KR20090118501A - Solid sample analysis device - Google Patents

Abstract

PURPOSE: A solid sample analysis device is provided to facilitate movement and analysis of a desired range and analyze particles emitted from a solid sample. CONSTITUTION: A solid sample analysis device comprises a laser-irradiated unit(105), a plasma generator(107), a first analysis unit(164) and a second analysis unit(166). The laser-irradiated unit emits a laser on the solid sample. An introduction part has an outer pipe supplied with cooling gas. The reactive part is connected to a first flow channel of the introduction part of the inner pipe. The chamber is supplied with the solid sample from the reactive part. The spout unit is positioned within the chamber. The spout unit spouts the cutting gas to the chamber. The first analysis unit is connected to the plasma generator.

Description

Apparatus of analyzing a solid sample

The present invention relates to a solid sample analysis device, and more particularly, to a solid sample analysis device for generating and analyzing particles emitted from a solid sample by plasma irradiation with a plasma.

From 1 July 2006, the European Union (EU) has entered into the Restriction of Hazardous Substances (RoSH), which is responsible for heavy metals such as cadmium, mercury, hexavalent chromium and bromine-based flame retardants in electrical and electronic products. The use of six substances (PPB, PBDE) is regulated. Due to the entry into force of the directive on the use of specific hazardous substances in the environment, hazardous substances such as heavy metals in all electrical and electronic products exported to the European Union may be regulated, which may have a significant impact on exports. Recently, there is a need for an analytical device that can easily analyze heavy metals used in all industries including six substances whose use is regulated in the European Union.

Examples of the analytical apparatus include an inductively coupled plasma-mass spectrometer (ICP-MS), a secondary ion mass spectrometer (SIMS), an X-ray fluorescence spectrometer (XRF), Atomic Absorption Spectrometer (Graphite Furnace Atomic Absorption Spectrometer: GFAAS).

Here, in the case of the inductively coupled plasma-mass spectrometer, the secondary ion mass spectrometer, and the atomic absorption spectrometer, the mobility of the device itself is very large, and thus the mobility is limited, and the device is expensive, and therefore, economical constraints follow. In particular, since the inductively coupled plasma-mass spectrometer and the atomic absorption spectrometer are required to pre-process a sample for analysis, the method according to the analysis is somewhat complicated and time-consuming. In other words, the inductively coupled plasma-mass spectrometer and the atomic absorption spectrometer cannot easily perform an analysis on a bulk sample. In addition, the laser ablation inductively coupled plasma mass spectrometer (LA-ICP-MS), which is a device for connecting a laser to the inductively coupled plasma-mass spectrometer, has excellent sensitivity according to analysis. Therefore, there is a limitation that the reference value is not easy to set. That is, since the laser-induced coupled plasma-mass spectrometer performs a high sensitivity analysis, the mobility, cost, performance, etc. of the device are not applicable to the somewhat less sensitive analysis, which is a measurement area required by the environmental regulations. It is somewhat unreasonable. In addition, in the case of the X-ray fluorescence spectrometer, it is difficult to obtain accurate analytical data due to severe interference when performing the analysis, low sensitivity according to the analysis, and only the surface of the solid sample can be analyzed. It is not easy to apply.

Therefore, in recent years, there is a demand for an analytical device capable of analyzing heavy metals, which are inexpensive and easy to move because the device itself is simple to perform accurate analysis of a desired analysis range.

An object of the present invention is to provide a solid sample analysis device that can be moved and can easily perform the analysis of the desired analysis range.

The solid sample analysis device according to an embodiment of the present invention for achieving the above object is a laser irradiation unit for emitting particles from the solid sample by irradiating a laser with a solid sample, and generating the particles emitted from the solid sample into a plasma A first analyzer connected to the plasma generation unit and the plasma generation unit to detect and analyze light emitted from the particles of the solid sample generated by the plasma in an X-axis direction, and the solid sample generated by the plasma And an analysis unit including a second analysis unit that detects and analyzes light emitted from the particles of Y in the Y axis direction. In particular, the plasma generating unit is formed between the inner tube having a first flow path connected to the laser irradiator to receive a sample discharged from the solid sample and the inner tube to accommodate the length of the inner tube. An inlet having an outer tube provided with a cooling gas in a tangential flow, and a sample which is connected to a first flow path of the inlet pipe and discharged from the solid sample provided through the first flow path into a plasma; A cutting gas in a direction opposite to a direction in which a reaction part to be produced, a chamber receiving the solid sample generated by the plasma from the reaction part, and positioned in the chamber and in which the particles of the solid sample generated in the plasma are supplied to the chamber are provided. It includes a jet unit for ejecting.

The first analyzer is connected to a monochromator for extracting a signal having a specific wavelength, and is connected to the optical amplification tube and the optical amplification tube which are connected to the monochromator and amplify the signal provided from the monochromator. And a display unit for displaying a signal provided from the monochromator, and the second analyzer may be connected to a charge coupling detector and the charge coupling detector, and may include a display unit for displaying a signal provided from the charge coupling detector. have.

In addition, it is preferable that the analysis unit be within a measurement range of several days to several tens of ppm.

In accordance with another aspect of the present invention, there is provided a solid sample analysis device including a laser irradiation unit for emitting particles from a solid sample by irradiating a laser with a solid sample, and plasma generated particles emitted from the solid sample. And a analyzer connected to the plasma generating unit and the plasma generating unit for analyzing the particle state of the solid sample generated by the plasma. In particular, the plasma generating unit includes a plate made of polydimethylsiloxane, a flow path penetrating the plate, a channel receiving a sample discharged from the solid sample to the plate through the flow path, and being inserted into the plate. The electrodes are installed to face each other with respect to the flow path, and include electrodes to which high frequency power is applied.

In the plasma generation unit, the plate may have a horizontal length of 20 to 50 mm to 40 to 70 mm, the flow path may have a diameter of 0.5 to 10 mm, and the electrodes may have a thickness of 0.1 to 0.5 mm and 4 to It may have a width of 8mm, the electrodes may be installed in a position spaced 0.1 to 1.5mm from the flow path.

In addition, the analyzer may include a prober inserted into one side of the channel of the plasma generator channel and a display unit connected to the prober.

In addition, it is preferable that the analysis unit be within a measurement range of several days to several tens of ppm.

As such, since the size of the plasma sampler is very small, the size of the analyzer may be reduced. Thus, it is possible to sufficiently cope with the recent market atmosphere that requires a movable analysis device. In addition, the measurement range can be set to several days to tens of thousands ppm but within a few days to several tens ppm or tens to hundreds of ppm can be set as the measurement range, thereby enabling more accurate analysis.

In addition, since the analysis can be performed in the air, sufficient analysis can be performed at a desired place such as customs, and thus a solid sample can be analyzed anywhere. In addition, since the analysis device of the present invention emits particles of the analytical sample by using a laser, it is possible to omit the pre-treatment of the solid sample to be analyzed, so that the method according to the analysis can be easily implemented, and the time is sufficient. It can be shortened.

In addition, since the solid sample analysis device of the present invention can analyze the profile according to the depth as well as the specific concentration of the sample, it is possible to further expand the analysis range.

As mentioned, the analysis apparatus of the present invention has a simple structure and is almost independent of the analysis range, and thus can sufficiently reflect the requirements of the recent market. Therefore, it can be actively used as an analytical device that can easily analyze heavy metals used in all industries including six substances whose use is regulated in the European Union.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In describing the drawings, similar reference numerals are used for similar elements. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention.

Terms such as first and second may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In the present application, the term "comprise" or "having" is intended to indicate that there is a feature, number, step, operation, component, part, or combination thereof described in the specification, and that one or more other features It should be understood that it does not exclude in advance the possibility of the presence or addition of numbers, steps, operations, components, parts or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

Example 1

1 is a schematic block diagram showing a solid sample analysis device according to a first embodiment of the present invention.

Referring to FIG. 1, the solid sample analyzer 100 includes a laser irradiator 105, a plasma generator 107, and an analyzer 160.

Specifically, the laser irradiation unit 105 is a member for receiving a solid sample and irradiating a laser to the solid sample, and emits particles from the solid sample by irradiating a laser to the solid sample. Here, examples of the laser irradiation unit 105 for irradiating the laser with the solid sample include F2 excimer laser, ArF excimer laser, KrCl excimer laser, KrF excimer laser, XeCl excimer laser, XeF excimer laser, Endi; Yag (Nd YAG) lasers, diode lasers, carbon dioxide lasers, and the like.

As such, in Example 1 of the present invention, since the particles are emitted from the solid sample by using the laser irradiator 105, a separate pre-treatment for the solid sample may be omitted. Thus, the solid sample analyzing apparatus 100 in Example 1 of the present invention may determine not only the solid sample in the coated state but also the solid sample in the bulk state as an analysis target.

The plasma generation unit 107 includes an introduction unit 150, a reaction unit 140, a chamber 100, and a jet unit 180. In particular, the plasma generation unit 107 is a "detection of the sample using the plasma filed by the inventor of the patent application No. 2004-112838 dated December 27, 2004, and registered as a patent registration number 10-679734 dated January 31, 2007 Device and a sample detection method using the same ".

Specifically, the introduction unit 150 in the plasma generation unit 107 is connected to the laser irradiation unit 105 is a member receiving a sample emitted from the solid sample, the reaction unit 140 is the introduction unit 150 Is a member for generating a plasma discharged from the solid sample provided through), and the chamber 100 provides an area for receiving and observing the solid sample generated in the plasma from the reaction unit 140. It is a member, the blowing unit 180 is located in the chamber 110, and ejects a cutting gas in a direction opposite to the direction in which the particles of the solid sample generated by the plasma is provided to the chamber 110 It is absent.

More specifically, the chamber 110 includes a space that receives particles (powder) of the decomposition-ionized solid sample by generating plasma, and the reaction unit 140 is located at one side of the chamber 110. do. In addition, at least one window 126 in which the analyzer 160 is positioned may be formed in the chamber 110. Accordingly, the light emitted from the particles of the solid sample formed by the plasma is analyzed by placing the analyzer 160 near the window 126. In particular, in the present invention, since the analysis unit 160 includes the first analysis unit 164 and the second analysis unit 166, the window 126 also forms two.

The reaction unit 140 is provided at one side of the chamber 110, and generates an inductive power to a particle of a solid sample provided through the introduction unit 150 to generate a plasma state, and thereby, the inside of the chamber 110. To provide. In particular, the reaction unit 140 includes a load coil 142 surrounding an end of the introduction unit 150 adjacent to the reaction unit 140, and a matching box 144 for applying power to the load coil 142. ), An RF oscillator 146 and the like. In addition, the reaction unit 140 may further include a cooling unit 148 for agglomerating plasma at an end portion adjacent to the chamber 100. Accordingly, the RF power is applied to the load coil 142 by the RF oscillator 146 to form particles of the solid sample provided into the reaction unit 140 into plasma.

The blowing unit 180 is a member that ejects the cutting gas to prevent the particles (powder) of the solid sample generated by the plasma adsorbed to the window 126 of the chamber 110 in advance, The adsorption of particles is prevented by ejecting the cutting gas in the reverse direction where the particles of the solid sample produced by the plasma are provided. Thus, the ejection unit 180 covers the window 126 of the chamber 110 provided in the chamber 110 in the X-axis direction, and is generated by plasma provided from the reaction unit 140. The cutting gas is ejected in the opposite direction to which a sample of solid particles is provided.

If the ejection unit 180 is not present in the chamber 110, particles of the solid sample generated by the plasma are ejected from the reaction unit 140 in the direction of the first analysis unit 164. It is adsorbed by the window 126 of the 110. As such, when the particles of the solid sample generated by the plasma are adsorbed to the window 126, the analysis efficiency is lowered, and thus the cutting gas is ejected by using the blowing unit 180.

In addition, the ejection unit 180 may prevent the recombination formed by recombination of particles of the solid sample generated by plasma in the chamber 110 to absorb the particles of the solid sample generated by the plasma. It also serves to deviate from the detection area.

In addition, the blowing unit 180 includes a cover 184 having an opening through which the cutting gas is ejected, and a supply unit 186 providing cutting gas to the inner space of the cover 184. Here, the cover portion 184 may have a cone shape, a hemispherical shape, a triangular shape, and the like, the inner space formed while covering the window 126. And as an example of the said cutting gas, argon gas, nitrogen gas, etc. are mentioned.

The introduction part 150 is formed between the inner tube 152 and the inner tube 152 having a first flow path connected with the laser irradiator 105 to receive a sample discharged from the solid sample. As a result, it has a dual structure including an outer tube 154 provided with cooling gas in a tangential flow with respect to the longitudinal direction of the inner tube 152. Here, the cooling gas may include argon gas and the like, and is provided through a member 156 installed in a vertical direction with respect to a length direction of the introduction part 150 at one side of the outer tube 154 of the introduction part 150. do.

The analysis unit 160 is connected to the plasma generating unit 107, in particular, a region near the window 126 of the chamber 110, and the X-axis light emitted from the particles of the solid sample generated by the plasma. The first analyzer 164 detects and analyzes in the direction, and the second analyzer 166 detects and analyzes the light emitted from the particles of the solid sample generated by the plasma in the Y-axis direction. In particular, the first analyzer 164 is a monochromator (monochromator) for extracting a signal of a specific wavelength, the optical amplification tube (photo amplifier) is connected to the monochromator, and amplifies the signal provided from the monochromator It may include a multi tube (PMT) and the optical amplifier tube, the display unit for displaying a signal provided from the monochromator. The second analysis unit 166 may include a charge coupled detector (CCD) and a display unit connected to the charge coupled detector and displaying a signal provided from the charge coupled detector.

Accordingly, the first analyzer 164 may precisely analyze the peaks of the solid sample particles generated by plasma in a predetermined region of wavelengths decomposed for each region by the monochromator, and the second analyzer 166 ) Can detect the peak change of the solid sample particles generated by the plasma in the wavelength range of the UV region and the visible light region. That is, since the intensity of light emitted from the particles of the solid sample generated by the plasma using the first analyzer 164 and the second analyzer 166 is detected simultaneously in the X-axis direction and the Y-axis direction, The long wavelength region can be analyzed simultaneously. In addition, Example 1 of the present invention has a characteristic that can directly monitor the physical decomposition-ion change process for the particles of the solid sample generated by the plasma.

As mentioned above, the solid sample analyzing apparatus 100 according to the first exemplary embodiment of the present invention includes a laser irradiator 105, a plasma generator 107, and an analyzer 160. In particular, since the plasma generating unit 107 is very small in size, it can be confirmed that mobility is not restricted. In addition, when the solid sample analysis apparatus 100 is used, the measurement range may be several days to several thousand ppm, but in Example 1 of the present invention, the measurement range may be limited to several tens of ppm. In addition, the solid sample analysis apparatus 100 according to the first exemplary embodiment of the present invention has the advantage of measuring not only the surface analysis of the solid sample but also the bulk region of the lower part of the surface of the solid sample.

Accordingly, the solid sample analysis device 100 may sufficiently cope with the recent market atmosphere requiring mobile and accurate analysis.

Example 2

Figure 2 is a schematic block diagram showing a solid sample analysis device according to a second embodiment of the present invention.

Referring to FIG. 2, the solid sample analyzer 200 includes a laser irradiator 201, a plasma generator 203, and an analyzer 206.

Since the laser irradiation unit 201 has the same configuration as the laser irradiation unit 105 of the solid sample analysis device 100 of FIG. 1, detailed description thereof will be omitted.

The plasma generator 203 includes a plate 205, a channel 202, and electrodes 204a and 204b. In particular, the plasma generating unit 203 is a "plasma generating device and the present inventor filed with the patent application No. 2004-109107 dated December 21, 2004, and registered as a patent registration number 10-535768 dated December 5, 2005 Similar to those described in "Analysis System Used."

Specifically, the plasma generation unit 203 includes a plate 205 made of polydimethylsiloxane and a channel 202 made of a flow path 202a passing through the plate 205. That is, the plasma generation unit 203 includes a plate 205 having a flow path 202a as the channel 202. Here, the channel 202 has a structure connected to the laser irradiation unit 201. That is, it has a structure that receives the particles emitted from the solid sample by the laser irradiation unit 201 through the flow path 202a of the channel 202.

The plate 205 is not limited in size, but is preferably manufactured in microchip units. Therefore, the plate 205 is preferably about 20 to 50 mm in width, and preferably about 40 to 70 mm in length. In addition, the width is preferably about 25 to 45 mm, more preferably about 45 to 60 mm.

In the case of the channel 202, the flow path 202a, the channel 202 is preferably manufactured together when the plate 205 is manufactured. That is, the flow path 202a can be manufactured together when the plate 205 is manufactured by considering the design of the mold as having the flow path 202a in the molding for manufacturing the plate 205. In addition, the diameter of the flow path 202a is preferably about 0.5 to 10mm, more preferably about 0.5 to 5mm, most preferably about 2mm.

In this way, the plasma generating unit 203 provides the flow path 202a in the plate 205 to provide the particles emitted from the solid sample to the flow path 202a when generating the plasma.

The plasma generation unit 203 includes electrodes 204a and 204b which are inserted into the plate 205 and are installed to face each other with respect to the flow path 202a. That is, the electrodes 204a and 204b face each other while being installed at upper and lower portions with respect to the flow path 202a, respectively. In addition, the site where the electrodes 204a and 204b are inserted also has a design of a mold for forming the plate 205 as in the formation of the flow path 202a. It can be easily prepared by considering having a site to be inserted. In addition, when the electrodes 204a and 204b are spaced apart from the flow passage 202a by less than about 0.1 mm, the electrodes 204a and 204b are not preferable because they may be in contact with each other. When spaced apart to exceed mm, the efficiency of the high frequency power applied to the electrodes 204a and 204b is not preferable. Therefore, the electrodes 204a and 204b are preferably installed about 0.1 to 1.5 mm apart from the flow path 202a, more preferably about 0.3 to 1.0 mm apart, and are disposed about 0.5 mm apart from each other. Most preferred. In addition, each of the electrodes 204a and 204b may be formed to have a thickness of about 0.1 to 0.5 mm and a width of about 4 to 8 mm. This is because the plate 205 is implemented in microchip units. In addition, in consideration of electrical resistance and price, the electrodes 204a and 204b are preferably made of copper.

As such, the plasma generation unit 205 provides the electrodes 204a and 204b to apply the high frequency power to the electrodes 204a and 204b to plasma particles of the solid sample provided to the flow path 102a. It can be formed as.

As mentioned above, according to the second embodiment of the present invention, the plasma generation unit 203 of the solid sample analysis device 200 has a microchip unit so as to enable stable operation, and thus the mobility as well as the analysis in the desired range. Can be done accurately.

The analyzer 206 is connected to the prober 206a inserted into one side of the flow path 202a to analyze the state of the plasma generated using the plasma generator 203, that is, the particles of the solid sample. It includes an analysis unit 206 for. Here, since the prober 206a is inserted into one side of the flow path 202a, the diameter of the prober 206a should be smaller than the diameter of the flow path 202a. Therefore, since the prober 206a must be very thin, it is preferable that the prober 206a is made of an optical fiber. In addition, the analysis unit 206 preferably includes a display unit 206b for displaying a signal transmitted by the prober 206a.

Accordingly, the solid sample particles in the plasma state generated using the plasma generator 203 can be easily analyzed through the analyzer 206. That is, since the plasma generating unit 203 is portable, the solid sample can be analyzed at any time at a desired place.

Since the plasma is generated in the flow path 202a in the operation of the plasma generator 203 of the solid sample analyzer 200, the prober 206a may be damaged by the plasma. Therefore, it is preferable to include a purge gas providing line 208 that purges the flow path 202a to sufficiently prevent damage of the prober 206a from sputtering due to the plasma. In particular, the purge gas providing line 208 is most efficiently installed between the electrodes 204a and 204b, which are the sites where the plasma is generated, and the prober 206a. In addition, the purge gas providing line 208 is preferably connected perpendicularly to the flow path 202a, and particularly preferably vertically connected to the flow direction of the gas provided to the flow path 202a. This is because the prober 206a can be most efficiently protected from the plasma when the purge gas is provided perpendicularly to the traveling direction of the gas provided to the flow path 202a.

In addition, since the prober 206a is inserted into one side of the flow path 202a in the operation of the plasma generation unit 203 of the solid sample analysis device 200, the solid sample provided to the flow path 202a may be formed. Interfere with the release of particles. Therefore, the plasma generation unit 203 preferably includes a discharge line 210 for discharging the particles of the solid sample provided to the flow path 202a and the purge gas. In particular, the discharge line 210 is preferably formed between the electrodes 204a, 204b and the purge gas providing line 208, about 4 to 5 mm away from the electrodes 204a, 204b. More preferably connected to. In particular, the discharge line 210 is most preferably connected to a position about 4.5mm away from the electrodes (204a, 204b).

Therefore, the solid sample analyzing apparatus 200 analyzes the solid sample particles in the plasma state generated using the plasma generating unit 203 through the analyzing unit 206. The purge gas is supplied to the purge gas providing line 208 to stabilize the prober 206a and to discharge particles of the solid sample remaining in the flow path 202a through the discharge line 210. .

As such, since the solid sample analyzing apparatus 200 includes the plasma generation unit 203 in units of microchips, the solid sample analyzing apparatus 200 may analyze particles of the solid sample in the plasma state at any time. In addition, when using the solid sample analysis device 200 may be applied to the measurement range of several days to tens of thousands of ppm, in Example 2 of the present invention can limit the measurement range to tens to hundreds of ppm. In addition, the solid sample analysis apparatus 100 according to the first exemplary embodiment of the present invention has the advantage of measuring not only the surface analysis of the solid sample but also the bulk region of the lower part of the surface of the solid sample.

Therefore, the solid sample analysis device 200 may sufficiently cope with the recent market atmosphere requiring mobile and accurate analysis.

1 is a schematic block diagram showing a solid sample analysis device according to a first embodiment of the present invention.

Figure 2 is a schematic block diagram showing a solid sample analysis device according to a second embodiment of the present invention.

Claims (7)

A laser irradiator which emits particles from the solid sample by irradiating a laser with a solid sample; In order to generate the particles emitted from the solid sample into the plasma, the inner tube having a first flow path connected with the laser irradiation unit for receiving the sample discharged from the solid sample is formed therebetween by accommodating the inner tube. An inlet having an outer tube provided with a cooling gas in a tangential flow with respect to a longitudinal direction of the inner tube, and connected to a first flow path of the inlet inner pipe and provided through the first flow path; A reaction unit for generating a plasma discharged from the sample into a plasma, a chamber for receiving a solid sample generated by the plasma from the reaction unit, the chamber is located in the chamber, the particles of the solid sample generated by the plasma is provided to the chamber A plasma generation unit including a blowing unit for ejecting the cutting gas in a direction opposite to the direction of the cutting gas; And A first analyzer connected to the plasma generator and configured to detect and analyze light emitted from the particles of the solid sample generated by the plasma in an X-axis direction, and light emitted from the particles of the solid sample generated by the plasma; Solid-state analysis device including an analysis unit having a second analysis unit for detecting and analyzing in the Y-axis direction. According to claim 1, wherein the first analyzer is a monochromator (monochromator) for extracting a signal of a specific wavelength, the optical amplifier tube connected to the monochromator, and amplifies a signal provided from the monochromator (photo a multi tube (PMT) and a display unit connected to the optical amplifier tube and displaying a signal provided from the monochromator, wherein the second analyzer includes a charge coupled detector (CCD) and the charge coupled detector And a display unit connected to the display unit and displaying a signal provided from the charge coupling detection unit. According to claim 1, wherein the analysis unit is a solid sample analysis device, characterized in that the measurement range within a few days to tens of thousands ppm. A laser irradiator which emits particles from the solid sample by irradiating a laser with a solid sample; In order to generate the particles emitted from the solid sample into a plasma, a plate made of poly (dimethylsiloxane (PDMS)), and a flow path through the plate, the solid sample through the flow path to the plate A plasma generation unit including a channel receiving a sample emitted from the electrode and an electrode inserted into the plate so as to face each other around the flow path and to which RF power is applied; And And an analyzer configured to be connected to the plasma generator and to analyze a particle state of the solid sample generated by the plasma. According to claim 4, wherein the plate in the plasma generating unit is horizontal to vertical length of 20 to 50mm ㅧ 40 to 70mm, the flow path has a diameter of 0.5 to 10mm, the electrode has a thickness of 0.1 to 0.5mm and 4 to It has a width of 8mm, the electrode is a solid sample analysis device, characterized in that installed in a position spaced 0.1 to 1.5mm from the flow path. The solid sample analysis device of claim 4, wherein the analysis unit comprises a prober inserted into one side of a channel of the plasma generation unit channel and a display unit connected to the prober. The solid sample analysis device of claim 4, wherein the analysis unit has a measurement range within several days to several tens of ppm.

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