KR20070120315A - Support substrate and manufacturing method of organic light emitting display device using same - Google Patents

Abstract

The present invention provides a support substrate capable of ultra-thinning while securing excellent characteristics and reliability of an organic light emitting display device and a method of manufacturing the organic light emitting display device using the same.

The support substrate according to the present invention is bonded to a pixel substrate of an organic light emitting diode display, and includes a support layer and a separation layer formed of a plurality of patterns formed while forming a buffer zone on a bonding surface of the support layer with the pixel substrate.

Description

A support substrate and a manufacturing method of an organic light emitting display device using the same {HOLDER SUBSTRATE AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY USING THE SAME}

1 is a cross-sectional view illustrating a support substrate for an organic light emitting display device according to an embodiment of the present invention.

2 is a partial plan view illustrating a support substrate for an organic light emitting diode display according to an exemplary embodiment of the present invention.

3 is a cross-sectional view illustrating a support substrate for an organic light emitting diode display according to another exemplary embodiment of the present invention.

4A through 4D are sequential process cross-sectional views illustrating a method of manufacturing an organic light emitting diode display according to an exemplary embodiment of the present invention.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic light emitting display device, and more particularly, to a support substrate that enables ultra-thinning of an organic light emitting display device and a method of manufacturing the organic light emitting display device using the same.

In the organic light emitting diode display, electrons and holes injected into the organic material through an anode and a cathode recombine to form an exciton, and light of a specific wavelength is generated by energy from the exciton formed. It is a self-luminous display device using the phenomenon which occurs. Accordingly, the organic light emitting diode display is attracting attention as a next-generation display device because it does not require a separate light source such as a backlight, and thus has low power consumption and easy securing of a wide viewing angle and a fast response speed compared to the liquid crystal display.

The light emitting device of the organic light emitting diode display includes a first electrode of an anode, which is a hole injection electrode, a light emitting layer, and a second electrode of a cathode, which is an electron injection electrode, and the light emitting layer is red (R), green (G; Green). In addition, each of the organic materials emitting blue (B) is made of full color. In addition, the light emitting layer has a multilayer structure including an electron transport layer (ETL) and a hole transport layer (HTL) in the emitting layer (EML) to improve the light emission efficiency by improving the balance between electrons and holes. In some cases, it may further include a separate electron injection layer (EIL) and a hole injection layer (HIL).

The OLED display is classified into a passive matrix type and an active matrix type according to a driving method.

Here, the passive driving type organic light emitting display device is simple in manufacturing process and low in manufacturing cost, but is large in power consumption and unsuitable for large area. On the other hand, since the active driving type organic light emitting display device has a thin film transistor (TFT) as a driving element, the process is more complicated and the manufacturing cost is higher than that of the passive driving type organic light emitting display device. Since R, G, and B independent driving methods enable low power consumption, high definition, fast response speed, wide viewing angle, and thinning, the active driving type organic light emitting display device is mainly applied.

Meanwhile, in order to manufacture thinner and lighter organic light emitting display devices as the demand for ultra-thin organic light emitting display devices increases, a substrate on which light emitting elements and driving elements are formed after fabrication of the organic light emitting display device (hereinafter, referred to as a 'pixel substrate'). It is applied to remove part by grinding the back of part) or part by using chemicals.

However, in this case, a separate process for removing a part of the pixel substrate and a separate facility for performing such a process should be added, and in particular, when using chemicals, the problem of deterioration of the characteristics of the device for chemicals is caused. have.

In order to solve this problem, in the related art organic light emitting diode display, a thin pixel substrate of about 0.6 mm is attached to a separate holder substrate, a pixel including a light emitting element and a driving element is fabricated on the pixel substrate, and By applying the pixel substrate and the encapsulation substrate, the method of separating the pixel substrate from the supporting substrate is applied.

However, even in this case, as the two substrates contact each other, heat transfer may not be uniformly performed to the pixel substrate during the heat treatment process, and the substrate may be deformed or destroyed due to the pressure difference when the two substrates are bonded in the vacuum chamber. This has a problem that it is difficult to manufacture an organic light emitting display device having high characteristics and reliability.

In addition, it is not easy to separate the pixel substrate from the support substrate after manufacturing the organic light emitting diode display, and the support substrate cannot be recycled, thereby increasing the manufacturing cost.

The present invention is to solve the problems of the prior art as described above, an object of the present invention is to provide a support substrate and an organic light emitting display device using the same to ensure the ultra-thin while ensuring excellent characteristics and reliability of the organic light emitting display device It is to provide a manufacturing method.

In order to achieve the above object, the present invention provides a separation layer comprising a plurality of patterns bonded to a pixel substrate of an organic light emitting diode display, and formed by forming a buffer zone on a bonding surface of the support layer and the pixel substrate of the support layer. It provides a supporting substrate comprising.

Here, the separation layer may include a first pattern disposed to surround the edge of the support layer, a second pattern disposed at each of four corners of the space formed by the first pattern to be spaced apart from the first pattern, and the second pattern; The second pattern may include a plurality of third patterns spaced apart from each other.

In addition, the first pattern, the second pattern, and the third pattern of the separation layer may each have a vertical shape, a tapered shape, or an inverted tapered shape, and each may be formed of an insulating material, a positive photoresist material, or a negative photoresist material. Can be done.

In addition, the first pattern, the second pattern, and the third pattern of the separation layer may have a width of 50 to 500 μm and an interval of 100 to 1000 μm, respectively.

In order to achieve the above object, according to the present invention, the above-described support substrate is prepared, the pixel substrate is bonded to the support substrate so that the buffer zone is in a vacuum state, and the pixel portion including the driving element and the organic light emitting element on the pixel substrate. A method of manufacturing an organic light emitting display device, the method comprising: forming and bonding an encapsulation substrate to a pixel substrate to protect the pixel portion, cutting the pixel substrate, and separating the pixel substrate from the support substrate.

Here, the cutting line of the pixel substrate may correspond to the buffer zone when the pixel substrate and the support substrate are bonded to each other.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the present invention.

First, a supporting substrate for an organic light emitting display device according to an exemplary embodiment of the present invention will be described with reference to FIGS. 1 and 2.

1 and 2, the support substrate 100 includes a plurality of patterns formed by forming a buffer zone on a bonding surface between the support layer 110 and a pixel substrate such as an organic light emitting display device among the support layers 110. A separation layer 120 is formed.

Here, the support layer 110 may have a thickness of about 0.7 to 1.0mm, for example, it may be made of a glass substrate.

The separation layer 120 mitigates the impact due to the pressure difference between the atmosphere and the vacuum during the junction with the pixel substrate and the cutting of the pixel substrate by the buffer zone, and preferably the first pattern disposed at the edge of the support layer 110. And the second pattern 112 spaced apart from the first pattern 111 and disposed inside the first pattern 111, and the second pattern 112 spaced apart from the second pattern 112 and disposed inside the second pattern 112. It may include a third pattern 113 to be.

More preferably, the first pattern 111 surrounds an edge of the support layer 110 to support a cutter when cutting the pixel substrate while maintaining a vacuum state when the support substrate 100 is bonded to the pixel substrate. It may be arranged to.

Each of the second patterns 112 may be disposed at each of four corners of the space formed by the first pattern 111 so as to further alleviate the impact due to the pressure difference generated during cutting.

In addition, a plurality of third patterns 113 may be regularly arranged to maintain a uniform distance between the pixel substrate and the support layer 110.

In addition, the first pattern 121, the second pattern 122, and the third pattern 123 of the separation layer 120 maintain the reflectance and transmittance while minimizing the pressure difference and do not cause a recognition problem such as a photo sensor. The first pattern 121, the second pattern 122, and the third pattern 123 may have a width of 50 to 500 μm and a spacing of 100 to 1000 μm, respectively. Can be arranged.

Meanwhile, the first pattern 121, the second pattern 122, and the third pattern 123 of the separation layer 120 may have side portions of a vertical shape or a tapered shape (not shown), respectively, as shown in FIG. 1. 3, the first pattern 131, the second pattern 132, and the third pattern 133 of the separation layer 130 may have inverted tapered sides to minimize the contact area with the support layer 110, as shown in FIG. 3. It may be. In the former case, the separation layer 120 may be made of an insulating material or a positive photoresist material. In the latter case, the separation layer 130 may be made of a negative type photoresist material. Silver may be cured to have stable properties even at high temperatures, such as UV or about 400 ℃.

In addition, in FIG. 2, the planar shape of the isolation layer 120 has a first frame 121 having a rectangular picture frame shape, the second pattern 122 has a rod shape, and the third pattern 123 has a rectangular shape. Although the case was shown, these shapes are not limited to the example of illustration, It can variously deform.

Next, a method of manufacturing the OLED display will be described with reference to FIGS. 4A to 4D.

Referring to FIG. 4A, as an example, a support substrate 100 as illustrated in FIG. 3 is prepared, a first sealing member 310 is disposed on the support substrate 100, and the pixels are supported on the support substrate 100 in a vacuum chamber. The substrate 210 is bonded to form a vacuum in the buffer zone of the separation layer 130.

In this case, the impact generated by the pressure difference is alleviated by the separation layer 130 of the support substrate 100, so that deformation or destruction of the pixel substrate 210 does not occur.

In addition, since a separate support substrate 100 is applied, the thickness of the pixel substrate 210 may be reduced to about 0.6 mm or less, thereby making it possible to reduce the thickness of the OLED display.

Meanwhile, the pixel substrate 210 may be made of an insulating material such as glass or plastic or a metal material such as stainless steel (SUS), and the first pattern 131 and the second pattern 132 of the separation layer 130 may be formed. The buffer zone between) may substantially correspond to the cutting line of the pixel substrate 210.

Referring to FIG. 4B, a pixel portion 220 including a driving element made of a TFT and an organic light emitting element made of a first electrode, an organic light emitting layer, and a second electrode is formed on the pixel substrate 210 by a known method. In this case, heat may be uniformly transferred to the pixel substrate 210 by the separation layer 130 during several heat treatment processes performed to form the pixel portion 230.

Referring to FIG. 4C, the encapsulation substrate 230 is bonded to the pixel substrate 210 so that the second sealing member 320 is disposed on the pixel substrate 210 and the pixel portion 220 is protected.

Thereafter, as illustrated in FIG. 4D, the pixel substrate 210 is cut along the cutting line and the pixel substrate 210 is separated from the support substrate 100 to form the organic light emitting diode display 200.

That is, as the buffer zone between the support substrate 100 and the pixel substrate 210 is in a vacuum state, the pixel substrate 210 is removed from the support substrate 100 simultaneously with the cutting of the pixel substrate 210 without a separate separation process. It becomes possible to separate.

In addition, since the impact applied due to the pressure difference between the vacuum and the atmosphere may be alleviated by the separation layer 130, deformation or destruction of the support substrate 100 and the pixel substrate 210 may be prevented, thereby supporting the support substrate 100. ) Can be recycled.

Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and various modifications and changes can be made within the scope of the claims and the detailed description of the invention and the accompanying drawings. Naturally, it belongs to the range of.

As described above, since the support substrate according to the present invention includes a separation layer having a buffer zone for mitigating impact, an ultra-thin organic light emitting display device having excellent characteristics and reliability without causing deformation or damage to the pixel substrate may be manufactured. Can be.

In addition, even when the pixel substrate is separated, the support substrate may not be deformed or damaged, and thus the support substrate may be recycled to reduce manufacturing costs.

Claims (7)

Bonded to a pixel substrate of an organic light emitting diode display, Support layer; And And a separation layer formed of a plurality of patterns disposed on a bonding surface of the support layer with the pixel substrate. According to claim 1, The separation layer A first pattern disposed to surround an edge of the support layer; A second pattern spaced apart from the first pattern and disposed at each of four corners of the space formed by the first pattern; And a third pattern spaced apart from the second pattern, the third pattern being disposed inside the second pattern. The method of claim 2, And the first pattern, the second pattern, and the third pattern of the separation layer each have a vertical shape, a tapered shape, or an inverse tapered shape. The method of claim 2, And the first pattern, the second pattern, and the third pattern of the separation layer are made of an insulating material, a positive photoresist material, or a negative photoresist material, respectively. The method of claim 2, The first pattern, the second pattern and the third pattern of the separation layer are disposed with a width of 50 to 500㎛ and a space of 100 to 1000㎛, respectively. Preparing a support substrate of any one of claims 1 to 5; Bonding the pixel substrate to the support substrate such that the buffer zone is in a vacuum state; Forming a pixel portion including a driving element and an organic light emitting element on the pixel substrate; Bonding an encapsulation substrate to the pixel substrate to protect the pixel portion; And And cutting the pixel substrate and separating the pixel substrate from the support substrate. The method of claim 6, And a cutting line of the pixel substrate corresponds to the buffer zone when the pixel substrate and the support substrate are bonded to each other.

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