KR20070069925A - Color filter substrate and manufacturing method thereof, and liquid crystal display device comprising same and manufacturing method thereof - Google Patents

Abstract

The present invention relates to a color filter substrate and a method for manufacturing the same, which can simplify the process; A black matrix formed on the transparent substrate; And a color filter substrate including a color filter formed on the transparent substrate except for the black matrix, a method of manufacturing the same, and a liquid crystal display device including the same and a method of manufacturing the same.

Description

COLOR FILTER SUBSTRATE AND FABRICATION METHOD THEREOF AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME, AND FABRICATION METHOD THEREOF}

1A is a plan view showing a general horizontal field type liquid crystal display device.

FIG. 1B is a cross-sectional view showing a cross section taken along line II ′ in FIG.

2 is a cross-sectional view showing a liquid crystal display device according to the present invention.

3A to 3E are cross-sectional views illustrating a method of manufacturing a color filter substrate according to the present invention.

*** Explanation of symbols for main parts of drawing ***

103: data line 106: common electrode

107: pixel electrode 113: gate insulating film

115: Shield 123, 223: Black Matrix

125, 225: color filter 130: liquid crystal layer

240: mask 250: slit mask

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a color filter substrate and a method of manufacturing the same, which simplify the process.

The twisted nematic mode liquid crystal display device, which is mainly used as a flat panel display device of high quality and low power, has a disadvantage in that the viewing angle is narrow. This is due to the refractive anisotropy of the liquid crystal molecules, because the liquid crystal molecules oriented horizontally with the substrate are oriented almost perpendicular to the substrate when a voltage is applied to the liquid crystal display panel.

Accordingly, in-plane switching mode LCD (LCD), which solves the viewing angle problem by aligning liquid crystal molecules in a substantially horizontal direction with a substrate, has been actively studied in recent years.

FIG. 1 schematically illustrates a unit pixel of a general horizontal field type liquid crystal display device, in which FIG. 1A is a plan view and FIG. 1B is a cross-sectional view taken along line II ′ of FIG. 1A.

As shown in the figure, the gate line 1 and the data line 3 are vertically and horizontally arranged on the transparent first substrate 10 to define a pixel area. In an actual liquid crystal display device, n gate lines 1 and m data lines 3 intersect with n x m pixels, but only one pixel is shown in the figure for simplicity.

A thin film transistor 9 composed of a gate electrode 1a, an active layer 5, and source / drain electrodes 2a and 2b is disposed at an intersection point of the gate line 1 and the data line 3. The gate electrode 1a and the source / drain electrodes 2a and 2b are connected to the gate line 1 and the data line 3, respectively. In addition, the gate insulating film 8 is laminated over the entire substrate.

In the pixel region, the common line 4 is arranged in parallel with the gate line 1, and at least one pair of electrodes for switching the liquid crystal molecules, that is, the common electrode 6 and the pixel electrode 7, includes the data line 3. It is arranged parallel to. The common electrode 6 is formed at the same time as the gate line 1 and connected to the common line 4, and the pixel electrode 7 is formed at the same time as the source / drain electrodes 2a and 2b to form the thin film transistor 9. It is connected to the drain electrode 2b. A protective film 11 is formed over the entire substrate including the source / drain electrodes 2a and 2b. In addition, the pixel electrode line 14 overlapping with the common line 4 and connected to the pixel electrode 7 forms a storage capacitor Cst with an insulating film 8 interposed therebetween. .

On the opposing surfaces of the first substrate 10 and the second substrate 20, alignment films 12a and 12b for determining the initial alignment direction of the liquid crystal are coated, and the first substrate 10 and the second substrate are coated. A liquid crystal layer 13 for controlling light transmittance by the voltage applied to the common electrode 6 and the pixel electrode 7 is formed between the 20.

In addition, the second substrate 20 has a black matrix 21 that prevents light from leaking into the thin film transistor 9, the gate line 1, and the data line 3, and a color filter for implementing color. 23 and an overcoat film 25 for planarizing the color filter 23 are formed. The black matrix 21 may use a metal material such as chromium (Cr). However, in the horizontal electric field method, the black matrix 21 mainly uses black resin because it affects the transverse electric field between the pixel electrode 7 and the common electrode 6. .

The color filter 23 is formed by applying a color ink, selectively irradiating light through a mask, and then developing. However, as the exposure is performed to an unintended area during exposure, the color filter 23 is formed on the black matrix 21 as shown in the drawing. Accordingly, a step is formed on the surface of the color filter 23, and the image quality such as gravity failure and touch failure due to liquid crystal fluctuations formed between the first substrate 10 and the second substrate 20 due to the step difference. Defects will occur

Therefore, in order to solve these problems, the overcoat film 25 for leveling the surface of the color filter 23 has to be formed in the related art, so that the process of the color filter substrate is complicated.

Accordingly, the present invention has been made to solve the above problems, and an object of the present invention is to form an overcoat film by forming a color filter in the area between the black matrices using a slit mask or a half-tone mask. The present invention provides a color filter substrate and a method of manufacturing the same, a liquid crystal display device including the same, and a method of manufacturing the same.

Other objects and features of the present invention will be described in detail in the configuration and claims of the following invention.

The present invention for achieving the above object is a transparent substrate; A black matrix formed on the transparent substrate; And it provides a color filter substrate comprising a color filter formed on the transparent substrate except the black matrix.

In this case, the black matrix may be formed of a metal material such as black resin or chromium (Cr).

In addition, the present invention is the first and second substrate; A black matrix formed on the second substrate;

A color filter formed on the second substrate except for the black matrix; And a liquid crystal layer formed between the first substrate and the second substrate, wherein the first substrate is a thin film transistor array substrate.

In addition, the present invention comprises the steps of preparing a transparent substrate; Forming a black matrix on the transparent substrate; And forming a color filter on the second substrate except for the black matrix, wherein the forming of the color filter comprises applying a color filter forming ink on a transparent substrate including a black matrix. Doing; Irradiating light through a mask having a light transmitting portion in an area excluding the black matrix and having slit portions on both sides of the light transmitting portion; And forming a color filter on the transparent substrate except for the black matrix.

In this case, a mask provided with a semi-transmissive portion may be used so that only part of the light is transmitted to both sides of the light transmitting portion.

In addition, the present invention comprises the steps of preparing a first substrate on which the thin film transistor array is formed; Preparing a second substrate on which a color filter is formed in an area excluding the black matrix and the black matrix; And it provides a method for manufacturing a liquid crystal display device comprising the step of forming a liquid crystal layer between the first and second substrate.

As described above, the present invention uses a mask provided with a slit portion or a semi-transmissive portion on both sides of the light transmitting portion when forming the color filter, so that the color filter does not overlap with the black matrix, so that the color is generated by the overlap between them. By removing the step of the filter, a color filter capable of removing the overcoat film and a method of manufacturing the same are provided. That is, in the present invention, the black matrix is formed on the transparent substrate, and the color filter is formed on the transparent substrate except for the black matrix, thereby eliminating the step caused by the overlap of the black matrix and the color filter. Prevents fluctuations in the amount of liquid crystal generated. As described above, the present invention has the advantage that the manufacturing process of the color filter can be further simplified by omitting the overcoat film step by preventing the variation in the amount of liquid crystal.

Hereinafter, a color filter substrate according to the present invention and a manufacturing method thereof, a liquid crystal display device including the same, and a manufacturing method thereof will be described in detail with reference to the accompanying drawings.

2 is a cross-sectional view schematically showing a liquid crystal display device according to the present invention.

As shown in the figure, the liquid crystal display device 100 according to the present invention includes a liquid crystal layer 130 formed between the first substrate 110 and the second substrate 120 and the first and second substrates 110 and 120. It is configured to include.

A plurality of gate lines (not shown) arranged in a first direction on the first substrate 110 and a plurality of data lines 103 arranged in a second direction perpendicular to the gate lines to define a plurality of pixel regions. ) Is formed.

A switching element (not shown) for switching each pixel is formed at an intersection point of the gate line and the data line 103, and the switching element includes a gate electrode, a semiconductor layer, a source electrode, and a drain electrode.

A common electrode 106 and a pixel electrode 107 are formed in the pixel region, and a gate insulating film 113 and a protective film 115 are formed between the common electrode 106 and the pixel electrode 107. Is interposed. That is, the common electrode 106 is formed on the first substrate 110, and the pixel electrode 107 is formed on the passivation layer 115. The pixel electrode 107 is formed of a transparent conductive material such as indium tin oxide (ITO) for high opening ratio, and is electrically connected to the drain electrode of the switching device.

Although not shown, the common electrode 106 may be formed on the second substrate 120, and the pixel electrode 107 may be formed over the entire pixel area.

Meanwhile, the black matrix 123 is formed on the second substrate 120, and the color filter 125 is formed on the second substrate 120 except for the black matrix 123. That is, the black matrix 123 and the color filter 125 are all formed on the first substrate 110 without overlapping regions on the first substrate 110.

As described above, in the present invention, since the black matrix 123 and the color filter 125 do not overlap, there is no step of the color filter 125 due to their overlap. Therefore, there is an advantage that the overcoat film for planarizing the color filter 125 can be omitted.

Furthermore, in the related art, an overcoat film had to be formed due to a step generated in the overlapping region of the black matrix 123 and the color filter 125. That is, when the overcoat layer is not formed due to the change of the overlapping region of the color filter 125 and the overcoat layer in the process, the amount of liquid crystal filled in the liquid crystal layer is changed due to the change of the overlapping region, resulting in a gravity failure and a touch failure.

However, in the present invention, by eliminating the overlapping region between the black matrix and the color filter, this problem can be solved and the overcoat film can be omitted.

According to the present invention, the black matrix and the color filter are formed so as not to overlap each other. In the exemplary embodiment of the present invention, a horizontal electric field type liquid crystal display device is described, but the present invention is not limited thereto, and the black matrix and the black matrix are not limited to this. If there is no overlapping area of the color filter, all driving modes will be included. For example, it may include a twisted nematic liquid crystal display.

In addition, the present invention does not limit the forming material of the black matrix, for example, chromium (Cr) or may be used as a black resin, or the like.

3A to 3E are process flowcharts illustrating a manufacturing process of a color filter substrate according to the present invention.

First, as shown in FIG. 3A, a transparent substrate 210 is prepared, and then a black matrix forming film 223a is coated on the transparent substrate 210. In this case, the black matrix forming film 223a may be made of chromium or black resin.

When black resin is used, the black matrix forming film 223a is blocked with a mask 240 in which a non-transmissive area for light is selectively formed, and then ultraviolet rays (arrows on the drawing) are irradiated.

Next, the black matrix forming film 223a irradiated with ultraviolet rays is developed to form the black matrix 223 as shown in FIG. 3B. At this time, since the region not irradiated with ultraviolet rays is removed by the developer, the black matrix 223 is formed in the region irradiated with ultraviolet rays. On the other hand, the resin for forming the black matrix remaining in the region not irradiated with ultraviolet rays may be used.

Subsequently, as shown in FIG. 3C, the R color filter forming resin film 225 ′ is coated on the transparent substrate 210 on which the black matrix 223 is formed, and then a non-transmissive area for light is selectively After blocking the R color filter-forming resin film 225 'with the formed slit mask 250, ultraviolet rays (arrows on the drawing) are irradiated.

In this case, the mask 250 is formed with light transmitting parts A and B for transmitting light in a region where the R color filter is to be formed, and in particular, a slit pattern A for transmitting only part of light to both sides of the light transmitting part. ) Is provided.

That is, the slit pattern A transmits only a part of the irradiated light without transmitting 100%, thereby preventing light from being irradiated onto the resin film for forming R color filters in a region overlapping with the black matrix 223.

In general, a mask manufactured to transmit 100% of light to a specific area is exposed to a non-transmissive area adjacent to the transmission area even though light is irradiated only to a limited transmission area, so that a pattern remains on a part of the non-transmission area after development. Problems will arise.

Therefore, in the present invention, by placing a slit pattern in the boundary region of the light transmitting portion, only part of the light is transmitted, thereby preventing a part of the non-transmissive region adjacent to the light transmitting region from being exposed and allowing the pattern to be formed only in a desired region.

Meanwhile, instead of the slit pattern, a halftone mask manufactured to transmit only part of light may be used.

As described above, by irradiating ultraviolet rays using the slit mask 250 provided with the slit pattern A, and applying the same to a developer, as shown in FIG. 3D, the black matrix 223 is interposed between the black matrices 223. An R color filter 225a having no overlap region with 223 is formed.

Subsequently, the above process is repeated using the green (G) and blue (B) color filter layer forming resin films instead of the R color filter layer forming resin film, as shown in FIG. 3E, as shown in FIG. 3E. 225b and 225c are formed to manufacture R, G and B color filters 225, respectively. In this case, the slit mask or the halftone mask is applied to form the G and B color filters 225b and 225c such that there is no area overlapping with the black matrix 223.

In addition, a common electrode (not shown) may be further formed on the color filter 225 according to the driving mode of the liquid crystal.

Subsequently, after bonding to the substrate on which the thin film transistor array is formed, the liquid crystal layer is formed, whereby a liquid crystal display device can be manufactured.

As described above, the present invention provides a color filter substrate capable of omitting an overcoat layer on a color filter, a method of manufacturing the same, and a liquid crystal display device including the same and a method of manufacturing the same. In other words, the present invention provides a liquid crystal display device capable of omitting an overcoat layer by forming a color filter that does not overlap with a black matrix through a slit mask or a halftone mask. If the filter is a liquid crystal display device having a configuration with no overlapping region, it will include all.

As described above, according to the present invention, by forming a color filter that does not overlap the black matrix through a slit mask or a halftone mask, it is possible to simplify the process of the color filter substrate by eliminating the overcoat process.

As described above, the present invention can improve the productivity of the liquid crystal display device by simplifying the color filter process.

Claims (8)

Transparent substrate; A black matrix formed on the transparent substrate; And A color filter substrate comprising a color filter formed on the transparent substrate except the black matrix. The method of claim 1, The black matrix is a color filter substrate, characterized in that the black resin. First and second substrates; A black matrix formed on the second substrate; A color filter formed on the first substrate except for the black matrix; And And a liquid crystal layer formed between the first substrate and the second substrate. The method of claim 3, And the first substrate is a thin film transistor array substrate. Preparing a transparent substrate; Forming a black matrix on the transparent substrate; And And forming a color filter on the transparent substrate except for the black matrix. The method of claim 5, Forming the color filter, Applying an ink for forming a color filter on a transparent substrate including a black matrix; Irradiating light through a slit mask having a light transmitting portion in an area excluding the black matrix and provided with slit patterns on both sides of the light transmitting portion; And Color filter manufacturing method comprising the step of forming a color filter on a transparent substrate except the black matrix. The method of claim 5, Forming the color filter, Applying an ink for forming a color filter on a transparent substrate including a black matrix; Irradiating light through a halftone mask having a light transmissive portion in an area excluding the black matrix and provided with transflective portions on both sides of the light transmissive portion; And Color filter manufacturing method comprising the step of forming a color filter on a transparent substrate except the black matrix. Preparing a first substrate on which a thin film transistor array is formed; Preparing a second substrate on which a color filter is formed in an area excluding the black matrix and the black matrix; And And forming a liquid crystal layer between the first and second substrates.

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