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KR20000065444A - Must cleaner - Google Patents

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Publication number
KR20000065444A
KR20000065444A KR1019990011742A KR19990011742A KR20000065444A KR 20000065444 A KR20000065444 A KR 20000065444A KR 1019990011742 A KR1019990011742 A KR 1019990011742A KR 19990011742 A KR19990011742 A KR 19990011742A KR 20000065444 A KR20000065444 A KR 20000065444A
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South Korea
Prior art keywords
mold
removal
stain
hydrochloric acid
sodium hypochlorite
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KR1019990011742A
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Korean (ko)
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강제훈
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강제훈
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Priority to KR1019990011742A priority Critical patent/KR20000065444A/en
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Abandoned legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/046Salts
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66Non-ionic compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/042Acids

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)

Abstract

본 발명은 곰팡이 제거 및 얼룩제거제에 관한 것으로, 염산과 물을 약 1:3의 비로 혼합한 염산수용액에 차아염소산 나트륨(sodium hypochlorite) 및 비이온계면활성제를 교반혼합하여 제조하는 것을 그 특징적 구성으로 하여, 곰팡이 제거효과 뿐만 아니라 곰팡이로 인한 얼룩까지 제거할 수 있는 곰팡이 제거 및 얼룩제거제를 간단한 제조공정으로 제조할 수 있는 곰팡이 제거 및 얼룩제거제 제조방법에 관한 것이다.The present invention relates to a mold removal and stain removal agent, characterized in that the sodium hypochlorite and a nonionic surfactant in a hydrochloric acid solution in which hydrochloric acid and water are mixed in a ratio of about 1: 3 by stirring and mixing The present invention relates to a mold removal and stain removal method capable of manufacturing a mold removal and stain removal agent capable of removing not only a mold removal effect but also stains due to mold by a simple manufacturing process.

Description

곰팡이 제거 및 얼룩제거제{MUST CLEANER}Mold remover and stain remover {MUST CLEANER}

본 발명은 곰팡이 제거 및 얼룩제거제의 제조방법에 관한 것으로, 특히 곰팡이가 서식하는 곳에 뿌려주면 곰팡이가 제거될 수 있을 뿐만 아니라 곰팡이로 인한 얼룩까지 제거할 수 있는 곰팡이 제거 및 얼룩제거제의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a mold removal and stain remover, and in particular, when sprayed on a mold inhabitation of the mold can be removed, as well as a method for manufacturing a mold removal and stain remover that can remove stains caused by the mold. will be.

일반적으로 곰팡이는 고온다습한 지역에서 왕성하게 성장하는데, 우리나라에서는 고온다습한 여름철의 그늘진 벽면이나, 욕실, 습기진 실내벽면, 카펫, 서화 등의 뒷면 등에 잘 서식한다.In general, mold grows vigorously in hot and humid areas. In Korea, it grows well in shaded walls in hot and humid summers, bathrooms, damp interior walls, carpets, and backs of calligraphy.

이와 같은 곰팡이는 미관상 좋지 않을 뿐만 아니라, 기관지에 악영향을 끼쳐 부비강염이나 폐렴을 일으키기도 하며, 피부병의 원인이 되기도 한다.This fungus is not only aesthetically pleasing, but it also adversely affects the bronchus, causing sinusitis and pneumonia, and can also cause skin diseases.

이러한 곰팡이로 인한 질병의 발생은 곰팡이 포자가 주원인이 되므로, 곰팡이 균을 제거하는 여러 가지 약제가 개발되어 사용되고 있다.The occurrence of the disease caused by the fungus is the main cause of the mold spores, various drugs to remove the fungus bacteria have been developed and used.

이 약제의 대표적인 것으로 한국특허출원 제93-22090호에 기재된 글리코펩타이드 안티바이오틱스를 들 수 있는데, 이와 같은 물질을 에어스프레이형이나 칠용으로 제조하여 사용하고 있다.Representative examples of this drug include glycopeptide antibiotics described in Korean Patent Application No. 93-22090. Such a substance is manufactured and used for air spray or lacquer use.

그러나, 이와 같은 여러 가지의 항진균제는 곰팡이 제거효과는 가지고 있으나 제조하기 힘들고, 곰팡이로 인한 얼룩을 제거하지 못해 벽면에 보통의 비누액으로 제거하기 힘든 단점이 있었다.However, various antifungal agents such as these have a mold removal effect, but are difficult to manufacture, and have a disadvantage of being difficult to remove with a normal soap solution on the wall because the stain due to the mold cannot be removed.

본 발명은 상기한 문제점을 해소하기 위한 것으로, 곰팡이 제거효과 뿐만 아니라 곰팡이로 인한 얼룩까지 제거할 수 있는 곰팡이 제거 및 얼룩제거제를 간단한 제조공정으로 제조할 수 있는 곰팡이 제거 및 얼룩제거제 제조방법을 제공함에 그 목적이 있다.The present invention is to solve the above problems, to provide a mold removal and stain removal method that can be produced by a simple manufacturing process of the mold removal and stain removal agent that can remove not only the mold removal effect, but also stains caused by the mold. Its purpose is.

상기한 목적을 달성하기 위한 본 발명은,The present invention for achieving the above object,

곰팡이 제거 및 얼룩제거제를 제조하는 방법에 있어서,In the method for producing a mold removal and stain removal agent,

염산과 물을 약 1:3의 비로 혼합한 염산수용액에 차아염소산 나트륨(sodium hypochlorite) 및 비이온계면활성제를 교반혼합하여 제조하는 것을 특징으로 하는 것이다.It is characterized in that it is prepared by stirring and mixing sodium hypochlorite and nonionic surfactant in an aqueous hydrochloric acid solution of hydrochloric acid and water in a ratio of about 1: 3.

상기 제조방법에서, 상기 염산수용액과 차아염소산 나트륨은 약 1:3의 비로 혼합하고, 상기 비이온계면활성제는 적량 혼합하는 것이 바람직하다.In the preparation method, the aqueous hydrochloric acid solution and sodium hypochlorite are mixed in a ratio of about 1: 3, and the nonionic surfactant is preferably mixed in an appropriate amount.

또한 상기 차아염소산 나트륨은 유효염소량이 약 4%인 것이 바람직하다..In addition, the sodium hypochlorite preferably has an effective chlorine content of about 4%.

상기 비이온계면활성제는 곰팡이 얼룩을 제거하는데 핵심적인 역할을 하는 것으로, 통상적으로 사용되는 폴리에틸렌 글리콜형이나 다가 알코올 에스테르형 등에 속하는 물질을 사용할 수 있다.The nonionic surfactant plays a key role in removing mold stain, and may be a material that belongs to a polyethylene glycol type or a polyhydric alcohol ester type that is commonly used.

이와 같은 제조방법에 따라 제조된 곰팡이 제거 및 얼룩제거제는 곰팡이를 제거할 수 있고, 곰팡이로 인한 얼룩을 깨끗이 지울 수 있다.Mold removal and stain removal agent prepared in accordance with such a manufacturing method can remove the mold, it is possible to clean the stain due to the mold.

도 1은 본 발명에 따른 곰팡이 제거 및 얼룩제거제의 사용전 벽면 상태 사진,1 is a picture of the wall state before use of the mold removal and stain remover according to the present invention,

도 2는 본 발명에 따른 곰팡이 제거 및 얼룩제거제의 사용 상태 사진,Figure 2 is a photograph of the use state of the mold removal and stain remover according to the present invention,

도 3은 본 발명에 따른 곰팡이 제거 및 얼룩제거제 사용후 벽면 상태 사진이다.Figure 3 is a picture of the state of the wall after using the mold removal and stain remover according to the present invention.

이하, 본 발명의 구성 및 작용을 실시예와 실험예 및 도면을 통하여 상세하게 설명한다.Hereinafter, the configuration and operation of the present invention will be described in detail through examples, experimental examples, and drawings.

상술한 바와 같이, 본 발명에 따른 곰팡이 제거 및 얼룩제거제를 제조하는 방법은, 염산과 증류수를 약 1:3의 비로 혼합한 염산수용액에 차아염소산 나트륨(sodium hypochlorite)을 상기 염산수용액에 대하여 1:3의 비로 혼합하고 비이온계면활성제를 적량 교반혼합하여 제조하는 것을 구성으로 하는 것으로, 이와 같이 제조된 곰팡이 제거 및 얼룩제거제는 뛰어난 효과를 갖는 것으로 실험을 통하여 입증되었는데, 염산과 차아염소산 나트륨 및 정제염소가 곰팡이의 제거효과를 갖는 것으로 보여지고, 비이온계면활성제가 얼룩 제거효과를 갖는 것으로 생각된다.As described above, the method for preparing the fungicide and stain remover according to the present invention includes sodium hypochlorite in a hydrochloric acid solution in which hydrochloric acid and distilled water are mixed at a ratio of about 1: 3. It was composed by mixing in a ratio of 3 and stirring and mixing a suitable amount of the nonionic surfactant, and the mold removal and stain remover prepared in this way has been proved through experiments, hydrochloric acid and sodium hypochlorite and tablets It is believed that chlorine has a fungicide removal effect, and nonionic surfactants have a stain removal effect.

(실시예)(Example)

비이커에 순수한 염산용액 10ml를 담고 증류수 30ml를 조금씩 가하여 혼합하였다. 이후 차아염소산나트륨 용액(유효 염소 4%) 120ml와 비이온계면활성제로서 폴리에틸렌글리콜에테르 25ml를 혼합하고, 분산제로서 에틸렌옥시드를 적량 투입하여 혼합하였다.10 ml of pure hydrochloric acid solution was added to the beaker, and 30 ml of distilled water was added little by little and mixed. Thereafter, 120 ml of sodium hypochlorite solution (4% effective chlorine) and 25 ml of polyethylene glycol ether as nonionic surfactants were mixed, and an appropriate amount of ethylene oxide was added and mixed as a dispersant.

(실험예)Experimental Example

상기 실시예에서 제조된 혼합액을 이용하여 다음과 같이 하여 실험하였다. 먼저 원액 그대로 곰팡이 제거에 사용하였고, 물로 1:10으로 희석한 희석액으로 실험하였는데, 실험은 아파트 건축현장의 베란다에 곰팡이가 증식된 곳에 플라스틱제 스프레이기에 담아 뿌려주었다.Experiment using the mixed solution prepared in the above Example. First, the solution was used to remove the mold as it was, and the experiment was conducted with a dilution solution diluted 1:10 with water.

실험 결과 원액으로 사용한 것과 1:10으로 희석한 희석액은 모두 효과가 좋음을 알 수 있었다.As a result, it was found that both the diluent diluted to 1:10 and the diluent diluted to 1:10 were effective.

특히 원액 그대로 실험한 경우가 곰팡이 제거효과와 얼룩제거효과가 뛰어남을 알 수 있었다.In particular, the experiment as it was found that the mold removal effect and stain removal effect was excellent.

원액으로 실험한 경과를 사진으로 나타내었는데, 도 1은 실험전의 상태로서 벽면에 곰팡이가 많이 증식된 상태를 나타내고 있고, 도 2는 희석액을 뿌려주는 상태를 찍은 사진이고, 도 3은 희석액을 뿌린 뒤 10분 후의 상태를 찍은 사진으로 깨끗하게 곰팡이가 제거되었을 뿐만 아니라 얼룩까지 제거되었음을 보여주고 있다.Figure 1 shows the progress of experiments with the stock solution, Figure 1 is a state before the experiment showing a state in which the mold was proliferated a lot, Figure 2 is a photograph taken a state of spraying the diluent, Figure 3 after spraying the diluent The picture taken 10 minutes later shows that not only the mold was clean, but also the stain was removed.

상술한 바와 같이, 본 발명에 따른 곰팡이 제거 및 얼룩제거제 제조방법은 간단한 공정으로 곰팡이 제거효과와 곰팡이로 인한 얼룩의 제거효과를 갖는 곰팡이 제거 및 얼룩제거제를 제조할 수 있게 한다.As described above, the mold removing and stain removing agent manufacturing method according to the present invention makes it possible to prepare a mold removing and stain removing agent having a mold removing effect and a stain removing effect due to the mold by a simple process.

Claims (3)

곰팡이 제거 및 얼룩제거제를 제조하는 방법에 있어서,In the method for producing a mold removal and stain removal agent, 염산과 물을 약 1:3의 비로 혼합한 염산수용액에 차아염소산 나트륨(sodium hypochlorite) 및 비이온계면활성제를 교반혼합하여 제조하는 것을 특징으로 하는 곰팡이 제거 및 얼룩제거제 제조방법.A method for producing a mold removal and stain removing agent, characterized in that the mixture is prepared by stirring and mixing sodium hypochlorite and a nonionic surfactant in an aqueous solution of hydrochloric acid and water in a ratio of about 1: 3. 제 1 항에 있어서, 상기 염산수용액과 차아염소산 나트륨은 약 1:3의 비로 혼합하고, 상기 비이온계면활성제는 적량 혼합하는 것을 특징으로 하는 곰팡이 제거 및 얼룩제거제 제조방법.The method of claim 1, wherein the aqueous hydrochloric acid solution and sodium hypochlorite are mixed in a ratio of about 1: 3, and the nonionic surfactant is mixed in an appropriate amount. 제 2 항에 있어서, 상기 차아염소산 나트륨은 유효염소량이 약 4%인 것을 특징으로 하는 곰팡이 제거 및 얼룩제거제 제조방법.The method of claim 2, wherein the sodium hypochlorite has an effective chlorine content of about 4%.
KR1019990011742A 1999-04-03 1999-04-03 Must cleaner Abandoned KR20000065444A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102352268B1 (en) 2021-10-06 2022-01-17 주식회사 에코앤드림 Cleaner and spray device thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03258392A (en) * 1990-03-07 1991-11-18 Omuko:Kk Method for producing sterilizing water containing hypochlorous acid by electrolysis
KR920004279A (en) * 1990-08-10 1992-03-27 오까사끼 도메 Sterilizing water production method and device
KR960034384A (en) * 1995-03-09 1996-10-22 니시까와 레이지 Fungicide composition
KR970704342A (en) * 1995-06-12 1997-09-06 섬너 에이. 바렌버그 SUSTAINED RELEASE, TRANSPARENT BIOCIDAL COMPOSITIONS
KR970704353A (en) * 1994-07-29 1997-09-06 STRONGLY ACIDIC STERILE WATER CONTAINING LOW-CONDENTRATION HYPOCHLOROUS ACID, METHOD OF FORMING STRONGLY ACIDIC STERILE WATER CONTAINING LOW-CONCENTRATION HYPOCHLOROUS AC
WO1998058544A1 (en) * 1997-06-19 1998-12-30 Basf Aktiengesellschaft Fungicide mixtures
US5939357A (en) * 1992-05-12 1999-08-17 Church & Dwight Co., Inc. Fungicide compositions

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03258392A (en) * 1990-03-07 1991-11-18 Omuko:Kk Method for producing sterilizing water containing hypochlorous acid by electrolysis
KR920004279A (en) * 1990-08-10 1992-03-27 오까사끼 도메 Sterilizing water production method and device
US5939357A (en) * 1992-05-12 1999-08-17 Church & Dwight Co., Inc. Fungicide compositions
KR970704353A (en) * 1994-07-29 1997-09-06 STRONGLY ACIDIC STERILE WATER CONTAINING LOW-CONDENTRATION HYPOCHLOROUS ACID, METHOD OF FORMING STRONGLY ACIDIC STERILE WATER CONTAINING LOW-CONCENTRATION HYPOCHLOROUS AC
KR960034384A (en) * 1995-03-09 1996-10-22 니시까와 레이지 Fungicide composition
KR970704342A (en) * 1995-06-12 1997-09-06 섬너 에이. 바렌버그 SUSTAINED RELEASE, TRANSPARENT BIOCIDAL COMPOSITIONS
WO1998058544A1 (en) * 1997-06-19 1998-12-30 Basf Aktiengesellschaft Fungicide mixtures

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102352268B1 (en) 2021-10-06 2022-01-17 주식회사 에코앤드림 Cleaner and spray device thereof

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