KR20000019363A - 극저조도 전해동박의 제조방법 및 그 장치 - Google Patents
극저조도 전해동박의 제조방법 및 그 장치 Download PDFInfo
- Publication number
- KR20000019363A KR20000019363A KR1019980037409A KR19980037409A KR20000019363A KR 20000019363 A KR20000019363 A KR 20000019363A KR 1019980037409 A KR1019980037409 A KR 1019980037409A KR 19980037409 A KR19980037409 A KR 19980037409A KR 20000019363 A KR20000019363 A KR 20000019363A
- Authority
- KR
- South Korea
- Prior art keywords
- solution
- coin solution
- gelatin
- coin
- copper foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/06—Filtering particles other than ions
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
인장 강도(Kg/mm2) | 연 신 율(%) | 조 도(Rz) | |||
상 온 | 고온(180℃) | 상 온 | 고온(180℃) | ||
본 발명 | 45 | 25 | 12 | 10 | 3.0μm |
기 존 | 36 | 18 | 9 | 2 | 7.0μm |
미국특허(5,215,645)젤라틴 (9ppm)티오요소 (10ppm)젤라틴 (15ppm)티오요소 (20ppm)젤라틴 (0.35ppm)티오요소 (5ppm)젤라틴 (0.6ppm)티오요소(3.5ppm) | 25.540.819.7 ∼21.026.9 | 16.1 | 11.258.754 ∼ 636.55 | 12.72 | 7.64.311 ∼ 1211.04 |
Claims (4)
- 양극(anode)과 회전하는 드럼통의 음극을 구비한 전해장치에 동전해액을 공급하면서 음극표면에 동을 전착시켜 동박을 얻는 것에 있어서, 저농도 젤라틴이 혼합된 동전해액을 공급하여 음극의 표면에 제 1 단계층이 전착되게 하고 연속하여 고농도 젤라틴이 혼합된 동전해액을 공급하여 상기 제 1 단계층 표면에 제 2 단계층이 전착되게 함을 특징으로 하는 극저조도 전해동박의 제조방법.
- 제 1 항에 있어서,제 1 단계층이 전착되어 핵 생성된 후 성장되기 전 또는 성장 초기에 제 2 단계층이 전착되게 함을 특징으로 하는 극저조도 전해동박의 제조방법.
- 제 1 항 또는 제 2 항에 있어서,제 1 단계층의 전착을 위한 동전해액중에 포함된 젤라틴은 5 mg/ℓ이하의 농도이고, 제 2 단계층의 전착을 위한 동전해액중에 포함된 젤라틴은 1 ∼ 20 mg/ℓ농도임을 특징으로 하는 극저조도 전해동박의 제조방법.
- 동전해액이 담겨진 저장탱크와, 상기 저장탱크내에 담겨진 동전해액의 공급라인상에 차례로 설치되어 동전해액의 공급시 동전해액내에 포함된 유기물 및 불순물을 제거하는 활성탄 필터 및 마이크로 필터와, 유기물 및 불순물이 제거된 동전해액의 이송경로상에 설치되어 저농도 젤라틴을 공급하는 저농도 젤라틴 공급탱크와, 상기 동전해액 공급라인의 끝단에 설치된 전해조와, 상기 전해조측으로 동전해액을 분사하는 노즐과, 상기 전해조의 내면에 설치된 양극과, 상기 양극의 상측에 회전가능하게 설치되어 동전해액이 공급됨에 따라 동이 전착되는 음극으로 구성된 동박 제조장치에 있어서, 마이크로 필터를 통과한 동전해액이 양분되어 전해조측으로 공급되도록 이들사이에 분할 형성되어 연결된 급액관과, 상기 급액관의 끝단에 연결되며 내부가 격벽으로 구획된 노즐을 구비하는 분사수단과, 상기 음극의 회전시작측으로 동전해액을 공급하는 급액관에 연결된 저농도 젤라틴 공급탱크와, 그 반대측으로 동전해액을 공급하는 급액관에 연결된 고농도 젤라틴 공급탱크로 구성됨을 특징으로 하는 극저조도 전해동박의 제조장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980037409A KR100296459B1 (ko) | 1998-09-10 | 1998-09-10 | 극저조도전해동박의제조방법및그장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980037409A KR100296459B1 (ko) | 1998-09-10 | 1998-09-10 | 극저조도전해동박의제조방법및그장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000019363A true KR20000019363A (ko) | 2000-04-06 |
KR100296459B1 KR100296459B1 (ko) | 2001-10-26 |
Family
ID=19550238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980037409A Expired - Fee Related KR100296459B1 (ko) | 1998-09-10 | 1998-09-10 | 극저조도전해동박의제조방법및그장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100296459B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114703515A (zh) * | 2022-04-14 | 2022-07-05 | 中国科学院金属研究所 | 一种铜箔及其制备方法、以及一种电路板和集电体 |
CN115791572A (zh) * | 2023-02-13 | 2023-03-14 | 甘肃德福新材料有限公司 | 一种电解铜箔渗透点及针孔的检测装置 |
-
1998
- 1998-09-10 KR KR1019980037409A patent/KR100296459B1/ko not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114703515A (zh) * | 2022-04-14 | 2022-07-05 | 中国科学院金属研究所 | 一种铜箔及其制备方法、以及一种电路板和集电体 |
CN114703515B (zh) * | 2022-04-14 | 2024-05-03 | 中国科学院金属研究所 | 一种铜箔及其制备方法、以及一种电路板和集电体 |
CN115791572A (zh) * | 2023-02-13 | 2023-03-14 | 甘肃德福新材料有限公司 | 一种电解铜箔渗透点及针孔的检测装置 |
Also Published As
Publication number | Publication date |
---|---|
KR100296459B1 (ko) | 2001-10-26 |
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