KR19990028390A - 트리아졸 항진균제 - Google Patents
트리아졸 항진균제 Download PDFInfo
- Publication number
- KR19990028390A KR19990028390A KR1019970709706A KR19970709706A KR19990028390A KR 19990028390 A KR19990028390 A KR 19990028390A KR 1019970709706 A KR1019970709706 A KR 1019970709706A KR 19970709706 A KR19970709706 A KR 19970709706A KR 19990028390 A KR19990028390 A KR 19990028390A
- Authority
- KR
- South Korea
- Prior art keywords
- triazol
- formula
- compound
- alkyl
- het
- Prior art date
Links
- 229940121375 antifungal agent Drugs 0.000 title abstract description 9
- 239000003429 antifungal agent Substances 0.000 title abstract description 7
- 150000003852 triazoles Chemical class 0.000 title description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 248
- -1 2-hydroxyethoxymethyl Chemical group 0.000 claims abstract description 191
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 52
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 25
- 150000003839 salts Chemical class 0.000 claims abstract description 24
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 20
- 125000001424 substituent group Chemical group 0.000 claims abstract description 20
- 125000004076 pyridyl group Chemical group 0.000 claims abstract description 19
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 18
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 18
- 125000000714 pyrimidinyl group Chemical group 0.000 claims abstract description 16
- 125000005843 halogen group Chemical group 0.000 claims abstract description 15
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims abstract description 5
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims abstract description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 4
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical group [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims abstract description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000001301 oxygen Substances 0.000 claims abstract description 4
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims abstract description 4
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 3
- 125000004215 2,4-difluorophenyl group Chemical group [H]C1=C([H])C(*)=C(F)C([H])=C1F 0.000 claims description 161
- 239000000203 mixture Substances 0.000 claims description 128
- 238000002360 preparation method Methods 0.000 claims description 111
- 238000000034 method Methods 0.000 claims description 77
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims description 68
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 68
- 238000004519 manufacturing process Methods 0.000 claims description 60
- 238000006243 chemical reaction Methods 0.000 claims description 40
- 125000003626 1,2,4-triazol-1-yl group Chemical group [*]N1N=C([H])N=C1[H] 0.000 claims description 33
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 27
- 150000001721 carbon Chemical group 0.000 claims description 10
- 229910052740 iodine Inorganic materials 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 230000009467 reduction Effects 0.000 claims description 9
- 125000001359 1,2,3-triazol-4-yl group Chemical group [H]N1N=NC([*])=C1[H] 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 229920000858 Cyclodextrin Polymers 0.000 claims description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 8
- 239000003054 catalyst Substances 0.000 claims description 8
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 claims description 7
- 125000004198 2-fluorophenyl group Chemical group [H]C1=C([H])C(F)=C(*)C([H])=C1[H] 0.000 claims description 7
- 238000009903 catalytic hydrogenation reaction Methods 0.000 claims description 7
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- MKUWVMRNQOOSAT-UHFFFAOYSA-N but-3-en-2-ol Chemical class CC(O)C=C MKUWVMRNQOOSAT-UHFFFAOYSA-N 0.000 claims description 6
- 238000005984 hydrogenation reaction Methods 0.000 claims description 6
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 206010017533 Fungal infection Diseases 0.000 claims description 5
- 208000031888 Mycoses Diseases 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 5
- 238000005903 acid hydrolysis reaction Methods 0.000 claims description 5
- 125000002140 imidazol-4-yl group Chemical group [H]N1C([H])=NC([*])=C1[H] 0.000 claims description 5
- 125000004289 pyrazol-3-yl group Chemical group [H]N1N=C(*)C([H])=C1[H] 0.000 claims description 5
- 125000004299 tetrazol-5-yl group Chemical group [H]N1N=NC(*)=N1 0.000 claims description 5
- 125000004496 thiazol-5-yl group Chemical group S1C=NC=C1* 0.000 claims description 5
- 125000003396 thiol group Chemical class [H]S* 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- 125000001401 1,2,4-triazol-4-yl group Chemical group N=1N=C([H])N([*])C=1[H] 0.000 claims description 4
- WHGYBXFWUBPSRW-FOUAGVGXSA-N beta-cyclodextrin Chemical class OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO WHGYBXFWUBPSRW-FOUAGVGXSA-N 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 125000002962 imidazol-1-yl group Chemical group [*]N1C([H])=NC([H])=C1[H] 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 claims description 4
- 125000004353 pyrazol-1-yl group Chemical group [H]C1=NN(*)C([H])=C1[H] 0.000 claims description 4
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 claims description 4
- GPZUOVSSXKNFCQ-UHFFFAOYSA-N 1-(ethoxymethyl)-3-methylsulfanyl-1,2,4-triazole Chemical compound CCOCN1C=NC(SC)=N1 GPZUOVSSXKNFCQ-UHFFFAOYSA-N 0.000 claims description 3
- ICGLPKIVTVWCFT-UHFFFAOYSA-N 4-methylbenzenesulfonohydrazide Chemical compound CC1=CC=C(S(=O)(=O)NN)C=C1 ICGLPKIVTVWCFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000003814 drug Substances 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- XZBIXDPGRMLSTC-UHFFFAOYSA-N formohydrazide Chemical compound NNC=O XZBIXDPGRMLSTC-UHFFFAOYSA-N 0.000 claims description 3
- 125000002883 imidazolyl group Chemical group 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 claims description 3
- 125000001715 oxadiazolyl group Chemical group 0.000 claims description 3
- 239000008194 pharmaceutical composition Substances 0.000 claims description 3
- 125000003226 pyrazolyl group Chemical group 0.000 claims description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 3
- 125000003831 tetrazolyl group Chemical group 0.000 claims description 3
- 125000001113 thiadiazolyl group Chemical group 0.000 claims description 3
- 125000001425 triazolyl group Chemical group 0.000 claims description 3
- 125000004768 (C1-C4) alkylsulfinyl group Chemical group 0.000 claims description 2
- 125000001305 1,2,4-triazol-3-yl group Chemical group [H]N1N=C([*])N=C1[H] 0.000 claims description 2
- BCLCTNFGMGONNN-UHFFFAOYSA-N 1-(ethoxymethyl)pyrazole Chemical compound CCOCN1C=CC=N1 BCLCTNFGMGONNN-UHFFFAOYSA-N 0.000 claims description 2
- OKDRQEKCXPQPPJ-UHFFFAOYSA-N 5-methylsulfonyl-1h-1,2,4-triazole Chemical compound CS(=O)(=O)C1=NC=NN1 OKDRQEKCXPQPPJ-UHFFFAOYSA-N 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- 239000003085 diluting agent Substances 0.000 claims description 2
- 230000026030 halogenation Effects 0.000 claims description 2
- 238000005658 halogenation reaction Methods 0.000 claims description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 239000012948 isocyanate Substances 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 238000007363 ring formation reaction Methods 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 125000000335 thiazolyl group Chemical group 0.000 claims description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 2
- 239000000651 prodrug Substances 0.000 claims 2
- 229940002612 prodrug Drugs 0.000 claims 2
- GPGLOLDFIZEVKP-JOCHJYFZSA-N (2r)-2-(2,4-difluorophenyl)-3-[4-(2-methylpyrazol-3-yl)phenyl]-1-(1,2,4-triazol-1-yl)but-3-en-2-ol Chemical compound CN1N=CC=C1C1=CC=C(C(=C)[C@](O)(CN2N=CN=C2)C=2C(=CC(F)=CC=2)F)C=C1 GPGLOLDFIZEVKP-JOCHJYFZSA-N 0.000 claims 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000003037 imidazol-2-yl group Chemical group [H]N1C([*])=NC([H])=C1[H] 0.000 claims 1
- 150000002513 isocyanates Chemical class 0.000 claims 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 125000004497 pyrazol-5-yl group Chemical group N1N=CC=C1* 0.000 claims 1
- 150000003217 pyrazoles Chemical class 0.000 claims 1
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 125000000168 pyrrolyl group Chemical group 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 abstract 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 285
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 259
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 186
- 239000000243 solution Substances 0.000 description 150
- 239000000047 product Substances 0.000 description 133
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 118
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 103
- 239000007787 solid Substances 0.000 description 92
- 235000019439 ethyl acetate Nutrition 0.000 description 87
- 229940093499 ethyl acetate Drugs 0.000 description 85
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 80
- 238000005160 1H NMR spectroscopy Methods 0.000 description 68
- 238000004458 analytical method Methods 0.000 description 68
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 52
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 52
- 239000000377 silicon dioxide Substances 0.000 description 47
- 238000002844 melting Methods 0.000 description 39
- 230000008018 melting Effects 0.000 description 39
- 238000010992 reflux Methods 0.000 description 38
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 239000012043 crude product Substances 0.000 description 27
- 239000011734 sodium Substances 0.000 description 27
- 239000000543 intermediate Substances 0.000 description 26
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 26
- 230000015572 biosynthetic process Effects 0.000 description 25
- 238000003786 synthesis reaction Methods 0.000 description 25
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 24
- 239000000284 extract Substances 0.000 description 24
- 239000006260 foam Substances 0.000 description 22
- 239000003921 oil Substances 0.000 description 21
- 235000019198 oils Nutrition 0.000 description 21
- 239000002904 solvent Substances 0.000 description 21
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 20
- 239000012267 brine Substances 0.000 description 20
- 239000012230 colorless oil Substances 0.000 description 20
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 20
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 20
- 239000000725 suspension Substances 0.000 description 20
- 125000006306 4-iodophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1I 0.000 description 19
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 19
- 239000012074 organic phase Substances 0.000 description 19
- 239000008346 aqueous phase Substances 0.000 description 17
- 239000012044 organic layer Substances 0.000 description 17
- 239000000706 filtrate Substances 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 15
- 239000007858 starting material Substances 0.000 description 15
- 238000005481 NMR spectroscopy Methods 0.000 description 14
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 13
- 238000003818 flash chromatography Methods 0.000 description 13
- 238000004440 column chromatography Methods 0.000 description 11
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 11
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 10
- 229910000027 potassium carbonate Inorganic materials 0.000 description 10
- 238000004611 spectroscopical analysis Methods 0.000 description 10
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000010828 elution Methods 0.000 description 9
- 208000015181 infectious disease Diseases 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 239000000741 silica gel Substances 0.000 description 9
- 229910002027 silica gel Inorganic materials 0.000 description 9
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 8
- 241001465754 Metazoa Species 0.000 description 7
- 229960000583 acetic acid Drugs 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 238000009835 boiling Methods 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 241000222122 Candida albicans Species 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 241000699670 Mus sp. Species 0.000 description 6
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 6
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 229940095731 candida albicans Drugs 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000006239 protecting group Chemical group 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 125000001607 1,2,3-triazol-1-yl group Chemical group [*]N1N=NC([H])=C1[H] 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 4
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- 238000001990 intravenous administration Methods 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000008101 lactose Substances 0.000 description 1
- 231100000518 lethal Toxicity 0.000 description 1
- 230000001665 lethal effect Effects 0.000 description 1
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 1
- 229940057995 liquid paraffin Drugs 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 1
- 210000004185 liver Anatomy 0.000 description 1
- 230000007056 liver toxicity Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- NXPHGHWWQRMDIA-UHFFFAOYSA-M magnesium;carbanide;bromide Chemical compound [CH3-].[Mg+2].[Br-] NXPHGHWWQRMDIA-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- QJXSSECYGUFRQL-UHFFFAOYSA-N methyl 2-(chloromethoxy)acetate Chemical compound COC(=O)COCCl QJXSSECYGUFRQL-UHFFFAOYSA-N 0.000 description 1
- STYLYYYBKCUCBJ-UHFFFAOYSA-N methyl 2-(triazol-1-ylmethoxy)acetate Chemical compound COC(=O)COCN1C=CN=N1 STYLYYYBKCUCBJ-UHFFFAOYSA-N 0.000 description 1
- YVASHOKVPSDGLC-UHFFFAOYSA-N methyl 2-methoxy-2-(triazol-1-yl)acetate Chemical compound COC(=O)C(OC)N1C=CN=N1 YVASHOKVPSDGLC-UHFFFAOYSA-N 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- HAMGRBXTJNITHG-UHFFFAOYSA-N methyl isocyanate Chemical compound CN=C=O HAMGRBXTJNITHG-UHFFFAOYSA-N 0.000 description 1
- LSEFCHWGJNHZNT-UHFFFAOYSA-M methyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 LSEFCHWGJNHZNT-UHFFFAOYSA-M 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- VGIVLIHKENZQHQ-UHFFFAOYSA-N n,n,n',n'-tetramethylmethanediamine Chemical compound CN(C)CN(C)C VGIVLIHKENZQHQ-UHFFFAOYSA-N 0.000 description 1
- IZLKGIWQDPUDDH-UHFFFAOYSA-N n-[4-[3-(2,4-difluorophenyl)-3-hydroxy-4-(1,2,4-triazol-1-yl)but-1-en-2-yl]phenyl]formamide Chemical compound C=1C=C(NC=O)C=CC=1C(=C)C(C=1C(=CC(F)=CC=1)F)(O)CN1C=NC=N1 IZLKGIWQDPUDDH-UHFFFAOYSA-N 0.000 description 1
- 150000002829 nitrogen Chemical group 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000012038 nucleophile Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000000069 prophylactic effect Effects 0.000 description 1
- 238000011321 prophylaxis Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004527 pyrimidin-4-yl group Chemical group N1=CN=C(C=C1)* 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 231100000279 safety data Toxicity 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 239000000829 suppository Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 230000009885 systemic effect Effects 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 150000005621 tetraalkylammonium salts Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- ZWZVWGITAAIFPS-UHFFFAOYSA-N thiophosgene Chemical compound ClC(Cl)=S ZWZVWGITAAIFPS-UHFFFAOYSA-N 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000820 toxicity test Toxicity 0.000 description 1
- FLTJDUOFAQWHDF-UHFFFAOYSA-N trimethyl pentane Natural products CCCCC(C)(C)C FLTJDUOFAQWHDF-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229940045860 white wax Drugs 0.000 description 1
Classifications
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- C07D231/12—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
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- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
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Abstract
Description
실시예 번호 | 할로겐화제 | Hal | 융점(℃) | [α]25 D(c=0.1%,MeOH) | 분자식 | 분석(%)(괄호는 계산값임) | ||
C | H | N | ||||||
69 | N-브로모숙신이미드 | Br | 123-125 | -54 | C20H17BrF2N6O 1/2H2O | 49.64 (49.62) | 3.52 (3.74) | 17.67 (17.36) |
70 | N-요오도숙신이미드 | I | 180-190 | -41 | C20H17F2IN6O | 46.46 (45.99) | 3.05 (3.28) | 16.25 (16.09) |
71 | 셀렉트플루오 (Selectfluor(상표명))* | F | 95-97 | -62 | C20H17F3N6O | 56.90 (56.74) | 3.91 (4.29) | 20.11 (19.85) |
실시예 번호 | RX | R | 융점 (℃) | [α]25 D(c=0.1%,MeOH) | 분자식 | 분석(%)(괄호는 계산값임) | ||
C | H | N | ||||||
92 | ClCH2CN | CH2CN | 발포물 | -41.5 | C22H19F2N7O 1/8Et2O | 60.37 (60.77) | 4.63 (4.59) | 22.02 (22.05) |
93 | BrCH2CONH2 | CH2CONH2 | 143-144 | - | C22H21F2N7O21/4H2O | 57.62 (57.69) | 4.80 (4.73) | 21.72 (21.41) |
Claims (30)
- 하기 화학식 I의 화합물 및 그의 제약학상 허용가능한 염.<화학식 I>식 중,Ar은 할로 및 CF3에서 각각 독립적으로 선택된 1 내지 3개의 치환체에 의해 치환된 페닐기이고,X는 화학식[여기에서, Z는 H 또는 F이고, Het는 산소 또는 황 원자를 임의 포함하고, 탄소 또는 질소 원자에 의해 페닐, 피리딜 또는 피리미디닐기에 부착되고, 할로, C1-C4알킬, (C1-C4알콕시)메틸, 2-(C1-C4알콕시)에톡시메틸, 2-히드록시에톡시메틸, 시아노메틸, -NR1R2또는 -CH2CONR1R2(여기에서, R1및 R2는 각각 독립적으로 H 또는 C1-C4알킬임), 페닐티오 또는 페닐-(C1또는 C2알킬) (이때, 상기 2개의 페닐기는 할로, 트리플루오로메틸 또는 C1-C4알킬에 의해 임의 치환됨), -NHCO(C1-C4알킬), -NHSO2(C1-C4알킬), -NHCONR1R2(여기에서, R1및 R2는 상기 정의한 바와 같음), 메르캅토, 및 -S(O)n(C1-C4알킬) (이때, n은 0, 1 또는 2임)로부터 각각 독립적으로 선택된 1 내지 3개의 치환체에 의해 임의 치환된 5-원 질소 함유 방향족 복소환식기임]의 기이다.
- 제1항에 있어서, Z가 H인 화합물.
- 제1항 또는 제2항에 있어서, "Het"가 모두 제1항에서 정의한 바와 같이 임의 치환된, 피라졸일, 이미다졸일, 트리아졸일, 티아디아졸일, 옥사디아졸일, 피롤일, 티아졸일 또는 테트라졸일기인 화합물.
- 제3항에 있어서, "Het"가 피라졸-1-일, 피라졸-3-일, 피라졸-4-일, 이미다졸-1-일, 이미다졸-2-일, 이미다졸-4-일, 1,2,3-트리아졸-1-일, 1,2,3-트리아졸-2-일, 1,2,3-트리아졸-4-일, 1,2,4-트리아졸-1-일, 1,2,4-트리아졸-3-일, 1,2,4-트리아졸-4-일, 1,3,4-티아디아졸-2-일, 1,3,4-옥사디아졸-2-일, 1,2,4-옥사디아졸-5-일, 피롤-1-일, 티아졸-5-일 또는 테트라졸-5-일기로서, 상기 모든 기들은 제1항에서 정의한 바와 같이 1 내지 3개의 치환체에 의해 임의 치환되는 것인 화합물.
- 제4항에 있어서, "Het"가 클로로, 브로모, 플루오로, 요오도, C1-C3알킬, 아미노, 에톡시메틸, 2-메톡시에톡시메틸, 2-히드록시에톡시메틸, 메틸티오, 메탄술포닐, 메르캅토, 페닐티오, 메탄술폰아미도, 3-메틸우레이도, 시아노메틸, 카르바모일메틸, 아세트아미도 및 벤질 중에서 각각 독립적으로 선택된 1 또는 2개의 치환체에 의해 치환되는 화합물.
- 제5항에 있어서, "Het"가 피라졸-1-일, 3-아미노피라졸-1-일, 1-에톡시메틸피라졸-4-일, 1-에톡시메틸피라졸-5-일, 4-브로모-피라졸-3-일, 3-메탄술폰아미도피라졸-1-일, 3-(3-메틸우레이도)피라졸-1-일, 3-아세트아미도피라졸-1-일, 1-메틸피라졸-5-일, 1-메틸피라졸-3-일, 1-에틸피라졸-5-일, 1-이소프로필피라졸-5-일, 1-에톡시메틸피라졸-5-일, 1-카르바모일메틸-피라졸-3-일, 1-시아노메틸피라졸-3-일, 피라졸-3-일, 피라졸-4-일, 3-메틸피라졸-4-일, 1-메틸이미다졸-2-일, 이미다졸-1-일, 2-메틸이미다졸-1-일, 1-에톡시메틸-2-페닐티오이미다졸-5-일, 1-에톡시메틸이미다졸-2-일, 4-메틸이미다졸-1-일, 1-에톡시메틸이미다졸-5-일, 이미다졸-2-일, 1-메틸이미다졸-5-일, 1-에틸이미다졸-5-일, 1-메틸-2-페닐티오이미다졸-5-일, 이미다졸-4-일, 1,2,3-트리아졸-1-일, 1,2,3-트리아졸-2-일, 1,2,4-트리아졸-1-일, 1-에톡시메틸-1,2,4-트리아졸-5-일, 1-에톡시메틸-3-메틸티오-1,2,4-트리아졸-5-일, 1,2,3-트리아졸-4-일, 1-(2-메톡시에톡시메틸)-1,2,3-트리아졸-5-일, 1-벤질-1,2,3-트리아졸-5-일, 1-(2-히드록시에톡시메틸)-1,2,3-트리아졸-5-일, 5-메틸-1,2,3-트리아졸-4-일, 3-메틸티오-1,2,4-트리아졸-1-일, 1-에톡시메틸-1,2,3-트리아졸-5-일, 4-메틸-1,2,4-트리아졸-3-일, 3-메르캅토-4-메틸-1,2,4-트리아졸-5-일, 1-메틸-1,2,4-트리아졸-5-일, 1-에톡시메틸-1,2,3-트리아졸-4-일, 2-에톡시메틸-1,2,3-트리아졸-4-일, 1,2,4-트리아졸-4-일, 4-클로로-1,2,3-트리아졸-5-일, 4-브로모-1,2,3-트리아졸-5-일, 4-요오도-1,2,3-트리아졸-5-일, 4-플루오로-1,2,3-트리아졸-5-일, 1,2,4-트리아졸-3-일, 5-메탄술포닐-1,2,4-트리아졸-3-일, 3-메탄술포닐-1,2,4-트리아졸-1-일, 1-에톡시메틸-3-메탄술포닐-1,2,4-트리아졸-5-일, 5-아미노-1,3,4-티아디아졸-2-일, 5-메틸-1,3,4-옥사디아졸-2-일, 5-메틸티오-1,3,4-옥사디아졸-2-일, 5-메탄술포닐-1,3,4-옥사디아졸-2-일, 3-아미노-1,2,4-옥사디아졸-5-일, 5-아미노-1,3,4-옥사디아졸-2-일, 1-메틸-테트라졸-5-일, 1-벤질테트라졸-5-일, 테트라졸-5-일, 티아졸-5-일 또는 2,5-디메틸피롤-1-일인 화합물.
- 제1항에 있어서, X는 화학식의 기(식 중, Z는 H 또는 F이고, "Het"는 제1항 및 제3항 내지 6항의 어느 한 항에서 정의한 바와 같음)인 화합물.
- 제7항에 있어서, X는 화학식의 기(식 중, "Het"는 제7항에서 정의한 바와 같음)인 화합물.
- 제1항 내지 제4항, 제7항 및 제8항 중 어느 한 항에 있어서, "Het"는 (a) 비치환 1,2,3-트리아졸-1-일기, (b) 비치환 1,2,4-트리아졸-1-일 또는 -4-일기, (c) 탄소 원자에 의해 인접한 페닐기에 부착되고, 질소 원자 상에 C1-C4알킬, 또는 (C1-C4알콕시)메틸에 의해 임의 치환된 1,2,3- 또는 1,2,4-트리아졸기, (d) 비치환 이미다졸-1-일, (e) 비치환 피라졸-3-일기, 비치환 피라졸-4-일기 또는 1-메틸피라졸-5-일기, 및 (f) 이미다졸-4-일 또는 1-메틸이미다졸-5-일기로부터 선택되는 화합물.
- 제1항 내지 제9항 중 어느 한 항에 있어서, Ar은 할로 및 CF3으로부터 각각 독립적으로 선택된 1 또는 2개의 치환체에 의해 치환된 페닐기인 화합물.
- 제10항에 있어서, Ar은 F, Cl 및 Br으로부터 각각 독립적으로 선택된 1 또는 2개의 치환체에 의해 치환된 페닐기인 화합물.
- 제11항에 있어서, Ar은 2,4-디플루오로페닐, 2-클로로페닐 또는 2-플루오로페닐인 화합물.
- 제1항에 있어서,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[이미다졸-1-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1,2,3-트리아졸-1-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1,2,3-트리아졸-4-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1,2,4-트리아졸-1-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1,2,4-트리아졸-3-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올,(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1,2,4-트리아졸-4-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올, 및(2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1-메틸피라졸-5-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올로부터 선택되는 화학식 I의 화합물.
- 하기 화학식 IIA의 화합물.식 중,Ar은 제1항에서 정의한 바와 같고, X는 제1항에서 정의한 바와 같으나, "Het"는 탄소 원자에 의해 인접한 페닐, 피리딜 또는 피리미딜기에 부착된다.
- 하기 화학식 V의 화합물.식 중,Ar은 제1항에서 정의한 바와 동일하고, R은 H 또는 C1-C4알킬이다.
- 제1항 내지 제13항 중 어느 한 항에서 청구한 화학식 I의 화합물 또는 그의 제약학상 허용가능한 염, 및 제약학상 허용가능한 희석제 또는 담체를 포함하는 제 약 조성물.
- 제16항에 있어서, 화학식 I의 화합물이 시클로덱스트린과 착체화된 것인 조성물.
- 제17항에 있어서, 시클로덱스트린이 베타-시클로덱스트린의 히드록시알킬 또는 술포알킬 유도체인 조성물.
- 약제로서 사용하기 위한 제1항 내지 제13항 중 어느 한 항에 청구된 화학식 I의 화합물 또는 그의 제약학상 허용가능한 염.
- 진균류 감염을 치료하기 위한 약제 제조용의 제1항 내지 제13항 중 어느 한 항에 청구된 화학식 I의 화합물 또는 그의 제약학상 허용가능한 염의 용도.
- 제1항 내지 제13항 중 어느 한 항에서 청구된 화학식 I의 화합물 또는 그의 염 또는 제16항 내지 제18항 중 어느 한 항에서 청구된 조성물의 유효량을 인체에 투여하는 것을 포함하는, 인체의 진균류 감염을 치료하거나 예방하는 방법.
- (i) 임의로 "Het" 상의 임의의 (C1-C4알콕시)메틸, 2-(C1-C4알콕시)에톡시메틸, 2-히드록시에톡시메틸, 페닐티오 또는 벤질 치환체의 제거를 포함하는, 하기 화학식 II(식 중, Ar 및 X는 화학식 I에서 정의한 바와 같음)의 3-부텐-2-올 유도체의 환원,<화학식 II>(ii) N-보호기를 제거하는, 하기 화학식 IIB(식 중, Ar 및 Z는 화학식 I에서 정의한 바와 같고, Het1은 탄소 원자 또는 질소 원자에 의해 페닐 고리에 부착되고, N-보호기에 의해 고리 질소 원자 상에 치환된 5-원 질소-함유 방향족 복소환식기임)의 3-부텐-2-올 유도체의 환원,(iii) 하기 화학식 IA(식 중, Ar 및 Z는 화학식 I에서 정의한 바와 같고, Het1은 상기 (ii)에서 정의한 바임)의 화합물로부터의 N-보호기의 제거,(iv) 페닐티오, 벤질, (C1-C4알콕시)메틸, 2-(C1-C4알콕시)에톡시메틸 또는 2-히드록시에톡시메틸 치환체가 "Het"에 부착되어 있는 경우 촉매적 수소화반응에 의해 화학식 I의 화합물로부터의 상기 치환체의 제거,(v) "Het"가 1,2,4-트리아졸-4-일기인 화학식 I의 화합물을 제조하기 위한, 포르밀히드라진과 X의 페닐, 피리딜 또는 피리미디닐기 상에 포름아미도 치환체를 갖는 화학식 I의 상응하는 화합물의 반응,(vi) "Het"가 5-(C1-C4알킬)-1,3,4-옥사디아졸-2-일기인 화학식 I의 화합물을 제조하기 위한, 화학식의 이미데이트 또는 그의 염과 X의 페닐, 피리딜 또는 피리미디닐기 상에 히드라지노카르보닐(-CONHNH2) 치환체를 갖는 화학식 I의 상응하는 화합물의 반응,(vii) (C1-C4알콕시)메틸, 2-(C1-C4알콕시)에톡시메틸, 트리틸 또는 2-히드록시에톡시메틸 치환체가 화학식 I의 화합물에서 "Het"의 질소 원자에 부착되어 있는 경우 상기 치환체의 가수분해에 의한 제거,(ix) "Het"가 C1-C4알킬술피닐 또는 C1-C4알킬술포닐기에 의해 치환되는 화학식 I의 화합물을 제조하기 위한, 화학식 I의 C1-C4알킬티오-치환 화합물의 산화,(x) "Het"가 화학식(식 중, R1및 R2는 각각 독립적으로 H 또는 C1-C4알킬임)의 옥사디아졸일기인 화학식 I의 화합물을 제조하기 위한, 화학식(식 중, R1및 R2는 상기 정의된 바와 같음)과 X의 페닐, 피리딜 또는 피리미디닐기의 (C1-C4알콕시)카르보닐 치환체를 갖는 화학식 I의 상응하는 화합물의 반응,(xi) "Het"가 화학식(식 중, R1및 R2는 각각 독립적으로 H 또는 C1-C4알킬임)의 옥사디아졸일기인 화학식 I의 화합물을 제조하기 위한,(식 중, R1및 R2는 상기 정의된 바와 같음)의 티오세미카르브아지드와 X의 페닐, 피리딜 또는 피리미디닐 상에 카르보닐 치환체를 갖는 상응하는 화합물의 활성 에스테르의 반응,(xii) 하기 화학식 IV(식 중, X는 화학식 I에서 정의한 바와 같음)의 친핵물 또는 하기 화학식 IVA(식 중, X는 화학식 I에서 정의한 바와 같고, M은 Li, Zn-Hal 또는 Mg-Hal임)의 화합물과 하기 화학식 III(식 중, Ar은 화학식 I에서 정의한 바와 같음)의 케톤의 반응,<화학식 III><화학식 IV><화학식 IVA>(xiii) "Het"가 화학식 -NHCO(C1-C4알킬), -NHSO2(C1-C4알킬) 또는 -NHCONH(C1-C4알킬)의 기에 의해 치환되는 화학식 I의 화합물을 제조하기 위해, 적절하다면, 화학식 (C1-C4알킬)COCl 또는 (C1-C4알킬.CO)2O의 산 염화물 또는 산 무수물, C1-C4알칸술포닐 염화물, 또는 C1-C4알킬 이소시아네이트와 "Het"가 아미노기에 의해 치환된 화학식 I의 화합물과의 반응,(xiv) "Het"가 1,2,3-트리아졸-4-일 또는 5-(C1-C4알킬)-1,2,3-트리아졸-4-일기인 화학식 I의 화합물을 제조하기 위한, 강 염기의 존재 중에서 화학식 [(Ra)2N]3PN3 +X-(식 중, Ra는 C1-C4알킬, C5-C7시클로알킬 또는 이들이 부착되는 질소 원자와 함께 각 Ra는 피롤리디노 또는 피페리디노를 나타내고, X는 대이온임)의 화합물과 하기 화학식 V(식 중, Ar은 화학식 I에서 정의한 바이고, R은 H 또는 C1-C4알킬임)의 화합물의 반응,<화학식 V>(xv) "Het"가 탄소 원자에 의해 인접한 페닐 또는 복소환식 고리에 부착되고, C1-C4알킬, C1-C4알콕시메틸, 시아노메틸 또는 카르바모일메틸기에 의해 질소 원자 상에 치환되는 화학식 I의 화합물을 제조하기 위한, 각각 C1-C4알킬 할라이드, (C1-C4알콕시)메틸 할라이드, 시아노 메틸 할라이드 또는 카르바모일메틸 할라이드를 사용하는 상응하는 비치환된 화학식 I의 화합물의 N-알킬화,(xvi) X가 화학식의 기(식 중, Z는 H 또는 F이고, "Het"는 1,2,3-트리아졸-4-일기임)인 화학식 I의 화합물을 제조하기 위한, 1차로 아지도트리(C1-C4알킬)실란과 그리고 2차로 물과 하기 화학식 VI의 화합물(식 중, Ar 및 Z는 화학식 I에서 정의한 바임)의 반응,<화학식 VI>(xvii) "Het"가 화학식 I에서 정의한 바와 같으나, 질소 원자에 의해 인접한 페닐기에 연결되는 화학식 I의 화합물을 제조하기 위한, 구리 촉매와 염기 존재 중에서 화학식 Het-H의 화합물(식 중, "Het"는 본 방법에서 정의한 바와 같음)과 화학식의 화합물(식 중, Ar 및 Z는 화학식 I에서 정의한 바와 같고, Y는 CH 또는 N임)의 반응,(xviii) "Het"가 할로-치환된 화합물을 제조하기 위한, 상응하는 비치환된 화합물의 할로겐화,(xix) "Het"가 3-메르캅토-4-(C1-C4알킬)-1,2,4-트리아졸-5-일인 화합물을 제조하기 위한, 페닐, 피리디닐 또는 피리미디닐 고리가 -CONHNHCSNH(C1-C4알킬)에 의해 치환되는 상응하는 화합물의 고리화,(xx) "Het" 상의 메르캅토기의 제거,(xxi) "Het" 상의 트리메틸실릴기의 제거, 또는(xxii) "Het"가 탄소 원자에 의해 인접한 페닐, 피리디닐 또는 피리미디닐기에 연결된 화합물을 제조하기 위한, 팔라듐 또는 니켈 촉매의 존재 중에서 그리고, 이탈기가 -OSO2CF3인 경우, 부가적으로 염화리튬의 존재 중에서 화학식 Het-M(식 중, M은 -Sn(Me)3, -Sn(n-Bu)3, -B(Et)2, -B(OH)2또는 -ZnCl이고, Het는 화학식 I에서 정의한 바와 같고, 필요하다면, N-보호됨)과 페닐, 피리디닐 또는 피리미디닐기가 Cl, Br, I 또는 -OSO2CF3와같은 이탈기에 의해 치환되는 상응하는 화합물의 반응을 특징으로 하며, 상기 (a) 내지 (xxii) 단계에 이어 임의로 화학식 I의 생성물을 제약학상 허용가능한 염으로 전환시키는, 하기 화학식 I의 화합물 또는 그의 제약학상 허용가능한 염의 제조 방법.<화학식 I>식 중,Ar은 할로 및 CF3에서 각각 독립적으로 선택된 1 내지 3개의 치환체에 의해 치환된 페닐기이고,X는[여기에서, Het는 산소 또는 황 원자를 임의로 포함하고, 탄소 또는 질소 원자에 의해 페닐, 피리딜 또는 피리미디닐기에 부착되고, 할로, C1-C4알킬, (C1-C4알콕시)메틸, 2-(C1-C4알콕시)에톡시메틸, 2-히드록시에톡시메틸, 시아노메틸, -NR1R2또는 -CH2CONR1R2(여기에서, R1및 R2는 각각 독립적으로 H 또는 C1-C4알킬임), 페닐티오 또는 페닐-(C1또는 C2알킬) (이때, 상기 2개의 페닐기는 할로, 트리플루오로메틸 또는 C1-C4알킬에 의해 임의 치환됨), -NHCO(C1-C4알킬), -NHSO2(C1-C4알킬), -NHCONR1R2(여기에서, R1및 R2는 상기 정의한 바와 동일함), 메르캅토, 및 -S(O)n(C1-C4알킬) (이때, n은 0, 1 또는 2임)로부터 각각 독립적으로 선택된 1 내지 3개의 치환체에 의해 임의 치환된 5-원 질소 함유 방향족 복소환식기이고, Z는 H 또는 F임]의 기이다.
- 제22항에 있어서, "Het"가 화학식 I에서 정의한 바와 같이 임의 치환되는, 피라졸일, 이미다졸일, 트리아졸일, 티아디아졸일, 옥사디아졸일, 피롤일 또는 테트라졸일기인 화학식 I의 화합물을 제조하기 위하여 사용되는 것을 특징으로 하는 방법.
- 제22항에 있어서, "Het"가 피라졸-1-일, 피라졸-3-일, 피라졸-4-일, 이미다졸-1-일, 이미다졸-2-일, 이미다졸-4-일, 1,2,3-트리아졸-1-일, 1,2,3-트리아졸-2-일, 1,2,3-트리아졸-4-일, 1,2,4-트리아졸-1-일, 1,2,4-트리아졸-3-일, 1,2,4-트리아졸-4-일, 1,3,4-티아디아졸-2-일, 1,3,4-옥사디아졸-2-일, 1,2,4-옥사디아졸-5-일, 피롤-1-일, 티아졸-5-일 또는 테트라졸-5-일기로서, 상기 모든 기들은 제1항에서 정의한 바와 같이 1 내지 3개의 치환체에 의해 임의 치환되는 화학식 I의 화합물을 제조하기 위하여 사용되는 것을 특징으로 하는 방법.
- 제22항 내지 제24항 중 어느 한 항에 있어서, Ar이 F, Cl 및 Br으로부터 각각 독립적으로 선택된 1 또는 2개의 치환체에 의해 치환된 페닐기인 것을 특징으로 하는 방법.
- 제22항에 있어서, (i) 또는 (ii)에서 환원이 촉매적 수소화반응에 의해 수행되는 것을 특징으로 하는 방법.
- 제22항에 있어서, (i)에서 환원이 p-톨루엔술포닐히드라지드를 사용하여 수행되는 것을 특징으로 하는 방법.
- 제22항에 있어서, (vii)에서 가수분해가 산 가수분해인 것을 특징으로 하는 방법.
- 제22항에 있어서, (i)에서 (2R,3S)-2-(2,4-디플루오로페닐)-3-(4-[1-메틸피라졸-5-일]페닐)-1-(1,2,4-트리아졸-1-일)부탄-2-올이 (2R)-2-(2,4-디플루오로페닐)-3-(4-[1-메틸피라졸-5-일]페닐)-1-(1,2,4-트리아졸-1-일)-3-부텐-2-올의 환원에 의해 제조되는 것을 특징으로 하는 방법.
- 제29항에 있어서, 환원이 촉매적 수소화반응에 의해 수행되는 것을 특징으로 하는 방법.
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CN103842355A (zh) | 2011-06-19 | 2014-06-04 | 威尔金制药有限公司 | 金属酶抑制剂化合物 |
MX2013015159A (es) | 2011-06-23 | 2015-01-14 | Viamet Pharmaceuticals Inc | Compuestos inhibidores de metaloenzima. |
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TWI646088B (zh) * | 2012-03-16 | 2019-01-01 | 維愛美製藥公司 | 金屬酶抑制劑化合物 |
WO2013144224A1 (en) * | 2012-03-27 | 2013-10-03 | Syngenta Participations Ag | Acetylenic microbiocides |
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US4729523A (en) * | 1984-06-11 | 1988-03-08 | Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho | Locking mechanism for webbing retractor |
GB8819308D0 (en) * | 1988-08-13 | 1988-09-14 | Pfizer Ltd | Triazole antifungal agents |
GB9107055D0 (en) * | 1991-04-04 | 1991-05-22 | Pfizer Ltd | Triazole antifungal agents |
GB9121456D0 (en) * | 1991-10-10 | 1991-11-27 | Pfizer Ltd | Triazole antifungal agents |
NZ270418A (en) * | 1994-02-07 | 1997-09-22 | Eisai Co Ltd | Polycyclic triazole & imidazole derivatives, antifungal compositions |
CA2145458A1 (en) * | 1994-03-28 | 1995-09-29 | Hiroki Kodama | Triazole compound and production process and use thereof |
-
1995
- 1995-06-26 GB GBGB9512961.5A patent/GB9512961D0/en active Pending
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1996
- 1996-06-05 DK DK96921941T patent/DK0835252T3/da active
- 1996-06-05 DE DE69629300T patent/DE69629300T2/de not_active Expired - Fee Related
- 1996-06-05 CA CA002224983A patent/CA2224983C/en not_active Expired - Fee Related
- 1996-06-05 BR BR9609298A patent/BR9609298A/pt not_active IP Right Cessation
- 1996-06-05 HU HU9803022A patent/HUP9803022A2/hu unknown
- 1996-06-05 KR KR1019970709706A patent/KR19990028390A/ko not_active Application Discontinuation
- 1996-06-05 PL PL96324336A patent/PL324336A1/xx unknown
- 1996-06-05 ES ES96921941T patent/ES2202453T3/es not_active Expired - Lifetime
- 1996-06-05 CZ CZ974155A patent/CZ415597A3/cs unknown
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- 1996-06-05 AT AT96921941T patent/ATE246186T1/de not_active IP Right Cessation
- 1996-06-05 AU AU63010/96A patent/AU697405B2/en not_active Ceased
- 1996-06-05 WO PCT/EP1996/002470 patent/WO1997001552A1/en active IP Right Grant
- 1996-06-05 US US08/983,006 patent/US6015825A/en not_active Expired - Fee Related
- 1996-06-05 EP EP96921941A patent/EP0835252B1/en not_active Expired - Lifetime
- 1996-06-05 NZ NZ311651A patent/NZ311651A/en unknown
- 1996-06-05 TR TR97/01699T patent/TR199701699T1/xx unknown
- 1996-06-05 PT PT96921941T patent/PT835252E/pt unknown
- 1996-06-20 IL IL11869896A patent/IL118698A0/xx unknown
- 1996-06-21 PE PE1996000475A patent/PE4698A1/es not_active Application Discontinuation
- 1996-06-24 AR ARP960103283A patent/AR002761A1/es unknown
- 1996-06-25 ZA ZA9605365A patent/ZA965365B/xx unknown
- 1996-06-26 CO CO96033565A patent/CO4480719A1/es unknown
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100738228B1 (ko) * | 2006-02-22 | 2007-07-12 | 한국화학연구원 | 아졸계 항균제 화합물 및 그의 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
ZA965365B (en) | 1997-12-29 |
NO976047D0 (no) | 1997-12-22 |
PT835252E (pt) | 2003-11-28 |
CZ415597A3 (cs) | 1998-11-11 |
CA2224983A1 (en) | 1997-01-16 |
AU697405B2 (en) | 1998-10-08 |
PL324336A1 (en) | 1998-05-25 |
JPH10506652A (ja) | 1998-06-30 |
CA2224983C (en) | 2003-04-08 |
MX9800046A (es) | 1998-08-30 |
GB9512961D0 (en) | 1995-08-30 |
ATE246186T1 (de) | 2003-08-15 |
NO976047L (no) | 1998-02-25 |
NZ311651A (en) | 1999-09-29 |
DE69629300T2 (de) | 2004-03-04 |
CO4480719A1 (es) | 1997-07-09 |
ES2202453T3 (es) | 2004-04-01 |
PE4698A1 (es) | 1998-03-03 |
DK0835252T3 (da) | 2003-10-27 |
EP0835252A1 (en) | 1998-04-15 |
US6015825A (en) | 2000-01-18 |
AR002761A1 (es) | 1998-04-29 |
DE69629300D1 (de) | 2003-09-04 |
HUP9803022A2 (hu) | 1999-10-28 |
WO1997001552A1 (en) | 1997-01-16 |
IL118698A0 (en) | 1996-10-16 |
BR9609298A (pt) | 1999-05-18 |
JP3105926B2 (ja) | 2000-11-06 |
TR199701699T1 (xx) | 1998-06-22 |
AU6301096A (en) | 1997-01-30 |
EP0835252B1 (en) | 2003-07-30 |
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