KR19980018089A - Stereoselective Preparation of Transazetidinone - Google Patents
Stereoselective Preparation of Transazetidinone Download PDFInfo
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- KR19980018089A KR19980018089A KR1019970016153A KR19970016153A KR19980018089A KR 19980018089 A KR19980018089 A KR 19980018089A KR 1019970016153 A KR1019970016153 A KR 1019970016153A KR 19970016153 A KR19970016153 A KR 19970016153A KR 19980018089 A KR19980018089 A KR 19980018089A
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- KR
- South Korea
- Prior art keywords
- compound
- formula
- reaction
- acid
- present
- Prior art date
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- 230000000707 stereoselective effect Effects 0.000 title claims description 3
- 238000002360 preparation method Methods 0.000 title description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 21
- MNFORVFSTILPAW-UHFFFAOYSA-N azetidin-2-one Chemical compound O=C1CCN1 MNFORVFSTILPAW-UHFFFAOYSA-N 0.000 claims abstract description 4
- AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical compound C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 claims description 16
- -1 alkali metal amides Chemical class 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 12
- 239000004473 Threonine Substances 0.000 claims description 8
- 229960002898 threonine Drugs 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 230000003197 catalytic effect Effects 0.000 claims description 5
- 238000007363 ring formation reaction Methods 0.000 claims description 5
- 150000004982 aromatic amines Chemical class 0.000 claims description 4
- 239000002841 Lewis acid Substances 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- 150000007517 lewis acids Chemical class 0.000 claims description 3
- 150000003335 secondary amines Chemical class 0.000 claims description 3
- 125000003460 beta-lactamyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000006239 protecting group Chemical group 0.000 claims description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims 1
- 230000008901 benefit Effects 0.000 abstract description 2
- 239000003782 beta lactam antibiotic agent Substances 0.000 abstract description 2
- YZBQHRLRFGPBSL-RXMQYKEDSA-N carbapenem Chemical compound C1C=CN2C(=O)C[C@H]21 YZBQHRLRFGPBSL-RXMQYKEDSA-N 0.000 abstract description 2
- HHXMXAQDOUCLDN-RXMQYKEDSA-N penem Chemical compound S1C=CN2C(=O)C[C@H]21 HHXMXAQDOUCLDN-RXMQYKEDSA-N 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 32
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 6
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 6
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 239000003153 chemical reaction reagent Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 4
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- VEUUMBGHMNQHGO-UHFFFAOYSA-N ethyl chloroacetate Chemical compound CCOC(=O)CCl VEUUMBGHMNQHGO-UHFFFAOYSA-N 0.000 description 3
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- 235000010288 sodium nitrite Nutrition 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-M Aminoacetate Chemical compound NCC([O-])=O DHMQDGOQFOQNFH-UHFFFAOYSA-M 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 241001442129 Myosotis Species 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 2
- 150000001370 alpha-amino acid derivatives Chemical class 0.000 description 2
- 235000008206 alpha-amino acids Nutrition 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000005695 dehalogenation reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 235000011167 hydrochloric acid Nutrition 0.000 description 2
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 235000010289 potassium nitrite Nutrition 0.000 description 2
- 239000004304 potassium nitrite Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- LCHQHZMPERBYFH-GBXIJSLDSA-N (2s,3r)-2-bromo-3-hydroxybutanoic acid Chemical compound C[C@@H](O)[C@H](Br)C(O)=O LCHQHZMPERBYFH-GBXIJSLDSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- GEQNZVKIDIPGCO-UHFFFAOYSA-N 2,4-dimethoxyaniline Chemical compound COC1=CC=C(N)C(OC)=C1 GEQNZVKIDIPGCO-UHFFFAOYSA-N 0.000 description 1
- YOYAIZYFCNQIRF-UHFFFAOYSA-N 2,6-dichlorobenzonitrile Chemical compound ClC1=CC=CC(Cl)=C1C#N YOYAIZYFCNQIRF-UHFFFAOYSA-N 0.000 description 1
- YOETUEMZNOLGDB-UHFFFAOYSA-N 2-methylpropyl carbonochloridate Chemical compound CC(C)COC(Cl)=O YOETUEMZNOLGDB-UHFFFAOYSA-N 0.000 description 1
- LGDHZCLREKIGKJ-UHFFFAOYSA-N 3,4-dimethoxyaniline Chemical compound COC1=CC=C(N)C=C1OC LGDHZCLREKIGKJ-UHFFFAOYSA-N 0.000 description 1
- PWNJRLOGOKXXKO-UHFFFAOYSA-N 3-(oxomethylidene)azetidin-2-one Chemical compound O=C=C1CNC1=O PWNJRLOGOKXXKO-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- HTYRTGGIOAMLRR-UHFFFAOYSA-N 5-amino-4-hydroxybenzene-1,3-disulfonic acid Chemical compound NC1=CC(S(O)(=O)=O)=CC(S(O)(=O)=O)=C1O HTYRTGGIOAMLRR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- IKUFTHLIOXUHMN-UHFFFAOYSA-M C(C)(=O)[O-].C(C)[I+] Chemical compound C(C)(=O)[O-].C(C)[I+] IKUFTHLIOXUHMN-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 1
- NMEGSGKCIWQRDB-UHFFFAOYSA-N butyl 2-bromoacetate Chemical compound CCCCOC(=O)CBr NMEGSGKCIWQRDB-UHFFFAOYSA-N 0.000 description 1
- YJRGMUWRPCPLNH-UHFFFAOYSA-N butyl 2-chloroacetate Chemical compound CCCCOC(=O)CCl YJRGMUWRPCPLNH-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- HSUGRBWQSSZJOP-RTWAWAEBSA-N diltiazem Chemical compound C1=CC(OC)=CC=C1[C@H]1[C@@H](OC(C)=O)C(=O)N(CCN(C)C)C2=CC=CC=C2S1 HSUGRBWQSSZJOP-RTWAWAEBSA-N 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- PQJJJMRNHATNKG-UHFFFAOYSA-N ethyl bromoacetate Chemical compound CCOC(=O)CBr PQJJJMRNHATNKG-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000003944 halohydrins Chemical class 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- YDCHPLOFQATIDS-UHFFFAOYSA-N methyl 2-bromoacetate Chemical compound COC(=O)CBr YDCHPLOFQATIDS-UHFFFAOYSA-N 0.000 description 1
- QABLOFMHHSOFRJ-UHFFFAOYSA-N methyl 2-chloroacetate Chemical compound COC(=O)CCl QABLOFMHHSOFRJ-UHFFFAOYSA-N 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- FUUUBHCENZGYJA-UHFFFAOYSA-N n-cyclopentylcyclopentanamine Chemical compound C1CCCC1NC1CCCC1 FUUUBHCENZGYJA-UHFFFAOYSA-N 0.000 description 1
- 239000012038 nucleophile Substances 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- VODRWDBLLGYRJT-UHFFFAOYSA-N propan-2-yl 2-chloroacetate Chemical compound CC(C)OC(=O)CCl VODRWDBLLGYRJT-UHFFFAOYSA-N 0.000 description 1
- IVRIRQXJSNCSPQ-UHFFFAOYSA-N propan-2-yl carbonochloridate Chemical compound CC(C)OC(Cl)=O IVRIRQXJSNCSPQ-UHFFFAOYSA-N 0.000 description 1
- ISYUCUGTDNJIHV-UHFFFAOYSA-N propyl 2-bromoacetate Chemical compound CCCOC(=O)CBr ISYUCUGTDNJIHV-UHFFFAOYSA-N 0.000 description 1
- QJZNRCWAXUGABH-UHFFFAOYSA-N propyl 2-chloroacetate Chemical compound CCCOC(=O)CCl QJZNRCWAXUGABH-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005055 short column chromatography Methods 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- BNWCETAHAJSBFG-UHFFFAOYSA-N tert-butyl 2-bromoacetate Chemical compound CC(C)(C)OC(=O)CBr BNWCETAHAJSBFG-UHFFFAOYSA-N 0.000 description 1
- KUYMVWXKHQSIAS-UHFFFAOYSA-N tert-butyl 2-chloroacetate Chemical compound CC(C)(C)OC(=O)CCl KUYMVWXKHQSIAS-UHFFFAOYSA-N 0.000 description 1
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D205/00—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom
- C07D205/02—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D205/06—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D205/08—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with one oxygen atom directly attached in position 2, e.g. beta-lactams
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
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Abstract
본 발명은 카바페넴 및 페넴계의 β-락탐항생제의 중요 중간체인 (3S, 4S)-3-[(1'R)-1'-히드록시에틸]-4-알콕시카르보닐-알킬-2-아제티디논을 입체선택적으로 제조하는 방법에 관한 것이다.The present invention relates to (3S, 4S) -3-[(1'R) -1'-hydroxyethyl] -4-alkoxycarbonyl-alkyl-2-, an important intermediate of carbapenem and penem-based lactam antibiotics. The present invention relates to a method for stereoselectively preparing azetidinone.
본 발명의 목적화합물은 우수한 경제성과 함께 높은 합성수율을 얻을 수 있는 특징과 장점들이 있는 것이다.The target compound of the present invention has the features and advantages to obtain a high synthetic yield with excellent economy.
Description
본 발명은 카바페넴 및 페넴계의 β-락탐항생제의 중요 중간체인 하기 일반식(I)의 (3S,4S)-3-[(1'R)-1'-히드록시에틸]-4-알콕시카르보닐-2-아제티디논(이하 트랜스아제티디논으로 약칭)을 천연에 풍부하게 존재하는 α-아미노산인 L-트레오닌을 출발물질로 하여 입체선택적으로 제조하는 방법에 관한 것이다.The present invention relates to (3S, 4S) -3-[(1'R) -1'-hydroxyethyl] -4-alkoxy of the following general formula (I), which is an important intermediate of carbapenem and penem-based lactam antibiotics The present invention relates to a method for stereoselectively preparing carbonyl-2-azetidinone (hereinafter, abbreviated as transazetidinone) using L-threonine, which is an α-amino acid which is abundant in nature, as a starting material.
(식중, R1은 C1~4인 저급알킬기를 나타내고, R2는 β-락탐환 보호기중 아릴기 혹은 치환된 벤질, 특히 4-메톡시페닐기, 2,4-디메톡시벤질을 나타낸다.)(Wherein R 1 represents a lower alkyl group having 1 to 4 carbon atoms, and R 2 represents an aryl group or substituted benzyl, in particular 4-methoxyphenyl group, 2,4-dimethoxybenzyl, in the β-lactam ring protecting group.)
본 발명의 목적물질인 일반식(I)의 트랜스아제티디논은 이미 공지된 화합물로서 그 제조 방법에 대해서는 시오자키등(Tetrahedron, 40권, 1795쪽)에 의해 보고되어 있는 바 그 내용을 간략하게 소개하면 다음과 같다.The transazetidinone of general formula (I), which is the target substance of the present invention, is a known compound and its preparation method has been reported by Shiozaki et al. (Tetrahedron, Vol. 40, p. 1795). Introducing:
하기 도식 1에 나타낸 바와 같이 L-트레오닌을 출발물질로 하여 합성된 하기 구조식(가)의 (2S, 3R)-브로모-3-히드록시-부티릭산을 알킬-N-(아릴 혹은 치환된 벤질)글리시네이트와 커플링 시약(예, 1,3-디시클로헥실카보디아미드; DCC) 존재하에서 반응시켜 하기일반식(나)의 히드록시브로모아미드 화합물을 제조한 후 이를 당량의 알칼리금속류 강염기(예, 리튬헥사메틸디실라자이드; LiHMDS)와 반응시키면 하기일반식(IV)의 에폭시아미드가 수득되고, 다시 동량의 알칼리금속류 강염기로 처리하면 C3-C4β-락탐환 형성반응이 일어나서 하기일반식(I)의 트랜스아제티디논이 합성된다. 이렇게 얻어진 트랜스아제티디논(I)은 필요시 유리수산기를 3급아민 존재하에서 t-부틸디메틸클로로실란으로 보호(Protection)하면 하기 일반식(다)의 실릴에스테르아제티디논을 제조할 수도 있다.As shown in Scheme 1, (2S, 3R) -bromo-3-hydroxy-butyric acid of the following structural formula (A) synthesized with L-threonine as a starting material is alkyl-N- (aryl or substituted benzyl Reaction of glycinate with a coupling reagent (e.g., 1,3-dicyclohexylcarbodiamide; DCC) to prepare a hydroxybromoamide compound of the general formula (I) When reacted with a strong base (e.g., lithium hexamethyldisilazide; LiHMDS), an epoxyamide of the following general formula (IV) is obtained, and when treated with the same amount of an alkali metal strong base, C 3 -C 4 β-lactam ring formation reaction is performed. It arises and the transazetidinone of the following general formula (I) is synthesize | combined. The transazetidinone (I) thus obtained can also be prepared with silyl esterazetidinone of the general formula (C) by protecting the free hydroxyl group with t-butyldimethylchlorosilane in the presence of a tertiary amine if necessary.
도식 1Scheme 1
(식중, R1, R2는 상기 정의한 바와 같으며, TBDMS는 t-부틸디메틸실릴기를 나타낸다.)Wherein R 1 and R 2 are as defined above and TBDMS represents a t-butyldimethylsilyl group.
그러나 본 발명자는 상기 제조방법을 토대로 재현성 실험을 거친 결과 다음과 같은 문제점들을 알아낼 수 있었는데, 첫째 1,3-디시클로헥실카보디이미드를 사용한 축합 반응 수행시 발생되는 부산물(DCU 등)의 제거가 용이하지 않았으며 화합물(나)를 당량의 리튬헥사메틸디실라자이드로 에폭시화(epoxidation)할 때 보고된 수율에 비해 수율이 떨어졌고, 둘째 C3-C4β-락탐환 형성반응에서 상당량의 입체이성체가 발생하여 분리가 어려웠으며, 셋째 합성단계가 까다롭고 복잡하여 상기 일반식(I)의 합성과정에서 심각한 부반응이 일어나 수율이 저하되는 단점이 있었기 때문에 이에 대한 개선의 여지가 남아 있다.However, the present inventors were able to find out the following problems based on the reproducibility experiment based on the preparation method. First, the removal of by-products (DCU, etc.) generated when performing the condensation reaction using 1,3-dicyclohexylcarbodiimide It was not easy and the yield was lower than the reported yield when the compound (b) was epoxidized with the equivalent of lithium hexamethyldisilazide, and secondly, a considerable amount of C 3 -C 4 β-lactam ring formation reaction was observed. Separation was difficult due to the generation of stereoisomers, and since the third synthesis step was difficult and complicated, serious side reactions occurred in the synthesis process of Formula (I), resulting in a decrease in yield.
이에 본 발명자는 상기와 같은 종래의 제조방법상의 문제점들을 해결하기 위해 연구 노력한 결과 본 발명을 완성하게 되었다.The present inventors have completed the present invention as a result of research efforts to solve the problems of the conventional manufacturing method as described above.
본 발명은 천연에 풍부하게 존재하는 저렴한 α-아미노산인 L-트레오닌을 출발물질로 하여 목적 화합물인 트랜스아제티디논(I)을 입체선택적으로 제조하는데 있어서 기존의 제조방법에 비해 전체수율이 높아지고, 공지의 제조방법의 문제점들을 해결한 새로운 제조방법을 제공하는데 그 목적이 있다.In the present invention, the overall yield is higher than that of the conventional manufacturing method for stereoselectively preparing the desired compound, transazetidinone (I), using L-threonine, an inexpensive α-amino acid, which is present in abundance in nature, as a starting material. It is an object of the present invention to provide a new manufacturing method that solves the problems of known manufacturing methods.
이하 본 발명을 합성단계별로 반응식들을 도식화하여 좀더 상세하게 설명하면 하기 도식 2와 같다.Hereinafter, the present invention will be described in more detail by schematizing the reaction schemes for each synthesis step, as shown in Scheme 2 below.
도식 2Scheme 2
(식중, R1, R2는 상기 정의한 바와 같다.)Wherein R 1 and R 2 are as defined above.
먼저 L-트레오닌으로 상기 구조식(II)의 (2R, 3R)-에폭시부틸산을 얻고, 이것을 아릴아민 및 알킬 할로아세테이트로부터 합성된 상기 일반식(III)의 N-아릴알킬글리시네이트와 반응시켜 상기 일반식(IV)의 (2R, 3R)-N-(알킬옥시카보닐)메틸-N-아릴-2,3-에폭시부틸릭아미드(이하, 에폭시아미드로 약칭)을 얻고 이렇게 합성된 일반식(IV)의 화합물을 입체선택적인 아제티디논 고리화 반응을 시키면 상기 일반식(I)의 트랜스아제티디논이 얻어진다.First, L-threonine is used to obtain (2R, 3R) -epoxybutyl acid of formula (II), which is reacted with N-arylalkylglycinate of formula (III) synthesized from arylamine and alkyl haloacetate. (2R, 3R) -N- (alkyloxycarbonyl) methyl-N-aryl-2,3-epoxybutylamide (hereinafter abbreviated as epoxyamide) of the above general formula (IV) and thus synthesized A stereoselective azetidinone cyclization reaction of the compound of (IV) affords the transazetidinone of the general formula (I).
본 발명의 반응식들을 상세히 단계별로 설명하면 다음과 같은데, 먼저 합성 단계 1은 L-트레오닌의 α-아미노기가 반응 중에 생성된 아질산에 의해 디아조화가 일어나고 입체배향의 반전(inversion)없이 할로겐원자로 치환된 후, 강염기에 의해 할로히드린이 에폭사이드로 전환되고 이를 다시 산성화시키면 일반식(II)의 (2R, 3R)-에폭시부틸산이 하나의 반응관내에서 일원화반응(one-pot reaction)으로 제조되는 단계로서, 이미 본 발명자 등이 국내에 출원한 특허[황태섭 등, 한국특허 공개번호 제96-41161호]에 자세한 내용이 수록되어 있으나 본 발명에서는 선행 합성방법을 좀 더 효율적이고 경제적으로 수행하였다. 단계 1의 반응용액 중에서 아질산을 발생시킬 수 있는 시약으로는 황산과 소디움나이트라이트(NaNO2), 황산과 포타슘나이트라이트, 염산과 소디움나이트라이트 혹은 염산과 포타슘나이트라이트 등이 사용될 수 있는데, 이중에서 특히 1 내지 10노르말 염산을 2 내지 10당량 사용하고, 1 내지 8당량의 소디움나이트라이트를 사용했을 때 아질산의 발생이 더욱 효율적이었으며, 할로겐 원자, 특히 클로로 원자의 공급은 염산에 의해 생성된 클로로 음이온(C1-)이 친핵(nucleophile)시약으로 작용함으로써 부가적인 시약의 공급없이 (2S, 3R)-2-클로로-3-히드록시부틸산이 합성되어지며, in situ상태에서 1 내지 10 당량의 가성소다로 처리하면 곧바로 에폭시화가 일어나는데 이때 초기 발열을 잡기 위해 0℃ 내지 실온으로 냉각하는 것이 바람직하다. 그리고 상기 반응용액을 과량의 산, 즉 염산 혹은 황산으로 산성화하여 일반적인 불활성 유기용매로 추출한 후 유기용매를 감압농축하면 다음 반응에 그대로 사용할 수 있는 비교적 순수한 일반식(II)의 (2R, 3R)-에폭시부틸산이 높은 수율로 얻어지는 제조단계이다.The reaction scheme of the present invention will be described in detail as follows. First, in the synthesis step 1, the a-amino group of L-threonine is diazotized by nitrous acid generated during the reaction and is substituted with a halogen atom without inversion of stereo alignment. Thereafter, the halohydrin is converted to the epoxide by a strong base and acidified again so that (2R, 3R) -epoxybutyl acid of the general formula (II) is prepared in a one-pot reaction in one reaction tube. As the present invention, the present inventors have already applied for domestic patents [Hwang Tae-seop et al., Korean Patent Publication No. 96-41161], but the details are included in the present invention, the prior synthesis method was performed more efficiently and economically. As a reagent capable of generating nitrous acid in the reaction solution of step 1, sulfuric acid and sodium nitrite (NaNO 2 ), sulfuric acid and potassium nitrite, hydrochloric acid and sodium nitrite or hydrochloric acid and potassium nitrite may be used. In particular, the use of 2 to 10 equivalents of normal hydrochloric acid and 1 to 8 equivalents of sodium nitrite was more efficient in the generation of nitrous acid, and the supply of halogen atoms, in particular chloro atoms, resulted in chloro anions produced by hydrochloric acid. (C1 -) the nucleophilic (nucleophile) without additional reagent in a reagent supply (2S, 3R) -2- chloro-3-hydroxy-butyl becomes acid is synthesized, 1 to 10 equivalents in the in situ condition caustic soda by acting The epoxidation takes place immediately after treatment with, in which case cooling to 0 ° C. to room temperature is preferred in order to catch initial heat generation. The reaction solution is acidified with an excess of acid, that is, hydrochloric acid or sulfuric acid, extracted with a general inert organic solvent, and the organic solvent is concentrated under reduced pressure to obtain (2R, 3R)- Epoxybutyl acid is a production step obtained in high yield.
본 발명의 단계 2는 아릴아민과 알킬할로아세테이트를 유기용매 존재하에서 탈할로겐화제와 반응시키거나 혹은 유기용매 없이 탈할로겐화제 단독으로 사용하여 일반식(III)의 N-아릴알킬글리시네이트를 제조하는 단계로서, 본 합성에 사용된 아릴아민류들은 아닐린, p-아니시딘, 2,4-디메톡시아닐린, 3,4-디메톡시아닐린 등이 사용될 수 있으나 본 발명에서는 p-아니시딘을 사용하였으며, 알킬할로아세테이트류들은 메틸클로로아세테이트, 메틸브로모아세테이트, 에틸클로로아세테이트, 에틸브로모아세테이트, 에틸요오드아세테이트, n-프로필클로로아세테이트, n-프로필브로모아세테이트, n-부틸클로로아세테이트, n-부틸브로모아세테이트, 이소프로필클로로아세테이트, 이소프로필브로모아세테이트, t-부틸클로로아세테이트 혹은 t-부틸브로모아세테이트 등이 사용될 수 있으나 본 발명에서는 에틸클로로아세테이트를 선택하여 사용하였다. 상기에서 '불활성 유기용매'란 반응에 참가하는 모든 화합물을 용해시킬 수 있고, 반응조건하에서 반응에 참여하지 않거나 또는 반응성을 저하시키지 않으며 부반응을 최소로 억제시키는 유기용매를 의미하며, 헥산 혹은 벤젠 등의 탄화수소류, 디에틸에테르, 테트라히드로퓨란 등의 에테르화합물, 디클로로메탄, 사염화탄소, 1,2-디클로로에탄, 클로로포름 등의 할로겐화 탄화수소류, 메틸아세테이트, 에틸아세테이트 등의 에스테르류, 아세토니트릴, 톨루엔, N,N-디메틸포름아미드 및 메탄올, 에탄올 등의 저급 알콜류 등을 지칭하고 있으며, 탈할로겐화제, 즉 염기로는 n-부틸리튬, 리튬아미드, 소디움아미드, 소디움히드라이드, 포타슘히드라이드 등과 같은 알칼리금속 염기류, 트리에틸아민, 피리딘, DBN, DBU 등과 같은 3급 유기아민류, 암모늄히드록사이드, 가성소다, 포타슘 히드록사이드 등과 같은 알칼리금속 수산화물 등을 사용할 수 있으나, 본 합성 단계에서는 불활성 유기용매를 사용하지 않고 트리에틸아민을 유기용매 및 탈할로겐화제로 단독 사용하였을 때 가장 좋은 결과를 얻었고, 바람직하기로는 트리에틸아민을 2 내지 6당량 사용하는 것이 가장 좋다. 반응 온도는 특별히 한정되지 않지만 실온 내지 환류온도가 일반적이다.In step 2 of the present invention, N-arylalkylglycinate of general formula (III) is reacted by reacting arylamine and alkylhaloacetate with a dehalogenating agent in the presence of an organic solvent or using a dehalogenating agent alone without an organic solvent. As the preparing step, the arylamines used in the synthesis may be aniline, p-anisidine, 2,4-dimethoxyaniline, 3,4-dimethoxyaniline, etc., but p-anisidine was used in the present invention. The alkyl halo acetates include methyl chloro acetate, methyl bromo acetate, ethyl chloro acetate, ethyl bromo acetate, ethyl iodine acetate, n-propylchloro acetate, n-propyl bromoacetate, n-butylchloro acetate, n- Butylbromoacetate, isopropylchloroacetate, isopropylbromoacetate, t-butylchloroacetate or t-butylbromoacetate The agent or the like can be used, but in the present invention was used to select the ethyl chloroacetate. As used herein, the term 'inert organic solvent' refers to an organic solvent capable of dissolving all compounds participating in a reaction, not participating in a reaction under reaction conditions or reducing reactivity, and minimizing side reactions, such as hexane or benzene. Ether compounds such as hydrocarbons, diethyl ether, tetrahydrofuran, halogenated hydrocarbons such as dichloromethane, carbon tetrachloride, 1,2-dichloroethane, chloroform, esters such as methyl acetate, ethyl acetate, acetonitrile, toluene, N, N-dimethylformamide and lower alcohols such as methanol and ethanol, and the like, and dehalogenation agents, i.e., alkali such as n-butyllithium, lithiumamide, sodium amide, sodium hydride, potassium hydride, etc. Tertiary organic amines such as metal bases, triethylamine, pyridine, DBN, DBU, etc., ammonium hydroxide Alkali metal hydroxides such as sodium hydroxide, caustic soda, potassium hydroxide and the like can be used. However, the best results were obtained when triethylamine was used alone as an organic solvent and a dehalogenation agent without using an inert organic solvent. Preferably, 2 to 6 equivalents of triethylamine are used. Although reaction temperature is not specifically limited, Room temperature to reflux temperature is common.
본 발명의 단계 3은 단계 1과 단계 2에서 각각 수득된 (2R,3R)-에폭시부틸산(II) 및 N-아릴알킬글리시네이트(III)를 아미드 결합 커플링 시약을 이용하여 일반식(IV)의 에폭시아미드 화합물을 합성하는 단계로서, 본 반응에 일반적으로 적용될 수 있는 아미드 커플링 방법들은 산-할라이드(acid halide)법, 혼합 무수물(mixed anhydride)법 혹은 활성 에스테르(active ester)법 등이 있으나 본 합성단계에서는 특히 혼합무수물법이 부반응을 최소한으로 줄이면서 완화된 반응조건하에서 수율을 증가시키는 방법임을 알 수 있었다. 이러한 혼합무수물법에 사용되는 활성화제로는 에틸클로로포메이트, 이소프로필클로로포메이트, 이소부틸클로로포메이트 등이 사용될 수 있으나 본 발명에서는 에틸클로로포메이트를 1 내지 3당량 사용했을 때 가장 좋은 결과가 얻어졌고, 사용되는 유기용매는 상기 언급한 불활성 유기용매들 중에서 특히 디클로로메탄, 클로로포름 또는 에틸아세테이트를 사용함이 바람직하고 발생되는 염산(HCl)을 제거하기 위한 스케빈져(scavenger)로는 트리에틸아민, 피리딘, N,N-디메틸아미노피리딘, N-메틸몰폴린, 바이싸이클릭 아민류(DBN, DBU 등) 등의 3급 아민류가 사용될 수 있으며, 이중에서 트리에틸아민 혹은 N-메틸몰폴린을 1 내지 5당량 사용하는 것이 좋고 반응온도는 -40℃ 내지 실온에서 실시함이 바람직하다.In step 3 of the present invention, (2R, 3R) -epoxybutyl acid (II) and N-arylalkylglycinate (III) obtained in steps 1 and 2, respectively, are prepared using an amide bond coupling reagent. In the step of synthesizing the epoxyamide compound of IV), the amide coupling methods that can be generally applied to the reaction include an acid halide method, a mixed anhydride method or an active ester method. In this synthesis step, however, the mixed anhydride method was found to increase the yield under moderate reaction conditions with minimal side reactions. Ethylchloroformate, isopropylchloroformate, isobutylchloroformate and the like may be used as the activator used in the mixed anhydride method, but in the present invention, the best results are obtained when 1 to 3 equivalents of ethylchloroformate are used. The organic solvent used is preferably dichloromethane, chloroform or ethyl acetate among the above-mentioned inert organic solvents, and triethylamine, as a scavenger for removing hydrochloric acid (HCl) generated, Tertiary amines such as pyridine, N, N-dimethylaminopyridine, N-methylmorpholine, bicyclic amines (DBN, DBU, etc.) may be used, among which triethylamine or N-methylmorpholine is 1 to It is preferable to use 5 equivalents, and it is preferable to carry out reaction temperature at -40 degreeC to room temperature.
본 발명의 단계 4는 시오자키 등이 보고한 공지의 기술과 맥락은 같이하고 있으나 경제적인 측면 및 산업화 관점에서 우수함을 보여주는 합성단계로서 앞서 합성된 에폭시아미드(IV)를 알칼리금속 아미드류와 촉매량의 루이스산(Lewis acid)을 사용하거나 혹은 알칼리금속 아미드류와 촉매량의 2급 아민류를 사용하여 반응시킴으로써 일반식(I)의 트랜스아제티디논을 높은 수율로 합성하는 단계이다. 여기에 사용된 알칼리금속 아민류는 리튬아미드, 소디움아미드, 리튬헥사메틸디실라자이드, 리튬디이소프로필아미드, 리튬디시클로헥실아미드 등이 사용될 수 있다. 루이스산은 아연, 망간, 주석, 티타늄, 알루미늄 혹은 보론 등의 양쪽성 원소 혹은 천이 원소의 할라이드류가 사용될 수 있는데 이중에서 특히 ZnCl2및 ZnBr2가 우수한 결과를 나타냈으며, 2급 아민류는 디메틸아민, 디에틸아민, 디시클로펜틸아민, 디시클로헥산아민, 헥사메틸디살라잔 등이 사용될 수 있으나, 특히 헥사메틸디실라잔을 촉매(catalyst)로 사용하는 것이 바람직하다. 상기 단계 4에 사용되는 불활성 유기용매로는 디클로로메탄 혹은 THF 등이 사용될 수 있으며 반응온도는 -20℃ 내지 환류온도 범위내에서 진행하는 것이 바람직하다. 본 발명의 4단계는 공지이 기술에 비해 여러 측면에서 강점을 나타내고 있는데 첫째 공지의 기술에 의하면 고가의 리튬헥사메틸디실라자이드(LiHMDS)를 1당량 사용하여 61%의 수율밖에는 얻지 못했으나 본 발명에서는 당량의 LiHMDS와 촉매량의 ZnBr2를 사용하여 수율을 대폭 향상시켰으며, 또한 상업적으로 널리 이용되는 저렴한 리튬 아미드(LiNH2)를 주 염기로 작용시키고 헥사메틸디실라잔을 촉매량 사용함으로써 합성원가 차원에서 우수한 결과를 얻을 수 있었다. 둘째, 반응 수율에 있어서도 본 발명의 단계 4는 반응 수율이 86% 혹은 84%로서 공지 기술의 61%에 비해 수율이 월등히 개선되었다. 셋째, 반응기전면에서 비교해보면 공지기술은 THF 용매상에서 열역학적 조절(thermodynamic control)에 의해 원하지 않는 이성체가 상당량 발생하나 본 발명의 방법은 CH2Cl2용매하에서 운동역학적 조절(Kinetic control)을 함으로써 이성체 발생을 근본적으로 제거한 장점이 있다.Step 4 of the present invention is a synthesizing step that shows the same technology and context as known by Shiozaki et al., But is superior in terms of economics and industrialization. It is a step of synthesizing transazetidinone of general formula (I) in a high yield by using Lewis acid or by using an alkali metal amide and a catalytic amount of secondary amines. As the alkali metal amines used herein, lithium amide, sodium amide, lithium hexamethyldisilazide, lithium diisopropylamide, lithium dicyclohexylamide, and the like can be used. Lewis acids may be halides of amphoteric or transition elements such as zinc, manganese, tin, titanium, aluminum, or boron. Among these, ZnCl 2 and ZnBr 2 have excellent results. Secondary amines are dimethylamine, Diethylamine, dicyclopentylamine, dicyclohexaneamine, hexamethyldisalazan and the like can be used, but it is particularly preferable to use hexamethyldisilazane as a catalyst. Dichloromethane or THF may be used as the inert organic solvent used in step 4, and the reaction temperature is preferably in the range of -20 ° C to reflux temperature. The fourth step of the present invention shows strengths in several aspects compared to the known technique. According to the first known technique, only 61% yield was obtained by using 1 equivalent of expensive lithium hexamethyldisilazide (LiHMDS). using the equivalent of LiHMDS and a catalytic amount of ZnBr 2 in stylized significantly improve the yield, and also in the synthesis cost level by acting an inexpensive lithium amide (LiNH 2) which are widely used commercially as a main base and using hexamethyldisilazane catalytic amount Excellent results were obtained. Second, also in the reaction yield, step 4 of the present invention, the reaction yield is 86% or 84%, the yield is significantly improved compared to 61% of the known technology. Third, in comparison with the front of the reactor, the known technique generates a considerable amount of unwanted isomers by thermodynamic control in THF solvent, but the method of the present invention generates isomers by performing kinetic control in CH 2 Cl 2 solvent. There is an advantage that eliminated fundamentally.
본 발명을 다음 실시예에 의하여 보다 상세히 설명하나, 본 발명이 이에 한정되는 것은 아니다.The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto.
실시예 1 : (2R, 3R)-에폭시부틸릭산의제조Example 1 Preparation of (2R, 3R) -Epoxybutylic Acid
7,5N-HCl 90ml를 냉각하고 여기에 L-트레오닌 20g(0.15몰)을 투입하여 완전히 용해시킨 후 반응온도를 5~10℃로 유지하면서 NaNO218.2g을 소량씩 5시간에 걸쳐 투입하였다. 상기 반응온도의 내부온도를 0℃로 냉각시키고 40% NaOH 용액을 서서히 적가한 후 실온에서 15시간 동안 교반한 다음, 반응온도의 상승을 억제하면서 6N-HCl로 산성화(pH 2.0)하고 에틸아세테이트 400ml씩 2회 추출한 다음 합쳐진 유기층을 망초 10g으로 건조한 후 감압농축하면 비교적 순수한 표제화합물 14.3g(90%)이 얻어진다. 이것은 더 이상의 정제과정없이 다음 반응에 사용하였다.After cooling 90 ml of 7,5N-HCl, 20 g (0.15 mol) of L-threonine was completely dissolved therein, 18.2 g of NaNO 2 was added in small portions over 5 hours while maintaining the reaction temperature at 5 to 10 ° C. After cooling the internal temperature of the reaction temperature to 0 ℃ and slowly added dropwise 40% NaOH solution and stirred for 15 hours at room temperature, acidified with 6N-HCl (pH 2.0) while inhibiting the increase of the reaction temperature and 400ml of ethyl acetate After extracting twice, the combined organic layers were dried over 10 g of forget-me-not and concentrated under reduced pressure to obtain 14.3 g (90%) of a relatively pure title compound. This was used for the next reaction without further purification.
1H-NMR(300MHz, CDCl3) δ ; 1.44(3H, d, J=5.33Hz), 3.38(1H, m), 1 H-NMR (300 MHz, CDCl 3 ) δ; 1.44 (3H, d, J = 5.33 Hz), 3.38 (1H, m),
3.57(1H, d, J=4.72Hz), 9~10(acid-H, brs) ppm.3.57 (1H, d, J = 4.72 Hz), 9-10 (acid-H, brs) ppm.
[α]D=-10.2(c=0.5, MeOH)[a] D = -10.2 (c = 0.5, MeOH)
실시예 2~6 : (2R, 3R)-에폭시부틸릭산의 제조Examples 2-6: Preparation of (2R, 3R) -Epoxybutylic Acid
출발물질로서 1당량의 L-트레오닌을 사용하고 실시예 1의 공정과 같이 반응을 진행시킨 결과 표제화합물이 하기 표 1의 수율로 얻어졌다.The reaction was carried out in the same manner as in Example 1 using 1 equivalent of L-threonine as a starting material, and the title compound was obtained in the yield shown in Table 1 below.
실시예 7 : 에틸 N-p-메톡시페닐 글리시네이트의 제조Example 7 Preparation of Ethyl N-p-methoxyphenyl Glycinate
p-아니시딘 20g(0.16몰)을 트리에틸아민 100ml에 가열 용해시키고 내부온도 50℃를 유지하면서 에틸클로로아세테이트 23.3ml(0.22몰)를 가하고 환류조건하에서 30분간 교반하였다. 반응이 종결된 후 반응 내부온도를 서서히 내리고 물/메탄올(2/1)용액 500ml를 가해 격렬하게 교반하면 엷은 황색을 띈 결정이 생성된다. 이렇게 생성된 고체를 감압여과한 후 진공건조하여 황갈색의 표제화합물을 순수하게 얻었다.20 g (0.16 mole) of p-anisidine was dissolved in 100 ml of triethylamine, and 23.3 ml (0.22 mole) of ethylchloroacetate was added while maintaining an internal temperature of 50 占 폚 and stirred for 30 minutes under reflux conditions. After completion of the reaction, the temperature inside the reaction is slowly lowered and vigorously stirred with 500 ml of water / methanol (2/1) solution to form pale yellow crystals. The solid thus produced was filtered under reduced pressure and dried in vacuo to afford the title compound as a tan.
1H-NMR(300MHz, CDCl3) δ ; 1.26(3H, t, J=7.2Hz), 3.74(3H, s), 3.86(2H, s), 4.23(2H, m), 6.6(2H, d, J=10Hz), 6.78(2H, d, J=10Hz) ppm. 1 H-NMR (300 MHz, CDCl 3 ) δ; 1.26 (3H, t, J = 7.2 Hz), 3.74 (3H, s), 3.86 (2H, s), 4.23 (2H, m), 6.6 (2H, d, J = 10 Hz), 6.78 (2H, d, J = 10 Hz) ppm.
실시예 8~12 : 알킬 N-p-메톡시페닐 글리시네이트의 제조Examples 8-12: Preparation of Alkyl N-p-methoxyphenyl Glycinate
p-아니시딘을 1당량 사용하고 알킬 할로 아세테이트를 1.33당량 사용했을 때 하기 표 2의 다양한 반응조건 하에서 표제화합물이 다음과 같은 수율로 얻어졌다.When 1 equivalent of p-anisidine and 1.33 equivalent of alkyl halo acetate were used, the title compound was obtained in the following yield under various reaction conditions shown in Table 2 below.
실시예 13 : (2R, 3R)-N-(에톡시카르보닐)메틸-N-p-메톡시페닐-2,3-에폭시 부틸릭아미드의 제조Example 13: Preparation of (2R, 3R) -N- (ethoxycarbonyl) methyl-N-p-methoxyphenyl-2,3-epoxy butyrylamide
(2R, 3R)-에폭시부틸릭산 14.3g(0.1몰)을 클로로포름 300ml에 용해시키고 -30℃로 냉각한 후 N-메틸몰폴린 20ml(0.18몰)을 가하고 에틸클로로포메이트 17.4ml(0.18몰)를 서서히 적가한 다음 30분간 강하게 교반하였다. 상기 용액에 실시예 7에서 합성된 에틸 N-p-메톡시페닐 글리시네이트 29.2g(0.14몰)을 투입하고 반응온도를 실온으로 올린 후 10시간 동안 교반하면 반응이 종결되는데 반응이 끝난 후 묽은 염산 적당량을 가해 유기층을 세척하고, 연속적으로 5% NaHCO3및 포화 소금물로 세척한 다음 망초로 건조하고 감압농축하면 불순한 표제화합물 45g이 얻어진다. 이렇게 얻어진 불순물 표제화합물 45g을 컬럼 크로마토그래피법(EA/Hex=1/2)으로 정제하여 순수한 미황색 오일상의 표제화합물 34.5g(84%)을 얻었다.14.3 g (0.1 mol) of (2R, 3R) -epoxybutylic acid was dissolved in 300 ml of chloroform, cooled to -30 ° C, 20 ml (0.18 mol) of N-methylmorpholine was added, and 17.4 ml (0.18 mol) of ethylchloroformate. Was slowly added dropwise and stirred vigorously for 30 minutes. 29.2 g (0.14 mol) of ethyl Np-methoxyphenyl glycinate synthesized in Example 7 was added to the solution and the reaction temperature was raised to room temperature, followed by stirring for 10 hours. The reaction was terminated. The organic layer was added, washed successively with 5% NaHCO 3 and saturated brine, dried over forget-me-not and concentrated under reduced pressure to yield 45 g of impure title compound. 45 g of the impurity title compound thus obtained was purified by column chromatography (EA / Hex = 1/2) to obtain 34.5 g (84%) of the title compound as a pure pale yellow oil.
1H-NMR(300MHz, CDCl3) δ ; 1.27(3H, t, J=7.2Hz), 1.42(3H, d, J=5.4Hz), 3.05(1H, m), 3.30(1H, d, J=4.5Hz), 3.83(3H, s), 4.14(1H, d, J=17.1Hz), 4.19(2H, q, J=7.2Hz), 4.66(1H, d, J=17.1Hz), 6.95(2H, d, J=10Hz), 7.29(2H, d, J=10Hz) ppm. 1 H-NMR (300 MHz, CDCl 3 ) δ; 1.27 (3H, t, J = 7.2 Hz), 1.42 (3H, d, J = 5.4 Hz), 3.05 (1H, m), 3.30 (1H, d, J = 4.5 Hz), 3.83 (3H, s), 4.14 (1H, d, J = 17.1 Hz), 4.19 (2H, q, J = 7.2 Hz), 4.66 (1H, d, J = 17.1 Hz), 6.95 (2H, d, J = 10 Hz), 7.29 (2H , d, J = 10 Hz) ppm.
실시예 14~21 : (2R, 3R)-N-(에톡시카르보닐)메틸-N-p-메톡시페닐-2,3-에폭시부틸릭아미드의 제조Examples 14-21: Preparation of (2R, 3R) -N- (ethoxycarbonyl) methyl-N-p-methoxyphenyl-2,3-epoxybutylarylamide
(2R, 3R)-에폭시부틸릭산을 1당량 사용하고 다양한 커플링 방법을 적용하여 실시예 13을 토대로 반응을 진행시킨 결과 표제화합물이 하기 표 3의 수율로 얻어졌다.The reaction was carried out based on Example 13 using 1 equivalent of (2R, 3R) -epoxybutylic acid and various coupling methods to obtain the title compound in the yield shown in Table 3.
실시예 22 : (3S, 4S)-3-[(1'R)-1'-히드록시에틸]-4-에톡시카르보닐-1-p-메톡시페닐-2-아제티디논의 제조Example 22 Preparation of (3S, 4S) -3-[(1'R) -1'-hydroxyethyl] -4-ethoxycarbonyl-1-p-methoxyphenyl-2-azetidinone
(방법 A)(Method A)
질소 존재하에서 에폭시아미드(IV) 20g(68밀리몰)을 THF 300ml에 용해시키고 ZnBr22.3g(10밀리몰)을 가한 다음 반응용액을 -10℃로 냉각시키고 1몰-리튬 헥사메틸디실라자이드 80ml(80밀리몰)를 빠르게 적가한 다음 반응온도를 서서히 0℃까지 올린 후 묽은 염산 적당량을 가해 반응을 종결시키고 디클로로메탄 600ml로 희석한 다음 유기층을 분리하고 10% NaHCO3용액 및 포화 소금물로 세척하고 감압농축하면 불순한 표제화합물이 얻어진다. 이 잔사를 짧은 관 크로마토그래피법(CH2Cl2/acetone=20/1)으로 정제하여 미황색의 침상결정상의 순수한 표제화합물 17.2g(86%)을 얻었다.20 g (68 mmol) of epoxyamide (IV) was dissolved in 300 ml of THF in the presence of nitrogen, 2.3 g (10 mmol) of ZnBr 2 were added, the reaction solution was cooled to -10 DEG C and 80 ml (1 mol-lithium hexamethyldisilazide). 80 mmol) was added drop wise and the reaction temperature was gradually raised to 0 ° C. and the reaction was terminated by adding an appropriate amount of dilute hydrochloric acid, diluted with 600 ml of dichloromethane. The organic layer was separated, washed with 10% NaHCO 3 solution and saturated brine, and concentrated under reduced pressure. This gives an impure title compound. The residue was purified by short column chromatography (CH 2 Cl 2 / acetone = 20/1) to give 17.2 g (86%) of the title compound as a slightly yellow needle.
1H-NMR(300MHz, CDCl3) δ ; 1.27(3H, t, J=7.2Hz), 1.39(3H, d, J=6.4Hz), 2.51(1H, d, J=4.5Hz), 3.36(1H, dd, J=2.5 and 4.0Hz), 3.77(3H, s), 4.27(2H, m), 4.35(1H, m), 4.57(1H, d, J=2.5Hz), 6.85(2H, d, J=10Hz), 7.23(2H, d, J=10Hz) ppm. 1 H-NMR (300 MHz, CDCl 3 ) δ; 1.27 (3H, t, J = 7.2 Hz), 1.39 (3H, d, J = 6.4 Hz), 2.51 (1H, d, J = 4.5 Hz), 3.36 (1H, dd, J = 2.5 and 4.0 Hz), 3.77 (3H, s), 4.27 (2H, m), 4.35 (1H, m), 4.57 (1H, d, J = 2.5 Hz), 6.85 (2H, d, J = 10 Hz), 7.23 (2H, d, J = 10 Hz) ppm.
(방법 B)(Method B)
질소 존재하에서 에폭시아미드(IV) 20g(68밀리몰)을 CH2Cl2400ml에 용해시키고 리튬아미드 3.1g(136 밀리몰)과 헥사메틸디실라잔 1.6ml(7.48 밀리몰)을 가한 후 환류가 시작되는 시점에 에탄올 1ml를 가한 다음 5시간 동안 환류시킨다. 반응이 완결된 후 상기(방법 A)의 후처리 방법과 동일하게 진행하여 순수한 표제화합물 14.4g(84%)을 얻었다.20 g (68 mmol) of epoxyamide (IV) was dissolved in 400 ml of CH 2 Cl 2 in the presence of nitrogen, and 3.1 g (136 mmol) of lithium amide and 1.6 ml (7.48 mmol) of hexamethyldisilazane were added to reflux. 1 ml of ethanol was added thereto and then refluxed for 5 hours. After the reaction was completed, the process was carried out in the same manner as the post-treatment method of (A) to obtain 14.4 g (84%) of the pure title compound.
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KR20020087500A (en) * | 2000-12-23 | 2002-11-23 | 주식회사대웅제약 | A process for preparing 3-substituted azetidinone |
WO2002100341A2 (en) * | 2001-06-12 | 2002-12-19 | Wellstat Therapeutics Corporation | Compounds for the treatment of metabolic disorders |
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GB8321004D0 (en) * | 1983-08-04 | 1983-09-07 | Erba Farmitalia | Azetidinones |
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JPH02306973A (en) * | 1989-05-19 | 1990-12-20 | Otsuka Pharmaceut Co Ltd | Production of carbonyl compound |
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-
1996
- 1996-08-24 KR KR1019960035355A patent/KR100205768B1/en active
-
1997
- 1997-04-29 KR KR1019970016152A patent/KR19980018088A/en not_active IP Right Cessation
- 1997-04-29 KR KR1019970016153A patent/KR100205769B1/en not_active IP Right Cessation
- 1997-04-30 WO PCT/KR1997/000071 patent/WO1998007690A1/en active Application Filing
- 1997-04-30 JP JP51060498A patent/JP4108130B2/en not_active Expired - Fee Related
- 1997-04-30 AU AU27132/97A patent/AU2713297A/en not_active Abandoned
- 1997-04-30 JP JP10510605A patent/JP2000516628A/en not_active Ceased
- 1997-04-30 AU AU27131/97A patent/AU2713197A/en not_active Abandoned
- 1997-04-30 WO PCT/KR1997/000072 patent/WO1998007691A1/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100654963B1 (en) * | 2004-08-24 | 2006-12-06 | 임광민 | Method for preparing an amide compound |
Also Published As
Publication number | Publication date |
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AU2713297A (en) | 1998-03-06 |
KR100205769B1 (en) | 1999-07-01 |
JP4108130B2 (en) | 2008-06-25 |
JP2000516628A (en) | 2000-12-12 |
KR100205768B1 (en) | 1999-07-01 |
WO1998007691A1 (en) | 1998-02-26 |
WO1998007690A1 (en) | 1998-02-26 |
AU2713197A (en) | 1998-03-06 |
JP2000516934A (en) | 2000-12-19 |
KR19980018088A (en) | 1998-06-05 |
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