KR102897660B1 - Sampling device, apparatus for sampling process particle comprising the sampling device and apparatus for monitoring process particle comprising the sampling device - Google Patents

Abstract

The present invention relates to a sampling mechanism, a process particle sampling device including the same, and a process particle monitoring device including the same.
A sampling device according to the present invention may include a feed-through rod extending in a longitudinal direction; a driving unit connected to one end of the feed-through rod and capable of rotating the feed-through rod; a holder body connected to the other end of the feed-through rod; and a TEM grid arranged on a side of the holder body so as to face a radial direction of the feed-through rod and provided in plurality and arranged along a circumferential direction of the feed-through rod.

Description

Sampling device, process particle sampling device including the same, and process particle monitoring device including the same {SAMPLING DEVICE, APPARATUS FOR SAMPLING PROCESS PARTICLE COMPRISING THE SAMPLING DEVICE AND APPARATUS FOR MONITORING PROCESS PARTICLE COMPRISING THE SAMPLING DEVICE}

The present invention relates to a sampling mechanism, a process particle sampling device including the same, and a process particle monitoring device including the same.

A device for analyzing process particles in a semiconductor or display manufacturing process is known.

For example, Patent Publication No. 10-0772488 discloses a particle measuring device and method. According to this, a particle focusing and accelerating unit (100) is used to focus and accelerate a gas containing particles, a particle charging unit (200) is used to charge the particles to saturation, a particle deflecting unit (300) is used to deflect the particles, and a particle counter (400) is used to measure the particle size distribution.

However, this method has the disadvantage of not being able to properly analyze the composition, size, shape, etc. of process particles in addition to the size distribution of the process particles. Therefore, a device capable of directly sampling process particles is required.

The purpose of the present invention is to provide a sampling mechanism capable of easily sampling process particles, a process particle sampling device including the same, and a process particle monitoring device including the same.

A sampling device according to the present invention may include a feed-through rod extending in a longitudinal direction; a driving unit connected to one end of the feed-through rod and capable of rotating the feed-through rod; a holder body connected to the other end of the feed-through rod; and a TEM grid arranged on a side of the holder body so as to face a radial direction of the feed-through rod and provided in plurality and arranged along a circumferential direction of the feed-through rod.

In addition, the holder body is formed into a polygon when viewed in the longitudinal direction of the feed-through rod, and the TEM grid can be placed in an area corresponding to each side of the polygon.

Additionally, the holder body may include a holder cover that at least partially covers an edge of the TEM grid and is detachably coupled to a side surface of the holder body.

Additionally, the TEM grids may be provided in multiples and arranged along the longitudinal direction of the feedthrough rod.

A process particle sampling device according to the present invention comprises: a vacuum chamber; a vacuum pump connected to the vacuum chamber; an aerodynamic lens for supplying process particles into the interior of the vacuum chamber; and a sampling device, wherein the sampling device comprises: a feed-through rod extending in a longitudinal direction; a driving unit connected to one end of the feed-through rod and capable of rotating the feed-through rod; a holder body coupled to the other end of the feed-through rod; and a TEM grid disposed on a side surface of the holder body so as to face a radial direction of the feed-through rod, and provided in plurality and arranged along a circumferential direction of the feed-through rod, wherein the TEM grid can be positioned on a path along which process particles supplied into the interior of the vacuum chamber by the aerodynamic lens proceed.

Additionally, the feedthrough load may be oriented perpendicular to the path.

In addition, it includes a pipe for introducing process particles from the outside; and a gate valve installed in the pipe, and the driving unit can operate in conjunction with the gate valve.

A process particle monitoring device according to an embodiment of the present invention comprises: a vacuum chamber; a vacuum pump connected to the vacuum chamber; an aerodynamic lens for supplying process particles into the interior of the vacuum chamber; an electron gun disposed at a rear end of the aerodynamic lens for electrically charging the process particles; a deflector disposed at a rear end of the electron gun for deflecting the process particles; a detector disposed at a rear end of the deflector for collecting the process particles and measuring their size distribution; and a sampling mechanism, wherein the sampling mechanism comprises: a feed-through rod extending in a longitudinal direction; a driving unit connected to one end of the feed-through rod and capable of rotating and moving the feed-through rod; a holder body coupled to the other end of the feed-through rod; And a TEM grid disposed on the side of the holder body so as to face the radial direction of the feed-through rod, and provided in multiple numbers and arranged along the circumferential direction of the feed-through rod, wherein the TEM grid may be positioned on the path along which process particles supplied into the interior of the vacuum chamber by the aerodynamic lens proceed.

Additionally, the sampling device may be installed between the electron gun and the deflector.

Additionally, the feedthrough load may be oriented perpendicular to the path.

In addition, it includes a pipe for introducing process particles from the outside; and a gate valve installed in the pipe, and the driving unit can operate in conjunction with the gate valve.

The sampling mechanism according to the present invention, the process particle sampling device including the same, and the process particle monitoring device including the same have a plurality of TEM grids arranged in a circumferential direction, so that process particles generated at a specific step among process progress steps are sampled using one TEM grid, and then the TEM grid is rotated using a driving unit to sample process particles of another step using an adjacent TEM grid, thereby easily sampling process particles of multiple steps sequentially.

Figure 1 is a schematic diagram of a sampling mechanism according to one embodiment of the present invention.
Figure 2 is a schematic diagram of a sampling mechanism according to another embodiment of the present invention.
Figure 3 is a schematic diagram of a process particle sampling device according to one embodiment of the present invention.
Figure 4 is a schematic diagram of a process particle monitoring device according to one embodiment of the present invention.

Referring to the drawings, a sampling mechanism according to an embodiment of the present invention, a process particle sampling device including the same, and a process particle monitoring device including the same are described in detail.

For reference, the sizes, ratios, shapes, etc. of components in the drawings may be somewhat exaggerated and distorted for convenience of illustration, and the scope of the present invention should not be considered to be limited thereby.

First, a sampling mechanism according to one embodiment of the present invention will be described.

Figure 1 is a schematic diagram of a sampling device (10) according to one embodiment of the present invention.

Referring to FIG. 1, the sampling mechanism (10) includes a feedthrough rod (11), a driving unit (12), a holder body (13), a TEM grid (14), and a holder cover (15).

The feed-through rod (11) extends straight. Hereinafter, the direction in which the feed-through rod (11) extends is referred to as the 'longitudinal direction', and 'radial direction', 'circumferential direction', etc. are defined based on this.

The driving unit (12) is connected to one end of the feed-through rod (11) and serves to rotate the feed-through rod (11) about a longitudinal central axis. For this purpose, the driving unit (12) may include, for example, a step motor. In addition, the driving unit (12) may serve to move the feed-through rod (11) in the longitudinal direction as needed. For this purpose, the driving unit (12) may include, for example, a linear actuator.

The holder body (13) is coupled to the other end of the feed-through rod (11) and moves together with the feed-through rod (11). In addition, the holder body (13) may be formed in a polygonal or circular shape when viewed in the longitudinal direction. In particular, the holder body (13) may be formed in a regular polygonal or circular shape and may be arranged concentrically to the other end of the feed-through rod (11). In the drawing, the holder body (13) is illustrated as being formed in a regular octagonal shape.

The TEM grid (14) is used to capture process particles, and its structure itself is substantially the same as that known or can be easily derived therefrom by a person skilled in the art, so a detailed description thereof will be omitted.

These TEM grids (14) are arranged on the side of the holder body (13) so as to face the radial direction. In addition, the TEM grids (14) are provided in multiples and arranged at specific intervals along the circumferential direction. For example, when the holder body (13) is formed in a polygon, the TEM grids (14) can be arranged in each area corresponding to each side of the polygon. In the drawing, the holder body (13) is formed in a regular octagon, and thus eight TEM grids (14) are provided and arranged at each point corresponding to the center of each side of the regular octagon.

The holder cover (15) at least partially covers the edge of the TEM grid (14) and is detachably coupled to the side of the holder body (13). Therefore, the TEM grid (14) can be fixed by the holder cover (15) being coupled to the holder body (13), and the TEM grid (14) can be separated by the holder cover (15) being disassembled from the holder body (13).

According to the aforementioned sampling mechanism (10), by arranging one of the plurality of TEM grids (14) so that it is positioned on the path along which the process particle to be sampled passes, the process particle can be sampled using the corresponding TEM grid (14). In addition, when sampling another process particle, by rotating the feed-through rod (11) at a specific angle using the driving unit (12), the TEM grid (14) adjacent to the previously used TEM grid (14) is positioned on the path, thereby easily sampling multiple process particles.

These effects will be more clearly revealed by the process particle sampling device and process particle monitoring device described later.

Figure 2 is a schematic diagram of a sampling device (10') according to another embodiment of the present invention.

In the case of the sampling device (10) according to one embodiment of the present invention described with reference to FIG. 1, if one set of TEM grids (14) arranged along the circumferential direction is provided in one stage, the sampling device (10') according to another embodiment of the present invention is different in that one set of TEM grids (14') arranged along the circumferential direction is provided in multiple stages.

More specifically, referring to FIG. 2, the sampling mechanism (10') includes a feedthrough rod (11'), a driving unit (12'), a holder body (13'), a TEM grid (14'), and a holder cover (15').

The feedthrough rod (11'), the driving unit (12'), the holder body (13') and the holder cover (15') of the sampling mechanism (10') according to another embodiment of the present invention are substantially the same as the feedthrough rod (11), the driving unit (12), the holder body (13) and the holder cover (15) of the sampling mechanism (10) according to one embodiment of the present invention, and even if there are any different parts, they correspond to the extent that a person skilled in the art would naturally expect to change them in response to the difference between the sampling mechanism (10) according to one embodiment of the present invention and the sampling mechanism (10') according to another embodiment of the present invention, and therefore, a repetitive description thereof will be omitted, and the following description will focus on the arrangement of the TEM grid (14').

The TEM grid (14') is placed on the side of the holder body (13') so as to face the radial direction. In addition, the TEM grid (14') is provided in multiples and arranged at specific intervals along the circumferential direction.

Furthermore, when TEM grids (14') arranged adjacently along the circumferential direction are referred to as a set, such sets are provided in multiples and arranged along the longitudinal direction. In the drawing, one set of TEM grids (14') arranged along the circumferential direction is illustrated as being arranged in three stages.

In other words, it can be said that TEM grids (14') are provided in multiples and arranged along the circumferential direction and along the longitudinal direction.

According to this sampling mechanism (10'), not only can the feed-through rod (11') be used while rotating it using the driving unit (12'), but the feed-through rod (11') can also be used while moving it using the driving unit (12'), so that more and more process particles can be sampled in a variety of ways.

Next, a process particle sampling device according to one embodiment of the present invention will be described.

FIG. 3 is a schematic diagram of a process particle sampling device (100) according to one embodiment of the present invention.

Referring to FIG. 3, the process particle sampling device (100) includes a vacuum chamber (110), a pipe (121), a gate valve (122), a pressure regulating valve (123), a vacuum pump (131), a vacuum gauge (132), an aerodynamic lens (140), a sampling mechanism, and a control unit (not shown). Here, the sampling mechanism may be a sampling mechanism (10) according to an embodiment of the present invention described with reference to FIG. 1, or a sampling mechanism (10') according to another embodiment of the present invention described with reference to FIG. 2. The former is illustrated in the drawing, and for convenience, the following description will focus on the latter.

A pipe (121) is connected to a process chamber (not shown), a fore-line (not shown), etc., and serves to introduce a gas containing process particles (hereinafter referred to as “measured gas”) therefrom. A gate valve (122) is installed in the pipe (121) and serves to determine the opening and closing of the pipe (121), and a pressure control valve (123) is installed in the pipe (121) and serves to control the pressure of the pipe (121) and thereby control the sampling flow rate.

The vacuum pump (131) is connected to the vacuum chamber (110) and serves to maintain the pressure of the vacuum chamber (110) lower than the pressure of the gas to be measured, for example, 1 torr or less. In addition, among the gas to be measured supplied to the vacuum chamber (110) by the aerodynamic lens (140), process particles proceed as is due to inertia, and the remaining gas components are discharged to the outside by the vacuum pump (131). The vacuum gauge (132) measures the pressure of the vacuum chamber (110). The pressure of the vacuum chamber (110) measured by the vacuum gauge (132) is transmitted to the control unit, and the control unit can control the vacuum pump (131) based on the pressure.

The aerodynamic lenses (140) are arranged in multiple stages and serve to focus and accelerate the measured gas. The measured gas, including process particles, is focused and accelerated as it passes through the aerodynamic lenses (140), and ultimately the particles are supplied to the vacuum chamber (110) in the form of a beam. In this way, since the measured gas proceeds in the form of a beam, the dispersion of the process particles can be prevented as much as possible. At this time, the faster the speed of the measured gas, the more the dispersion of the process particles is reduced, so it is preferable that the measured gas is accelerated to a subsonic or transonic speed. The acceleration of the measured gas is achieved by the pressure difference between the measured gas and the pressure of the vacuum chamber (110) and the nozzle at the end of the aerodynamic lenses (140).

The sampling mechanism (10) includes a feedthrough rod (11), a driving unit (12), a holder body (13), a TEM grid (14), and a holder cover (15), as described above, and a repetitive description thereof will be omitted.

The feedthrough rod (11) can be oriented perpendicular to the path along which process particles supplied to the vacuum chamber (110) by the aerodynamic lens (140) proceed. Additionally, any one of the plurality of TEM grids (14) can be positioned on the path so as to face the aerodynamic lens (140).

Accordingly, the process particle can be sampled using the TEM grid (14), and when other process particles are to be sampled, the drive unit (12) is used to rotate the feed-through rod (11) at a specific angle, so that the TEM grid (14) adjacent to the previously used TEM grid (14) is positioned on the path to face the aerodynamic lens (140), thereby easily sampling multiple process particles. If the sampling mechanism (10') according to another embodiment of the present invention is employed, the feed-through rod (11') can be further used by moving it using the drive unit (12').

Meanwhile, the control unit can control the gate valve (122) based on the process steps performed in the process chamber. Furthermore, the control unit can control the driving unit (12) in conjunction with the gate valve (122). For example, when a cleaning step, a seasoning step, a deposition step, etc. are sequentially performed for a CVD (Chemical Vapor Deposition) process, the control unit can open the gate valve (122) at a desired time in the cleaning step, sample the process particles generated in the cleaning step using a TEM grid (14), close the gate valve (122), and rotate the feedthrough rod (11) at a specific angle using the driving unit (12). Next, the control unit can open the gate valve (122) again at a desired time in the seasoning step, sample the process particles generated in the seasoning step using another TEM grid (14), close the gate valve (122), and rotate the feedthrough rod (11) at a specific angle using the driving unit (12). Likewise, the control unit can open the gate valve (122) at a desired point in the deposition step to sample process particles generated in the deposition step using another TEM grid (14), then close the gate valve (122) and rotate the feedthrough rod (11) at a specific angle using the drive unit (12). In this way, process particles generated in each process step can be automatically and easily sampled.

Finally, a process particle monitoring device according to one embodiment of the present invention is described.

Figure 4 is a schematic diagram of a process particle monitoring device (200) according to one embodiment of the present invention.

Referring to FIG. 4, the process particle monitoring device (200) includes a first vacuum chamber (210A), a second vacuum chamber (210B), a skimmer (211), a pipe (221), a gate valve (222), a pressure regulating valve (223), a first vacuum pump (231A), a second vacuum pump (231B), a first vacuum gauge (232A), a second vacuum gauge (232B), an aerodynamic lens (240), an electron gun (251), a skimmer (211), a deflector (252), a detector (253), a sampling mechanism, and a control unit (not shown). Here, the sampling mechanism may be a sampling mechanism (10) according to one embodiment of the present invention described with reference to FIG. 1, or may be a sampling mechanism (10') according to another embodiment of the present invention described with reference to FIG. 2. The former is illustrated in the drawing, and for convenience, the following description will focus on the latter.

The first vacuum chamber (210A) and the second vacuum chamber (210B) are connected in series with a skimmer (211) between them. The first vacuum chamber (210A) has a lower pressure than the second vacuum chamber (210B), and thus acts as a buffer for the second vacuum chamber (210B).

The pipe (221) is connected to a process chamber (not shown), a fore-line (not shown), etc., and serves to introduce a gas containing process particles (i.e., a gas to be measured).

A gate valve (222) is installed in a pipe (221) and serves to determine the opening and closing of the pipe (221), and a pressure control valve (223) is installed in a pipe (221) and serves to control the sampling flow rate by controlling the pressure of the pipe (221).

The first vacuum pump (231A) is connected to the first vacuum chamber (210A) and serves to maintain the pressure of the first vacuum chamber (210A) at, for example, 1 torr or less. In addition, among the measured gas supplied to the first vacuum chamber (210A) by the aerodynamic lens (240), process particles proceed as is due to inertia, and the remaining gas components are discharged to the outside by the first vacuum pump (231A). The second vacuum pump (231B) is connected to the second vacuum chamber (210B) and serves to maintain the pressure of the second vacuum chamber (210B) at, for example, approximately 10 ^-3 torr. The first vacuum gauge (232A) measures the pressure of the first vacuum chamber (210A), and the second vacuum gauge (232B) measures the pressure of the second vacuum chamber (210B). The pressure of the first and second vacuum chambers (210A, B) measured by the first and second vacuum gauges (232A, B) is transmitted to the control unit, and the control unit can control the first and second vacuum pumps (231A, 231B) based on the pressure.

The aerodynamic lenses (240) are arranged in multiple stages and serve to focus and accelerate the gas to be measured. The gas to be measured, including process particles, is focused and accelerated as it passes through the aerodynamic lenses (240), and the particles are ultimately supplied to the first vacuum chamber (210A) in the form of a beam.

The electron gun (251) is arranged at the rear end of the aerodynamic lens (240) inside the second vacuum chamber (210B) and serves to electrically charge process particles that have passed through the skimmer (211). The deflector (252) is arranged at the rear end of the electron gun (251) and is oriented at an angle of 45° to the direction in which the process particles travel, and serves to deflect the process particles by 90° through electrostatic force. The detector (253) is arranged at the rear end of the deflector (252) and serves to capture process particles and measure their size distribution. However, the structure and principle of the electron gun (251), deflector (252), detector (253), etc. are substantially the same as those disclosed in the background art patent publication No. 10-0772488 or other publicly known technologies, or are such that a person skilled in the art can easily derive them therefrom, so a detailed description thereof will be omitted.

The sampling mechanism (10) includes a feedthrough rod (11), a driving unit (12), a holder body (13), a TEM grid (14), and a holder cover (15), as described above, and a repetitive description thereof will be omitted.

In the process particle monitoring device (200), when sampling process particles, the drive unit (12) is used to pull out the feedthrough rod (11) into the vacuum chamber, and any one of the plurality of TEM grids (14) is positioned on the path along which the process particles to be sampled pass, thereby allowing the process particles to be sampled using the corresponding TEM grid (14). In addition, when sampling other process particles, the drive unit (12) is used to rotate the feedthrough rod (11) at a specific angle, and the TEM grid (14) adjacent to the previously used TEM grid (14) is positioned on the path, thereby allowing for easy sampling of multiple process particles. If the sampling mechanism (10') according to another embodiment of the present invention is employed, the feedthrough rod (11') can be further used by moving it using the drive unit (12').

On the other hand, when there is no need to sample process particles or to monitor process particles in real time through a detector (253), a feedthrough rod (11) can be introduced from inside the vacuum chamber using a driving unit (12) so that the TEM grid (14) is positioned away from the path.

This sampling mechanism (10) may be placed inside the first vacuum chamber (210A), between the aerodynamic lens (240) and the electron gun (251), or may be placed inside the second vacuum chamber (210B), between the electron gun (251) and the deflector (252). The latter is illustrated in the drawing.

Meanwhile, the control unit can control the gate valve (222) based on the process steps performed in the process chamber. In addition, the control unit can control the driving unit (12) in conjunction with the gate valve (222). For example, when a cleaning step, a seasoning step, a deposition step, etc. are sequentially performed for a CVD process, the control unit can open the gate valve (222) at a desired time in the cleaning step, sample the process particles generated in the cleaning step using a TEM grid (14), close the gate valve (222), and rotate the feedthrough rod (11) at a specific angle using the driving unit (12). Next, the control unit can open the gate valve (222) again at a desired time in the seasoning step, sample the process particles generated in the seasoning step using another TEM grid (14), close the gate valve (222), and rotate the feedthrough rod (11) at a specific angle using the driving unit (12). Likewise, the control unit can open the gate valve (222) at a desired point in the deposition step to sample process particles generated in the deposition step using another TEM grid (14), then close the gate valve (222) and rotate the feed-through rod (11) at a specific angle using the drive unit (12). In this way, process particles generated in each process step can be automatically and easily sampled. In addition, by withdrawing/introducing the feed-through rod (11) using the drive unit (12) before and after sampling, sampling and monitoring of process particles can be selectively operated.

The sampling device (10, 10') described above, the process particle sampling device (100) including the same, and the process particle monitoring device (200) including the same are only one of the sampling device, the process particle sampling device including the same, and the process particle monitoring device including the same according to various embodiments of the present invention. In addition, the contents omitted to avoid excessive repetition while describing the process particle sampling device (100) may be supplemented by referring to the configurations of the sampling device (10, 10') mentioned above, and the contents omitted to avoid excessive repetition while describing the process particle monitoring device (200) may also be supplemented by referring to the configurations of the sampling device (10, 10') or the process particle sampling device (100) mentioned above. In this way, the technical idea of the present invention is not limited to the above embodiments, but includes all ranges that can be easily modified by a person having ordinary skill in the art to which the present invention pertains, as described in the claims.

Claims (12)

delete delete delete delete delete delete delete delete vacuum chamber,
A vacuum pump connected to the above vacuum chamber,
An aerodynamic lens for supplying process particles into the interior of the vacuum chamber;
An electron gun, placed at the rear of the aerodynamic lens, for electrically charging process particles;
A deflector placed at the rear end of the above electron gun to redirect process particles,
A detector is placed at the rear end of the above electron gun to capture process particles and measure their size distribution.
Includes a sampling device,
The above sampling device
A feed-through rod extending longitudinally,
A driving unit connected to one end of the above feed-through rod and capable of rotating and moving the above feed-through rod,
A holder body coupled to the other end of the above feed-through rod, and
A TEM grid arranged on the side of the holder body so as to face the radial direction of the feed-through rod, and provided in multiple numbers and arranged along the circumferential direction of the feed-through rod; and
A holder cover that at least partially covers the edge of each of a plurality of TEM grids arranged in multiple stages along the circumferential and longitudinal directions of the feed-through rod and is detachably coupled to the side of the holder body,
A process particle monitoring device in which the TEM grid is positioned on a path along which process particles supplied into the interior of the vacuum chamber by the aerodynamic lens travel by moving the feedthrough rod using the driving unit, thereby sampling process particles using the TEM grid, or the TEM grid is positioned away from the path, thereby monitoring process particles using the detector. In paragraph 9,
The above sampling mechanism is a process particle monitoring device installed between the electron gun and the deflector. In paragraph 9,
The above feedthrough load is a process particle monitoring device oriented perpendicular to the path. In paragraph 9,
Piping for introducing process particles from outside and
Including a gate valve installed in the above pipe,
The above driving unit is a process particle monitoring device that operates in conjunction with the gate valve.