KR102848148B1 - Deposition apparatus - Google Patents

Abstract

The deposition apparatus comprises a frame structure including a crucible containing membranes defining receiving spaces and a lower frame formed with supports that heat the crucible and overlap the membranes.

Description

Deposition apparatus {DEPOSITION APPARATUS}

The present invention relates to a deposition apparatus. More specifically, the present invention relates to a deposition apparatus used in a process for manufacturing a display device.

The display device has a structure in which a plurality of thin films are laminated, and the thin films can be formed through a deposition process or the like. For example, the deposition process can be performed through a deposition device including a crucible and a frame structure. When a deposition material is placed inside the crucible and heated, the evaporated deposition material is sprayed through a nozzle and deposited on a target substrate.

During the above deposition process, it is desirable for the deposition material to be uniformly evaporated. Accordingly, it is necessary to ensure that the heat applied to the deposition material is uniform. However, depending on the position of the crucible, the heat applied to the deposition material is not uniform, resulting in a defect in which the deposition material is differentially consumed depending on the position of the crucible.

Additionally, if the deposition material is solid rather than liquid, the deposition material does not move within the crucible. Consequently, there is a problem in which the differential exhaustion defect is further accelerated.

An object of the present invention is to provide a deposition device capable of uniformly transferring heat to a crucible.

However, the purpose of the present invention is not limited to the purpose described above, and may be expanded in various ways without departing from the spirit and scope of the present invention.

In order to achieve the above-described object of the present invention, a deposition apparatus according to one embodiment of the present invention may include a frame structure including a crucible including separators defining accommodation spaces and a lower frame formed with support members overlapping the separators and heating the crucible.

In one embodiment, each of the supports may overlap each of the separators.

In one embodiment, the separators may be arranged in parallel along the first direction, and the supports may be arranged in parallel along the first direction.

In one embodiment, the width of the separators in the first direction may be the same as the width of the supports in the first direction.

In one embodiment, each of the separators may extend in a second direction intersecting the first direction, and each of the supports may extend in the second direction.

In one embodiment, the frame structure further includes a side frame adjacent to a side of the crucible, and the lower frame and the side frame may comprise metal.

In one embodiment, the deposition device may further include a heater fixed to the side frame.

In one embodiment, heat generated from the heater is transferred to the supports through the side frame, and the separators can be indirectly heated by the heat transferred to the supports.

In one embodiment, each of the separators may have an opening formed therein to communicate between the receiving spaces.

In one embodiment, the lower frame may further include a lower cover plate positioned between the supports.

In one embodiment, the frame structure may further include a side frame adjacent to a side of the crucible and a cooling device formed within the side frame.

In one embodiment, the deposition device further includes a heater fixed to the side frame, and heat generated from the heater may not be transferred to the supports by the cooling device.

In one embodiment, the frame structure further includes a side frame adjacent to a side of the crucible, wherein the supports may have a thermal conductivity less than a thermal conductivity of the side frame.

In one embodiment, the side frame may comprise metal, and the supports may comprise ceramic.

In one embodiment, the side frame may comprise metal, and the supports may comprise plastic.

A deposition apparatus according to embodiments of the present invention may include a crucible and a frame structure. The crucible may vaporize and spray a deposition material, and the frame structure may support the crucible and apply heat to the crucible. The crucible may include separators defining receiving spaces, and the frame structure may include a lower frame having support members formed therein. The support members may overlap the separators.

When heat generated from the heater is transferred to the support portions, the separators can be indirectly heated by the heat transferred to the support portions. According to the present invention, since the support portions and the separators all overlap, the separators can be uniformly heated. In addition, since the support portions do not overlap the receiving spaces, the heat radiated from the support portions may not be directly transferred toward the deposition material received in the receiving spaces. Accordingly, the thermal gradient applied to the deposition material can be made more uniform, and differential exhaustion of the deposition material depending on the position of the crucible can be prevented. Accordingly, the film formation uniformity of the manufacturing process using the crucible can be improved, and the margin due to the differential exhaustion can be reduced.

However, the effects of the present invention are not limited to the above-described effects, and may be expanded in various ways without departing from the spirit and scope of the present invention.

FIG. 1 is a cross-sectional view illustrating a deposition device according to a first embodiment of the present invention.
Fig. 2 is a side view for explaining the deposition device of Fig. 1.
Figure 3 is a rear view illustrating the crucible and lower frame included in the deposition device of Figure 1.
Fig. 4 is a cross-sectional view illustrating a deposition device according to a second embodiment of the present invention.
Fig. 5 is a drawing for explaining the separation membranes included in the deposition device of Fig. 4.
Figure 6 is a cross-sectional view illustrating a deposition device according to a third embodiment of the present invention.
Fig. 7 is a side view for explaining the deposition device of Fig. 6.
Fig. 8 is a cross-sectional view illustrating a deposition device according to a fourth embodiment of the present invention.
Fig. 9 is a side view for explaining the deposition device of Fig. 8.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the attached drawings. Identical components in the drawings will be designated by the same reference numerals, and redundant descriptions of identical components will be omitted.

FIG. 1 is a cross-sectional view for explaining a deposition apparatus according to a first embodiment of the present invention, FIG. 2 is a side view for explaining the deposition apparatus of FIG. 1, and FIG. 3 is a rear view for explaining a crucible and a lower frame included in the deposition apparatus of FIG. 1.

Referring to FIGS. 1 and 2, a deposition device (1000) according to a first embodiment of the present invention may include a crucible (100), a frame structure (200), a heater (300), and a nozzle unit (400).

The crucible (100) may include a crucible frame (110) and separators (120). The crucible frame (110) may constitute a side and a bottom portion forming the outer shape of the crucible (100). The separators (120) may be installed at the bottom of the crucible frame (110) and may define accommodation spaces (130). In other words, a plurality of accommodation spaces (130) may be defined in the crucible (100) by the separators (120).

In one embodiment, the crucible frame (110) and the separators (120) may be formed of a metal, plastic, ceramic, or the like having a required thermal conductivity. For example, the crucible frame (110) and the separators (120) may be formed of a metal such as stainless steel (SUS), aluminum, titanium, or copper, or a plastic such as polyethylene (PE), polypropylene (PP), or polycarbonate (PC), or a ceramic such as alumina, silicon carbide, or silicon dioxide.

In one embodiment, the separators (120) may include a first separator (121), a second separator (122), and a third separator (123). The first to third separators (121, 122, 123) may be arranged in parallel along a first direction (D1). In addition, the receiving spaces (130) may have a rectangular container shape arranged in parallel along the first direction (D1).

Each of the above-described receiving spaces (130) can accommodate a deposition material (DM). The deposition material (DM) can include a high molecular organic material, a low molecular organic material, a polymer, an inorganic material, etc., and can be in a solid or liquid state. When heat is applied to the deposition material (DM) through the crucible (100), the deposition material (DM) can liquefy or sublimate and change into a gas, and can be deposited on a target substrate.

The above frame structure (200) may include a side frame (210) and a lower frame (220). The crucible (100) is placed inside the frame structure (200), and the frame structure (200) may cover the side and lower portions of the crucible (100).

In one embodiment, the side frame (210) and the lower frame (220) may be formed of a metal, plastic, ceramic, or the like having a required thermal conductivity. For example, the side frame (210) and the lower frame (220) may be formed of a metal such as stainless steel (SUS), aluminum, titanium, copper, or the like, or a plastic such as polyethylene (PE), polypropylene (PP), or polycarbonate (PC), or a ceramic such as alumina, silicon carbide, or silicon dioxide. In one embodiment, the side frame (210) and the lower frame (220) may include the same stainless steel (SUS).

The side frame (210) may be adjacent to a side of the crucible (100). For example, the side frame (210) may have a rectangular shape having a long side extending in the first direction (D1) and a short side extending in a second direction (D2) intersecting the first direction (D1) so as to correspond to the side of the crucible (100) on a plane, and may have a height in a third direction (D3) intersecting the first and second directions (D1, D2).

A heater (300) can be fixed to the side frame (210), and the side frame (210) can be connected to the lower frame (220). Heat generated from the heater (300) can be transferred to the lower frame (220) through the side frame (210).

The above lower frame (220) may include support members (230) and a lower cover plate (240).

In one embodiment, the support members (230) may include a first support member (231), a second support member (232), and a third support member (233). The first to third support members (231, 232, 233) may be arranged in parallel along the first direction (D1).

In one embodiment, the support portions (230) may overlap with the separators (120), respectively. In other words, the first support portion (231) may overlap with the first separator (121), the second support portion (232) may overlap with the second separator (122), and the third support portion (233) may overlap with the third separator (123). Accordingly, each of the support portions (230) may overlap with each of the separators (120).

When the heat generated from the heater (300) is transferred to the support parts (230) through the side frame (210), the separators (120) can be indirectly heated by the heat transferred to the support parts (230). According to the present invention, since the support parts (230) and the separators (120) both overlap, the separators (120) can be uniformly heated. In addition, since the support parts (230) do not overlap the receiving spaces (130), the heat emitted from the support parts (230) may not be directly transferred toward the deposition material (DM) received in the receiving spaces (130). Accordingly, the heat gradient applied to the deposition material (DM) can become more uniform, and differential exhaustion of the deposition material (DM) depending on the position of the crucible (100) can be prevented. Accordingly, the film uniformity of the manufacturing process using the above crucible (100) can be improved, and the margin due to differential exhaustion can be reduced.

The lower shielding plate (240) may be positioned between the support members (230). The lower shielding plate (240) may release heat accumulated between the crucible (100) and the frame structure (200). In one embodiment, the lower shielding plate (240) may include the same material as the support members (230). In this case, the thickness of the lower shielding plate (240) may be smaller than the thickness of the support members (230), or an opening may be formed in the lower shielding plate (240) to release heat.

The heater (300) may be fixed to the side frame (210) of the frame structure (200). When heat generated from the heater (300) is applied to the crucible (100), the deposition material (DM) accommodated inside the crucible (100) may be heated. The heater (300) may be fixed in various structures capable of heating the deposition material (DM). For example, the heater (300) may include a first heater extending in the first direction (D1) and a second heater extending in the second direction (D2) so as to correspond to a side of the crucible (100) on a plane.

The nozzle unit (400) may be placed on the upper portion of the crucible (100). The nozzle unit (400) may include a nozzle (410), through which the vaporized deposition material (DM) may be sprayed. Accordingly, the nozzle (410) may be placed to correspond to the receiving spaces (130).

Referring to FIG. 3, the crucible (100) may include the separators (120) arranged in parallel in the first direction (D1), and the frame structure (200) may include the support members (230) arranged in parallel in the first direction (D1). The separators (120) and the support members (230) may overlap each other.

In one embodiment, the first width (W1) of each of the separators (120) in the first direction (D1) may be substantially equal to the second width (W2) of each of the support portions (230) in the first direction (D1). In addition, each of the separators (120) may extend in the second direction (D2), and each of the support portions (230) may extend in the second direction (D2). Accordingly, the separators (120) and the support portions (230) may overlap.

FIG. 4 is a cross-sectional view for explaining a deposition device according to a second embodiment of the present invention, and FIG. 5 is a drawing for explaining separation membranes included in the deposition device of FIG. 4.

Referring to FIGS. 4 and 5, a deposition apparatus (2000) according to a second embodiment of the present invention may include a crucible (100), a frame structure (200), a heater (300), and a nozzle unit (400). The crucible (100) may include a crucible frame (110) and separators (120). The deposition apparatus (2000) may be substantially the same as the deposition apparatus (1000) described above with reference to FIGS. 1 to 3, except for the separators (120).

In one embodiment, the separators (120) may include a first separator (121), a second separator (122), and a third separator (123). The first to third separators (121, 122, 123) may be arranged in parallel along a first direction (D1). In addition, the receiving spaces (130) may have a rectangular container shape arranged in parallel along the first direction (D1).

In one embodiment, an opening (OP) may be formed in each of the separators (120) to communicate between the accommodation spaces (130). The accommodation spaces (130) may be communicated with each other through the opening (OP). Accordingly, the deposition material (DM) may move between the accommodation spaces (130) through the opening (OP). Accordingly, as the deposition material (DM) moves to the accommodation space where the deposition material (DM) is relatively quickly vaporized, differential exhaustion of the deposition material (DM) that may occur between the accommodation spaces (130) may be prevented.

In addition, as described above, the support members (230) may overlap the separators (120). Accordingly, the thermal gradient applied to the deposition material (DM) may become more uniform. Accordingly, even when the solid deposition material (DM) that does not move through the opening (OP) is used, differential exhaustion of the deposition material (DM) may be prevented.

FIG. 6 is a cross-sectional view for explaining a deposition device according to a third embodiment of the present invention, and FIG. 7 is a side view for explaining the deposition device of FIG. 6.

Referring to FIGS. 6 and 7, a deposition apparatus (3000) according to a third embodiment of the present invention may include a crucible (100), a frame structure (200), a heater (300), a nozzle unit (400), and a cooling device (CLU). The deposition apparatus (3000) may be substantially the same as the deposition apparatus (1000) described above with reference to FIGS. 1 to 3, except for the cooling device (CLU).

In one embodiment, the deposition device (3000) may include the cooling unit (CLU). The cooling unit (CLU) may be formed within the side frame (210) of the frame structure (200). For example, a cooling water channel may be installed within the side frame (210), and cooling water (process cooling water, PCW) may be supplied to the cooling water channel.

The heat generated from the heater (300) by the cooling device (CLU) may not be transferred to the side frame (210) and the support members (230). Accordingly, the separators (120) may not receive heat from the support members (230), and the heat gradient applied to the deposition material (DM) may become more uniform.

Also, in one embodiment, as illustrated in FIG. 6, the support members (230) may overlap the separators (120), but the present invention is not limited thereto. For example, in another embodiment, the support members (230) may not overlap the separators (120). Even if the support members (230) do not overlap the separators (120), since the deposition apparatus (3000) includes the cooling apparatus (CLU), the thermal gradient applied to the deposition material (DM) may become more uniform.

FIG. 8 is a cross-sectional view for explaining a deposition device according to a fourth embodiment of the present invention, and FIG. 9 is a side view for explaining the deposition device of FIG. 8.

Referring to FIGS. 8 and 9, a deposition apparatus (4000) according to a fourth embodiment of the present invention may include a crucible (100), a frame structure (200), a heater (300), and a nozzle unit (400). The frame structure (200) may include a side frame (210) and a lower frame (220), and the lower frame (220) may include support members (230) and a lower cover plate (240). The deposition apparatus (4000) may be substantially the same as the deposition apparatus (1000) described above with reference to FIGS. 1 to 3, except for the support members (230).

In one embodiment, the thermal conductivity of the support members (230) may be less than the thermal conductivity of the side frame (210). For example, the side frame (210) may be formed of a metal such as stainless steel (SUS), aluminum, titanium, or copper.

In one embodiment, the support members (230) of the lower frame (220) may be formed of a plastic such as polyethylene (PE), polypropylene (PP), or polycarbonate (PC). In another embodiment, the support members (230) may be formed of a ceramic such as alumina, silicon carbide, or silicon dioxide. Since the support members (230) are formed of a material having a relatively low thermal conductivity, heat generated from the heater (300) may not be smoothly transferred to the support members (230). Accordingly, the separators (120) may not receive heat from the support members (230), and the thermal gradient applied to the deposition material (DM) may become more uniform.

In addition, in one embodiment, as illustrated in FIG. 8, the support portions (230) may overlap the separators (120), but the present invention is not limited thereto. For example, in another embodiment, the support portions (230) may not overlap the separators (120). Even if the support portions (230) do not overlap the separators (120), since the support portions (230) are formed of a material having a relatively low thermal conductivity, the thermal gradient applied to the deposition material (DM) may become more uniform.

Although the present invention has been described with reference to exemplary embodiments thereof, it will be understood by those skilled in the art that various modifications and changes may be made to the present invention without departing from the spirit and scope of the present invention as set forth in the claims below.

The present invention can be applied to deposition devices and display devices manufactured using the same. For example, the present invention can be applied to processes for manufacturing high-resolution smartphones, mobile phones, smart pads, smart watches, tablet PCs, vehicle navigation systems, televisions, computer monitors, laptops, and the like.

Although the present invention has been described above with reference to exemplary embodiments thereof, it will be understood by those skilled in the art that various modifications and changes may be made to the present invention without departing from the spirit and scope of the present invention as set forth in the following claims.

1000: Deposition device 100: Crucible
110: Crucible Frame 120: Separators
130: Accommodation spaces 200: Frame structures
210: Side frame 220: Lower frame
230: Supports 240: Lower cover
300: Heater 400: Nozzle

Claims (15)

A crucible containing membranes defining the receiving spaces; and
A frame structure including a lower frame formed with supports that heat the crucible and overlap the separators,
The above lower frame further includes a lower cover plate positioned between the above supports,
A deposition device characterized in that the thickness of the lower cover plate is smaller than the thickness of each of the support parts. A deposition device, characterized in that in the first paragraph, each of the support parts overlaps each of the separators. In the first paragraph, the separators are arranged in parallel along the first direction,
A deposition device characterized in that the above supports are arranged in parallel along the first direction. A deposition device, characterized in that in the third paragraph, the width of the separators in the first direction is the same as the width of the supports in the first direction. In the third paragraph, each of the separators extends in a second direction intersecting the first direction,
A deposition device, characterized in that each of the above support members extends in the second direction. In the first paragraph, the frame structure further includes a side frame adjacent to the side of the crucible,
A deposition device, characterized in that the lower frame and the side frame comprise metal. In paragraph 6,
A deposition device further comprising a heater fixed to the side frame. In the seventh paragraph, heat generated from the heater is transmitted to the supports through the side frame,
A deposition device characterized in that the separators are indirectly heated by the heat transferred to the support members. A deposition device characterized in that in the first paragraph, each of the separation membranes has an opening formed therein for communicating between the receiving spaces. delete In the first paragraph, the frame structure
A side frame adjacent to the side of the above crucible; and
A deposition device characterized in that it further includes a cooling device formed within the side frame. In Article 11,
Further comprising a heater fixed to the side frame,
A deposition device characterized in that heat generated from the heater is not transferred to the supports by the cooling device. In the first paragraph, the frame structure further includes a side frame adjacent to the side of the crucible,
A deposition device characterized in that the above supports have a thermal conductivity lower than the thermal conductivity of the side frame. In the 13th paragraph, the side frame comprises metal,
A deposition device characterized in that the above supports include ceramic. In the 13th paragraph, the side frame comprises metal,
A deposition device characterized in that the above supports comprise plastic.