KR102770715B1 - Light Conversion Ink Composition, Color Filter and Display Device - Google Patents
Light Conversion Ink Composition, Color Filter and Display Device Download PDFInfo
- Publication number
- KR102770715B1 KR102770715B1 KR1020200039365A KR20200039365A KR102770715B1 KR 102770715 B1 KR102770715 B1 KR 102770715B1 KR 1020200039365 A KR1020200039365 A KR 1020200039365A KR 20200039365 A KR20200039365 A KR 20200039365A KR 102770715 B1 KR102770715 B1 KR 102770715B1
- Authority
- KR
- South Korea
- Prior art keywords
- ink composition
- photoconversion
- present
- color filter
- photoconversion ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 81
- 238000006243 chemical reaction Methods 0.000 title description 7
- 239000002096 quantum dot Substances 0.000 claims abstract description 73
- 239000000178 monomer Substances 0.000 claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims description 51
- 239000000126 substance Substances 0.000 claims description 38
- 239000002245 particle Substances 0.000 claims description 27
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 26
- 239000003999 initiator Substances 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 9
- 239000004094 surface-active agent Substances 0.000 claims description 9
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 239000003963 antioxidant agent Substances 0.000 claims description 3
- 230000003078 antioxidant effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 32
- 238000004519 manufacturing process Methods 0.000 abstract description 22
- 230000003287 optical effect Effects 0.000 abstract description 21
- 230000008569 process Effects 0.000 abstract description 17
- 230000007774 longterm Effects 0.000 abstract description 7
- 238000007641 inkjet printing Methods 0.000 abstract description 4
- -1 1-methylpentyl Chemical group 0.000 description 20
- 239000000758 substrate Substances 0.000 description 19
- 239000006185 dispersion Substances 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 17
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000000654 additive Substances 0.000 description 7
- 239000011258 core-shell material Substances 0.000 description 7
- 239000003085 diluting agent Substances 0.000 description 7
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 5
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 5
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 5
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 5
- 239000005642 Oleic acid Substances 0.000 description 5
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 230000000977 initiatory effect Effects 0.000 description 5
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 5
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000007704 wet chemistry method Methods 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000004020 luminiscence type Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000013110 organic ligand Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000010301 surface-oxidation reaction Methods 0.000 description 3
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 3
- YTZSKPAYFHSKOL-UHFFFAOYSA-N 2-(2,3-dichlorophenyl)-2-[2-(2,3-dichlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=C(Cl)C=CC=2)Cl)=C1Cl YTZSKPAYFHSKOL-UHFFFAOYSA-N 0.000 description 2
- MCORDGVZLPBVJB-UHFFFAOYSA-N 2-(2-butoxyethoxy)acetic acid Chemical compound CCCCOCCOCC(O)=O MCORDGVZLPBVJB-UHFFFAOYSA-N 0.000 description 2
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
- VPSXHKGJZJCWLV-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(1-ethylpiperidin-4-yl)oxypyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OC1CCN(CC1)CC VPSXHKGJZJCWLV-UHFFFAOYSA-N 0.000 description 2
- AWFYPPSBLUWMFQ-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(1,4,6,7-tetrahydropyrazolo[4,3-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=C2 AWFYPPSBLUWMFQ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 2
- 241000764773 Inna Species 0.000 description 2
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 2
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229910007709 ZnTe Inorganic materials 0.000 description 2
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001661 cadmium Chemical class 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 239000004246 zinc acetate Substances 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- VKQJCUYEEABXNK-UHFFFAOYSA-N 1-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC=C2Cl VKQJCUYEEABXNK-UHFFFAOYSA-N 0.000 description 1
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- QIRUERQWPNHWRC-UHFFFAOYSA-N 2-(1,3-benzodioxol-5-ylmethyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(CC=2C=C3OCOC3=CC=2)=N1 QIRUERQWPNHWRC-UHFFFAOYSA-N 0.000 description 1
- CLLLODNOQBVIMS-UHFFFAOYSA-N 2-(2-methoxyethoxy)acetic acid Chemical compound COCCOCC(O)=O CLLLODNOQBVIMS-UHFFFAOYSA-N 0.000 description 1
- WEBYLMXBPGYVLS-UHFFFAOYSA-N 2-(2-phenylmethoxyethoxy)acetic acid Chemical compound OC(=O)COCCOCC1=CC=CC=C1 WEBYLMXBPGYVLS-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-QPJJXVBHSA-N 2-[(e)-2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1\C=C\C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-QPJJXVBHSA-N 0.000 description 1
- YHBWXWLDOKIVCJ-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]acetic acid Chemical compound COCCOCCOCC(O)=O YHBWXWLDOKIVCJ-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-UHFFFAOYSA-N 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-UHFFFAOYSA-N 0.000 description 1
- XOPKKHCDIAYUSK-UHFFFAOYSA-N 2-[2-(5-methylfuran-2-yl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound O1C(C)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 XOPKKHCDIAYUSK-UHFFFAOYSA-N 0.000 description 1
- CQWXKASOCUAEOW-UHFFFAOYSA-N 2-[2-(carboxymethoxy)ethoxy]acetic acid Chemical compound OC(=O)COCCOCC(O)=O CQWXKASOCUAEOW-UHFFFAOYSA-N 0.000 description 1
- PNDRGJCVJPHPOZ-UHFFFAOYSA-N 2-[2-(furan-2-yl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2OC=CC=2)=N1 PNDRGJCVJPHPOZ-UHFFFAOYSA-N 0.000 description 1
- HJZZQNLKBWJYPD-UHFFFAOYSA-N 2-[2-[2-(carboxymethoxy)ethoxy]ethoxy]acetic acid Chemical compound OC(=O)COCCOCCOCC(O)=O HJZZQNLKBWJYPD-UHFFFAOYSA-N 0.000 description 1
- KNDAEDDIIQYRHY-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(piperazin-1-ylmethyl)pyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)CN1CCNCC1 KNDAEDDIIQYRHY-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 1
- IJBSPUKPEDBNKQ-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-prop-1-en-2-ylphenyl)propan-1-one Chemical compound CC(=C)C1=CC=C(C(=O)C(C)(C)O)C=C1 IJBSPUKPEDBNKQ-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- 125000005916 2-methylpentyl group Chemical group 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- BLLOXKZNPPDLGM-UHFFFAOYSA-N 4-[2-[4,6-bis(trichloromethyl)-1,3,5-triazin-2-yl]ethenyl]-n,n-diethyl-3-methylaniline Chemical compound CC1=CC(N(CC)CC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 BLLOXKZNPPDLGM-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- 125000004920 4-methyl-2-pentyl group Chemical group CC(CC(C)*)C 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910004262 HgTe Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- VAYOSLLFUXYJDT-RDTXWAMCSA-N Lysergic acid diethylamide Chemical compound C1=CC(C=2[C@H](N(C)C[C@@H](C=2)C(=O)N(CC)CC)C2)=C3C2=CNC3=C1 VAYOSLLFUXYJDT-RDTXWAMCSA-N 0.000 description 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N Methyl benzoate Natural products COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 229910005642 SnTe Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- DBHQYYNDKZDVTN-UHFFFAOYSA-N [4-(4-methylphenyl)sulfanylphenyl]-phenylmethanone Chemical compound C1=CC(C)=CC=C1SC1=CC=C(C(=O)C=2C=CC=CC=2)C=C1 DBHQYYNDKZDVTN-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- VBXWCGWXDOBUQZ-UHFFFAOYSA-K diacetyloxyindiganyl acetate Chemical compound [In+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VBXWCGWXDOBUQZ-UHFFFAOYSA-K 0.000 description 1
- PODOEQVNFJSWIK-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethoxyphenyl)methanone Chemical compound COC1=CC(OC)=CC(OC)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 PODOEQVNFJSWIK-UHFFFAOYSA-N 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 125000005469 ethylenyl group Chemical group 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 238000000103 photoluminescence spectrum Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- OUMZKMRZMVDEOF-UHFFFAOYSA-N tris(trimethylsilyl)phosphane Chemical compound C[Si](C)(C)P([Si](C)(C)C)[Si](C)(C)C OUMZKMRZMVDEOF-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/50—Sympathetic, colour changing or similar inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optical Filters (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Luminescent Compositions (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
본 발명은 양자점, 경화성 모노머 및 비이온성 광산발생제를 포함하고, 상기 경화성 모노머는 25℃에서 30 cP 이하의 점도를 갖는 경화성 모노머를 포함하는 광변환 잉크 조성물, 이를 이용하여 형성되는 컬러필터 및 상기 컬러필터를 구비한 화상표시장치를 제공한다. 본 발명에 따른 광변환 잉크 조성물은 UV 또는 포스트베이크 공정에서 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수하다. 따라서, 본 발명에 따른 광변환 잉크 조성물은 잉크젯 인쇄 방식으로 컬러필터를 제조하는데 효과적으로 사용될 수 있다.The present invention provides a photoconversion ink composition comprising quantum dots, a curable monomer and a nonionic photoacid generator, wherein the curable monomer has a viscosity of 30 cP or less at 25°C, a color filter formed using the same, and an image display device having the color filter. The photoconversion ink composition according to the present invention has excellent optical characteristics because optical characteristics are not degraded in a UV or post-bake process, and has excellent long-term reliability under high humidity conditions. Therefore, the photoconversion ink composition according to the present invention can be effectively used to manufacture a color filter by an inkjet printing method.
Description
본 발명은 광변환 잉크 조성물, 컬러필터 및 화상표시장치에 관한 것으로, 보다 상세하게는 UV 또는 포스트베이크 공정에서 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수한 광변환 잉크 조성물, 이를 이용하여 형성되는 컬러필터 및 상기 컬러필터를 구비한 화상표시장치에 관한 것이다.The present invention relates to a photoconversion ink composition, a color filter, and an image display device, and more specifically, to a photoconversion ink composition having excellent optical characteristics because no degradation of optical characteristics occurs during a UV or post-bake process and excellent long-term reliability in a high-humidity state, a color filter formed using the same, and an image display device equipped with the color filter.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소 단위로 가능하게 하는 박막 필름형 광학부품이다.A color filter is a thin film-type optical component that extracts three colors, red, green, and blue, from white light and enables fine pixel units.
이와 관련하여, 최근에는 우수한 패턴 특성뿐만 아니라 높은 색재현율을 나타내기 위해, 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터의 제조 방법이 제안되었다.In this regard, a method for manufacturing a color filter using a self-luminous photosensitive resin composition containing quantum dots has been recently proposed to exhibit not only excellent pattern characteristics but also high color reproducibility.
통상적으로 알려진 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 포토리소그래피 방법은 코팅, 노광, 현상 및 경화를 통해 색 필터를 형성하는 방법으로, 색 필터의 정교성과 재현성 측면에서는 우수하지만, 화소를 형성하기 위하여 각각의 색에 대하여 코팅, 노광, 현상 및 경화하는 과정이 각각 요구되어 제조 공정 및 시간 및 비용이 늘어나고 공정간 제어 인자가 많아져 수율 관리에 어려움이 있을 수 있다. The photolithography method using a self-luminous photosensitive resin composition containing commonly known quantum dots is a method of forming a color filter through coating, exposure, development, and curing. Although it is excellent in terms of the precision and reproducibility of the color filter, the coating, exposure, development, and curing processes are separately required for each color to form pixels, which increases the manufacturing process, time, and cost, and the number of control factors between processes increases, which may make it difficult to manage the yield.
이에 따라, 상기 포토리소그래피 방법 대신 적색, 녹색 및 청색을 포함한 복수의 색을 한번에 착색할 수 있는 잉크젯(inkjet) 방법이 제안되고 있다.Accordingly, instead of the photolithography method, an inkjet method capable of coloring multiple colors including red, green, and blue at once is being proposed.
대한민국 등록특허 제10-1475520호에는 양자점, 용매 및 고점도의 고분자 첨가제를 포함하여 잉크젯법에 의한 양자점의 토출이 가능하고 양자점의 농도를 자유롭게 조절할 수 있을 뿐 아니라, 양자점의 로딩(loading)양을 줄일 수 있는 잉크젯 프린트용 양자점 잉크 조성물이 개시되어 있다.Korean Patent No. 10-1475520 discloses a quantum dot ink composition for inkjet printing, which comprises quantum dots, a solvent, and a high-viscosity polymer additive, and enables the discharge of quantum dots by an inkjet method, freely controls the concentration of quantum dots, and reduces the loading amount of quantum dots.
하지만, 상기 양자점 잉크 조성물은 도막의 경화를 촉진하는 별도의 경화 촉진 성분이 첨가되어 있지 않아 도막이 고습 상태에서 장기간 동안 노출될 경우 신뢰성이 떨어지는 문제점이 있었다. 또한, 이러한 문제점을 해결하기 위해 통상의 광중합 개시제를 첨가하는 경우에는 UV 또는 포스트베이크 공정에서 발생한 라디칼이 QD 표면과 접촉하여 표면 산화를 야기시키고 결국 양자점의 광특성 저하가 발생하여 광변환 화소의 광특성이 떨어지게 된다.However, since the quantum dot ink composition does not have a separate curing accelerating component added to promote curing of the film, there is a problem in that reliability is reduced when the film is exposed to high humidity for a long period of time. In addition, if a conventional photopolymerization initiator is added to solve this problem, radicals generated during the UV or post-bake process come into contact with the QD surface, causing surface oxidation, which ultimately leads to a deterioration in the optical characteristics of the quantum dot, and thus a deterioration in the optical characteristics of the photoconversion pixel.
따라서, UV 또는 포스트베이크 공정에서 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수한 광변환 잉크 조성물의 개발이 절실히 요구되고 있다.Therefore, there is an urgent need for the development of a photoconversion ink composition that has excellent optical properties and long-term reliability under high humidity conditions without degradation of optical properties during UV or post-baking processes.
본 발명의 한 목적은 UV 또는 포스트베이크 공정에서 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수한 광변환 잉크 조성물을 제공하는 것이다.One purpose of the present invention is The purpose is to provide a photoconversion ink composition having excellent optical properties and excellent long-term reliability under high humidity conditions, without any degradation of optical properties during a UV or post-baking process.
본 발명의 다른 목적은 상기 광변환 잉크 조성물의 경화물을 포함하는 광변환 화소를 제공하는 것이다.Another object of the present invention is to provide a photoconversion pixel comprising a cured product of the photoconversion ink composition.
본 발명의 또 다른 목적은 상기 광변환 화소를 포함하는 컬러필터를 제공하는 것이다.Another object of the present invention is to provide a color filter including the photoconversion pixel.
본 발명의 또 다른 목적은 상기 컬러필터를 구비한 화상표시장치를 제공하는 것이다.Another object of the present invention is to provide an image display device having the color filter.
한편으로, 본 발명은 양자점, 경화성 모노머 및 비이온성 광산발생제를 포함하고, 상기 경화성 모노머는 25℃에서 30 cP 이하의 점도를 갖는 경화성 모노머를 포함하는 광변환 잉크 조성물을 제공한다.On the one hand, the present invention provides a photoconversion ink composition comprising quantum dots, a curable monomer and a nonionic photoacid generator, wherein the curable monomer has a viscosity of 30 cP or less at 25°C.
본 발명의 일 실시형태에서, 상기 경화성 모노머는 25℃에서 30 cP 이하의 점도를 갖는 단관능 (메타)아크릴레이트 또는 다관능 (메타)아크릴레이트를 포함할 수 있다.In one embodiment of the present invention, the curable monomer may include a monofunctional (meth)acrylate or a polyfunctional (meth)acrylate having a viscosity of 30 cP or less at 25°C.
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제는 하기 화학식 1로 표시되는 산 화합물을 발생시키는 것일 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may generate an acid compound represented by the following chemical formula 1.
[화학식 1][Chemical Formula 1]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제는 하기 화학식 2 내지 3으로 표시되는 화합물 중 하나 이상을 포함할 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may include one or more of the compounds represented by the following chemical formulas 2 to 3.
[화학식 2][Chemical formula 2]
[화학식 3][Chemical Formula 3]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제는 전체 조성물 100 중량%에 대하여 0.1 내지 10 중량%의 양으로 포함될 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may be included in an amount of 0.1 to 10 wt% based on 100 wt% of the total composition.
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 산란 입자, 광중합 개시제, 계면활성제 및 산화방지제로 구성된 군으로부터 선택되는 하나 이상을 추가로 포함할 수 있다.The photoconversion ink composition according to one embodiment of the present invention may additionally include at least one selected from the group consisting of scattering particles, a photopolymerization initiator, a surfactant, and an antioxidant.
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 용제를 1 중량% 이하의 양으로 포함할 수 있다.The photoconversion ink composition according to one embodiment of the present invention may contain a solvent in an amount of 1 wt% or less.
다른 한편으로, 본 발명은 상기 광변환 잉크 조성물의 경화물을 포함하는 광변환 화소를 제공한다.On the other hand, the present invention provides a photoconversion pixel comprising a cured product of the photoconversion ink composition.
또 다른 한편으로, 본 발명은 상기 광변환 화소를 포함하는 컬러필터를 제공한다.On the other hand, the present invention provides a color filter including the photoconversion pixel.
또 다른 한편으로, 본 발명은 상기 컬러필터가 구비된 화상표시장치를 제공한다.On the other hand, the present invention provides an image display device equipped with the color filter.
본 발명에 따른 광변환 잉크 조성물은 UV 또는 포스트베이크 공정에서 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수하다. 또한, 본 발명에 따른 광변환 잉크 조성물은 용제를 실질적으로 포함하지 않아도 저점도 구현이 가능하며 양자점의 분산성이 우수하다. 따라서, 본 발명에 따른 광변환 잉크 조성물은 잉크젯 인쇄 방식으로 컬러필터를 제조하는데 효과적으로 사용될 수 있다.The photoconversion ink composition according to the present invention has excellent optical properties since no degradation of optical properties occurs during the UV or post-bake process, and has excellent long-term reliability under high humidity conditions. In addition, the photoconversion ink composition according to the present invention can implement low viscosity even without substantially containing a solvent, and has excellent quantum dot dispersibility. Therefore, the photoconversion ink composition according to the present invention can be effectively used to manufacture a color filter by an inkjet printing method.
이하, 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명에서 어떤 부재가 다른 부재 "상에" 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.In the present invention, when it is said that a certain member is located "on" another member, this includes not only a case where a certain member is in contact with another member, but also a case where another member exists between the two members.
본 발명에서 어떤 부분이 어떤 구성요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.When it is said that a part of the present invention "includes" a certain component, this does not exclude other components, unless otherwise specifically stated, but rather means that other components may be included.
본 발명의 일 실시형태는 양자점(A), 경화성 모노머(B) 및 비이온성 광산발생제(C)를 포함하고, 상기 경화성 모노머(B)는 25℃에서 30 cP 이하의 점도를 갖는 저점도 경화성 모노머를 포함하는 광변환 잉크 조성물에 관한 것이다.One embodiment of the present invention relates to a photoconversion ink composition comprising a quantum dot (A), a curable monomer (B), and a nonionic photoacid generator (C), wherein the curable monomer (B) comprises a low viscosity curable monomer having a viscosity of 30 cP or less at 25°C.
양자점(A)Quantum Dot (A)
본 발명의 일 실시형태에서, 상기 양자점은 표면 상에 리간드층을 갖는 것이다.In one embodiment of the present invention, the quantum dot has a ligand layer on its surface.
예를 들어, 상기 양자점은 표면 상에 하기 화학식 4로 표시되는 화합물을 포함하는 리간드층을 갖는 것일 수 있다.For example, the quantum dot may have a ligand layer including a compound represented by the following chemical formula 4 on its surface.
[화학식 4][Chemical Formula 4]
상기 식에서, In the above formula,
R' 및 R''는 각각 독립적으로 수소 원자; 카르복실기; 페닐기; 또는 티올기로 치환되거나 치환되지 않은 C1-C20의 알킬기이고, R' and R'' are each independently a hydrogen atom; a carboxyl group; a phenyl group; or a C 1 -C 20 alkyl group substituted or unsubstituted with a thiol group,
R'와 R"는 동시에 수소 원자; 페닐기; 또는 치환되지 않은 C1-C20의 알킬기는 아니며, R' and R" are not simultaneously a hydrogen atom; a phenyl group; or an unsubstituted C 1 -C 20 alkyl group,
n은 1 내지 20의 정수이다.n is an integer from 1 to 20.
본 명세서에서 사용되는 C1-C20의 알킬기는 탄소수 1 내지 20개로 구성된 직쇄형 또는 분지형의 1가 탄화수소를 의미하며, 예를 들어 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, tert-부틸, sec-부틸, 1-메틸-부틸, 1-에틸-부틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, n-헥실, 1-메틸펜틸, 2-메틸펜틸, 4-메틸-2-펜틸, 3,3-디메틸부틸, 2-에틸부틸, n-헵틸, 1-메틸헥실, n-옥틸, tert-옥틸, 1-메틸헵틸, 2-에틸헥실, 2-프로필펜틸, n-노닐, 2,2-디메틸헵틸, n-데실 등이 포함되나 이에 한정되는 것은 아니다.As used herein, the C 1 -C 20 alkyl group means a straight-chain or branched monovalent hydrocarbon having 1 to 20 carbon atoms, and examples thereof include, but are not limited to, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, sec-butyl, 1-methyl-butyl, 1-ethyl-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, n-heptyl, 1-methylhexyl, n-octyl, tert-octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-nonyl, 2,2-dimethylheptyl, n-decyl, and the like.
본 발명의 일 실시형태에서, 상기 화학식 4로 표시되는 화합물의 구체예로는 2-(2-메톡시에톡시)아세트산 (WAKO사), 2-[2-(2-메톡시에톡시)에톡시]아세트산 (WAKO사), {2-[2-(카복시메톡시)에톡시]에톡시}아세트산 (WAKO사), 2-[2-(벤질옥시)에톡시]아세트산, (2-(카복시메톡시)에톡시)아세트산 (WAKO사), (2-부톡시에톡시)아세트산 (WAKO사), 카복시-EG6-언데칸티올 등을 들 수 있으나, 이에 한정되지 않는다.In one embodiment of the present invention, specific examples of the compound represented by the chemical formula 4 include, but are not limited to, 2-(2-methoxyethoxy)acetic acid (WAKO), 2-[2-(2-methoxyethoxy)ethoxy]acetic acid (WAKO), {2-[2-(carboxymethoxy)ethoxy]ethoxy}acetic acid (WAKO), 2-[2-(benzyloxy)ethoxy]acetic acid, (2-(carboxymethoxy)ethoxy)acetic acid (WAKO), (2-butoxyethoxy)acetic acid (WAKO), carboxy-EG6-undecanethiool, and the like.
상기 양자점은 화학식 4로 표시되는 폴리에틸렌 글리콜계 리간드를 포함함으로써 양자점의 광특성이 우수하고, 용제 없이 하기에서 기술하는 경화성 모노머만으로도 양호한 분산 특성을 나타낼 수 있다.The above quantum dots have excellent optical properties by including a polyethylene glycol-based ligand represented by chemical formula 4, and can exhibit good dispersion properties with only the curable monomer described below without a solvent.
상기 화학식 4로 표시되는 화합물은 양자점의 총 표면적에 대하여 5% 이상의 표면을 덮고 있을 수 있다.The compound represented by the above chemical formula 4 may cover a surface area of 5% or more with respect to the total surface area of the quantum dot.
이때, 상기 화학식 4로 표시되는 화합물의 함량은 양자점 1몰에 대하여 0.1 내지 10몰일 수 있다.At this time, the content of the compound represented by the chemical formula 4 may be 0.1 to 10 moles per 1 mole of quantum dots.
상기 화학식 4로 표시되는 화합물을 포함하는 리간드층은 0.1nm 내지 2nm의 두께, 예를 들어 0.5nm 내지 1.5nm의 두께를 가질 수 있다.The ligand layer including the compound represented by the chemical formula 4 may have a thickness of 0.1 nm to 2 nm, for example, a thickness of 0.5 nm to 1.5 nm.
본 발명의 일 실시형태에서, 상기 양자점은 나노 크기의 반도체 물질을 일컬을 수 있다. 원자가 분자를 이루고, 분자는 클러스터라고 하는 작은 분자들의 집합체를 구성하여 나노 입자를 이루게 되는데, 이러한 나노 입자들이 반도체 특성을 띠고 있을 때 양자점이라고 한다. 상기 양자점은 외부에서 에너지를 받아 들뜬 상태에 이르면, 상기 양자점의 자체적으로 해당하는 에너지 밴드갭에 따른 에너지를 방출하게 된다. 예를 들면, 본 발명의 광변환 잉크 조성물은 이러한 양자점을 포함함으로써, 입사된 청색광을 녹색광 및 적색광으로 광변환이 가능하다.In one embodiment of the present invention, the quantum dot may refer to a semiconductor material of nano size. Atoms form molecules, and molecules form a collection of small molecules called clusters to form nanoparticles. When these nanoparticles have semiconductor properties, they are called quantum dots. When the quantum dot receives energy from the outside and reaches an excited state, it emits energy according to the energy band gap corresponding to the quantum dot itself. For example, the photoconversion ink composition of the present invention can convert incident blue light into green light and red light by including such quantum dots.
본 발명의 일 실시형태에서, 상기 양자점은 비카드뮴계 양자점일 수 있다.In one embodiment of the present invention, the quantum dots may be non-cadmium quantum dots.
상기 비카드뮴계 양자점은 광에 의한 자극으로 발광할 수 있는 양자점 입자라면 특별히 한정되지 않는다. 예컨대, II-VI족 반도체 화합물; III-V족 반도체 화합물; IV-VI족 반도체 화합물; IV족 원소 또는 이를 포함하는 화합물; 및 이들의 조합으로 이루어진 군에서 선택될 수 있으며, 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The above-mentioned non-cadmium quantum dots are not particularly limited as long as they are quantum dot particles that can emit light when stimulated by light. For example, they may be selected from the group consisting of II-VI group semiconductor compounds; III-V group semiconductor compounds; IV-VI group semiconductor compounds; IV group elements or compounds containing them; and combinations thereof, and these may be used singly or in combination of two or more.
구체적으로, 상기 II-VI족 반도체 화합물은 ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, HgZnS, HgZnSe, HgZnTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 HgZnSeS, HgZnSeTe, HgZnSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있으나 이에 한정되는 것은 아니다.Specifically, the II-VI group semiconductor compound may be selected from, but is not limited to, a binary compound selected from the group consisting of ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; a ternary compound selected from the group consisting of ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and a quaternary compound selected from the group consisting of HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof.
상기 III-V족 반도체 화합물은 GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있으나 이에 한정되는 것은 아니다.The above III-V group semiconductor compound may be selected from the group consisting of binary compounds selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; ternary compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; and quaternary compounds selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof, but is not limited thereto.
상기 IV-VI족 반도체 화합물은 SnS, SnSe, SnTe, PbS, PbSe, PbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 SnPbSSe, SnPbSeTe, SnPbSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택되는 하나 이상일 수 있으나, 역시 이에 한정되지 않는다.The above IV-VI group semiconductor compound may be at least one selected from the group consisting of a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; a ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a quaternary compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof, but is not limited thereto.
이에 한정되지는 않으나, 상기 IV족 원소 또는 이를 포함하는 화합물은 Si, Ge 및 이들의 혼합물로 이루어진 군에서 선택되는 원소; 및 SiC, SiGe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물로 이루어진 군에서 선택될 수 있다.Although not limited thereto, the group IV element or compound containing the same may be selected from the group consisting of an element selected from the group consisting of Si, Ge, and mixtures thereof; and a group consisting of binary compounds selected from the group consisting of SiC, SiGe, and mixtures thereof.
상기 양자점은 균질한(homogeneous) 단일 구조; 코어-쉘(core-shell), 그래디언트(gradient) 구조 등과 같은 이중 구조; 또는 이들의 혼합 구조일 수 있다. 바람직하게는, 상기 양자점은 코어 및 코어를 덮은 쉘을 포함하는 코어-쉘 구조를 가질 수 있다.The quantum dot may have a homogeneous single structure; a dual structure such as a core-shell or gradient structure; or a mixed structure thereof. Preferably, the quantum dot may have a core-shell structure including a core and a shell covering the core.
구체적으로, 상기 코어-쉘의 이중 구조에서, 각각의 코어와 쉘을 이루는 물질은 상기 언급된 서로 다른 반도체 화합물로 이루어질 수 있다. 예컨대, 상기 코어는 GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, 및 InAlPSb로 구성된 군으로부터 선택되는 하나 이상을 포함하며, 상기 쉘은 ZnSe, ZnS 및 ZnTe로 구성된 군으로부터 선택되는 하나 이상을 포함할 수 있으나, 이에 한정되는 것은 아니다.Specifically, in the above core-shell dual structure, the materials forming each core and shell can be formed of different semiconductor compounds as mentioned above. For example, the core may include at least one selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb, and the shell may include at least one selected from the group consisting of ZnSe, ZnS, and ZnTe, but is not limited thereto.
예를 들어, 코어-쉘 구조의 양자점은 InP/ZnS, InP/ZnSe, InP/GaP/ZnS, InP/ZnSe/ZnS, InP/ZnSeTe/ZnS 및 InP/MnSe/ZnS 등을 들 수 있다.For example, quantum dots with core-shell structures include InP/ZnS, InP/ZnSe, InP/GaP/ZnS, InP/ZnSe/ZnS, InP/ZnSeTe/ZnS, and InP/MnSe/ZnS.
상기 양자점은 습식 화학 공정(wet chemical process), 유기금속 화학증착 공정(MOCVD, metal organic chemical vapor deposition) 또는 분자선 에피텍시 공정(MBE, molecular beam epitaxy)에 의해 합성될 수 있으나 이에 한정되는 것은 아니나, 바람직하게는 습식 화학 공정(wet chemical process)에 의해 합성하는 것이 더욱 광특성이 우수한 양자점을 수득할 수 있다.The above quantum dots can be synthesized by, but are not limited to, a wet chemical process, a metal organic chemical vapor deposition (MOCVD) process, or a molecular beam epitaxy (MBE) process, but preferably, synthesizing them by a wet chemical process can obtain quantum dots with better optical properties.
상기 습식 화학 공정이란 유기용제에 전구체 물질을 넣어 입자를 성장시키는 방법이다. 결정이 성장될 때 유기용제가 자연스럽게 양자점 결정의 표면에 배위되어 분산제 역할을 하여 결정의 성장을 조절하게 되므로, 유기금속 화학증착 공정이나 분자선 에피텍시와 같은 기상증착법보다 더 쉽고 저렴한 공정을 통하여 나노 입자의 성장을 제어할 수 있으므로, 상기 습식 화학 공정을 사용하여 상기 양자점을 제조하는 것이 바람직하다.The above wet chemical process is a method of growing particles by adding a precursor material to an organic solvent. When the crystal grows, the organic solvent is naturally coordinated to the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the growth of nanoparticles can be controlled through a process that is easier and cheaper than a vapor deposition method such as an organometallic chemical vapor deposition process or molecular beam epitaxy. Therefore, it is preferable to manufacture the quantum dots using the above wet chemical process.
습식 화학 공정에 의해 양자점을 제조하는 경우 양자점의 응집을 방지하고 양자점의 입자 크기를 나노 수준으로 제어하기 위하여 유기 리간드가 사용된다. 이러한 유기 리간드로는 일반적으로 올레산이 사용될 수 있다.When producing quantum dots by a wet chemical process, organic ligands are used to prevent aggregation of quantum dots and to control the particle size of quantum dots to the nano level. Oleic acid can generally be used as such organic ligands.
본 발명의 일 실시형태에서, 상기 양자점의 제조 과정에서 사용된 올레산은 상기 화학식 4의 폴리에틸렌 글리콜계 화합물에 의해 리간드 교환 방법에 의해 대체된다.In one embodiment of the present invention, the oleic acid used in the process of manufacturing the quantum dots is replaced by a polyethylene glycol compound of the chemical formula 4 through a ligand exchange method.
상기 리간드 교환은 원래의 유기 리간드, 즉 올레산을 갖는 양자점을 함유하는 분산액에, 교환하고자 하는 유기 리간드, 즉 화학식 4의 폴리에틸렌 글리콜계 화합물을 첨가하고 이를 상온 내지 200℃에서 30분 내지 3시간 동안 교반하여 화학식 4의 폴리에틸렌 글리콜계 화합물이 결합된 양자점을 수득함으로써 수행될 수 있다. 필요에 따라 상기 화학식 4의 폴리에틸렌 글리콜계 화합물이 결합된 양자점을 분리하고 정제하는 과정을 추가로 수행할 수도 있다.The above ligand exchange can be performed by adding an organic ligand to be exchanged, i.e., a polyethylene glycol-based compound of chemical formula 4, to a dispersion containing quantum dots having an original organic ligand, i.e., oleic acid, and stirring the mixture at room temperature to 200° C. for 30 minutes to 3 hours to obtain quantum dots to which the polyethylene glycol-based compound of chemical formula 4 is bound. If necessary, a process of separating and purifying the quantum dots to which the polyethylene glycol-based compound of chemical formula 4 is bound can be additionally performed.
상기 양자점은 광변환 잉크 조성물 전체 100 중량%에 대하여 1 내지 40 중량%, 바람직하게는 2 내지 30 중량%로 포함될 수 있다. 상기 양자점이 상기 범위 내로 포함될 경우 발광 효율이 우수하고, 코팅층의 신뢰성이 우수한 이점이 있다. 상기 양자점이 상기 범위 미만으로 포함되는 경우 녹색광 및 적색광의 광변환 효율이 미비할 수 있고, 상기 범위를 초과하는 경우 상대적으로 청색광의 방출이 저하되어 색재현성이 떨어지는 문제가 발생될 수 있다.The quantum dots may be included in an amount of 1 to 40 wt%, preferably 2 to 30 wt%, based on 100 wt% of the total light conversion ink composition. When the quantum dots are included within the above range, there are advantages of excellent luminescence efficiency and excellent reliability of the coating layer. When the quantum dots are included in an amount less than the above range, the light conversion efficiency of green light and red light may be low, and when the quantum dots are included in an amount exceeding the above range, the emission of blue light may be relatively reduced, resulting in a problem of poor color reproducibility.
경화성 모노머(B)Curable monomer (B)
본 발명의 일 실시형태에서, 상기 경화성 모노머(B)는 25℃에서 30 cP 이하의 점도, 예를 들어 5 내지 30 cP의 점도를 갖는 경화성 모노머, 즉 저점도 경화성 모노머를 포함한다.In one embodiment of the present invention, the curable monomer (B) includes a curable monomer having a viscosity of 30 cP or less at 25°C, for example, a viscosity of 5 to 30 cP, i.e., a low-viscosity curable monomer.
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 경화성 모노머로서 저점도 경화성 모노머를 포함함으로써 양호한 표면 경화성과 도막 특성을 가지면서 잉크젯 인쇄에 적합한 저점도를 나타낼 수 있다.A photoconversion ink composition according to one embodiment of the present invention can exhibit a low viscosity suitable for inkjet printing while having good surface curability and coating properties by including a low-viscosity curable monomer as a curable monomer.
상기 저점도 경화성 모노머는 25℃에서 30 cP 이하의 점도를 갖는 단관능 (메타)아크릴레이트 또는 다관능 (메타)아크릴레이트를 포함할 수 있다.The above low viscosity curable monomer may include a monofunctional (meth)acrylate or a polyfunctional (meth)acrylate having a viscosity of 30 cP or less at 25°C.
예를 들어, 상기 저점도 경화성 모노머로는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 이소부틸(메타)아크릴레이트, 라우릴(메타)아크릴레이트, 스테아릴(메타)아크릴레이트 등의 단관능 알킬(메타)아크릴레이트; 1,4-부탄디올디아크릴레이트, 1,6-헥산디올디아크릴레이트, 1,9-노난디올디아크릴레이트, 1,10-데칸디올디아크릴레이트 등의 알킬렌쇄를 갖는 2관능 (메타)아크릴레이트; 2-히드록시-3-아크릴로일옥시프로필(메타)아크릴레이트, 2-히드록시-3-페녹시에틸(메타)아크릴레이트, 1,4-시클로헥산디메탄올모노(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시프로필(메타)아크릴레이트, 4-히드록시부틸(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 디펜타에리트리톨모노히드록시펜타(메타)아크릴레이트, 2-히드록시프로필(메타)아크릴레이트 등의 수산기를 갖는 (메타)아크릴레이트; 아이소보닐(메타)아크릴레이트; 아크릴로일모르폴린; 글리시딜메타크릴레이트 등을 사용할 수 있다. 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.For example, the low viscosity curable monomers include monofunctional alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, lauryl (meth)acrylate, and stearyl (meth)acrylate; bifunctional (meth)acrylates having an alkylene chain such as 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol diacrylate, and 1,10-decanediol diacrylate; Examples of (meth)acrylates having a hydroxyl group, such as 2-hydroxy-3-acryloyloxypropyl (meth)acrylate, 2-hydroxy-3-phenoxyethyl (meth)acrylate, 1,4-cyclohexanedimethanol mono(meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate, and 2-hydroxypropyl (meth)acrylate; isobornyl (meth)acrylate; acryloylmorpholine; and glycidyl methacrylate, can be used. These can be used alone or in combination of two or more.
상기 경화성 모노머(B)는 상기 광변환 잉크 조성물 전체 100 중량%에 대하여 20 내지 90 중량%, 바람직하게는 30 내지 80 중량%로 포함될 수 있다. 상기 경화성 모노머가 상기 범위 내로 포함될 경우 화소부의 강도나 평활성 측면에서 바람직한 이점이 있다. 상기 경화성 모노머가 상기 범위 미만으로 포함되는 경우 화소부의 강도가 다소 저하될 수 있으며, 상기 경화성 모노머가 상기 범위를 초과하여 포함되는 경우 평활성이 다소 저하될 수 있으므로 상기 범위 내로 포함되는 것이 바람직하다.The above-mentioned curable monomer (B) may be included in an amount of 20 to 90 wt%, preferably 30 to 80 wt%, based on 100 wt% of the total weight of the photoconversion ink composition. When the above-mentioned curable monomer is included within the above range, there is a desirable advantage in terms of the strength or smoothness of the pixel portion. When the above-mentioned curable monomer is included in an amount less than the above range, the strength of the pixel portion may be somewhat reduced, and when the above-mentioned curable monomer is included in an amount exceeding the above range, the smoothness may be somewhat reduced, and therefore it is preferable that the above-mentioned range be included.
비이온성 광산발생제(C)Nonionic photoacid generator (C)
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제(C)는 빛 또는 방사선의 작용에 의해 산을 발생시킬 수 있는 화합물로서, 양자점의 표면 산화를 야기하지 않아 양자점의 광특성 저하를 발생시키지 않을 수 있다.In one embodiment of the present invention, the nonionic photoacid generator (C) is a compound capable of generating an acid by the action of light or radiation, and may not cause surface oxidation of the quantum dot, thereby preventing deterioration of the optical properties of the quantum dot.
상기 비이온성 광산발생제는 하기 화학식 1로 표시되는 산 화합물을 발생시키는 것일 수 있다.The above nonionic photoacid generator may generate an acid compound represented by the following chemical formula 1.
[화학식 1][Chemical Formula 1]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
본 명세서에서 사용되는 C1-C4의 지방족 탄화수소기는 탄소수 1 내지 4개로 구성된 직쇄형 또는 분지형의 1가 탄화수소로서, 탄소-탄소 단일결합만으로 구성되거나, 하나 이상의 탄소-탄소 이중결합 또는 삼중결합을 갖는 것도 포함하는 개념이다. 예를 들어, C1-C4의 지방족 탄화수소기는 메틸, 에틸, n-프로필, i-프로필, n-부틸, i-부틸, t-부틸, 에틸렌일, 프로펜일, 부텐일, 아세틸렌일, 프로핀일, 부틴일 등이 포함되나 이에 한정되는 것은 아니다.The C 1 -C 4 aliphatic hydrocarbon group used herein is a linear or branched monovalent hydrocarbon group consisting of 1 to 4 carbon atoms, and includes those consisting of only carbon-carbon single bonds, or those having one or more carbon-carbon double bonds or triple bonds. For example, the C 1 -C 4 aliphatic hydrocarbon group includes, but is not limited to, methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, ethylenyl, propenyl, butenyl, acetylenyl, propynyl, butynyl, and the like.
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제는 하기 화학식 2 내지 3으로 표시되는 화합물 중 하나 이상을 포함할 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may include one or more of the compounds represented by the following chemical formulas 2 to 3.
[화학식 2][Chemical formula 2]
[화학식 3][Chemical Formula 3]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
본 발명의 일 실시형태에 있어서, 상기 비이온성 광산발생제는 하기 화학식 5 내지 화학식 8의 화합물 중 하나 이상을 포함할 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may include at least one of the compounds represented by the following chemical formulas 5 to 8.
[화학식 5][Chemical Formula 5]
[화학식 6][Chemical formula 6]
[화학식 7][Chemical formula 7]
[화학식 8][Chemical formula 8]
본 발명의 일 실시형태에서, 상기 비이온성 광산발생제는 전체 조성물 100 중량%에 대하여 0.1 내지 10 중량%, 바람직하게는 0.1 내지 5 중량%의 양으로 포함될 수 있다. 상기 비이온성 광산발생제가 0.1 중량% 미만의 양으로 포함되면 패턴 형성을 위한 필요 노광량이 증가하여 감도가 저하될 수 있고, 10 중량% 초과의 양으로 포함되면 표면 거칠기가 증가할 수 있다.In one embodiment of the present invention, the nonionic photoacid generator may be included in an amount of 0.1 to 10 wt%, preferably 0.1 to 5 wt%, based on 100 wt% of the total composition. If the nonionic photoacid generator is included in an amount less than 0.1 wt%, the required exposure amount for pattern formation may increase, thereby lowering sensitivity, and if it is included in an amount greater than 10 wt%, surface roughness may increase.
산란 입자(D)Scattered particles (D)
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 산란 입자(D)를 추가로 포함할 수 있다.The photoconversion ink composition according to one embodiment of the present invention may additionally include scattering particles (D).
상기 산란 입자는 양자점에서 방출된 광의 경로를 증가시켜 전체적인 광효율을 높이는 역할을 한다.The above scattering particles serve to increase the overall light efficiency by increasing the path of light emitted from the quantum dot.
상기 산란 입자로는 통상의 무기 재료를 사용할 수 있으며, 바람직하게는 금속 산화물을 사용할 수 있다.As the above scattering particles, conventional inorganic materials can be used, and preferably, metal oxides can be used.
상기 금속산화물은 Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In 및 이들의 조합으로 이루어진 군에서 선택된 1종의 금속을 포함하는 산화물일 수 있으나, 이에 한정되지는 않는다.The above metal oxide may be an oxide including one metal selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In, and combinations thereof, but is not limited thereto.
구체적으로 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ITO, IZO, ATO, ZnO-Al, Nb2O3, SnO, MgO 및 이들의 조합으로 이루어진 군에서 선택된 1종이 가능하다. 필요한 경우 아크릴레이트 등의 불포화 결합을 갖는 화합물로 표면 처리된 재질도 사용 가능하다.Specifically, one selected from the group consisting of Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ITO, IZO, ATO, ZnO-Al, Nb 2 O 3 , SnO, MgO and combinations thereof is possible. If necessary, a material surface-treated with a compound having an unsaturated bond such as acrylate can also be used.
산란 입자는 50 내지 1000nm의 평균입경을 가질 수 있으며, 바람직하기로 100 내지 500 nm, 더욱 바람직하기로 150 내지 300nm의 범위인 것이 좋다. 이때 입자 크기가 너무 작으면 양자점으로부터 방출된 빛의 충분한 산란 효과를 기대할 수 없고, 이와 반대로 너무 큰 경우에는 조성물 내에 가라 앉거나 균일한 품질의 광변환층 표면을 얻을 수 없으므로, 상기 범위 내에서 적절히 조절하여 사용한다.The scattering particles may have an average particle size of 50 to 1000 nm, preferably 100 to 500 nm, and more preferably 150 to 300 nm. If the particle size is too small, sufficient scattering effect of light emitted from the quantum dots cannot be expected, and conversely, if it is too large, it may sink into the composition or a light conversion layer surface of uniform quality may not be obtained. Therefore, it is appropriately adjusted and used within the above range.
본 발명에서 평균입경이란, 수평균 입경일 수 있으며, 예컨대 전계방출 주사전자현미경(FE-SEM) 또는 투과전자현미경(TEM)에 의해 관찰한 상으로부터 구할 수 있다. 구체적으로, FE-SEM 또는 TEM의 관찰 화상으로부터 몇 개의 샘플을 추출하고 이들 샘플의 직경을 측정하여 산술 평균한 값으로 얻을 수 있다.In the present invention, the average particle diameter may be a number-average particle diameter, and may be obtained from an image observed by, for example, a field emission scanning electron microscope (FE-SEM) or a transmission electron microscope (TEM). Specifically, several samples may be extracted from an observation image of an FE-SEM or TEM, and the diameters of these samples may be measured and obtained as an arithmetic average.
상기 산란입자는 상기 광변환 잉크 조성물의 전체 100 중량%에 대하여 0.5 내지 20 중량%, 바람직하게는 1 내지 15 중량%로 포함할 수 있다. 상기 산란입자가 상기 범위 내로 포함될 경우에는 발광 세기 증가 효과가 극대화될 수 있어 바람직하며, 상기 범위 미만으로 포함될 경우에는 얻고자 하는 발광 세기의 확보가 다소 어려울 수 있고, 상기 범위를 초과할 경우에는 청색 조사광의 투과도가 저하되어 발광효율에 문제가 발생할 수 있다.The scattering particles may be included in an amount of 0.5 to 20 wt%, preferably 1 to 15 wt%, based on 100 wt% of the total light conversion ink composition. When the scattering particles are included within the above range, the effect of increasing luminescence intensity can be maximized, which is preferable. When the scattering particles are included in an amount less than the above range, it may be somewhat difficult to secure the desired luminescence intensity, and when the particles are included in an amount exceeding the above range, the transmittance of blue irradiation light may be reduced, which may cause problems in luminescence efficiency.
광중합 개시제(E)Photopolymerization initiator (E)
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 광중합 개시제(E)를 추가로 포함할 수 있다.The photoconversion ink composition according to one embodiment of the present invention may additionally contain a photopolymerization initiator (E).
본 발명의 일 실시형태에서, 상기 광중합 개시제(E)는 상기 경화성 모노머를 중합시킬 수 있는 것이라면 그 종류를 특별히 제한하지 않고 사용할 수 있다. 특히, 상기 광중합 개시제는 중합특성, 개시효율, 흡수파장, 입수성, 가격 등의 관점에서 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물, 옥심계 화합물, 티오크산톤계 화합물, 아실포스핀옥사이드계 화합물 등을 사용하는 것이 바람직하며, 특히 아실포스핀옥사이드계 화합물이 바람직하다. 이들 광중합 개시제는 단독으로 또는 2종 이상 조합하여 사용할 수 있다.In one embodiment of the present invention, the photopolymerization initiator (E) can be used without particular limitation as long as it can polymerize the curable monomer. In particular, from the viewpoints of polymerization characteristics, initiation efficiency, absorption wavelength, availability, price, etc., it is preferable to use an acetophenone-based compound, a benzophenone-based compound, a triazine-based compound, a biimidazole-based compound, an oxime-based compound, a thioxanthone-based compound, an acylphosphine oxide-based compound, etc., and an acylphosphine oxide-based compound is particularly preferable. These photopolymerization initiators can be used alone or in combination of two or more.
상기 아세토페논계 화합물의 구체적인 예로는 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온, 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. Specific examples of the above acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, 2-hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one, etc.
상기 벤조페논계 화합물로서는, 예를 들면 벤조페논, o-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등이 있다. Examples of the above benzophenone compounds include benzophenone, o-benzoyl methyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetra(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, etc.
상기 트리아진계 화합물의 구체적인 예로는 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. Specific examples of the above triazine compounds include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine, Examples thereof include 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine, etc.
상기 비이미다졸계 화합물의 구체적인 예로는 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸 또는 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 비이미다졸 화합물 등을 들 수 있다. 이들 중에서 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸이 바람직하게 사용된다. Specific examples of the above biimidazole compounds include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole, 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, or biimidazole compounds in which the phenyl group at the 4,4',5,5' position is substituted by a carboalkoxy group. Among these, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and 2,2-bis(2,6-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole are preferably used.
상기 옥심계 화합물의 구체적인 예로는 o-에톡시카르보닐-α-옥시이미노-1-페닐프로판-1-온 등을 들 수 있으며, 시판품으로 바스프사의 Irgacure OXE 01, OXE 02가 대표적이다.Specific examples of the above oxime compounds include o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one, and representative commercial products include BASF's Irgacure OXE 01 and OXE 02.
상기 티오크산톤계 화합물로서는, 예를 들면 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등이 있다.Examples of the above thioxanthone compounds include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, etc.
상기 아실포스핀옥사이드계 화합물로서는, 예를 들면 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸-펜틸포스핀옥사이드 등을 들 수 있다. 시판품으로는, 바스프사 제조의 루시린 TPO, 시바 스페셜티 케미컬즈사 제조의 이가큐어-819 등을 들 수 있다.Examples of the above acylphosphine oxide compounds include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl-pentylphosphine oxide, etc. Commercially available products include Lucirin TPO manufactured by BASF and Igacure-819 manufactured by Ciba Specialty Chemicals.
상기 광중합 개시제는 상기 비이온성 광산발생제와 광중합 개시제의 총량 100 중량%에 대하여 50 중량% 이하의 양으로 포함될 수 있다. 상기 광중합 개시제가 상기 비이온성 광산발생제와 광중합 개시제의 총량 100 중량%에 대하여 50 중량% 초과의 양으로 포함되면 양자점의 표면 산화를 야기하여 양자점의 광특성을 저하시킬 수 있다.The above photopolymerization initiator may be included in an amount of 50 wt% or less based on 100 wt% of the total amount of the nonionic photoacid generator and the photopolymerization initiator. If the above photopolymerization initiator is included in an amount exceeding 50 wt% based on 100 wt% of the total amount of the nonionic photoacid generator and the photopolymerization initiator, it may cause surface oxidation of the quantum dot, thereby deteriorating the optical properties of the quantum dot.
상기 광중합 개시제는 상기 광변환 잉크 조성물 전체 100 중량%에 대하여 0.01 내지 20 중량%, 바람직하게는 0.5 내지 15 중량%로 포함될 수 있다. 상기 광중합 개시제가 상기 범위 내로 포함되는 경우 상기 광변환 잉크 조성물이 고감도화되어 노광 시간이 단축되므로 생산성이 향상할 수 있기 때문에 바람직하다. 또한, 본 발명에 따른 광변환 잉크 조성물을 사용하여 형성한 화소부의 강도와 상기 화소부의 표면에서의 평활성이 양호해지는 이점이 있다.The photopolymerization initiator may be included in an amount of 0.01 to 20 wt%, preferably 0.5 to 15 wt%, based on 100 wt% of the total photoconversion ink composition. When the photopolymerization initiator is included within the above range, the photoconversion ink composition becomes highly sensitive, thus shortening the exposure time, thereby improving productivity, which is preferable. In addition, there is an advantage in that the strength of the pixel portion formed using the photoconversion ink composition according to the present invention and the smoothness on the surface of the pixel portion are improved.
상기 광중합 개시제(E)는 본 발명에 따른 광변환 잉크 조성물의 감도를 향상시키기 위해서, 광중합 개시 보조제(e1)를 더 포함할 수 있다. 상기 광중합 개시 보조제가 포함되는 경우 감도가 더욱 높아져 생산성이 향상되는 이점이 있다.The above photopolymerization initiator (E) may further include a photopolymerization initiation assistant (e1) in order to improve the sensitivity of the photoconversion ink composition according to the present invention. When the above photopolymerization initiation assistant is included, there is an advantage in that the sensitivity is further increased, thereby improving productivity.
상기 광중합 개시 보조제(e1)는 예컨대, 아민 화합물, 카르복시산 화합물 및 티올기를 가지는 유기 황화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있으나 이에 한정되지 않는다. The photopolymerization initiation assistant (e1) may preferably be one or more compounds selected from the group consisting of, for example, amine compounds, carboxylic acid compounds, and organic sulfur compounds having a thiol group, but is not limited thereto.
상기 광중합 개시 보조제(e1)는 본 발명의 효과를 해치지 않는 범위에서 적절히 추가하여 사용할 수 있다.The above photopolymerization initiation auxiliary agent (e1) can be appropriately added and used within a range that does not impair the effects of the present invention.
첨가제(F)Additive (F)
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 상기한 성분들 이외에 첨가제(F)를 추가로 포함할 수 있다.The photoconversion ink composition according to one embodiment of the present invention may additionally contain an additive (F) in addition to the above-described components.
상기 첨가제는 계면활성제, 산화방지제, 열산발생제, 분산제, 충진제, 경화제, 밀착증진제 등일 수 있고, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.The above additives may be surfactants, antioxidants, thermal acid generators, dispersants, fillers, curing agents, adhesion promoters, etc., and these may be used alone or in combination of two or more.
상기 계면활성제는 본 발명의 광변환 잉크 조성물의 피막 형성성을 보다 향상시키기 위해 사용할 수 있으며, 불소계 계면활성제, 실리콘계 계면활성제 등이 바람직하게 사용될 수 있다.The above surfactant can be used to further improve the film-forming property of the photoconversion ink composition of the present invention, and a fluorine-based surfactant, a silicone-based surfactant, etc. can be preferably used.
상기 실리콘계 계면활성제는 예를 들면 시판품으로서 다우코닝 도레이 실리콘사의 DC3PA, DC7PA, SH11PA, SH21PA, SH8400 등이 있고, GE 도시바 실리콘사의 TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4452 등이 있다. 상기 불소계 계면활성제는 예를 들면 시판품으로서 다이니혼잉크화학공업㈜의 메가팍 F-470, F-471, F-475, F-482, F-489, F-554 등이 있다.Examples of the silicone surfactants that are commercially available include DC3PA, DC7PA, SH11PA, SH21PA, SH8400 from Dow Corning Toray Silicone Co., Ltd., and TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4452 from GE Toshiba Silicone Co., Ltd. As for the fluorine surfactants that are commercially available include Megapak F-470, F-471, F-475, F-482, F-489, F-554 from Dainippon Ink & Chemical Industry Co., Ltd., for example.
상기 예시된 계면활성제는 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.The surfactants exemplified above can be used alone or in combination of two or more.
상기 첨가제는 상기 광변환 잉크 조성물 전체 100 중량%에 대하여 0.05 내지 10 중량%, 구체적으로 0.1 내지 10 중량%, 더욱 구체적으로 0.1 내지 5 중량%로 사용할 수 있으나 이에 한정되는 것은 아니다.The above additive may be used in an amount of 0.05 to 10 wt%, specifically 0.1 to 10 wt%, and more specifically 0.1 to 5 wt%, relative to 100 wt% of the total photoconversion ink composition, but is not limited thereto.
본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 용제를 실질적으로 포함하지 않으며, 포함하더라도 광변환 잉크 조성물 전체 100 중량%에 대하여 1 중량% 이하의 양으로 포함할 수 있다. 본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 용제를 포함하지 않는 무용제형이거나 1 중량% 이하의 극소량 포함하는 저용제형임에도 양자점의 광특성 및 분산성이 우수하고, 저점도 구현이 가능하다.The photoconversion ink composition according to one embodiment of the present invention substantially does not contain a solvent, and even if it does contain a solvent, it may be contained in an amount of 1 wt% or less relative to 100 wt% of the total photoconversion ink composition. The photoconversion ink composition according to one embodiment of the present invention is a solvent-free type that does not contain a solvent or a low-solvent type that contains a very small amount of 1 wt% or less, but has excellent optical properties and dispersibility of quantum dots and can implement low viscosity.
또한, 본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 수지 성분을 실질적으로 포함하지 않으며, 포함하더라도 광변환 잉크 조성물 전체 100 중량%에 대하여 0.5 중량% 이내로 포함할 수 있다. 본 발명의 일 실시형태에 따른 광변환 잉크 조성물은 수지 성분을 포함하지 않음으로써 낮은 점도를 구현할 수 있어 잉크의 노즐 제팅 특성이 우수하다.In addition, the photoconversion ink composition according to one embodiment of the present invention substantially does not include a resin component, and even if it does include one, it may be included in an amount of 0.5 wt% or less with respect to 100 wt% of the entire photoconversion ink composition. The photoconversion ink composition according to one embodiment of the present invention can implement low viscosity by not including a resin component, and thus has excellent nozzle jetting characteristics of the ink.
본 발명의 일 실시형태는 상술한 광변환 잉크 조성물의 경화물을 포함하는 광변환 화소에 관한 것이다. One embodiment of the present invention relates to a photoconversion pixel comprising a cured product of the photoconversion ink composition described above.
또한, 본 발명의 일 실시형태는 상술한 광변환 화소를 포함하는 컬러필터에 관한 것이다. In addition, one embodiment of the present invention relates to a color filter including the above-described photoconversion pixel.
본 발명에 따른 광변환 잉크 조성물의 패턴 형성 방법은, 상술한 광변환 잉크 조성물을 잉크젯 방식으로 소정 영역에 도포하는 단계 및 상기 도포된 광변환 잉크 조성물을 경화시키는 단계를 포함하여 이루어진다.A method for forming a pattern of a photoconversion ink composition according to the present invention comprises a step of applying the above-described photoconversion ink composition to a predetermined area by inkjet method and a step of curing the applied photoconversion ink composition.
먼저, 본 발명의 광변환 잉크 조성물을 잉크젯 분사기에 주입하여 기판의 소정 영역에 프린팅한다.First, the photoconversion ink composition of the present invention is injected into an inkjet injector and printed on a predetermined area of a substrate.
상기 기판은 제한되지 않으며, 일례로 유리 기판, 실리콘 기판, 폴리카보네이트 기판, 폴리에스테르 기판, 방향족 폴리아미드 기판, 폴리아미드이미드 기판, 폴리이미드 기판, Al 기판, GaAs 기판 등의 표면이 평탄한 기판을 들 수 있다. 이들 기판은 실란 커플링제 등의 약품에 의한 약품 처리, 플라스마 처리, 이온 플레이팅 처리, 스퍼터링 처리, 기상반응 처리, 진공증착 처리 등의 전처리를 실시할 수 있다. 기판으로서 실리콘 기판 등을 사용하는 경우, 실리콘 기판 등의 표면에는 전하 결합소자(CCD), 박막 트랜지스터(TFT) 등이 형성될 수 있다. 또한, 격벽 매트릭스가 형성되어 있을 수도 있다.The above substrate is not limited, and examples thereof include flat-surfaced substrates such as a glass substrate, a silicon substrate, a polycarbonate substrate, a polyester substrate, an aromatic polyamide substrate, a polyamideimide substrate, a polyimide substrate, an Al substrate, and a GaAs substrate. These substrates can be pretreated by a chemical treatment using a silane coupling agent or the like, a plasma treatment, an ion plating treatment, a sputtering treatment, a gas phase reaction treatment, or a vacuum deposition treatment. When a silicon substrate or the like is used as the substrate, a charge-coupled device (CCD), a thin film transistor (TFT), or the like can be formed on the surface of the silicon substrate or the like. In addition, a barrier matrix may be formed.
잉크젯 분사기의 일례인 피에조 잉크젯 헤드에서 분사되어 기판 위에서 적절한 상(phase)을 형성하기 위하여, 점도, 유동성, 양자점 입자 등의 특성이 잉크젯 헤드와 균형 있게 맞춰져야 한다. 본 발명에서 사용된 피에조 잉크젯 헤드는 제한되지 않으나, 약 10 내지 100pL, 바람직하게는 약 20 내지 40pL의 액적 크기를 가지는 잉크를 분사한다.In order to form an appropriate phase on a substrate by being ejected from a piezo inkjet head, which is an example of an inkjet injector, the properties such as viscosity, fluidity, and quantum dot particles must be balanced with those of the inkjet head. The piezo inkjet head used in the present invention is not limited, but ejects ink having a droplet size of about 10 to 100 pL, preferably about 20 to 40 pL.
본 발명의 광변환 잉크 조성물의 점도는 25℃에서 약 3 내지 30cP가 적당하며, 보다 바람직하게는 7 내지 20cP의 범위에서 조절된다.The viscosity of the photoconversion ink composition of the present invention is suitably controlled to be about 3 to 30 cP at 25°C, and more preferably, to be controlled to be in the range of 7 to 20 cP.
본 발명의 일 실시형태에 따른 컬러필터는 상기 패턴 형성방법에 의해 형성되는 착색 패턴층을 포함한다. 즉, 컬러필터는 기판 상에 상술한 광변환 잉크 조성물을 소정의 패턴으로 도포한 후 경화시켜 형성되는 착색 패턴층을 포함하는 것을 특징으로 한다. 컬러필터의 구성 및 제조방법은 당해 기술분야에서 잘 알려져 있으므로 자세한 설명을 생략한다.A color filter according to one embodiment of the present invention includes a colored pattern layer formed by the pattern forming method. That is, the color filter is characterized by including a colored pattern layer formed by applying the above-described photoconversion ink composition on a substrate in a predetermined pattern and then curing it. Since the configuration and manufacturing method of the color filter are well known in the art, a detailed description thereof will be omitted.
본 발명의 일 실시형태는 상술한 컬러필터가 구비된 화상표시장치에 관한 것이다.One embodiment of the present invention relates to an image display device equipped with the color filter described above.
본 발명의 컬러필터는 통상의 액정표시장치(LCD)뿐만 아니라, 전계발광표시장치(EL), 플라스마표시장치(PDP), 전계방출표시장치(FED), 유기발광소자(OLED) 등 각종 화상표시장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as conventional liquid crystal displays (LCDs), electroluminescence displays (ELs), plasma display devices (PDPs), field emission displays (FEDs), and organic light emitting diodes (OLEDs).
본 발명의 화상표시장치는 상술한 컬러필터를 구비한 것을 제외하고는, 당해 기술분야에서 알려진 구성을 포함한다.The image display device of the present invention includes a configuration known in the art, except that it has the color filter described above.
이하, 실시예, 비교예 및 실험예에 의해 본 발명을 보다 구체적으로 설명하고자 한다. 이들 실시예, 비교예 및 실험예는 오직 본 발명을 설명하기 위한 것으로, 본 발명의 범위가 이들에 국한되지 않는다는 것은 당업자에게 있어서 자명하다.Hereinafter, the present invention will be described in more detail by examples, comparative examples, and experimental examples. These examples, comparative examples, and experimental examples are only for explaining the present invention, and it is obvious to those skilled in the art that the scope of the present invention is not limited thereto.
합성예 1: 양자점(Q-1)의 합성Synthesis Example 1: Synthesis of quantum dot (Q-1)
인듐 아세테이트(Indium acetate) 0.4mmol(0.058g), 팔미트산(palmitic acid) 0.6mmol(0.15g) 및 1-옥타데센(octadecene) 20mL를 반응기에 넣고 진공 하에 120℃로 가열하였다. 1시간 후 반응기 내 분위기를 질소로 전환하였다. 280℃로 가열한 후, 트리스(트리메틸실릴)포스핀(TMS3P) 0.2mmol(58㎕) 및 트리옥틸포스핀 1.0mL의 혼합 용액을 신속히 주입하고 1분간 반응시켰다.Indium acetate (0.4 mmol) (0.058 g), palmitic acid (0.15 g) and 1-octadecene (20 mL) were placed in a reactor and heated to 120°C under vacuum. After 1 hour, the atmosphere inside the reactor was changed to nitrogen. After heating to 280°C, a mixed solution of 0.2 mmol (58 μL) of tris(trimethylsilyl)phosphine (TMS 3 P) and 1.0 mL of trioctylphosphine was rapidly injected and reacted for 1 minute.
이어서 아연 아세테이트 2.4mmoL(0.448g), 올레산 4.8mmol 및 트리옥틸아민 20mL를 반응기에 넣고 진공 하에 120℃로 가열하였다. 1시간 후 반응기 내 분위기를 질소로 전환하고 반응기를 280℃로 승온시켰다. 앞서 합성한 InP 코어 용액 2ml를 넣고, 이어서 트리옥틸포스핀 중의 셀레늄(Se/TOP) 4.8mmol을 넣은 후, 최종 혼합물을 2시간 동안 반응시켰다. 상온으로 신속하게 식힌 반응 용액에 에탄올을 넣고 원심 분리하여 얻은 침전을 감압여과 후 감압 건조하여 InP/ZnSe 코어-쉘을 형성시켰다. Then, 2.4 mmol (0.448 g) of zinc acetate, 4.8 mmol of oleic acid, and 20 mL of trioctylamine were placed in the reactor and heated to 120°C under vacuum. After 1 hour, the atmosphere inside the reactor was changed to nitrogen, and the reactor was heated to 280°C. 2 mL of the previously synthesized InP core solution was added, followed by 4.8 mmol of selenium (Se/TOP) in trioctylphosphine, and the final mixture was reacted for 2 hours. Ethanol was added to the reaction solution, which was quickly cooled to room temperature, and the precipitate obtained by centrifugation was filtered under reduced pressure and dried under reduced pressure to form an InP/ZnSe core-shell.
이어서, 아연 아세테이트 2.4mmoL(0.448g), 올레산 4.8mmol 및 트리옥틸아민 20mL를 반응기에 넣고 진공 하에 120℃로 가열하였다. 1시간 후 반응기 내 분위기를 질소로 전환하고 반응기를 280℃로 승온시켰다. 앞서 합성한 InP/ZnSe 코어-쉘 용액 2 ml를 넣고, 이어서 트리옥틸포스핀 중의 황(S/TOP) 4.8mmol을 넣은 후, 최종 혼합물을 2시간 동안 반응시켰다. 상온으로 신속하게 식힌 반응 용액에 에탄올을 넣고 원심 분리하여 얻은 침전을 감압여과 후 감압 건조하여 InP/ZnSe/ZnS 코어-쉘 구조의 침전물을 수득하였다. 얻어진 나노 양자점의 광발광 스펙트럼의 최대발광 피크는 535nm를 나타내었다. Then, 2.4 mmol (0.448 g) of zinc acetate, 4.8 mmol of oleic acid, and 20 mL of trioctylamine were placed in a reactor, and the reactor was heated to 120°C under vacuum. After 1 hour, the atmosphere inside the reactor was changed to nitrogen, and the reactor was heated to 280°C. 2 mL of the previously synthesized InP/ZnSe core-shell solution was added, followed by 4.8 mmol of sulfur (S/TOP) in trioctylphosphine, and the final mixture was reacted for 2 hours. Ethanol was added to the reaction solution, which was quickly cooled to room temperature, and the resulting precipitate was centrifuged, filtered under reduced pressure, and dried under reduced pressure to obtain a precipitate having an InP/ZnSe/ZnS core-shell structure. The maximum emission peak of the photoluminescence spectrum of the obtained nano quantum dots was 535 nm.
앞서 수득한 양자점 용액 5mL를 원심분리 튜브에 넣고 에탄올 20mL를 넣어 침전시켰다. 원심분리를 통해 상층액은 버리고 침전물에 2mL의 클로로포름을 넣어 양자점을 분산시킨 다음 0.50g의 (2-부톡시에톡시)아세트산을 넣고 질소분위기 하에서 60℃로 가열하면서 한 시간 동안 반응시켰다.The 5 mL of the quantum dot solution obtained above was placed in a centrifuge tube and 20 mL of ethanol was added to precipitate. The supernatant was discarded after centrifugation, and 2 mL of chloroform was added to the precipitate to disperse the quantum dots. Then, 0.50 g of (2-butoxyethoxy)acetic acid was added and reacted for one hour while heating at 60°C under a nitrogen atmosphere.
이어서, 반응물에 25mL의 n-헥산을 넣어 양자점을 침전시킨 후 원심분리를 실시하여 양자점(Q-1)을 얻었다.Next, 25 mL of n-hexane was added to the reaction mixture to precipitate the quantum dots, and centrifugation was performed to obtain quantum dots (Q-1).
제조예 1: 양자점 분산액(A-1)의 제조Manufacturing Example 1: Manufacturing of quantum dot dispersion (A-1)
양자점(Q-1) 47.6 중량부와 희석액으로서 저점도 모노머 아이소보닐아크릴레이트 52.4 중량부를 혼합하여 질소분위기 하에서 60℃로 가열하면서 4시간 동안 반응시켜 양자점 분산액 (A-1)을 제조하였다.A quantum dot dispersion (A-1) was prepared by mixing 47.6 parts by weight of quantum dots (Q-1) and 52.4 parts by weight of low-viscosity monomer isobornyl acrylate as a diluent and reacting them for 4 hours while heating at 60°C under a nitrogen atmosphere.
제조예 2: 양자점 분산액(A-2)의 제조Manufacturing Example 2: Manufacturing of quantum dot dispersion (A-2)
양자점(Q-1) 47.6 중량부와 희석액으로서 저점도 모노머 1,6-헥산디올디아크릴레이트 52.4 중량부를 혼합하여 질소분위기 하에서 60℃로 가열하면서 4시간 동안 반응시켜 양자점 분산액 (A-2)을 제조하였다.A quantum dot dispersion (A-2) was prepared by mixing 47.6 parts by weight of quantum dots (Q-1) and 52.4 parts by weight of low-viscosity monomer 1,6-hexanediol diacrylate as a diluent and reacting them for 4 hours while heating at 60°C under a nitrogen atmosphere.
제조예 3: 양자점 분산액(A-3)의 제조Manufacturing Example 3: Manufacturing of quantum dot dispersion (A-3)
양자점(Q-1) 47.6 중량부와 희석액으로서 고점도 모노머 디트리메틸올프로판테트라(메타)아크릴레이트 52.4 중량부를 혼합하여 질소분위기 하에서 60℃로 가열하면서 4시간 동안 반응시켜 양자점 분산액 (A-3)을 제조하였다.A quantum dot dispersion (A-3) was prepared by mixing 47.6 parts by weight of quantum dots (Q-1) and 52.4 parts by weight of high-viscosity monomer ditrimethylolpropanetetra(meth)acrylate as a diluent and reacting them for 4 hours while heating at 60°C under a nitrogen atmosphere.
제조예 4: 산란입자 분산액(D-1)의 제조Manufacturing Example 4: Manufacturing of scattering particle dispersion (D-1)
산란입자로서 입경 210nm인 TiO2(이시하라사 CR-63) 70.0 중량부, 분산제로서 DISPERBYK-2001(BYK사 제조) 4.0 중량부 및 희석액으로서 저점도 모노머 1,6-헥산디올디아크릴레이트 26 중량부를 비드밀에 의해 12시간 동안 혼합 및 분산하여 산란입자 분산액(D-1)을 제조하였다.70.0 parts by weight of TiO 2 (CR-63, Ishihara) having a particle size of 210 nm as a scattering particle, 4.0 parts by weight of DISPERBYK-2001 (manufactured by BYK) as a dispersant, and 26 parts by weight of low-viscosity monomer 1,6-hexanediol diacrylate as a diluent were mixed and dispersed using a bead mill for 12 hours to prepare a scattering particle dispersion (D-1).
실시예 및 비교예: 광변환 잉크 조성물의 제조Examples and Comparative Examples: Preparation of Photoconversion Ink Compositions
하기 표 1 및 표 2의 조성으로 각각의 성분들을 혼합하여 광변환 잉크 조성물을 제조하였다(중량%).A photoconversion ink composition was prepared by mixing each component according to the compositions in Table 1 and Table 2 below (weight %).
A-1: 제조예 1에서 제조된 양자점 분산액(희석액으로서 아이소보닐아크릴레이트 포함)A-1: Quantum dot dispersion prepared in Manufacturing Example 1 (containing isobornyl acrylate as a diluent)
A-2: 제조예 2에서 제조된 양자점 분산액(희석액으로서 1,6-헥산디올디아크릴레이트 포함)A-2: Quantum dot dispersion prepared in Manufacturing Example 2 (including 1,6-hexanediol diacrylate as a diluent)
A-3: 제조예 3에서 제조된 양자점 분산액(희석액으로서 디트리메틸올프로판테트라(메타)아크릴레이트 포함)A-3: Quantum dot dispersion prepared in Manufacturing Example 3 (containing ditrimethylolpropanetetra(meth)acrylate as a diluent)
B-1: 아이소보닐아크릴레이트(점도: 5 ~ 10 cP, 25℃)B-1: Isobornyl acrylate (viscosity: 5 ~ 10 cP, 25℃)
B-2: 1,6-헥산디올디아크릴레이트(점도: 5 ~ 10 cP, 25℃)B-2: 1,6-Hexanediol diacrylate (Viscosity: 5 ~ 10 cP, 25℃)
B-3: 디트리메틸올프로판테트라(메타)아크릴레이트(점도: 400 ~ 600 cP, 25℃)B-3: Ditrimethylolpropanetetra(meth)acrylate (Viscosity: 400 ~ 600 cP, 25℃)
C-1: 하기 화학식 5로 표시되는 화합물 C-1: A compound represented by the following chemical formula 5
[화학식 5][Chemical Formula 5]
C-2: 하기 화학식 7로 표시되는 화합물C-2: A compound represented by the following chemical formula 7
[화학식 7][Chemical formula 7]
D-1: 제조예 4에서 제조된 산란입자 분산액D-1: Scatter particle dispersion prepared in Manufacturing Example 4
E-1: TPO (BASF 사)E-1: TPO (BASF)
F-1: F-554 (DIC㈜ 사)F-1: F-554 (DIC Co., Ltd.)
실험예: Experimental example:
상기 실시예 및 비교예에서 제조된 광변환 잉크 조성물을 사용하여 아래와 같이 광변환 코팅층을 제조하였으며, 이때의 막두께, 휘도, 분산성, 고습 조건 신뢰성 및 점도를 하기와 같은 방법으로 측정하고, 그 결과를 하기 표 3 및 표 4에 나타내었다.Using the photoconversion ink compositions manufactured in the above examples and comparative examples, a photoconversion coating layer was manufactured as follows, and the film thickness, brightness, dispersibility, high-humidity condition reliability, and viscosity at this time were measured by the following methods, and the results are shown in Tables 3 and 4 below.
< 광변환 코팅층의 제조>< Manufacturing of photoconversion coating layer >
실시예 및 비교예에서 제조된 각각의 광변환 잉크 조성물을 잉크젯 방식으로 5cm×5cm 유리 기판 위에 도포한 다음, 자외선 광원으로서 g, h, i 선을 모두 함유하는 1kW 고압 수은등을 사용하여 1000mJ/㎠로 조사 후 180℃의 가열 오븐에서 30분 동안 가열하여 광변환 코팅층을 제조하였다.Each of the photoconversion ink compositions manufactured in the examples and comparative examples was applied onto a 5 cm × 5 cm glass substrate by inkjet, and then irradiated at 1000 mJ/cm2 using a 1 kW high-pressure mercury lamp containing all of the g, h, and i lines as an ultraviolet light source, and then heated in a heating oven at 180°C for 30 minutes to manufacture a photoconversion coating layer.
(1) 막두께(1) Film thickness
상기에서 제조된 광변환 코팅층의 막 두께를 막두께 측정기(Dektak 6M, Vecco 社)를 이용하여 측정하였다.The film thickness of the photoconversion coating layer manufactured above was measured using a film thickness measuring device (Dektak 6M, Vecco).
(2) 휘도 (2) Brightness
상기에서 제조된 광변환 코팅층을 청색(blue) 광원(XLamp XR-E LED, Royal blue 450, Cree 社) 상부에 위치시킨 후 휘도 측정기(CAS140CT Spectrometer, Instrument systems 社)를 이용하여, 청색 광 조사 시 휘도를 측정하였다.The photoconversion coating layer manufactured above was placed on top of a blue light source (XLamp XR-E LED, Royal blue 450, Cree), and the brightness was measured when irradiated with blue light using a brightness meter (CAS140CT Spectrometer, Instrument systems).
(3) 분산성(3) Dispersibility
상기 광변환 잉크 조성물의 제조 과정에서, 산란입자를 투입하기 전의 액상 시료를 육안으로 확인하여 하기 평가 기준에 따라 평가하였다.In the process of manufacturing the above photoconversion ink composition, the liquid sample before adding scattering particles was visually inspected and evaluated according to the following evaluation criteria.
<평가 기준><Evaluation criteria>
○: 투명한 상태○: Transparent state
×: 혼탁한 상태×: cloudy state
(4) 고습 조건 신뢰성(4) Reliability under high humidity conditions
상기에서 제조된 광변환 코팅층에 대해 고습 조건에 의한 발광효율 특성 변화를 하기 수학식 1로 확인하였다. 구체적으로, 상기 광변환 코팅층을 12시간 동안 85%의 고습 조건에서 방치하고, 방치 전후의 발광효율을 측정하여 하기 수학식 1로 발광효율 유지율을 계산하였다.The change in luminous efficiency characteristics due to high humidity conditions for the photoconversion coating layer manufactured above was confirmed using the following mathematical formula 1. Specifically, the photoconversion coating layer was left for 12 hours under high humidity conditions of 85%, and the luminous efficiency before and after leaving was measured to calculate the luminous efficiency maintenance rate using the following mathematical formula 1.
[수학식 1][Mathematical formula 1]
발광효율 유지율(%) = {(고습 조건 방치 후 발광효율) / (고습 조건 방치 전 발광효율)} × 100Luminous efficiency maintenance rate (%) = {(luminous efficiency after exposure to high humidity conditions) / (luminous efficiency before exposure to high humidity conditions)} × 100
고습 조건 신뢰성은 하기 평가 기준에 따라 평가하였다.High humidity condition reliability was evaluated according to the following evaluation criteria.
<평가 기준><Evaluation criteria>
○: 발광효율 유지율이 90% 이상○: Luminous efficiency maintenance rate of 90% or more
×: 발광효율 유지율이 90% 미만×: Luminous efficiency retention rate is less than 90%
(5) 점도 (5) Viscosity
상기 광변환 잉크 조성물의 점도는 R형 점도계(VISCOMETER MODEL RE120L SYSTEM, 도키 산교 가부시끼가이샤 제품)를 사용하여 회전수 20 rpm, 온도 25℃의 조건에서 측정하였다.The viscosity of the above photoconversion ink composition was measured using an R-type viscometer (VISCOMETER MODEL RE120L SYSTEM, manufactured by Toki Sangyo Co., Ltd.) at a rotation speed of 20 rpm and a temperature of 25°C.
상기 표 3 내지 표 4에 나타낸 바와 같이, 본 발명에 따라 비이온성 광산발생제를 포함하고, 경화성 모노머로서 25℃에서 30 cP 이하의 점도를 갖는 경화성 모노머를 포함하는 실시예의 광변환 잉크 조성물은 분산성이 양호하며, UV 공정 후 광특성 저하가 발생하지 않아 광특성이 우수하고, 고습 상태에서의 장기 신뢰성이 우수한 것을 확인하였다. 반면, 비이온성 광산발생제를 포함하지 않거나 경화성 모노머로서 25℃에서 30 cP 초과의 점도를 갖는 경화성 모노머를 포함하는 비교예의 광변환 잉크 조성물은 분산성이 떨어지거나, UV 공정 후 광특성 저하가 발생하거나, 또는 고습 상태에서의 장기 신뢰성이 떨어지는 것을 확인할 수 있었다.As shown in Tables 3 and 4 above, the photoconversion ink compositions of the examples including a nonionic photoacid generator according to the present invention and a curable monomer having a viscosity of 30 cP or less at 25°C have good dispersibility, no degradation of optical properties occurs after the UV process, so that the optical properties are excellent, and the long-term reliability under high humidity conditions is excellent. On the other hand, the photoconversion ink compositions of the comparative examples not including a nonionic photoacid generator or including a curable monomer having a viscosity of more than 30 cP at 25°C were found to have poor dispersibility, poor optical properties after the UV process, or poor long-term reliability under high humidity conditions.
이상으로 본 발명의 특정한 부분을 상세히 기술하였는 바, 본 발명이 속한 기술분야에서 통상의 지식을 가진 자에게 있어서 이러한 구체적인 기술은 단지 바람직한 구현예일 뿐이며, 이에 본 발명의 범위가 제한되는 것이 아님은 명백하다. 본 발명이 속한 기술분야에서 통상의 지식을 가진 자라면 상기 내용을 바탕으로 본 발명의 범주 내에서 다양한 응용 및 변형을 행하는 것이 가능할 것이다.As described above, specific parts of the present invention have been described in detail. It is obvious to those skilled in the art that these specific descriptions are merely preferred implementation examples and that the scope of the present invention is not limited thereto. Those skilled in the art will be able to make various applications and modifications within the scope of the present invention based on the above contents.
따라서, 본 발명의 실질적인 범위는 첨부된 특허청구범위와 그의 등가물에 의하여 정의된다고 할 것이다.Accordingly, the substantial scope of the present invention will be defined by the appended claims and their equivalents.
Claims (10)
상기 경화성 모노머는 25℃에서 30 cP 이하의 점도를 갖는 경화성 모노머로 구성되는 광변환 잉크 조성물.Containing quantum dots, curable monomers and nonionic photoacid generators,
A photoconversion ink composition comprising a curable monomer having a viscosity of 30 cP or less at 25°C.
[화학식 1]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the first paragraph, the photoconversion ink composition wherein the nonionic photoacid generator generates an acid compound represented by the following chemical formula 1:
[Chemical Formula 1]
In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
[화학식 2]
[화학식 3]
상기 식에서, R은 C1-C4의 지방족 탄화수소기이다.In the first paragraph, the nonionic photoacid generator is a photoconversion ink composition comprising at least one of the compounds represented by the following chemical formulas 2 to 3:
[Chemical formula 2]
[Chemical Formula 3]
In the above formula, R is an aliphatic hydrocarbon group of C 1 -C 4 .
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200039365A KR102770715B1 (en) | 2020-03-31 | 2020-03-31 | Light Conversion Ink Composition, Color Filter and Display Device |
JP2021055607A JP7487134B2 (en) | 2020-03-31 | 2021-03-29 | Light conversion ink composition, color filter, and image display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200039365A KR102770715B1 (en) | 2020-03-31 | 2020-03-31 | Light Conversion Ink Composition, Color Filter and Display Device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20210121917A KR20210121917A (en) | 2021-10-08 |
KR102770715B1 true KR102770715B1 (en) | 2025-02-21 |
Family
ID=78003350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020200039365A Active KR102770715B1 (en) | 2020-03-31 | 2020-03-31 | Light Conversion Ink Composition, Color Filter and Display Device |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7487134B2 (en) |
KR (1) | KR102770715B1 (en) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101475520B1 (en) | 2008-01-14 | 2014-12-23 | 삼성전자주식회사 | Quantum dot ink composition for inkjet printing and electronic device using the same |
JP6094406B2 (en) * | 2013-07-11 | 2017-03-15 | Jsr株式会社 | Radiation sensitive resin composition, cured film, light emitting element, wavelength conversion film, and method for forming light emitting layer |
KR102195513B1 (en) * | 2013-12-24 | 2020-12-28 | 제이에스알 가부시끼가이샤 | Curable resin composition, cured film, light emitting element, and method for forming light emitting layer |
JP6427876B2 (en) * | 2013-12-27 | 2018-11-28 | Jsr株式会社 | Radiation sensitive resin composition, cured film, light emitting element, and method for forming light emitting layer |
JP2016000803A (en) * | 2014-05-19 | 2016-01-07 | 富士フイルム株式会社 | Quantum dot-containing polymerizable composition, wavelength conversion member, backlight unit, liquid crystal display device, and method for producing wavelength conversion member |
WO2016010077A1 (en) * | 2014-07-18 | 2016-01-21 | 旭硝子株式会社 | Negative-type photosensitive resin composition, and resin cured film, partition and optical element |
JP6657684B2 (en) * | 2015-09-04 | 2020-03-04 | Jsr株式会社 | Composition for forming cured film, cured film, light emitting display element, and method for forming cured film |
KR20170110344A (en) * | 2016-03-23 | 2017-10-11 | 동우 화인켐 주식회사 | Photoresist Composition Comprising Photo Acid Generator and Thermal Acid Generator |
CN113861760B (en) * | 2016-12-28 | 2023-05-05 | Dic株式会社 | Dispersion body |
JP6878915B2 (en) * | 2017-01-26 | 2021-06-02 | 東洋インキScホールディングス株式会社 | Quantum dots and quantum dot-containing compositions |
KR102711499B1 (en) * | 2018-07-10 | 2024-09-27 | 삼성디스플레이 주식회사 | Ink compositions, production method thereof, and method of forming quatnum dot polymer composite pattern using the same |
-
2020
- 2020-03-31 KR KR1020200039365A patent/KR102770715B1/en active Active
-
2021
- 2021-03-29 JP JP2021055607A patent/JP7487134B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2021162863A (en) | 2021-10-11 |
KR20210121917A (en) | 2021-10-08 |
JP7487134B2 (en) | 2024-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI742244B (en) | Color filter and image display device | |
CN108026443B (en) | Additive stabilized composite nanoparticles | |
KR102737424B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
KR102153965B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
KR20210102828A (en) | A quantum dot, a quantum dot dispersion, a light converting curable composition, a quantum dot light-emitting diode and a quantum dot film comprising the quantum dot, a cured film manufactured by the composition and a display device comprising the same | |
KR102153632B1 (en) | A light conversion ink composition, a color filter manufactured by using thereof and a display device comprising the same | |
CN108026444B (en) | Additive stabilized composite nanoparticles | |
JP2024123014A (en) | Quantum dots, quantum dot dispersions containing the same, curable compositions, cured films, and image display devices | |
TWI725261B (en) | Yellow curable resin composition, and color filter and image display device comprising the same | |
CN116478681A (en) | Quantum dot, quantum dot dispersion, light-converting curable composition, cured film formed using the composition, and image display device | |
KR102770783B1 (en) | A quantum dot, a light converting ink composition comprising the quantum dot, a light converting pixel manufactured by the composition, a color filter comprising the light converting pixel and a display device comprising the same | |
KR102153629B1 (en) | A light conversion ink composition, a color filter manufactured by using thereof and an image display device using the same | |
KR20210154588A (en) | A quantum dot, a quantum dot dispersion, a light converting curable composition, a quantum dot light-emitting diode, a quantum dot film and a light converting ink composition comprising the quantum dot, a cured film manufactured by the composition and a display device comprising the same | |
KR102732873B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
KR102727274B1 (en) | An ink composition, a pixel manufactured by using thereof, a color filter comprising the pixel, and a display device comprising the color filter | |
JP2022112507A (en) | Quantum Dots, Quantum Dot Dispersions, Photoconverting Ink Compositions, Electronic Devices, Color Filters, Photoconverting Layered Substrates, and Image Display Devices | |
KR102770715B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
KR102725672B1 (en) | Quantum Dot Dispersion and Curable Composition Comprising the Same | |
TW201823385A (en) | Yellow curable resin composition, and color filter and image display device comprising the same | |
KR20210092684A (en) | An ink composition, a pixel manufactured by using thereof, a color filter comprising the pixel, and a display device comprising the color filter | |
CN115678536B (en) | Quantum dots and their applications | |
CN113214819B (en) | Quantum dots, quantum dot dispersion containing the same, curable composition, cured film and image display device | |
KR102790001B1 (en) | An ink composition, a pixel manufactured by using thereof, a color filter comprising the pixel, and a display device comprising the color filter | |
KR102778841B1 (en) | A quantum dot, a quantum dot dispersion, a light converting curable composition, a cured film manufactured by the composition and a display device comprising the cured film | |
TW201842164A (en) | Additive stabilized composite nanoparticles |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20200331 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20220207 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20200331 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20240319 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20241125 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20250217 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20250217 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration |