KR102760889B1 - 2-(3급-부틸아미노)-4-((1r,3r,4r)-3-하이드록시-4-메틸사이클로헥실아미노)-피리미딘-5-카복스아미드의 고체형, 이의 조성물 및 이의 사용방법 - Google Patents
2-(3급-부틸아미노)-4-((1r,3r,4r)-3-하이드록시-4-메틸사이클로헥실아미노)-피리미딘-5-카복스아미드의 고체형, 이의 조성물 및 이의 사용방법 Download PDFInfo
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- KR102760889B1 KR102760889B1 KR1020227013115A KR20227013115A KR102760889B1 KR 102760889 B1 KR102760889 B1 KR 102760889B1 KR 1020227013115 A KR1020227013115 A KR 1020227013115A KR 20227013115 A KR20227013115 A KR 20227013115A KR 102760889 B1 KR102760889 B1 KR 102760889B1
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Classifications
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D239/00—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
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Abstract
Description
도 2는 형태 A의 결정 패킹 패턴(crystal packing pattern) 및 H-결합 스킴(H-bond scheme)을 도시한 것이다.
도 3은 형태 A의 주사전자현미경(SEM) 이미지를 도시한 것이다.
도 4는 형태 A의 열중량분석(TGA) 서모그램(thermogram)을 도시한 것이다.
도 5는 형태 A의 시차 주사 열량측정(DSC) 서모그램을 도시한 것이다.
도 6은 형태 A의 동적 증기 흡착(DVS) 등온 플롯을 도시한 것이다.
도 7은 형태 A의 1H 핵 자기 공명(NMR) 스펙트럼을 도시한 것이다.
도 8은 형태 A의 DVS 전 및 후의 XRPD 패턴(위 및 아래)의 오버레이를 도시한 것이다.
도 9는 형태 A를 1분 동안 2000psi 압축한 후의 XRPD 패턴을 도시한 것이다.
도 10은 형태 B의 XRPD 패턴을 도시한 것이다.
도 11은 형태 B의 TGA 서모그램을 도시한 것이다.
도 12는 형태 B의 DSC 서모그램을 도시한 것이다.
도 13은 형태 B의 1H NMR 스펙트럼을 도시한 것이다.
도 14는 형태 C의 XRPD 패턴을 도시한 것이다.
도 15는 형태 C의 TGA 서모그램을 도시한 것이다.
도 16은 형태 C의 DSC 서모그램을 도시한 것이다.
도 17은 형태 C의 1H NMR 스펙트럼을 도시한 것이다.
도 18은 형태 D의 XRPD 패턴을 도시한 것이다.
도 19는 형태 D의 TGA 서모그램을 도시한 것이다.
도 20은 형태 D의 DSC 서모그램을 도시한 것이다.
도 21은 형태 D의 1H NMR 스펙트럼을 도시한 것이다.
도 22는 형태 E의 XRPD 패턴을 도시한 것이다.
도 23은 형태 E의 TGA 서모그램을 도시한 것이다.
도 24는 형태 E의 DSC 서모그램을 도시한 것이다.
도 25는 형태 E의 1H NMR 스펙트럼을 도시한 것이다.
도 26은 형태 F의 XRPD 패턴을 도시한 것이다.
도 27은 형태 F의 TGA 서모그램을 도시한 것이다.
도 28은 형태 F의 DSC 서모그램을 도시한 것이다.
도 29는 형태 F의 1H NMR 스펙트럼을 도시한 것이다.
도 30은 형태 G의 XRPD 패턴을 도시한 것이다.
도 31은 형태 G의 TGA 서모그램을 도시한 것이다.
도 32는 형태 G의 DSC 서모그램을 도시한 것이다.
도 33은 형태 G의 1H NMR 스펙트럼을 도시한 것이다.
도 34는 형태 H의 XRPD 패턴을 도시한 것이다.
도 35는 형태 H의 TGA 서모그램을 도시한 것이다.
도 36은 형태 H의 DSC 서모그램을 도시한 것이다.
도 37은 형태 A, 형태 B, 형태 C, 형태 D, 형태 E, 형태 F, 형태 G 및 형태 H의 XRPD 패턴의 오버레이를 도시한 것이다.
도 38은 형태 I의 XRPD 패턴을 도시한 것이다.
도 39는 형태 I의 DSC 서모그램을 도시한 것이다.
도 40은 형태 I의 1H NMR 스펙트럼을 도시한 것이다.
도 41은 무정형 고체의 XRPD 패턴을 도시한 것이다.
도 42는 무정형 고체의 DSC 서모그램을 도시한 것이다.
도 43은 무정형 고체의 1H NMR 스펙트럼을 도시한 것이다.
도 44는 무정형 고체의 질량 분광법과 함께 액체 크로마토그래피를 도시한 것이다.
도 45는 DMSO 중 물% 대 온도에서의 화합물 1의 형태 A 및 H의 형태 맵(map)을 도시한 것이다.
Claims (11)
- 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
9.80, 10.30, 14.62, 17.29, 18.23, 20.66, 21.74 및 30.55°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
9.83, 10.21, 12.16, 17.26, 17.61, 18.18, 20.46 및 21.86°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
10.37, 13.41, 17.54, 17.73, 19.52, 21.54, 22.47 및 23.92°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
9.92, 10.36, 11.97, 14.50, 17.29, 18.37, 20.10 및 21.81°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
8.07, 9.21, 12.06, 17.45, 17.79, 18.53, 20.85 및 21.10°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
9.51, 10.34, 16.94, 17.33, 17.90, 21.28, 28.83 및 31.22°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
9.74, 10.23, 14.64, 17.22, 18.04, 18.55, 21.76 및 24.18°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 화학식(iii)의 화합물을 용매 중에서 염기 또는 루이스산의 존재하에 R1NH2와 접촉시키는 것을 포함하고,
7.94, 10.50, 11.86, 16.00, 17.26, 18.27, 20.65 및 24.12°2θ±0.2°2θ에서 피크를 포함하는 X선 분말 회절 패턴을 갖는 화학식(iv)의 화합물의 결정형의 제조방법으로서,
상기 화학식에서,
R1은 이고,
R2는 이고,
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(iii)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(iii)의 화합물을 제조하는 방법은, 용매 중에서 염기의 존재 하에 2,4-디클로로피리미딘-5-카복스아미드를 화학식(A)의 화합물과 접촉시키는 것을 포함하고:
상기 화학식(iv)의 화합물의 결정형의 제조방법은 화학식(A)의 화합물을 제조하는 방법을 추가로 포함하되,
화학식(A)의 화합물을 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iv)의 화합물의 결정형의 제조방법. - 2,4-디클로로피리미딘-5-카복스아미드를 용매 중에서 염기의 존재하에 R2NH2와 접촉시키는 것을 포함하는, 화학식(iii)의 화합물의 제조방법으로서,
상기 화학식에서,
R2는 이고,
상기 화학식(iii)의 화합물의 제조방법은 R2NH2를 제조하는 방법을 추가로 포함하되,
R2NH2를 제조하는 방법은,
화학식(9a)의 화합물을 용매 중에서 염산과 접촉시키는 것을 포함하고:
이 때 용매는 에테르이고,
이 때 염산과의 반응 전에 화학식(9a) 및 (9b)의 화합물들의 부분입체이성질체 혼합물을 키랄 분리법을 사용하여 분리시키는 것을 추가로 포함하고:
이 때 상기 키랄 분리법은 키랄 초임계 유체 크로마토그래피(SFC), 재결정화, 키랄 HPLC, 키랄 LC 및 키랄 분해(chiral resolution) 로 이루어진 군으로부터 선택되는 것인,
화학식(iii)의 화합물의 제조방법. - 1) 화학식(iv)의 화합물을 제1 온도에서 제1 용매에 용해시키고; 2) 제2 용매를 상기 생성된 용액에 첨가하고; 3) 상기 용액을 제2 온도로 냉각시키고; 4) 고체를 수집하는 것을 포함하는, 제1항 내지 제8항 중 어느 한 항의 화학식(iv)의 화합물의 결정형의 정제방법.
상기 화학식에서,
R1은 이고,
R2는 이다. - 화학식(iii)의 화합물 또는 이의 호변이성질체.
상기 화학식에서,
R2는 이다.
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