KR102741487B1 - Gas valve assembly and substrate processing apparatus having the same - Google Patents

Abstract

The present invention relates to a gas valve assembly, a substrate processing apparatus and a substrate processing system having the same, and more specifically, to a gas valve assembly through which gas for substrate processing is supplied, a substrate processing apparatus and a substrate processing system having the same.
The present invention comprises: a main passage part (100) forming a main passage (S1) through which gas passes; a gas inlet part (300) extending from the main passage part (100) and forming a gas inlet passage (S2) communicating with the main passage (S1); a gas outlet part (400) extending from the main passage part (100) and having an outlet (410) formed to communicate with the main passage (S1); A gas valve assembly is disclosed, which includes a blocking member (200) that supplies or blocks the gas by opening and closing the outlet (410) through operation on the main path (S1), and the gas inlet member (300) includes at least one inlet (310) formed so that gas supplied through the gas inlet passage (S2) is transmitted to the main path (S1), and an inlet member contact surface (320) with which the blocking member (200) is in contact when the outlet (410) is opened.

Description

{Gas valve assembly and substrate processing apparatus having the same}

The present invention relates to a gas valve assembly, a substrate processing apparatus and a substrate processing system having the same, and more specifically, to a gas valve assembly through which gas for substrate processing is supplied, a substrate processing apparatus and a substrate processing system having the same.

A substrate processing device is a device that performs substrate processing, such as depositing or etching the surface of a substrate mounted on a substrate support, by applying power to a closed processing space to form plasma.

At this time, the substrate processing device is configured to include a top lid and a chamber body that are combined with each other to form a processing space, a showerhead assembly installed in the top lid to inject gas for substrate processing into the processing space, and a substrate support part installed in the chamber body to support the substrate.

Meanwhile, the substrate processing device can inject gas for substrate processing into the processing space, including the showerhead assembly, and it is very important to stably supply the gas used at this time.

In particular, when particles are formed due to continuous gas supply on the gas valve assembly for gas supply, there is a problem that the particles enter the processing space during the gas supply process, thereby reducing process precision.

In order to solve this problem, as shown in Fig. 1, the conventional gas supply valve periodically cleans particles deposited on the blocking surface by supplying cleaning gas while opening the gas supply path to expose the blocking surface. However, in this case, there is a problem that the sealing member installed together with the blocking surface is continuously exposed to the cleaning gas, causing damage to the sealing member.

In this way, damage to the sealing member causes additional particles to be generated by the sealing member, and there is a problem in that the process gas leaks because the blocking section is not completely closed.

The purpose of the present invention is to provide a gas valve assembly having a structure for preventing exposure of a sealing member to process gas, a substrate processing device having the same, and a substrate processing system, in order to solve the above-mentioned problems.

The present invention has been created to achieve the above-described purpose of the present invention, and the present invention comprises: a main passage part (100) forming a main passage (S1) through which gas passes; a gas inlet part (300) extending from the main passage part (100) and forming a gas inlet passage (S2) communicated with the main passage (S1); a gas outlet part (400) extending from the main passage part (100) and having an outlet (410) formed to communicate with the main passage (S1); A gas valve assembly is disclosed, which includes a blocking member (200) that supplies or blocks the gas by opening and closing the outlet (410) through operation on the main path (S1), and the gas inlet member (300) includes at least one inlet (310) formed so that gas supplied through the gas inlet passage (S2) is transmitted to the main path (S1), and an inlet member contact surface (320) with which the blocking member (200) is in contact when the outlet (410) is opened.

The above blocking member (200) may include a blocking member (210) including a blocking surface (211) that opens and closes the outlet (410), a first sealing member (212) provided on the edge of the blocking surface (211), and a driving shaft (220) that connects an external driving unit and the blocking member (210).

The above blocking surface (211) may be provided so as to protrude in a shape corresponding to the outlet (410) so that at least a portion thereof is inserted into the outlet (410).

The above gas inlet portion (300) may additionally include a blocking surface exposure port (330) formed through the center of the inlet contact surface (320) corresponding to the blocking surface (211) so that when the blocking member (210) is in close contact with the inlet contact surface (320), the blocking surface (211) is exposed to the gas inlet passage (S2).

The above inlet (310) can be formed to communicate with the main flow path (S1) at a location adjacent to the blocking surface exposure port (330).

The above main flow path (100) may include a main flow path forming part (140) that is formed by extending from the gas inlet (300) and the gas outlet (400), and a cover part (110) that is coupled to the main flow path forming part (140) to form the main flow path (S1) inside.

The above main flow path part (100) may additionally include a second sealing member (130) provided on the joint surface between the main flow path forming part (140) and the cover part (110).

The above gas inlet section (300) may include a gas inlet section (341) that is connected to the external gas chamber side and forms at least a portion of the gas inlet passage (S2), and an extension section (350) that is formed by extending radially from an end of the gas inlet section (341) on the main path section (100).

The above gas outlet (400) may include an outlet contact surface (430) to which the blocking portion (200) is in close contact when the outlet (410) is closed by the blocking portion (200).

The above blocking member (200) can be in close contact with the inlet contact surface (320) when the outlet port (410) is open and with the outlet contact surface (430) when the outlet port (410) is closed, respectively, in order to prevent the first sealing member (212) from being exposed to gas.

In addition, the present invention discloses a substrate processing device including a process chamber (10) forming a processing space for substrate processing; a substrate support member (20) installed in the process chamber (10) to support a substrate (1); a showerhead (30) installed on an upper portion of the substrate support member (20) to inject gas for performing a process; a gas chamber installed outside the process chamber (10) to supply gas to the showerhead (30); and a gas valve assembly (70) installed in a pipe for supplying gas from the gas chamber to the showerhead (30) to control the gas supplied to the showerhead (30).

The above gas chamber may be a remote plasma supply chamber that supplies gas in a plasma state.

In addition, the present invention discloses a substrate processing system including a plurality of substrate processing devices (4) that form a sealed processing space to perform substrate processing; a substrate return module (3) in which the plurality of substrate processing devices (4) are coupled and a return robot (5) that transports or introduces the substrate (1) to each of the plurality of substrate processing devices (4) is installed; and a substrate exchange module (2) coupled to the substrate return module (3) to transport a substrate (1) that has completed substrate processing through the substrate processing device (4) to the outside and to introduce a substrate (1) to be processed from the outside.

The gas valve assembly according to the present invention, the substrate processing device and the substrate processing system having the same have the advantage of enabling smooth substrate processing by removing particles generated and deposited on the gas valve assembly by periodically exposing the gas valve assembly to a cleaning gas.

In addition, the gas valve assembly according to the present invention, the substrate processing device and the substrate processing system having the same have the advantage of minimizing damage to the sealing member caused by gas by preventing the sealing member from being exposed to the process gas and the cleaning gas.

Accordingly, the gas valve assembly according to the present invention, the substrate processing device and the substrate processing system having the same have the advantage of increasing the durability of the sealing member, preventing gas leakage and particle generation from the sealing member, thereby enabling stable process performance.

In addition, the gas valve assembly according to the present invention, the substrate processing device and the substrate processing system having the same have the advantage of maximizing the cleaning effect of the blocking surface by preventing the sealing member from being exposed to the process gas and cleaning gas while allowing the blocking surface to be exposed to the cleaning gas.

Figure 1 is a cross-sectional view showing the appearance of a conventional gas valve assembly.
Figure 2 is a cross-sectional view showing a schematic appearance of a substrate processing device according to the present invention.
Figure 3 is a perspective view showing the state of a gas valve assembly according to the present invention with the cover portion removed.
FIGS. 4A and 4B are cross-sectional views showing the operating appearance of the gas valve assembly of FIG. 3. FIG. 4A is a cross-sectional view showing the gas valve assembly in a closed state, and FIG. 4B is a cross-sectional view showing the gas valve assembly in an open state.
Fig. 5 is a cross-sectional view taken in the AA direction showing the internal appearance of the gas valve assembly according to Fig. 3.
FIG. 6 is a schematic diagram of a substrate processing system including a substrate processing device according to FIG. 2.

Hereinafter, a gas valve assembly according to the present invention, a substrate processing device having the same, and a substrate processing system will be described with reference to the attached drawings.

The substrate processing system according to the present invention, as illustrated in FIG. 6, comprises: a plurality of substrate processing devices (4) that form a sealed processing space to perform substrate processing; a substrate return module (3) in which the plurality of substrate processing devices (4) are coupled and a return robot (5) for transporting or introducing a substrate (1) to each of the plurality of substrate processing devices (4) is installed; and a substrate exchange module (2) coupled to the substrate return module (3) for transporting a substrate (1) that has completed substrate processing through the substrate processing device (4) to the outside and introducing a substrate (1) to be processed from the outside.

The substrate (1) to be processed by the present invention is a configuration in which substrate processing such as deposition and etching is performed, and any substrate such as a semiconductor manufacturing substrate, an LCD manufacturing substrate, an OLED manufacturing substrate, a solar cell manufacturing substrate, or a transparent glass substrate can be used.

In particular, the substrate (1) may be configured to perform substrate processing through process gas injected into a processing space.

The above substrate return module (3) is configured such that multiple substrate processing devices (4) are combined, and a return robot (5) for transporting or introducing a substrate (1) is installed in each of the multiple substrate processing devices (4), and various configurations are possible.

For example, the substrate return module (3) can transfer a substrate to be processed (1) brought in from the outside through the substrate exchange module (2) to the substrate processing device (4) through a return robot (5) installed inside.

In addition, the substrate return module (3) can transport a substrate (1) that has undergone substrate processing through the substrate processing device (4) from the substrate processing device (4) to the substrate exchange module (2) and transport it to the outside.

The above substrate exchange module (2) is configured to be coupled to a substrate return module (3) to transport a substrate (1) that has undergone substrate processing to the outside through a substrate processing device (4) and to introduce a substrate (1) to be processed from the outside. Various configurations are possible.

For example, the substrate exchange module (2) can load a substrate (1) to be processed from outside in an atmospheric pressure state and transport the substrate (1) to a substrate return module (3) in a vacuum space.

In addition, the substrate exchange module (2) can receive a substrate (1) on which substrate processing has been completed from the substrate processing device (4) through the substrate return module (3) and unload the substrate (1) on which processing has been completed from the inside of a vacuum space to the outside under atmospheric pressure.

The above substrate processing device (4) is configured to perform substrate processing by forming a sealed processing space, and is installed in multiple units in the substrate return module (3) to perform the same process or different processes.

For example, the substrate processing device (4), as illustrated in FIG. 2, includes a process chamber (10) forming a processing space for substrate processing; a substrate support member (20) installed in the process chamber (10) to support a substrate (1); a showerhead (30) installed on the upper portion of the substrate support member (20) to inject a process gas for performing a process; a gas chamber installed outside the process chamber (10) to supply gas to the showerhead (30); and a gas valve assembly (70) installed in a pipe for supplying gas from the gas chamber to the showerhead (30) to control the gas supplied to the showerhead (30).

The above process chamber (10) is configured to form a processing space for substrate processing and can have various configurations.

For example, the process chamber (10) may include a chamber body (11) with an open upper side and a top lid (12) that covers the upper part of the chamber body (11) to form a processing space for substrate processing.

The above chamber body (11) is configured such that the upper part is open and a processing space for substrate processing is formed, and various configurations are possible.

In particular, the chamber body (11) may be provided with a substrate support member (20) to be described later, and one or more gates (13) may be formed on the inner wall for introducing and discharging the substrate (1) into the processing space.

The above gate (13) is a structure formed in the chamber body (11) of the process chamber (10) for introducing and discharging the substrate (1) into the processing space, and various structures are possible.

The above top lid (12) is configured to cover the upper part of the chamber body (11) to form a processing space for substrate processing, and various configurations are possible.

For example, the top lid (12) may be opened at the center so that a showerhead (30) described later may be installed, or may be installed so that the upper part of the chamber body (11) is covered from above the showerhead (30).

In addition, the process chamber (10) may additionally include a gas supply pipe (14) that transmits gas between the showerhead (30) and the gas valve assembly (70) described below.

The above substrate support member (20) is installed in the process chamber (10) and is configured to secure the substrate (1), and various configurations are possible.

For example, the substrate support member (20) may include a substrate mounting member (21) on which the substrate (1) is mounted, and a support shaft (22) installed on the lower side of the substrate mounting member (21) so that the substrate mounting member (21) can move up and down.

The above substrate support member (20) can be installed so that the substrate (1) and the substrate mounting member (21) can move up and down for the introduction and discharge of the substrate (1) and substrate processing, and further, a temperature control member including a heater can be additionally installed for temperature control such as heating or cooling the substrate (1).

In addition, the substrate support member (20) may be configured as an electrode or ground at a position opposite to the showerhead (30) described below, in order to form a plasma atmosphere in the processing space for substrate processing.

The above showerhead (30) is installed on the upper part of the substrate support member (20) and is configured to spray gas for performing a process, and various configurations are possible.

The above showerhead (30) is connected to a gas valve assembly (70) and can uniformly spray gas supplied from an external gas chamber through the gas valve assembly (70) toward a substrate (1) located on the upper surface of a substrate support member (20).

The above gas chamber is installed outside the process chamber (10) and supplies gas to the showerhead (30), and various configurations are possible.

At this time, the gas chamber may be configured as an RPG (Remote Plasma Generator) that supplies gas in a plasma state, and may be configured to supply gas in a plasma state.

Accordingly, since gas in a plasma state is supplied, the first sealing member (212) installed on the blocking surface (211) described later is easily damaged when exposed to the gas, so a technology is required to minimize the exposure of the first sealing member (212) to gas, especially to the cleaning gas.

Furthermore, since the blocking surface (211) is continuously exposed to gas flowing back from the process chamber (10) when the outlet (410) is closed, exposure to the cleaning gas is necessary. However, since damage occurs when the first sealing member (212) is exposed to the cleaning gas in a plasma state, a technology is needed to minimize the exposure of the first sealing member (212) while exposing the blocking surface (211) to the cleaning gas.

The above gas valve assembly (70) is installed in a pipe for supplying gas from a gas chamber to a showerhead (30) and is configured to control the gas supplied to the showerhead (30), and various configurations are possible.

At this time, the gas valve assembly (70) is a configuration through which gas for the process is delivered, so it is very important to deliver the gas supplied for the process without foreign substances, particles, etc., and for this purpose, cleaning gas can be supplied periodically.

In particular, the gas valve assembly (70) has a problem in that when the gas valve is shut off, gas for the process is located through a space located on the side of the process chamber (10), and the blocking surface (211) for blocking is continuously exposed to the gas, and thus particles accumulate and the accumulated particles are supplied together when the gas is supplied.

To this end, as illustrated in FIG. 1, a conventional gas valve assembly includes a gas inlet (50) through which gas is introduced, a gas outlet (60) that delivers the introduced gas to a process chamber (10), and a blocking member (40) that opens and closes a gas path, and while the blocking member (40) opens the gas path, a cleaning gas is supplied to remove particles deposited on the blocking member (40).

However, as shown in Fig. 1, the conventional gas valve assembly has a structure in which the sealing member (41) provided in the blocking member (40) is also exposed to the cleaning gas, and thus there is a problem in that the durability of the sealing member (41) is reduced and particles are generated due to damage to the sealing member (41).

In order to overcome these problems, the gas valve assembly according to the present invention, as illustrated in FIG. 2, includes a main passage part (100) forming a main passage (S1) through which gas passes; a gas inlet part (300) extending from the main passage part (100) and forming a gas inlet passage (S2) communicating with the main passage (S1); a gas outlet part (400) extending from the main passage part (100) and forming an outlet (410) communicating with the main passage (S1); and a blocking part (200) that opens and closes the outlet (410) by driving on the main passage (S1) to supply or block the gas.

Meanwhile, the gas valve assembly of the present invention can be formed by processing the main flow path (100), gas inlet (300), and gas outlet (400) into a single body, and as another example, can be formed by physically combining each component.

Here, the gas is a composition including a process gas used in a process for processing a substrate (1) and a cleaning gas used for cleaning a gas valve assembly, and any gas disclosed in the related art that is used for processing a substrate or for cleaning a gas valve assembly can be applied.

The above main flow path (100) is configured to form a main flow path (S1) through which gas passes, and various configurations are possible.

For example, the main flow path (100) may include a main flow path forming part (140) that extends from a gas inlet (300) and a gas outlet (400) formed on one side to the other side to form a space for a main flow path (S1), and a cover part (110) that is coupled to the main flow path forming part (140) to form a main flow path (S1) inside together with the main flow path forming part (140).

In addition, the main euro section (100) may additionally include a through hole (120) through which a drive shaft (220) passes, which is connected to a drive section installed externally to drive the blocking section (200).

In addition, the main flow path part (100) may additionally include a second sealing member (130) provided on the joint surface between the main flow path forming part (140) and the cover part (110).

At this time, it is also obvious that the main flow path (100) may be configured as an independent member, connected to the gas inlet (300) and the gas outlet (400), and having a main flow path (S1).

The above main flow path forming part (140) is formed by extending from a gas inlet part (300) and a gas outlet part (400) formed vertically on one side to the other side, as shown in FIGS. 4a and 4b, and may have an internal space so that a main flow path (S1) is formed inside.

The above main flow path forming part (140) can form a main flow path (S1) inside by combining the cover part (110), and through this, gas supplied through the gas inlet part (300) can be delivered to the gas outlet part (400) through the main flow path (S1).

Meanwhile, when the gas is blocked, the gas supplied through the gas inlet (300) can be located in the main path (S1) due to the blocking of the gas outlet (400).

That is, the main path (S1) can be formed to communicate with the gas inlet (300) regardless of the passage or blocking of gas.

The above cover part (110) is configured to be connected to the main flow path forming part (140) to form a main flow path (S1) inside, and various configurations are possible.

For example, the cover part (110) may be connected to a main flow path forming part (140) that extends from a gas inlet part (300) and a gas outlet part (400) on the opposite side of the gas inlet part (300) and the gas outlet part (400) to form an internal space that is a main flow path (S1).

That is, the cover part (110) can be connected to the main flow path forming part (140) at a position opposite to the gas inlet part (300) and gas outlet part (400) located on one side.

Meanwhile, the cover part (110) may have an inner surface that forms a main path (S1) that is formed flat, and as another example, may have an inner surface that has a curve and a protruding portion to induce smooth fluid flow of gas supplied from the gas inlet part (300) to the gas outlet part (400).

Meanwhile, the cover part (110) is configured to be coupled to the main flow forming part (140), and when the coupling is released, the main flow (S1) can be opened to the outside to facilitate maintenance of the gas valve assembly and other components.

That is, when the cover part (110) is separated from the main flow path forming part (140), it can be installed to open the main flow path (S1) and facilitate maintenance of the internal configuration.

The above-mentioned through hole (120) is configured to allow a drive shaft (220) connected to a drive unit installed externally to drive the blocking unit (200) to pass through, and various configurations are possible.

The above through hole (120) can be formed to a size corresponding to the drive shaft (220), and at this time, a bellows or the like can be additionally installed on the drive shaft (220) to prevent leakage of the transmitted gas.

The above second sealing member (130) is provided on the joint surface between the main flow path forming member (140) and the cover member (110), and various configurations are possible.

For example, the second sealing member (130) may be provided as an O-ring on the joint surface between the main channel forming part (140) and the cover part (110) to prevent gas from leaking from the joint surface, and more preferably, a groove may be formed on at least one of the joint surfaces of the main channel forming part (140) and the cover part (110) so that the second sealing member may be fitted into the groove and joined, thereby performing sealing more completely.

The above blocking unit (200) is configured to supply or block gas by opening and closing the outlet (410) through driving on the main path (S1), and various configurations are possible.

For example, the blocking member (200) may include a blocking member (210) that opens and closes the outlet (410), a driving member that drives the blocking member (210) from the outside, and a driving shaft (220) that connects the driving member and the blocking member (210).

The above blocking member (210) is configured to open and close the outlet (410) and can have various configurations.

For example, the blocking member (210) may include a blocking surface (211) that opens and closes the outlet (410) and a first sealing member (212) provided at the edge of the blocking surface (211).

That is, the above-mentioned blocking member (210) can supply or block gas by opening and closing the outlet (410) through which the gas outlet (400) and the main passage (S1) are connected.

The above blocking surface (211) is configured to directly open and close the outlet (410) and may have various configurations.

For example, the above-mentioned blocking surface (211) may be provided so that at least a portion thereof is in surface contact with the gas outlet (400) to block the outlet (410), and as another example, may be provided so as to protrude in a shape corresponding to the outlet (410) so that at least a portion thereof is inserted into the outlet (410).

That is, a part may be formed to protrude with a size and shape corresponding to the outlet (410) so that at least a part may be inserted into the outlet (410), and the gas supply may be blocked by contacting the gas outlet (400) at the magnetic field.

The above first sealing member (212) is provided at the edge of the blocking surface (211) and is configured to come into contact between the gas outlet (400) and the blocking member (210), and various configurations are possible.

The above first sealing member (212) may be an O-ring that comes into contact between the blocking member (210) and the gas outlet (400) to prevent gas from being supplied through the space between the blocking member (210) and the gas outlet (400) when the gas is blocked, and a rubber material or the like may be used for a more complete gas blocking effect.

The above driving shaft (220) is a configuration that connects the blocking member (210) and the external driving unit, and can have various configurations.

For example, the above-mentioned driving shaft (220) can be connected to a blocking member (210) at one end and connected to an external driving member at the other end to drive the blocking member (210), and can be installed by penetrating a through hole (120) formed in the main passage (100).

The above drive shaft (220) can be driven in various ways to close the outlet (410) when the blocking member (210) blocks gas, open the outlet (410) when the gas is supplied, and bring it into close contact with the inlet contact surface (320) formed in the gas inlet (300).

For example, the drive shaft (220) can be driven in L motion through an external drive unit, and can be driven by cam driving, hydraulic driving, motor driving, and a combination thereof.

The above gas inlet section (300) is configured to extend from the main flow path section (100) as shown in FIGS. 4a and 4b and form a gas inlet passage (S2) that is connected to the main flow path (S1), and various configurations are possible.

For example, the gas inlet (300) may include at least one inlet (310) formed so that gas supplied through the gas inlet passage (S2) is transferred to the main passage (S1), and an inlet contact surface (320) to which the blocking portion (200) is in contact when the outlet (410) is opened.

In addition, the gas inlet portion (300) may additionally include a blocking surface exposure port (330) formed through the center of the inlet contact surface (320) corresponding to the blocking surface (211) so that the blocking surface (211) is exposed to the gas inlet passage (S2) when the blocking member (210) is in contact with the inlet contact surface (320).

In addition, the gas inlet section (300) may include a gas inlet section (341) that is connected to the external gas chamber side to form at least a portion of a gas inlet passage (S2), and an extension section (350) that is formed by extending radially from an end of the main passage section (100) of the gas inlet section (341).

The above inlet port (310) is configured to allow the gas inlet passage (S2) through which gas is supplied and the main passage (S1) to be connected, and various configurations are possible.

For example, the inlet port (310) may be formed so that the gas inlet passage (S2) and the main passage (S1) are connected to each other in order to prevent the gas supplied by the inlet contact surface (320) located between the gas inlet passage (S2) and the main passage (S1) from being blocked.

At this time, the inlet port (310) may be formed in multiple numbers and may be formed to communicate with the main flow path (S1) on both sides centered on the blocking surface exposure port (330).

More specifically, the inlet port (310) may be formed on both sides around the blocking surface exposure port (330) so that gas supplied through the gas inlet passage (S2) is diffused through the expansion portion (350) and delivered to the main passage (S1).

That is, the inlet (310) is formed adjacent to the blocking surface exposure port (330), so that the gas supplied through the gas inlet passage (S2), particularly the cleaning gas in a plasma state for cleaning the blocking surface (211), comes into contact with the blocking surface (211) through the blocking surface exposure port (330), thereby increasing the cleaning efficiency of the blocking surface (211).

Furthermore, when supplying the cleaning gas, the cleaning gas is delivered to the blocking surface (211) of the blocking part (200) exposed to the gas inlet passage (S2) through the blocking surface exposure port (330), and can be spread left and right through the expansion part (350) and delivered to the main path (S1) through the inlet port (310).

The above inlet contact surface (320) is configured to be in contact with the blocking portion (200) when the outlet (410) is opened, and various configurations are possible.

The above inlet contact surface (320) is a configuration that separates the gas inlet passage (S2) and the main path (S1), and can be formed between the gas inlet (300) and the main path (100).

At this time, the inlet sealing surface (320) can prevent the first sealing member (212) from being exposed to gas by sealing the blocking member (210) when gas is supplied through the opening of the outlet (410).

At this time, the inlet contact surface (320) may be formed so that at least a portion of the blocking surface (211) and the first sealing member (212) are in close contact, and an insertion groove may be additionally formed to completely prevent exposure to gas by inserting the first sealing member (212).

The above-mentioned blocking surface exposure opening (330) is configured to penetrate the center of the inlet contact surface (320) so as to correspond to the blocking surface (211) so that the blocking surface (211) is exposed to the gas inlet passage (S2) when the blocking member (210) is in close contact with the inlet contact surface (320). Various configurations are possible.

That is, the above-mentioned blocking surface exposure opening (330) can allow the cleaning gas to remove particles deposited on the blocking surface (211) by exposing at least a portion of the blocking surface (211) of the blocking member (210) to the gas inlet passage (S2).

To this end, the above-mentioned blocking surface exposure port (330) is formed through a penetration at a position corresponding to the blocking surface (211) of the inlet contact surface (320), so that the cleaning gas supplied through the gas inlet passage (S2) can be delivered to the blocking surface (211).

The above gas introduction unit (341) is formed on one end of the gas introduction unit (300) and is formed on a flange (340) connected to an external gas chamber to form at least a part of the gas introduction passage (S2), and various configurations are possible.

The above gas introduction unit (341) may be formed through processing inside the gas introduction unit (300) so that at least a portion of the gas introduction passage (S2) is formed, and as another example, may be a pipe installed inside the gas introduction unit (300).

At this time, the gas introduction portion (341) may be formed with a diameter equal to or smaller than the diameter of the blocking surface exposure port (330) so that the supplied gas, particularly the cleaning gas, can be delivered to the blocking surface (211) exposed to the gas inlet passage (S2) side through the blocking surface exposure port (330).

That is, the gas introduction portion (341) is formed so that the center is the same as the blocking surface exposure port (330) and the diameter is the same or smaller, so that the cleaning gas supplied through the gas introduction passage (S2) is delivered to the blocking surface (211), thereby increasing the removal efficiency of particles deposited on the blocking surface (211).

The above-mentioned expansion portion (350) is formed by extending radially from the end of the main path portion (100) of the gas introduction portion (341), and various configurations are possible.

For example, the above-mentioned expansion portion (350) has a step portion (351) and is expanded radially at the end of the main path portion (100) of the gas introduction portion (341), so that gas supplied through the gas inlet passage (S2) formed on the gas introduction portion (341) side can pass through the inlets (310) provided on both sides of the blocking surface exposure port (330) and be delivered to the main path (S1).

At this time, the expansion portion (350) is extended radially from the gas introduction portion (341) with a step portion (351), and the step portion (351) may be formed to have a curve or a protruding portion for smooth fluid flow of the supplied gas.

The above gas outlet (400) is formed to extend from the main flow path (100) and has an outlet (410) formed to communicate with the main flow path (S1), and various configurations are possible.

For example, the gas outlet (400) may have one end in the shape of a flange (420) so as to be connected to the process chamber (10), and an outlet (410) may be formed at the boundary with the main flow path (100) so as to be connected to the main flow path (S1).

In addition, the gas outlet (400) may include an outlet contact surface (430) to which the blocking portion (200) is in close contact when the outlet (410) is closed by the blocking portion (200).

The above outlet (410) is configured to supply or block gas that has reached the main path (S1) through the gas inlet path (S2) to the process chamber (10), and various configurations are possible.

The above outlet (410) can be opened or closed through the aforementioned blocking member (200) to allow gas to be supplied or blocked.

The above-mentioned outlet contact surface (430) is formed at the edge of the outlet (410) when the outlet (410) is closed by the blocking member (200), as shown in FIGS. 4a and 4b, and is configured to contact at least a portion of the blocking member (200), and various configurations are possible.

In particular, the above-mentioned outlet contact surface (430) can protect the first sealing member (212) formed in the blocking member (200) from being exposed to gas when the outlet (410) is closed, thereby enabling complete closure of the outlet (410).

Meanwhile, at this time, the blocking member (200) can be in close contact with the inlet contact surface (320) when the outlet port (410) is open and with the outlet contact surface (430) when the outlet port (410) is closed, respectively, in order to prevent the first sealing member (212) from being exposed to gas.

Accordingly, by minimizing the exposure of the first sealing member (212) to gas during the supply and blocking of gas of the blocking member (200), damage to the first sealing member (212) can be minimized.

The above is only a description of some of the preferred embodiments that can be implemented by the present invention, and therefore, as is well known, the scope of the present invention should not be construed as being limited to the above embodiments, and the technical ideas of the present invention described above and the technical ideas underlying them are all included in the scope of the present invention.

100: Main Euro 200: Blocking
300: Gas inlet 400: Gas outlet

Claims (13)

A main passage section (100) forming a main passage (S1) through which gas passes;
A gas inlet section (300) that extends from the main flow section (100) and forms a gas inlet passage (S2) that is connected to the main flow section (S1);
A gas outlet (400) formed by extending from the main flow path (100) and having an outlet (410) formed to communicate with the main flow path (S1);
By opening and closing the outlet (410) through driving on the main path (S1), the gas is supplied or blocked, and a blocking part (200) having a first sealing member (212) on the edge is included.
The above gas inlet (300) is
It includes at least one inlet port (310) formed so that gas supplied through the gas inlet passage (S2) is delivered to the main passage (S1), and an inlet contact surface (320) to which the blocking portion (200) is in close contact so as to prevent gas exposure of the first sealing member (212) when the outlet port (410) is opened.
A gas valve assembly characterized in that the main flow path (S1) and the gas inflow passage (S2) are connected to each other while the blocking part (200) is in close contact with the inflow contact surface (320). In claim 1,
The above blocking part (200) is
A gas valve assembly characterized by including a blocking member (210) including a blocking surface (211) for opening and closing the outlet (410), the first sealing member (212) provided on the edge of the blocking surface (211), and a driving shaft (220) connecting an external driving unit and the blocking member (210). In claim 2,
The above blocking surface (211) is
A gas valve assembly characterized in that it is provided so as to protrude in a shape corresponding to the outlet (410) so that at least a portion thereof is inserted into the outlet (410). In claim 2,
The above gas inlet (300) is
A gas valve assembly characterized in that it additionally includes a blocking surface exposure port (330) formed through the center of the inlet contact surface (320) to correspond to the blocking surface (211) so that when the blocking member (210) is brought into close contact with the inlet contact surface (320), the blocking surface (211) is exposed to the gas inlet passage (S2). In claim 4,
The above inlet (310) is
A gas valve assembly characterized in that it is formed so as to be connected to the main path (S1) at a position adjacent to the above-mentioned blocking surface exposure port (330). A main passage section (100) forming a main passage (S1) through which gas passes;
A gas inlet section (300) that extends from the main flow section (100) and forms a gas inlet passage (S2) that is connected to the main flow section (S1);
A gas outlet (400) formed by extending from the main flow path (100) and having an outlet (410) formed to communicate with the main flow path (S1);
It includes a blocking unit (200) that supplies or blocks the gas by opening and closing the outlet (410) through driving on the main path (S1).
The above gas inlet (300) is
It includes at least one inlet port (310) formed so that gas supplied through the gas inlet passage (S2) is delivered to the main passage (S1), and an inlet port contact surface (320) to which the blocking portion (200) is contacted when the outlet port (410) is opened.
The above main euro section (100) is
A gas valve assembly characterized by including a main flow path forming part (140) formed by extending from the gas inlet part (300) and the gas outlet part (400), and a cover part (110) coupled to the main flow path forming part (140) to form the main flow path (S1) inside. In claim 6,
The above main euro section (100) is
A gas valve assembly characterized by additionally including a second sealing member (130) provided on a joint surface between the main flow forming member (140) and the cover member (110). In claim 1,
The above gas inlet (300) is
A gas valve assembly characterized by including a gas introduction portion (341) that is connected to the external gas chamber side and forms at least a part of the gas introduction passage (S2), and an extension portion (350) that is formed by extending radially from an end of the main passage portion (100) of the gas introduction portion (341). In claim 2,
The above gas outlet (400) is
A gas valve assembly characterized in that it includes an outlet contact surface (430) to which the blocking member (200) is in close contact when the outlet (410) is closed by the blocking member (200). In claim 9,
The above blocking part (200) is
A gas valve assembly characterized in that, in order to prevent the first sealing member (212) from being exposed to gas, when the outlet (410) is opened, it is in close contact with the inlet contact surface (320) and when the outlet (410) is closed, it is in close contact with the outlet contact surface (430). A process chamber (10) forming a processing space for substrate processing;
A substrate support member (20) installed in the above process chamber (10) to support the substrate (1);
A showerhead (30) installed on the upper part of the substrate support member (20) and spraying gas for performing the process;
A gas chamber installed outside the above process chamber (10) and supplying gas to the shower head (30);
A substrate processing device characterized by including a gas valve assembly (70) according to any one of claims 1 to 10, which is installed in a pipe for supplying gas from the gas chamber to the showerhead (30) and controls the gas supplied to the showerhead (30). In claim 11,
The above gas chamber,
A substrate processing device characterized by a remote plasma supply chamber that supplies gas in a plasma state. A plurality of substrate processing devices (4) according to claim 11, which perform substrate processing by forming a sealed processing space;
A substrate return module (3) in which the above plurality of substrate processing devices (4) are combined and a return robot (5) for transporting or introducing the substrate (1) to each of the above plurality of substrate processing devices (4) is installed;
A substrate processing system characterized by including a substrate exchange module (2) coupled to the substrate return module (3) to transport a substrate (1) that has undergone substrate processing through the substrate processing device (4) to the outside and to introduce a substrate (1) to be processed from the outside.

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