KR102542899B1 - Novel n-sulfonyl aziridine compounds and its preparation method - Google Patents
Novel n-sulfonyl aziridine compounds and its preparation method Download PDFInfo
- Publication number
- KR102542899B1 KR102542899B1 KR1020210095069A KR20210095069A KR102542899B1 KR 102542899 B1 KR102542899 B1 KR 102542899B1 KR 1020210095069 A KR1020210095069 A KR 1020210095069A KR 20210095069 A KR20210095069 A KR 20210095069A KR 102542899 B1 KR102542899 B1 KR 102542899B1
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- sulfonyl
- alkyl
- aziridine compound
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000002360 preparation method Methods 0.000 title description 5
- -1 sulfonyl halide compound Chemical class 0.000 claims description 43
- 229910052783 alkali metal Inorganic materials 0.000 claims description 16
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 15
- 125000002947 alkylene group Chemical group 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 230000002140 halogenating effect Effects 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 12
- 239000004820 Pressure-sensitive adhesive Substances 0.000 abstract description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 11
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000000178 monomer Substances 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- OTQWIESGQBCQSQ-UHFFFAOYSA-N oxiran-2-ylmethyl 2-methylbut-2-enoate Chemical compound CC=C(C)C(=O)OCC1CO1 OTQWIESGQBCQSQ-UHFFFAOYSA-N 0.000 description 2
- PNOXUQIZPBURMT-UHFFFAOYSA-M potassium;3-(2-methylprop-2-enoyloxy)propane-1-sulfonate Chemical compound [K+].CC(=C)C(=O)OCCCS([O-])(=O)=O PNOXUQIZPBURMT-UHFFFAOYSA-M 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OZDGMOYKSFPLSE-UHFFFAOYSA-N 2-Methylaziridine Chemical compound CC1CN1 OZDGMOYKSFPLSE-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000009435 amidation Effects 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- VSFOXJWBPGONDR-UHFFFAOYSA-M potassium;3-prop-2-enoyloxypropane-1-sulfonate Chemical compound [K+].[O-]S(=O)(=O)CCCOC(=O)C=C VSFOXJWBPGONDR-UHFFFAOYSA-M 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D203/00—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom
- C07D203/04—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D203/06—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D203/22—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms directly attached to the ring nitrogen atom
- C07D203/24—Sulfur atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
본 발명은 신규 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것으로, 보다 상세하게는 아크릴산 타입의 점착제에 이중결합의 도입이 가능하도록 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것이다.The present invention relates to a novel N-sulfonyl aziridine compound and a method for preparing the same, and more particularly, to an N-sulfonyl aziridine compound having an acrylate group to allow introduction of a double bond into an acrylic acid type pressure-sensitive adhesive and a method for preparing the same It is about.
Description
본 발명은 신규 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것으로, 보다 상세하게는 아크릴산 타입의 점착제에 이중결합의 도입이 가능하도록 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것이다.The present invention relates to a novel N-sulfonyl aziridine compound and a method for preparing the same, and more particularly, to an N-sulfonyl aziridine compound having an acrylate group to allow introduction of a double bond into an acrylic acid type pressure-sensitive adhesive and a method for preparing the same It is about.
점착(粘着)이란 저압조건에서 접촉하면 바로 결합강도를 형성할 수 있는 성질을 의미하는 것으로, 영구 접착에 대한 일시적 접착을 나타낸다. 이러한 특성을 지닌 점착제는 물, 용제, 열 등을 사용하지 않고 상온에서 단시간에 작은 압력에 의해 피착물에 접착된다는 의미에서 감압 접착제(pressure sensitive adhesive, PSA)로도 불린다. 첨착제는 초기에 고체와 액체의 중간 정도의 반고체의 성질을 지니며, 경화 후에도 초기와 같은 반고체의 성질을 계속 유지한다.Adhesion means a property that can form bonding strength immediately upon contact under a low pressure condition, and represents temporary adhesion to permanent adhesion. An adhesive having such characteristics is also called a pressure sensitive adhesive (PSA) in the sense that it adheres to an adherend by a small pressure in a short time at room temperature without using water, solvent, or heat. The adhesive initially has semi-solid properties intermediate between solid and liquid, and continues to maintain the same semi-solid properties after curing.
일반적으로, 전기전자, 건축, 자동차, 선박, 의료산업의 전반에 걸쳐 아크릴계 점착제가 사용되고 있다. 아크릴계 점착제는 아크릴산 에스테르계 공중합물로서 무색투명하고 햇볕에 노출되어도 황변이 일어나지 않으며 산화 저항성이 우수하고 내후, 내유성 및 내열성 등이 우수하여 기능성 단량체를 잘 활용하면 용도에 맞추어 물성을 조절할 수 있는 장점이 있다. 또한 가격도 저렴하고 제조 공정이 비교적 간단하여 특수 라벨지나 테이프, 표면보호용 점착시트 및 마스킹용 점착 테이프, 웨이퍼 제조 공정용 다이싱 테이프 등에서 현재 산업분야 전반에 널리 사용되고 있다.In general, acrylic adhesives are used throughout electrical and electronic, construction, automobile, ship, and medical industries. Acrylic adhesive is an acrylic acid ester-based copolymer that is colorless and transparent, does not yellow when exposed to sunlight, has excellent oxidation resistance, and has excellent weather resistance, oil resistance, and heat resistance. there is. In addition, because of its low price and relatively simple manufacturing process, it is currently widely used throughout the industry in special label paper or tape, adhesive sheet for surface protection, adhesive tape for masking, and dicing tape for wafer manufacturing process.
그러나, 아크릴계 점착제 대부분은 (메타)아크릴레이트 단량체와 측쇄에 관능기를 가지는 단량체를 공중합시켜 얻어지는 폴리머에 가교제를 사용하고 있어, 점착제와 가교제의 혼합공정이 필요하고, 혼합 후에 사용시간(가사 시간(pot life))이 한정이 되어 있으며, 필름에 코팅된 이후에도 완벽한 경화까지 걸리는 시간(숙성시간)이 필수적이므로 생산성이 저하되는 단점이 있다. 특히 생산성과 직결되는 숙성시간 단축을 위하여 다양한 열경화 형태의 제품들을 제시하고 있으나 숙성시간이 단축되도록 배합을 하면 가사시간도 함께 단축되어 사용하기 불편하며 소비량이 많아지는 단점이 있다.However, most acrylic adhesives use a crosslinking agent in a polymer obtained by copolymerizing a (meth)acrylate monomer and a monomer having a functional group on the side chain, so a mixing process of the adhesive and the crosslinking agent is required, and after mixing, the use time (pot life) Life)) is limited, and since the time required for perfect curing (aging time) is essential even after coating on the film, there is a disadvantage in that productivity is lowered. In particular, various heat-curing products are proposed to reduce aging time, which is directly related to productivity.
이와 같은 단점을 보완하기 위하여, UV에 의한 경화 방식을 이용하려는 연구가 시도되고 있다.In order to compensate for this disadvantage, research to use a curing method by UV has been attempted.
일예로, 아크릴 중합물의 측쇄에 카르복실기와 히드록시기를 가지는 모노머를 공중합하여 카르복실기에는 글리시딜 메타크릴레이트(GMA)를, 하이드록실기에는 이소시아노에틸(메타)아크릴레이트를 반응시켜 광중합성 사이트를 만드는 방법, 점착제 주쇄에 히드록시기 등의 관능기를 부가한 후 이소시아네이트 말단을 가지는 화합물이나 실란, 혹은 글리시딜기 말단을 가진 화합물과 2차 반응시켜 사용하는 방법 등이 공지되어 있다. 그러나, 상기 기술들은 아크릴 공중합체와 광중합성기 함유 화합물의 반응시 60℃ 이상의 고온의 반응온도가 요구되거나, 독성을 유발하는 주석계 촉매의 사용이 요구되는 문제점이 있다.For example, by copolymerizing a monomer having a carboxyl group and a hydroxyl group on the side chain of an acrylic polymer, glycidyl methacrylate (GMA) is reacted with the carboxyl group and isocyanoethyl (meth)acrylate is reacted with the hydroxyl group to form a photopolymerizable site. A manufacturing method, a method of adding a functional group such as a hydroxyl group to the main chain of the adhesive, followed by a secondary reaction with a compound having an isocyanate terminal, a silane or a compound having a glycidyl terminal terminal, and the like are known. However, the above technologies have problems in that a high reaction temperature of 60° C. or more is required when the acrylic copolymer and the photopolymerizable group-containing compound are reacted, or the use of a tin-based catalyst that causes toxicity is required.
따라서, UV 조사 시 화학 반응에 의한 가교 결합이 가능하여 50℃ 미만, 좋게는 상온의 저온에서 트리에틸아민과 같은 유기촉매를 사용하여 별도의 가교제 없이 UV 조사만으로 내구성 및 점착 물성을 구현할 수 있는 신규 구조의 UV 경화형 단량체, 아크릴산계 점착제에 이중 결합을 도입할 수 있는, 즉 아크릴산의 카복실기와 원활하게 반응할 수 있는 새로운 UV 경화형 단량체의 개발이 요구되고 있다.Therefore, cross-linking by chemical reaction is possible during UV irradiation, so durability and adhesive properties can be realized only by UV irradiation without a separate cross-linking agent using an organic catalyst such as triethylamine at a low temperature of less than 50 ° C, preferably room temperature. There is a need to develop a new UV curable monomer capable of introducing a double bond into a structured UV curable monomer and an acrylic acid-based pressure-sensitive adhesive, that is, a new UV curable monomer capable of smoothly reacting with a carboxyl group of acrylic acid.
본 발명은 아크릴산 타입의 점착제에 이중결합의 도입이 가능하도록 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물 및 이의 제조방법을 제공하는데 목적이 있다.An object of the present invention is to provide an N-sulfonyl aziridine compound having an acrylate group and a method for preparing the same so that a double bond can be introduced into an acrylic acid type pressure-sensitive adhesive.
본 발명은 하기 화학식 1로 표시되는 N-설포닐 아지리딘 화합물을 제공한다.The present invention provides an N-sulfonyl aziridine compound represented by Formula 1 below.
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
R은 C1-C10알킬이고;R is C1-C10 alkyl;
L은 C1-C10알킬렌이고, 상기 L의 알킬렌은 C1-C10알킬로 더 치환될 수 있으며;L is C1-C10 alkylene, and the alkylene of L may be further substituted with C1-C10 alkyl;
R1 및 R2는 각각 독립적으로 수소 또는 C1-C10알킬이고;R 1 and R 2 are each independently hydrogen or C1-C10 alkyl;
m은 0, 1 또는 2의 정수이다.m is an integer of 0, 1 or 2;
또한, 본 발명은 상기 화학식 1의 N-설포닐 아지리딘 화합물을 제조하는 방법으로서, 하기 화학식 A의 설포닐 알칼리금속염을 산 할로겐화제와 반응시켜 화학식 C의 설포닐 할라이드 화합물을 제조하는 단계; 및 화학식 C의 설포닐 할라이드 화합물과 화학식 D의 아지리딘 화합물을 반응시켜 상기 화학식 1로 표시되는 N-설포닐 아지리딘 화합물을 제조하는 단계;를 포함하는 N-설포닐 아지리딘 화합물의 제조방법을 제공한다:In addition, the present invention is a method for preparing the N-sulfonyl aziridine compound of Formula 1, comprising the steps of preparing a sulfonyl halide compound of Formula C by reacting a sulfonyl alkali metal salt of Formula A with an acid halogenating agent; and preparing an N-sulfonyl aziridine compound represented by Formula 1 by reacting a sulfonyl halide compound of Formula C with an aziridine compound of Formula D. to provide:
[화학식 A][Formula A]
[화학식 C][Formula C]
[화학식 D][Formula D]
상기 화학식 A, C 및 D에서, R1, R2, L, R 및 m은 상기 화학식 1에서의 정의와 동일하고;In Formulas A, C and D, R 1 , R 2 , L, R and m are as defined in Formula 1 above;
M은 알칼리금속이고;M is an alkali metal;
X1은 할로겐이다.X 1 is halogen.
본 발명에 따른 신규 N-설포닐 아지리딘 화합물은 분자 내 아크릴레이트기를 가지고 있어 아크릴산 타입의 점착제에 이중결합의 도입이 가능하므로, 해체형 아크릴산계 점착제에 이중결합을 도입할 수 있는 새로운 가교성 단량체로서 적용될 수 있다.Since the novel N-sulfonyl aziridine compound according to the present invention has an acrylate group in the molecule and can introduce a double bond into an acrylic acid-type pressure-sensitive adhesive, it is a novel crosslinkable monomer capable of introducing a double bond into a dissociable acrylic acid-based pressure-sensitive adhesive. can be applied as
특히 점착제에 이중결합의 특성을 부여하기 위한 보편적 방법 중 하나인 GMA (glycidyl methylmethacrylate) 단량체의 사용과 대비하여 본 발명에 따른 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물을 이중결합을 도입하기 위한 단량체로서 적용하는 경우 상대적으로 저온숙성이 가능한 공정상의 이점이 있다. In particular, in contrast to the use of GMA (glycidyl methylmethacrylate) monomer, which is one of the universal methods for imparting double bond characteristics to adhesives, the N-sulfonyl aziridine compound having an acrylate group according to the present invention is a monomer for introducing a double bond When applied as a process, there is an advantage in that relatively low-temperature aging is possible.
따라서, 본 발명에 따른 신규 N-설포닐 아지리딘 화합물은 이중결합을 도입하기 위한 신규 단량체로서, 향후 해체형 아크릴산계 점착제 분야에 용이하게 적용될 수 있다.Therefore, the novel N-sulfonyl aziridine compound according to the present invention is a novel monomer for introducing a double bond, and can be easily applied to the field of disintegrating acrylic acid-based pressure-sensitive adhesives in the future.
도 1 - 화합물 SPMA-Maz (실시예 1)의 1H NMR 스펙트럼Figure 1 - 1 H NMR spectrum of compound SPMA-Maz (Example 1)
이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
이때, 사용되는 기술 용어 및 과학 용어에 있어서 다른 정의가 없다면, 이 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 통상적으로 이해하고 있는 의미를 가진다. 또한, 종래와 동일한 기술적 구성 및 작용에 대한 반복되는 설명은 생략하기로 한다. At this time, unless there is another definition in the technical terms and scientific terms used, they have meanings commonly understood by those of ordinary skill in the art to which this invention belongs. In addition, repeated description of the same technical configuration and operation as in the prior art will be omitted.
본 명세서에서, 용어 "CA-CB"는 "탄소수가 A 이상이고 B 이하"인 것을 의미한다.In this specification, the term “C A -C B ” means “a number of carbon atoms greater than or equal to A and less than or equal to B”.
본 명세서 내 용어 "알킬"은 탄소 및 수소 원자만으로 구성된 1가의 직쇄 또는 분쇄 포화 탄화수소 라디칼을 의미한다. 상기 알킬은 1 내지 10개의 탄소원자를 가질 수 있다. 상기 알킬은 1 내지 7개의 탄소원자를 가질 수 있다. 상기 알킬은 1 내지 4개의 탄소원자를 가질 수 있다. 이러한 알킬 라디칼의 예는 메틸, 에틸, 프로필, 이소프로필, 부틸, 이소부틸, t-부틸, 펜틸, 헥실 등을 포함하지만 이에 한정되지는 않는다.The term “alkyl” in this specification means a monovalent straight-chain or branched saturated hydrocarbon radical composed only of carbon and hydrogen atoms. The alkyl may have 1 to 10 carbon atoms. The alkyl may have 1 to 7 carbon atoms. The alkyl may have 1 to 4 carbon atoms. Examples of such alkyl radicals include, but are not limited to, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, pentyl, hexyl, and the like.
본 명세서 내 용어 "할로겐"은 할로겐족 원소를 나타내며, 예컨대, 플루오로, 클로로, 브로모 및 요오도를 포함한다.The term “halogen” in this specification refers to a halogen group element and includes, for example, fluoro, chloro, bromo and iodo.
본 명세서 내 용어 "알킬렌"은 선형 또는 분지형 포화 2가 탄화수소 라디칼을 의미한다. 상기 알킬렌은 1 내지 10개의 탄소원자를 가질 수 있다. 상기 알킬렌은 2 내지 5개의 탄소원자를 가질 수 있다. 이러한 알킬렌 라디칼의 예는 메틸렌, 에틸렌, 프로필렌 등을 포함하지만 이에 한정되지는 않는다.The term "alkylene" as used herein refers to a linear or branched saturated divalent hydrocarbon radical. The alkylene may have 1 to 10 carbon atoms. The alkylene may have 2 to 5 carbon atoms. Examples of such alkylene radicals include, but are not limited to, methylene, ethylene, propylene, and the like.
본 발명은 신규 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것으로, 보다 상세하게는 아크릴산 타입의 점착제에 이중결합의 도입이 가능하도록 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물 및 이의 제조방법에 관한 것이다.The present invention relates to a novel N-sulfonyl aziridine compound and a method for preparing the same, and more particularly, to an N-sulfonyl aziridine compound having an acrylate group to allow introduction of a double bond into an acrylic acid type pressure-sensitive adhesive and a method for preparing the same It is about.
본 발명은 하기 화학식 1로 표시되는 N-설포닐 아지리딘 화합물을 제공한다:The present invention provides an N-sulfonyl aziridine compound represented by Formula 1 below:
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
R은 C1-C10알킬이고;R is C1-C10 alkyl;
L은 C1-C10알킬렌이고, 상기 L의 알킬렌은 C1-C10알킬로 더 치환될 수 있으며;L is C1-C10 alkylene, and the alkylene of L may be further substituted with C1-C10 alkyl;
R1 및 R2는 각각 독립적으로 수소 또는 C1-C10알킬이고;R 1 and R 2 are each independently hydrogen or C1-C10 alkyl;
m은 0, 1 또는 2의 정수이다.m is an integer of 0, 1 or 2;
본 발명에 따른 상기 N-설포닐 아지리딘 화합물은 분자 내 아크릴레이트기를 가지고 있어 아크릴산계 점착제에 이중결합을 도입할 수 있는 새로운 가교성 단량체로서 적용될 수 있다.The N-sulfonyl aziridine compound according to the present invention has an acrylate group in the molecule and can be applied as a new crosslinkable monomer capable of introducing a double bond into an acrylic acid-based pressure-sensitive adhesive.
특히 점착제에 이중결합의 특성을 부여하기 위하여 사용되던 GMA (glycidyl methylmethacrylate) 단량체 대비하여 본 발명에 따른 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물을 이중결합을 도입하기 위한 단량체로서 적용하는 경우 상대적으로 저온반응이 가능하며, 향후 반도체용 다이싱 테이프 등과 같이 UV 조사 이후 점착력을 저하시켜 기재로부터 잔사없이 박리가 가능한 해체형 점착제 분야에 이중결합을 도입하기 위한 신규 단량체로서 용이하게 적용될 수 있다.In particular, when the N-sulfonyl aziridine compound having an acrylate group according to the present invention is applied as a monomer for introducing a double bond, compared to the GMA (glycidyl methylmethacrylate) monomer used to impart the characteristics of a double bond to an adhesive, relatively Low-temperature reaction is possible, and it can be easily applied as a new monomer for introducing double bonds in the field of detachable adhesives that can be peeled off from substrates without residue by lowering adhesiveness after UV irradiation, such as dicing tapes for semiconductors in the future.
일 실시예에 있어서, 상기 m은 2인 경우 R은 서로 동일하거나 상이할 수 있다.In one embodiment, when m is 2, R's may be the same as or different from each other.
일 실시예에 있어서, 상기 R은 C1-C4알킬이고; L은 C2-C5알킬렌이고, 상기 L의 알킬렌은 C1-C4알킬로 더 치환될 수 있으며; R1 및 R2는 각각 독립적으로 수소 또는 C1-C4알킬이고; m은 0, 1 또는 2의 정수일 수 있다.In one embodiment, R is C1-C4 alkyl; L is C2-C5 alkylene, and the alkylene of L may be further substituted with C1-C4 alkyl; R 1 and R 2 are each independently hydrogen or C1-C4 alkyl; m may be an integer of 0, 1 or 2.
일 실시예에 있어서, 상기 L은 C2-C4알킬렌일 수 있고, 바람직하게는 프로필렌일 수 있다.In one embodiment, L may be C2-C4 alkylene, preferably propylene.
일 실시예에 있어서, 상기 N-설포닐 아지리딘 화합물은 하기 화학식 2로 표시될 수 있다.In one embodiment, the N-sulfonyl aziridine compound may be represented by Formula 2 below.
[화학식 2][Formula 2]
상기 화학식 2에서,In Formula 2,
R은 C1-C3알킬이고;R is C1-C3 alkyl;
R1은 수소 또는 C1-C3알킬이고;R 1 is hydrogen or C1-C3 alkyl;
m은 0, 1 또는 2의 정수이다.m is an integer of 0, 1 or 2;
일 실시예에 있어서, 바람직하게 상기 N-설포닐 아지리딘 화합물은 하기 화학식 3으로 표시될 수 있다.In one embodiment, preferably, the N-sulfonyl aziridine compound may be represented by Formula 3 below.
[화학식 3][Formula 3]
상기 화학식 3에서, R은 메틸 또는 에틸이고; R1은 수소, 메틸 또는 에틸이다.In Formula 3, R is methyl or ethyl; R 1 is hydrogen, methyl or ethyl.
일 구체예에 있어서, 상기 R은 메틸이고; R1은 수소 또는 메틸일 수 있다.In one embodiment, R is methyl; R 1 can be hydrogen or methyl.
또한, 본 발명은 하기 화학식 A의 설포닐 알칼리금속염을 산 할로겐화제와 반응시켜 화학식 C의 설포닐 할라이드 화합물을 제조하는 단계; 및In addition, the present invention comprises the steps of preparing a sulfonyl halide compound of formula C by reacting a sulfonyl alkali metal salt of formula A with an acid halogenating agent; and
화학식 C의 설포닐 할라이드 화합물과 화학식 D의 아지리딘 화합물을 반응시켜 상기 화학식 1로 표시되는 N-설포닐 아지리딘 화합물을 제조하는 단계;를 포함하는 N-설포닐 아지리딘 화합물의 제조방법을 제공한다:A method for preparing an N-sulfonyl aziridine compound comprising the steps of preparing an N-sulfonyl aziridine compound represented by Formula 1 by reacting a sulfonyl halide compound of Formula C with an aziridine compound of Formula D do:
[화학식 A][Formula A]
[화학식 C][Formula C]
[화학식 D][Formula D]
상기 화학식 A, C 및 D에서,In Formulas A, C and D above,
R1 및 R2는 각각 독립적으로 수소 또는 C1-C10알킬이고;R 1 and R 2 are each independently hydrogen or C1-C10 alkyl;
L은 C1-C10알킬렌이고, 상기 L의 알킬렌은 C1-C10알킬로 더 치환될 수 있으며;L is C1-C10 alkylene, and the alkylene of L may be further substituted with C1-C10 alkyl;
M은 알칼리금속이고;M is an alkali metal;
X1은 할로겐이고;X 1 is halogen;
R은 C1-C10알킬이고;R is C1-C10 alkyl;
m은 0, 1 또는 2의 정수이다.m is an integer of 0, 1 or 2;
본 발명의 제조방법에 따르면, 설포닐 알칼리금속염(화학식 A)과 산 할로겐화제의 반응을 통해 설포닐 할라이드 화합물(화학식 C)을 제조한 후 연이은 아지리딘 화합물(화학식 D)과의 아미데이션(amidation)에 의해 목적하는 아크릴레이트기를 가지는 N-설포닐 아지리딘 화합물(화학식 1)을 효율적으로 제조할 수 있다.According to the production method of the present invention, a sulfonyl halide compound (Formula C) is prepared through the reaction of a sulfonyl alkali metal salt (Formula A) with an acid halogenating agent, followed by amidation with an aziridine compound (Formula D). ), it is possible to efficiently prepare an N-sulfonyl aziridine compound (Formula 1) having a desired acrylate group.
일 실시예에 있어서, 상기 화학식 A의 설포닐 알칼리금속염은 나트륨 또는 칼륨염일 수 있다.In one embodiment, the sulfonyl alkali metal salt of Formula A may be a sodium or potassium salt.
일 실시예에 있어서, 상기 산 할로겐화제는 하기 화학식 B의 옥살릴 할로겐화물일 수 있다.In one embodiment, the acid halogenating agent may be an oxalyl halide of Formula B below.
[화학식 B][Formula B]
상기 화학식 B에서, X1은 할로겐이다.In Formula B, X 1 is halogen.
일 구체예에 있어서, 상기 산 할로겐화제는 산 클로라이드 형성 시약일 수 있으며, 바람직하게는 옥살릴 클로라이드일 수 있다.In one embodiment, the acid halogenating agent may be an acid chloride forming reagent, preferably oxalyl chloride.
상기 산 할로겐화제는 화학식 A의 설포닐 알칼리금속염의 양에 비하여 동량 또는 과량으로 사용될 수 있으며, 구체적으로 화학식 A의 설포닐 알칼리금속염 1 당량에 대해 1 내지 5 당량, 바람직하게는 1 내지 3 당량 범위로 사용될 수 있다.The acid halogenating agent may be used in the same amount or in excess compared to the amount of the sulfonyl alkali metal salt of Formula A, specifically, 1 to 5 equivalents, preferably 1 to 3 equivalents, based on 1 equivalent of the sulfonyl alkali metal salt of Formula A. can be used as
일 실시예에 있어서, 상기 화학식 A의 설포닐 알칼리금속염과 산 할로겐화제의 반응은 산 할라이드 형성을 촉진시키는 촉매의 존재 하에 수행될 수 있다. 구체적인 예로, 디메틸포름아미드(DMF), N-메틸피롤리돈 (NMP) 등이 있으며, 바람직하게는 디메틸포름아미드(DMF)를 사용한다. 상기 촉매는 상기 화학식 A의 설포닐 알칼리금속염 1 당량에 대하여 0.001 내지 0.01 당량, 바람직하게는 0.003 내지 0.005 당량 범위로 사용될 수 있으나, 이에 제한되는 것은 아니며, 목적하는 촉매 효과를 발휘하는 적정 범위 내로 조절하여 사용할 수 있다.In one embodiment, the reaction of the sulfonyl alkali metal salt of Chemical Formula A with the acid halide may be performed in the presence of a catalyst that promotes acid halide formation. Specific examples include dimethylformamide (DMF) and N-methylpyrrolidone (NMP), and dimethylformamide (DMF) is preferably used. The catalyst may be used in the range of 0.001 to 0.01 equivalents, preferably 0.003 to 0.005 equivalents, based on 1 equivalent of the sulfonyl alkali metal salt of Formula A, but is not limited thereto, and is adjusted within an appropriate range to exert the desired catalytic effect. and can be used.
일 실시예에 있어서, 상기 화학식 A의 설포닐 알칼리금속염과 산 할로겐화제의 반응은 -30 내지 50℃사이의 온도, 더 바람직하게는 0 내지 25℃사이의 온도에서 수행될 수 있다.In one embodiment, the reaction of the sulfonyl alkali metal salt of Formula A with the acid halogenating agent may be carried out at a temperature between -30 and 50 °C, more preferably between 0 and 25 °C.
상기 화학식 A의 설포닐 알칼리금속염과 산 할로겐화제의 반응에 의해 제조된 화학식 C의 설포닐 할라이드 화합물은 분리 정제 없이 바로 다음 반응에 이용된다.The sulfonyl halide compound of Formula C prepared by the reaction of the sulfonyl alkali metal salt of Formula A with an acid halogenating agent is used in the next reaction without separation and purification.
일 실시예에 있어서, 상기 화학식 D의 아지리딘 화합물은 상기 화학식 A의 설포닐 알칼리금속염 화합물 1 당량에 대하여 1 내지 3, 바람직하게는 1 내지 1.5 당량 범위로 사용될 수 있다.In one embodiment, the aziridine compound of Formula D may be used in an amount of 1 to 3, preferably 1 to 1.5 equivalents based on 1 equivalent of the sulfonyl alkali metal salt compound of Formula A.
일 실시예에 있어서, 상기 화학식 D의 아지리딘 화합물과의 반응은 염기 촉매의 존재 하에 수행될 수 있으며, 사용가능한 염기 촉매로는 트리에틸아민 등을 들 수 있다. 상기 염기 촉매는 상기 화학식 A의 설포닐 알칼리금속염 화합물 1 당량에 대하여 1 내지 4, 바람직하게는 1.5 내지 2.5 당량 범위로 사용될 수 있다.In one embodiment, the reaction with the aziridine compound of Formula D may be carried out in the presence of a base catalyst, and examples of the base catalyst that may be used include triethylamine. The base catalyst may be used in an amount of 1 to 4, preferably 1.5 to 2.5 equivalents based on 1 equivalent of the sulfonyl alkali metal salt compound of Formula A.
일 실시예에 있어서, 상기 화학식 D의 아지리딘 화합물과의 반응은 -30 내지 -10℃ 사이의 온도, 더 바람직하게는 -25 내지 -20℃ 사이의 온도에서 수행될 수 있다.In one embodiment, the reaction with the aziridine compound of Formula D may be carried out at a temperature between -30 and -10°C, more preferably between -25 and -20°C.
일 실시예에 있어서, 상기 모든 반응은 유기용매 하에서 이루어질 수 있다. 상기 반응에 참여하는 반응물질들을 용해할 수 있는 것이라면 유기용매에 제한을 둘 필요는 없다. 구체적으로 사용가능한 유기용매는 디클로로메탄(DCM), 디클로로에탄(DCE), 1,4-다이옥산, 테트라하이드로퓨란(THF), t-부틸알콜, t-아밀알콜, 트리플루오로에탄올, 자일렌, 헥사플루오로이소프로판올, 아세토나이트릴(MeCN), 클로로벤젠, 톨루엔, 디메틸포름아마이드(DMF), 나이트로메탄, 클로로포름 등으로, 이로 제한되지는 않으나, 보다 향상된 반응성 측면에서 테트라하이드로퓨란(THF)을 사용하는 것이 좋다.In one embodiment, all of the above reactions may be performed in an organic solvent. There is no need to limit the organic solvent as long as it can dissolve the reactants participating in the reaction. Specifically usable organic solvents include dichloromethane (DCM), dichloroethane (DCE), 1,4-dioxane, tetrahydrofuran (THF), t-butyl alcohol, t-amyl alcohol, trifluoroethanol, xylene, Hexafluoroisopropanol, acetonitrile (MeCN), chlorobenzene, toluene, dimethylformamide (DMF), nitromethane, chloroform, etc., but not limited to, tetrahydrofuran (THF) in terms of more improved reactivity good to use
반응시간은 반응물질, 용매의 종류 및 용매의 양에 따라 달라질 수 있으며, TLC 등을 통하여 출발물질이 소모됨과 동시에 생성물을 확인한 후 반응을 완결시킨다. 반응이 완결되면 통상의 방법을 통하여 목적물을 분리 정제할 수 있다.The reaction time may vary depending on the type and amount of the reactant, solvent, and the reaction is completed after the starting material is consumed and the product is confirmed through TLC or the like. When the reaction is completed, the target product may be separated and purified through a conventional method.
이하, 실시예를 통하여 본 발명의 구성을 보다 구체적으로 설명하지만, 하기의 실시예들은 본 발명에 대한 이해를 돕기 위한 것으로서, 본 발명의 범위가 여기에 국한된 것은 아니다.Hereinafter, the configuration of the present invention will be described in more detail through examples, but the following examples are intended to aid understanding of the present invention, and the scope of the present invention is not limited thereto.
[실시예 1] 3-sulfopropylmethacrylate methylaziridine (화합물 SPMA-Maz)의 제조[Example 1] Preparation of 3-sulfopropylmethacrylate methylaziridine (compound SPMA-Maz)
설포닐 할라이드 화합물 (C1)의 제조Preparation of sulfonyl halide compound (C1)
250ml 둥근 플라스크에 10.0 g의 3-설포프로필 메타크릴레이트 포타슘염 (3-Sulfopropyl methacrylate potassium salt, A1, sigma aldrich)과 30 ml의 THF를 넣은 후, 0℃에서 15분간 교반하였다. 12.3 g의 옥살릴 염화물 (B1)을 천천히 주입한 후, 촉매로써 DMF를 3~4방울을 투입하고 25℃에서 3시간 교반하였다. 침전된 염을 여과를 통해 제거하고, 설포닐 할라이드 화합물 (C1)을 포함하는 여액을 별도의 정제 없이 곧바로 다음 반응에 사용하였다.After putting 10.0 g of 3-sulfopropyl methacrylate potassium salt (A1, sigma aldrich) and 30 ml of THF in a 250ml round flask, the mixture was stirred at 0° C. for 15 minutes. After slowly injecting 12.3 g of oxalyl chloride (B1), 3 to 4 drops of DMF as a catalyst were added, followed by stirring at 25°C for 3 hours. The precipitated salt was removed through filtration, and the filtrate containing the sulfonyl halide compound (C1) was directly used in the next reaction without separate purification.
3-sulfopropylmethacrylate methylaziridine (화합물 SPMA-Maz)의 제조Preparation of 3-sulfopropylmethacrylate methylaziridine (compound SPMA-Maz)
250ml의 3구 둥근 플라스크에 3.00 g의 2-메틸아지리딘 (D1)과 8.50 g의 TEA, 그리고 30 ml의 THF를 넣은 후 -20℃에서 15분간 교반하였다. 앞서 수득된 설포닐 할라이드 화합물 (C1)을 포함하는 용액을 60분에 걸쳐 드랍핑 깔대기(dropping funnel)을 통해 천천히 적가한 후 동일한 온도에서 1시간 교반하였다. 그 다음, 반응용액 내의 염을 여과를 통해 거른 후 여액을 물과 에틸 아세테이트를 이용하여 분별추출하고, MgSO4를 이용해 건조한 다음, 모여진 유기층을 진공으로 용매를 제거하여 목적 화합물인 3-sulfopropylmethacrylate methylaziridine (화합물 SPMA-Maz)를 무색 액상 형태로 수득하였다. (수득량 6.4 g, 수율 64%) [도 1].After putting 3.00 g of 2-methylaziridine (D1), 8.50 g of TEA, and 30 ml of THF in a 250 ml three-necked round flask, the mixture was stirred at -20 ° C for 15 minutes. A solution containing the previously obtained sulfonyl halide compound (C1) was slowly added dropwise through a dropping funnel over 60 minutes and then stirred at the same temperature for 1 hour. Then, the salt in the reaction solution was filtered through filtration, and the filtrate was fractionated and extracted using water and ethyl acetate, dried using MgSO 4 , and then the solvent was removed from the collected organic layer in vacuo to obtain the target compound, 3-sulfopropylmethacrylate methylaziridine ( Compound SPMA-Maz) was obtained in the form of a colorless liquid. (yield 6.4 g, yield 64%) [Fig. 1].
1H NMR (300 MHz, 298 K, CDCl3): δ 6.13 (1H), 5.62 (1H), 4.32 (2H), 3.25 (2H), 2.83 (1H), 2.64 (1H), 2.33 (2H), 1.97 (3H), 1.35 (3H). 1 H NMR (300 MHz, 298 K, CDCl 3 ): δ 6.13 (1H), 5.62 (1H), 4.32 (2H), 3.25 (2H), 2.83 (1H), 2.64 (1H), 2.33 (2H), 1.97 (3H), 1.35 (3H).
13C NMR (75 MHz, 298 K, CDCl3): δ 167.18, 136.09, 126.11, 62.47, 49.65, 35.39, 34.41, 23.23, 18.42, 17.04. 13 C NMR (75 MHz, 298 K, CDCl 3 ): δ 167.18, 136.09, 126.11, 62.47, 49.65, 35.39, 34.41, 23.23, 18.42, 17.04.
HRMS (MALDI-TOF, m/z): Calcd. for [M] = C10H17NO4S; [M+H]+ : 248.096, Found; [M+H]+ : 248.117, [M+Na]+ : 270.093.HRMS (MALDI-TOF, m/z ): Calcd. for [M] = C 10 H 17 NO 4 S; [M+H] + : 248.096, Found; [M+H] + : 248.117, [M+Na] + : 270.093.
[실시예 2] 3-sulfopropylacrylate methylaziridine (화합물 SPA-Maz)의 제조[Example 2] Preparation of 3-sulfopropylacrylate methylaziridine (compound SPA-Maz)
3-설포프로필 메타크릴레이트 포타슘염 (A1) 대신에 3-설포프로필 아크릴레이트 포타슘염 (3-Sulfopropyl acrylate potassium salt, A2, sigma aldrich) 10.0 g을 사용한 것을 제외하고는 상기 실시예 1과 동일한 방법으로 반응시켜 목적 화합물인 3-sulfopropylacrylate methylaziridine (화합물 SPA-Maz)를 무색 액상 형태로 수득하였다(수득량 5.9 g, 수율 59%).Same method as Example 1 except for using 10.0 g of 3-sulfopropyl acrylate potassium salt (A2, sigma aldrich) instead of 3-sulfopropyl methacrylate potassium salt (A1) to obtain the target compound, 3-sulfopropylacrylate methylaziridine (compound SPA-Maz) in the form of a colorless liquid (yield: 5.9 g, yield: 59%).
1H NMR (300 MHz, 298 K, CDCl3): δ 6.43 (1H), 6.13 (1H), 5.87 (1H), 4.32 (2H), 3.23 (2H), 2.81 (1H), 2.63 (1H), 2.30 (2H), 2.07 (1H), 1.33 (3H). 1 H NMR (300 MHz, 298 K, CDCl 3 ): δ 6.43 (1H), 6.13 (1H), 5.87 (1H), 4.32 (2H), 3.23 (2H), 2.81 (1H), 2.63 (1H), 2.30 (2H), 2.07 (1H), 1.33 (3H).
13C NMR (75 MHz, 298 K, CDCl3): δ 165.99, 131.50, 128.11, 62.32, 49.59, 35.40, 34.43, 23.19, 17.05. 13 C NMR (75 MHz, 298 K, CDCl 3 ): δ 165.99, 131.50, 128.11, 62.32, 49.59, 35.40, 34.43, 23.19, 17.05.
HRMS (MALDI-TOF, m/z): Calcd. for [M] = C9H15NO4S; [M+H]+ : 234.080, Found: [M+H]+ : 234.062, [M+Na]+ : 256.075.HRMS (MALDI-TOF, m/z ): Calcd. for [M] = C 9 H 15 NO 4 S; [M+H] + : 234.080, Found: [M+H] + : 234.062, [M+Na] + : 256.075.
Claims (6)
[화학식 1]
상기 화학식 1에서,
R은 C1-C10알킬이고;
L은 C1-C10알킬렌이고, 상기 L의 알킬렌은 C1-C10알킬로 더 치환될 수 있으며;
R1 및 R2는 각각 독립적으로 수소 또는 C1-C10알킬이고;
m은 0, 1 또는 2의 정수이다.An N-sulfonyl aziridine compound represented by Formula 1 below:
[Formula 1]
In Formula 1,
R is C1-C10 alkyl;
L is C1-C10 alkylene, and the alkylene of L may be further substituted with C1-C10 alkyl;
R 1 and R 2 are each independently hydrogen or C1-C10 alkyl;
m is an integer of 0, 1 or 2;
상기 R은 C1-C4알킬이고;
L은 C2-C5알킬렌이고, 상기 L의 알킬렌은 C1-C4알킬로 더 치환될 수 있으며;
R1 및 R2는 각각 독립적으로 수소 또는 C1-C4알킬이고;
m은 0, 1 또는 2의 정수인, N-설포닐 아지리딘 화합물.According to claim 1,
wherein R is C1-C4 alkyl;
L is C2-C5 alkylene, and the alkylene of L may be further substituted with C1-C4 alkyl;
R 1 and R 2 are each independently hydrogen or C1-C4 alkyl;
m is an integer of 0, 1 or 2, N-sulfonyl aziridine compounds.
상기 N-설포닐 아지리딘 화합물은 하기 화학식 2로 표시되는 것인, N-설포닐 아지리딘 화합물:
[화학식 2]
상기 화학식 2에서,
R은 C1-C3알킬이고;
R1은 수소 또는 C1-C3알킬이고;
m은 0, 1 또는 2의 정수이다.According to claim 1,
The N-sulfonyl aziridine compound is an N-sulfonyl aziridine compound represented by Formula 2 below:
[Formula 2]
In Formula 2,
R is C1-C3 alkyl;
R 1 is hydrogen or C1-C3 alkyl;
m is an integer of 0, 1 or 2;
상기 N-설포닐 아지리딘 화합물은 하기 화학식 3으로 표시되는 것인, N-설포닐 아지리딘 화합물:
[화학식 3]
상기 화학식 3에서, R은 메틸 또는 에틸이고; R1은 수소, 메틸 또는 에틸이다.According to claim 1,
The N-sulfonyl aziridine compound is an N-sulfonyl aziridine compound represented by Formula 3 below:
[Formula 3]
In Formula 3, R is methyl or ethyl; R 1 is hydrogen, methyl or ethyl.
화학식 C의 설포닐 할라이드 화합물과 화학식 D의 아지리딘 화합물을 반응시켜 하기 화학식 1로 표시되는 N-설포닐 아지리딘 화합물을 제조하는 단계;를 포함하는 N-설포닐 아지리딘 화합물의 제조방법.
[화학식 1]
[화학식 A]
[화학식 C]
[화학식 D]
상기 화학식 1, A, C 및 D에서,
R1 및 R2는 각각 독립적으로 수소 또는 C1-C10알킬이고;
L은 C1-C10알킬렌이고, 상기 L의 알킬렌은 C1-C10알킬로 더 치환될 수 있으며;
M은 알칼리금속이고;
X1은 할로겐이고;
R은 C1-C10알킬이고;
m은 0, 1 또는 2의 정수이다.Preparing a sulfonyl halide compound of Formula C by reacting a sulfonyl alkali metal salt of Formula A with an acid halogenating agent; and
Preparing an N-sulfonyl aziridine compound represented by Formula 1 by reacting a sulfonyl halide compound of Formula C with an aziridine compound of Formula D;
[Formula 1]
[Formula A]
[Formula C]
[Formula D]
In Formula 1, A, C and D,
R 1 and R 2 are each independently hydrogen or C1-C10 alkyl;
L is C1-C10 alkylene, and the alkylene of L may be further substituted with C1-C10 alkyl;
M is an alkali metal;
X 1 is halogen;
R is C1-C10 alkyl;
m is an integer of 0, 1 or 2;
상기 산 할로겐화제는 화학식 B의 옥살릴 할로겐화물인, 제조방법.
[화학식 B]
상기 화학식 B에서, X1은 할로겐이다.According to claim 5,
Wherein the acid halide is an oxalyl halide of Formula B.
[Formula B]
In Formula B, X 1 is halogen.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020210095069A KR102542899B1 (en) | 2021-07-20 | 2021-07-20 | Novel n-sulfonyl aziridine compounds and its preparation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020210095069A KR102542899B1 (en) | 2021-07-20 | 2021-07-20 | Novel n-sulfonyl aziridine compounds and its preparation method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20230013948A KR20230013948A (en) | 2023-01-27 |
KR102542899B1 true KR102542899B1 (en) | 2023-06-15 |
Family
ID=85101729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020210095069A Active KR102542899B1 (en) | 2021-07-20 | 2021-07-20 | Novel n-sulfonyl aziridine compounds and its preparation method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR102542899B1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20080062642A (en) | 2006-12-29 | 2008-07-03 | 제일모직주식회사 | Pressure-sensitive adhesive, pressure-sensitive adhesive composition and dicing film prepared therefrom |
TWI471396B (en) | 2008-07-01 | 2015-02-01 | Lg Chemical Ltd | Acrylic composition for optical elements, protective film for optical elements, polarizer and liquid crystal display |
KR101260095B1 (en) | 2008-07-16 | 2013-05-02 | 주식회사 엘지화학 | Pressure-sensitive adhesive composition, pressure-sensitive adhesive film, polarizer and liquid crystal display |
-
2021
- 2021-07-20 KR KR1020210095069A patent/KR102542899B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20230013948A (en) | 2023-01-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2023065802A1 (en) | Polythiol compound and preparation method therefor, curing agent, resin composition and use thereof | |
CN104995229B (en) | Synthesis of the polyether polyols through copper azide alkynes click chemistry for the application of coating, adhesive, sealant and elastomer | |
JP6773815B2 (en) | Polyfunctional oxetane compounds and methods for producing them | |
US10815187B2 (en) | Preparation of vegetable oil-based monomers for use in thermosetting resins | |
WO2018058816A1 (en) | Method for manufacturing polyoxazoline chain extending agent | |
CN110317558A (en) | A kind of poly-dopamine acrylic adhesive for polyurethane and preparation method thereof | |
CN110964457A (en) | Methacrylate composition, preparation method and adhesive tape using methacrylate composition | |
WO2017063419A1 (en) | Organosilicone chain extender and application | |
CN107383103A (en) | Compound, preparation method and application thereof, and flame-retardant material | |
US10287368B2 (en) | Alkoxysilane-functionalized hydrocarbon compounds, intermediates thereof and methods of preparation thereof | |
KR102542899B1 (en) | Novel n-sulfonyl aziridine compounds and its preparation method | |
TWI738730B (en) | Two part curable compositions | |
CN116375591A (en) | A kind of preparation method of polyimide diamine monomer containing double bond | |
CN110698646B (en) | A kind of epoxy acrylate and preparation method thereof | |
EP0028024B1 (en) | Carboxylic acid glycidyl esters, process for their preparation and their use in resin compositions | |
CN104086580B (en) | Aryl multi-arm silane coupler and preparation method thereof | |
CN105503756A (en) | Pluridentate macromolecular bonding agent and preparation method thereof | |
CN115232585A (en) | A kind of one-component epoxy resin composition resistant to moist heat hydrolysis and its preparation method and application | |
JP5591857B2 (en) | (Meth) acrylamide compound precursor | |
CN106715559B (en) | Curing accelerators for anaerobic curable compositions | |
EP1937695B1 (en) | Novel organic silane compound | |
CN118359523A (en) | An acrylate monomer and its application in photocurable functional coatings | |
US20160251300A1 (en) | Photoreactive monomers | |
CN113845434A (en) | A kind of synthetic method of avibactam intermediate (I) | |
CN115850121B (en) | Erythritol-based polyurethane prepolymer and synthesis and application thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20210720 |
|
PA0201 | Request for examination | ||
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20230407 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20230601 |
|
PG1601 | Publication of registration |