KR102488931B1 - 양방향 반도체 패키지 및 제조방법 - Google Patents
양방향 반도체 패키지 및 제조방법 Download PDFInfo
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- KR102488931B1 KR102488931B1 KR1020200091510A KR20200091510A KR102488931B1 KR 102488931 B1 KR102488931 B1 KR 102488931B1 KR 1020200091510 A KR1020200091510 A KR 1020200091510A KR 20200091510 A KR20200091510 A KR 20200091510A KR 102488931 B1 KR102488931 B1 KR 102488931B1
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 122
- 230000002457 bidirectional effect Effects 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 118
- 238000005476 soldering Methods 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000000465 moulding Methods 0.000 claims description 5
- 239000012782 phase change material Substances 0.000 claims description 5
- 239000004593 Epoxy Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 238000009751 slip forming Methods 0.000 claims 2
- 230000000694 effects Effects 0.000 abstract description 3
- 125000006850 spacer group Chemical group 0.000 description 17
- 230000008569 process Effects 0.000 description 10
- 230000017525 heat dissipation Effects 0.000 description 9
- 239000000919 ceramic Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000012778 molding material Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3677—Wire-like or pin-like cooling fins or heat sinks
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
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- H01L23/00—Details of semiconductor or other solid state devices
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- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
- H01L23/053—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
- H01L23/057—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body the leads being parallel to the base
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- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
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- H01L23/00—Details of semiconductor or other solid state devices
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- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/433—Auxiliary members in containers characterised by their shape, e.g. pistons
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/33—Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
- H01L2224/331—Disposition
- H01L2224/3318—Disposition being disposed on at least two different sides of the body, e.g. dual array
- H01L2224/33181—On opposite sides of the body
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/4813—Connecting within a semiconductor or solid-state body, i.e. fly wire, bridge wire
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4846—Connecting portions with multiple bonds on the same bonding area
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- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
도 2는 본 발명의 일실시예에 따른 양방향 반도체 패키지의 단면을 나타내는 단면도이다.
120: 제1패턴층 200: 리드프레임
300: 반도체칩 400: 상부DBC기판
410: 제2베이스부 420: 제2패턴층
500: 버퍼층 600: 버퍼와이어
610: 변곡점 700: 도전성와이어
Claims (10)
- 하부DBC(Direct Bonded Copper)기판;
상부DBC기판;
상기 하부DBC기판의 일면 상에 실장된 리드프레임(lead frame);
상기 리드프레임 상의 일부에 실장된 반도체칩(semiconductor chip);
일단이 상기 상부DBC기판의 하면에 솔더링되고, 타단은 상기 반도체칩이 실장되지 않은 상기 리드프레임 상면에 솔더링되는 버퍼층(buffer layer); 및
상기 반도체칩의 상면에 솔더링된 버퍼와이어를 포함하되,
상기 버퍼와이어는,
일단이 상기 반도체칩의 상면의 일면에 솔더링되고, 타단이 상기 반도체칩의 상면의 타면에 솔더링되며,
상기 일단과 타단 사이에 상기 상부DBC기판 방향으로 절곡된 변곡점과 상기 하부DBC기판 방향으로 절곡된 변곡점이 각각 적어도 하나 이상 연속적으로 형성되고,
상기 상부DBC기판으로부터 상기 하부DBC기판 방향으로 절곡된 절곡부의 변곡점은 상기 상부DBC기판의 하면에 접촉되는 것을 특징으로 하는 양방향 반도체 패키지(bidirectional semiconductor package). - 제 1 항에 있어서,
상기 버퍼층은,
PCM(Phase Change Material)을 이용하여 형성되는 것을 특징으로 하는 양방향 반도체 패키지. - 삭제
- 삭제
- 제 1 항에 있어서,
상기 버퍼와이어는 리본형 금속 와이어(ribbon metal wire) 또는 테이프형 금속 와이어(tape metal wire)인 것을 특징으로 하는 양방향 반도체 패키지. - 제 1 항에 있어서,
상기 하부DBC기판의 상면과 상기 반도체칩을 전기적으로 연결하는 도전성 와이어를 더 포함하는 것을 특징으로 하는 양방향 반도체 패키지. - 제 6 항에 있어서,
상기 도전성 와이어는,
금, 알루미늄 또는 구리를 포함하는 것을 특징으로 하는 양방향 반도체 패키지. - 제 1 항에 있어서,
상기 상부DBC기판과 상기 하부DBC기판을 둘러싸는 몰딩부를 더 포함하는 것을 특징으로 하는 양방향 반도체 패키지. - 제 8 항에 있어서,
상기 몰딩부는 에폭시 몰드 컴파운드(EMC; Epoxy Mold Compound)로 형성되는 것을 특징으로 하는 양방향 반도체 패키지. - 하부DBC(Direct Bonded Copper)기판과 상부DBC기판을 포함하는 양방향 반도체 패키지의 제조 방법에 있어서,
상기 하부DBC기판의 일면 상에 리드프레임(lead frame)을 실장하는 단계;
상기 리드프레임 상면의 일부에 반도체칩을 실장하는 단계;
버퍼층을 솔더링하는 단계; 및
버퍼와이어를 상기 반도체칩의 상면에 솔더링하는 단계를 포함하되,
상기 버퍼층의 일단은 상기 상부DBC기판의 하면에 솔더링되고, 상기 버퍼층의 타단은 상기 반도체칩이 실장되지 않은 상기 리드프레임 상면에 솔더링되고,
상기 버퍼와이어는,
일단이 상기 반도체칩의 상면의 일면에 솔더링되고, 타단이 상기 반도체칩의 상면의 타면에 솔더링되며,
상기 일단과 타단 사이에 상기 상부DBC기판 방향으로 절곡된 변곡점과 상기 하부DBC기판 방향으로 절곡된 변곡점이 각각 적어도 하나 이상 연속적으로 형성되고,
상기 상부DBC기판으로부터 상기 하부DBC기판 방향으로 절곡된 절곡부의 변곡점은 상기 상부DBC기판의 하면에 접촉되는 것을 특징으로 하는 양방향 반도체 패키지의 제조 방법.
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