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KR102462034B1 - Agent for forming adhesive coating for aluminum oxide or aluminum substrate - Google Patents

Agent for forming adhesive coating for aluminum oxide or aluminum substrate Download PDF

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KR102462034B1
KR102462034B1 KR1020167036299A KR20167036299A KR102462034B1 KR 102462034 B1 KR102462034 B1 KR 102462034B1 KR 1020167036299 A KR1020167036299 A KR 1020167036299A KR 20167036299 A KR20167036299 A KR 20167036299A KR 102462034 B1 KR102462034 B1 KR 102462034B1
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쇼타로 오타
요스케 이이누마
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닛산 가가쿠 가부시키가이샤
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Abstract

웨트 코팅법으로 성막 가능한, 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제를 제공한다.
하기 식 (I) 및 식 (II) 로 나타내는 알콕시실란에서 선택되는 적어도 1 종을 포함하는 알콕시실란 성분의 가수분해·축합체, 및 알루미늄염을 함유하는 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제.
(화학식 1)
Si(OR1)4 (I)
(화학식 2)
R2 mSi(OR3)4-m (II)
R1 및 R3 은 각각 독립적으로 탄소수 1 ∼ 5 의 알킬기를 나타내고, R2 는 수소 원자 등을 나타내고, m 은 1 ∼ 3 의 정수를 나타낸다.
An adhesive film forming agent for aluminum oxide or aluminum substrates, which can be formed by a wet coating method, is provided.
Adhesive film forming agent for aluminum oxide or aluminum substrates containing a hydrolysis/condensation product of an alkoxysilane component containing at least one selected from alkoxysilanes represented by the following formulas (I) and (II), and an aluminum salt .
(Formula 1)
Si(OR 1 ) 4 (I)
(Formula 2)
R 2 m Si(OR 3 ) 4-m (II)
R 1 and R 3 each independently represent an alkyl group having 1 to 5 carbon atoms, R 2 represents a hydrogen atom or the like, and m represents an integer of 1 to 3.

Figure 112016127253214-pct00002
Figure 112016127253214-pct00002

Description

산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제 {AGENT FOR FORMING ADHESIVE COATING FOR ALUMINUM OXIDE OR ALUMINUM SUBSTRATE}Adhesive film former for aluminum oxide or aluminum substrates {AGENT FOR FORMING ADHESIVE COATING FOR ALUMINUM OXIDE OR ALUMINUM SUBSTRATE}

본 발명은 사파이어 유리 등의 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제에 관한 것이다.The present invention relates to an adhesive film forming agent for aluminum oxide such as sapphire glass or an aluminum substrate.

사파이어 유리는 단결정의 산화알루미늄으로, 매우 단단하고 투명하며, 열에 강하고, 또한 약품에 녹지 않는다는 우수한 성질을 갖는다. 경도가 높아 흠집이 잘 생기지 않는다는 특징으로부터, 사파이어 유리는, 시계의 커버 유리 (방풍), 카메라 렌즈의 커버 유리, 스마트폰이나 타블렛의 터치 패널 기판에 사용된다.Sapphire glass is single-crystal aluminum oxide, and has excellent properties such as being very hard and transparent, strong in heat, and insoluble in chemicals. From the characteristic that it is hard to be scratched with high hardness, sapphire glass is used for the cover glass (windproof) of a watch, the cover glass of a camera lens, and the touch panel board|substrate of a smart phone and a tablet.

기재에 다른 물질을 문질렀을 때의 흠집이 잘 생기지 않는 성질인 내찰상성을 높이기 위해, 유리 등의 부재 표면에 불소계 화합물이나 실리콘계 화합물 등의 방오제를 도포하는 기술도 알려져 있다. 방오제를 도포함으로써 표면의 미끄러짐성이 양호해져, 충격이 가해져도 미끄러짐성에 의해 그 충격을 완화시킬 수 있어, 우수한 내찰상성을 얻을 수 있다. 또, 방오제의 도포에 의해, 발수, 발유, 및 지문이 잘 묻지 않는다는 효과도 얻어진다.There is also known a technique of applying an antifouling agent such as a fluorine-based compound or a silicone-based compound to the surface of a member such as glass in order to improve abrasion resistance, which is a property that scratches when another substance is rubbed on a substrate. By applying the antifouling agent, the slipperiness of the surface becomes good, and even if an impact is applied, the impact can be mitigated by the slipperiness, and excellent scratch resistance can be obtained. Moreover, by application|coating of an antifouling agent, the effect that water repellency, oil repellency, and a fingerprint are not easily attached is also acquired.

사파이어 유리에 방오제를 도포하면, 사파이어 유리의 높은 경도와 방오층의 미끄러짐 효과에 의해 현저히 우수한 내찰상성이 얻어지는 것을 기대할 수 있다. 그러나, 사파이어 유리 등의 산화알루미늄은, 일반적으로 방오제와의 밀착성이 나빠, 기대하는 내찰상성은 얻어지지 않는다. 이 문제를 회피하기 위해, 종래, 산화알루미늄 (Al2O3) 과 이산화규소 (SiO2) 의 밀착 보조층을, 진공하에서의 드라이 코팅법에 의해 형성하는 방법이 보고되어 있다 (특허문헌 1).When an antifouling agent is applied to sapphire glass, it can be expected that remarkably excellent scratch resistance is obtained due to the high hardness of the sapphire glass and the sliding effect of the antifouling layer. However, aluminum oxide, such as a sapphire glass, generally has bad adhesiveness with an antifouling|stain-resistant agent, and anticipation of abrasion resistance is not acquired. In order to avoid this problem, conventionally, the method of forming the close_contact |adherence auxiliary|assistant layer of aluminum oxide (Al2O3) and silicon dioxide (SiO2) by the dry coating method under vacuum is reported (patent document 1 ).

또, 사파이어 유리에 산화규소 (SiO2) 및 질화규소 (SiNx) 를 스퍼터링에 의해 성막하고, 그 후에 방오층을 성막하는 기술이 보고되어 있다 (특허문헌 2). 스퍼터링, PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition) 등의 드라이 코팅법에 의한 성막은 진공 용기 내에서 실시되어, 고가의 대규모 장치가 필요해진다. 또, 성막 가능한 기재의 크기나 형상이 제한된다는 문제도 있다.Moreover, the technique of forming a silicon oxide (SiO2) and a silicon nitride (SiNx) into a film by sputtering on sapphire glass, and forming an antifouling|stain-resistant layer into a film after that is reported (patent document 2). Film formation by dry coating methods, such as sputtering, PVD (Physical Vapor Deposition), and CVD (Chemical Vapor Deposition), is performed in a vacuum container, and an expensive large-scale apparatus is required. In addition, there is also a problem that the size and shape of the substrate that can be formed into a film is limited.

한편, 플렉소 인쇄, 스핀 코트, 잉크젯, 슬릿 코트, 바 코트, 스프레이 등의 웨트 코팅법에 의한 성막은, 저렴하게 또한 고속으로 막을 형성할 수 있다. 그러나, 산화알루미늄과 충분히 접착하는 웨트 코팅 가능한 방법은 알려져 있지 않아, 방오제를 도포하기 위해서는 고비용의 드라이 코팅법에 의한 성막을 실시할 필요가 있었다.On the other hand, film formation by a wet coating method such as flexographic printing, spin coating, inkjet, slit coating, bar coating or spraying can form a film inexpensively and at high speed. However, a wet coating method capable of sufficiently adhering to aluminum oxide is not known, and in order to apply an antifouling agent, it is necessary to perform film formation by an expensive dry coating method.

미국 특허 공개 2014/0087197 A1US Patent Publication 2014/0087197 A1 일본 특허공보 제5435168호Japanese Patent Publication No. 5435168

본 발명의 목적은, 사파이어 유리 등의 산화알루미늄 또는 알루미늄 기판에 방오제 등의 기능성막을 형성하는 경우에, 양자 사이에 개재되어 그들의 밀착성을 높이는 역할을 완수하고, 또한 웨트 코팅법으로 성막 가능한 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제를 제공하는 것에 있다.An object of the present invention is, when forming a functional film such as an antifouling agent on an aluminum oxide such as sapphire glass or an aluminum substrate, it is interposed between the two to fulfill a role of enhancing their adhesiveness, and furthermore, aluminum oxide that can be formed into a film by a wet coating method Or it exists in providing the close_contact|adherence film forming agent for aluminum substrates.

본 발명자는 상기 목적을 달성하기 위해 예의 연구를 실시한 결과, 이하의 요지를 갖는 본 발명을 완성시켰다.MEANS TO SOLVE THE PROBLEM As a result of earnestly researching in order to achieve the said objective, this inventor completed this invention which has the following summary.

1. 알콕시실란의 가수분해·축합체와, 알루미늄염을 함유하는 것을 특징으로 하는 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제.1. Adhesive film forming agent for aluminum oxide or aluminum substrates characterized by containing the hydrolysis/condensation product of an alkoxysilane, and an aluminum salt.

2. 알콕시실란의 가수분해·축합체가, 하기 식 (I) 및 (II) 로 나타내는 알콕시실란에서 선택되는 적어도 1 종을 포함하는 알콕시실란 성분의 가수분해·축합체인, 상기 1 에 기재된 밀착 피막 형성제.2. The adhesion film formation as described in said 1, wherein the hydrolysis/condensation product of an alkoxysilane is a hydrolysis/condensation product of an alkoxysilane component containing at least one selected from alkoxysilanes represented by the following formulas (I) and (II). My.

(화학식 1)(Formula 1)

Si(OR1)4 (I)Si(OR 1 ) 4 (I)

(화학식 2)(Formula 2)

R2 mSi(OR3)4-m (II)R 2 m Si(OR 3 ) 4-m (II)

상기 식 (I) 및 (II) 에 있어서, R1 및 R3 은 각각 독립적으로 탄소수 1 ∼ 5 의 알킬기를 나타내고, R2 는 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 및 시클로헥실기로 이루어지는 군에서 선택되는 적어도 1 종으로 치환되어 있어도 되고, 또한 헤테로 원자를 갖고 있어도 되는 탄소수 1 ∼ 20 의 탄화수소기, 수소 원자, 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 시클로헥실기, 아미노기, 글리시독시기, 메르캅토기, 이소시아네이트기 또는 우레이드기를 나타낸다. m 은 1 ∼ 3 의 정수를 나타낸다.In the formulas (I) and (II), R 1 and R 3 each independently represent an alkyl group having 1 to 5 carbon atoms, and R 2 is a halogen atom, a vinyl group, a methacryloxy group, an acryloxy group, and a styryl group. A hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a vinyl group, or a methacryloxy group which may be substituted with at least one selected from the group consisting of , a phenyl group and a cyclohexyl group and may have a hetero atom. , an acryloxy group, a styryl group, a phenyl group, a cyclohexyl group, an amino group, a glycidoxy group, a mercapto group, an isocyanate group or a ureide group. m represents the integer of 1-3.

3. 상기 알루미늄염이, 염화알루미늄, 질산알루미늄, 황산알루미늄, 아세트산알루미늄, 옥살산알루미늄, 술팜산알루미늄, 술폰산알루미늄, 아세토아세트산알루미늄, 알루미늄아세틸아세토네이트 및 이것들의 염기성염으로 이루어지는 군에서 선택되는 적어도 1 종인, 상기 1 또는 2 에 기재된 밀착 피막 형성제.3. The aluminum salt is at least one selected from the group consisting of aluminum chloride, aluminum nitrate, aluminum sulfate, aluminum acetate, aluminum oxalate, aluminum sulfamate, aluminum sulfonate, aluminum acetoacetate, aluminum acetylacetonate, and basic salts thereof. The adhesive film forming agent as described in said 1 or 2 which is a species.

4. 상기 알루미늄염이 질산알루미늄염인, 상기 1 ∼ 3 중 어느 한 항에 기재된 밀착 피막 형성제.4. The adhesive film forming agent according to any one of 1 to 3, wherein the aluminum salt is an aluminum nitrate salt.

5. 규소 원자의 전체 몰수 (Si) 와 알루미늄 원자의 몰수 (Al) 의 합계에 대한 알루미늄 원자의 몰비 (Al/(Si + Al)) 가 0.1 ∼ 0.5 인, 상기 1 ∼ 4 중 어느 한 항에 기재된 밀착 피막 형성제.5. In any one of 1 to 4 above, wherein the molar ratio (Al/(Si + Al)) of aluminum atoms to the sum of the total number of moles of silicon atoms (Si) and the number of moles of aluminum atoms (Al) is 0.1 to 0.5. The described adhesion film former.

6. 석출 방지제로서, N-메틸-피롤리돈, 에틸렌글리콜, 디메틸포름아미드, 디메틸아세트아미드, 디에틸렌글리콜, 프로필렌글리콜, 헥실렌글리콜 및 이들의 유도체로 이루어지는 군에서 선택되는 적어도 하나를 함유하는, 상기 1 ∼ 5 중 어느 한 항에 기재된 밀착 피막 형성제.6. As a precipitation inhibitor, containing at least one selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof , The adhesive film forming agent according to any one of 1 to 5 above.

7. 상기 1 ∼ 6 중 어느 한 항에 기재된 밀착 피막 형성제를 사용하여 얻어지는 피막.7. A film obtained by using the adhesion film forming agent according to any one of 1 to 6.

8. 상기 7 에 기재된 밀착 피막을 갖는 산화알루미늄 또는 알루미늄 기판.8. The aluminum oxide or aluminum substrate which has an adhesive film as described in 7 above.

9. 상기 7 에 기재된 밀착 피막을 갖는 터치 패널.9. The touch panel which has an adhesive film as described in 7 above.

10. 상기 1 ∼ 6 중 어느 한 항에 기재된 밀착 피막 형성제를, 산화알루미늄 기판 또는 알루미늄 기판에 도포한 도막을 100 ∼ 600 ℃ 에서 소성하는 산화알루미늄 또는 알루미늄 기판용의 밀착 피막의 형성 방법.10. A method for forming an adhesion film for aluminum oxide or aluminum substrates, wherein the coating film obtained by applying the adhesion film forming agent according to any one of 1 to 6 to an aluminum oxide substrate or an aluminum substrate is baked at 100 to 600°C.

본 발명의 밀착 피막 형성제는, 이것을 사파이어 유리 등의 산화알루미늄 또는 알루미늄 기판에 도포 등에 의해 적용하여 피막을 형성하고, 그 위에 방오제 등의 기능성막을 형성함으로써 우수한 내찰상성 등의 특성을 부여할 수 있다. 예를 들어, 본 발명에 의하면, 우수한 방오성 및 내찰상성을 갖는 터치 패널용 커버 유리가 얻어진다. 금속 알루미늄의 표면은, 공기 중에서 산화되어 산화알루미늄 피막이 형성되기 때문에, 본 발명의 밀착 피막 형성제는 금속 알루미늄 기판용으로도 사용할 수 있다.The adhesion film forming agent of the present invention forms a film by applying it to an aluminum oxide such as sapphire glass or an aluminum substrate or the like, and forming a functional film such as an antifouling agent thereon, so that excellent scratch resistance properties, etc. can be imparted. have. For example, according to this invention, the cover glass for touch panels which has the outstanding antifouling property and abrasion resistance is obtained. Since the surface of metallic aluminum is oxidized in air to form an aluminum oxide film, the adhesion film forming agent of the present invention can also be used for metallic aluminum substrates.

도 1 은, 본 발명의 밀착 피막 형성제를 사용하여 얻어지는 산화알루미늄 기판의 대표예인 터치 패널용 커버 유리의 모식적인 단면도이다.BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic sectional drawing of the cover glass for touch panels which is a representative example of the aluminum oxide board|substrate obtained using the close_contact|adherence film forming agent of this invention.

본 발명의 밀착 피막 형성제는, (A) 성분으로서 알콕시실란의 가수분해·축합체, 및 (B) 성분으로서 알루미늄염을 함유한다.The adhesion film forming agent of this invention contains the aluminum salt as a hydrolysis/condensation product of an alkoxysilane as (A) component, and (B) component.

<(A) 성분><(A) component>

(A) 성분인 알콕시실란의 가수분해·축합체는, 하기 식 (I) 및 (II) 로 나타내는 알콕시실란에서 선택되는 적어도 1 종을 포함하는 알콕시실란 성분의 가수분해·축합체이다.(A) The hydrolysis/condensation product of the alkoxysilane component is a hydrolysis/condensation product of the alkoxysilane component containing at least 1 sort(s) selected from the alkoxysilane represented by following formula (I) and (II).

(화학식 3)(Formula 3)

Si(OR1)4 (I)Si(OR 1 ) 4 (I)

R1 은, 탄소수 1 ∼ 5 의 알킬기를 나타낸다. 반응성의 관점에서 OR1 기로는, 메톡시기, 에톡시기 또는 프로폭시기가 바람직하다.R 1 represents an alkyl group having 1 to 5 carbon atoms. From the viewpoint of reactivity, the OR 1 group is preferably a methoxy group, an ethoxy group or a propoxy group.

식 (I) 로 나타내는 알콕시실란의 구체예를 들지만, 이들에 한정되는 것은 아니다. 예를 들어, 테트라메톡시실란, 테트라에톡시실란, 테트라-iso-프로폭시실란, 테트라-n-프로폭시실란, 테트라-n-부톡시실란, 테트라-sec-부톡시실란, 테트라-tert-부톡시실란, 테트라펜타에톡시실란 등을 들 수 있다.Although the specific example of the alkoxysilane represented by Formula (I) is given, it is not limited to these. For example, tetramethoxysilane, tetraethoxysilane, tetra-iso-propoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-tert- Butoxysilane, tetrapentaethoxysilane, etc. are mentioned.

식 (I) 로 나타내는 알콕시실란은, 전체 알콕시실란 중 40 몰% 이하에서는 충분한 경도가 얻어지지 않는 경우가 있기 때문에, 40 몰% 이상이 바람직하다. 보다 바람직하게는 50 몰% 이상이다. 더욱 바람직하게는 80 몰% 이상이다.Since sufficient hardness may not be obtained at 40 mol% or less in the alkoxysilane represented by Formula (I) in all the alkoxysilanes, 40 mol% or more is preferable. More preferably, it is 50 mol% or more. More preferably, it is 80 mol% or more.

(화학식 4)(Formula 4)

R2 mSi(OR3)4-m (II)R 2 m Si(OR 3 ) 4-m (II)

R2 는, 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 및 시클로헥실기로 이루어지는 군에서 선택되는 적어도 1 종으로 치환되어 있어도 되고, 또한 헤테로 원자를 갖고 있어도 되는 탄소수 1 ∼ 20 의 탄화수소기, 수소 원자, 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 시클로헥실기, 아미노기, 글리시독시기, 메르캅토기, 이소시아네이트기 또는 우레이드기를 나타낸다. 또한, R1, R2 및 R3 이 복수가 되는 경우, R1, R2 및 R3 은, 각각 독립적으로 상기 정의를 나타낸다.R 2 may be substituted with at least one selected from the group consisting of a halogen atom, a vinyl group, a methacryloxy group, an acryloxy group, a styryl group, a phenyl group, and a cyclohexyl group, or may have a hetero atom A hydrocarbon group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a vinyl group, a methacryloxy group, an acryloxy group, a styryl group, a phenyl group, a cyclohexyl group, an amino group, a glycidoxy group, a mercapto group, an isocyanate group or a ureide group represents the group. In addition, when R 1 , R 2 and R 3 are plural, R 1 , R 2 and R 3 each independently represent the above definition.

R3 은, 탄소수 1 ∼ 5 의 알킬기를 나타내고, m 은 1 ∼ 3 의 정수를 나타낸다. 또한, R3 이 복수가 되는 경우, R3 은, 각각 독립적으로 상기 정의를 나타낸다. 반응성의 관점에서 OR3 기로는, 메톡시기 또는 에톡시기가 바람직하다.R 3 represents an alkyl group having 1 to 5 carbon atoms, and m represents an integer of 1 to 3. In addition, when R< 3 > becomes plural, R< 3 > represents the said definition each independently. From the viewpoint of reactivity, the OR 3 group is preferably a methoxy group or an ethoxy group.

식 (II) 로 나타내는 알콕시실란의 구체예를 들지만, 이들에 한정되는 것은 아니다. 예를 들어, 3-메타크릴옥시프로필트리메톡시실란, 3-메타크릴옥시프로필트리에톡시실란, 메타크릴옥시메틸트리메톡시실란, 메타크릴옥시메틸트리에톡시실란, 3-아크릴옥시프로필트리메톡시실란, 3-아크릴옥시프로필트리에톡시실란, 아크릴옥시에틸트리메톡시실란, 아크릴옥시에틸트리에톡시실란, 스티릴에틸트리메톡시실란, 스티릴에틸트리에톡시실란, 3-(N-스티릴메틸-2-아미노에틸아미노)프로필트리메톡시실란, 4-(트리메톡시실릴)스티렌, 비닐트리메톡시실란, 비닐트리에톡시실란, 3,3,3-트리플루오로프로필트리메톡시실란, 3-클로로프로필트리에톡시실란, 3-브로모프로필트리에톡시실란, 디메틸디에톡시실란, 디메틸디메톡시실란, 디에틸디에톡시실란, 디에틸디메톡시실란, 디페닐디메톡시실란, 디페닐디에톡시실란트리메틸에톡시실란, 트리메틸메톡시실란, 3-(2-아미노에틸아미노프로필)트리메톡시실란, 3-(2-아미노에틸아미노프로필)트리에톡시실란, 2-아미노에틸아미노메틸트리메톡시실란, 2-(2-아미노에틸티오에틸)트리에톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디에톡시실란, 3-글리시독시프로필트리에톡시실란, 3-메르캅토프로필트리에톡시실란, 메르캅토메틸트리메톡시실란, 3-이소시아네이트프로필트리에톡시실란, 3-메르캅토프로필트리메톡시실란, 3-아미노프로필메틸디에톡시실란, 3-아미노프로필디메틸에톡시실란, γ-우레이도프로필트리에톡시실란, γ-우레이도프로필트리메톡시실란, γ-우레이도프로필트리프로폭시실란 등을 들 수 있다.Although the specific example of the alkoxysilane represented by Formula (II) is given, it is not limited to these. For example, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, methacryloxymethyltrimethoxysilane, methacryloxymethyltriethoxysilane, 3-acryloxypropyltri Methoxysilane, 3-acryloxypropyltriethoxysilane, acryloxyethyltrimethoxysilane, acryloxyethyltriethoxysilane, styrylethyltrimethoxysilane, styrylethyltriethoxysilane, 3-(N -Styrylmethyl-2-aminoethylamino)propyltrimethoxysilane, 4-(trimethoxysilyl)styrene, vinyltrimethoxysilane, vinyltriethoxysilane, 3,3,3-trifluoropropyltri Methoxysilane, 3-chloropropyltriethoxysilane, 3-bromopropyltriethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, diethyldiethoxysilane, diethyldimethoxysilane, diphenyldimethoxysilane , Diphenyldiethoxysilanetrimethylethoxysilane, trimethylmethoxysilane, 3-(2-aminoethylaminopropyl)trimethoxysilane, 3-(2-aminoethylaminopropyl)triethoxysilane, 2-aminoethyl Aminomethyltrimethoxysilane, 2-(2-aminoethylthioethyl)triethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-Glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-mercaptopropyltriethoxysilane, mercaptomethyltrimethoxysilane , 3-isocyanatepropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, γ-ureidopropyltriethoxysilane, γ- Ureidopropyl trimethoxysilane, gamma -ureidopropyl tripropoxysilane, etc. are mentioned.

또한, 본 발명의 밀착 피막 형성제에 함유되는 알콕시실란의 가수분해·축합체는, 보존 안정성 및 저온 소성시의 경도의 관점에서 5 량체 이하인 것이 바람직하고, 2 ∼ 4 량체가 보다 바람직하다.Moreover, it is preferable that it is pentamer or less from a viewpoint of storage stability and the hardness at the time of low-temperature baking, and, as for the hydrolysis/condensation product of the alkoxysilane contained in the adhesion-film forming agent of this invention, 2 - tetramer are more preferable.

이 알콕시실란의 가수분해·축합체는, 염기 및 물의 존재하에 축합시키는 것이 가능하다. 염기의 존재량은 알콕시실란에 대하여 0.01 배 몰 내지 2 배 몰이 바람직하고, 0.05 배 몰 내지 1 배 몰이 보다 바람직하다. 물의 존재량은 알콕시실란에 대하여 0.5 배 몰 내지 10 배 몰이 바람직하고, 1 배 몰 내지 5 배 몰이 보다 바람직하다.The hydrolysis/condensation product of this alkoxysilane can be condensed in the presence of a base and water. 0.01 times mole - 2 times mole are preferable with respect to an alkoxysilane, and, as for the abundance of a base, 0.05 times mole - 1 times mole are more preferable. 0.5 times mole - 10 times mole are preferable with respect to an alkoxysilane, and, as for the abundance of water, 1 times mole - 5 times mole are more preferable.

<(B) 성분><(B) component>

본 발명의 밀착 피막 형성제에 함유되는 알루미늄염으로는, 염화알루미늄, 질산알루미늄, 황산알루미늄, 아세트산알루미늄, 옥살산알루미늄, 술팜산알루미늄, 술폰산알루미늄, 아세토아세트산알루미늄, 알루미늄아세틸아세토네이트, 이들의 수화물, 함수염, 또는 염기성염을 들 수 있다.Examples of the aluminum salt contained in the adhesion film forming agent of the present invention include aluminum chloride, aluminum nitrate, aluminum sulfate, aluminum acetate, aluminum oxalate, aluminum sulfamate, aluminum sulfonate, aluminum acetoacetate, aluminum acetylacetonate, and hydrates thereof; A hydrous salt or a basic salt is mentioned.

그 중에서도, 입수의 용이성과 피막 형성제의 저장 안정성의 점에서, 특히, 질산알루미늄염이 바람직하다.Especially, an aluminum nitrate salt is especially preferable from the point of the ease of acquisition and the storage stability of a film forming agent.

<석출 방지제><Precipitation inhibitor>

본 발명의 밀착 피막 형성제에는, 보존 안정성의 관점에서 석출 방지제가 포함되는 것이 바람직하다. 석출 방지제는, 본 발명의 밀착 피막 형성제로 피막을 형성했을 때, 피막 중에 알루미늄염이 석출되는 것을 방지하기 위해 사용된다.It is preferable that a precipitation inhibitor is contained in the adhesive film forming agent of this invention from a viewpoint of storage stability. A precipitation inhibitor is used in order to prevent the aluminum salt from precipitating in a film, when a film is formed with the adhesive film forming agent of this invention.

석출 방지제로는, N-메틸-피롤리돈, 에틸렌글리콜, 디메틸포름아미드, 디메틸아세트아미드, 디에틸렌글리콜, 프로필렌글리콜, 헥실렌글리콜, 이들의 유도체 등을 들 수 있고, 이들을 1 종 또는 2 종 이상 혼합하여 사용할 수 있다.Examples of the precipitation inhibitor include N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. It can be used by mixing the above.

<유기 용매><Organic solvent>

본 발명의 밀착 피막 형성제는, 통상적으로 상기 (A) 성분 및 (B) 성분을 용해 또는 분산시키는 유기 용매를 함유한다. 이 유기 용매는, 밀착 피막 형성제의 도막을 형성하고, 이 도막을 가열 처리하여 밀착 피막을 얻을 때에 일산 (逸散) 되어, 형성된 밀착 피막 중에는 잔존하지 않는 것이 바람직하다. 이 때문에, 이러한 유기 용매로는, 상기 (A) 성분 및 (B) 성분을 양호하게 용해 또는 분산시키고, 비점이 바람직하게는 60 ∼ 250 ℃, 보다 바람직하게는 75 ∼ 200 ℃ 인 것이 바람직하다.The adhesion film forming agent of this invention contains the organic solvent which melt|dissolves or disperse|distributes the said (A) component and (B) component normally. It is preferable that this organic solvent forms a coating film of an adhesion film forming agent, is dispersed when heat-processing this coating film to obtain an adhesion film, and does not remain in the formed adhesion film. For this reason, as such an organic solvent, it is preferable that the said (A) component and (B) component are melt|dissolved or disperse|distributed favorably, A boiling point becomes like this. Preferably it is 60-250 degreeC, More preferably, it is 75-200 degreeC.

유기 용매의 예로는, 메탄올, 에탄올, 프로판올, 부탄올 등의 알코올류, 아세트산에틸에스테르 등의 에스테르류, 에틸렌글리콜 등의 글리콜류 및 그 에테르 유도체, 에스테르 유도체, 디에틸에테르 등의 에테르류, 아세톤, 메틸에틸케톤, 시클로헥사논 등의 케톤류, 벤젠, 톨루엔 등의 방향족 탄화수소류 등을 들 수 있다. 그 중에서도, 용매의 잔존성 및 도포성의 관점에서, 에탄올, 프로판올, 또는 프로필렌글리콜모노메틸에테르가 바람직하다.Examples of the organic solvent include alcohols such as methanol, ethanol, propanol and butanol, esters such as ethyl acetate ester, glycols such as ethylene glycol and ether derivatives thereof, ester derivatives, ethers such as diethyl ether, acetone, Ketones, such as methyl ethyl ketone and cyclohexanone, aromatic hydrocarbons, such as benzene and toluene, etc. are mentioned. Among them, ethanol, propanol, or propylene glycol monomethyl ether is preferable from the viewpoint of solvent survivability and applicability.

<그 밖의 성분><Other ingredients>

본 발명의 밀착 피막 형성제는, 본 발명의 효과를 저해하지 않는 한에 있어서, 상기 이외의 성분, 예를 들어, 무기 미립자, 메탈록산 모노머, 메탈록산 올리고머, 메탈록산 폴리머, 가교제, 유기 폴리머, 레벨링제, 계면 활성제 등의 성분이 포함되어 있어도 된다.The adhesion film forming agent of the present invention, as long as the effect of the present invention is not impaired, components other than the above, for example, inorganic fine particles, metaloxane monomers, metaloxane oligomers, metaloxane polymers, crosslinking agents, organic polymers, Components, such as a leveling agent and surfactant, may be contained.

<밀착 피막 형성제의 제조><Production of adhesive film former>

본 발명의 밀착 피막 형성제는, 상기 (A) 성분인 식 (I) 및 (II) 로 나타내는 알콕시실란에서 선택되는 적어도 1 종과, (B) 성분인 알루미늄염과, 물을 함유하는 유기 용매 중에서 혼합함으로써 제조된다. 식 (I) 및 (II) 로 나타내는 알콕시실란은, 물과의 접촉에 의해 가수분해·축합되어 가수분해·축합체로 전화된다. 이로써, 본 발명의 밀착 피막 형성제는, 알콕시실란의 가수분해·축합체와, 알루미늄염이 유기 용매 중에 용해 또는 분산되어 함유하는 조성물의 형태로 얻어진다.The adhesion film forming agent of this invention is an organic solvent containing at least 1 sort(s) selected from the alkoxysilane represented by Formula (I) and (II) which is the said (A) component, the aluminum salt which is (B) component, and water. It is prepared by mixing in The alkoxysilane represented by Formula (I) and (II) is hydrolyzed and condensed by contact with water, and is converted into a hydrolysis/condensation product. Thereby, the adhesion film forming agent of this invention is obtained in the form of a composition containing the hydrolysis/condensation product of an alkoxysilane, and an aluminum salt melt|dissolving or disperse|distributing in an organic solvent.

여기에서 사용되는 유기 용매는, 바람직한 특성도 포함하여, 본 발명의 밀착 피막 형성제 중에 함유되는 상기한 유기 용매와 동일한 것을 사용할 수 있다.As the organic solvent used herein, the same organic solvents as those contained in the adhesion film forming agent of the present invention can be used, including desirable properties.

본 발명의 밀착 피막 형성제에 있어서의 각 성분의 함유량에 대해서는, (A) 성분인 알콕시실란의 가수분해·축합물과 (B) 성분인 알루미늄염을 모두 금속 산화물의 고형분으로서 환산한 경우, 0.1 ∼ 20 질량% 가 바람직하고, 0.5 ∼ 6 질량% 가 보다 바람직하다. 함유량이 20 질량% 를 초과하면, 조성물의 저장 안정성이 나빠지는 데다가, 형성되는 보호막의 막두께 제어가 곤란해진다. 한편, 0.1 질량% 이하에서는, 얻어지는 보호막의 두께가 얇아져, 소정의 막두께를 얻기 위해서 다수 회의 도막 형성이 필요해져, 밀착 피막의 제조가 번잡해져 버린다.About content of each component in the adhesion film forming agent of this invention, when converting both the hydrolysis/condensation product of the alkoxysilane which is (A) component, and the aluminum salt which is (B) component as solid content of a metal oxide, 0.1 -20 mass % is preferable, and 0.5-6 mass % is more preferable. When content exceeds 20 mass %, the storage stability of a composition will worsen, and also film thickness control of the protective film formed will become difficult. On the other hand, if it is 0.1 mass % or less, the thickness of the protective film obtained becomes thin, in order to obtain a predetermined|prescribed film thickness, multiple times of coating film formation is needed, and manufacture of an adhesion film will become complicated.

(A) 성분인 알콕시실란의 가수분해에 사용되는 물의 양은, 몰비 (물의 양 (몰))/사용 알콕시실란의 총 몰) 로, 0.5 이상으로 하는 것이 바람직하고, 1 ∼ 5 가 보다 바람직하다. 이 몰비가 0.5 이상인 경우에는, 상기 서술한 알콕시실란의 가수분해가 충분해져 성막성을 향상시키고, 얻어지는 밀착 피막의 강도를 증대시킨다.(A) The amount of water used for hydrolysis of the alkoxysilane, which is the component, is preferably 0.5 or more, more preferably 1 to 5 in a molar ratio (amount (mol) of water)/total moles of alkoxysilane used. When this molar ratio is 0.5 or more, the hydrolysis of the above-mentioned alkoxysilane becomes enough, film-forming property is improved, and the intensity|strength of the adhesive film obtained is increased.

또한, 상기 가수분해에 있어서, (B) 성분인 알루미늄염의 함수염이 공존하는 경우에는 그 함수분이 반응에 관여하기 때문에, 가수분해에 사용하는 물의 양에 대하여 금속염의 함수분을 산입할 필요가 있다.In addition, in the above hydrolysis, when the water-containing salt of the aluminum salt as component (B) coexists, the water content is involved in the reaction, so it is necessary to include the water content of the metal salt with respect to the amount of water used for hydrolysis. .

알콕시실란의 가수분해시의 온도는, 20 ∼ 100 ℃ 의 범위에서 실시되는 것이 바람직하다. 그 중에서도, 적절한 분자량의 축합체가 얻어지는 관점에서, 25 ∼ 80 ℃ 의 범위인 것이 보다 바람직하다. 가수분해의 시간으로는, 적절한 분자량의 축합체를 얻는 관점에서 30 분 ∼ 48 시간이 바람직하고, 보다 바람직하게는 30 분 ∼ 24 시간이다.It is preferable that the temperature at the time of hydrolysis of an alkoxysilane is implemented in the range of 20-100 degreeC. Especially, it is more preferable that it is the range of 25-80 degreeC from a viewpoint from which the condensate of suitable molecular weight is obtained. As time for hydrolysis, 30 minutes - 48 hours are preferable from a viewpoint of obtaining the condensate of suitable molecular weight, More preferably, they are 30 minutes - 24 hours.

석출 방지제는, 알콕시실란이 알루미늄염의 존재하에서 가수분해·축합 반응할 때에 첨가되어 있어도 되고, 그들의 가수분해·축합 반응의 종료 후에 첨가되어도 된다.The precipitation inhibitor may be added when an alkoxysilane hydrolyzes and carries out a condensation reaction in presence of an aluminum salt, and may be added after completion|finish of those hydrolysis and condensation reaction.

석출 방지제는, 알루미늄염의 알루미늄을 산화알루미늄으로 환산하여, (석출 방지제/산화알루미늄) 의 중량 비율이 1 이상인 것이 바람직하고, 2 ∼ 20 이 보다 바람직하다. 이 비율이 1 미만이면, 도막 형성시에 있어서의 금속염의 석출 방지 효과가 작아진다.A precipitation inhibitor converts the aluminum of an aluminum salt into aluminum oxide, and it is preferable that the weight ratio of (precipitation inhibitor/aluminum oxide) is 1 or more, and 2-20 are more preferable. When this ratio is less than 1, the precipitation prevention effect of the metal salt at the time of coating-film formation becomes small.

본 발명의 밀착 피막 형성제에 함유되는, (A) 성분인 알콕시실란의 가수분해·축합체와, (B) 성분인 알루미늄염의 함유 비율은, 규소 원자의 전체 몰수 (Si) 와 알루미늄 원자의 몰수 (Al) 의 합계에 대한 알루미늄 원자의 몰비 (Al/(Si+Al)) 가 0.1 ∼ 0.5 인 것이 바람직하고, 0.2 ∼ 0.4 가 보다 바람직하다. 이 몰비가 0.1 이상인 경우나, 0.5 이하인 경우에는 목적으로 하는 밀착 특성을 향상시킬 수 있다.The content ratio of the hydrolysis/condensation product of alkoxysilane as component (A) and aluminum salt as component (B), which are contained in the adhesion film forming agent of the present invention, is the total number of moles of silicon atoms (Si) and the number of moles of aluminum atoms. It is preferable that the molar ratio (Al/(Si+Al)) of the aluminum atom with respect to the sum total of (Al) is 0.1-0.5, and 0.2-0.4 is more preferable. When this molar ratio is 0.1 or more, or when it is 0.5 or less, the target adhesive property can be improved.

<밀착 피막><Adhesive film>

본 발명의 밀착 피막 형성제를, 산화알루미늄 또는 알루미늄 기판과 같이 표면이 산화알루미늄으로 덮여 있는 기판에 도포하고, 소성함으로써 기판 표면에 밀착 피막이 얻어진다.The adhesion film forming agent of this invention is apply|coated to the board|substrate whose surface is covered with aluminum oxide like aluminum oxide or an aluminum substrate, and an adhesion film is obtained on the substrate surface by baking.

본 발명의 밀착 피막 형성제를 사용하여, 기판 표면에 그 도막을 형성하는 방법으로는, 여러 가지 도포법을 적용하여 실시할 수 있다. 예를 들어, 딥 코트법, 스핀 코트법, 스프레이 코트법, 솔칠법, 롤 전사법, 스크린 인쇄법, 잉크젯법, 플렉소 인쇄법 등을 사용할 수 있다.As a method of forming the coating film on the substrate surface using the adhesion film forming agent of this invention, it can apply and implement various application|coating methods. For example, the dip coating method, the spin coating method, the spray coating method, the brush coating method, the roll transfer method, the screen printing method, the inkjet method, the flexographic printing method etc. can be used.

기판 표면에 형성된 도막은, 이어서 예를 들어, 50 ∼ 100 ℃, 바람직하게는 60 ∼ 80 ℃ 의 온도에서 가열하여 도막을 건조시킨 후, 100 ℃ 이상, 바람직하게는 100 ∼ 600 ℃, 보다 바람직하게는 300 ∼ 600 ℃ 의 온도에서, 10 분 이상, 바람직하게는 0.5 ∼ 2 시간 소성함으로써, 치밀한 막 구조의 밀착 피막을 얻을 수 있다. 이들 가열 처리는, 오븐로, 핫 플레이트 등의 장치를 사용하여 실시할 수 있다. 또한, 도막을 건조시키기 위한 상기 가열은 생략하는 것도 가능하다.The coating film formed on the surface of the substrate is then heated, for example, at a temperature of 50 to 100°C, preferably 60 to 80°C to dry the coating film, and then 100°C or more, preferably 100 to 600°C, more preferably is fired at a temperature of 300 to 600°C for 10 minutes or more, preferably for 0.5 to 2 hours, to obtain an adhesive film having a dense film structure. These heat processing can be performed using apparatuses, such as an oven and a hot plate. In addition, it is also possible to abbreviate|omit the said heating for drying a coating film.

상기와 같이 하여, 산화알루미늄 기판 상에서, 본 발명의 밀착 피막 형성제로 피막이 형성된다. 이 밀착 피막은, 그 표면에 여러 가지 특성 피막을 형성하는 코팅제를 형성하기 위한 밀착 보조층으로서 기능할 수 있다. 예를 들어, 코팅제로서 방오제를 사용한 경우에는, 우수한 내찰상 특성 피막을 표면에 갖는 산화알루미늄 기판이 얻어진다.As described above, on the aluminum oxide substrate, a film is formed with the adhesion film forming agent of the present invention. This adhesion film can function as an adhesion auxiliary|assistant layer for forming the coating agent which forms various characteristic films on the surface. For example, when an antifouling agent is used as a coating agent, an aluminum oxide substrate having an excellent scratch resistance coating film on the surface is obtained.

<산화알루미늄 기판><Aluminum oxide substrate>

본 발명의 밀착 피막 형성제는, 산화알루미늄 또는 알루미늄 기판의 표면에 밀착 피막을 형성하는 데에 사용된다. 즉, 산화알루미늄 기판의 표면에 밀착 피막을 형성하고, 이어서 밀착 피막의 표면에는, 특정 코팅제로부터 얻어지는 기능성막을 형성한다. 밀착 피막은, 상기 서술한 본 발명의 밀착 피막 형성제로부터, 산화알루미늄 기판의 표면에 직접 형성된다.The adhesion film forming agent of this invention is used for forming an adhesion film on the surface of aluminum oxide or an aluminum substrate. That is, an adhesion film is formed on the surface of the aluminum oxide substrate, and then, on the surface of the adhesion film, a functional film obtained from a specific coating agent is formed. The adhesion film is directly formed on the surface of the aluminum oxide substrate from the adhesion film forming agent of this invention mentioned above.

기능성막의 일례로는 방오층을 들 수 있다. 방오층은 방오제를 도포하고, 소성함으로써 형성할 수 있다. 기판으로서 사파이어 유리를 사용하고, 그 위에 본 발명의 밀착 피막 형성제로부터 얻어지는 피막을 형성하고, 계속해서 방오제로부터 얻어지는 피막 2 를 형성함으로써 우수한 내찰상성이 얻어진다.An example of the functional film is an antifouling layer. An antifouling layer can be formed by apply|coating an antifouling agent and baking. The excellent scratch resistance is obtained by using sapphire glass as a board|substrate, forming the film obtained from the adhesive film forming agent of this invention on it, and forming the film 2 obtained from the antifouling|stain-resistant agent then.

밀착 피막이나 기능성막의 두께는 모두 5 ∼ 1000 ㎚ 가 바람직하고, 보다 바람직하게는 10 ∼ 400 ㎚ 이다.As for the thickness of an adhesion film and a functional film, 5-1000 nm is preferable, More preferably, it is 10-400 nm.

본 발명의 밀착 피막 형성제는, 여러 가지 결정 구조의 산화알루미늄에 대해서도 유효하다. 단결정 산화알루미늄인 사파이어 유리 이외에, 다결정 또는 비정질의 산화알루미늄에도 사용할 수 있다.The adhesion film forming agent of this invention is effective also about the aluminum oxide of various crystal structures. In addition to sapphire glass, which is single-crystal aluminum oxide, it can also be used for polycrystalline or amorphous aluminum oxide.

또, 금속 알루미늄의 표면은 공기 중에서 산화되어 산화알루미늄 피막이 형성되기 때문에, 본 발명의 밀착 피막 형성제는, 금속 알루미늄 기판으로 이루어지는 구조체에 대해서도 사용할 수 있다.Moreover, since the surface of metallic aluminum is oxidized in air to form an aluminum oxide film, the adhesion film forming agent of this invention can be used also for the structure which consists of a metallic aluminum substrate.

본 발명에 있어서, 밀착 피막 상에 형성되는 기능성막은 특별히 한정되지 않는다. 구체적인 예로는, 방오제, 도료, 접착제, 반사 방지제, 발수제, 친수제, 발유제, 친유제, 하드 코트제, 방활재 (防滑材) 등으로부터 얻어지는 피막을 들 수 있다.In the present invention, the functional film formed on the adhesion film is not particularly limited. Specific examples include a coating film obtained from an antifouling agent, a paint, an adhesive, an antireflection agent, a water repellent agent, a hydrophilic agent, an oil repellent agent, an oil lipophilic agent, a hard coat agent, a lubricant, and the like.

<터치 패널용 커버 유리><Cover glass for touch panel>

발명의 밀착 피막 형성제를 사용하여 얻어지는 산화알루미늄 기판의 대표예로서, 도 1 에 나타내는 터치 패널용 커버 유리를 들 수 있다. 도 1 은, 터치 패널용 커버 유리의 모식적인 단면도이다. 터치 패널용 커버 유리 (1) 는, 사파이어 유리 (4) 의 표면 상에, 기능성막 (2) 을 밀착 피막 (3) 을 개재하여 갖는다. 밀착 피막 (3) 은, 본 발명의 밀착 피막 형성제를 사용하여 사파이어 유리의 표면에 직접 형성된 피막이다. 기능성막 (2) 의 일례로는, 방오층을 들 수 있다. 방오층은 방오제를 도포하고, 소성함으로써 형성할 수 있다.The cover glass for touch panels shown in FIG. 1 is mentioned as a representative example of the aluminum oxide board|substrate obtained using the adhesive film forming agent of this invention. BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic sectional drawing of the cover glass for touch panels. The cover glass 1 for touch panels has the functional film 2 through the adhesion film 3 on the surface of the sapphire glass 4 . The adhesion film 3 is a film formed directly on the surface of sapphire glass using the adhesion film forming agent of this invention. An example of the functional film 2 is an antifouling layer. An antifouling layer can be formed by apply|coating an antifouling agent and baking.

사파이어 유리 상에 본 발명의 피막 형성제로부터 얻어지는 밀착 피막을 형성하고, 계속해서 방오제의 막을 형성함으로써, 손가락이나 물질을 문질러도 방오제를 사파이어 유리 상에 유지할 수 있다. 이로써, 터치 패널을 사용할 때의 내찰상성, 발수성, 발유성의 열화 및 지문 등이 부착되는 문제를 방지할 수 있다.By forming the adhesion film obtained from the film forming agent of this invention on sapphire glass, and then forming the film|membrane of an antifouling agent, even if it rubs a finger or a substance, an antifouling agent can be hold|maintained on sapphire glass. Accordingly, it is possible to prevent deterioration of abrasion resistance, water repellency and oil repellency, and problems such as adhesion of fingerprints when the touch panel is used.

실시예Example

이하, 실시예를 나타내어 본 발명을 구체적으로 설명하지만, 본 발명은 하기 실시예 등에 제한되어 해석되는 것은 아니다.Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to the following Examples and the like to be interpreted.

[화합물과 그 약칭][Compound and its abbreviation]

TEOS : 테트라에톡시실란 AN : 질산알루미늄·9 수화물TEOS: Tetraethoxysilane AN: Aluminum nitrate hexahydrate

EtOH : 에탄올 PGME : 프로필렌글리콜모노메틸에테르EtOH: ethanol PGME: propylene glycol monomethyl ether

HG : 헥실렌글리콜 PB : 프로필렌글리콜모노부틸에테르HG: Hexylene glycol PB: Propylene glycol monobutyl ether

BCS : 에틸렌글리콜모노부틸에테르BCS: Ethylene glycol monobutyl ether

방오제 : FT-Net 사 제조, P-5425-0.2Antifouling agent: manufactured by FT-Net, P-5425-0.2

<실시예 1><Example 1>

4 구 반응 플라스크에, EtOH (22.49 g), 물 (7.42 g), 및 AN (12.88 g) 을 투입하여 교반하였다. 이어서, EtOH (28.60 g), 및 TEOS (28.60 g) 를 투입하고, 20 ℃ 에서 1 시간 교반하여 용액을 조제하였다.In a 4-necked reaction flask, EtOH (22.49 g), water (7.42 g), and AN (12.88 g) were added and stirred. Subsequently, EtOH (28.60 g) and TEOS (28.60 g) were added, and the mixture was stirred at 20°C for 1 hour to prepare a solution.

이 용액 (30 g) 을 HG (14 g), PB (10.5 g), BCS (10.5 g), 및 PGME (35 g) 와 혼합함으로써 밀착 피막 형성제를 얻었다.An adhesion film former was obtained by mixing this solution (30g) with HG (14g), PB (10.5g), BCS (10.5g), and PGME (35g).

<실시예 2><Example 2>

4 구 반응 플라스크에, EtOH (22.93 g), 물 (6.6 g), 및 AN (19.62 g) 을 투입하여 교반하였다. 이어서, EtOH (25.43 g), 및 TEOS (25.43 g) 를 투입하고, 1 시간 수욕 중에서 교반하여 용액을 조제하였다.In a 4-necked reaction flask, EtOH (22.93 g), water (6.6 g), and AN (19.62 g) were added and stirred. Then, EtOH (25.43 g) and TEOS (25.43 g) were added, and the solution was prepared by stirring in a water bath for 1 hour.

이 용액 (30 g) 을 HG (14 g), PB (10.5 g), BCS (10.5 g), 및 PGME (35 g) 와 혼합함으로써 밀착 피막 형성제를 얻었다.An adhesion film former was obtained by mixing this solution (30g) with HG (14g), PB (10.5g), BCS (10.5g), and PGME (35g).

<비교예 1><Comparative Example 1>

환류관을 설치한 4 구 반응 플라스크에, EtOH (33.87 g), 알콕시실란으로서 TEOS (34.72 g) 를 투입하여 교반하였다. 이어서, EtOH (16.94 g), 물 (13.6 g), 및 질산 60 중량% 함유 수용액 (0.88 g) 을, 30 분간 적하하면서 투입하여 교반하였다. 이어서, 3 시간 환류하고, 실온까지 방랭시켜 용액을 조제하였다.EtOH (33.87 g) and TEOS (34.72 g) as an alkoxysilane were put into a four-necked reaction flask equipped with a reflux tube and stirred. Subsequently, EtOH (16.94 g), water (13.6 g), and an aqueous solution containing 60 wt% of nitric acid (0.88 g) were added dropwise over 30 minutes, and stirred, and the mixture was stirred. Then, it refluxed for 3 hours, and it was made to cool to room temperature, and the solution was prepared.

이 용액 (30 g) 을 HG (14 g), PB (10.5 g), BCS (10.5 g), 및 PGME (35 g) 와 혼합함으로써 밀착 피막 형성제를 얻었다.An adhesion film former was obtained by mixing this solution (30g) with HG (14g), PB (10.5g), BCS (10.5g), and PGME (35g).

[방오제막을 갖는 사파이어 유리의 제작][Production of sapphire glass having an antifouling film]

스핀 코터를 사용하고, 상기 서술한 실시예 1, 2 및 비교예 1 의 밀착 피막 형성제를, 각각 두께 0.7 ㎜ 의 사파이어 유리 (단결정 사파이어 유리, 표면 거칠기 : 1 Å 이하) 에 도포하고, 핫 플레이트 상에서 80 ℃ 에서 3 분간의 건조를 실시하였다. 계속해서, 클린 오븐 중에서, 150 ℃ 또는 300 ℃ 에서 30 분간 가열함으로써, 두께 50 ∼ 100 ㎚ 의 실시예 및 비교예의 밀착 피막을 얻었다.Using a spin coater, the adhesion film formers of Examples 1 and 2 and Comparative Example 1 described above were applied to sapphire glass (single crystal sapphire glass, surface roughness: 1 Å or less) having a thickness of 0.7 mm, respectively, and a hot plate Drying was performed for 3 minutes at 80 degreeC on the top. Then, the close_contact|adherence film of the Example and the comparative example with a thickness of 50-100 nm was obtained by heating at 150 degreeC or 300 degreeC for 30 minute(s) in clean oven.

다음으로, 기능성막을 형성하는 코팅제인 방오제를, 스핀 코터를 사용하여, 실시예 및 비교예로부터 얻어지는 밀착 피막이 부착된 기판에 도포하였다. 그 후, 핫 플레이트 상에서 80 ℃ 에서 3 분간 건조시키고, 이어서, 클린 오븐 중, 170 ℃ 에서 20 분간 가열시킴으로써, 표면에 방오제막을 갖는 사파이어 유리를 제조하였다.Next, an antifouling agent, which is a coating agent for forming a functional film, was applied to the substrate with an adhesion film obtained in Examples and Comparative Examples using a spin coater. Then, the sapphire glass which has an antifouling|stain-resistant film on the surface was manufactured by drying at 80 degreeC for 3 minutes on a hotplate, and heating at 170 degreeC for 20 minutes in a clean oven then.

비교예 2 에서는, 실시예 및 비교예의 밀착 피막 형성제를 도막하지 않고, 사파이어 유리 기판에 직접, 방오제막을 형성한 기판도 제작하였다.In the comparative example 2, the board|substrate which formed the antifouling|stain-resistant film directly on the sapphire glass substrate without coating the adhesion film forming agent of an Example and a comparative example was also produced.

[내마모 평가 : 스틸울 내찰상성 시험][Abrasion resistance evaluation: Steel wool scratch resistance test]

왕복식 내찰상성 시험기 (다이에이 과학 정기 제작소사 제조) 의 받침대 상에 유지된, 상기 실시예 및 비교예에서 제작한 사파이어 유리 기판의 표면 상에, #0000 등급의 스틸울 (니혼 스틸울사 제조, 등록상표 : 본스타) 를 면적 2 ㎠ 의 사각형 패드를 접촉하도록 올리고, 이러한 패드를 인가 하중 1,000 g, 매분 25 왕복의 속도로 0 왕복에서 1000 왕복까지 마찰하였다. 마찰 200 왕복마다, 접촉각계 (쿄와 계면 과학사 제조, DM-701) 를 사용하여 액량 3 ㎖ 에서의 물의 접촉각 측정을 실시하였다. 측정 결과를 정리하여 표 1 에 나타낸다.On the surface of the sapphire glass substrate produced in the above examples and comparative examples, held on the pedestal of a reciprocating abrasion resistance testing machine (manufactured by Daiei Science Seiki Seisakusho Co., Ltd.), grade #0000 steel wool (manufactured by Nippon Steel Wool Co., Ltd., registered) Trademark: Bonstar) was raised to contact a square pad having an area of 2 cm 2 , and this pad was rubbed from 0 to 1000 reciprocations at an applied load of 1,000 g and a speed of 25 reciprocations per minute. The contact angle of water in 3 ml of liquid volume was measured using the contact angle meter (made by Kyowa Interface Science, Ltd., DM-701) every 200 reciprocating friction. The measurement results are summarized and shown in Table 1.

Figure 112016127253214-pct00001
Figure 112016127253214-pct00001

표 1 에 나타내는 바와 같이, 실시예 1, 2 의 방오제가 부착된 사파이어 유리 기판은, 800 왕복의 스틸울 마찰을 실시해도 물 접촉각은 90°이상이고, 초기로부터의 변화가 20°미만으로, 양호한 내찰상성이 얻어지는 것이 확인되었다.As shown in Table 1, the sapphire glass substrates with the antifouling agent of Examples 1 and 2 had a water contact angle of 90° or more even after 800 rounds of steel wool rubbing, and the change from the initial stage was less than 20°, which was good. It was confirmed that scratch resistance was obtained.

한편, 비교예 1, 2 의 방오제가 부착된 사파이어 유리 기판은, 800 왕복의 스틸울 마찰에 의해 물 접촉각이 90°미만이 되어, 20°이상 저하되었다.On the other hand, in the sapphire glass substrates with antifouling agent of Comparative Examples 1 and 2, the water contact angle became less than 90 degrees by 800 reciprocating steel wool friction, and it fell 20 degrees or more.

본 발명의 밀착 피막 형성제로부터 얻어지는 피막을 개재하여 형성된 기능성막으로서 방오성막을 갖는 산화알루미늄 기판은, 내찰상성이 우수하여, 시계의 커버 유리 (방풍), 카메라 렌즈의 커버 유리, 스마트폰이나 타블렛 등의 터치 패널 기판 등으로서 사용이 가능하다.An aluminum oxide substrate having an antifouling film as a functional film formed through a film obtained from the adhesion film forming agent of the present invention has excellent scratch resistance, so that the cover glass of a watch (windproof), the cover glass of a camera lens, a smartphone or tablet, etc. It can be used as a touch panel substrate of

또한, 2014년 5월 29일에 출원된 일본 특허 출원 2014-111610호의 명세서, 특허청구범위, 도면 및 요약서의 전체 내용을 여기에 인용하여, 본 발명의 명세서의 개시로서 받아들이는 것이다.In addition, the whole content of the specification of JP Patent application 2014-111610 for which it applied on May 29, 2014, a claim, drawing, and an abstract is referred here, and it takes in as an indication of the specification of this invention.

1 : 터치 패널용 커버 유리
2 : 기능성막
3 : 밀착 피막층
4 : 사파이어 유리 기판
1: Cover glass for touch panel
2: functional film
3: Adhesive film layer
4: Sapphire glass substrate

Claims (10)

알콕시실란의 가수분해·축합체와, 알루미늄염을 규소 원자의 전체 몰수 (Si) 와 알루미늄 원자의 몰수 (Al) 의 합계에 대한 알루미늄 원자의 몰비 (Al/(Si + Al)) 가 0.2 ∼ 0.4 가 되도록 함유하는 밀착 피막 형성제로부터 얻어지는 밀착 피막을 개재하여 기능성막이 형성된 산화알루미늄 또는 알루미늄 기판.The molar ratio (Al/(Si+Al)) of the hydrolysis/condensation product of the alkoxysilane and the aluminum salt to the sum of the total number of moles of silicon atoms (Si) and the number of moles of aluminum atoms (Al) is 0.2 to 0.4 An aluminum oxide or aluminum substrate on which a functional film is formed through an adhesion film obtained from an adhesion film forming agent contained so as to become 제 1 항에 있어서,
알콕시실란의 가수분해·축합체가, 하기 식 (I) 및 (II) 로 나타내는 알콕시실란으로 이루어지는 군에서 선택되는 적어도 1 종을 포함하는 알콕시실란의 가수분해·축합체인 산화알루미늄 또는 알루미늄 기판.
Si(OR1)4 (I)
R2 mSi(OR3)4-m (II)
상기 식 (I) 및 (II) 중, R1 및 R3 은 각각 독립적으로 탄소수 1 ∼ 5 의 알킬기를 나타내고, R2 는 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 및 시클로헥실기로 이루어지는 군에서 선택되는 적어도 1 종으로 치환되어 있어도 되고, 또한 헤테로 원자를 갖고 있어도 되는 탄소수 1 ∼ 20 의 탄화수소기, 수소 원자, 할로겐 원자, 비닐기, 메타크릴옥시기, 아크릴옥시기, 스티릴기, 페닐기, 시클로헥실기, 아미노기, 글리시독시기, 메르캅토기, 이소시아네이트기 또는 우레이드기를 나타낸다. m 은 1 ∼ 3 의 정수를 나타낸다.
The method of claim 1,
An aluminum oxide or aluminum substrate wherein the hydrolysis/condensation product of an alkoxysilane is a hydrolysis/condensation product of an alkoxysilane containing at least one selected from the group consisting of alkoxysilanes represented by the following formulas (I) and (II).
Si(OR 1 ) 4 (I)
R 2 m Si(OR 3 ) 4-m (II)
In the formulas (I) and (II), R 1 and R 3 each independently represent an alkyl group having 1 to 5 carbon atoms, R 2 is a halogen atom, a vinyl group, a methacryloxy group, an acryloxy group, a styryl group, A hydrocarbon group having 1 to 20 carbon atoms which may be substituted with at least one selected from the group consisting of a phenyl group and a cyclohexyl group and may have a hetero atom, a hydrogen atom, a halogen atom, a vinyl group, a methacryloxy group, an acryloxy group, a styryl group, a phenyl group, a cyclohexyl group, an amino group, a glycidoxy group, a mercapto group, an isocyanate group, or a ureide group. m represents the integer of 1-3.
제 1 항에 있어서,
상기 알루미늄염이, 염화알루미늄, 질산알루미늄, 황산알루미늄, 아세트산알루미늄, 옥살산알루미늄, 술팜산알루미늄, 술폰산알루미늄, 아세토아세트산알루미늄, 알루미늄아세틸아세토네이트 및 이것들의 염기성염으로 이루어지는 군에서 선택되는 적어도 1 종인 산화알루미늄 또는 알루미늄 기판.
The method of claim 1,
Oxidation wherein the aluminum salt is at least one selected from the group consisting of aluminum chloride, aluminum nitrate, aluminum sulfate, aluminum acetate, aluminum oxalate, aluminum sulfamate, aluminum sulfonate, aluminum acetoacetate, aluminum acetylacetonate, and basic salts thereof. aluminum or aluminum substrate.
제 1 항에 있어서,
상기 알루미늄염이 질산알루미늄염인 산화알루미늄 또는 알루미늄 기판.
The method of claim 1,
An aluminum oxide or aluminum substrate wherein the aluminum salt is an aluminum nitrate salt.
제 1 항에 있어서,
석출 방지제로서, N-메틸-피롤리돈, 에틸렌글리콜, 디메틸포름아미드, 디메틸아세트아미드, 디에틸렌글리콜, 프로필렌글리콜, 헥실렌글리콜 및 이들의 유도체로 이루어지는 군에서 선택되는 적어도 하나를 추가로 함유하는 산화알루미늄 또는 알루미늄 기판.
The method of claim 1,
As a precipitation inhibitor, it further contains at least one selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. aluminum oxide or aluminum substrate.
제 1 항에 있어서,
상기 산화알루미늄이 사파이어 유리인 산화알루미늄 또는 알루미늄 기판.
The method of claim 1,
An aluminum oxide or aluminum substrate wherein the aluminum oxide is sapphire glass.
제 1 항에 있어서,
상기 기능성 막이 불소계 화합물 또는 실리콘계 화합물의 막인 산화알루미늄 또는 알루미늄 기판.
The method of claim 1,
An aluminum oxide or aluminum substrate wherein the functional film is a film of a fluorine-based compound or a silicon-based compound.
제 1 항 내지 제 7 항 중 어느 한 항에 기재된 산화알루미늄 또는 알루미늄 기판으로 구성되고, 기능성 막이 방오제의 막인 터치 패널.A touch panel comprising the aluminum oxide or the aluminum substrate according to any one of claims 1 to 7, wherein the functional film is a film of an antifouling agent. 제 1 항 내지 제 7 항 중 어느 한 항에 기재된 산화알루미늄 또는 알루미늄 기판의 제조 방법으로서, 알콕시실란의 가수분해·축합체와 알루미늄염을, 규소 원자의 전체 몰수 (Si) 와 알루미늄 원자의 몰수 (Al) 의 합계에 대한 알루미늄 원자의 몰비 (Al/(Si + Al)) 가 0.2 ∼ 0.4 가 되도록 함유하는 밀착 피막 형성제를 산화알루미늄 또는 알루미늄 기판에 도포한 도막을, 100 ∼ 600 ℃ 에서 소성해 밀착 피막을 형성하고, 이어서, 상기 밀착 피막상에 기능성막을 형성하는, 산화알루미늄 또는 알루미늄 기판의 제조 방법.In the method for producing an aluminum oxide or aluminum substrate according to any one of claims 1 to 7, the hydrolysis/condensation product of alkoxysilane and an aluminum salt are mixed with the total number of moles of silicon atoms (Si) and the number of moles of aluminum atoms ( A coating film obtained by coating aluminum oxide or an aluminum substrate with an adhesion film forming agent containing a molar ratio (Al/(Si+Al)) of aluminum atoms to the total of Al) is 0.2 to 0.4, and baking at 100 to 600°C. A method for producing an aluminum oxide or aluminum substrate, comprising forming an adhesion film and then forming a functional film on the adhesion film. 삭제delete
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