KR102458845B9 - Plasma processing apparatus and method using the same - Google Patents
Plasma processing apparatus and method using the sameInfo
- Publication number
- KR102458845B9 KR102458845B9 KR1020220090217A KR20220090217A KR102458845B9 KR 102458845 B9 KR102458845 B9 KR 102458845B9 KR 1020220090217 A KR1020220090217 A KR 1020220090217A KR 20220090217 A KR20220090217 A KR 20220090217A KR 102458845 B9 KR102458845 B9 KR 102458845B9
- Authority
- KR
- South Korea
- Prior art keywords
- same
- processing apparatus
- plasma processing
- plasma
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020210124952 | 2021-09-17 | ||
| KR1020210124952 | 2021-09-17 | ||
| KR1020210124944 | 2021-09-17 | ||
| KR1020210124944 | 2021-09-17 | ||
| KR1020210186633A KR20230041559A (en) | 2021-09-17 | 2021-12-23 | Plasma processing apparatus and method using the same |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020210186633A Division KR20230041559A (en) | 2021-02-19 | 2021-12-23 | Plasma processing apparatus and method using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR102458845B1 KR102458845B1 (en) | 2022-10-26 |
| KR102458845B9 true KR102458845B9 (en) | 2024-10-21 |
Family
ID=83784417
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020220081313A Active KR102467406B1 (en) | 2021-09-17 | 2022-07-01 | Plasma processing apparatus and method using the same |
| KR1020220090217A Active KR102458845B1 (en) | 2021-09-17 | 2022-07-21 | Plasma processing apparatus and method using the same |
| KR1020220103794A Active KR102476398B1 (en) | 2021-09-17 | 2022-08-19 | Plasma processing apparatus and method using the same |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020220081313A Active KR102467406B1 (en) | 2021-09-17 | 2022-07-01 | Plasma processing apparatus and method using the same |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020220103794A Active KR102476398B1 (en) | 2021-09-17 | 2022-08-19 | Plasma processing apparatus and method using the same |
Country Status (1)
| Country | Link |
|---|---|
| KR (3) | KR102467406B1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240116224A (en) * | 2023-01-20 | 2024-07-29 | 주식회사 플라즈맵 | Plasma processing apparatus including jig |
| WO2024191109A1 (en) * | 2023-03-10 | 2024-09-19 | 주식회사 플라메디 | Apparatus for treating atmospheric plasma surface, and control method thereof |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000048999A (en) * | 1998-07-31 | 2000-02-18 | Kem Kk | Inspection for high-frequency power source and pressure guage in plasma processing |
| JP2002025443A (en) * | 2000-07-03 | 2002-01-25 | Aitekku:Kk | Manufacturing method and apparatus of plasma display panel |
| KR100467813B1 (en) * | 2002-05-02 | 2005-01-24 | 동부아남반도체 주식회사 | Apparatus of warming for unstriping of photoresist and method of manufacturing for semiconductor device using the same |
| JP4238015B2 (en) * | 2002-11-19 | 2009-03-11 | 大日本印刷株式会社 | Manufacturing method for plastic containers |
| JP2010050188A (en) * | 2008-08-20 | 2010-03-04 | Panasonic Corp | Plasma doping device |
| JP2011077321A (en) * | 2009-09-30 | 2011-04-14 | Tokyo Electron Ltd | Selective plasma nitriding method, and plasma nitriding device |
| KR101252767B1 (en) * | 2010-07-08 | 2013-04-11 | (주)에스이피 | A Method of surface treatment for dental implant |
| EP4019055A1 (en) * | 2015-05-11 | 2022-06-29 | Nova Plasma Ltd | Apparatus and method for handling an implant |
| KR101930617B1 (en) * | 2016-08-02 | 2018-12-18 | 주식회사 피글 | Implant processing apparatus |
| KR102762801B1 (en) * | 2020-03-04 | 2025-02-07 | 주식회사 플라즈맵 | Plasma processing apparatus And Method using the same |
| KR102267375B1 (en) * | 2020-05-07 | 2021-06-22 | 주식회사 플라즈맵 | Storage of implant |
| KR102245290B1 (en) * | 2020-07-10 | 2021-04-27 | 주식회사 플라즈맵 | Plasma processing apparatus And Method using the same |
-
2022
- 2022-07-01 KR KR1020220081313A patent/KR102467406B1/en active Active
- 2022-07-21 KR KR1020220090217A patent/KR102458845B1/en active Active
- 2022-08-19 KR KR1020220103794A patent/KR102476398B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR102458845B1 (en) | 2022-10-26 |
| KR102467406B9 (en) | 2025-02-12 |
| KR102476398B1 (en) | 2022-12-12 |
| KR102467406B1 (en) | 2022-11-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0107 | Divisional application |
Comment text: Divisional Application of Patent Patent event date: 20220721 Patent event code: PA01071R01D Filing date: 20211223 Application number text: 1020210186633 |
|
| PA0201 | Request for examination | ||
| PA0302 | Request for accelerated examination |
Patent event date: 20220721 Patent event code: PA03022R01D Comment text: Request for Accelerated Examination |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20221019 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20221020 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20221021 End annual number: 3 Start annual number: 1 |
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| PG1601 | Publication of registration | ||
| PZ0301 | Request for patent revocation |
Patent event date: 20230417 Comment text: Request for Patent Revocation Patent event code: PZ03011R01D Appeal kind category: Request for Patent Revocation Appeal identifier: 2023106000047 Request date: 20230417 |
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| Z031 | Request for patent cancellation [new post grant opposition system introduced on 1 march 2017] |
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Comment text: Written Transmittal of Certified Copy of Decision Patent event code: PZ07011R01D Patent event date: 20240930 |
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| PZ1301 | Decision on request for patent revocation |
Comment text: Decision on Revocation (Decision on Request for Revocation) Patent event code: PZ13011R01D Patent event date: 20240930 |
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| Z072 | Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301] | ||
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| PG1701 | Publication of correction |