KR102412772B1 - Substrate spinning apparatus - Google Patents

Abstract

The present invention relates to a substrate spinning apparatus, wherein the substrate spinning apparatus rotates while supporting a circular disk-shaped substrate, a fixed support part fixedly installed to support one edge of the substrate, and the other side of the edge of the substrate facing the fixed support part It supports but includes a movable support provided to be movable in a direction approaching and spaced apart from the substrate, and it is possible to adjust a grip position of the substrate by the movable support in response to the movement of the movable support with respect to the substrate, so that the The placement state can be maintained stably, and the grip pressure of the substrate can be adjusted uniformly.

Description

Substrate spinning apparatus {SUBSTRATE SPINNING APPARATUS}

The present invention relates to a substrate spinning apparatus, and more particularly, to a substrate spinning apparatus that accurately measures the number of rotations of a substrate while spin-rotating a circular disk-shaped substrate.

A semiconductor device is manufactured through many processes, such as a deposition process, a photo process, and an etching process, on a substrate such as a wafer. And, after performing the above process, a cleaning process is performed to remove foreign substances such as unnecessary thin films and particles remaining on the substrate.

In particular, since many foreign substances remain on the surface of the substrate after the chemical mechanical polishing process, a cleaning process of several steps is performed to remove the foreign substances.

For example, the substrate spinning apparatus 1 used in the brush cleaning apparatus for simultaneously contact cleaning the upper and lower surfaces of the circular disk-shaped substrate W with the cleaning brush 99 is as shown in FIGS. 1 and 2 . is composed That is, in the substrate spinning apparatus 1, when the circular disk-shaped substrate W is supplied, any one of the supports (not shown) for fixing the driving supports 10 and 20 of the pair A1 and A2 moves. Thus, in a state in which the substrate W is accommodated in the contact supports 15 and 25 of the driving supports 10 and 20, the contact support 15 is rotationally driven to horizontally rotate the substrate W.

Foreign substances remaining on the surface of the substrate W can be removed while supplying a cleaning solution and a chemical solution to the brush 99 that rotates and contacts the surface of the substrate while the substrate is horizontally rotated.

In general, the driving supports 10 and 20 of the substrate spinning apparatus 1 are formed of three or more, and some of the driving supports 10 and 20 are the driving supports 10 for rotationally driving the substrate W, and the remaining Another part may be provided as the idler support 20 for measuring the number of rotations of the substrate (W).

The driving support 10 is rotationally driven by the driving motor M as shown in FIG. 3 and is rotatably supported by bearings 12b on the upper and lower sides of the rotating shaft 12, and surrounding the periphery of the rotating shaft 12 . The hollow housing 13 and the contact support 15 coupled to the upper end of the rotation shaft 12 to support the substrate (W).

The contact support 15 is coupled to the rotation shaft 12 and rotates together with the rotation shaft 12 . 3 and 4, the contact support 15 may be divided into a plurality of supports 15a, 15b, and 15b, and may be coupled with connection bolts 77x, 78x, and 79x. In some cases, it is also possible for the contact support to be provided as a single body. The edge of the substrate W is maintained in contact with the contact support 15 , and as the contact support 15 is rotationally driven, the substrate W in contact with the contact support 15 is also rotationally driven.

As shown in FIG. 5, the idler support 20 also includes a rotary shaft 22 that is rotationally supported by bearings 22b on the upper and lower sides, a hollow housing 23 surrounding the circumference of the rotary shaft 22, and the rotary shaft ( 22) is coupled to the upper end and consists of a contact support 25 for supporting the substrate (W). And, instead of the drive motor being connected, a sensor (S) such as an encoder for detecting the number of rotations is connected to the rotation shaft 22 and installed to measure the rotation speed of the rotation shaft 22 rotating together with the idler contact support 25 . Thus, the number of rotations of the substrate W is sensed.

As described above, in the conventional spinning apparatus 1, since the substrate must rotate in contact with (grip) the driving support and the idler support, the contact state between the driving support and the idler support and the substrate must be stably maintained. .

However, there is a problem in that a specific support of the driving support 10 and the idler support 20 may not contact the substrate W due to processing and setting deviation. For example, when the specific driving support does not contact the substrate, it is difficult to stably rotate the substrate because the driving force by the specific driving support cannot be transmitted to the substrate. Since this cannot be done, there is a problem in that the cleaning amount of the substrate cannot be calculated.

In addition, when the grip pressure at which each support (driving support and idler support) grips the substrate W is non-uniform or a specific support cannot contact the substrate, each support (drive support and idler support) is substantially in the substrate Since there is a problem that the contact supports 15 and 25 made of a urethane material in contact with each are non-uniformly worn, there is a problem in that it is difficult to manage the replacement cycle of each contact support.

Furthermore, conventionally, depending on the outer diameter tolerance of the contact supports 15 and 25, the grip pressure at which each support (the driving support and the idler support) grips the substrate W may vary, and each support may apply a different grip pressure to the substrate. Since there is a problem that substrate rotation deviation may occur when gripping, high processing precision of the contact support is required.

Accordingly, in recent years, it is possible to stably maintain the grip state of the substrate by each support (driving support and idler support), and various studies have been made to freely adjust the grip pressure by each support, but it is still insufficient. development is required.

An object of the present invention is to provide a substrate spinning apparatus capable of stably maintaining a support state (grip state) of a substrate and capable of accurately controlling rotation conditions of a substrate.

In particular, it is an object of the present invention to provide a substrate spinning apparatus capable of adjusting a support position of a substrate by a movable support unit according to process conditions.

Another object of the present invention is to provide a substrate spinning apparatus capable of uniformly adjusting a supporting pressure of a substrate.

Another object of the present invention is to provide a substrate spinning apparatus capable of managing the replacement cycle of the contact body by using the wear amount of the contact body in contact with the substrate.

According to a preferred embodiment of the present invention for achieving the above-described objects of the present invention, a fixed support that is fixedly installed to support one side of the edge of the substrate, and the other side of the edge of the substrate facing the fixed support, but approach the substrate and Provided is a substrate spinning apparatus comprising a movable support provided movably in a spaced apart direction, and capable of adjusting a grip position of a substrate by the movable support in response to movement of the movable support with respect to the substrate. Through this configuration, by adjusting the support position of the substrate by the movable support unit according to process conditions such as processing and setting deviation, the substrate can be stably supported and the rotation conditions of the substrate can be more accurately controlled.

The fixed support part and the movable support part may be provided in various structures capable of supporting the edge of the substrate according to required conditions and design specifications. For example, the fixed support may include a first fixed support for supporting the edge of the substrate, and a second fixed support spaced apart from the first fixed support to support the other edge of the substrate, and the movable support may include a first fixed support. A first movable support facing the support and provided movably in a direction approaching and spaced from the substrate to support the edge of the substrate, and a second fixed support facing the substrate are provided movably in a direction approaching and spaced apart from the substrate It may include a second movable support for supporting the other edge of the. When the movable support part is composed of a plurality of supports, since it is possible to support the substrate at at least two points or more, the support stability of the substrate can be improved, and the support position between the supports constituting the movable support part can be adjusted.

For reference, in the present invention, that the fixed support part and the movable support part support the edge of the substrate may be understood as a state in which the edge of the substrate is in direct contact with and supported by the fixed support part and the movable support part.

In addition, in the present invention, when the movable support part supports the opposite side of the substrate to face the fixed support part, the support position of the substrate supported by the movable support part is arranged on the same horizontal line as the support position of the substrate supported by the fixed support part, or It may be understood as a concept including all cases of being disposed on another adjacent horizontal line.

In addition, the fixed support part and the movable support part may include a rotation shaft which is installed upright in the form of a column and rotates, and a contact body coupled to the tip of the rotation shaft to directly contact the edge of the substrate.

In addition, the use of each support (the first fixed support, the second fixed support, the first movable support and the second movable support) may be variously changed according to the required conditions and design specifications. For example, a portion of each support may be used as a driving support for rotationally driving the substrate, and the remaining part of each support may be used as an idler support that idles by rotation of the substrate.

The first movable support and the second movable support may be configured to move in a direction approaching and spaced apart from the substrate in various ways according to required conditions and design specifications. For example, the first movable support and the second movable support may be configured to move in a straight line using a conventional cylinder, solenoid, motor, etc., and to move in a direction approaching and spaced apart from the substrate. In some cases, it is also possible to configure the first movable support and the second movable support to move in a direction approaching and spaced apart from the substrate while rotating based on a point.

In addition, the first movable support and the second movable support may be configured to move simultaneously by a single driving source or to move individually by a separate driving source. In addition, the first movable support and the second movable support of the movable support may be configured to move in different directions or move to different moving distances along the same direction depending on process conditions such as processing and setting deviation. In the case of a method in which the first movable support and the second movable support move in different directions or move at different moving distances in the same direction, there is an effect that the support pressure of the substrate by each movable support can be uniformly adjusted. .

For example, the first movable support and the second movable support of the movable support may be provided to be movable in opposite directions by a single driving source. To this end, the movable support unit includes a pressing member providing a pressing force, and a connecting member rotatably hinged to the pressing member, one end rotatably connected to the first movable support and the other end rotatably connected to the second movable support. It may include, in response to rotation of the connection member with respect to the pressing member, the first movable support and the second movable support may move in opposite directions to each other. In some cases, it is also possible to configure the rotation of the connecting member with respect to the pressing member to be made elastically.

As another example, the first movable support and the second movable support of the movable support may be configured to move at different moving distances in the same direction as each other. To this end, the movable support part includes a pressing member providing a pressing force, a connection member connected to the pressing member, a first elastic connection part elastically connecting one end of the first movable support and the connection member, and a second movable support and a connecting member. It may include a second elastic connection part elastically connecting the other end, and the pressing force transmitted from the pressing member to the connection member is transmitted to the first movable support and the second movable support through the first elastic connection part and the second elastic connection part. And, the first movable support and the second movable support may be in elastic contact with the substrate.

The first and second elastic connectors may be provided in various structures according to required conditions and design specifications. For example, at least one of the first elastic connection part and the second elastic connection part is an extension part extending from the connection member, a guide rod connected to the first movable support body or the second movable support body through the extension part, and at the end of the guide rod It may include a closing member coupled to, and an elastic member provided on the guide rod to be disposed between the closing member and the extension, and the extension compresses the elastic member as a pressing force is applied to the connecting member, and the first movable support or The second movable support may be moved elastically. In addition, the closing member may be provided so as to be accessible and spaced apart from the support part on the guide rod, and by moving the finishing member on the guide rod, the distance between the support part and the finishing member is adjusted to adjust the distance between the support part and the closing member, so that the substrate by the first movable support or the second movable support. It is possible to adjust the support pressure of

In addition, the substrate spinning apparatus may include a measuring unit for measuring the moving distance of the movable support with respect to the substrate, and a wear amount calculating unit for calculating the wear amount of the contact body in response to the measurement result measured by the measuring unit, and replacement of the contact body It is possible to set the cycle. That is, without the inconvenience of visually checking and replacing the wear amount of each support body as in the past, the moving distance of the movable support to the substrate is measured, and the amount of wear of the contact is quantified through the moving distance of the movable support. Thus, there is an advantage that it is possible to set the replacement cycle of the contact body.

In addition, the support pressure of the substrate by the fixed support portion may be set higher than the support pressure of the substrate by the movable support portion. Such a structure induces the substrate to move in a predetermined predetermined direction according to the wear of the contact during the cleaning process, so that the wear of the contact can occur more regularly, so that the replacement cycle of the contact can be managed more efficiently. make it possible

According to another preferred embodiment of the present invention, a fixing support including a first fixing support for supporting the edge of the substrate, and a second fixing support for supporting the other edge of the substrate and spaced apart from the first fixing support, the first fixing The first movable support and the second fixed support facing the support and provided movably in a direction approaching and spaced apart from the substrate to support the edge of the substrate are provided to be movable in the direction approaching and spaced from the substrate to face the substrate. A movable support that includes a second movable support for supporting the other edge and is provided to selectively adjust a grip position of the substrate, a measurement for measuring the movement distance of the first movable support and the second movable support with respect to the substrate It provides a substrate spinning apparatus including a unit, and a wear amount calculating unit for calculating the wear amount of the first movable support and the second movable support in response to the measurement result measured by the measuring unit. Through this configuration, it is possible to adjust the support position of the substrate by the movable support part according to process conditions such as processing and setting deviation, and to set the replacement cycle of the contact body by quantifying the wear amount of the contact body through the movement distance of the movable support part. it is possible

Here, some of the first fixed support, the second fixed support, the first movable support, and the second movable support may be a driving support for rotationally driving the substrate, and the first fixed support, the second fixed support, and the first movable support and the remaining part of the second movable support may be an idler support that idles by rotation of the substrate.

In addition, the first fixed support, the second fixed support, the first movable support and the second movable support are respectively installed upright in the form of a column to rotate a rotation shaft, and a contact body coupled to the tip of the rotation shaft to contact the edge of the substrate and the wear amount calculating unit may calculate the wear amount of the contact body in response to the measurement result measured by the measuring unit.

The support pressure of the substrate by the fixed support may be set higher than the support pressure of the substrate by the movable support, and the first movable support and the second movable support may be provided movably in opposite directions or in the same direction as each other at the same time. .

As described above, according to the present invention, the support state (grip state) of the substrate can be stably maintained, and the rotation condition of the substrate can be precisely controlled.

In particular, according to the present invention, by adjusting the support position of the substrate by the movable support unit according to process conditions such as processing and setting deviation, the substrate can be stably supported and the rotation conditions of the substrate can be more accurately controlled. Accordingly, it is possible to prevent in advance the incomplete rotation phenomenon due to the failure of the driving support for rotationally driving the substrate to contact the substrate, and the rotation speed detection error due to the failure of the idler support for detecting rotation of the substrate not to contact the substrate. .

In addition, according to the present invention, it is possible to uniformly control the support pressure of the substrate by the movable support part by allowing the movable support part to move along the direction in which it approaches and moves with respect to the substrate. In particular, according to the present invention, by allowing the first and second movable supports constituting the movable support to move in different moving directions or different moving distances according to process conditions, the first movable support and the second movable support It is possible to uniformly control the support pressure of the substrate by the

In addition, according to the present invention, even if processing deviation occurs in the contact body to which the substrate is in contact, the support position by the movable support part can be adjusted in response to the processing deviation, so there is no need to process the contact body with high processing precision, and maintain Maintenance costs can be reduced.

Further, according to the present invention, by measuring the moving distance of the movable support and calculating the wear amount of the contact according to the moving distance of the movable support, it is possible to efficiently manage the replacement cycle of the contact. Moreover, according to the present invention, the wear amount of the contact body can be monitored in real time by measuring the moving distance of the movable support without the operator having to visually check the wear amount of the contact body daily, and the replacement period of the contact body can be reduced. It is possible to set

In addition, according to the present invention, since the wear of the contact body can be controlled at a uniform level by allowing the substrate to move in a predetermined predetermined direction according to the wear of the contact body during the cleaning process, the replacement cycle of the contact body can be more efficiently It is possible to manage

1 is a perspective view showing the configuration of a general substrate spinning apparatus;
2 is a plan view showing a state in which the substrate is seated in FIG. 1;
3 is a longitudinal cross-sectional view of the drive support taken along line III-III of FIG. 1;
4 is an enlarged view of part 'A' of FIG. 3;
5 is a longitudinal cross-sectional view of the sensing support of FIG. 1;
6 is a view for explaining a substrate spinning apparatus according to the present invention;
7 is a view for explaining a fixed support and a movable support as a substrate spinning apparatus according to the present invention;
8 to 11 are views for explaining another example of a substrate spinning apparatus according to the present invention, a movable support part;
12 is a cross-sectional view taken along line VII-VII of FIG. 6;
13 is a cross-sectional view taken along line VIII-VIII of FIG. 6 .

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited or limited by the embodiments. For reference, the same numbers in this description refer to substantially the same elements, and may be described by citing the contents described in other drawings under these rules, and the contents determined to be obvious to those skilled in the art or repeated may be omitted.

FIG. 6 is a view for explaining a substrate spinning apparatus according to the present invention, and FIG. 7 is a view for explaining a fixed support part and a movable support part as a substrate spinning apparatus according to the present invention. 8 to 11 are views for explaining another example of a movable support unit as a substrate spinning apparatus according to the present invention. Also, FIG. 12 is a cross-sectional view taken along line VII-VII of FIG. 6 , and FIG. 13 is a cross-sectional view taken along line VIII-VIII of FIG. 6 .

As shown in these figures, the substrate (W) spinning apparatus according to the present invention is an apparatus for spin-rotating a circular disk-shaped substrate (W), and includes a fixed support part 200 and a movable support part 300 .

The fixed support unit 200 is fixedly installed to support one edge of the substrate W. Here, that the fixing support 200 supports one edge of the substrate W may be understood as a state in which one edge of the substrate W is in direct contact with and supported by the fixing support 200 .

The fixed support 200 may be provided in various structures capable of supporting the edge of the substrate W according to required conditions and design specifications. For example, the fixed support 200 is a first fixed support 210 for supporting the edge of the substrate W, and is disposed to be spaced apart from the first fixed support 210 to support the other edge of the substrate W. It may be configured to include a second fixed support (220). In some cases, it is also possible for the fixed support to be configured by a single fixed support or to include three or more fixed supports.

The first fixed support 210 and the second fixed support 220 are coupled to the ends of the rotation shafts 212 and 222 that are installed upright in the form of a column and rotate, and the rotation shafts 212 and 222, so that the edge of the substrate W is in direct contact. It may be configured to include the contacts 214 and 224 that are.

For example, the contacts 214 and 224 may be divided into a plurality of contact supports, and may be coupled to a single body by a connection bolt. In some cases, it is possible that the contact body is provided with only one contact support, and the present invention is not limited or limited by the number and structure of the contact support.

For reference, the first fixed support 210 and the second fixed support 220 are used as a driving support for rotationally driving the substrate W, or an idler rotating idle by the rotation of the substrate W. It can be used as a support. Hereinafter, an example in which both the first fixed support 210 and the second fixed support 220 constituting the fixed support 200 are used as a driving support for rotationally driving the substrate W will be described. In some cases, any one of the first fixed support and the second fixed support may be used as the driving support and the other one may be used as the idle support. Alternatively, both the first fixed support and the second fixed support may be used as the idle support.

When the first fixed support 210 and the second fixed support 220 are used as the driving support, the rotation shafts 212 and 222 of the first fixed support 210 and the second fixed support 220 are respectively driven by a driving motor. It may be rotationally driven, and each contact body 214 , 224 may rotate together with a rotation shaft 212 , 222 . As each of the contacts 214 and 224 rotates, the substrate W supported in contact with each of the contacts 214 and 224 may rotate together.

The movable support part 300 supports the other side of the edge of the substrate (W) facing the fixed support part (200), but is provided movably in a direction approaching and spaced apart from the substrate (W), for the substrate (W). A grip position of the substrate W by the movable support 300 may be selectively adjusted in response to the movement of the movable support 300 .

The movable support unit 300 is provided to support the opposite side of the substrate W in a state where one side of the substrate W is supported by the fixed support unit 200, and approaches and spaced apart from the substrate W along the direction. It is configured to be able to adjust the support position of the substrate (W) by moving. Here, when the movable support part 300 supports the other edge of the substrate W, the other edge of the substrate W is in direct contact with and supported by the movable support part 300 .

For reference, in the present invention, supporting the opposite side of the substrate W so that the movable support 300 faces the fixed support 200 means that the support position of the substrate W supported by the movable support 300 is fixed. It includes all cases of being disposed on the same horizontal line as the supporting position of the substrate W supported by the support 200 or disposed on another adjacent horizontal line.

The movable support unit 300 may be provided in various structures capable of supporting the edge of the substrate W according to required conditions and design specifications. For example, the movable support unit 300 faces the first fixed support 210 and is provided movably in a direction approaching and spaced apart from the substrate W to support the edge of the substrate W ( 310), and a second movable support 320 facing the second fixed support 220 and provided movably in a direction approaching and spaced from the substrate W to support the edge of the substrate W can be configured. In some cases, it is also possible for the movable support to be configured to include three or more movable supports.

The first movable support 310 and the second movable support 320 may be configured to move in a direction approaching and spaced apart from the substrate W in various ways according to required conditions and design specifications. As an example, the first movable support 310 and the second movable support 320 move in a straight line using a conventional cylinder, solenoid, motor, etc. and can be configured to move in a direction approaching and spaced apart from the substrate W. have. In some cases, it is also possible to configure the first movable support and the second movable support to move in a direction approaching and spaced apart from the substrate W while rotating based on a point.

12 and 13, the first movable support 310 and the second movable support 320 are installed upright in the form of a column to rotate the rotation shafts 312 and 322, and the rotation shafts 312 and 322 are coupled to the front ends of the The edge of the substrate W may be configured to include contacts 314 and 324 that are in direct contact with each other.

For example, the contacts 314 and 324 of the first movable support 310 and the second movable support 320 may be divided into a plurality of contact supports 314a to 314c and 324a to 324c, and a connection bolt 77x , 78x, 79x) can be combined to form a single body. In some cases, it is possible that the contact body is provided with only one contact support, and the present invention is not limited or limited by the number and structure of the contact support.

For reference, the first movable support 310 and the second movable support 320 are used as a driving support for rotationally driving the substrate W, or an idler rotating idle by the rotation of the substrate W. It can be used as a support. For example, among the first movable support 310 and the second movable support 320 constituting the movable support unit 300 , the first movable support 310 is used as a driving support for rotationally driving the substrate W. Also, the second movable support 320 may be used as an idler support for idle rotation by the substrate W.

When the first movable support 310 is used as a driving support for rotationally driving the substrate W, the rotation shaft 312 of the first movable support 310 may be rotationally driven by a driving motor, respectively. The contact body 314 of the single movable support 310 may rotate together with the rotation shaft 312 . As the contact body 314 of the first movable support 310 rotates, the substrate W supported in contact with the contact body 314 may rotate together. When the second movable support 320 is used as an idler support, a sensor S such as an encoder for detecting the number of rotations is connected to the rotation shaft 312 instead of a driving motor connected to the second movable support 320 . Installed, it is possible to detect the number of rotations of the substrate (W) by measuring the number of rotations of the rotation shaft 312 that rotates together with the contact body of the second movable support 320 .

As such, in the present invention, since the movable support part 300 can selectively move in a direction to approach and spaced apart from the substrate W, the movable support part 300 (first movable support and second movable support) for processing and setting deviations, etc. In the case where some of them cannot support the substrate W, the movable support unit 300 moves with respect to the substrate W in a state where one edge of the substrate W is supported by the fixed support unit 200 to move the substrate W. ) by adjusting the support position, the movable support part 300 (the first movable support and the second movable support) can all support the substrate W.

In addition, the first movable support 310 and the second movable support 320 may be configured to move simultaneously by a single driving source. (See FIG. 7) In some cases, as shown in FIG. 8, the movable support 300 ) It is also possible to configure the first movable support 310 and the second movable support 320 to move individually by a separate driving source, respectively.

On the other hand, the first movable support 310 and the second movable support 320 of the movable support part 300 move in different directions depending on the degree of processing and setting deviation, or move to different moving distances along the same direction. can be configured.

For example, the first movable support 310 and the second movable support 320 of the movable support part 300 may be provided to be movable in opposite directions by a single driving source. In such a structure, the first movable support 310 and the second movable support 320 move in opposite directions depending on the degree of processing and setting deviation, etc. Allows the grip pressure to be uniformly adjusted. In some cases, it is also possible to configure the first movable support 310 and the second movable support 320 to move in opposite directions by different driving sources, respectively.

As an example of a method in which the first movable support 310 and the second movable support 320 move in opposite directions, referring to FIG. 9 , the movable support 300 is a pressing member 302 that provides a pressing force. and a connecting member 304 that is rotatably hinged to the pressing member 302 and has one end rotatably connected to the first movable support 310 and the other end rotatably connected to the second movable support 220 . may include, and in response to rotation of the connection member 304 for the pressing member 302 , the first movable support 310 and the second movable support 220 may move in opposite directions.

For example, when the second movable support 320 needs to support the substrate W at a position closer to the fixed support 200 than the first movable support 310, the connecting member 304 is a pressing member ( By rotating clockwise around the hinge coupling portion of 302), the second movable support 320 can move in a direction approaching the fixed support 200, and on the contrary, the first movable support 310 is the fixed support 200. It can move in a direction away from (a moving direction opposite to the moving direction of the second movable support 320).

In addition, an elastic member (not shown) that provides an elastic force so that the rotation of the connecting member 304 with respect to the pressing member 302 can be made elastically may be provided. A conventional spring may be used as the elastic member, and the present invention is not limited or limited by the type and characteristics of the elastic member. The elastic member enables the rotation of the connecting member 304 with respect to the pressing member 302 to be elastically made, so that the first movable support 310 and the second movable support 320 are mounted on the substrate W, respectively. allow sexual contact.

As another example, the first movable support 310 and the second movable support 320 of the movable support unit 300 may be configured to move at different moving distances along the same direction according to the degree of processing and setting deviation.

In such a structure, the first movable support 310 and the second movable support 320 move in the same direction according to the degree of processing and setting deviation, etc., but move at different moving distances. It allows the grip pressure by the two movable support 320 to be uniformly adjusted. In some cases, it is also possible to configure the first movable support 310 and the second movable support 320 to move at different moving distances along the same direction by different driving sources, respectively.

As an example of a method in which the first movable support 310 and the second movable support 320 move in the same direction as each other, referring to FIG. 10 , the movable support part 300 is the movable support part 300, the pressing force A pressing member 302 that provides It may include an elastic connection part 306, and a second elastic connection part 308 elastically connecting the second movable support 320 and the other end of the connection member 304', from the pressing member 302 to The pressing force transmitted to the connection member 304' may be transmitted to the first movable support 310 and the second movable support 320 through the first elastic connection part 306 and the second elastic connection part 308, and the The first movable support 310 and the second movable support 320 may elastically contact the substrate (W).

As the first elastic connection part 306 and the second elastic connection part 308 , a normal spring or an elastically compressible and recoverable member may be used, and the first elastic connection part 306 and the second elastic connection part 308 may be used. The type and characteristics may be variously changed according to required conditions and design specifications.

The first elastic connection part 306 and the second elastic connection part 308 are elastically deformed differently depending on the degree of processing and setting deviation, and the first movable support 310 and the second movable support 320 have different moving distances. make it moveable For example, when the second movable support 320 needs to support the substrate W at a position closer to the fixed support 200 than the first movable support 310 , the first elastic connection part 306 is the second elastic It may be compressed (L1 < L2) relatively more than the connection part 308 , and the second movable support 320 may move by a larger moving distance than the first movable support 310 .

As another example of the first elastic connection part 306 (or the second elastic connection part), referring to FIG. 11 , the first elastic connection part 306 (or the second elastic connection part) is the connection member 304' ) extending from the extension 304a, the guide rod 307a connected to the first movable support 310 (or the second movable support) through the extension 304a, and the end of the guide rod 307a It may include a closing member 307b coupled to, and an elastic member 307c provided on the guide rod 307a to be disposed between the closing member 307b and the extension portion 304a, and the connecting member As a pressing force is applied to the 304', the extension 304a compresses the elastic member 307c and may be configured to elastically move the first movable support 310 (or the second movable support).

In addition, the closing member 307b may be provided so as to be accessible and spaced apart from the support on the guide rod 307a, and between the support and the closing member 307b by moving the closing member 307b on the guide rod 307a. It is possible to adjust the support pressure of the substrate W by the first movable support 310 or the second movable support 320 by adjusting the distance. A normal nut may be used as the closing member 307b. In some cases, it is possible to use another member that can move on the guide rod and maintain the arrangement state as a finishing member.

Meanwhile, as described above, the fixed support 200 and the movable support 300 include rotation shafts 212,222,312,322 and contactors 214,224,314,324, and the contactors 214,224,314,324 that are in direct contact with the substrate W are the substrate ( W) may be formed of an elastically deformable material such as urethane to elastically maintain a contact state.

In addition, since the contacts 214 , 224 , 314 , and 324 are consumable parts that are worn as they rotate while in direct contact with the substrate W, they should be replaceable after a certain period of use. However, since it is difficult to measure the wear amount of the contact body for each support in the prior art, the operator has to visually check the wear amount of the contact body for each support body and replace them.

Therefore, the present invention measures the movement distance of the movable support unit 300 with respect to the substrate W, and calculates the amount of wear of the contact bodies 214, 224, 314, 324 according to the movement distance of the movable support unit 300. It is possible to set the replacement cycle.

To this end, the substrate (W) spinning apparatus includes a measuring unit 400 for measuring the moving distance of the movable support unit 300 with respect to the substrate W, and a contact body corresponding to the measurement result measured by the measuring unit 400 . It may include a wear amount calculation unit 500 for calculating the wear amount of (214,224,314,324).

As the measuring unit 400 , a conventional sensor or measuring means capable of measuring the moving distance of the movable support unit 300 may be used, and the wear amount calculating unit 500 is contacted according to the moving distance of the movable support unit 300 . The amount of wear of the sieves 214 , 224 , 314 and 324 can be calculated and quantified. That is, when the amount of wear of the contacts 214, 224, 314, and 324 is increased by the repetitive process, the movement distance of the movable support 300 may increase by the increase in the amount of wear of the contacts 214, 224, 314, 324. Therefore, the movement of the movable support 300 It is possible to calculate the amount of wear of the contacts 214 , 224 , 314 , 324 through the distance.

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As described above, although described with reference to preferred embodiments of the present invention, those skilled in the art can variously modify and modify the present invention within the scope without departing from the spirit and scope of the present invention as set forth in the following claims. You will understand that it can be changed.

200: fixed support 210: first fixed support
220: second fixed support 300: movable support
310: first movable support 320: second movable support
400: measurement unit 500: wear amount calculation unit

Claims (20)

A substrate spinning apparatus for rotating while supporting a circular disk-shaped substrate, the substrate spinning apparatus comprising:
a fixing support part including a first fixing support for supporting the edge of the substrate and being fixedly installed to support one side of the edge of the substrate; and
A first movable support and a second movable support provided movably in a direction approaching and spaced apart from the substrate to support an edge of the substrate, a pressing member providing a pressing force, and a connecting member connected to the pressing member; a first elastic connection part elastically connecting the first movable support and one end of the connection member; and a second elastic connection part elastically connecting the second movable support and the other end of the connection member; a movable support part for supporting the other side of the edge of the substrate facing the support part;
Including, the pressing force transmitted from the pressing member to the connection member is transmitted to the first movable support and the second movable support through the first elastic connection part and the second elastic connection part, the first movable support and The second movable support is in elastic contact with the substrate so that a grip position of the substrate by the movable support is adjusted.
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The substrate spinning apparatus according to claim 1, wherein the first movable support and the second movable support are provided to be movable at different moving distances in the same direction.

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