KR102405876B1 - 내오염성 및 심미적 효과가 우수한 장식재 및 이의 제조방법 - Google Patents
내오염성 및 심미적 효과가 우수한 장식재 및 이의 제조방법 Download PDFInfo
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Abstract
Description
도 2는 실시예 2에서 제조된 코팅층의 제2 영역을 주사전자현미경(SEM)으로 촬영한 이미지이다.
도 3은 본 발명에 따른 장식재의 단면 구조를 도시한 단면도이다.
도 4는 코팅층의 제2 영역을 주사전자현미경(SEM)으로 촬영한 이미지와 제2 영역의 단면 구조를 도시한 단면도이다.
도 5는 비교예 3에서 제조된 코팅층의 제2 영역을 주사전자현미경(SEM)으로 촬영한 이미지이다.
광량 | 평균 두께 | ||||
전체 코팅층 | 제1 영역 | 제2 영역 | 제3 영역 | ||
실시예 1 | 10±1 mJ/㎠ | 12~16㎛ | 30~35㎛ | 12~16㎛ | 8~12㎛ |
실시예 2 | 7±1 mJ/㎠ | 12~16㎛ | 30~35㎛ | 12~16㎛ | 8~12㎛ |
표면조도 (Rz) | 평균 광택도 | 내오염성 | 논슬립성 | |
실시예 1 | 20±0.1㎛ | 3.5±0.01 | 5 등급 | R11 |
실시예2 | 16±0.1㎛ | 4.1±0.01 | 5 등급 | R10 |
비교예 1 | 12±0.1㎛ | 8.5±0.01 | 5 등급 | R9 |
비교예 2 | 20±0.1㎛ | 4.1±0.01 | 5 등급 | R10 |
비교예3 | 16±0.1㎛ | 3.5±0.01 | 5 등급 | R10 |
111: 홈
120: 기재층
210: 코팅층
220: 기재층
211: 덴드라이트
a: 제1 영역
b: 제2 영역
c: 제3 영역
Claims (15)
- 기재층과 코팅층을 포함하고;
상기 코팅층은,
표면에 점 형상의 요철 구조를 갖는 제1 영역,
표면에 한 점을 중심부로 하고 상기 중심부에서 주변부로 뻗어나가는 방사형 굴곡 구조를 갖는 제2 영역, 및
제1 영역과 제2 영역 사이에 위치하고, 표면에 제1 영역과 접하는 면의 길이 방향에 대하여 70˚ 내지 110˚로 배향된 주름 구조를 갖는 제3 영역을 포함하고,
방사형 굴곡 구조의 평균 직경은 5㎛ 내지 500㎛인 장식재.
- 제1항에 있어서,
코팅층은 단위 면적(1m X 1m) 중에서,
0.1 내지 5.0 면적%의 제1 영역,
90 내지 99.8 면적%의 제2 영역, 및
0.1 내지 5.0 면적%의 제3 영역을 포함하는 장식재.
- 제1항에 있어서,
코팅층의 평균 두께는 50㎛ 이하이고, 하기 식 1의 조건을 만족(단, DR2=DR3=DR1인 경우는 제외)하는 장식재:
[식 1] DR3≤DR2≤DR1
식 1에서,
DR1은 제1 영역의 평균 두께이고,
DR2는 제2 영역의 평균 두께이며,
DR3은 제3 영역의 평균 두께이다.
- 제1항에 있어서,
제2 영역의 표면 조도(Rz)는 평균 10㎛ 내지 30㎛인 장식재.
- 제1항에 있어서,
방사형 굴곡 구조는 표면의 단위 면적 (1㎜ X 1㎜)당 20 내지 400개 존재하는 장식재.
- 삭제
- 기재층 상에 도포된 아크릴 수지 조성물에 자외선을 조사하여, 표면에 점 형상의 요철 구조를 갖는 제1 영역; 표면에 한 점을 중심부로 하고 상기 중심부에서 주변부로 뻗어나가는 방사형 굴곡 구조인 덴드라이트 구조를 갖는 제2 영역; 및 제1 영역과 제2 영역 사이에 위치하고, 표면에 제1 영역과 접하는 면의 길이 방향에 대하여 70˚ 내지 110˚로 배향된 주름 구조를 갖는 제3 영역을 포함하는 코팅층을 형성하는 단계를 포함하고,
방사형 굴곡 구조의 평균 직경은 5㎛ 내지 500㎛인 장식재의 제조방법.
- 제7항에 있어서,
기재층은 아크릴 수지 조성물이 도포되는 면에 평균 깊이가 5 ㎛ 내지 200 ㎛이고, 평균 너비가 2 ㎛ 내지 100 ㎛인 홈을 포함하는 장식재의 제조방법.
- 제7항에 있어서,
광 조사 단계는,
기재층 상에 도포된 아크릴 수지 조성물에, 불활성 기체 조건 하에서 250㎚ 이하 파장의 광을 조사하여 상기 조성물을 활성화시키는 제1 광 조사 단계;
활성화된 조성물에, 공기(air) 조건 하에서 250㎚ 내지 400㎚ 파장의 광을 조사하여 조성물을 1차 경화하여 코팅층을 형성하는 제2 광 조사 단계; 및
1차 경화된 조성물에, 불활성 기체 조건 하에서 200㎚ 내지 400㎚ 파장의 광을 조사하여 조성물을 2차 광 경화시켜 코팅층을 형성하는 제3 광 조사 단계를 포함하는 장식재의 제조방법.
- 제9항에 있어서,
제1 광 조사 단계는 1 mJ/㎠ 내지 100 mJ/㎠의 광 조사량으로 수행되는 것을 특징으로 하는 장식재의 제조방법.
- 제9항에 있어서,
제1 광 단계는, 산소(O2)의 농도가 10 ppm 내지 30,000 ppm인 질소(N2) 조건 하에서 수행되는 것을 특징으로 하는 장식재의 제조방법.
- 제7항에 있어서,
아크릴 수지 조성물은,
우레탄(메트)아크릴계 올리고머 100 중량부;
친수성 관능기를 갖는 아크릴계 모노머 30 내지 90 중량부; 및
다관능성 아크릴계 모노머 50 내지 150 중량부를 포함하는 장식재의 제조방법.
- 제7항에 있어서,
아크릴 수지 조성물은 실리카, 알루미나, 글래스 비드 및 유기물 비드로 이루어진 군으로부터 선택되는 1종 이상의 필러를 더 포함하는 장식재의 제조방법.
- 제13항에 있어서,
필러의 함량은 아크릴 수지 조성물 100 중량부에 대하여 15 중량부 이하인 장식재의 제조방법.
- 제7항에 있어서,
아크릴 수지 조성물의 점도는 500 cps 이하인 장식재의 제조방법.
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