KR102363820B1 - Silsesquioxane composite polymer and method for manufacturing thereof - Google Patents
Silsesquioxane composite polymer and method for manufacturing thereof Download PDFInfo
- Publication number
- KR102363820B1 KR102363820B1 KR1020150028252A KR20150028252A KR102363820B1 KR 102363820 B1 KR102363820 B1 KR 102363820B1 KR 1020150028252 A KR1020150028252 A KR 1020150028252A KR 20150028252 A KR20150028252 A KR 20150028252A KR 102363820 B1 KR102363820 B1 KR 102363820B1
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- South Korea
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- methyl
- phenyl
- composite polymer
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- 229920000642 polymer Polymers 0.000 title claims abstract description 103
- 239000002131 composite material Substances 0.000 title claims abstract description 67
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- -1 (meth)acryl group Chemical group 0.000 claims description 171
- 239000003054 catalyst Substances 0.000 claims description 70
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 51
- 239000008199 coating composition Substances 0.000 claims description 37
- 238000006243 chemical reaction Methods 0.000 claims description 32
- 125000003700 epoxy group Chemical group 0.000 claims description 27
- 238000003756 stirring Methods 0.000 claims description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
- 125000003277 amino group Chemical group 0.000 claims description 19
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 18
- 239000003960 organic solvent Substances 0.000 claims description 18
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 18
- 238000002156 mixing Methods 0.000 claims description 17
- 229910052736 halogen Inorganic materials 0.000 claims description 15
- 150000002367 halogens Chemical class 0.000 claims description 15
- 125000002560 nitrile group Chemical group 0.000 claims description 15
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 15
- 239000003377 acid catalyst Substances 0.000 claims description 14
- 239000003999 initiator Substances 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 229910000077 silane Inorganic materials 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 11
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 9
- 230000002378 acidificating effect Effects 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 238000006482 condensation reaction Methods 0.000 claims description 9
- 229910052805 deuterium Inorganic materials 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 7
- 238000001953 recrystallisation Methods 0.000 claims description 7
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 claims description 6
- 125000002910 aryl thiol group Chemical group 0.000 claims description 6
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 125000001072 heteroaryl group Chemical group 0.000 claims description 6
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 3
- 239000004014 plasticizer Substances 0.000 claims description 2
- 230000000475 sunscreen effect Effects 0.000 claims description 2
- 239000000516 sunscreening agent Substances 0.000 claims description 2
- 230000000704 physical effect Effects 0.000 abstract description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 206
- 101100192865 Drosophila melanogaster GlyP gene Proteins 0.000 description 106
- LTPSRQRIPCVMKQ-UHFFFAOYSA-N 2-amino-5-methylbenzenesulfonic acid Chemical compound CC1=CC=C(N)C(S(O)(=O)=O)=C1 LTPSRQRIPCVMKQ-UHFFFAOYSA-N 0.000 description 51
- 102100027370 Parathymosin Human genes 0.000 description 51
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 51
- 150000001356 alkyl thiols Chemical class 0.000 description 28
- 238000000576 coating method Methods 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 27
- 125000003944 tolyl group Chemical group 0.000 description 22
- 239000000243 solution Substances 0.000 description 20
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 239000000178 monomer Substances 0.000 description 13
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 12
- 239000004205 dimethyl polysiloxane Substances 0.000 description 12
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 11
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 11
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 11
- 229920002554 vinyl polymer Polymers 0.000 description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- 229920000728 polyester Polymers 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical group [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 239000004721 Polyphenylene oxide Substances 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 229920000570 polyether Polymers 0.000 description 7
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- 239000002904 solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
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- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- RIYCDEZLYPQMJX-UHFFFAOYSA-N [methoxy(diphenyl)silyl] trimethyl silicate Chemical compound C=1C=CC=CC=1[Si](OC)(O[Si](OC)(OC)OC)C1=CC=CC=C1 RIYCDEZLYPQMJX-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 125000005395 methacrylic acid group Chemical group 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 4
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
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- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
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- 230000005494 condensation Effects 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 4
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 4
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- DUMWHCLFZJQIGA-UHFFFAOYSA-N [methoxy(dimethyl)silyl] trimethyl silicate Chemical compound CO[Si](C)(C)O[Si](OC)(OC)OC DUMWHCLFZJQIGA-UHFFFAOYSA-N 0.000 description 3
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
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- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
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- 238000007865 diluting Methods 0.000 description 1
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- 238000003618 dip coating Methods 0.000 description 1
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 1
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- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
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- JHYNXXDQQHTCHJ-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 JHYNXXDQQHTCHJ-UHFFFAOYSA-M 0.000 description 1
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- 238000002474 experimental method Methods 0.000 description 1
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- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
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- 239000012535 impurity Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
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- YFYSUAZHCKSLCV-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxobutan-2-yl)diazenyl]-2-methylbutanoate Chemical compound COC(=O)C(C)(CC)N=NC(C)(CC)C(=O)OC YFYSUAZHCKSLCV-UHFFFAOYSA-N 0.000 description 1
- LSEFCHWGJNHZNT-UHFFFAOYSA-M methyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 LSEFCHWGJNHZNT-UHFFFAOYSA-M 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
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- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
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- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
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- 230000001681 protective effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
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- 229920005989 resin Polymers 0.000 description 1
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- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- HJBZFPLBRXFZNE-UHFFFAOYSA-M tetrabutylphosphanium fluoride hydrofluoride Chemical compound F.[F-].CCCC[P+](CCCC)(CCCC)CCCC HJBZFPLBRXFZNE-UHFFFAOYSA-M 0.000 description 1
- GFZMLBWMGBLIDI-UHFFFAOYSA-M tetrabutylphosphanium;acetate Chemical compound CC([O-])=O.CCCC[P+](CCCC)(CCCC)CCCC GFZMLBWMGBLIDI-UHFFFAOYSA-M 0.000 description 1
- DFQPZDGUFQJANM-UHFFFAOYSA-M tetrabutylphosphanium;hydroxide Chemical compound [OH-].CCCC[P+](CCCC)(CCCC)CCCC DFQPZDGUFQJANM-UHFFFAOYSA-M 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- CHUAQURBBLLEGO-UHFFFAOYSA-N trimethyl propan-2-yl silicate Chemical compound CO[Si](OC)(OC)OC(C)C CHUAQURBBLLEGO-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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Abstract
본 발명은 실세스퀴옥산 복합 고분자 및 이의 제조방법에 관한 것으로, 더욱 상세하게는 하나의 고분자 내에 특정 구조의 선형 실세스퀴옥산 사슬 및 케이지형 실세스퀴옥산을 포함하여 가공성 및 물리적 특성을 극대화한 실세스퀴옥산 복합 고분자에 관한 것이다.The present invention relates to a silsesquioxane composite polymer and a method for manufacturing the same, and more particularly, to include a linear silsesquioxane chain of a specific structure and a cage-type silsesquioxane in one polymer to maximize processability and physical properties It relates to a silsesquioxane composite polymer.
Description
본 발명은 실세스퀴옥산 복합 고분자 및 이의 제조방법에 관한 것으로, 더욱 상세하게는 하나의 실세스퀴옥산 고분자 내에 다양한 실세스퀴옥산 구조체를 도입하여 가공성 및 물리적 특성을 극대화한 실세스퀴옥산 복합 고분자에 관한 것이다.
The present invention relates to a silsesquioxane composite polymer and a method for manufacturing the same, and more particularly, to a silsesquioxane composite that maximizes processability and physical properties by introducing various silsesquioxane structures into one silsesquioxane polymer It is about polymers.
실세스퀴옥산은 다양한 분야에 여러 가지 용도로 사용되고 있다. 특히, 가공성을 향상시키고 기계적 물리적 특성을 극대화 시키고자 여러 시도들이 있어 왔으며, 현재까지 연구개발이 지속되고 있다. 하지만, 지금까지 개발된 실세스퀴옥산 고분자들은 가공성, 기계적 물리적 특성을 동시에 만족시키기는 여전히 부족하였다.Silsesquioxane has been used for various purposes in various fields. In particular, several attempts have been made to improve processability and maximize mechanical and physical properties, and R&D continues to this day. However, the silsesquioxane polymers developed so far are still insufficient to simultaneously satisfy processability and mechanical and physical properties.
예를 들어, 케이지형(cage) 실세스퀴옥산은 실록산 결합이 발현할 수 있는 물리적 특성을 보여주어 다양한 방면에 응용되고 있지만, 그 자체가 결정형 구조로, 용액 가공시 용해성에 한계가 있으며, 케이지형 구조를 응용한 결과물 자체에서 재결정 현상 등 분자단위의 재편성이 발생되어, 성능의 재현성이 보장되지 않는 문제가 발생된다. 다른 대표적 구조로, 선형(ladder) 실세스퀴옥산은 용액 가공성이 우수하고, 케이지형 구조의 단점을 보완해 줄 수 있는 구조이나, 물리적 특성이 결정형 구조인 케이지형 구조에는 미치지 못하는 단점이 있다. 또한 랜덤(random) 형의 실세스퀴옥산은 자유로운 형태로 중합이 이루어지기 때문에 고분자 내에 불안정하게 존재하는 Si-OH, Si-alkoxy 등을 이용하여 겔(gel)화시켜 응용하여야 하는 한계와 재현성을 담보하기 어려운 문제가 있다. For example, cage-type silsesquioxane shows physical properties that can be expressed by siloxane bonds and is applied in various fields. Reorganization of the molecular unit such as recrystallization occurs in the result of applying the topographical structure itself, resulting in a problem that the reproducibility of the performance is not guaranteed. As another representative structure, the linear (ladder) silsesquioxane has excellent solution processability and has a structure that can compensate for the shortcomings of the cage-type structure, but has a disadvantage in that the physical properties do not reach the cage-type structure, which is a crystalline structure. In addition, because random type silsesquioxane is polymerized in a free form, it is necessary to gel it using Si-OH, Si-alkoxy, etc., which are unstable in the polymer, and apply the limitations and reproducibility. There are problems that are difficult to guarantee.
이러한 실세스퀴옥산의 구조체는 산업계의 요구사항에 맞추어 특정 구조로 제어하고자 하는 시도들이 이어져 왔다. 일예로, 미국특허공개 제US2011-0201827에서는 전구체로 실란 커플링제를 사용하여 다면체 실세스퀴옥산을 제어하고 독특한 장점을 이끌어내려 시도하였지만, 이 또한 단일 선형에 케이지형을 연결하여 치환체로만 사용한 예로 실제 물리적 특성의 향상을 크게 도모하지는 못하였다.Attempts have been made to control the structure of this silsesquioxane to a specific structure in accordance with the requirements of the industry. For example, US Patent Publication No. US2011-0201827 uses a silane coupling agent as a precursor to control polyhedral silsesquioxane and to derive unique advantages, but this is also an example of using only a substituent by connecting a cage type to a single linear. The improvement of the physical properties could not be greatly improved.
따라서 본 발명자들은 상기와 같은 실세스퀴옥산의 단점을 보완하고, 장점을 극대화 시키고자 연구한 결과, 특정구조의 고분자구조를 설계하고, 측쇄에 도입된 유기관능기를 이용해 손쉬운 경화공정을 도입하도록 유도한 결과, 우수한 물리적 특성이 오랜 시간 지속될 수 있고, 주 소재, 첨가소재, 코팅소재 등 다양한 산업방면에 이용될 수 있음을 확인하여 본 발명을 완성하였다.
Therefore, the present inventors have studied to supplement the disadvantages of silsesquioxane as described above and to maximize the advantages. As a result, the polymer structure of a specific structure was designed and an easy curing process was introduced using the organic functional group introduced in the side chain. As a result, the present invention was completed by confirming that excellent physical properties can be maintained for a long time and can be used in various industrial fields such as main material, additive material, and coating material.
상기와 같은 문제점을 해결하기 위해, 본 발명은 하나의 고분자 내에 특정 구조의 선형 실세스퀴옥산 사슬 및 케이지형 실세스퀴옥산을 포함하여 가공성 및 물리적 특성을 극대화한 실세스퀴옥산 복합 고분자를 제공하는 것을 목적으로 한다.In order to solve the above problems, the present invention provides a silsesquioxane composite polymer that maximizes processability and physical properties by including a linear silsesquioxane chain of a specific structure and a cage-type silsesquioxane in one polymer aim to do
또한 본 발명은 상기 실세스퀴옥산 복합 고분자의 제조방법을 제공하는 것을 목적으로 한다.Another object of the present invention is to provide a method for preparing the silsesquioxane composite polymer.
또한 본 발명은 상기 실세스퀴옥산 복합 고분자를 포함하는 실세스퀴옥산 코팅 조성물을 제공하는 것을 목적으로 한다.
Another object of the present invention is to provide a silsesquioxane coating composition comprising the silsesquioxane composite polymer.
상기 목적을 달성하기 위해 본 발명은 하기 화학식 1 내지 3 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자를 제공한다:In order to achieve the above object, the present invention provides a silsesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 3:
[화학식 1][Formula 1]
[화학식 2][Formula 2]
[화학식 3][Formula 3]
상기 화학식 1 내지 3에서,In Formulas 1 to 3,
A는 이고, D는 이고, E는 이며,A is and D is and E is is,
Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
X는 각각 독립적으로 R10 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,each X is independently R 10 or [(SiO 3/2 R) 4+2n R], at least one is [(SiO 3/2 R) 4+2n R],
R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며, 바람직하기로는 중수소, 할로겐, 아민기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기 또는 사이클로헥실 에폭시기로 치환되거나 치환되지 않은 C1~C40의 알킬기, C2~C40의 알케닐기, 아민기, 에폭시기, 사이클로헥실 에폭시기, (메타)아크릴기, 사이올기, 페닐기 또는 이소시아네이트기이며,R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group, preferably deuterium, halogen, amine group, (meth) acryl group, thiol group, isocyanate Group, nitrile group, nitro group, phenyl group, or unsubstituted C 1 ~ C 40 alkyl group, C 2 ~ C 40 alkenyl group, amine group, epoxy group, cyclohexyl epoxy group, (meth) acrylic group substituted or unsubstituted with a phenyl group or a cyclohexyl epoxy group , a thiol group, a phenyl group or an isocyanate group,
a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고, 바람직하기로는 a는 3 내지 1000이고, d는 1 내지 500이며, 더욱 바람직하기로는 a는 5 내지 300이고, d는 2 내지 100이며,a and d are each independently an integer from 1 to 100,000, preferably a is from 3 to 1000, d is from 1 to 500, more preferably a is from 5 to 300, and d is from 2 to 100,
e는 1 또는 2이며, 바람직하기로 1이며,e is 1 or 2, preferably 1,
n은 각각 독립적으로 1 내지 20의 정수이며, 바람직하기로는 3 내지 10이다.
n is each independently an integer of 1 to 20, preferably 3 to 10.
또한 본 발명은 반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계를 포함하는 것을 특징으로 하는 화학식 1로 표시되는 실세스퀴옥산 복합고분자의 제조방법을 제공한다:In addition, the present invention is a first step of preparing the following formula (4) by mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; and a third step of carrying out a condensation reaction by converting the reaction solution to basic by adding a basic catalyst to the reactor after the second step. to provide:
[화학식 4][Formula 4]
상기에서 R1, R2, R6, a 및 d는 화학식 1 내지 3에서 정의한 바와 같다.In the above, R 1 , R 2 , R 6 , a and d are as defined in Formulas 1 to 3.
또한 본 발명은 반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 및 구조를 화학식 2와 같이 도입하기 위하여 유기실란 화합물을 첨가하고, 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 교반하는 제2단계; 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 제3단계 이후 재결정과 필터과정을 통하여, 단독 cage 생성 구조를 제거하는 제4단계를 포함하는 것을 특징으로 하는 화학식 2로 표시되는 실세스퀴옥산 복합고분자의 제조방법을 제공한다.In addition, the present invention is a first step of preparing the following formula (4) by mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing; and in Formula 4 after the first step and a second step of adding an organosilane compound to introduce the structure as shown in Chemical Formula 2, adjusting the reaction solution to acidity by adding an acid catalyst to the reactor, and then stirring; a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; and a fourth step of removing the single cage-forming structure through recrystallization and filtering after the third step.
또한 본 발명은 반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 상기 제3단계 이후에 복합고분자의 말단에 구조를 도입하여 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 제4단계를 포함하는 것을 특징으로 하는 화학식 3으로 표시되는 실세스퀴옥산 복합고분자의 제조방법을 제공한다.In addition, the present invention is a first step of preparing the following formula (4) by mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; and at the end of the composite polymer after the third step. In order to introduce the structure, an acid catalyst is introduced into the reactor to convert the reaction solution into an acidic atmosphere, and a fourth step of mixing and stirring an organosilane compound. A manufacturing method is provided.
또한 본 발명은 상기 실세스퀴옥산 복합 고분자를 포함하는 실세스퀴옥산 코팅 조성물을 제공한다.
The present invention also provides a silsesquioxane coating composition comprising the silsesquioxane composite polymer.
본 발명에 따른 실세스퀴옥산 복합 고분자는 선형 실세스퀴옥산의 가공용이성과 케이지형 실세스퀴옥산의 우수한 물리적 특성을 동시에 가짐으로써 코팅용액으로 제조시 간단한 경화공정을 통하여 뛰어난 물리적 특성, 광학특성, 내열특성 등을 다양한 소재에 부여할 수 있다.
The silsesquioxane composite polymer according to the present invention has both the processing ease of linear silsesquioxane and the excellent physical properties of cage-type silsesquioxane at the same time. , heat resistance, etc. can be imparted to various materials.
이하 본 발명을 상세히 설명한다.
Hereinafter, the present invention will be described in detail.
본 발명은 하기 화학식 1 내지 3 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자를 제공한다:The present invention provides a silsesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 3:
[화학식 1][Formula 1]
[화학식 2][Formula 2]
[화학식 3][Formula 3]
상기 화학식 1 내지 3에서,In Formulas 1 to 3,
A는 이고, D는 이고, E는 이며,A is and D is and E is is,
Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며, Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
X는 각각 독립적으로 R10 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,each X is independently R 10 or [(SiO 3/2 R) 4+2n R], at least one is [(SiO 3/2 R) 4+2n R],
R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며, 바람직하기로는 중수소, 할로겐, 아민기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기 또는 사이클로헥실 에폭시기로 치환되거나 치환되지 않은 C1~C40의 알킬기, C2~C40의 알케닐기, 아민기, 에폭시기, 사이클로헥실 에폭시기, (메타)아크릴기, 사이올기, 페닐기 또는 이소시아네이트기이며,R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group, preferably deuterium, halogen, amine group, (meth) acryl group, thiol group, isocyanate Group, nitrile group, nitro group, phenyl group, or unsubstituted C 1 ~ C 40 alkyl group, C 2 ~ C 40 alkenyl group, amine group, epoxy group, cyclohexyl epoxy group, (meth) acrylic group substituted or unsubstituted with a phenyl group or a cyclohexyl epoxy group , a thiol group, a phenyl group or an isocyanate group,
a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고, 바람직하기로는 a는 3 내지 1000이고, d는 1 내지 500이며, 더욱 바람직하기로는 a는 5 내지 300이고, d는 2 내지 100이며,a and d are each independently an integer from 1 to 100,000, preferably a is from 3 to 1000, d is from 1 to 500, more preferably a is from 5 to 300, and d is from 2 to 100,
e는 1 또는 2이며, 바람직하기로 1이며,e is 1 or 2, preferably 1,
n은 각각 독립적으로 1 내지 20의 정수이며, 바람직하기로는 3 내지 10이다.n is each independently an integer of 1 to 20, preferably 3 to 10.
상기 화학식 1 내지 3 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자는 R, R1, R2, R3, R4, R5, R6, R7, R8, R9, 또는 R10으로 표시된 유기관능기를 가지며, 반복단위가 , 로 구성되고, 말단단위로 를 선택적으로 도입할 수 있는 복합 실세스퀴옥산 고분자이다.The silsesquioxane composite polymer represented by any one of Formulas 1 to 3 is R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , or R 10 It has the indicated organic functional group, and the repeating unit is , is composed of, and as a terminal unit It is a complex silsesquioxane polymer that can be selectively introduced.
상기 화학식 1 또는 2의 반복단위 에 도입된[(SiO3/2R)4+2nO] 구조의 n은 1 내지 20의 정수로 치환될 수 있으며, 바람직하기로는 3 내지 10이며, 더욱 바람직하기로는 평균 n 값이 4 내지 5이며, 상기 n이 4일 때 치환된 구조를 표현하면 하기 화학식 5와 같다:The repeating unit of Formula 1 or 2 n of the [(SiO 3/2 R) 4+2n O] structure introduced into may be substituted with an integer of 1 to 20, preferably 3 to 10, and more preferably an average n value of 4 to 5 And, when n is 4, the substituted structure is represented by the following Chemical Formula 5:
[화학식 5][Formula 5]
상기 식에서, R은 상기에서 정의한 바와 같다.
In the above formula, R is as defined above.
본 발명에 있어서, 상기 화학식 3의 반복단위 에 도입된[(SiO3/2R)4+2nR] 구조의 n은 1 내지 20의 정수로 치환될 수 있으며, 바람직하기로는 3 내지 10이며, 더욱 바람직하기로는 평균 n 값이 4 내지 5이며, 예를 들어, 상기 n이 4일 때 치환된 구조를 표현하면 하기 화학식 6과 같다: In the present invention, the repeating unit of Formula 3 n of the [(SiO 3/2 R) 4+2n R] structure introduced into may be substituted with an integer of 1 to 20, preferably 3 to 10, more preferably an average n value of 4 to 5 And, for example, when expressing a substituted structure when n is 4, it is as follows:
[화학식 6][Formula 6]
상기 식에서, R은 상기에서 정의한 바와 같다.
In the above formula, R is as defined above.
구체적인 예로 상기 화학식 1의 실세스퀴옥산 복합고분자는 하기 표 1 및 2에 기재된 고분자일 수 있다. 하기 표 1 내지 6에서 ECHE는 (Epoxycyclohexyl)ethyl, GlyP는 Glycidoxypropyl, POMMA는 (methacryloyloxy)propyl을 의미하며, 두 개 이상이 기재된 경우 혼합사용을 의미한다. n은 각각 독립적으로 1 내지 8이다.As a specific example, the silsesquioxane composite polymer of Formula 1 may be the polymers shown in Tables 1 and 2 below. In Tables 1 to 6, ECHE means (Epoxycyclohexyl)ethyl, GlyP means Glycidoxypropyl, and POMMA means (methacryloyloxy)propyl, and when two or more are described, it means mixed use. n is each independently 1 to 8;
구체적인 예로 상기 화학식 2의 실세스퀴옥산 복합고분자는 하기 표 3 및 4에 기재된 고분자일 수 있다.As a specific example, the silsesquioxane composite polymer of Formula 2 may be the polymers shown in Tables 3 and 4 below.
구체적인 예로 상기 화학식 3의 실세스퀴옥산 복합고분자는 하기 표 5 또는 6에 기재된 고분자일 수 있다.As a specific example, the silsesquioxane composite polymer of Formula 3 may be a polymer shown in Tables 5 or 6 below.
본 발명의 실세스퀴옥산 복합 고분자는 우수한 보관 안정성을 확보하여 폭넓은 응용성을 얻기 위해, 축합도가 1 내지 99.9% 이상으로 조절될 수 있다. 즉, 말단 및 중앙의 Si에 결합된 알콕시 그룹의 함량이 전체 고분자의 결합기에 대해 50%에서 0.01%까지 조절될 수 있다.
The degree of condensation of the silsesquioxane composite polymer of the present invention may be adjusted to 1 to 99.9% or more in order to secure excellent storage stability and obtain wide applicability. That is, the content of the alkoxy group bonded to Si at the ends and the center can be controlled from 50% to 0.01% of the total polymer bonding group.
또한 본 발명에 실세스퀴옥산 복합 고분자의 중량평균분자량은 1,000 내지 1,000,000, 바람직하게는 5,000 내지 100,000이며, 더욱 바람직하게는 7,000 내지 50,000일 수 있다. 이 경우 실세스퀴옥산의 가공성 및 물리적 특성을 동시에 향상시킬 수 있다.
In addition, the weight average molecular weight of the silsesquioxane composite polymer in the present invention may be 1,000 to 1,000,000, preferably 5,000 to 100,000, and more preferably 7,000 to 50,000. In this case, the processability and physical properties of silsesquioxane can be improved at the same time.
본 발명의 실세스퀴옥산 복합 고분자는 하나의 반응기에서 염기성 촉매와 산성촉매를 이용하여 염기도와 산도를 연속적으로 조절함으로써 제조될 수 있으며, 하기와 같은 제조공법 중 하나를 이용할 수 있다.
The silsesquioxane composite polymer of the present invention can be prepared by continuously controlling basicity and acidity using a basic catalyst and an acid catalyst in one reactor, and one of the following manufacturing methods can be used.
화학식 1로 표시되는 실세스퀴옥산 복합 고분자의 제조방법Method for producing a silsesquioxane composite polymer represented by Formula 1
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계를 포함한다. 제조된 실세스퀴옥산 복합 고분자는 하기 화학식 1-1과 같은 구조를 가진다.A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; and a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic. The prepared silsesquioxane composite polymer has a structure as shown in Formula 1-1 below.
[화학식 4][Formula 4]
[화학식 1-1][Formula 1-1]
상기 식에서 R, R1, R2, R6, R7, Y, a 및 d는 화학식 1 내지 3에서 정의한 바와 같다.In the above formula, R, R 1 , R 2 , R 6 , R 7 , Y, a and d are as defined in Formulas 1 to 3.
화학식 2로 표시되는 실세스퀴옥산 복합고분자의 제조방법Method for producing a silsesquioxane composite polymer represented by Formula 2
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 및 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 과량의 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 제3단계 반응을 거쳐, 단독으로 생성되는 부산물인 cage 구조를 재결정으로 제거하여주는 정제단계를 진행하면 제조된 복합 고분자 하기 화학식 2-1과 같은 구조를 가진다.A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step and a second step of adding an acidic catalyst to the reactor to adjust the reaction solution to acidity in order to introduce the structure, then adding an excess of an organosilane compound and stirring; and a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; And through the third step reaction, when the purification step of removing the cage structure, which is a by-product, by recrystallization is performed, the prepared composite polymer has a structure as shown in Chemical Formula 2-1 below.
[화학식 2-1][Formula 2-1]
상기 식에서 R, R3, R4, R6, R7, D, Y, a 및 d는 화학식 1 내지 3에서 정의한 바와 같다.
In the above formula, R, R 3 , R 4 , R 6 , R 7 , D, Y, a and d are as defined in Formulas 1 to 3.
화학식 3으로 표시되는 실세스퀴옥산 복합고분자의 제조방법Method for producing a silsesquioxane composite polymer represented by the formula (3)
반응기에 염기성 촉매와 유기용매를 혼합한 후 유기 실란 화합물을 첨가하고 축합하여 하기 화학식 4를 제조하는 제1단계; 및 상기 제1단계 이후에 화학식 4에 구조를 도입하기 위하여 반응기에 산성 촉매를 첨가하여 반응액을 산성으로 조절한 후, 유기 실란 화합물을 첨가하고 교반하는 제2단계; 및 상기 2단계 이후에 반응기에 염기성 촉매를 첨가하여 반응액을 염기성으로 변환하여 축합반응을 실시하는 제3단계; 및 상기 제3단계 이후에 복합고분자의 말단에 구조를 도입하여 위하여 반응기에 산성 촉매를 투입하여 반응액을 산성 분위기로 변환하고 유기실란 화합물을 혼합하여 교반하는 제4단계를 포함한다. 제조된 실세스퀴옥산 복합 고분자는 하기 화학식 3-1과 같은 구조를 가진다. A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; and a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; and at the end of the composite polymer after the third step. In order to introduce the structure, an acid catalyst is introduced into the reactor to convert the reaction solution into an acidic atmosphere, and a fourth step of mixing and stirring the organosilane compound is included. The prepared silsesquioxane composite polymer has a structure as shown in Formula 3-1 below.
[화학식 3-1][Formula 3-1]
상기 식에서 R, R5, R6, R7, R8, Y, X, a, d 및 e는 화학식 1 내지 3에서 정의한 바와 같다.In the above formula, R, R 5 , R 6 , R 7 , R 8 , Y, X, a, d and e are as defined in Formulas 1 to 3.
상기 실세스퀴옥산 복합 고분자의 제조방법에서는 염기성 촉매로서 바람직하기로는 2종 이상의 염기성 촉매의 혼합촉매를 사용하고, 이를 산성 촉매로 중화 및 산성화하여 재 가수분해를 유도하며, 다시 2종 이상의 염기성 촉매의 혼합촉매를 이용하여 염기성으로 축합을 진행함으로써 하나의 반응기내에서 산도와 염기도를 연속적으로 조절할 수 있다.In the method for producing the silsesquioxane complex polymer, a mixed catalyst of two or more basic catalysts is preferably used as a basic catalyst, and this is neutralized and acidified with an acidic catalyst to induce re-hydrolysis, and again two or more basic catalysts are used. Acidity and basicity can be continuously adjusted in one reactor by carrying out the condensation in a basic manner using a mixed catalyst of
이때, 상기 염기성 촉매는 Li, Na, K, Ca 및 Ba 으로 이루어진 군에서 선택된 금속계 염기성 촉매 및 아민계 염기성 촉매에서 선택되는 2종 이상의 물질을 적절히 조합하여 제조될 수 있다. 바람직하게는 상기 아민계 염기성 촉매가 테트라메틸암모늄 하이드록시드(TMAH)이고, 금속계 염기성 촉매가 포타슘 하이드록시드(KOH) 또는 중탄산나트륨 (NaHCO3)일 수 있다. 상기 혼합촉매에서 각 성분의 함량은 바람직하기로는 아민계 염기성 촉매와 금속계 염기성 촉매의 비율이 10 내지 90: 10 내지 90 중량부의 비율에서 임의로 조절할 수 있다. 상기 범위 내인 경우 가수분해시 관능기와 촉매와의 반응성을 최소화시킬 수 있으며, 이로 인해 Si-OH 또는 Si-알콕시 등의 유기 관능기의 결함이 현저히 감소하여 축합도를 자유로이 조절할 수 있는 장점이 있다. 또한, 상기 산성 촉매로는 당분야에서 통상적으로 사용하는 산성 물질이라면 제한 없이 사용될 수 있으며, 예를 들어, HCl, H2SO4, HNO3, CH3COOH 등의 일반 산성물질을 사용할 수 있고, 또한 latic acid, tartaric acid, maleic acid, citric acid 등의 유기계 산성물질도 적용할 수 있다.
In this case, the basic catalyst may be prepared by appropriately combining two or more materials selected from a metal-based basic catalyst and an amine-based basic catalyst selected from the group consisting of Li, Na, K, Ca and Ba. Preferably, the amine-based basic catalyst is tetramethylammonium hydroxide (TMAH), and the metal-based basic catalyst is potassium hydroxide (KOH) or sodium bicarbonate (NaHCO 3 ). The content of each component in the mixed catalyst may be arbitrarily adjusted in a ratio of preferably 10 to 90: 10 to 90 parts by weight of the amine-based basic catalyst and the metal-based basic catalyst. If it is within the above range, it is possible to minimize the reactivity of the functional group with the catalyst during hydrolysis, and this has the advantage that defects of organic functional groups such as Si-OH or Si-alkoxy are significantly reduced, so that the degree of condensation can be freely controlled. In addition, the acid catalyst may be used without limitation as long as it is an acidic material commonly used in the art, for example, a general acidic material such as HCl, H 2 SO 4 , HNO 3 , CH 3 COOH may be used, In addition, organic acidic substances such as latic acid, tartaric acid, maleic acid, and citric acid can be applied.
본 발명의 실세스퀴옥산 복합 고분자의 제조방법에서 상기 유기용매는 당분야에서 통상적으로 사용하는 유기용매라면 제한 없이 사용될 수 있으며, 예를 들어, 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜, 셀로솔브계 등의 알코올류, 락테이트계, 아세톤, 메틸(아이소부틸)에틸케톤 등의 케톤류, 에틸렌글리콜 등의 글리콜류, 테트라하이드로퓨란 등의 퓨란계, 디메틸포름아미드, 디메틸아세트아미드, N-메틸-2-피롤리돈 등의 극성용매 뿐 아니라, 헥산, 사이클로헥산, 사이클로헥사논, 톨루엔, 자일렌, 크레졸, 클로로포름, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크로니트릴, 메틸렌클로라이드, 옥타데실아민, 아닐린, 디메틸설폭사이드, 벤질알콜 등 다양한 용매를 사용할 수 있다.
In the method for producing the silsesquioxane composite polymer of the present invention, the organic solvent may be used without limitation as long as it is an organic solvent commonly used in the art, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, Alcohols such as cellosolve, ketones such as lactate, acetone, and methyl (isobutyl) ethyl ketone, glycols such as ethylene glycol, furan such as tetrahydrofuran, dimethylformamide, dimethylacetamide, N- In addition to polar solvents such as methyl-2-pyrrolidone, hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acro Various solvents such as nitrile, methylene chloride, octadecylamine, aniline, dimethyl sulfoxide, and benzyl alcohol can be used.
또한, 상기 유기 실란계 화합물로는 본 발명의 실세스퀴옥산 복합 고분자인 화학식 1 내지 3의 R, R1, R2, R3, R4, R5, R6, R7, R8, R9, 또는 R10을 포함하는 유기 실란이 사용될 수 있으며, 특히 실세스퀴옥산 복합 고분자의 내화학성을 증가시켜 비팽윤성을 향상시키는 효과가 있는 페닐기 또는 아미노기를 포함하는 유기 실란 화합물, 또는 복합 고분자의 경화 밀도를 증가시켜 경화층의 기계적 강도 및 경도를 향상시키는 효과가 있는 에폭시기 또는 (메타)아크릴기를 포함하는 유기 실란 화합물을 사용할 수 있다.
In addition, as the organosilane-based compound, R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , the silsesquioxane complex polymer of the present invention, of Formulas 1 to 3, An organic silane containing R 9 , or R 10 may be used, and in particular, an organic silane compound containing a phenyl group or an amino group, which has the effect of improving the non-swelling property by increasing the chemical resistance of the silsesquioxane composite polymer, or a composite polymer An organic silane compound containing an epoxy group or a (meth)acryl group, which has the effect of improving the mechanical strength and hardness of the cured layer by increasing the curing density of the cured layer, may be used.
상기 유기 실란계 화합물의 구체적인 예로는 (3-글리시드옥시프로필)트리메톡시실란, (3-글리시드옥시프로필)트리에톡시실란, (3-글리시드옥시프로필)메틸디메톡시실란, (3-글리시드옥시프로필)디메틸에톡시실란, 3-(메타아크릴옥시)프로필트리메톡시실란, 3,4-에폭시부틸트리메톡시실란, 3,4-에폭시부틸트리에톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리에톡시실란, 아미노프로필트리에톡시실란, 비닐트리에톡시실란, 비닐트리-t-부톡시실란, 비닐트리이소부톡시실란, 비닐트리이소프로폭시실란, 비닐트리페녹시실란, 페닐트리에톡시실란, 페닐트리메톡시실란, 아미노프로필트리메톡시실란, N-페닐-3-아미노프로필트리메톡시실란, 디메틸테트라메톡시실록산, 디페닐테트라메톡시실록산 등을 들 수 있으며, 이들 중 1종 단독으로 또는 2종 이상을 병용하여 사용할 수도 있다. 최종 제조되는 조성물의 물성을 위하여 2종 이상을 혼합하여 사용하는 것이 보다 바람직하다.
Specific examples of the organosilane compound include (3-glycidoxypropyl)trimethoxysilane, (3-glycidoxypropyl)triethoxysilane, (3-glycidoxypropyl)methyldimethoxysilane, (3 -glycidoxypropyl) dimethylethoxysilane, 3-(methacryloxy)propyltrimethoxysilane, 3,4-epoxybutyltrimethoxysilane, 3,4-epoxybutyltriethoxysilane, 2-(3 ,4-epoxycyclohexyl)ethyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltriethoxysilane, aminopropyltriethoxysilane, vinyltriethoxysilane, vinyltri-t-butoxy Silane, vinyltriisobutoxysilane, vinyltriisopropoxysilane, vinyltriphenoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane, aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltrime oxysilane, dimethyltetramethoxysiloxane, diphenyltetramethoxysiloxane, etc. are mentioned, Among these, it can also be used individually by 1 type or in combination of 2 or more types. It is more preferable to use a mixture of two or more for the physical properties of the final composition.
바람직하기로 본 발명의 제1단계의 반응액의 pH는 9 내지 11.5인 것이 바람직하고, 제2단계의 반응액의 pH는 2 내지 4인 것이 바람직하고, 제3단계의 반응액의 pH는 8 내지 11.5인 것이 바람직하고, 화학식 3을 제조하는 제4단계의 반응액의 pH는 1.5 내지 4인 것이 바람직하다. 상기 범위 내인 경우 제조되는 실세스퀴옥산 복합 고분자의 수율이 높을 뿐만 아니라 제조된 실세스퀴옥산 복합 고분자의 기계적 물성을 향상시킬 수 있다.
Preferably, the pH of the reaction solution in the first step of the present invention is preferably 9 to 11.5, the pH of the reaction solution in the second step is preferably 2 to 4, and the pH of the reaction solution in the third step is 8 to 11.5, and the pH of the reaction solution in the fourth step of preparing Formula 3 is preferably 1.5 to 4. When it is within the above range, the yield of the prepared silsesquioxane composite polymer may be high, and mechanical properties of the prepared silsesquioxane composite polymer may be improved.
또한 본 발명은 상기 화학식 1 내지 3 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자를 포함하는 것을 특징으로 하는 코팅 조성물을 제공한다. 상기 코팅 조성물은 실세스퀴옥산 복합 고분자가 액상인 경우 무용제 타입으로 단독으로 코팅이 가능하며, 고상인 경우 유기용매를 포함하여 구성될 수 있다. 또한 코팅 조성물은 개시제 또는 경화제를 더욱 포함할 수 있다.The present invention also provides a coating composition comprising a silsesquioxane composite polymer represented by any one of Formulas 1 to 3. When the silsesquioxane composite polymer is liquid, the coating composition can be coated alone as a solvent-free type, and when the silsesquioxane composite polymer is in a solid state, it may be configured by including an organic solvent. In addition, the coating composition may further include an initiator or a curing agent.
바람직하기로는 상기 코팅 조성물은 상기 화학식 1 내지 3 중 어느 하나로 표시되는 실세스퀴옥산 복합 고분자, 상기 복합 고분자와 상용성이 있는 당분야에서 통상적으로 사용하는 유기용매, 개시제를 포함하며, 선택적으로 경화제, 가소제, 자외선 차단제, 기타 기능성 첨가제 등의 첨가제를 추가로 포함하여 경화성, 내열특성, 자외선차단, 가소 효과 등을 향상시킬 수 있다.
Preferably, the coating composition includes a silsesquioxane complex polymer represented by any one of Chemical Formulas 1 to 3, an organic solvent commonly used in the art that is compatible with the complex polymer, and an initiator, and optionally a curing agent , plasticizers, sunscreens, and other functional additives may be additionally included to improve curability, heat resistance, UV protection, and plasticizing effect.
본 발명의 코팅 조성물에 있어서 상기 실세스퀴옥산 복합 고분자는 코팅 조성물 100 중량부에 대하여 적어도 5 중량부 이상으로 포함되는 것이 좋으며, 바람직하게는 5 내지 90 중량부, 더욱 바람직하게는 10 내지 50 중량부의 양으로 포함되는 것이 바람직하다. 상기 범위 내인 경우 코팅 조성물의 경화막의 기계적 물성을 더욱 향상시킬 수 있다.
In the coating composition of the present invention, the silsesquioxane composite polymer is preferably included in an amount of at least 5 parts by weight or more, preferably 5 to 90 parts by weight, more preferably 10 to 50 parts by weight based on 100 parts by weight of the coating composition. It is preferably included in a negative amount. When within the above range, the mechanical properties of the cured film of the coating composition may be further improved.
상기 유기용매로는 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜, 셀로솔브계 등의 알코올류, 락테이트계, 아세톤, 메틸(아이소부틸)에틸케톤 등의 케톤류, 에틸렌글리콜 등의 글리콜 류, 테트라하이드로퓨란 등의 퓨란계, 디메틸포름아미드, 디메틸아세트아미드, N-메틸-2-피롤리돈 등의 극성용매 뿐 아니라, 헥산, 사이클로헥산, 사이클로헥사논, 톨루엔, 자일렌, 크레졸, 클로로포름, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크로니트릴, 메틸렌클로라이드, 옥타데실아민, 아닐린, 디메틸설폭사이드, 벤질알콜 등 다양한 용매를 이용할 수 있으나, 이에 제한되지는 않는다. 상기 유기용매의 양은 복합고분자, 개시제, 경화제 및 선택적으로 추가되는 첨가제를 제외한 잔량으로 포함된다.
Examples of the organic solvent include alcohols such as methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, and cellosolve; ketones such as lactate, acetone, and methyl (isobutyl) ethyl ketone; glycols such as ethylene glycol; Furan-based solvents such as tetrahydrofuran, polar solvents such as dimethylformamide, dimethylacetamide, and N-methyl-2-pyrrolidone, as well as hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform, Various solvents such as dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrynitrile, methylene chloride, octadecylamine, aniline, dimethyl sulfoxide, and benzyl alcohol may be used, but are not limited thereto. The amount of the organic solvent is included in the remaining amount excluding the complex polymer, initiator, curing agent, and optionally added additives.
또한 본 발명의 코팅 조성물에 있어서 상기 개시제 또는 경화제는 실세스퀴옥산 복합 고분자에 포함된 유기관능기에 따라 적절히 선택하여 사용할 수 있다.In addition, in the coating composition of the present invention, the initiator or curing agent may be appropriately selected and used according to the organic functional group contained in the silsesquioxane composite polymer.
구체적인 예로서 상기 유기관능기에 불포화 탄화수소, 사이올계, 에폭시계, 아민계, 이소시아네이트계 등의 후경화가 가능한 유기계가 도입될 경우, 열 또는 광을 이용한 다양한 경화가 가능하다. 이때 열 또는 광에 의한 변화를 고분자 자체 내에서 도모할 수 있지만, 바람직하게는 상기와 같은 유기용매에 희석함으로써 경화공정을 도모할 수 있다.
As a specific example, when an organic type capable of post-curing, such as an unsaturated hydrocarbon, a thiol type, an epoxy type, an amine type, an isocyanate type, etc. is introduced into the organic functional group, various curing using heat or light is possible. At this time, the change by heat or light can be achieved within the polymer itself, but preferably, the curing process can be achieved by diluting it in the organic solvent as described above.
또한 본 발명에서는 복합 고분자의 경화 및 후 반응을 위하여, 다양한 개시제를 사용할 수 있으며, 상기 개시제는 조성물 100 중량부에 대하여 0.1-10 중량부로 포함되는 것이 바람직하며, 상기 범위 내의 함량으로 포함될 때, 경화 후 투과도 및 코팅안정성을 동시에 만족시킬 수 있다.
In the present invention, various initiators can be used for curing and post-reaction of the composite polymer, and the initiator is preferably included in an amount of 0.1-10 parts by weight based on 100 parts by weight of the composition. Post-transmittance and coating stability can be satisfied at the same time.
또한 상기 유기관능기에 불포화 탄화수소 등이 도입될 경우에는 라디칼 개시제를 사용할 수 있으며, 상기 라디칼 개시제로는 트리클로로 아세토페논(trichloro acetophenone), 디에톡시 아세토페논(diethoxy acetophenone), 1-페닐-2-히드록시-2-메틸프로판-1-온(1-phenyl-2-hydroxyl-2-methylpropane-1-one), 1-히드록시사이클로헥실페닐케톤, 2-메틸-1-(4-메틸 티오페닐)-2-모르폴리노프로판-1-온(2-methyl-1-(4-methyl thiophenyl)-2-morpholinopropane-1-one), 2,4,6-트리메틸 벤조일 디페닐포스핀 옥사이드(trimethyl benzoyl diphenylphosphine oxide), 캠퍼 퀴논(camphor quinine), 2,2'-아조비스(2-메틸부티로니트릴), 디메틸-2,2'-아조비스(2-메틸 부틸레이트), 3,3-디메틸-4-메톡시-벤조페논, p-메톡시벤조페논, 2,2-디에톡시 아세토페논, 2,2-디메톡시-1,2-디페닐 에탄-1-온 등의 광 래디컬 개시제, t-부틸파옥시 말레인산, t-부틸하이드로퍼옥사이드, 2,4-디클로로벤조일퍼옥사이드, 1,1-디(t-부틸퍼옥시)-3,3,5-트리메틸시클로헥산, N-부틸-4,4'-디(t-부틸퍼옥시)발레레이트 등의 열 레디칼 개시제 및 이들의 다양한 혼합물 등이 사용될 수 있다.
In addition, when an unsaturated hydrocarbon is introduced into the organic functional group, a radical initiator may be used, and the radical initiator includes trichloro acetophenone, diethoxy acetophenone, 1-phenyl-2-hydro Roxy-2-methylpropane-1-one (1-phenyl-2-hydroxyl-2-methylpropane-1-one), 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methyl thiophenyl) -2-morpholinopropane-1-one (2-methyl-1- (4-methyl thiophenyl)-2-morpholinopropane-1-one), 2,4,6-trimethyl benzoyl diphenylphosphine oxide (trimethyl benzoyl diphenylphosphine oxide), camphor quinone, 2,2'-azobis (2-methylbutyronitrile), dimethyl-2,2'-azobis (2-methyl butyrate), 3,3-dimethyl- Photoradical initiators such as 4-methoxy-benzophenone, p-methoxybenzophenone, 2,2-diethoxy acetophenone, and 2,2-dimethoxy-1,2-diphenyl ethan-1-one, t- Butylparoxy maleic acid, t-butyl hydroperoxide, 2,4-dichlorobenzoyl peroxide, 1,1-di(t-butylperoxy)-3,3,5-trimethylcyclohexane, N-butyl-4, Thermal radical initiators such as 4'-di(t-butylperoxy)valerate and various mixtures thereof may be used.
또한, 상기 유기관능기에 에폭시 등이 포함되는 경우에는, 광중합 개시제(양이온)로서 트리페닐술포늄, 디페닐-4-(페닐티오)페닐술포늄 등의 술포늄계, 디페닐요오드늄이나 비스(도데실페닐)요오드늄 등의 요오드늄, 페닐디아조늄 등의 디아조늄, 1-벤질-2-시아노피리니늄이나 1-(나프틸메틸)-2-시아노프리디늄 등의 암모늄, (4-메틸페닐)[4-(2-메틸프로필)페닐]-헥사플루오로포스페이트 요오드늄, 비스(4-t-부틸페닐)헥사플루오로포스페이트 요오드늄, 디페닐헥사플루오로포스페이트 요오드늄, 디페닐트리플루오로메탄술포네이트 요오드늄, 트리페닐술포늄 테트라풀루오로보레이트, 트리-p-토일술포늄 헥사풀루오로포스페이트, 트리-p-토일술포늄 트리풀루오로메탄술포네이트 및 (2,4-시클로펜타디엔-1-일)[(1-메틸에틸)벤젠]-Fe 등의 Fe 양이온들과 BF4 -, PF6 -, SbF6 - 등의 [BQ4]- 오늄염 조합을 이용할 수 있다(여기서, Q는 적어도 2개 이상의 불소 또는 트리플루오로메틸기로 치환된 페닐기이다.).
In addition, when an epoxy etc. are contained in the said organic functional group, as a photoinitiator (cation), sulfonium types, such as triphenylsulfonium, diphenyl-4- (phenylthio) phenylsulfonium, diphenyliodonium, or bis (dode iodonium such as silphenyl) iodonium, diazonium such as phenyldiazonium, ammonium such as 1-benzyl-2-cyanopyrininium and 1-(naphthylmethyl)-2-cyanopridinium, (4- Methylphenyl)[4-(2-methylpropyl)phenyl]-hexafluorophosphate iodonium, bis(4-t-butylphenyl)hexafluorophosphate iodonium, diphenylhexafluorophosphate iodonium, diphenyltrifluoro Romethanesulfonate iodonium, triphenylsulfonium tetrafluoroborate, tri-p-toylsulfonium hexafluorophosphate, tri-p-toylsulfonium trifluoromethanesulfonate and (2,4- A combination of Fe cations such as cyclopentadien-1-yl)[(1-methylethyl)benzene]-Fe and [BQ 4 ] -onium salts such as BF 4 - , PF 6 - , SbF 6 - may be used. (Wherein, Q is a phenyl group substituted with at least two or more fluorine or trifluoromethyl groups).
또한, 열에 의해 작용하는 양이온 개시제로는 트리플산염, 3불화 붕소 에테르착화합물, 3불화 붕소 등과 같은 양이온계 또는 프로톤산 촉매, 암모늄염, 포스포늄염 및 술포늄염 등의 각종 오늄염 및 메틸트리페닐포스포늄 브롬화물, 에틸트리페닐포스포늄 브롬화물, 페닐트리페닐포스포늄 브롬화물 등을 제한 없이 사용할 수 있으며, 이들 개시제 또한 다양한 혼합형태로 첨가할 수 있으며, 상기에 명시한 다양한 라디칼 개시제들과의 혼용도 가능하다.
In addition, as a cationic initiator acting by heat, a cationic or protonic acid catalyst such as triflate, boron trifluoride ether complex, boron trifluoride, etc., various onium salts such as ammonium salt, phosphonium salt and sulfonium salt, and methyltriphenylphosphonium Bromide, ethyltriphenylphosphonium bromide, phenyltriphenylphosphonium bromide, etc. can be used without limitation, and these initiators can also be added in various mixed forms, and can be mixed with the various radical initiators specified above Do.
또한, 상기 유기관능기의 종류에 따라, 아민 경화제류인 에틸렌디아민, 트리에틸렌 테트라민, 테트라에틸렌 펜타민, 1,3-디아미노프로판, 디프로필렌트리아민, 3-(2-아미노에틸)아미노-프로필아민, N,N'-비스(3-아미노프로필)-에틸렌디아민, 4,9-디옥사도테칸-1,12-디아민, 4,7,10-트리옥사트리데칸-1,13-디아민, 헥사메틸렌디아민, 2-메틸펜타메틸렌디아민, 1,3-비스아미노메틸시클로헥산, 비스(4-아니모시클로헥실)메탄, 노르보르넨디아민, 1,2-디아미노시클로헥산 등을 이용할 수 있다.
In addition, depending on the type of the organic functional group, amine curing agents ethylenediamine, triethylenetetramine, tetraethylenepentamine, 1,3-diaminopropane, dipropylenetriamine, 3-(2-aminoethyl)amino-propyl amine, N,N'-bis(3-aminopropyl)-ethylenediamine, 4,9-dioxadothecan-1,12-diamine, 4,7,10-trioxatridecane-1,13-diamine, Hexamethylenediamine, 2-methylpentamethylenediamine, 1,3-bisaminomethylcyclohexane, bis(4-animocyclohexyl)methane, norbornenediamine, 1,2-diaminocyclohexane, etc. can be used. .
또한 상기 경화작용을 촉진하기 위한 경화 촉진제로, 아세토구아나민, 벤조구아나민, 2,4-디아미노-6-비닐-s-트리아진 등의 트리아진계 화합물, 이미다졸, 2-메틸이미다졸, 2-에틸-4-메틸이미다졸, 2-페닐이미다졸, 2-페닐-4-메틸이미다졸, 비닐이미다졸, 1-메틸이미다졸 등의 이미다졸계 화합물, 1,5-디아자비시클로[4.3.0]논엔-5,1,8-디아자비시클로[5.4.0]운데센-7, 트리페닐포스핀, 디페닐(p-트릴)포스핀, 트리스(알킬페닐)포스핀, 트리스(알콕시페닐)포스핀, 에틸트리페닐포스포늄포스페이트, 테트라부틸포스포늄히드록시드, 테트라부틸포스포늄아세테이트, 테트라부틸포스포늄하이드로젠디플루오라이드, 테트라부틸포스포늄디하이드로젠트리플루오르 등도 사용될 수 있다.
In addition, as a curing accelerator for accelerating the curing action, triazine-based compounds such as acetoguanamine, benzoguanamine, 2,4-diamino-6-vinyl-s-triazine, imidazole, and 2-methylimidazole , 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, vinylimidazole, imidazole compounds such as 1-methylimidazole, 1, 5-diazabicyclo[4.3.0]nonene-5,1,8-diazabicyclo[5.4.0]undecene-7, triphenylphosphine, diphenyl(p-triyl)phosphine, tris(alkylphenyl) ) Phosphine, tris (alkoxyphenyl) phosphine, ethyl triphenyl phosphonium phosphate, tetrabutyl phosphonium hydroxide, tetrabutyl phosphonium acetate, tetrabutyl phosphonium hydrogen difluoride, tetrabutyl phosphonium dihydrogen tri Fluorine or the like may also be used.
아울러, 무수프탈산, 무수트리멜리트산, 무수피로멜리트산, 무수말레산, 테트라히드로 무수프탈산, 메틸헥사히드로 무수프탈산, 메틸테트라히드로 무수프탈산, 메틸나드산 무수물, 수소화메틸나드산 무수물, 트리알킬테트라히드로 무수프탈산, 도데세닐 무수숙신산, 무수2,4-디에틸글루타르산 등의 산무수경화제류도 폭넓게 사용될 수 있다.In addition, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, hydrogenated methylnadic anhydride, trialkyltetra Acid anhydride curing agents such as hydrophthalic anhydride, dodecenyl succinic anhydride, and 2,4-diethyl glutaric anhydride can also be widely used.
상기 경화제는 조성물 100 중량부에 대하여 0.1-10 중량부로 포함되는 것이 좋다.
The curing agent is preferably included in an amount of 0.1-10 parts by weight based on 100 parts by weight of the composition.
본 발명에서는 또한 경화공정 또는 후반응을 통한 경도, 강도, 내구성, 성형성 등을 개선하는 목적으로 자외선 흡수제, 산화 방지제, 소포제, 레벨링제, 발수제, 난연제, 접착개선제 등의 첨가제를 추가로 포함할 수 있다. 이러한 첨가제는 그 사용에 있어 특별하게 제한은 없으나 기판의 특성 즉, 유연성, 투광성, 내열성, 경도, 강도 등의 물성을 해치지 않는 범위 내에서 적절히 첨가할 수 있다. 상기 첨가제는 각각 독립적으로 조성물 100 중량부에 대하여 0.1-10 중량부로 포함되는 것이 좋다.
In the present invention, additives such as UV absorbers, antioxidants, defoamers, leveling agents, water repellents, flame retardants, and adhesion improvers are additionally included for the purpose of improving hardness, strength, durability, moldability, etc. through the curing process or post-reaction. can These additives are not particularly limited in their use, but may be appropriately added within a range that does not impair the properties of the substrate, that is, physical properties such as flexibility, light transmittance, heat resistance, hardness, and strength. Preferably, the additives are each independently included in an amount of 0.1-10 parts by weight based on 100 parts by weight of the composition.
본 발명에서 사용가능한 첨가제로는 폴리에테르 디메틸폴리실록산계 (Polyether-modified polydimethylsiloxane, 예를 들어, BYK 사 제품인 BYK-300, BYK-301, BYK-302, BYK-331, BYK-335, BYK-306, BYK-330, BYK-341, BYK-344, BYK-307, BYK-333, BYK-310 등), 폴리에테르 하이드록시 폴리디메틸실록산계 (Polyether modified hydroxyfunctional poly-dimethyl-siloxane, 예를 들어, BYK-308, BYK-373 등), 폴리메틸알킬실록산계 (Methylalkylpolysiloxane, 예를 들어, BYK-077, BYK-085 등), 폴리에테르 폴리메틸알킬실록산계 (Polyether modified methylalkylpolysiloxane, 예를 들어, BYK-320, BYK-325 등), 폴리에스테르 폴리메틸알킬실록산계 (Polyester modified poly-methyl-alkyl-siloxane, 예를 들어, BYK-315 등), 알랄킬 폴리메틸알킬실록산계 (Aralkyl modified methylalkyl polysiloxane, 예를 들어, BYK-322, BYK-323 등), 폴리에스테르 하이드록시 폴리디메틸실록산계 (Polyester modified hydroxy functional polydimethylsiloxane, 예를 들어, BYK-370 등), 폴리에스테르 아크릴 폴리디메틸실록산계 (Acrylic functional polyester modified polydimethylsiloxane, 예를 들어, BYK-371, BYK-UV 3570 등), 폴리에테르-폴리에스테르 하이드록시 폴리디메틸실록산계 (Polyeher-polyester modified hydroxy functional polydimethylsiloxane, 예를 들어, BYK-375 등), 폴리에테르 폴리디메틸실록산계 (Polyether modified dimethylpolysiloxane, 예를 들어, BYK-345, BYK-348, BYK-346, BYK-UV3510, BYK-332, BYK-337 등), 비이온 폴리아크릴계 (Non-ionic acrylic copolymer, 예를 들어, BYK-380 등), 이온성 폴리아크릴계 (Ionic acrylic copolymer, 예를 들어, BYK-381 등), 폴리아크릴레이트계 (Polyacrylate, 예를 들어, BYK-353, BYK-356, BYK-354, BYK-355, BYK-359, BYK-361 N, BYK-357, BYK-358 N, BYK-352 등), 폴리메타아크릴레이트계 (Polymethacrylate, 예를 들어, BYK-390 등), 폴리에테르 아크릴 폴리디메틸실록산계 (Polyether modified acryl functional polydimethylsiloxane, 예를 들어, BYK-UV 3500, BYK-UV3530 등), 폴리에테르 실록산계 (Polyether modified siloxane, 예를 들어, BYK-347 등), 알코올 알콕시레이트계 (Alcohol alkoxylates, 예를 들어, BYK-DYNWET 800 등), 아크릴레이트계 (Acrylate, 예를 들어, BYK-392 등), 하이드록시 실리콘 폴리아크릴레이트계 (Silicone modified polyacrylate (OH-functional), 예를 들어, BYK-Silclean 3700 등) 등을 들 수 있다.
Additives usable in the present invention include polyether-modified polydimethylsiloxane (for example, BYK-300, BYK-301, BYK-302, BYK-331, BYK-335, BYK-306, manufactured by BYK). BYK-330, BYK-341, BYK-344, BYK-307, BYK-333, BYK-310, etc.), Polyether modified hydroxyfunctional poly-dimethyl-siloxane (for example, BYK- 308, BYK-373, etc.), polymethylalkylpolysiloxane (eg, BYK-077, BYK-085, etc.), polyether modified methylalkylpolysiloxane (eg, BYK-320, BYK-325, etc.), polyester poly-methyl-alkyl-siloxane (Polyester modified poly-methyl-alkyl-siloxane, e.g., BYK-315, etc.), Aralkyl modified methylalkyl polysiloxane, e.g. , BYK-322, BYK-323, etc.), polyester hydroxy polydimethylsiloxane (Polyester modified hydroxy functional polydimethylsiloxane, for example, BYK-370, etc.), polyester acrylic polydimethylsiloxane (Acrylic functional polyester modified polydimethylsiloxane, For example, BYK-371, BYK-UV 3570, etc.), polyether-polyester hydroxy polydimethylsiloxane (Polyeher-polyester modified hydroxy functional polydimethylsiloxane, for example, BYK-375, etc.), polyether polydimethylsiloxane acid (Poly) ether modified dimethylpolysiloxane, for example, BYK-345, BYK-348, BYK-346, BYK-UV3510, BYK-332, BYK-337, etc.), non-ionic acrylic copolymer, for example, BYK -380, etc.), ionic polyacrylic copolymer (eg, BYK-381, etc.), polyacrylate (eg, BYK-353, BYK-356, BYK-354, BYK-355) , BYK-359, BYK-361 N, BYK-357, BYK-358 N, BYK-352, etc.), polymethacrylate-based (Polymethacrylate, for example, BYK-390, etc.), polyether acrylic polydimethylsiloxane-based (Polyether modified acryl functional polydimethylsiloxane, for example, BYK-UV 3500, BYK-UV3530, etc.), polyether siloxane-based (Polyether modified siloxane, for example, BYK-347, etc.), alcohol alkoxylates, such as For example, BYK-DYNWET 800, etc.), acrylate-based (Acrylate, such as BYK-392, etc.), hydroxy silicone polyacrylate (OH-functional), such as BYK-Silclean 3700 etc.) and the like.
본 발명의 코팅 조성물은 다양한 소재에 적용되어 소재에 높은 표면경도, 기계적 강도 및 내열성을 향상시킬 수 있다. 코팅의 두께는 임의로 조절할 수 있으며, 0.01 내지 500 um일 수 있으며, 바람직하기로는 0.1 내지 300 um, 더욱 바람직하기로는 1 내지 100 um 범위가 좋다. 일예로 상기 소재는 금속, 세라믹, 플라스틱, 목재, 종이, 유리 또는 섬유일 수 있으며, 보다 구체적인 소재에 코팅된 구체적인 물품으로는 휴대폰 또는 디스플레이의 보호필름일 수 있다.
The coating composition of the present invention can be applied to various materials to improve the high surface hardness, mechanical strength and heat resistance of the material. The thickness of the coating may be arbitrarily controlled, and may be 0.01 to 500 um, preferably 0.1 to 300 um, more preferably 1 to 100 um. For example, the material may be metal, ceramic, plastic, wood, paper, glass or fiber, and a specific article coated on a more specific material may be a protective film for a mobile phone or display.
본 발명에 있어서, 상기 코팅 조성물을 코팅하는 방법은 스핀코팅, 바코팅, 슬릿코팅, 딥 코팅, 내츄럴 코팅, 리버스 코팅, 롤 코팅, 스핀코팅, 커텐코팅, 스프레이 코팅, 그라비어 코팅 등 공지된 방법 중에서 당업자가 임의로 선택하여 적용할 수 있음은 물론이다.
In the present invention, the method for coating the coating composition is spin coating, bar coating, slit coating, dip coating, natural coating, reverse coating, roll coating, spin coating, curtain coating, spray coating, gravure coating, among known methods. It goes without saying that those skilled in the art can arbitrarily select and apply it.
본 발명에 따라 제조된 실세스퀴옥산 복합 고분자는 선형 실세스퀴옥산 고분자로 구성된 선형 실세스퀴옥산 사슬과 케이지형 실세스퀴옥산 사슬을 포함하므로, 선형 고분자의 가공용이성과 결정형 실세스퀴옥산의 우수한 물리적 특성을 가질 수 있고, 상기 구조에 포함된 유기 관능기를 통해 경화가 용이하므로, 유-무기 혼성화 고분자를 적용하고자 하는 산업 전반에 폭 넓게 적용할 수 있다. 또한 실리콘의 뛰어난 광학특성, 물리적 특성, 내열특성 등을 기본적으로 구비하고 있어 주재, 첨가제 또는 다양한 코팅 소재로 폭넓게 이용될 수 있다.
Since the silsesquioxane composite polymer prepared according to the present invention includes a linear silsesquioxane chain and a cage-type silsesquioxane chain composed of a linear silsesquioxane polymer, the ease of processing of the linear polymer and the crystalline silsesquioxane chain Since it can have excellent physical properties of , and it is easy to cure through the organic functional group included in the structure, it can be widely applied to the overall industry to which the organic-inorganic hybrid polymer is to be applied. In addition, since it has the excellent optical properties, physical properties, and heat resistance properties of silicone, it can be widely used as a main material, additive, or various coating materials.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.
Hereinafter, preferred examples are presented to help the understanding of the present invention, but the following examples are only illustrative of the present invention and the scope of the present invention is not limited to the following examples.
실시예 1Example 1 : 실세스퀴옥산 A-D 구조 복합 고분자의 합성: Synthesis of silsesquioxane A-D structure composite polymer
합성단계는 아래와 같이, 연속가수분해 및 축합을 단계적으로 진행하였다.As for the synthesis step, continuous hydrolysis and condensation were carried out step by step.
[실시예 1-a] 촉매의 제조[Example 1-a] Preparation of catalyst
염기도 조절을 위하여, Tetramethylammonium hydroxide (TMAH) 25 중량% 수용액에 10 중량% Potassium hydroxide (KOH) 수용액을 혼합하여 촉매 1a를 준비하였다.
For basicity control, catalyst 1a was prepared by mixing 10 wt% potassium hydroxide (KOH) aqueous solution with 25 wt% tetramethylammonium hydroxide (TMAH) aqueous solution.
[실시예 1-b] 선형 실세스퀴옥산 구조의 합성[Example 1-b] Synthesis of linear silsesquioxane structure
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5 중량부, 테트라하이드로퓨란 15 중량부, 상기 실시예 1-a에서 제조된 촉매 1 중량부를 적가하고, 1시간 동안 상온에서 교반 한 후, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane 20중량부를 적가하고, 다시 테트라하이드로류란을 15 중량부 적가하여 5시간 추가 교반 하였다. 교반 중의 혼합용액을 적취하여, 두 차례 세정하는 것으로 촉매와 불순물을 제거하고 필터 한 후, IR 분석을 통하여 말단기에 생성된 SI-OH 관능기를 확인할 수 있었으며(3200 cm-1), 분자량을 측정한 결과, 화학식 4구조와 같은 선형구조의 실세스퀴옥산이 8,000 스티렌 환산 분자량을 가짐을 확인할 수 있었다.
5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, and 1 part by weight of the catalyst prepared in Example 1-a were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and after stirring at room temperature for 1 hour, 2 20 parts by weight of -(3,4-epoxycyclohexyl)ethyltrimethoxysilane was added dropwise, and then 15 parts by weight of tetrahydrolurane was added dropwise, followed by further stirring for 5 hours. After removing the catalyst and impurities by collecting the mixed solution during stirring, washing twice, and filtering, the SI-OH functional group generated at the terminal group was confirmed through IR analysis (3200 cm -1 ), and the molecular weight was measured. As a result, it was confirmed that silsesquioxane having a linear structure such as the structure of Chemical Formula 4 had a molecular weight equivalent to 8,000 styrene.
[실시예 1-c] 연속적 cage 구조의 생성[Example 1-c] Creation of a continuous cage structure
상기 실시예 1-b 혼합용액에 0.36 중량% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 Diphenyltetramethoxydisiloxane 5 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 1시간 교반 후 실시예 1-a에서 제조된 촉매를 7 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형고분자와는 별도로 alkoxy가 열려있는 D구조의 전구체가 형성된다. 소량의 샘플을 적취하여, H-NMR과 IR로 분석하여 methoxy의 잔존율을 확인한 후, 잔존율이 20% 일 때, 0.36 중량% HCl 수용액을 10 중량부 천천히 적가하여, pH를 산성으로 조절해 주었다. 이후 Phenyltrimethoxysilane 1 중량부를 한번에 적가하여 15분간 교반 후, 1-a에서 제조된 촉매 20 중량부를 첨가하였다. 4시간의 혼합교반 이후, 확인결과 고분자내에 cage 형태의 고분자가 생성됨을 확인 할 수 있었다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합 교반 이후, 일부를 적취하여 29Si-NMR을 통해 분석한 결과 phenyl기를 이용해 도입된 구조의 분석피크가 날카로운 형태의 2개로 나타나고 별도로 잔존하는 부산물 없이 화학식 1과 같은 A-D 고분자가 50% 이상 제조되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 11,000으로 측정되었다. 29Si-NMR (CDCl3) δ -68.2, -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad)
To the mixed solution of Example 1-b, 5 parts by weight of 0.36 wt% HCl aqueous solution was added dropwise very slowly, the pH was adjusted to have acidity, and the mixture was stirred at a temperature of 4 °C for 30 minutes. Then, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise at once to achieve stable hydrolysis, and after stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to adjust the pH of the mixed solution to a basic state. At this time, a precursor of the D structure in which the alkoxy is open is formed separately from the linear polymer. After taking a small sample and analyzing it with H-NMR and IR to check the residual ratio of methoxy, when the residual ratio is 20%, 10 parts by weight of 0.36 wt% HCl aqueous solution is slowly added dropwise to adjust the pH to acid. gave. Then, 1 part by weight of Phenyltrimethoxysilane was added dropwise at a time, stirred for 15 minutes, and then 20 parts by weight of the catalyst prepared in 1-a was added. After 4 hours of mixing and stirring, it was confirmed that a cage-type polymer was produced in the polymer. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum, so that the entire reactant was converted into an aqueous mixture. After 4 hours of mixing and stirring, a portion was taken and analyzed through 29 Si-NMR. As a result, the analysis peak of the structure introduced using a phenyl group appeared as two sharp peaks, and the AD polymer as in Formula 1 was 50% It could be confirmed that the above was manufactured. In addition, the molecular weight in terms of styrene was measured to be 11,000. 29 Si-NMR (CDCl 3 ) δ -68.2, -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
또한, 하기 표 7에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 1-b 및 1-c에서 사용한 방법을 대등하게 적용하였다.In addition, a silsesquioxane composite polymer was prepared by applying the monomers described in Table 7 below. At this time, the manufacturing method was equally applied to the method used in Examples 1-b and 1-c.
방법
practice
method
적용 단량체1-b method
Applicable monomer
적용 단량체1-c method
Applicable monomer
(Mw)Molecular Weight
(Mw)
상기 표 7에서 ECHETMS는 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS는 Glycidoxypropytrimethoxysilane, MAPTMS는 (methacryloyloxy)propyltrimethoxysilane, PTMS는 Phenyltrimethoxysilane, MTMS는 Methyltrimethoxysilane, ECHETMDS는 Di(epoxycyclohexyethyl) tetramethoxy disiloxane, GPTMDS는 Di(glycidoxypropyl) tetramethoxy disiloxane, MAPTMDS는 Di(methacryloyloxy)propy, PTMDS는 Di(phenyl) tetramethoxy disiloxane, MTMDS는 Di(Methyl) tetramethoxy disiloxane을 의미한다.
In Table 7 above, ECHETMS is 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS is Glycidoxypropytrimethoxysilane, MAPTMS is (methacryloyloxy)propyltrimethoxysilane, PTMS is Phenyltrimethoxysilane, MTMS is Methyltrimethoxysilane, ECHETMDS is Di(epoxycyclohexyethyl) tetramethoxy disiloxane, ECHETMDS is Di(epoxycyclohexyethyl) tetramethoxy disiloxane ) tetramethoxy disiloxane, MAPTMDS stands for Di(methacryloyloxy)propy, PTMDS stands for Di(phenyl)tetramethoxy disiloxane, and MTMDS stands for Di(Methyl)tetramethoxy disiloxane.
실시예 2Example 2 : 실세스퀴옥산 D-A-D 구조 복합 고분자의 합성: Synthesis of silsesquioxane D-A-D structure composite polymer
D-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였다. 촉매 및 선형구조의 제조는 실시예 1-a 및 1-b의 방법을 동일하게 사용하였으며, 이후 연속적 D-A-D 구조를 생성하기 위하여 아래의 방법으로 제조를 실시하였다.
The following examples were used to prepare a composite polymer having a DAD structure. For the preparation of the catalyst and the linear structure, the methods of Examples 1-a and 1-b were used in the same manner, and then, the preparation was carried out in the following manner in order to generate a continuous DAD structure.
[실시예 2-a] 과량의 연속적 cage 구조의 생성[Example 2-a] Creation of an excess of continuous cage structure
상기 실시예 1-b 혼합용액에 0.36 중량% HCl 수용액을 매우 천천히 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 실시예 1-b에서 사용된 Diphenyltetramethoxydisiloxane의 5배인 25 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 1시간 교반 후 실시예 1-a에서 제조된 촉매를 7 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, 선형고분자와는 별도로 alkoxy가 열려있는 D구조의 전구체가 형성된다. 소량의 샘플을 적취하여, H-NMR과 IR로 분석하여 methoxy의 잔존율을 확인한 후, 잔존율이 20% 일 때, 0.36 중량% HCl 수용액을 10 중량부 천천히 적가하여, pH를 산성으로 조절해 주었다. 이후 Phenyltrimethoxysilane 1 중량부를 한번에 적가하여 15분간 교반 후, 1-a에서 제조된 촉매 20 중량부를 첨가하였다. 4시간의 혼합교반 이후, 확인결과 고분자내에 cage 형태의 고분자가 생성됨을 확인 할 수 있었다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여, 전체적인 반응물이 수용액 혼합물로 변환되도록 하였다. 4시간의 혼합 교반 이후, 일부를 적취하여 29Si-NMR을 통해 분석한 결과 phenyl기를 이용해 도입된 구조의 분석피크가 날카로운 형태의 2개로 나타나고 별도로 잔존하는 부산물 없이 화학식 1과 같은 A-D 고분자가 제조되었음을 확인할 수 있었다. 또한 스티렌 환산 분자량은 14,000으로 측정되었다. 또한, Si-NMR 분석에서 A-D구조와는 달리 A구조의 말단에서 보이던 -68ppm 근방의 피크가 사라져, A구조의 말단이 D구조로 모두 변환되어 D-A-D구조로 생성됨을 확인 하였다. 29Si-NMR (CDCl3) δ -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad)
To the mixed solution of Example 1-b, 5 parts by weight of 0.36 wt% HCl aqueous solution was added dropwise very slowly, the pH was adjusted to have acidity, and the mixture was stirred at a temperature of 4 °C for 30 minutes. After that, 25 parts by weight, which is 5 times the amount of Diphenyltetramethoxydisiloxane used in Example 1-b, was added dropwise at a time to achieve stable hydrolysis, and after stirring for 1 hour, 7 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state to adjust the pH of the mixed solution. At this time, a precursor of the D structure in which the alkoxy is open is formed separately from the linear polymer. After taking a small sample and analyzing it with H-NMR and IR to check the residual ratio of methoxy, when the residual ratio is 20%, 10 parts by weight of 0.36 wt% HCl aqueous solution is slowly added dropwise to adjust the pH to acid. gave. Then, 1 part by weight of Phenyltrimethoxysilane was added dropwise at a time, stirred for 15 minutes, and then 20 parts by weight of the catalyst prepared in 1-a was added. After 4 hours of mixing and stirring, it was confirmed that a cage-type polymer was produced in the polymer. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed by vacuum, so that the entire reactant was converted into an aqueous mixture. After 4 hours of mixing and stirring, a portion was taken and analyzed through 29 Si-NMR. As a result, the analysis peaks of the structure introduced using a phenyl group appeared as two sharp shapes, indicating that an AD polymer as in Formula 1 was prepared without separately remaining by-products. could check In addition, the molecular weight in terms of styrene was measured to be 14,000. In addition, unlike the AD structure in the Si-NMR analysis, the peak near -68ppm that was seen at the end of the A structure disappeared, confirming that the end of the A structure was all converted to the D structure to form a DAD structure. 29 Si-NMR (CDCl 3 ) δ -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)
또한, 하기 표 8에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 2에서 사용한 방법을 대등하게 적용하였다.In addition, a silsesquioxane composite polymer was prepared by applying the monomers described in Table 8 below. At this time, the manufacturing method was equally applied to the method used in Example 2.
방법practice
method
적용 단량체1-b method
Applicable monomer
적용 단량체2-a method
Applicable monomer
(Mw)Molecular Weight
(Mw)
상기 표 8에서 ECHETMS는 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS는 Glycidoxypropytrimethoxysilane, MAPTMS는 (methacryloyloxy)propyltrimethoxysilane, PTMS는 Phenyltrimethoxysilane, MTMS는 Methyltrimethoxysilane, ECHETMDS는 Di(epoxycyclohexyethyl) tetramethoxy disiloxane, GPTMDS는 Di(glycidoxypropyl) tetramethoxy disiloxane, MAPTMDS는 Di(methacryloyloxy)propy, PTMDS는 Di(phenyl) tetramethoxy disiloxane, MTMDS는 Di(Methyl) tetramethoxy disiloxane을 의미한다.
In Table 8, ECHETMS is 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS is Glycidoxypropytrimethoxysilane, MAPTMS is (methacryloyloxy)propyltrimethoxysilane, PTMS is Phenyltrimethoxysilane, MTMS is Methyltrimethoxysilane, ECHETMDS is Di(epoxycyclohexyethyl) tetramethoxy disiloxane, ECHETMDS is Di(epoxycyclohexyethyl) tetramethoxy disiloxane ) tetramethoxy disiloxane, MAPTMDS stands for Di(methacryloyloxy)propy, PTMDS stands for Di(phenyl)tetramethoxy disiloxane, and MTMDS stands for Di(Methyl)tetramethoxy disiloxane.
실시예 3Example 3 : 실세스퀴옥산 E-A-D 구조 복합 고분자의 합성: Synthesis of silsesquioxane E-A-D structure composite polymer
E-A-D구조의 복합 고분자를 제조하기 위하여 아래의 실시예를 이용하였다. 촉매 및 선형구조의 제조는 실시예 1의 방법을 동일하게 사용하였으며, 이후 E-A-D 구조를 생성하기 위하여 아래의 방법으로 제조를 실시하였다.
The following examples were used to prepare EAD-structured composite polymers. The catalyst and the linear structure were prepared in the same manner as in Example 1, and then the EAD structure was prepared by the following method.
[실시예 3-a] 사슬 말단 E구조의 생성[Example 3-a] Generation of chain terminal E structure
실시예 1-c 에서 얻어진 A-D 혼합물에 별도의 정제 없이 메틸렌크로라이드 20 중량부를 적가하고, 0.36 중량% HCl 수용액을 5 중량부 적가하고, pH가 산성을 가지도록 조절하였으며, 4 ℃의 온도에서 30분간 교반하였다. 이후 dimethyltetramethoxysilane 1 중량부를 한번에 적가하였다. 이때, 아직 분자구조 내에서 가수분해되지 않고 존재하던 부분들이 용매와 분리된 산성 수용액 층에서 가수분해물로 쉽게 변환되며, 생성된 별도의 반응물과 유기용매 층에서 축합되어 말단단위에 E가 도입되었다. 5시간의 교반 후, 반응의 교반을 정지하고 상온으로 반응기의 온도를 조절 하였다.
To the AD mixture obtained in Example 1-c, 20 parts by weight of methylene chloride was added dropwise without separate purification, and 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted to have acidity, and the pH was adjusted to 30 at a temperature of 4°C. stirred for minutes. Then, 1 part by weight of dimethyltetramethoxysilane was added dropwise at a time. At this time, the parts that have not yet been hydrolyzed in the molecular structure are easily converted into hydrolysates in the acidic aqueous solution layer separated from the solvent, and are condensed with the generated separate reactants in the organic solvent layer to introduce E into the terminal unit. After stirring for 5 hours, the stirring of the reaction was stopped and the temperature of the reactor was adjusted to room temperature.
[실시예 3-b] 말단 E 구조에 cage 도입[Example 3-b] Incorporation of cage into end E structure
상기 실시예 3-a에서 얻어진 결과물의 유기층을 별도의 정제 없이 준비한 후, 3관능 단량체를 이용해서 말단을 cage구조로 변환하였다. 반응이 진행 중인 실시예 3-a 혼합용액에 Methyltrimethoxysilane 3 중량부를 한번에 적가하여, 안정적인 가수분해를 도모하고, 24시간 교반 후 실시예 1-a에서 제조된 촉매를 3 중량부 다시 첨가해 주어 염기성 상태로 혼합용액의 pH를 조절해 주었다. 이때, E 구조 말단에 cage 형태의 고분자가 도입되며, 반응기 내에서 연속적으로 반응이 진행되어 화학식 3과 같은 고분자가 형성된다. 그러나, 다른 부산물들과 함께 얻어지므로, 별도의 정제가 필요하였다. 이후, 상온으로 온도를 변화시키고, 혼합용액 내 테트라하이드로퓨란을 진공으로 제거하여 정제를 준비하였다.
After the organic layer obtained in Example 3-a was prepared without further purification, the ends were converted into a cage structure using a trifunctional monomer. 3 parts by weight of Methyltrimethoxysilane was added dropwise to the mixed solution of Example 3-a in which the reaction is in progress, to achieve stable hydrolysis, and after stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 1-a was added again to give a basic state to adjust the pH of the mixed solution. At this time, a cage-type polymer is introduced at the end of the E structure, and the reaction proceeds continuously in the reactor to form a polymer as shown in Chemical Formula 3. However, since it was obtained together with other by-products, separate purification was required. Thereafter, the temperature was changed to room temperature, and tetrahydrofuran in the mixed solution was removed in a vacuum to prepare a tablet.
[실시예 3-c] 침전 및 재결정을 통한 부산물 제거, 결과물의 수득[Example 3-c] Removal of by-products through precipitation and recrystallization, obtaining the result
상기 실시예 3-b에서 반응이 완료된 혼합물을 얻어낸 후, 증류수를 이용하여 세척하고, 증류수 층의 pH가 중성을 나타낼 때, 진공감압으로 용매를 완전히 제거하였다. 이후, 메탄올에 2회 침전하여, 미반응 단량체를 제거하고 테트라하이드로퓨란과 수용액이 9.5:0.5 중량비율로 혼합된 용매에 30 중량부로 녹여 -20 ℃의 온도에서 2일간 보관하였다. 이는 고분자에 도입되지 못하고, cage구조로 닫혀 버린 물질의 재결정을 도모하여, 정제가 쉽게 이루어지도록 하기 위함이다. After obtaining the mixture in which the reaction was completed in Example 3-b, the mixture was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed under reduced pressure. Thereafter, by precipitation twice in methanol, unreacted monomers were removed, and 30 parts by weight was dissolved in a solvent in which tetrahydrofuran and aqueous solution were mixed at a weight ratio of 9.5:0.5 and stored at a temperature of -20 °C for 2 days. This is to promote recrystallization of the material that cannot be introduced into the polymer and is closed in a cage structure, so that purification can be performed easily.
재결정 과정을 마치고 얻어진 고체물질들을 필터 후, 진공감압을 통해 화학식 3의 고분자를 여러 부산물과 함께 얻어짐을 확인하였다. 또한, GPC 결과를 NMR 결과와 비교할 때, 각 단계의 고분자 성장에서 단독으로 얻어지는 저분자가 없이 Sharp한 형태의 Cage 형태가 결과로 도출되는 것으로 미루어 보아, 복합 고분자가 문제없이 얻어질 수 있음을 확인할 수 있었다. 이때, 분자량은 스티렌환산 값으로 17,000이었으며, 특히 화학식 3의 결과는 다음과 같다. After filtering the solid materials obtained after the recrystallization process, it was confirmed that the polymer of Formula 3 was obtained along with various by-products through vacuum pressure reduction. In addition, when comparing the GPC result with the NMR result, it can be confirmed that a complex polymer can be obtained without problems, considering that a sharp cage form is derived as a result without a small molecule obtained alone in each stage of polymer growth. there was. At this time, the molecular weight was 17,000 in terms of styrene, and in particular, the result of Chemical Formula 3 is as follows.
29Si-NMR (CDCl3) δ -68.2, -71.8(sharp). -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad)
29 Si-NMR (CDCl 3 ) δ -68.2, -71.8 (sharp). -72.3(broad), -81.1(sharp), -80.8(sharp), -82.5(broad)
또한, 하기 표 9에 기술한 단량체들을 적용하여 실세스퀴옥산 복합 고분자를 제조하였다. 이때 제조 방법은 상기 실시예 3에서 사용한 방법을 대등하게 적용하였다.In addition, a silsesquioxane composite polymer was prepared by applying the monomers described in Table 9 below. At this time, the manufacturing method was equally applied to the method used in Example 3.
방법practice
method
적용 단량체1-b method
Applicable monomer
적용 단량체1-c method
Applicable monomer
방법
적용 단량체3-a
method
Applicable monomer
방법
적용단량체3-b
method
Applicable monomer
상기 표 9에서 ECHETMS는 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS는 Glycidoxypropytrimethoxysilane, MAPTMS는 (methacryloyloxy)propyltrimethoxysilane, PTMS는 Phenyltrimethoxysilane, MTMS는 Methyltrimethoxysilane, ECHETMDS는 Di(epoxycyclohexyethyl) tetramethoxy disiloxane, GPTMDS는 Di(glycidoxypropyl) tetramethoxy disiloxane, MAPTMDS는 Di(methacryloyloxy)propy, PTMDS는 Di(phenyl) tetramethoxy disiloxane, MTMDS는 Di(Methyl) tetramethoxy disiloxane을 의미한다.
In Table 9, ECHETMS is 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, GPTMS is Glycidoxypropytrimethoxysilane, MAPTMS is (methacryloyloxy)propyltrimethoxysilane, PTMS is Phenyltrimethoxysilane, MTMS is Methyltrimethoxysilane, ECHETMDS is Di(epoxycyclohexyethyl) tetramethoxy disiloxane ) tetramethoxy disiloxane, MAPTMDS stands for Di(methacryloyloxy)propy, PTMDS stands for Di(phenyl)tetramethoxy disiloxane, and MTMDS stands for Di(Methyl)tetramethoxy disiloxane.
실시예 4Example 4 : 실세스퀴옥산 복합고분자를 이용한 코팅조성물 제조 및 공정: Manufacturing and process of coating composition using silsesquioxane complex polymer
실시예 1, 2 및 3에서 얻어진 실세스퀴옥산 복합 고분자를 이용하여 그 자체로 경화공정을 유도하거나 코팅조성물을 제조하였다.
Using the silsesquioxane composite polymer obtained in Examples 1, 2 and 3, a curing process was induced by itself or a coating composition was prepared.
[실시예 4-1] 광경화형 코팅 조성물 제조[Example 4-1] Preparation of photocurable coating composition
상기 실시예 1에서 제조한 화학식 1로 표시되는 실세스퀴옥산 복합 고분자 20 g을 메틸에틸케톤에 20 중량%로 녹여 100 g의 코팅조성물을 제조하였다. 이후, 코팅 조성물 100 중량부에 디페닐요오드늄 5 중량부와 BYK-347 1 중량부를 첨가하고 10분간 교반하여 광경화형 코팅 조성물을 제조하였다.
A coating composition of 100 g was prepared by dissolving 20 g of the silsesquioxane complex polymer represented by Formula 1 prepared in Example 1 at 20 wt % in methyl ethyl ketone. Then, 5 parts by weight of diphenyliodonium and 1 part by weight of BYK-347 were added to 100 parts by weight of the coating composition and stirred for 10 minutes to prepare a photocurable coating composition.
[실시예 4-2] 광경화형 코팅 조성물의 경화[Example 4-2] Curing of photocurable coating composition
실시예 4-1에서 준비한 코팅 조성물을 SKC 사 PET 필름인 SKC-SG00L 250 um 필름에 도포하고, No.30-50 rod를 5단위로 구분하여 Mayer coating을 시행하였다. 이후, 80 ℃ 온도에서 10분간 용매를 제거하고, UV 장비를 이용하여 100 mW/cm2 램프에서 10초간 UV를 조사하여 결과물을 수득하였다.
The coating composition prepared in Example 4-1 was applied to SKC-SG00L 250 um film, which is SKC's PET film, and Mayer coating was performed by dividing the No. 30-50 rod into 5 units. Thereafter, the solvent was removed at a temperature of 80° C. for 10 minutes, and UV was irradiated for 10 seconds in a 100 mW/cm 2 lamp using UV equipment to obtain a result.
[실시예 4-3] 열경화형 코팅 조성물의 제조[Example 4-3] Preparation of thermosetting coating composition
실시예에서 제조한 화학식 3-1로 표시되는 실세스퀴옥산 복합 고분자 50 g을 메틸에틸케톤에 50 중량%로 녹여 100 g의 코팅조성물을 제조하였다. 이후, 준비된 코팅 조성물 100 중량부에 1,3-디아미노프로판 3 중량부와 BYK-357 및 BYK-348을 각 1 중량부씩 첨가하고 10분간 교반하여 열경화형 코팅 조성물을 제조하였다.
100 g of a coating composition was prepared by dissolving 50 g of the silsesquioxane composite polymer represented by Chemical Formula 3-1 prepared in Example at 50 wt % in methyl ethyl ketone. Thereafter, 3 parts by weight of 1,3-diaminopropane and 1 part by weight of BYK-357 and BYK-348 were added to 100 parts by weight of the prepared coating composition and stirred for 10 minutes to prepare a thermosetting coating composition.
[실시예 4-4] 열경화형 코팅 조성물의 경화[Example 4-4] Curing of thermosetting coating composition
실시예 4-3에서 준비한 코팅 조성물을 SKC 사 PET 필름인 SKC-SG00L 250 um 필름에 도포하고, No.30 ~ 50 로드(rod)를 5단위로 구분하여 메이어 코팅(Mayer coating)을 실시하였다. 코팅 후, 80 ℃의 건조오븐에서 10분간 경화 후 결과물을 수득하였다.
The coating composition prepared in Example 4-3 was applied to SKC-SG00L 250 um film, which is a PET film by SKC, and Mayer coating was performed by dividing No. 30 to 50 rods into 5 units. After coating, the result was obtained after curing for 10 minutes in a drying oven at 80 °C.
[실시예 4-5] 실시예를 통해 얻어낸 화학식 1, 2 및 3의 자체경화(self-curing)[Example 4-5] Self-curing of Chemical Formulas 1, 2 and 3 obtained through Examples
실시예 1, 2 및 3을 통해 얻어낸 결과물들을 별도의 조성 없이 열을 통해 경화하였다. SKC사 PET 필름인 SKC-SG00L 250 um 필름에 No.30 ~ 50 로드(rod)를 5단위로 구분하여 메이어 코팅(Mayer coating)을 실시하였으며, 100 ℃의 건조오븐에서 2시간 경화 후 결과물을 수득하였다.
The results obtained in Examples 1, 2 and 3 were cured through heat without a separate composition. The SKC-SG00L 250 um film, which is SKC's PET film, was divided into 5 units of No. 30 ~ 50 rods and subjected to Mayer coating, and the result was obtained after curing in a drying oven at 100 ° C for 2 hours. did
[실험예 1] [Experimental Example 1]
실시예 1을 통해 제조된 실세스퀴옥산 수지의 중량평균분자량 및 분자량 분포를 RI-2031 plus refractive index detector와 UV-2075 plus UV detector (254detection wavelength)이 장착된 JASCO PU-2080 plus SEC system을 사용하여 측정하였다. 40 ℃에서 유동율 1로 THF를 사용하였으며, 샘플은 4개의 컬럼(Shodex-GPC KF-802, KF-803, KF-804 및 KF-805)을 통해 분리하였다. 그 결과, 수득된 실세스퀴옥산은 SEC 분석에 의해 12,000의 중량 평균 분자량을 가지며, 분자량 분포가 1.8임을 확인하였다. The weight average molecular weight and molecular weight distribution of the silsesquioxane resin prepared in Example 1 was measured using a JASCO PU-2080 plus SEC system equipped with RI-2031 plus refractive index detector and UV-2075 plus UV detector (254detection wavelength). and measured. THF was used at a flow rate of 1 at 40 °C, and samples were separated through four columns (Shodex-GPC KF-802, KF-803, KF-804 and KF-805). As a result, it was confirmed by SEC analysis that the obtained silsesquioxane had a weight average molecular weight of 12,000 and a molecular weight distribution of 1.8.
[실험예 2][Experimental Example 2]
Perkin-Elmer FT-IR system Spectrum-GX의 ATR모드를 이용하여, IR을 측정하였다. FT-IR 분석결과 실시예 1-b 과정에서 소량 적취한 구조체에서 넓은 바이모달(연속적인 2중모양) 흡수 피크가 950 내지 1200 cm-1에서 나타났으며, 이는 실세스퀴옥산 사슬 중 수직(-Si-O-Si-R)과 수평(-Si-O-Si-) 방향에서 실록산 결합의 신축 진동(Stretching Vibration)으로부터 유래된 것이다. 이후, 1-c 에서 얻어진 구조체의 적취물을 분석한 결과 1200 cm-1에서 나타나는 피크가 더욱 성장한 것으로 보아 케이지형 구조의 치환을 확인할 수 있었다. 이는 실험예 1에서 분석된 GPC 분석결과와 연계분석 하였을 때, 바구니형 특성피크의 성장에도 불구하고, 실제 분자량이 낮은 수준인 케이지형이 (일반적으로 분자량 1,000~5,000 정도) 단독으로 관찰되지 않은 점을 미루어보아, 사슬 내에 예상된 구조로 도입되었음을 확인할 수 있었다.
IR was measured using the ATR mode of the Perkin-Elmer FT-IR system Spectrum-GX. As a result of FT-IR analysis, a broad bimodal (continuous double shape) absorption peak appeared at 950 to 1200 cm -1 in the structure taken in a small amount in the process of Example 1-b, which is a vertical ( -Si-O-Si-R) and the horizontal (-Si-O-Si-) direction are derived from the stretching vibration of the siloxane bond. Then, as a result of analyzing the extract of the structure obtained in 1-c, it was confirmed that the peak appearing at 1200 cm -1 was further grown, confirming the substitution of the cage-type structure. When this was analyzed in conjunction with the GPC analysis results analyzed in Experimental Example 1, despite the growth of the cage-shaped characteristic peak, the cage type with a low actual molecular weight (generally about 1,000 to 5,000 molecular weight) was not observed alone. It was confirmed that it was introduced in the expected structure in the chain.
[실험예 3][Experimental Example 3]
실시예 1, 2 및 3을 통해 제조된 구조체의 열적 안정성을 TGA(thermal gravimetric analyzer)를 사용하여 확인하였으며, 특히, 화학식 3-1의 에서 얻어진 복합 고분자의 측정하였다. 측정은, 질소 하 50-800 ℃의 10 ℃/min 스캔 속도에서 TGA를 통해 측정하였다. 측정 결과 말단에 케이지형 구조가 치환됨으로써, 100-200 ℃ 사이에서 분해되던 Si-OH 및 Si-OR의 분해량이 현격히 줄어들었음을 확인할 수 있었다.
The thermal stability of the structures prepared in Examples 1, 2 and 3 was confirmed using a thermal gravimetric analyzer (TGA), and in particular, the composite polymer obtained in Formula 3-1 was measured. Measurements were made via TGA at 10 °C/min scan rate of 50-800 °C under nitrogen. As a result of the measurement, it was confirmed that the amount of decomposition of Si-OH and Si-OR, which was decomposed between 100-200 °C, was significantly reduced by replacing the cage-type structure at the end.
[실험예 4][Experimental Example 4]
PC(아이콤포넌트 사 Glastic polycarbonate제품) SKC 사 PET 및 PMMA(COPAN 사 OAS-800 제품) 투명기판에 상기 표 7 내지 9에 기재된 고분자 수지를 이용하여 실시예 4에 기재된 방법과 동일한 방법으로 코팅 조성물을 코팅하고, 경화시켜 표면특성을 측정하였다. 하기 실험결과는 실시예 3에서 제조한 고분자 수지를 이용한 결과이며, 표에는 기재되지 않았지만 표 7 내지 9에 기재된 고분자 수지를 이용한 코팅조성물은 실시예 3의 고분자 수지와 대등한 결과를 나타내었다.
PC (I-Component's Glastic polycarbonate product) SKC's PET and PMMA (COPAN's OAS-800 product) Using the polymer resins shown in Tables 7 to 9 on a transparent substrate, the coating composition was prepared in the same manner as in Example 4. After coating and curing, the surface properties were measured. The following experimental results are results using the polymer resin prepared in Example 3, and although not described in the table, the coating compositions using the polymer resins described in Tables 7 to 9 showed comparable results to the polymer resin of Example 3.
- 표면경도측정 : 일반적으로 연필경도법(JIS 5600-5-4)은 일반적으로 500 g 하중으로 평가하는데 이보다 가혹조건인 1 kgf 하중으로 코팅면에 45도 각도로 연필을 매초 0.5 mm의 속도로 수평으로 3 mm 이동해서 코팅막을 긁어서 긁힌 흔적으로 평가하였다. 5회 실험으로 2회 이상 긁힌 흔적이 확인되지 않으면 상위의 경도의 연필을 선택하고 , 긁힌 흔적이 2회 이상 되면 연필을 선정하고 그 연필경도보다 한단 하위의 연필경도가 해당 코팅막의 연필경도로 평가하였다. 평가 결과는 10 um 이상의 코팅 두께에서 기판 종류에 상관없이 모두 유리수준의 9H 경도를 확인하였다.
- Surface hardness measurement : In general, the pencil hardness method (JIS 5600-5-4) is generally evaluated with a 500 g load. Under a harsher condition, a 1 kgf load, the pencil is horizontally 3 mm at a speed of 0.5 mm per second at a 45 degree angle to the coated surface. It moved and scraped the coating film and evaluated it as a scratch mark. If no traces of scratches are confirmed more than twice in 5 experiments, select a pencil of higher hardness, and if there are more than two scratches, select a pencil, and the pencil hardness one level lower than the pencil hardness is evaluated as the pencil hardness of the coating film did As a result of the evaluation, all glass-level 9H hardness was confirmed regardless of the substrate type at a coating thickness of 10 μm or more.
- Scratch test 측정: Steel wool #0000을 1 kgf로 400회 평가 Steel wool에 의한 마모 평가법(JIS K5600-5-9)은 1kg 정도 무게의 쇠망치의 선단에 #0000의 Steel wool을 감아서 15회 왕복 시험편을 문지르고 그 헤이즈를 값을 측정하는데 이보다 가혹한 조건인 400회 시험편을 문지르고 헤이즈 측정 및 현미경으로 육안 평가 진행하였다. 코팅두께가 5 um 이상의 코팅에서는 표면에 발생되는 스크레치에 대한 내성이 모두 우수한 것을 확인하였다.
- Scratch test measurement: Steel wool #0000 is evaluated 400 times at 1 kgf The wear evaluation method by steel wool (JIS K5600-5-9) is 15 times by winding #0000 steel wool around the tip of a hammer weighing about 1 kg. The reciprocating test piece was rubbed and the haze value was measured, and the test piece, which is a more severe condition, was rubbed 400 times, and the haze was measured and visually evaluated with a microscope. It was confirmed that all coatings with a coating thickness of 5 μm or more had excellent resistance to scratches on the surface.
- 접착력 평가(JIS K5600-5-6): 코팅막을 1-5 mm간격으로 컷터날로 긁어서 그 위에 셀로판테이프를 붙이고 붙인 테입을 잡아당겼을 때 이탈된 갯수로 접착성 판단하는데 이때 컷터날로 100개의 칸을 만들어 100개 중 떨어지는 개수로 접착성 판단 시행하였으며, 결과는 하기 표 10에 나타내었다. 표기는 100개중 떨어지지 않은 개수로 "(떨어지지 않은 개수/100)"로 표기 예제로 100개가 떨어지지 않으면 "(100/100)"로 표기 하였다. - Adhesion evaluation (JIS K5600-5-6): Scratch the coating film at intervals of 1-5 mm with a cutter blade and attach cellophane tape on it. Adhesiveness was judged by the number of falling pieces out of 100, and the results are shown in Table 10 below. The notation is "(Number that does not fall/100)" as the number that does not fall out of 100.
- 신뢰성 평가 : 85%, 85℃ 신뢰성 챔버에 240 시간 보관하고 휨 특성 평가하였다. 휨평가 기준은 신뢰성 평가전 ±0.1 mm 이내, 신뢰성평가 후 ±0.3 mm 이내, 신뢰성 보관 후 휨특성 평가 결과는 PET, PC, PMMA 모든 기재에 있어서 우수하였다. - Reliability evaluation : 85%, stored in a 85 ℃ reliability chamber for 240 hours and evaluated for bending characteristics. The warpage evaluation criteria were within ±0.1 mm before reliability evaluation, within ±0.3 mm after reliability evaluation, and the results of evaluation of bending characteristics after reliability storage were excellent in all substrates of PET, PC, and PMMA.
(100/100)pass
(100/100)
(100/100)pass
(100/100)
(100/100)pass
(100/100)
(Steel wool, 1kgf하중,
400회)Scratch test
(Steel wool, 1 kg f load,
400 times)
상기 표 10에 나타난 바와 같이 본 발명의 코팅조성물은 매우 우수한 표면경도와 광학적 특성을 보일 뿐만 아니라 기타 물성에 있어서도 동시에 우수함을 확인할 수 있다.As shown in Table 10, it can be confirmed that the coating composition of the present invention not only exhibits very excellent surface hardness and optical properties, but is also excellent in other physical properties.
Claims (21)
[화학식 1]
[화학식 2]
[화학식 3]
상기 화학식 1 내지 3에서,
A는 이고, D는 이고, E는 이며,
Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며,
X는 각각 독립적으로 R10 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,
R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며,
a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,
e는 1 또는 2이며,
n은 각각 독립적으로 1 내지 20의 정수이다.A silsesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 3:
[Formula 1]
[Formula 2]
[Formula 3]
In Formulas 1 to 3,
A is and D is and E is is,
Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
each X is independently R 10 or [(SiO 3/2 R) 4+2n R], at least one is [(SiO 3/2 R) 4+2n R],
R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group,
a and d are each independently an integer from 1 to 100,000,
e is 1 or 2,
n is each independently an integer from 1 to 20;
R, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10은 각각 독립적으로 아민기; 에폭시기; 사이클로헥실 에폭시기; (메타)아크릴기; 사이올기; 페닐기; 이소시아네이트기; 중수소, 할로겐, 아민기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 페닐기 또는 사이클로헥실에폭시기로 치환되거나 치환되지 않은 C1~C40의 알킬기 또는 C2~C40의 알케닐기인 것을 특징으로 하는 실세스퀴옥산 복합 고분자.According to claim 1,
R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 are each independently an amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; phenyl group; isocyanate group; Deuterium, halogen, amine group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group, phenyl group, or unsubstituted C 1 ~ C 40 alkyl group or C 2 ~ C 40 Silsesquioxane composite polymer, characterized in that it is an alkenyl group.
a는 3 내지 1000이고, d는 1 내지 500인 것을 특징으로 하는 실세스퀴옥산 복합 고분자.According to claim 1,
a is 3 to 1000, and d is 1 to 500 silsesquioxane composite polymer.
d는 2 내지 100인 것을 특징으로 하는 실세스퀴옥산 복합 고분자.According to claim 1,
d is a silsesquioxane composite polymer, characterized in that 2 to 100.
n 값의 평균이 4 내지 5인 것을 특징으로 하는 실세스퀴옥산 복합 고분자.According to claim 1,
Silsesquioxane composite polymer, characterized in that the average of n values is 4 to 5.
상기 화학식 1의 선형 실세스퀴옥산 복합 고분자의 중량평균분자량이 1,000 내지 1,000,000인 것을 특징으로 하는 선형 실세스퀴옥산 복합 고분자.According to claim 1,
Linear silsesquioxane composite polymer, characterized in that the weight average molecular weight of the linear silsesquioxane composite polymer of Formula 1 is 1,000 to 1,000,000.
[화학식 4]
[화학식 1]
상기 A는 이고, D는 이며,
상기 Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며,
상기 R, R1, R2, R6, R7 및 R9 은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며,
상기 a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,
상기 n은 각각 독립적으로 1 내지 20의 정수이다.A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; and a third step of performing a condensation reaction by converting the reaction solution to basic by adding a basic catalyst to the reactor after the second step. :
[Formula 4]
[Formula 1]
The A is and D is is,
Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
The R, R 1 , R 2 , R 6 , R 7 and R 9 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group,
Wherein a and d are each independently an integer of 1 to 100,000,
Each of n is independently an integer from 1 to 20.
[화학식 4]
[화학식 2]
상기 A는 이고, D는 이며,
상기 Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며,
상기 R, R1, R2, R3, R4, R6, R7 및 R9은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며,
상기 a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,
상기 n은 각각 독립적으로 1 내지 20의 정수이다.A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step and a second step of adding an organosilane compound to introduce the structure as shown in Chemical Formula 2, adjusting the reaction solution to acidity by adding an acid catalyst to the reactor, and then stirring; a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; and a fourth step of removing the single cage-forming structure through recrystallization and filtering after the third step.
[Formula 4]
[Formula 2]
The A is and D is is,
Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
Wherein R, R 1 , R 2 , R 3 , R 4 , R 6 , R 7 and R 9 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group,
Wherein a and d are each independently an integer of 1 to 100,000,
Each of n is independently an integer from 1 to 20.
[화학식 4]
[화학식 3]
상기 A는 이고, D는 이며, E는 이고,
상기 Y는 각각 독립적으로 O, NR9 또는 [(SiO3/2R)4+2nO]이며, 적어도 하나는 [(SiO3/2R)4+2nO]이며,
상기 X는 각각 독립적으로 R10 또는 [(SiO3/2R)4+2nR]이고, 적어도 하나는 [(SiO3/2R)4+2nR]이고,
상기 R, R1, R2, R5, R6, R7, R8, R9 및 R10은 각각 독립적으로 수소; 중수소; 할로겐; 아민기; 에폭시기; 사이클로헥실에폭시기; (메타)아크릴기; 사이올기; 이소시아네이트기; 니트릴기; 니트로기; 페닐기; 중수소, 할로겐, 아민기, 에폭시기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 또는 페닐기로 치환되거나 치환되지 않은, C1~C40의 알킬기, C2~C40의 알케닐기, C1~C40의 알콕시기, C3~C40의 시클로알킬기, C3~C40의 헤테로시클로알킬기, C6~C40의 아릴기, C3~C40의 헤테로아릴기, C7~C40의 아르알킬기, C6~C40의 아릴옥시기, 또는 C6~C40의 아릴사이올기이며,
상기 a 및 d는 각각 독립적으로 1 내지 100,000의 정수이고,
상기 e는 1 또는 2이며,
상기 n은 각각 독립적으로 1 내지 20의 정수이다.A first step of mixing a basic catalyst and an organic solvent in a reactor, then adding an organic silane compound and condensing to prepare the following Chemical Formula 4; and in Formula 4 after the first step a second step of adding an acid catalyst to the reactor to adjust the reaction solution to acidity to introduce the structure, then adding an organosilane compound and stirring; a third step of performing a condensation reaction by adding a basic catalyst to the reactor after the second step to convert the reaction solution to basic; and at the end of the composite polymer after the third step. In order to introduce the structure, an acid catalyst is introduced into the reactor to convert the reaction solution into an acidic atmosphere, and a fourth step of mixing and stirring an organosilane compound. manufacturing method;
[Formula 4]
[Formula 3]
The A is and D is and E is ego,
Y is each independently O, NR 9 or [(SiO 3/2 R) 4+2n O], at least one is [(SiO 3/2 R) 4+2n O],
wherein each X is independently R 10 or [(SiO 3/2 R) 4+2n R], and at least one is [(SiO 3/2 R) 4+2n R],
Wherein R, R 1 , R 2 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 are each independently hydrogen; heavy hydrogen; halogen; amine group; epoxy group; cyclohexyl epoxy group; (meth)acryl group; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Deuterium, halogen, amine group, epoxy group, (meth)acryl group, thiol group, isocyanate group, nitrile group, nitro group or unsubstituted, C 1 ~ C 40 alkyl group, C 2 ~ C 40 alke Nyl group, C 1 ~ C 40 alkoxy group, C 3 ~ C 40 cycloalkyl group, C 3 ~ C 40 heterocycloalkyl group, C 6 ~ C 40 aryl group, C 3 ~ C 40 heteroaryl group, C 7 ~ C 40 aralkyl group, C 6 ~ C 40 aryloxy group, or C 6 ~ C 40 aryl thiol group,
Wherein a and d are each independently an integer from 1 to 100,000,
wherein e is 1 or 2,
Each of n is independently an integer from 1 to 20.
상기 제1단계 및 제3단계 중 어느 한 단계에서 첨가되는 염기성 촉매는 2종 이상의 염기성 촉매의 혼합촉매이며,
상기 혼합촉매는 금속계 염기성 촉매 및 아민계 염기성 촉매를 포함하는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.9. The method of claim 8,
The basic catalyst added in any one of the first and third steps is a mixed catalyst of two or more basic catalysts,
The mixed catalyst is a method for producing a silsesquioxane composite polymer comprising a metal-based basic catalyst and an amine-based basic catalyst.
상기 아민계 염기성 촉매와 금속계 염기성 촉매의 비율이 10 내지 90: 10 내지 90 중량부로 구성되는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.12. The method of claim 11,
The method for producing a silsesquioxane composite polymer, characterized in that the ratio of the amine-based basic catalyst to the metal-based basic catalyst is 10 to 90: 10 to 90 parts by weight.
상기 제1단계 및 제3단계 중 어느 한 단계에서 첨가되는 염기성 촉매는 2종 이상의 염기성 촉매의 혼합촉매이며,
상기 혼합촉매는 금속계 염기성 촉매 및 아민계 염기성 촉매를 포함하는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.10. The method of claim 9,
The basic catalyst added in any one of the first and third steps is a mixed catalyst of two or more basic catalysts,
The mixed catalyst is a method for producing a silsesquioxane composite polymer comprising a metal-based basic catalyst and an amine-based basic catalyst.
상기 아민계 염기성 촉매와 금속계 염기성 촉매의 비율이 10 내지 90: 10 내지 90 중량부로 구성되는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.14. The method of claim 13,
The method for producing a silsesquioxane composite polymer, characterized in that the ratio of the amine-based basic catalyst to the metal-based basic catalyst is 10 to 90: 10 to 90 parts by weight.
상기 제1단계 및 제3단계 중 어느 한 단계에서 첨가되는 염기성 촉매는 2종 이상의 염기성 촉매의 혼합촉매이며,
상기 혼합촉매는 금속계 염기성 촉매 및 아민계 염기성 촉매를 포함하는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.11. The method of claim 10,
The basic catalyst added in any one of the first and third steps is a mixed catalyst of two or more basic catalysts,
The mixed catalyst is a method for producing a silsesquioxane composite polymer comprising a metal-based basic catalyst and an amine-based basic catalyst.
상기 아민계 염기성 촉매와 금속계 염기성 촉매의 비율이 10 내지 90: 10 내지 90 중량부로 구성되는 것을 특징으로 하는 실세스퀴옥산 복합 고분자의 제조방법.16. The method of claim 15,
The method for producing a silsesquioxane composite polymer, characterized in that the ratio of the amine-based basic catalyst to the metal-based basic catalyst is 10 to 90: 10 to 90 parts by weight.
상기 코팅 조성물은 무용제 타입인 것을 특징으로 하는 코팅 조성물.18. The method of claim 17,
The coating composition is a coating composition, characterized in that the solvent-free type.
제1항에 따른 실세스퀴옥산 복합 고분자;
개시제; 및
유기용매;
를 포함하는 것을 특징으로 하는 코팅 조성물.18. The method of claim 17,
The silsesquioxane composite polymer according to claim 1;
initiator; and
organic solvents;
A coating composition comprising a.
상기 실세스퀴옥산 복합 고분자가 코팅 조성물 100 중량부에 대하여 5 내지 90 중량부인 것을 특징으로 하는 코팅 조성물.20. The method of claim 19,
The coating composition, characterized in that the silsesquioxane composite polymer is 5 to 90 parts by weight based on 100 parts by weight of the coating composition.
상기 코팅조성물은 경화제, 가소제, 또는 자외선 차단제를 추가로 포함하는것을 특징으로 하는 코팅 조성물.20. The method of claim 19,
The coating composition is a coating composition, characterized in that it further comprises a curing agent, a plasticizer, or a sunscreen.
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