KR102358312B1 - 소결된 다결정성 입방정 질화 붕소 물질 - Google Patents
소결된 다결정성 입방정 질화 붕소 물질 Download PDFInfo
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- KR102358312B1 KR102358312B1 KR1020217000948A KR20217000948A KR102358312B1 KR 102358312 B1 KR102358312 B1 KR 102358312B1 KR 1020217000948 A KR1020217000948 A KR 1020217000948A KR 20217000948 A KR20217000948 A KR 20217000948A KR 102358312 B1 KR102358312 B1 KR 102358312B1
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- 239000000463 material Substances 0.000 title claims abstract description 82
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 20
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 20
- 239000000843 powder Substances 0.000 claims abstract description 110
- 239000011159 matrix material Substances 0.000 claims abstract description 100
- 239000002245 particle Substances 0.000 claims abstract description 98
- 239000002243 precursor Substances 0.000 claims abstract description 68
- 238000000034 method Methods 0.000 claims abstract description 38
- 238000002156 mixing Methods 0.000 claims abstract description 24
- 239000011812 mixed powder Substances 0.000 claims abstract description 11
- 238000005245 sintering Methods 0.000 claims abstract description 11
- 238000000227 grinding Methods 0.000 claims description 54
- 239000002904 solvent Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000002105 nanoparticle Substances 0.000 claims description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 42
- 238000009826 distribution Methods 0.000 description 20
- 239000002131 composite material Substances 0.000 description 11
- 239000012535 impurity Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 239000002775 capsule Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 6
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 5
- 229910033181 TiB2 Inorganic materials 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 239000011858 nanopowder Substances 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
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- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000013074 reference sample Substances 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 238000002525 ultrasonication Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 150000003609 titanium compounds Chemical group 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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Abstract
Description
도 1은 소결된 PCBN 물질을 제조하는 공지된 예시적 방법을 나타내는 흐름도이다;
도 2는 도 1에 나타낸 단계에 따라 제조된 예시적 소결된 PCBN 물질을 나타내는 현미경 사진이다;
도 3은 탄화 텅스텐 함량을 실질적으로 가지지 않는 소결된 PCBN 물질의 제조 방법의 예시적 단계를 나타내는 흐름도이다;
도 4는 크게 감소된 탄화 텅스텐 함량을 갖는 소결된 PCBN 물질의 제조 방법의 예시적 단계를 나타내는 흐름도이다;
도 5는 탄화 텅스텐을 가지지 않는 소결된 PCBN 물질의 제조 방법의 예시적 단계를 나타내는 흐름도이다;
도 6은 크게 감소된 탄화 텅스텐 함량을 갖는 소결된 PCBN 물질의 제조 방법의 예시적 단계를 나타내는 흐름도이다;
도 7은 탄화 텅스텐을 갖지 않도록 제조된 샘플의 주사 전자 현미경 사진이다;
도 8은 매우 낮은 탄화 텅스텐을 갖도록 제조된 샘플의 주사 전자 현미경 사진이다;
도 9는 마찰 분쇄를 사용하여 제조된 종래 기술의 PCBN 물질에 대한 탄화 텅스텐의 존재를 나타내는 X-선 회절 트레이스이다;
도 10은 단지 결합제 전구체 분말 상에 마찰 분쇄를 사용하여 제조된 예시적 PCBN 물질에 대한 탄화 텅스텐의 존재를 나타내는 X-선 회절 트레이스이다;
도 11은 H05 기계 가공 시험에서 PCBN 물질을 사용하여 제조된 공구에 대해 측정된 플랭크 내마모성을 나타낸다;
도 12는 H05 기계 가공 시험에서 PCBN 물질을 사용하여 제조된 공구에 대해 측정된 크레이터(crater) 내마모성을 나타낸다.
Claims (5)
- 사전 마찰 분쇄 없이, 50 nm 내지 100nm의 평균 입자 크기를 갖는 나노-입자를 포함하는 나노-매트릭스 전구체 분말을 제공하는 단계;
나노-매트릭스 전구체 분말을 초음파 혼합기를 사용하여 친밀히 혼합하는 단계;
0.2 μm 이상의 평균 입자 크기를 갖는 입방정 질화 붕소(cBN) 입자를 포함하는 cBN 분말을 제공하는 단계;
상기 나노-매트릭스 전구체 분말 및 상기 cBN 분말을 친밀히 혼합하는 단계; 및
상기 친밀히 혼합된 분말을 1100℃ 이상의 온도 및 3.5 GPa 이상의 압력에서 소결하여 매트릭스 물질에 분산된 cBN 입자를 포함하는 다결정성 입방정 질화 붕소(PCBN) 물질을 형성하는 단계
를 포함하는 PCBN 물질의 제조 방법으로서,
상기 나노-매트릭스 전구체 분말 및 cBN 분말을 친밀히 혼합하는 단계가
나노-매트릭스 전구체 분말 및 cBN 분말을 용매에 분산시킴;
상기 용매, 나노-매트릭스 전구체 분말 및 cBN 분말을 초음파 혼합기를 사용하여 혼합함; 및
상기 용매를 제거하여 나노-매트릭스 전구체 입자 및 cBN 입자의 친밀히 혼합된 분말을 남김
으로 구성되는, PCBN 물질의 제조 방법. - 제1항에 있어서,
0.2 내지 15 μm의 평균 크기를 갖는 cBN 입자를 제공하는 단계를 포함하는, 방법. - 제1항에 있어서,
1 μm 초과의 평균 크기를 갖는 cBN 입자를 제공하는 단계를 포함하는, 방법. - 제1항에 있어서,
5 내지 10 μm 범위의 평균 크기를 갖는 cBN 입자를 제공하는 단계를 포함하는, 방법. - 제1항에 있어서,
매트릭스 물질이 티타늄 및 알루미늄 중 어느 하나의 화합물로부터 선택된 물질을 포함하는, 방법.
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GBGB1609672.9A GB201609672D0 (en) | 2016-06-02 | 2016-06-02 | Sintered polycrystalline cubic boron nitride material |
GB1609672.9 | 2016-06-02 | ||
PCT/EP2017/063104 WO2017207601A1 (en) | 2016-06-02 | 2017-05-31 | Sintered polycrystalline cubic boron nitride material |
KR1020187034764A KR20190003696A (ko) | 2016-06-02 | 2017-05-31 | 소결된 다결정성 입방정 질화 붕소 물질 |
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GB201913252D0 (en) * | 2019-09-13 | 2019-10-30 | Element Six Uk Ltd | Sintered polycrystalline cubic boron nitride material |
CN110922192A (zh) * | 2019-11-20 | 2020-03-27 | 天津大学 | 一种聚晶立方氮化硼刀具材料 |
GB202001174D0 (en) * | 2020-01-28 | 2020-03-11 | Element Six Uk Ltd | Polycrystalline cubic boron nitride material |
GB202001369D0 (en) * | 2020-01-31 | 2020-03-18 | Element Six Ltd | Polycrystalline cubic boron nitride material |
CN112500178B (zh) * | 2020-12-08 | 2022-11-04 | 郑州大学 | 一种原位生成ZrB2-SiC增韧PcBN刀具及其制备方法 |
CN114349517A (zh) * | 2021-12-17 | 2022-04-15 | 燕山大学 | cBN-B4C复合材料及其制备方法 |
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GB201609672D0 (en) | 2016-07-20 |
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WO2017207601A1 (en) | 2017-12-07 |
US11518717B2 (en) | 2022-12-06 |
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