KR102357819B1 - 원통형 스퍼터링 타깃 - Google Patents
원통형 스퍼터링 타깃 Download PDFInfo
- Publication number
- KR102357819B1 KR102357819B1 KR1020207003482A KR20207003482A KR102357819B1 KR 102357819 B1 KR102357819 B1 KR 102357819B1 KR 1020207003482 A KR1020207003482 A KR 1020207003482A KR 20207003482 A KR20207003482 A KR 20207003482A KR 102357819 B1 KR102357819 B1 KR 102357819B1
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- South Korea
- Prior art keywords
- sputtering target
- backing tube
- bonding layer
- cylindrical sputtering
- target material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005477 sputtering target Methods 0.000 title claims abstract description 129
- 239000013077 target material Substances 0.000 claims abstract description 72
- 230000002093 peripheral effect Effects 0.000 claims abstract description 42
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 description 23
- 238000010828 elution Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 14
- 239000010408 film Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000003628 erosive effect Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 238000001125 extrusion Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007542 hardness measurement Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- -1 SUS304 Inorganic materials 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010622 cold drawing Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001192 hot extrusion Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3423—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
도 2 는, 직경 방향의 열저항의 계산 방법을 나타내는 설명도이다.
도 3 은, 접합층과 배킹 튜브의 접합 강도의 측정 방법을 나타내는 설명도이다.
11 : 원통 형상의 스퍼터링 타깃재
12 : 배킹 튜브
13 : 접합층
Claims (5)
- 원통 형상을 이루는 스퍼터링 타깃재와, 이 스퍼터링 타깃재의 내주측에 접합층을 개재하여 접합된 배킹 튜브를 구비한 원통형 스퍼터링 타깃으로서,
상기 배킹 튜브에 있어서의 직경 방향의 열저항이 6.5 × 10-5 K/W 이하이고,
상기 접합층의 외주면에서부터 상기 배킹 튜브의 내주면까지의 직경 방향의 열저항이 1.2 × 10-4 K/W 이하이고,
상기 배킹 튜브는, 비커스 경도가 100 Hv 이상인 것을 특징으로 하는 원통형 스퍼터링 타깃. - 제 1 항에 있어서,
상기 접합층과 상기 배킹 튜브의 접합 강도가 4 ㎫ 이상인 것을 특징으로 하는 원통형 스퍼터링 타깃. - 제 1 항 또는 제 2 항에 있어서,
상기 배킹 튜브는, 구리 합금으로 구성되어 있는 것을 특징으로 하는 원통형 스퍼터링 타깃. - 삭제
- 삭제
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2017/032230 WO2019049254A1 (ja) | 2017-09-07 | 2017-09-07 | 円筒型スパッタリングターゲット |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20200051581A KR20200051581A (ko) | 2020-05-13 |
KR102357819B1 true KR102357819B1 (ko) | 2022-02-08 |
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KR1020207003482A Active KR102357819B1 (ko) | 2017-09-07 | 2017-09-07 | 원통형 스퍼터링 타깃 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR102357819B1 (ko) |
CN (1) | CN111032904A (ko) |
WO (1) | WO2019049254A1 (ko) |
Families Citing this family (1)
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CN111286704B (zh) * | 2020-04-13 | 2024-12-24 | 合肥江丰电子材料有限公司 | 一种便于与设备连接的一体型旋转靶材 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012162759A (ja) * | 2011-02-04 | 2012-08-30 | Sumitomo Metal Mining Co Ltd | 円筒形スパッタリングターゲット |
JP2017131541A (ja) | 2016-01-29 | 2017-08-03 | セイコーエプソン株式会社 | 熱流センサー及び検出単位体 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0539566A (ja) * | 1991-02-19 | 1993-02-19 | Mitsubishi Materials Corp | スパツタリング用ターゲツト及びその製造方法 |
JP3896422B2 (ja) * | 1996-10-08 | 2007-03-22 | Dowaメタルテック株式会社 | バッキングプレート用銅合金およびその製造方法 |
JP3896431B2 (ja) * | 1996-10-08 | 2007-03-22 | Dowaメタルテック株式会社 | 銅または銅合金の製造方法 |
JP6089983B2 (ja) | 2012-07-18 | 2017-03-08 | 三菱マテリアル株式会社 | 円筒形スパッタリングターゲットおよびその製造方法 |
JP6218106B2 (ja) * | 2013-06-28 | 2017-10-25 | 株式会社リコー | 光学モジュール、光走査装置、画像形成装置、及び光学モジュールの製造方法 |
CN105624622B (zh) * | 2014-11-26 | 2018-02-09 | 宁波江丰电子材料股份有限公司 | 靶材组件的制造方法 |
JP5887625B1 (ja) * | 2015-03-27 | 2016-03-16 | Jx金属株式会社 | 円筒型スパッタリングターゲット、円筒型焼結体、円筒型成形体及びそれらの製造方法 |
JP6756283B2 (ja) * | 2016-04-12 | 2020-09-16 | 三菱マテリアル株式会社 | 円筒型スパッタリングターゲット |
-
2017
- 2017-09-07 KR KR1020207003482A patent/KR102357819B1/ko active Active
- 2017-09-07 WO PCT/JP2017/032230 patent/WO2019049254A1/ja active Application Filing
- 2017-09-07 CN CN201780093699.2A patent/CN111032904A/zh active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012162759A (ja) * | 2011-02-04 | 2012-08-30 | Sumitomo Metal Mining Co Ltd | 円筒形スパッタリングターゲット |
JP2017131541A (ja) | 2016-01-29 | 2017-08-03 | セイコーエプソン株式会社 | 熱流センサー及び検出単位体 |
Also Published As
Publication number | Publication date |
---|---|
WO2019049254A1 (ja) | 2019-03-14 |
KR20200051581A (ko) | 2020-05-13 |
CN111032904A (zh) | 2020-04-17 |
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