KR102346796B1 - Cover window plate and manufacturing method thereof - Google Patents
Cover window plate and manufacturing method thereof Download PDFInfo
- Publication number
- KR102346796B1 KR102346796B1 KR1020150124916A KR20150124916A KR102346796B1 KR 102346796 B1 KR102346796 B1 KR 102346796B1 KR 1020150124916 A KR1020150124916 A KR 1020150124916A KR 20150124916 A KR20150124916 A KR 20150124916A KR 102346796 B1 KR102346796 B1 KR 102346796B1
- Authority
- KR
- South Korea
- Prior art keywords
- cover window
- window substrate
- base film
- coating layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 26
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 23
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- 229910010272 inorganic material Inorganic materials 0.000 claims description 17
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Abstract
본 발명은 커버 윈도우 기판에 관한 것으로서, 보다 상세하게는 고분자 기재 필름의 적어도 일면에 유무기 하이브리드 하드코팅층을 포함하고, 적어도 하나의 단부에 곡면부를 포함하며, 1kg 하중하 연필 경도가 4H 이상을 만족함으로써, 고온·고습의 가혹 조건에서 기판의 휨 발생을 현저히 감소시켜 제품에 적용시 우수한 내구성 및 광학 특성을 구현할 수 있으며, 기판의 평탄한 부분과 동등 수준의 물성을 가지는 곡면부를 포함함으로써, 다양한 형상의 제품에 적용할 수 있는 커버 윈도우 기판 및 이의 제조 방법에 관한 것이다. The present invention relates to a cover window substrate, and more particularly, includes an organic-inorganic hybrid hard coating layer on at least one surface of a polymer base film, a curved portion at at least one end, and a pencil hardness of 4H or more under a load of 1 kg. By doing so, it is possible to significantly reduce the occurrence of warpage of the substrate in harsh conditions of high temperature and high humidity, and realize excellent durability and optical properties when applied to products. It relates to a cover window substrate applicable to a product and a manufacturing method thereof.
Description
본 발명은 커버 윈도우 기판 및 이의 제조 방법에 관한 것으로서, 보다 구체적으로, 고온·고습의 조건하에서도 기판의 휨 발생을 최소화한 커버 윈도우 기판에 관한 것이다.The present invention relates to a cover window substrate and a method of manufacturing the same, and more particularly, to a cover window substrate in which warpage of the substrate is minimized even under conditions of high temperature and high humidity.
최근 다양한 디스플레이 장치들은 스크래치 또는 외부 충격으로부터 디스플레이 패널을 보호하고자 디스플레이 패널 위에 디스플레이 보호용 윈도우 커버를 구비하고 있으며, 대부분의 경우 디스플레이용 강화 유리를 윈도우 커버로 사용하고 있다. 디스플레이용 강화 유리는 일반적인 유리 보다 얇지만, 높은 강도와 함께 긁힘에 강하게 제작되어 있는 특징이 있다.Recently, various display devices have a window cover for display protection on the display panel to protect the display panel from scratches or external impact, and in most cases, tempered glass for display is used as the window cover. Tempered glass for display is thinner than general glass, but it has high strength and is strong against scratches.
하지만 강화 유리는 무게가 무거워 휴대 기기의 경량화에 적합하지 못한 단점을 가지고 있을 뿐 아니라, 외부 충격에 취약하여 쉽게 깨지지 않는 성질(unbreakable)을 구현하기 어려우며, 일정 수준 이상 구부러지지 않아 구부리거나(bendable) 접을 수 있는(foldable) 기능을 가지는 휘는(flexible) 디스플레이 소재로서 적합하지 않다.However, tempered glass has a disadvantage that it is not suitable for reducing the weight of portable devices due to its heavy weight, and it is difficult to implement an unbreakable property because it is vulnerable to external shocks, and it is not bent over a certain level and is bendable. It is not suitable as a flexible display material having a foldable function.
최근에는 유연성 및 내충격성을 확보하는 동시에 강화 유리에 상응하는 강도 또는 내스크래치성을 가지는 광학용 플라스틱 커버에 대한 검토가 다양하게 진행되고 있다. 일반적으로 강화 유리에 비해 유연성을 가지는 광학용 투명 플라스틱 커버 소재로는 폴리에틸렌테레프탈레이트(PET),폴리에테르설폰(PES),폴리에틸렌나프탈레이트(PEN), 폴리아크릴레이트(PAR), 폴리카보네이트(PC), 폴리이미드(PI), 폴리아라미드(PA)등이 있다. 하지만, 이들 고분자 플라스틱 기판의 경우, 디스플레이 보호용 윈도우 커버로 사용되는 강화 유리에 비해 경도 및 내스크래치성 측면에서 부족한 물성을 나타낼 뿐 아니라, 내충격성도 충분하지 못하다. 때문에 이들 플라스틱 기판에 복합 수지 조성물을 코팅함으로써 요구되는 물성들을 보완하고자 하는 다양한 시도가 진행되고 있다.In recent years, various studies have been conducted on optical plastic covers having strength or scratch resistance corresponding to tempered glass while securing flexibility and impact resistance. In general, as for the optical transparent plastic cover material, which has more flexibility than tempered glass, polyethylene terephthalate (PET), polyether sulfone (PES), polyethylene naphthalate (PEN), polyacrylate (PAR), polycarbonate (PC) , polyimide (PI), and polyaramid (PA). However, in the case of these polymer plastic substrates, compared to tempered glass used as a window cover for display protection, not only exhibit insufficient physical properties in terms of hardness and scratch resistance, but also insufficient impact resistance. Therefore, various attempts are being made to supplement the required physical properties by coating the composite resin composition on these plastic substrates.
일반적인 하드 코팅의 경우, (메타)아크릴레이트((metha)acrylate) 또는 에폭시(epoxy) 등의 광경화형 관능기가 포함된 수지와 경화제 또는 경화 촉매 및 기타 첨가제로 이루어진 조성물을 이용하며, 특히 고관능기의 복합 수지의 경우, 이를 광학용 플라스틱 기재 필름 위에 코팅하여 경도 및 내스크래치성이 향상된 디스플레이 보호용 윈도우로의 사용이 가능하다.In the case of a general hard coating, a composition consisting of a resin containing a photocurable functional group such as (metha)acrylate or epoxy, a curing agent or a curing catalyst and other additives is used, and in particular, In the case of the composite resin, it can be used as a display protection window with improved hardness and scratch resistance by coating it on an optical plastic base film.
하지만, 일반적인 (메타)아크릴레이트 또는 에폭시 고관능기 광경화형 복합 수지의 경우, 강화 유리에 상응하는 고경도를 구현하기 어려울 뿐만 아니라, 경화 시 수축에 의한 컬(curl) 현상이 크게 발생하고, 유연성 또한 충분하지 않아 플렉서블 디스플레이에 적용하기 위한 보호용 윈도우 기판으로는 적합하지 못한 단점이 있다.However, in the case of general (meth)acrylate or epoxy high-functional group photocurable composite resin, it is difficult to realize high hardness corresponding to tempered glass, and curling phenomenon due to shrinkage occurs greatly during curing, and flexibility is also There is a disadvantage in that it is not sufficient as a protective window substrate for application to a flexible display.
한국공개특허 제2013-74167호에는 플라스틱 기판이 개시되어 있다.Korean Patent Application Laid-Open No. 2013-74167 discloses a plastic substrate.
본 발명은 비유리 제품이면서도 고경도를 구현할 수 있는 커버 윈도우 기판을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a cover window substrate capable of realizing high hardness while being a non-glass product.
본 발명은 고온·고습의 가혹 조건에서도 휨 발생을 최소화한 커버 윈도우 기판을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a cover window substrate that minimizes warpage even under severe conditions of high temperature and high humidity.
본 발명은 다양한 형상의 제품에 적용 가능한 소정 곡면부를 가지는 커버 윈도우 기판을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a cover window substrate having a predetermined curved portion applicable to products of various shapes.
또한, 본 발명은 상기 커버 윈도우 기판의 제조 방법을 제공하는 것을 목적으로 한다.Another object of the present invention is to provide a method for manufacturing the cover window substrate.
또한, 본 발명은 상기 커버 윈도우 기판을 구비하는 화상표시장치를 제공하는 것을 목적으로 한다.Another object of the present invention is to provide an image display device including the cover window substrate.
1. 고분자 기재 필름의 적어도 일면에 유무기 하이브리드 하드코팅층을 포함하고, 적어도 하나의 단부에 곡면부를 포함하며, 1kg 하중하 연필 경도가 4H 이상인, 커버 윈도우 기판.1. A cover window substrate comprising an organic-inorganic hybrid hard coating layer on at least one surface of the polymer base film, a curved portion at at least one end, and a pencil hardness of 4H or higher under a load of 1 kg.
2. 위 1에 있어서, 상기 1kg 하중하 연필 경도는 6H 이상인, 커버 윈도우 기판.2. The cover window substrate according to 1 above, wherein the pencil hardness under a load of 1 kg is 6H or more.
3. 위 1에 있어서, 상기 곡면부의 곡률 반경은 5mm 내지 15mm인, 커버 윈도우 기판.3. The cover window substrate according to 1 above, wherein a radius of curvature of the curved portion is 5 mm to 15 mm.
4. 위 1에 있어서, 상기 하드코팅층은 나노 실리카, 비닐트리메톡시실란, 비닐트리에톡시실란, 글리시독시프로필메틸디메톡시실란, 에폭시사이클로헥실에틸트리메톡시실란, 글리시독시프로필트리메톡시실란, 글리시독시프로필트리에톡시실란, 메타크릴록시프로필트리메톡시실란 및 메타크릴록시프로필트리에톡시실란으로 이루어진 군에서 선택되는 적어도 1종의 무기 화합물을 포함하는, 커버 윈도우 기판.4. In the above 1, the hard coating layer is nano silica, vinyltrimethoxysilane, vinyltriethoxysilane, glycidoxypropylmethyldimethoxysilane, epoxycyclohexylethyltrimethoxysilane, glycidoxypropyltrimethyl A cover window substrate comprising at least one inorganic compound selected from the group consisting of oxysilane, glycidoxypropyltriethoxysilane, methacryloxypropyltrimethoxysilane and methacryloxypropyltriethoxysilane.
5. 위 4에 있어서, 상기 하드코팅층은 중합성 화합물, 중합 개시제 및 용매를 더 포함하는 하드코팅층 형성용 조성물로 제조된, 커버 윈도우 기판.5. The cover window substrate according to 4 above, wherein the hard coat layer is made of a composition for forming a hard coat layer further comprising a polymerizable compound, a polymerization initiator, and a solvent.
6. 위 5에 있어서, 상기 무기 화합물은 중합성 화합물 100 중량부 대비 100 내지 260중량부로 포함되는, 커버 윈도우 기판.6. The cover window substrate according to 5 above, wherein the inorganic compound is included in an amount of 100 to 260 parts by weight based on 100 parts by weight of the polymerizable compound.
7. 위 5에 있어서, 상기 중합성 화합물은 퍼플루오로알킬아크릴레이트,하이드록시에틸(메타)아크릴레이트, 헥산디올디아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 트리프로필렌글리콜디아크릴레이트, 트리메틸올프로판트리옥시에틸(메타)아크릴레이트, 트리사이크로데칸디메탄올디아크릴레이트 및 디펜타에리트리톨핵사(메타)아크릴레이트로 이루어진 군에서 선택된 적어도 1종인, 커버 윈도우 기판.7. In the above 5, the polymerizable compound is perfluoroalkyl acrylate, hydroxyethyl (meth) acrylate, hexanediol diacrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) ) acrylate, ethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, tripropylene glycol diacrylate, trimethylolpropane trioxyethyl (meth)acrylate, tricyclodecanedi At least one selected from the group consisting of methanol diacrylate and dipentaerythritol hexa(meth)acrylate, the cover window substrate.
8. 위 1에 있어서, 상기 하드코팅층의 수접촉각은 80° 내지 120°인, 커버 윈도우 기판.8. The cover window substrate according to the above 1, wherein the water contact angle of the hard coating layer is 80° to 120°.
9. 위 1에 있어서, 상기 하드코팅층의 두께는 10㎛ 내지 40㎛인, 커버 윈도우 기판.9. The cover window substrate according to the above 1, wherein the hard coating layer has a thickness of 10 μm to 40 μm.
10. 위 1에 있어서, 상기 고분자 기재 필름은 폴리메틸(메타)아크릴레이트(PMMA), 폴리카보네이트(PC), 폴리에틸렌테레프탈레이트(PET), 폴리이미드(PI), 폴리아미드(PA), 사이클로올레핀폴리머(COP), 사이클로올레핀코폴리머(COC), PMMA/PC코폴리머 및 PMMA/PC/PMMA코폴리머 중 적어도 1종을 포함하는, 커버 윈도우 기판.10. The above 1, wherein the polymer base film is polymethyl (meth) acrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), polyamide (PA), cycloolefin A cover window substrate comprising at least one of a polymer (COP), a cycloolefin copolymer (COC), a PMMA/PC copolymer, and a PMMA/PC/PMMA copolymer.
11. 위 1에 있어서, 상기 고분자 기재 필름의 두께는 0.2mm 내지 1.0mm인, 커버 윈도우 기판.11. The cover window substrate according to the above 1, wherein the thickness of the polymer-based film is 0.2 mm to 1.0 mm.
12. 위 1에 있어서, 상기 고분자 기재 필름의 하드코팅층이 형성된 면의 타면에 비표시부 차광층을 더 포함하는, 커버 윈도우 기판.12. The cover window substrate of 1 above, further comprising a non-display light blocking layer on the other surface of the surface on which the hard coating layer of the polymer base film is formed.
13. 위 1에 있어서, 양면에 각각 보호필름을 더 포함하는, 커버 윈도우 기판.13. The cover window substrate according to the above 1, further comprising a protective film on both surfaces.
14. 위 13에 있어서, 60℃, 90%RH의 조건에서 상기 상부면의 보호필름의 수축률은 100ppm이하이고, 하부면의 보호필름의 수축률은 100ppm이상인, 커버 윈도우 기판.14. The cover window substrate according to the above 13, wherein under the conditions of 60°C and 90%RH, the shrinkage ratio of the protective film on the upper surface is 100ppm or less, and the shrinkage ratio of the protective film on the lower surface is 100ppm or more.
15. 위 13에 있어서, 85℃, 85%RH의 조건에서 상기 상부면의 보호필름의 수축률은 100ppm이하이고, 하부면의 보호필름의 수축률은 100ppm이상인, 커버 윈도우 기판.15. The cover window substrate according to the above 13, wherein the shrinkage ratio of the protective film on the upper surface is 100 ppm or less, and the shrinkage ratio of the protective film on the lower surface is 100 ppm or more under the conditions of 85°C and 85%RH.
16. 위 1에 있어서, 상기 기판을 60℃, RH90%에 방치 후, 하드코팅층이 위를 향하도록 두고 상온(25℃)에서 측정한 휨량은 -1.0mm(역컬) 내지 +1.0mm(정컬)인, 커버 윈도우 기판.16. In the above 1, after leaving the substrate at 60 ℃, RH90%, the amount of warpage measured at room temperature (25 ℃) with the hard coating layer facing upward is -1.0mm (reverse curl) to +1.0mm (normal curl) phosphorus, cover window substrate.
17. 위 1에 있어서, 상기 기판을 85℃, RH85%에 방치 후, 하드코팅층이 위를 향하도록 두고 상온(25℃)에서 측정한 휨량은 -1.0mm(역컬) 내지 +1.0mm(정컬)인, 커버 윈도우 기판.17. In the above 1, after leaving the substrate at 85 ℃, RH85%, the amount of warpage measured at room temperature (25 ℃) with the hard coating layer facing upward is -1.0mm (reverse curl) to +1.0mm (normal curl) phosphorus, cover window substrate.
18. 고분자 기재 필름의 적어도 일면에 무기 화합물을 포함하는 유무기 하이브리드 코팅층 형성용 조성물을 도포하여 유무기 하이브리드 하드코팅층을 형성하는 단계(S1); 및 18. Forming an organic-inorganic hybrid hard coating layer by applying a composition for forming an organic-inorganic hybrid coating layer comprising an inorganic compound on at least one surface of the polymer-based film (S1); and
상기 유무기 하이브리드 코팅층 형성 후에, 기재 필름의 적어도 하나의 단부로부터 소정 간격 이격된 부분을 열처리하면서 상기 단부에 압력을 가하여 상기 단부가 가압되는 방향으로 휘어져 곡면부를 형성하는 단계(S2);를 포함하는, 커버 윈도우 기판의 제조 방법.After forming the organic-inorganic hybrid coating layer, heat-treating a portion spaced a predetermined distance from at least one end of the base film while applying pressure to the end portion to form a curved portion by bending the end portion in a pressurized direction (S2); including; , a method of manufacturing a cover window substrate.
19. 위 18에 있어서, 상기 (S1) 단계 전에 상기 고분자 기재 필름을 고분자의 열변형온도(HDT)의 ±20 또는 유리전이온도(Tg)의 ±20℃ 의 조건 하에서 열처리하는 단계를 더 포함하는, 커버 윈도우 기판의 제조 방법.19. The method of 18 above, further comprising the step of heat-treating the polymer base film under the conditions of ±20 of the heat deflection temperature (HDT) or ±20°C of the glass transition temperature (Tg) of the polymer before the step (S1). , a method of manufacturing a cover window substrate.
20. 위 18에 있어서, 상기 고분자 기재 필름은 90℃ 내지 110℃에서 120분 내지 240분간 열처리 단계(S1-1)를 거친 것인, 커버 윈도우 기판의 제조 방법.20. The method for manufacturing a cover window substrate according to the above 18, wherein the polymer base film is subjected to a heat treatment step (S1-1) at 90° C. to 110° C. for 120 minutes to 240 minutes.
21. 위 20에 있어서, 상기 고분자 기재 필름은 상기 열처리 단계(S1-1) 후, 25 내지 60℃에서 1분 내지 15분간 냉각하는 단계(S1-2)를 거친 것인, 커버 윈도우 기판의 제조 방법.21. The manufacturing of a cover window substrate according to the above 20, wherein after the heat treatment step (S1-1), the polymer base film is cooled at 25 to 60° C. for 1 minute to 15 minutes (S1-2) Way.
22. 위 21에 있어서, 상기 (S1-2) 단계 후 상기 (S1-2) 단계의 냉각 온도보다 더 낮은 온도에서 냉각하는 단계(S1-3)를 더 거친 것인, 커버 윈도우 기판의 제조 방법.22. The method of manufacturing a cover window substrate according to the above 21, wherein after the step (S1-2), the step (S1-3) of cooling at a temperature lower than the cooling temperature of the step (S1-2) is further performed. .
23. 위 18에 있어서, 상기 (S2) 단계의 열처리는 열풍 분사로 수행되는, 커버 윈도우 기판의 제조 방법.23. The method of manufacturing a cover window substrate according to the above 18, wherein the heat treatment in step (S2) is performed by hot air spraying.
24. 위 18에 있어서, 상기 (S2) 단계의 열처리는 100℃ 내지 350℃에서 수행되는, 커버 윈도우 기판의 제조 방법.24. The method of manufacturing a cover window substrate according to the above 18, wherein the heat treatment in step (S2) is performed at 100°C to 350°C.
25. 위 18에 있어서, 상기 (S2) 단계에서, 25. The above 18, in the step (S2),
상기 기재 필름의 열풍이 분사되는 지점의 타면에 커버 윈도우 기판을 지지하는 곡률 형성부가 배치되고, 상기 단부의 일면에서 가압부가 상기 단부를 가압하고, 열풍 분사 지점을 기준으로 상기 단부의 타측은 고정부로 고정되는, 커버 윈도우 기판의 제조 방법.A curvature forming part for supporting the cover window substrate is disposed on the other surface of the base film at a point where the hot air is sprayed, the pressing part presses the end on one surface of the end, and the other side of the end is a fixing part based on the hot air spraying point A method of manufacturing a cover window substrate that is fixed to
26. 위 1 내지 17 중 어느 한 항의 커버 윈도우 기판을 구비하는 화상표시장치.26. An image display device having the cover window substrate of any one of 1 to 17 above.
본 발명의 커버 윈도우 기판은 고분자 비유리 제품이면서도 고경도를 구현할 수 있어, 제품의 경량화를 구현하기 적합하며, 제조 원가 또한 낮아 경제성이 매우 뛰어나다.The cover window substrate of the present invention can realize high hardness even though it is a non-glass polymer product, so it is suitable for realizing the weight reduction of the product, and the manufacturing cost is also low, so that it is very economical.
본 발명의 커버 윈도우 기판은 광학적 물성 및 기계적 물성이 모두 뛰어난 곡면부를 포함하여, 다양한 형상의 제품에 적용 가능하다. The cover window substrate of the present invention can be applied to products of various shapes, including curved portions having excellent optical and mechanical properties.
본 발명의 커버 윈도우 기판은 고온·고습의 가혹 조건에서 기판의 휨 발생을 현저히 감소시켜 제품에 적용시 우수한 내구성 및 광학 특성을 나타낸다.The cover window substrate of the present invention remarkably reduces the occurrence of warpage of the substrate under severe conditions of high temperature and high humidity, thereby exhibiting excellent durability and optical properties when applied to products.
본 발명의 커버 윈도우 기판은 별도의 지문방지층을 구비하지 않아도 표면의 내지문 성능(Anti-finger)이 뛰어나다.The cover window substrate of the present invention has excellent anti-fingerprint performance on the surface even without a separate anti-fingerprint layer.
본 발명의 커버 윈도우 기판의 제조 방법은 곡면부를 포함한 기판의 전체가 동등 수준의 우수한 물성을 나타내는 윈도우 기판을 제조할 수 있다.The method of manufacturing a cover window substrate of the present invention can manufacture a window substrate in which the entire substrate including the curved portion exhibits excellent physical properties at the same level.
도 1은 본 발명의 일 실시예에 따른 커버 윈도우 기판을 개략적으로 나타낸 것이다.
도 2는 본 발명에서 곡면부의 형상 측정 기준을 나타낸 것이다.
도 3은 본 발명의 일 실시예에 따른 커버 윈도우 기판의 곡면부 형성 공정에 사용되는 장치를 개략적으로 나타낸 것이다.
도 4는 본 발명에서 휨 발생을 측정하는 기준을 나타낸 것이다.1 schematically shows a cover window substrate according to an embodiment of the present invention.
2 is a view showing the standard for measuring the shape of the curved portion in the present invention.
3 schematically illustrates an apparatus used in a process for forming a curved portion of a cover window substrate according to an embodiment of the present invention.
Figure 4 shows a criterion for measuring the occurrence of warpage in the present invention.
본 발명은 커버 윈도우 기판에 관한 것으로서, 보다 상세하게는 고분자 기재 필름의 적어도 일면에 유무기 하이브리드 하드코팅층을 포함하고, 적어도 하나의 단부에 곡면부를 포함하며, 1kg 하중하 연필 경도가 4H 이상을 만족함으로써, 고온·고습의 가혹 조건에서 기판의 휨 발생을 현저히 감소시켜 제품에 적용시 우수한 내구성 및 광학 특성을 구현할 수 있으며, 기판의 평탄한 부분과 동등 수준의 물성을 가지는 곡면부를 포함함으로써, 다양한 형상의 제품에 적용할 수 있는 커버 윈도우 기판 및 이의 제조 방법에 관한 것이다. The present invention relates to a cover window substrate, and more particularly, includes an organic-inorganic hybrid hard coating layer on at least one surface of a polymer base film, a curved portion at at least one end, and a pencil hardness of 4H or more under a load of 1 kg. By doing so, it is possible to significantly reduce the occurrence of warpage of the substrate in harsh conditions of high temperature and high humidity, and realize excellent durability and optical properties when applied to products. It relates to a cover window substrate applicable to a product and a manufacturing method thereof.
이하, 본 발명을 보다 상세히 설명하기로 한다.Hereinafter, the present invention will be described in more detail.
고분자 기재 필름을 기반으로 커버 윈도우 기판을 제조하는 경우, 강도 향상의 측면에서 필름의 표면에 하드코팅층을 형성할 수 있다. 그러나, 기재 필름을 이루는 고분자가 가지는 고유의 수축률 및 기재 필름 제조시 열변화에 의해 잔류되는 응력 등에 의해 고온·고습의 가혹 조건에서 각 층이 들뜨는 휨 현상이 발생하는 문제가 있으며, 이러한 휨 발생으로 제품의 내구성이 저하되고 구현하고자 하는 화상의 시인성을 저하시키는 문제가 있다.In the case of manufacturing the cover window substrate based on the polymer base film, a hard coating layer may be formed on the surface of the film in terms of strength improvement. However, due to the inherent shrinkage of the polymer constituting the base film and the stress remaining due to thermal change during the manufacture of the base film, there is a problem in that each layer is lifted under severe conditions of high temperature and high humidity. There is a problem in that the durability of the product is lowered and the visibility of the image to be implemented is lowered.
또한, 다양한 형상의 디스플레이에 적용하기위해 기판에 소정 곡면부를 형성하는 경우, 가온 및 가압 공정에 의해 곡면부의 고분자가 변형되거나 각 층이 들뜨는 현상이 발생할 수 있으며, 이로 인하여 기판의 평탄한 부분 대비 곡면부에서 광학 특성 및 내구성이 현저히 저하되는 문제가 있었다.In addition, when a predetermined curved portion is formed on the substrate to be applied to a display of various shapes, the polymer of the curved portion may be deformed or each layer may be lifted due to the heating and pressurization process, which may cause the curved portion compared to the flat portion of the substrate There was a problem in that the optical properties and durability were significantly reduced.
이에, 본 발명은 고분자 기재 필름의 표면에 특정 강도값을 가지는 유무기 하이브리드 하드코팅층을 형성함으로써, 고온 고습 조건하에서 휨 현상을 현저히 감소시켜 전술한 문제를 해결하였으며, 아울러, 단부에 평탄부와 동일한 물성을 나타내는 곡면부를 포함비함으로써, 다양한 형상의 제품에 적용할 수 있게 하였다. 또한, 상기 하드코팅층에 의해 표면의 내지문성(Anti-finger)도 구현할 수 있다.Accordingly, the present invention solves the above problem by forming an organic-inorganic hybrid hard coating layer having a specific strength value on the surface of the polymer base film, remarkably reducing the warpage under high-temperature, high-humidity conditions. By including a curved portion showing physical properties, it can be applied to products of various shapes. In addition, anti-finger properties of the surface may be implemented by the hard coating layer.
<커버 <cover 윈도우window 기판> Substrate>
본 발명에 따른 커버 윈도우 기판은 고분자 기재 필름 및 유무기 하이브리드 하드코팅층을 포함하며, 적어도 하나의 단부에 곡면부를 포함한다. 또한, 상기 유무기 하이브리드 하드코팅층은 상기 고분자 기재 필름의 적어도 일면에 형성되어 기판의 표면 1kg 하중하 연필 경도가 4H이상을 나타내게 된다.The cover window substrate according to the present invention includes a polymer base film and an organic-inorganic hybrid hard coating layer, and includes a curved portion at at least one end. In addition, the organic-inorganic hybrid hard coating layer is formed on at least one surface of the polymer base film to exhibit a pencil hardness of 4H or more under a load of 1 kg on the surface of the substrate.
본 발명자는 커버 윈도우 기판에 적합한 1kg 하중하 연필 경도 값이 4H 이상임을 도출하였으며, 종래 고분자 필름에 기반한 기판의 경우, 상기 조건 하에서 4H 이상의 연필 경도를 만족하지 못하고 있다.The present inventors have derived that the pencil hardness value under 1 kg load suitable for the cover window substrate is 4H or more, and in the case of a substrate based on a conventional polymer film, it does not satisfy the pencil hardness of 4H or more under the above conditions.
본 발명에 따른 커버 윈도우 기판은 유무기 하이브리드 하드코팅층을 포함함으로써, 1kg 하중하 연필 경도가 4H 이상을 구현할 수 있게 하였다. 상기 기판의 연필 경도가 4H 미만인 경우, 커버 기판으로 충분한 강도를 내지 못하며, 1kg 하중하 연필 경도가 6H 이상인 경우, 전술한 효과가 더욱 향상될 수 있다.The cover window substrate according to the present invention includes an organic-inorganic hybrid hard coating layer, so that the pencil hardness under 1 kg load can be implemented to be 4H or more. When the pencil hardness of the substrate is less than 4H, the cover substrate does not provide sufficient strength, and when the pencil hardness under 1 kg load is 6H or more, the above-described effect can be further improved.
본 발명에서, 상기 1kg 하중하 연필 경도는 기판 전체 표면이 나타내는 물성으로, 즉, 상기 곡면부 및 곡면부가 형성되지 않은 평탄한 부분 전체가 나타내는 물성이다. In the present invention, the pencil hardness under a load of 1 kg is a physical property represented by the entire surface of the substrate, that is, a physical property represented by the curved portion and the entire flat portion on which the curved portion is not formed.
본 발명에 따른 상기 곡면부는 기판의 적어도 하나의 단부에 형성되는 것으로서, 소정 곡률 반경을 가지도록 형성되어, 다양한 형상의 제품에 적용할 수 있게 한다.The curved portion according to the present invention is formed on at least one end of the substrate, and is formed to have a predetermined radius of curvature, so that it can be applied to products of various shapes.
도 1은 본 발명의 일 실시예에 따른 커버 윈도우 기판을 개략적으로 나타낸 것이다.1 schematically shows a cover window substrate according to an embodiment of the present invention.
본 발명에 따른 곡면부의 형성 위치는 특별히 한정되지 않으며, 도 1에 도시된 바와 같이, 기판 단변 방향의 양 단부에 형성될 수 있으며, 이외에도 제품이 요구하는 형상에 따라 기판 장변 방향의 일 단부, 기판 단변 방향의 일 단부 또는 이들의 양 단부에 형성될 수 있다.The formation position of the curved portion according to the present invention is not particularly limited, and as shown in FIG. 1 , it may be formed at both ends in the short side direction of the substrate. It may be formed at one end or both ends thereof in the short side direction.
도 2는 본 발명에 따른 곡면부의 형상을 측정하는 기준을 나타낸 것이다.Figure 2 shows a reference for measuring the shape of the curved portion according to the present invention.
본 발명에 따른 곡면부의 형상은 특별히 한정되지 않으며, 도 2에 도시된 바와 같이, 소정 길이로, 소정 곡률 반경을 갖도록 형성될 수 있다. 상기 곡면부가 5mm 내지 15mm의 곡률 반경을 가지는 경우, 기판의 평탄한 부분과 동등 수준의 물성을 구현하기에 더욱 적합한 것으로 판단된다.The shape of the curved portion according to the present invention is not particularly limited, and as shown in FIG. 2 , it may be formed to have a predetermined length and a predetermined radius of curvature. When the curved portion has a radius of curvature of 5 mm to 15 mm, it is determined that it is more suitable for realizing the same level of physical properties as the flat portion of the substrate.
본 발명의 커버 윈도우 기판은 유무기 하이브리드 하드코팅층을 구비함으로써, 곡면부의 형상에 무관하게 기판의 전체에서 우수한 내구성 및 광학 특성을 구현할 수 있다.Since the cover window substrate of the present invention includes an organic-inorganic hybrid hard coating layer, excellent durability and optical properties can be realized throughout the substrate regardless of the shape of the curved portion.
본 발명에 따른 유무기 하이브리드 하드코팅층은 유기 화합물과 무기 화합물이 조합되어 형성된 것으로서, 상기 하드코팅층의 연필 경도는 사용되는 유무기 화합물의 종류, 혼합 비율(무기 화합물:중합성 화합물), 코팅층 형성시 공정 조건 등을 조절함으로써, 구현될 수 있다.The organic-inorganic hybrid hard coating layer according to the present invention is formed by combining an organic compound and an inorganic compound, and the pencil hardness of the hard coating layer is determined by the type of organic-inorganic compound used, the mixing ratio (inorganic compound: polymerizable compound), and when the coating layer is formed. It can be implemented by adjusting process conditions and the like.
상기 유무기 하이브리드 하드코팅층은 무기 화합물, 중합성 화합물, 중합 개시제 및 용매를 더 포함하는 유무기 하이브리드 코팅층 형성용 조성물을 고분자 기재 필름에 도포하여 형성된 것일 수 있다.The organic-inorganic hybrid hard coating layer may be formed by applying a composition for forming an organic-inorganic hybrid coating layer further comprising an inorganic compound, a polymerizable compound, a polymerization initiator, and a solvent to a polymer base film.
본 발명에서 사용 가능한 무기 화합물의 종류는 특별히 한정되지 않으나, 예를 들면, 나노 실리카, 비닐트리메톡시실란, 비닐트리에톡시실란, 글리시독시프로필메틸디메톡시실란, 에폭시사이클로헥실에틸트리메톡시실란, 글리시독시프로필트리메톡시실란, 글리시독시프로필트리에톡시실란, 메타크릴록시프로필트리메톡시실란, 메타크릴록시프로필트리에톡시실란을 등을 사용할 수 있다. 특히, 비닐트리메톡시실란, 비닐트리에톡시실란, 메타크릴록시프로필트리메톡시실란, 메타크릴록시프로필트리에톡시실란 바람직하며, 이들은 단독으로 또는 2종 이상 혼합되어 사용될 수 있다.The type of inorganic compound usable in the present invention is not particularly limited, but for example, nano silica, vinyltrimethoxysilane, vinyltriethoxysilane, glycidoxypropylmethyldimethoxysilane, epoxycyclohexylethyltrimethoxy silane, glycidoxypropyltrimethoxysilane, glycidoxypropyltriethoxysilane, methacryloxypropyltrimethoxysilane, methacryloxypropyltriethoxysilane, etc. can be used. In particular, vinyltrimethoxysilane, vinyltriethoxysilane, methacryloxypropyltrimethoxysilane, and methacryloxypropyltriethoxysilane are preferable, and these may be used alone or in combination of two or more.
상기 무기 화합물의 함량은 특별히 한정되지 않으나, 예를 들면, 중합성 화합물 100중량부에 대하여, 100 내지 260 중량부로 포함될 수 있으며, 상기 함량 범위로 포함되는 경우, 유기 화합물과 무기 화합물이 적정 비율로 혼합되어 전체 구조의 압축성을 향상시켜 코팅두께의 박막화를 할 수 있으며, 고분자 기재 필름과의 밀착성이 향상될 수 있고, 코팅층의 평탄성 및 고경도를 구현할 수 있다. 이에 따라, 고온 고습의 조건에서 휨 현상을 최소화할 수 있으며, 곡면부 형성시에도 우수한 내구성을 구현할 수 있으며, 표면의 내지문성도 향상시킬 수 있는 것으로 판단된다.The content of the inorganic compound is not particularly limited, but, for example, may be included in an amount of 100 to 260 parts by weight based on 100 parts by weight of the polymerizable compound. It is mixed to improve the compressibility of the entire structure, so that the coating thickness can be thinned, the adhesion with the polymer base film can be improved, and the flatness and high hardness of the coating layer can be realized. Accordingly, it is determined that warpage can be minimized under conditions of high temperature and high humidity, excellent durability can be realized even when forming a curved surface, and fingerprint resistance of the surface can be improved.
또한, 상기 무기 화합물은 바람직하게는 120 내지 220 중량부로 포함된 것일 수 있으며, 이 경우, 경도를 강화 효과가 더욱 향상될 수 있다.In addition, the inorganic compound may be preferably included in an amount of 120 to 220 parts by weight, and in this case, the effect of strengthening the hardness may be further improved.
본 발명에서 사용 가능한 중합성 화합물의 종류는 특별히 한정되지 않으나, 아크릴레이트계 모노머를 포함하여 중합된 것일 수 있으며, 구체적으로 상기 아크릴레이트계 모노머는 퍼플로로알킬아크릴레이트, 하이드록시에틸(메타)아크릴레이트, 헥산디올디아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 트리프로필렌글리콜디아크릴레이트, 트리메틸올프로판트리옥시에틸(메타)아크릴레이트, 트리사이크로데칸디메탄올디아크릴레이트 및 디펜타에리트리톨핵사(메타)아크릴레이트 등 들 수 있고, 이들은 단독으로 또는 2종 이상 혼합되어 사용될 수 있다. The kind of polymerizable compound that can be used in the present invention is not particularly limited, but may be polymerized including an acrylate-based monomer, and specifically, the acrylate-based monomer is perfluoroalkyl acrylate, hydroxyethyl (meth) Acrylate, hexanediol diacrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, ethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate , tripropylene glycol diacrylate, trimethylolpropane trioxyethyl (meth) acrylate, tricyclodecane dimethanol diacrylate, and dipentaerythritol hexa(meth) acrylate, and these are singly or in two More than one species may be mixed and used.
또한, 상기 중합성 화합물은 내지문성의 향상 측면에서 불소계 바인더 수지를 사용하는 것이 바람직하며, 예를 들면, 퍼플루오로알킬아크릴레이트 등 포함하여 중합된 수지를 사용하는 것이 보다 바람직하다.In addition, as the polymerizable compound, it is preferable to use a fluorine-based binder resin in terms of improving anti-fingerprint properties, and, for example, it is more preferable to use a polymerized resin including perfluoroalkyl acrylate.
본 발명에서 사용 가능한 중합 개시제의 종류는 특별히 한정되지 않으나, 예를 들면, 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물, 티오크산톤계 화합물, 옥심에스테르계 화합물로 이루어진 군에서 선택된 적어도 1종의 화합물을 사용할 수 있으며, 바람직하게는 옥심에스테르계 화합물을 사용하는 것이 바람직하다.The kind of polymerization initiator that can be used in the present invention is not particularly limited, but for example, an acetophenone-based compound, a benzophenone-based compound, a triazine-based compound, a biimidazole-based compound, a thioxanthone-based compound, or an oxime ester-based compound. At least one compound selected from the group consisting of may be used, and preferably, an oxime ester-based compound is used.
상기 아세토페논계 화합물의 구체적인 예를 들면, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온, 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. Specific examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1-[4-(2) -Hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropane-1- One, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propane -1-one, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one, and the like.
상기 벤조페논계 화합물의 구체적인 예를 들면, 벤조페논, o-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. Specific examples of the benzophenone-based compound include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3',4,4'-tetra (tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
상기 트리아진계 화합물의 구체적인 예를 들면, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. Specific examples of the triazine-based compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4 -Bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran- 2-yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5- Triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloro and romethyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine.
상기 비이미다졸계 화합물의 구체적인 예를 들면, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4’5,5’-테트라페닐-1,2’-비이미다졸 또는 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있으며, 바람직하게는 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4’5,5’-테트라페닐-1,2’-비이미다졸 등을 들 수 있다.Specific examples of the biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2, 3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl) Biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(trialkoxyphenyl)biimidazole, 2,2-bis(2,6-dichlorophenyl) -4,4'5,5'-tetraphenyl-1,2'-biimidazole or an imidazole compound in which the phenyl group at the 4,4',5,5' position is substituted with a carboalkoxy group; and preferably 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4 ,4',5,5'-tetraphenylbiimidazole, 2,2-bis(2,6-dichlorophenyl)-4,4'5,5'-tetraphenyl-1,2'-biimidazole, etc. can be heard
상기 티오크산톤계 화합물의 구체적인 예를 들면, 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.Specific examples of the thioxanthone-based compound include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone and the like.
상기 옥심에스테르계 화합물의 구체적인 예를 들면, o-에톡시카르보닐-α-옥시이미노-1-페닐프로판-1-온, 1,2-옥타디온,-1-(4-페닐치오)페닐,-2-(o-벤조일옥심), 에타논,-1-(9-에틸)-6-(2-메틸벤조일-3-일)-,1-(o-아세틸옥심) 등을 들 수 있으며, 시판품으로 CGI-124(시바가이기사), CGI-224(시바가이기사), Irgacure OXE-01(BASF사), Irgacure OXE-02(BASF사), N-1919(아데카사), NCI-831(아데카사) 등이 있다.Specific examples of the oxime ester compound include: o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one, 1,2-octadione,-1-(4-phenylthio)phenyl; -2-(o-benzoyloxime), ethanone,-1-(9-ethyl)-6-(2-methylbenzoyl-3-yl)-,1-(o-acetyloxime), and the like; Commercially available products include CGI-124 (Shiba Geigisa), CGI-224 (Ciba Geigisa), Irgacure OXE-01 (BASF), Irgacure OXE-02 (BASF), N-1919 (Adeka), NCI-831 ( Adecas), etc.
또한, 상기 광중합 개시제(C)는 본 발명의 감광성 수지 조성물의 감도를 향상시키기 위해서, 광중합 개시 보조제를 더 포함할 수 있다. 본 발명에 따른 감광성 수지 조성물은 광중합 개시 보조제를 함유함으로써, 감도가 더욱 높아져 생산성을 향상시킬 수 있다.In addition, the photopolymerization initiator (C) may further include a photopolymerization initiation adjuvant in order to improve the sensitivity of the photosensitive resin composition of the present invention. The photosensitive resin composition according to the present invention contains a photopolymerization initiation adjuvant, thereby further increasing the sensitivity and improving productivity.
본 발명에서 사용 가능한 용매의 종류는 특별히 한정되지 않으나, 예를 들면, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르 및 에틸렌글리콜모노부틸에테르와 같은 에틸렌글리콜모노알킬에테르류; 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜에틸메틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류; 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류; 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알킬렌글리콜알킬에테르아세테이트류; 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르 등의 프로필렌글리콜모노알킬에테르류; 프로필렌글리콜디메틸에테르, 프로필렌글리콜디에틸에테르, 프로필렌글리콜에틸메틸에테르, 프로필렌글리콜디프로필에테르프로필렌글리콜프로필메틸에테르, 프로필렌글리콜에틸프로필에테르 등의 프로필렌글리콜디알킬에테르류; 프로필렌글리콜메틸에테르프로피오네이트, 프로필렌글리콜에틸에테르프로피오네이트, 프로필렌글리콜프로필에테르프로피오네이트, 프로필렌글리콜부틸에테르프로피오네이트 등의 프로필렌글리콜알킬에테르프로피오네이트류; 메톡시부틸알코올, 에톡시부틸알코올, 프로폭시부틸알코올, 부톡시부틸알코올 등의 부틸디올모노알킬에테르류; 메톡시부틸아세테이트, 에톡시부틸아세테이트, 프로폭시부틸아세테이트, 부톡시부틸아세테이트 등의 부탄디올모노알킬에테르아세테이트류; 메톡시부틸프로피오네이트, 에톡시부틸프로피오네이트, 프로폭시부틸프로피오네이트, 부톡시부틸프로피오네이트 등의 부탄디올모노알킬에테르프로피오네이트류; 디프로필렌글리콜디메틸에테르, 디프로필렌글리콜디에틸에테르, 디프로필렌글리콜메틸에틸에테르 등의 디프로필렌글리콜디알킬에테르류; 벤젠, 톨루엔, 자일렌, 메시틸렌 등의 방향족 탄화수소류; 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤류; 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류; 아세트산메틸, 아세트산에틸, 아세트산프로필, 아세트산부틸, 2-히드록시프로피온산에틸, 2-히드록시-2-메틸프로피온산메틸, 2-히드록시-2-메틸프로피온산에틸, 히드록시아세트산메틸, 히드록시아세트산에틸, 히드록시아세트산부틸, 락트산메틸, 락트산에틸, 락트산프로필, 락트산부틸, 3-히드록시프로피온산메틸, 3-히드록시프로피온산에틸, 3-히드록시프로피온산프로필, 3-히드록시프로피온산부틸, 2-히드록시-3-메틸부탄산메틸, 메톡시아세트산메틸, 메톡시아세트산에틸, 메톡시아세트산프로필, 메톡시아세트산부틸, 에톡시아세트산메틸, 에톡시아세트산에틸, 에톡시아세트산프로필, 에톡시아세트산부틸, 프로폭시아세트산메틸, 프로폭시아세트산에틸, 프로폭시아세트산프로필, 프로폭시아세트산부틸, 부톡시아세트산메틸, 부톡시아세트산에틸, 부톡시아세트산프로필, 부톡시아세트산부틸, 2-메톡시프로피온산메틸, 2-메톡시프로피온산에틸, 2-메톡시프로피온산프로필, 2-메톡시프로피온산부틸, 2-에톡시프로피온산메틸, 2-에톡시프로피온산에틸, 2-에톡시프로피온산프로필, 2-에톡시프로피온산부틸, 2-부톡시프로피온산메틸, 2-부톡시프로피온산에틸, 2-부톡시프로피온산프로필, 2-부톡시프로피온산부틸, 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-메톡시프로피온산프로필, 3-메톡시프로피온산부틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 3-에톡시프로피온산프로필, 3-에톡시프로피온산부틸, 3-프로폭시프로피온산메틸, 3-프로폭시프로피온산에틸, 3-프로폭시프로피온산프로필, 3-프로폭시프로피온산부틸, 3-부톡시프로피온산메틸, 3-부톡시프로피온산에틸, 3-부톡시프로피온산프로필, 3-부톡시프로피온산부틸 등의 에스테르류; 테트라히드로푸란, 피란 등의 고리형 에테르류; γ-부티로락톤 등의 고리형 에스테르류 등을 들 수 있다. 여기서 예시한 용매는, 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. The kind of solvent that can be used in the present invention is not particularly limited, but for example, ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, ethylene glycol monobutyl ether acetate, and ethylene glycol monoethyl ether acetate; alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, and propylene glycol monobutyl ether; propylene glycol dialkyl ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol ethyl methyl ether, propylene glycol dipropyl ether, propylene glycol propyl methyl ether, and propylene glycol ethyl propyl ether; propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate, and propylene glycol butyl ether propionate; butyldiol monoalkyl ethers such as methoxybutyl alcohol, ethoxybutyl alcohol, propoxybutyl alcohol and butoxybutyl alcohol; butanediol monoalkyl ether acetates such as methoxybutyl acetate, ethoxybutyl acetate, propoxybutyl acetate, and butoxybutyl acetate; butanediol monoalkyl ether propionates such as methoxybutyl propionate, ethoxybutyl propionate, propoxybutyl propionate and butoxybutyl propionate; dipropylene glycol dialkyl ethers such as dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, and dipropylene glycol methyl ethyl ether; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; Methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl hydroxyacetate, ethyl hydroxyacetate , butyl hydroxyacetate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate, butyl 3-hydroxypropionate, 2-hydroxy -3-methylbutanoate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, propyl ethoxyacetate, butyl ethoxyacetate, propoxy Methyl acetate, ethyl propoxy acetate, propyl propoxy acetate, butyl propoxy acetate, methyl butoxy acetate, ethyl butoxy acetate, propyl butoxy acetate, butyl butoxy acetate, methyl 2-methoxypropionate, 2-methoxypropionic acid Ethyl, 2-methoxypropyl propionate, 2-methoxybutyl propionate, 2-ethoxypropionate methyl, 2-ethoxypropionate ethyl, 2-ethoxypropionate propyl, 2-ethoxypropionate butyl, 2-butoxypropionate methyl , 2-butoxypropionate ethyl, 2-butoxypropionate propyl, 2-butoxypropionate butyl, 3-methoxymethylpropionate, 3-methoxyethylpropionate, 3-methoxypropylpropionate, 3-methoxybutylpropionate, 3-methyl ethoxypropionate, 3-ethyl ethoxypropionate, 3-ethoxypropionate propyl, 3-ethoxypropionate butyl, 3-propoxypropionate methyl, 3-propoxypropionate ethyl, 3-propoxypropionate propyl, 3 -esters, such as butyl propoxy propionate, 3-butoxy propionate methyl, 3-butoxy propionate ethyl, 3-butoxy propionate propyl, 3-butoxy propionate butyl; cyclic ethers such as tetrahydrofuran and pyran; Cyclic esters, such as (gamma)-butyrolactone, etc. are mentioned. The solvents illustrated here can be used individually or in mixture of 2 or more types, respectively.
상기 용매는 도포성 및 건조성을 고려하였을 때 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 부탄디올알킬에테르아세테이트류, 부탄디올모노알킬에테르류, 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등의 에스테르류가 바람직하게 사용될 수 있으며, 더욱 바람직하게는 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 시클로헥사논, 메톡시부틸아세테이트, 메톡시부탄올, 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등이 사용될 수 있다. Esters such as alkylene glycol alkyl ether acetates, ketones, butanediol alkyl ether acetates, butanediol monoalkyl ethers, 3-ethoxy ethyl propionate, 3-methoxy methyl propionate, etc. may be preferably used, more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, methoxybutyl acetate, methoxybutanol, 3-ethoxypropionate ethyl, 3-methoxypropionic acid methyl and the like can be used.
본 발명에 따른 유무기 하이브리드 하드코팅층의 수접촉각은 80° 내지 120°일 수 있으며, 바람직하게는 100° 내지 120°일 수 있다. 상기 범위의 수접촉각을 만족하는 경우, 표면의 내지문성이 향상되어, 구현하고자 하는 화상의 시인성을 더욱 향상시킬 수 있다.The water contact angle of the organic-inorganic hybrid hard coating layer according to the present invention may be 80° to 120°, preferably 100° to 120°. When the water contact angle within the above range is satisfied, the anti-fingerprint property of the surface is improved, thereby further improving the visibility of the image to be implemented.
본 발명에 따른 유무기 하이브리드 하드코팅층의 두께는 특별히 한정되지 않으나, 예를 들면, 10 내지 40㎛일 수 있으며, 바람직하게는 15 내지 30㎛일 수 있다. 상기 범위의 두께를 만족하는 경우, 연필경도를 향상시키는 하는 효과를 구현할 수 있다.The thickness of the organic-inorganic hybrid hard coating layer according to the present invention is not particularly limited, but may be, for example, 10 to 40 μm, preferably 15 to 30 μm. When the thickness in the above range is satisfied, the effect of improving the pencil hardness can be realized.
본 발명에 따른 고분자 기재 필름은 상기 유무기 하이브리드 하드코팅층이 형성되는 기재 역할을 수행하는 것으로서, 상기 하드코팅층의 형성이 용이하도록 적정 강도를 가지는 것이라면, 그 종류는 특별히 한정되지 않는다.The polymer substrate film according to the present invention serves as a substrate on which the organic-inorganic hybrid hard coating layer is formed, and as long as it has an appropriate strength to facilitate the formation of the hard coating layer, the type thereof is not particularly limited.
본 발명에서 사용 가능한 상기 고분자 기재 필름의 소재의 구체적인 예를 들면, 폴리메틸(메타)아크릴레이트(PMMA), 폴리카보네이트(PC), 폴리에틸렌테레프탈레이트(PET), 폴리이미드(PI), 폴리아미드(PA), 사이클로올레핀폴리머(COP), 사이클로올레핀코폴리머(COC), PMMA/PC코폴리머 및 PMMA/PC/PMMA코폴리머 등을 들 수 있으며, 바람직하게는 폴리메틸(메타)아크릴레이트(PMMA)를 사용할 수 있다.Specific examples of the material of the polymer base film usable in the present invention include polymethyl (meth) acrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), polyamide ( PA), cycloolefin polymer (COP), cycloolefin copolymer (COC), PMMA/PC copolymer, and PMMA/PC/PMMA copolymer, etc., preferably polymethyl (meth)acrylate (PMMA) can be used
본 발명에 따른 고분자 기재 필름의 두께는 특별히 한정되지 않으나, 예를 들면, 0.2mm 내지 1.0mm일 수 있으며, 상기 두께 범위를 만족하는 경우, 4H이상의 고경도를 만족하며 소정 곡면부를 가지는 커버 윈도우를 구현할 수 있다.The thickness of the polymer base film according to the present invention is not particularly limited, but may be, for example, 0.2 mm to 1.0 mm, and when the thickness range is satisfied, a cover window having a high hardness of 4H or more and having a predetermined curved surface is provided. can be implemented
본 발명에 따른 커버 윈도우 기판은 고분자 기재 필름의 하드코팅층이 형성된 면의 타면에 비표시부 차광층을 더 포함하는 것일 수 있다.The cover window substrate according to the present invention may further include a non-display light blocking layer on the other surface of the surface on which the hard coating layer of the polymer base film is formed.
본 발명에서, "상부(Front)"는 해당 부재를 기준으로 화상표시장치의 시인측을 의미하며, "하부(Rear)"는 시인측의 타측을 의미한다. In the present invention, "front" means the viewer side of the image display device based on the member, and "rear" means the other side of the viewer side.
본 발명에 따른 비표시부 차광층은 화상표시장치에서 가리고자 하는 부분을 은폐하고, 시각적으로 미화시키는 역할을 하는 것이며, 그 소재 및 형상은 특별히 한정되지 않으나, 예를 들면 요철 구조로 형성되어 입체적 구조를 구현할 수 있는 입체 패턴을 포함할 수 있으며, 구체적인 예를 들면, IR 센서, 카메라 개구부, 홈키 홀, 스피커 홀, 아이콘 등의 패턴을 포함할 수 있다.The light blocking layer of the non-display part according to the present invention serves to hide the part to be covered in the image display device and visually beautify it, and its material and shape are not particularly limited, but for example, it is formed in a concave-convex structure and has a three-dimensional structure. It may include a three-dimensional pattern that can implement , specific examples, it may include a pattern such as an IR sensor, a camera opening, a home key hole, a speaker hole, an icon.
또한, 상기 비전도성 파광 패턴은 착색제, 알칼리 가용성 수지, 중합성 화합물, 중합 개시제, 용매 등을 포함하며, 포토리소그래피가 가능한 비전도성 색상 패턴 형성용 조성물로 형성될 수 있으며, 각 성분들은 당 분야에서 통상적으로 사용되는 것이라면 특별한 제한 없이 사용될 수 있다.In addition, the non-conductive wave pattern includes a colorant, an alkali-soluble resin, a polymerizable compound, a polymerization initiator, a solvent, and the like, and may be formed of a photolithography-capable composition for forming a non-conductive color pattern, and each component is used in the art. As long as it is commonly used, it may be used without particular limitation.
착색제는 당분야에 알려진 착색제가 특별한 제한 없이 사용될 수 있다. 착색제의 종류는 사용자가 요구하는 색상을 구현하기 위해 특별히 한정되지 않으며, 예를 들면 백색, 적색, 녹색, 청색의 염료 및 안료; 조색용의 황색, 오렌지, 바이올렛, 브라운 등의 염료 및 안료; 카본 블랙 등을 들 수 있다. 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.As the colorant, any colorant known in the art may be used without particular limitation. The type of the colorant is not particularly limited in order to realize the color required by the user, for example, white, red, green, blue dyes and pigments; dyes and pigments such as yellow, orange, violet and brown for toning; Carbon black etc. are mentioned. These can be used individually or in mixture of 2 or more types.
착색제는 필요에 따라 금속 가루, 백색 안료, 형광 안료 등을 더 포함할 수 있다.The colorant may further include metal powder, white pigment, fluorescent pigment, and the like, if necessary.
안료는 무기 안료 또는 유기 안료일 수 있다.The pigment may be an inorganic pigment or an organic pigment.
무기 안료의 종류는 특별히 한정되지 않으며, 예를 들면 황산바륨, 황산납, 산화티탄, 황색납, 벵갈, 산화 크롬, 카본 블랙 등을 들 수 있다.The kind of inorganic pigment is not specifically limited, For example, barium sulfate, lead sulfate, titanium oxide, yellow lead, bengal, chromium oxide, carbon black, etc. are mentioned.
유기 안료의 종류는 특별히 한정되지 않으며, 예를 들면, 당분야에서 통상적으로 사용되는 C.I.(컬러 인덱스) 번호를 가지는 다양한 안료를 들 수 있고, 이들은 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.The type of organic pigment is not particularly limited, and for example, various pigments having CI (color index) numbers commonly used in the art may be mentioned, and these may be used alone or in combination of two or more. .
본 발명에 따른 커버 윈도우 기판은 제조 후, 보관 및 운송 과정에서 표면 스크래치 등의 외관상 불량 발생을 방지하기 위해서 양면에 보호필름을 더 포함하는 것일 수 있으며, 상기 보호필름은 최종 제품에 적용시 제거될 수 있다.The cover window substrate according to the present invention may further include a protective film on both sides to prevent appearance defects such as surface scratches during storage and transportation after manufacturing, and the protective film may be removed when applied to the final product. can
본 발명에 따른 보호필름은 기판의 양면, 즉, 상기 하드코팅층이 구비된 고분자 기재 필름의 상부와 비표시부 차광층의 하부에 각각 보호필름이 배치된 것일 수 있다.The protective film according to the present invention may be one in which the protective film is disposed on both sides of the substrate, that is, on the upper part of the polymer base film provided with the hard coating layer and on the lower part of the non-display part light blocking layer, respectively.
본 발명에 따른 보호필름은 투명성, 기계적 강도, 열안정성, 수분차폐성, 등방성 등이 우수한 것이라면 특별히 제한되지 않으며, 예를 들면 폴리에틸렌테레프탈레이트, 폴리에틸렌이소프탈레이트, 폴리부틸렌테레프탈레이트 등의 폴리에스테르계 필름; 디아세틸셀룰로오스, 트리아세틸셀룰로오스 등의 셀룰로오스계 필름; 폴리카보네이트 필름; 폴리메틸(메타)아크릴레이트, 폴리에틸(메타)아크릴레이트 등의 아크릴계 필름; 폴리스티렌, 아크릴로니트릴-스티렌 공중합체 등의 스티렌계 필름; 폴리에틸렌, 폴리프로필렌, 시클로계 또는 노보넨 구조를 갖는 폴리올레핀, 에틸렌프로필렌 공중합체 등의 폴리올레핀계 필름; 폴리이미드계 필름; 폴리에테르설폰계 필름; 설폰계 필름 등의 통상의 필름을 사용할 수 있으며, 이에 한정되는 것은 아니다.The protective film according to the present invention is not particularly limited as long as it has excellent transparency, mechanical strength, thermal stability, moisture shielding property, isotropy, etc. For example, a polyester film such as polyethylene terephthalate, polyethylene isophthalate, and polybutylene terephthalate ; Cellulose films, such as diacetyl cellulose and triacetyl cellulose; polycarbonate film; Acrylic films, such as polymethyl (meth)acrylate and polyethyl (meth)acrylate; styrenic films such as polystyrene and acrylonitrile-styrene copolymer; polyolefin-based films such as polyethylene, polypropylene, polyolefin having a cyclo-based or norbornene structure, and an ethylenepropylene copolymer; polyimide-based film; polyethersulfone-based film; A conventional film such as a sulfone-based film may be used, but is not limited thereto.
본 발명에서, 상기 상부면의 보호필름(고분자 기재 필름의 상부의 보호필름)의 60℃, 90%RH의 조건에서 수축률은 100ppm이하일 수 있고, 하부면의 보호필름(비표시부 차광층의 하부의 보호필름)의 60℃, 90%RH의 조건에서 수축률은 100ppm이상일 수 있다. 상기 60℃, 90%RH의 조건은 고온고습에서 안정하다는 것을 의미하며, 이 조건에서 전술한 수축률을 만족하는 경우 커버 플라스틱의 양면을 접합함으로써, 기판의 휨 발생을 최소화할 수 있다. In the present invention, the shrinkage rate of the protective film on the upper surface (protective film on the upper part of the polymer substrate film) at 60°C and 90% RH may be 100 ppm or less, and the protective film on the lower surface (the lower part of the light blocking layer of the non-display part) (protective film) under the conditions of 60°C and 90%RH, the shrinkage rate may be 100ppm or more. The conditions of 60° C. and 90% RH mean that it is stable at high temperature and high humidity, and when the shrinkage rate described above is satisfied in this condition, by bonding both sides of the cover plastic, the occurrence of warpage of the substrate can be minimized.
또한, 본 발명에서, 상기 상부면의 보호필름(고분자 기재 필름의 상부의 보호필름)의 85℃, 85%RH의 조건에서 수축률은 100ppm이하일 수 있고, 하부면의 보호필름(비표시부 차광층의 하부의 보호필름)의 85℃, 85%RH의 조건에서 수축률은 100ppm이상일 수 있다. 상기 85℃, 85%RH의 조건은 60℃, 90%RH의 대비 더욱 가혹한 조건하에서의 안정성을 평가한 것을 의미하며, 이 조건에서 전술한 수축률을 만족하는 경우 커버 플라스틱의 양면을 접합함으로써, 기판의 휨 발생을 최소화할 수 있다. In addition, in the present invention, the shrinkage rate of the protective film on the upper surface (protective film on the upper part of the polymer substrate film) at 85 ℃ and 85% RH may be 100 ppm or less, and the protective film on the lower surface (of the non-display part light blocking layer) Under the conditions of 85 ℃ and 85% RH of the lower protective film), the shrinkage rate may be 100 ppm or more. The conditions of 85 ℃, 85% RH mean that stability under more severe conditions compared to 60 ℃ and 90% RH was evaluated, and when the shrinkage rate described above is satisfied in this condition, by bonding both sides of the cover plastic, the The occurrence of warpage can be minimized.
또한, 상기 상부면의 보호필름의 박리력은 10 내지 100N/25mm일 수 있고, 하부면의 보호필름의 박리력은 100 내지 300N/25mm일 수 있다. 이 경우, 커버 플라스틱의 양면을 접합함으로써, 기판의 휨 발생을 최소화할 수 있다.In addition, the peeling force of the protective film of the upper surface may be 10 to 100N/25mm, the peeling force of the lower protective film may be 100 to 300N/25mm. In this case, by bonding both surfaces of the cover plastic, it is possible to minimize the occurrence of warpage of the substrate.
전술한 구성을 포함하는 본 발명에 따른 커버 윈도우 기판은 고온·고습 조건 하에서 휨 발생을 현저히 감소시킬 수 있으며, 예를 들면, 상기 기판을 60℃, RH90%에 방치 후, 하드코팅층이 위를 향하도록 두고 상온(25℃)에서 측정한 휨량은 -1.0mm(역컬) 내지 +1.0mm(정컬)일 수 있으며, 바람직하게는 -0.5 내지 +0.5mm일 수 있다.The cover window substrate according to the present invention including the above configuration can significantly reduce the occurrence of warpage under high temperature and high humidity conditions. For example, after leaving the substrate at 60°C and RH90%, the hard coating layer faces upward The amount of deflection measured at room temperature (25° C.) may be -1.0 mm (reverse curl) to +1.0 mm (normal curl), preferably -0.5 to +0.5 mm.
상기 기판을 85℃, RH85%에 방치 후, 하드코팅층이 위를 향하도록 두고 상온(25℃)에서 측정한 휨량은 -1.0mm(역컬) 내지 +1.0mm(정컬)일 수 있으며, 바람직하게는 -0.5 내지 +0.5mm일 수 있다.After leaving the substrate at 85°C, RH85%, the amount of warpage measured at room temperature (25°C) with the hard coating layer facing upward may be -1.0mm (reverse curl) to +1.0mm (normal curl), preferably It may be -0.5 to +0.5 mm.
본 발명에서 휨 발생이란, 고온·고습 조건 하에서 기판의 끝단에 들림(h1)이 발생하거나, 기판의 내부에서 들뜸(h2)이 발생하는 경우를 의미하는 것으로서, 휨량은 고온 고습 조건에 투입한 후, 커버 윈도우 기판을 상온(25℃)조건하에서 평평한 바닥면에 두고 바닥에 밀착되지 않고 뜨는 부분 중 최대 높이를 의미한다(도 4 참조).In the present invention, the occurrence of warpage means a case in which lifting (h1) occurs at the tip of the substrate under high temperature and high humidity conditions, or lifting (h2) occurs inside the substrate. , refers to the maximum height of the part that floats without being in close contact with the floor when the cover window substrate is placed on a flat surface under room temperature (25° C.) conditions (refer to FIG. 4).
보다 구체적으로, 휨량은 하드코팅층이 위로 가도록 한 후 측정하여 나타낼 수 있으며, 휨량이 +인 경우, 하드코팅층으로 휘는 것을 의미하며(정컬), 상기 휨량이 -인 경우, 차광측으로 휘는것을 의미한다(역컬).More specifically, the amount of warpage can be expressed by measuring after the hard coating layer goes upward, and when the amount of warpage is +, it means warping with the hard coating layer (Junkal), and when the amount of warpage is -, it means bending toward the light-shielding side ( reverse curl).
<커버 윈도우 기판의 제조 방법><Method for manufacturing cover window substrate>
본 발명은 상기 커버 윈도우 기판을 제조하는 방법에 관한 것이다.The present invention relates to a method of manufacturing the cover window substrate.
이하, 본 발명에 따른 제조 방법의 일 실시예를 들어, 보다 구체적으로 설명하기로 한다.Hereinafter, an embodiment of the manufacturing method according to the present invention will be described in more detail.
먼저, ((S1)단계) 고분자 기재 필름의 적어도 일면에 무기 화합물을 포함하는 유무기 하이브리드 코팅층 형성용 조성물을 도포하여 유무기 하이브리드 하드코팅층을 형성한다.First, ((S1) step) a composition for forming an organic-inorganic hybrid coating layer comprising an inorganic compound is applied to at least one surface of the polymer base film to form an organic-inorganic hybrid hard coating layer.
상기 유무기 하이브리드 코팅층 형성용 조성물은 전술한 성분 및 함량을 가지는 조성물이 동일하게 사용될 수 있다.The composition for forming the organic-inorganic hybrid coating layer may be the same composition having the above-described components and contents.
상기 코팅층 도포 방법은 특별히 한정되지 않으며, 예를 들면, 다이코터, 에어 나이프, 리버스 롤, 스프레이, 블레이드, 캐스팅, 그라비아, 스핀 코팅 등의 공지된 방법에 의해 수행될 수 있다.The method for applying the coating layer is not particularly limited, and for example, it may be performed by a known method such as a die coater, an air knife, a reverse roll, spray, blade, casting, gravure, or spin coating.
상기 도포 공정 이후, 경화하는 공정을 더 수행할 수 있으며, 경화 방법은 특별히 한정되지 않으며, 예를 들면, 광경화나 열경화를 단독으로, 또는 광경화 이후 열경화, 열경화 이후 광경화하는 등의 방법으로 행해질 수 있다.After the coating process, a curing process may be further performed, and the curing method is not particularly limited, and for example, photocuring or thermal curing alone, or thermal curing after photocuring, photocuring after thermal curing, etc. method can be done.
상기 경화 공정이 열경화 이후 광경화하는 공정으로 진행되는 경우, 상기 열경화는 60 내지 90℃에서, 60초 내지 300초간 수행될 수 있으며, 상기 광경화는 320 내지 400nm 영역의 광을 광량이 400 내지 700 mJ/cm2이 되도록 경화시간을 조절하여 수행할 수 있다.When the curing process proceeds to a photocuring process after thermal curing, the thermal curing may be performed at 60 to 90° C. for 60 seconds to 300 seconds, and the photocuring is performed using light in a range of 320 to 400 nm with an amount of 400 to 700 mJ/cm 2 It can be carried out by controlling the curing time.
다음으로, ((S2)단계) 상기 유무기 하이브리드 코팅층 형성 후에, 기재 필름의 적어도 하나의 단부로부터 소정 간격 이격된 부분을 열처리하면서 상기 단부에 압력을 가하여 상기 단부가 가압되는 방향으로 휘어져 곡면부를 형성한다.Next, ((S2) step) after forming the organic-inorganic hybrid coating layer, a portion spaced apart from at least one end of the base film by applying pressure to the end while heat-treating is bent in a direction in which the end is pressed to form a curved portion do.
보다 구체적으로, 상기 곡면부의 형성 단계(S2)는 곡면부를 형성하고자 하는 소정 위치에 열처리 공정과 가압 공정을 동시에 수행하는 것으로서, 소정 온도의 열처리에 의해 기판의 고분자 소재들이 유연하게 되어 변형 가능한 상태가 되며, 상기 가압 공정의 압력에 의해 소정 방향으로 휘어짐으로써 수행될 수 있다.More specifically, the forming step (S2) of the curved portion is to simultaneously perform a heat treatment process and a pressing process at a predetermined position where the curved portion is to be formed. and bending in a predetermined direction by the pressure of the pressing process may be performed.
상기 곡면부의 방향은 상기 가압되는 방향에 따라 적절히 조절되어, 제품이 요구되는 방향으로 형성될 수 있으며, 곡면부의 형성 위치 역시 제품이 요구되는 부분에 열처리 및 가압되어 형성될 수 있다.The direction of the curved portion may be appropriately adjusted according to the direction in which the product is pressed, and the product may be formed in a required direction, and the location of the curved portion may also be formed by heat treatment and pressurization at a required portion of the product.
본 발명의 (S2) 단계에서, 상기 열처리는 열풍 분사로 수행될 수 있으며, 상기 열처리의 수행온도는 특별히 한정되지 않으나, 사용되는 기판의 소재에 따라 적절하게 선택될 수 있다. 구체적인 예를 들면, 상기 열처리는 100℃ 내지 350℃에서 수행될 수 있으며, 상기 범위 내에서 열처리가 수행되는 경우, 본 발명의 기판의 소재(고분자 기재 필름 및 하드코팅층을 이루는 성분)의 용융 온도 범위 내로서 곡면부를 용이하게 형성할 수 있는 것으로 판단된다.In step (S2) of the present invention, the heat treatment may be performed by hot air spraying, and the temperature at which the heat treatment is performed is not particularly limited, but may be appropriately selected according to the material of the substrate used. As a specific example, the heat treatment may be performed at 100° C. to 350° C., and when the heat treatment is performed within the above range, the melting temperature range of the material (components constituting the polymer base film and the hard coating layer) of the substrate of the present invention It is judged that the curved portion can be easily formed as an interior.
도 3은 본 발명의 일 실시예에 따른 곡면부 형성 단계(S2)에 사용되는 장치를 개략적으로 나타낸 것이다.3 schematically shows an apparatus used in the step S2 of forming a curved portion according to an embodiment of the present invention.
도 3을 참고하면, 본 발명에 따른 곡면부 형성 단계(S2)는 특정 장치 하에서 열처리 공정 및 가압 공정이 동시에 수행되는 것일 수 있다. Referring to FIG. 3 , in the step of forming the curved portion ( S2 ) according to the present invention, a heat treatment process and a pressing process may be simultaneously performed under a specific device.
보다 구체적으로, 상기 기재 필름의 열풍이 분사되는 지점의 타면에 커버 윈도우 기판을 지지하는 곡면 형성부가 배치되고, 상기 단부의 일면에서 가압부가 상기 단부를 가압하고, 열풍 분사 지점을 기준으로 상기 단부의 타측은 고정부로 고정됨으로써 수행될 수 있다.More specifically, a curved surface forming part for supporting the cover window substrate is disposed on the other surface of the base film at the point where the hot air is sprayed, and the pressing part presses the end on one surface of the end, and the end of the end is based on the hot air spraying point. The other side can be performed by being fixed with a fixing part.
본 발명에 따른 곡면 형성부는 제품이 요구하는 형상을 구현하기 위해 적절하게 배치될 수 있으며, 상기 곡면 형성부의 배치되는 지점과 상기 열풍 분사 지점을 기판의 동일한 부분을 향하도록 서로 대향하여 배치될 수 있다.The curved surface forming part according to the present invention may be appropriately disposed to implement the shape required by the product, and the point where the curved surface forming part is disposed and the hot air jetting point may be disposed to face each other so as to face the same part of the substrate .
본 발명에 따른 가압부는 기판의 단부 상에 소정 방향으로 가압할 수 있도록 적절하게 배치될 수 있으며, 바람직하게는 열풍 분사 지점과 같은 측의 단부에 배치될 수 있다.The pressing unit according to the present invention may be appropriately arranged to pressurize in a predetermined direction on the end of the substrate, and preferably may be arranged at the end on the same side as the hot air spraying point.
본 발명에 따른 고정부는 기재 필름의 열풍 분사 지점을 기준으로 가압부가 배치되는 단부의 타측에 배치되어 곡면을 형성하지 않는 기판을 고정시킬 수 있다. 상기 고정부에 의해 곡면부를 제외한 기판의 평탄한 부분에 열처리 및 가압 공정에 의한 영향을 줄여줄 수 있다.The fixing unit according to the present invention is disposed on the other side of the end where the pressing unit is disposed based on the hot air spraying point of the base film to fix the substrate that does not form a curved surface. By the fixing part, it is possible to reduce the influence of the heat treatment and pressing process on the flat part of the substrate except for the curved part.
전술한 바와 같이, 본 발명에 따른 커버 윈도우 기판의 제조 방법은, 먼저, 고분자 기재 필름에 하드코팅층을 형성한 후((S1)단계), 열처리 및 가압에 의해 곡면부를 형성((S2)단계)로 수행됨으로써, 기판의 경도 저하를 효과적으로 억제할 수 있으며, 곡면부에서도 기판의 평탄부와 동일한 광학 특성을 구현할 수 있게 한다.As described above, in the method of manufacturing a cover window substrate according to the present invention, first, a hard coating layer is formed on a polymer base film (step (S1)), and then a curved portion is formed by heat treatment and pressurization (step (S2)) By performing as, it is possible to effectively suppress a decrease in hardness of the substrate, and it is possible to implement the same optical properties as the flat portion of the substrate even in the curved portion.
상기 (S2)단계를 먼저 수행하고, (S1)단계를 수행하게 되는 경우, 불균일한 하드코팅으로 인하여 기판의 경도가 저하될 수 있으며, 곡면부의 두께편차로 인한 위상차 문제 및 하드코팅층의 Crack이 발생할 수 있다. 또한, 기판의 곡면부의 내구성 및 광학 특성이 기판의 평탄부 대비 다소 저하될 수 있다.If step (S2) is performed first and step (S1) is performed, the hardness of the substrate may be lowered due to non-uniform hard coating, and retardation problems and cracks of the hard coating layer may occur due to thickness deviation of the curved portion. can In addition, durability and optical properties of the curved portion of the substrate may be slightly degraded compared to that of the flat portion of the substrate.
본 발명에서, 상기 (S1)단계에 사용되는 고분자 기재 필름의 형성 방법은 특별히 한정되지 않으나, 전술한 고분자 소재를 특정 온도와 압력 조건에서 압출하는 공정으로 형성된 것일 수 있다. In the present invention, the method of forming the polymer base film used in step (S1) is not particularly limited, but may be formed by extruding the above-described polymer material under specific temperature and pressure conditions.
보다 구체적으로, 상기 압출 공정은 고분자 소재의 융점 이상의 온도 하에서 고분자 소재를 녹인 후, 소정 압력의 압출 다이를 통해 배출시키는 과정으로 수행될 수 있으며, 본 발명의 기재 필름과 같이 판상 형태의 고분자 기재 필름을 형성하는 경우, 상기 압출된 고분자 소재를 일정 이상의 장력으로 연신하면서 권취하는 공정으로 수행될 수 있다.More specifically, the extrusion process may be performed by dissolving the polymer material under a temperature equal to or higher than the melting point of the polymer material and then discharging it through an extrusion die at a predetermined pressure, and a plate-shaped polymer base film like the base film of the present invention. When forming, it may be carried out in a process of winding the extruded polymer material while stretching it with a predetermined tension or more.
한편, 상기 연신 공정 중 고분자는 급격하게 냉각되게 되는데 이 과정에서 필름 내부에 잔류 응력이 발생하게 되며, 권취되는 과정에서 공기층과 접하는 상부면과 이송 수단과 접하는 하부면의 온도 차이에 의해 상하부의 표면 조도와 조직의 치밀성 등의 차이가 발생하게 된다.On the other hand, during the stretching process, the polymer is rapidly cooled, and in this process, residual stress is generated inside the film. There is a difference between the roughness and the denseness of the tissue.
이와 같이, 필름에 잔류 응력이 존재하는 경우, 추가적인 열 가공시 뒤틀림, 수축 및 팽창에 의한 휨 등의 현상이 발생할 수 있으며, 상부에 추가 적층물과 박리되기 쉬운 문제가 있었다. As such, when residual stress is present in the film, phenomena such as warpage due to distortion, shrinkage and expansion may occur during additional thermal processing, and there is a problem in that it is easy to peel from the additional laminate on the upper part.
본 발명에서, 상기 (S1)단계에서 사용되는 고분자 기재 필름은 상기 (S1)단계 이전에 추가 열처리를 거친 것일 수 있다((S1-1)단계).In the present invention, the polymer base film used in step (S1) may have been subjected to additional heat treatment before step (S1) (step (S1-1)).
보다 구체적으로, 상기 (S1-1)단계는 고분자의 열변형온도(HDT)의 ±20℃ 또른 유리전이온도(Tg)의 ±20℃ 의 조건하에서 열처리된 것일 수 있다. 이 경우, 제조 공정 중에서 발생한 잔류 응력을 완화시켜, 추가 열 가공시에 발생하는 내구성 저하 문제를 보완할 수 있다. 본 발명에서 ±20℃란, 해당 기준점이 되는 온도(고분자의 열변형온도(HDT) 또는 유리전이온도(Tg))에서 -20℃ 내지 +20℃를 포함하는 개념이다.More specifically, the step (S1-1) may be heat-treated under the conditions of ±20°C of the heat deflection temperature (HDT) of the polymer or ±20°C of the glass transition temperature (Tg) of the polymer. In this case, the residual stress generated during the manufacturing process may be relieved to compensate for the problem of durability deterioration occurring during additional thermal processing. In the present invention, ±20°C is a concept including -20°C to +20°C at the reference point (heat deflection temperature (HDT) or glass transition temperature (Tg) of the polymer).
또한, 상기 고분자 기재 필름의 열처리 공정은 90℃ 내지 110 ℃에서 60분 내지 240분간 수행될 수 있으며, 상기 조건에서 수행되는 경우, 잔류 응력을 효과적으로 완화시킬 수 있다.In addition, the heat treatment process of the polymer base film may be performed at 90° C. to 110° C. for 60 minutes to 240 minutes, and when performed under the above conditions, residual stress can be effectively relieved.
본 발명에 따른 고분자 기재 필름은 상기 열처리 공정 이후(S1-1), 25℃ 내지 80℃에서 1분 내지 15분간 냉각 공정(S1-2)을 거친 것일 수 있으며, 이 경우, 잔류응력을 해소하는 효과를 더욱 향상시킬 수 있다.The polymer base film according to the present invention may be one that has undergone a cooling process (S1-2) for 1 minute to 15 minutes at 25°C to 80°C after the heat treatment process (S1-1), and in this case, The effect can be further improved.
또한, 본 발명에 따른 고분자 기재 필름은 상기 (S1-2) 단계 후 상기 (S1-2) 단계의 냉각 온도보다 더 낮은 온도에서 냉각하는 단계(S1-3)를 더 거친 것일 수 있으며, 이 경우, 전술한 효과를 더욱 향상시킬 수 있다.In addition, the polymer base film according to the present invention may be further subjected to the step (S1-3) of cooling at a lower temperature than the cooling temperature of the step (S1-2) after the step (S1-2), in this case , it is possible to further improve the above-described effect.
본 발명에 커버 윈도우 기판은 상기 방법에 따라, 전술한 형상 및 물성을 만족하도록 형성되어, 휨 발생이 현저히 감소될 수 있으며, 다양한 형상의 제품에 적용되어 우수한 내구성 및 광학 특성을 구현할 수 있다.According to the present invention, the cover window substrate is formed to satisfy the above-described shape and physical properties according to the method, so that the occurrence of warpage can be significantly reduced, and excellent durability and optical properties can be realized when applied to products of various shapes.
<화상표시장치><Image display device>
본 발명은 상기 커버 윈도우 기판을 구비하는 화상표시장치에 관한 것이다. 본 발명의 화상표시장치는 상기 구성 외에 당 분야에 공지된 구성을 더 포함할 수 있다.The present invention relates to an image display device including the cover window substrate. The image display device of the present invention may further include a configuration known in the art in addition to the above configuration.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 이들 실시예는 본 발명을 예시하는 것일 뿐 첨부된 특허청구범위를 제한하는 것이 아니며, 본 발명의 범주 및 기술사상 범위 내에서 실시예에 대한 다양한 변경 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다.Hereinafter, preferred embodiments are presented to help the understanding of the present invention, but these examples are merely illustrative of the present invention and do not limit the appended claims, and are within the scope and spirit of the present invention. It is obvious to those skilled in the art that various changes and modifications are possible, and it is natural that such variations and modifications fall within the scope of the appended claims.
실시예Example 및 and 비교예comparative example
실시예Example 1 One
<고분자 기재 필름의 제조><Production of polymer base film>
폴리메틸메타아크릴레이트 필름을 100℃에서 120분간 가열한 후, 60℃에서 10분간 냉각하고, 상온(25℃)에서 냉각하는 단계별 열처리를 거쳐 고분자 기재 필름(A-1)을 제조하였다.The polymethyl methacrylate film was heated at 100° C. for 120 minutes, cooled at 60° C. for 10 minutes, and subjected to step-by-step heat treatment of cooling at room temperature (25° C.) to prepare a polymer base film (A-1).
<커버 윈도우 기판의 제조><Manufacture of cover window substrate>
열처리된 고분자 기재 필름의 일면에 하기 표 1에 기재된 성분 및 조성을 가지는 유무기 하이브리드 하드코팅용 조성물을 도포한 후, 90℃에서 90초간 건조하고, 315nm, 365nm의 자외선 파장역역의 광을 600mJ로 경화하여, 최종 두께가 30㎛되는 하드코팅층을 형성하였다.After coating the composition for organic-inorganic hybrid hard coating having the components and compositions shown in Table 1 on one side of the heat-treated polymer base film, drying at 90° C. for 90 seconds, and curing the light in the UV wavelength range of 315 nm and 365 nm to 600 mJ Thus, a hard coating layer having a final thickness of 30 μm was formed.
다음으로, 상기 고분자 기재 필름의 하드코팅층이 형성된 타면에 비표시부 차광층을 형성하였으며, 이 후 80℃에서 60분간 건조하였다. Next, a non-display light blocking layer was formed on the other surface of the polymer base film on which the hard coating layer was formed, and then dried at 80° C. for 60 minutes.
이후, 상기 고분자 기재 필름의 상부(하드코팅층 형성측)에 박리력이 80N/25mm이고, 60℃, RH90%에서 수축률이 60ppm인 PET 기재 필름을 아크릴계 접착제를 사용하여 접합하고, 상기 고분자 기재 필름의 하부(비표시부 차광층 형성측)에 박리력이 200N/25mm이고, 60℃, RH90%에서 수축률이 150ppm인 PET 기재 필름을 아크릴계 접착제를 사용하여 접합하였다.Thereafter, a PET base film having a peel force of 80N/25mm and a shrinkage rate of 60ppm at 60°C and RH90% on the upper portion of the polymer base film (the side on which the hard coat layer is formed) is bonded using an acrylic adhesive, and the polymer base film A PET base film having a peeling force of 200N/25mm and a shrinkage rate of 150ppm at 60°C and RH90% was bonded to the lower portion (on the non-display part light-shielding layer formation side) using an acrylic adhesive.
접합 후, 400W의 CO2 레이저를 사용하여, 100mm/sec의 속도로 소정 사이즈의 셀단위로 컷팅하여 커버 윈도우 기판을 제조하였다.After bonding, a cover window substrate was manufactured by cutting the cell unit of a predetermined size at a speed of 100 mm/sec using a 400 W CO 2 laser.
<곡면부 형성><Formation of curved part>
상기 제조된 커버 윈도우 기판의 단변 방향의 단부로부터 100mm 지점을 제외하고 나머지 부분을 고정 장치로 고정시켰다. 이 후, 기판의 상기 단부로부터 90mm 지점을 기준으로 기판의 하드코팅층이 형성된 측에 열풍 분사기를 배치하였으며, 기판의 비표시부 차광층이 형성된 측에 곡면 형성부를 배치하였다. 이 때, 상기 열풍 분사기는 기판으로부터 100mm 간격을 두어 배치하였으며, 상기 기판 하드코팅층이 형성된 단부의 일면에 가압부를 배치하였다.Except for a point 100 mm from the end in the short side direction of the prepared cover window substrate, the remaining portions were fixed with a fixing device. Thereafter, the hot air sprayer was disposed on the side where the hard coating layer was formed on the basis of the 90 mm point from the end of the substrate, and the curved surface forming part was disposed on the side where the light blocking layer of the non-display part of the substrate was formed. At this time, the hot air sprayer was disposed at a distance of 100 mm from the substrate, and a pressing part was disposed on one surface of an end portion where the substrate hard coating layer was formed.
이 후, 상기 기판의 단부를 가압부에 의해 50kPa로 15mm/sec로 가압하였으며, 동시에 250℃의 온도로 열풍 분사하여 곡면부를 형성하였다. 형성된, 곡면부의 곡률 반경은 10mm이다.Thereafter, the end of the substrate was pressurized at 50 kPa at 15 mm/sec by the pressing part, and at the same time hot air was sprayed at a temperature of 250° C. to form a curved part. The radius of curvature of the formed curved portion is 10 mm.
실시예Example 2 2
하드코팅층의 두께를 20㎛로 형성한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A cover window substrate was manufactured in the same manner as in Example 1, except that the thickness of the hard coating layer was formed to be 20 μm.
실시예Example 3 3
하드코팅층의 두께를 10㎛로 형성한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A cover window substrate was manufactured in the same manner as in Example 1, except that the thickness of the hard coating layer was formed to be 10 μm.
실시예Example 4 4
80℃에서 열처리한 고분자 기재 필름(A-2)을 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A cover window substrate was manufactured in the same manner as in Example 1, except that the polymer substrate film (A-2), which was heat-treated at 80°C, was used.
실시예Example 5 5
110℃에서 열처리한 고분자 기재 필름(A-3)을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A substrate for a cover window was prepared in the same manner as in Example 1, except that the polymer substrate film (A-3) heat-treated at 110° C. was used.
실시예Example 6 6
열처리를 수행하지 않은 것을 고분자 기재 필름(A-4)을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A substrate for a cover window was prepared in the same manner as in Example 1, except that a polymer base film (A-4) that was not subjected to heat treatment was used.
실시예Example 15 15
곡면부를 먼저 형성한 뒤, 하이브리드 코팅층을 먼저 제조한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도의 기판을 제조하였다.A substrate of a cover window was manufactured in the same manner as in Example 1, except that a curved portion was first formed and a hybrid coating layer was first prepared.
실시예Example 7 내지 14 및 7 to 14 and 비교예comparative example 1 내지 3 1 to 3
하이브리드 코팅층 제조시 하기 표 1에 기재된 성분 및 함량을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로 커버 윈도우 기판을 제조하였다.A cover window substrate was prepared in the same manner as in Example 1, except that the components and contents shown in Table 1 were used in preparing the hybrid coating layer.
경도surface
Hardness
필름 종류(A)write
Film type (A)
(㎛)Hard coating layer thickness
(μm)
(B/중량%)inorganic compound
(B/wt%)
화합물
(C/중량%)polymeric
compound
(C/wt%)
(D/중량%)polymerization initiator
(D/wt%)
(E/중량%)menstruum
(E/wt%)
A: 고분자 기재 필름
A-1: 100℃에서 열처리한 폴리메틸(메타)아크릴레이트 필름
A-2: 80℃에서 열처리한 폴리메틸(메타)아크릴레이트 필름
A-3: 110℃에서 열처리한 폴리메틸(메타)아크릴레이트 필름
A-4: 별도의 열처리를 거치지 않은 폴리메틸(메타)아크릴레이트 필름
B: 무기 화합물
B-1: 나노실리카졸:비닐트리메톡시실란 67중량비: 23중량비
B-2: 나노실리카졸:비스(트리에톡시실릴프로필)테트라설파이드 67중량비:23중량비
B-3: 나노실리카졸:N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리메톡시실란 67중량비:23중량비
C: 중합성 화합물
C-1: 하이드록시에틸(메타)아크릴레이트:퍼플로로알킬아크릴레이트 94중량비:6중량비
D: 중합 개시제
D-1:Igracure184:Igracure2959 50중량비:50중량비
E: 용제
E-1: PGMEA
표면 경도는, 하드코팅층에 대해서 JIS5400에 따라, Mitsubishi사 제조 연필을 사용하여 1kg의 하중하 연필 경도를 측정한 것임
A: Polymer base film
A-1: Polymethyl (meth)acrylate film heat-treated at 100°C
A-2: Polymethyl (meth)acrylate film heat-treated at 80°C
A-3: Polymethyl (meth)acrylate film heat-treated at 110°C
A-4: Polymethyl (meth)acrylate film that has not undergone a separate heat treatment
B: inorganic compound
B-1: Nanosilicasol:vinyltrimethoxysilane 67 weight ratio: 23 weight ratio
B-2: Nanosilicasol:bis(triethoxysilylpropyl)tetrasulfide 67 weight ratio:23 weight ratio
B-3: Nanosilicasol:N-(3-acryloxy-2-hydroxypropyl)-3-aminopropyltrimethoxysilane 67 weight ratio: 23 weight ratio
C: polymerizable compound
C-1: Hydroxyethyl (meth) acrylate: Perfluoroalkyl acrylate 94 weight ratio: 6 weight ratio
D: polymerization initiator
D-1:Igracure184:Igracure2959 50 weight ratio: 50 weight ratio
E: solvent
E-1: PGMEA
The surface hardness is the hardness of the pencil under a load of 1 kg using a pencil manufactured by Mitsubishi according to JIS 5400 for the hard coating layer.
실험 방법experimental method
(1) 휨 발생 평가((1) Warpage occurrence evaluation ( 휨량amount of deflection ))
실시예 및 비교예에 따라 제조된 커버 윈도우 기판을 60℃, RH90%에 48시간 방치한 후, 하드코팅층이 위를 향하도록 두고 상온(25℃)에서 평평한 바닥면에 밀착되지 않고 뜨는 부분 중 최대 높이를 측정하였으며(도 1 참고), 그 결과를 하기 표 2에 기재하였다.After leaving the cover window substrates prepared according to Examples and Comparative Examples at 60° C. and RH90% for 48 hours, the hard coating layer was placed facing up, and at room temperature (25° C.), the largest of the floating parts without being in close contact with the flat bottom surface. The height was measured (refer to FIG. 1), and the results are shown in Table 2 below.
+의 경우, 하드코팅층으로 휘는 것(정컬)을 의미하며, -의 경우 차광측으로 휘는 것(역컬)을 의미한다.In the case of +, it means bending to the hard coating layer (positive curl), and in the case of -, it means bending toward the light-shielding side (reverse curl).
(2) (2) 내지문성anti-fingerprint 평가 evaluation
실시예 및 비교예에 따라 제조된 커버 윈도우 기판의 표면에 물방울을 떨어뜨린 후, 표면과 물방울이 이루는 각도(수접촉각)를 측정하여 하기 표 2에 기재하였다.After dropping water droplets on the surface of the cover window substrate prepared according to Examples and Comparative Examples, the angle (water contact angle) between the surface and the water droplet was measured, and is shown in Table 2 below.
각도가 100°내지 120°범위 내인 경우, 우수한 내지문성을 구현할 수 있으며, 가장 바람직하게는 110°내지 120°인 경우, 내지문성이 뛰어나다.When the angle is within the range of 100° to 120°, excellent anti-fingerprint properties can be implemented, and most preferably, when the angle is 110° to 120°, the anti-fingerprint property is excellent.
(3) 내충격성 평가(3) Impact resistance evaluation
실시예 및 비교예에 따란 제조된 커버 윈도우 기판을 중심에 50mm의 구멍이 뚫린 지그 위에 고정시키고 130g의 쇠구슬을 소정 높이에서 떨어뜨려 외관 상의 변형, 깨짐 등이 발생하는 최대 높이를 측정하였으며, 그 결과를 하기 표 2에 기재하였다.The cover window substrates manufactured according to Examples and Comparative Examples were fixed on a jig with a hole of 50 mm in the center, and a 130 g iron bead was dropped from a predetermined height to measure the maximum height at which deformation, cracking, etc. occurred in appearance, The results are shown in Table 2 below.
(4) 내구성 평가((4) durability evaluation ( 곡면부curved part , , 평탄부flat part ))
실시예 및 비교예에 따라 제조된 커버 윈도우 기판의 곡면부와 평탄부를 각각 3파장 lamp를 사용하여 표면의 스크래치, 크랙, 변형을 육안으로 확인하였으며, 광학 현미경을 사용하여 절단면을 확대 관찰하여, 절단면의 yellow zone의 장변 길이를 측정하였으며, 그 결과를 하기 표 2에 기재하였다.The curved and flat portions of the cover window substrates prepared according to Examples and Comparative Examples were visually checked for scratches, cracks, and deformations using a 3-wavelength lamp, respectively, and the cut surface was magnified using an optical microscope to observe the cut surface. The long side length of the yellow zone was measured, and the results are shown in Table 2 below.
절단면의 yellow zone의 장변 길이가 80㎛ 미만인 경우, Edge부의 시인성이 우수하며 80㎛ 이상인 경우, Edge부에서의 Yellow부분이 시인되는 문제를 유발할 수 있다.If the long side length of the yellow zone of the cut surface is less than 80㎛, the visibility of the edge part is excellent, and if it is 80㎛ or more, the yellow part in the edge part may cause a problem to be recognized.
(5) 광학 특성 평가((5) Evaluation of optical properties ( 곡면부curved part , , 평탄부flat part ))
실시예 및 비교예에 따라 제조된 커버 윈도우 기판의 곡면부와 평탄부를 각각 JIS K7361-1을 사용하여 Haze 및 색도(색상(b*))을 측정하였으며, 그 결과를 하기 표 2에 기재하였다. Haze and chromaticity (color (b*)) of the curved and flat portions of the cover window substrates manufactured according to Examples and Comparative Examples were measured using JIS K7361-1, respectively, and the results are shown in Table 2 below.
(Haze/색상(b*))optical properties
(Haze/color(b*))
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.730.8
/0.73
/0.730.8
/0.73
/100100
/100
/0.640.6
/0.64
/0.640.6
/0.64
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/1.11.2
/1.1
/0.991.2
/0.99
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/10090
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/10080
/100
/0.971.0
/0.97
/0.971.0
/0.97
/10070
/100
/1.13.6
/1.1
/1.13.4
/1.1
/10060
/100
/1.04.2
/1.0
/1.34.2
/1.3
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.971.0
/0.97
/0.971.0
/0.97
/100100
/100
/0.880.9
/0.88
/0.880.9
/0.88
/100100
/100
/0.820.6
/0.82
/0.820.6
/0.82
/100100
/100
/0.800.5
/0.80
/0.800.5
/0.80
상기 표 2에서 알 수 있듯이, 본 발명에 따른 하드코팅층을 구비하는 실시예의 경우, 경도 4H이상 휨 +1.0mm이내의 제품이 제작 가능한 것을 확인할 수 있다.As can be seen from Table 2, in the case of an embodiment having a hard coating layer according to the present invention, it can be confirmed that a product having a hardness of 4H or more and a warpage of +1.0 mm can be produced.
다만, 고분자 기재 필름의 열처리 온도가 다소 낮은 실시예 4의 경우, 휨이 다소 증가하였으며, 열처리 온도가 다소 높은 실시예 5의 경우, Haze가 약한 상승하였으며, 열처리를 수행하지 않은 고분자 기재 필름을 사용한 실시예 6의 경우, 잔류 응력으로 인해 다른 실시예들 보다 휨 발생이 증가한 것을 확인할 수 있다.However, in the case of Example 4, where the heat treatment temperature of the polymer substrate film was rather low, the warpage was slightly increased, and in the case of Example 5 where the heat treatment temperature was somewhat high, the haze was slightly increased, and the polymer substrate film without heat treatment was used. In the case of Example 6, it can be seen that the occurrence of warpage is increased compared to the other examples due to residual stress.
본 발명에 따른 경도 값을 벗어난 비교예 1 내지 3은 실시예 대비 휨 발생이 현저히 증가하고, 내충격정이 현저히 저하되는 것을 확인할 수 있었다. 특히, 중합성 화합물 대비 무기 화합물의 함량이 감소할수록(비교예 1 < 비교예 2 < 비교예 3), 휨 량이 더욱 증가하는 확인할 수 있었다.In Comparative Examples 1 to 3, which deviates from the hardness value according to the present invention, it was confirmed that the occurrence of warpage was significantly increased compared to Examples, and the impact resistance tablet was significantly lowered. In particular, as the content of the inorganic compound decreased compared to the polymerizable compound (Comparative Example 1 < Comparative Example 2 < Comparative Example 3), it was confirmed that the amount of warpage further increased.
또한, 곡면부를 먼저 형성한 뒤, 하드코팅층을 형성한 실시예 15의 우, 곡면부에서 일부 Crack이 발생하는 것을 확인할 수 있었다.In addition, it was confirmed that some cracks occurred in the right side of Example 15 in which the hard coating layer was formed after forming the curved portion first.
Claims (26)
상기 하드코팅층은,
나노 실리카; 및
비닐트리메톡시실란, 비닐트리에톡시실란, 글리시독시프로필메틸디메톡시실란, 에폭시사이클로헥실에틸트리메톡시실란, 글리시독시프로필트리메톡시실란, 글리시독시프로필트리에톡시실란, 메타크릴록시프로필트리메톡시실란 및 메타크릴록시프로필트리에톡시실란으로 이루어진 군에서 선택되는 적어도 1종의 무기 화합물을 포함하고,
1kg 하중하 연필 경도가 4H 이상인, 커버 윈도우 기판.
At least one surface of the polymer-based film includes an organic-inorganic hybrid hard coating layer, and at least one end includes a curved portion,
The hard coating layer,
nano silica; and
Vinyltrimethoxysilane, vinyltriethoxysilane, glycidoxypropylmethyldimethoxysilane, epoxycyclohexylethyltrimethoxysilane, glycidoxypropyltrimethoxysilane, glycidoxypropyltriethoxysilane, methacryl At least one inorganic compound selected from the group consisting of hydroxypropyltrimethoxysilane and methacryloxypropyltriethoxysilane,
A cover window substrate having a pencil hardness of 4H or higher under a load of 1 kg.
The cover window substrate according to claim 1, wherein the pencil hardness under a load of 1 kg is 6H or more.
The cover window substrate of claim 1 , wherein a radius of curvature of the curved portion is 5 mm to 15 mm.
The cover window substrate of claim 1 , wherein the hard coat layer is made of a composition for forming a hard coat layer further comprising a polymerizable compound, a polymerization initiator, and a solvent.
The cover window substrate of claim 5 , wherein the inorganic compound is included in an amount of 100 to 260 parts by weight based on 100 parts by weight of the polymerizable compound.
The method according to claim 5, wherein the polymerizable compound is perfluoroalkyl acrylate, hydroxyethyl (meth) acrylate, hexanediol diacrylate, trimethylol propane tri (meth) acrylate, pentaerythritol tri (meth) acrylic Rate, ethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, tripropylene glycol diacrylate, trimethylolpropane trioxyethyl (meth)acrylate, tricyclodecane dimethanol di At least one selected from the group consisting of acrylate and dipentaerythritol hexa(meth)acrylate, the cover window substrate.
The cover window substrate of claim 1 , wherein the water contact angle of the hard coating layer is 80° to 120°.
The cover window substrate of claim 1 , wherein the hard coating layer has a thickness of 10 μm to 40 μm.
The method according to claim 1, wherein the polymer base film is polymethyl (meth) acrylate (PMMA), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), polyamide (PA), cycloolefin polymer ( A cover window substrate comprising at least one of COP), a cycloolefin copolymer (COC), a PMMA/PC copolymer, and a PMMA/PC/PMMA copolymer.
The method according to claim 1, The thickness of the polymer base film is 0.2mm to 1.0mm, the cover window substrate.
The cover window substrate of claim 1, further comprising a non-display light blocking layer on the other surface of the surface on which the hard coating layer of the polymer base film is formed.
The cover window substrate according to claim 1, further comprising a protective film on both surfaces.
상기 고분자 기재 필름의 적어도 일면에 형성된 유무기 하이브리드 하드코팅층;
상기 고분자 기재 필름의 적어도 하나의 단부에 형성된 곡면부; 및
상기 고분자 기재 필름의 양면에 각각 형성된 보호필름을 포함하고,
60℃, 90%RH의 조건에서 상기 고분자 기재 필름 상부면의 보호필름의 수축률은 100ppm이하이고, 상기 고분자 기재 필름 하부면의 보호필름의 수축률은 100ppm이상이며,
1kg 하중하 연필 경도가 4H 이상인, 커버 윈도우 기판.
polymer base film;
an organic-inorganic hybrid hard coating layer formed on at least one surface of the polymer base film;
a curved portion formed on at least one end of the polymer base film; and
and a protective film formed on both sides of the polymer base film,
The shrinkage rate of the protective film on the upper surface of the polymer base film under the conditions of 60 ° C. and 90%RH is 100 ppm or less, and the shrinkage rate of the protective film on the lower surface of the polymer base film is 100 ppm or more,
A cover window substrate having a pencil hardness of 4H or higher under a load of 1 kg.
The cover window substrate of claim 14 , wherein under the conditions of 85° C. and 85% RH, the shrinkage ratio of the protective film on the upper surface is 100 ppm or less, and the shrinkage ratio of the protective film on the lower surface is 100 ppm or more.
The method according to claim 1, After leaving the substrate at 60 ℃, RH90%, the amount of warpage measured at room temperature (25 ℃) with the hard coating layer facing upward is -1.0mm (reverse curl) to +1.0mm (normal curl), cover window substrate.
The method according to claim 1, After leaving the substrate at 85 ℃, RH85%, the amount of warpage measured at room temperature (25 ℃) with the hard coating layer facing upward is -1.0mm (reverse curl) to +1.0mm (normal curl), cover window substrate.
상기 유무기 하이브리드 코팅층 형성 후에, 기재 필름의 적어도 하나의 단부로부터 소정 간격 이격된 부분을 열처리하면서 상기 단부에 압력을 가하여 상기 단부가 가압되는 방향으로 휘어져 곡면부를 형성하는 단계(S2);를 포함하는, 커버 윈도우 기판의 제조 방법.
Forming an organic-inorganic hybrid hard coating layer by applying a composition for forming an organic-inorganic hybrid coating layer comprising an inorganic compound on at least one surface of the polymer base film (S1); and
After forming the organic-inorganic hybrid coating layer, heat-treating a portion spaced apart from at least one end of the base film by applying pressure to the end portion to form a curved portion by bending the end portion in a pressurized direction (S2); including; , a method of manufacturing a cover window substrate.
The method according to claim 18, further comprising the step of heat-treating the polymer base film under the conditions of ± 20 ° C. of the heat deflection temperature (HDT) of the polymer or ± 20 ° C. of the glass transition temperature (Tg) before the step (S1), A method of manufacturing a cover window substrate.
The method of claim 18, wherein the polymer base film is subjected to a heat treatment step (S1-1) at 90° C. to 110° C. for 120 minutes to 240 minutes.
The method of claim 20, wherein the polymer base film is subjected to a step (S1-2) of cooling at 25 to 60°C for 1 minute to 15 minutes after the heat treatment step (S1-1).
The method of claim 21, wherein after the step (S1-2), the step of cooling (S1-3) at a temperature lower than the cooling temperature of the step (S1-2) is further performed.
The method of claim 18, wherein the heat treatment in step (S2) is performed by hot air spraying.
The method of claim 18, wherein the heat treatment in step (S2) is performed at 100°C to 350°C.
상기 기재 필름의 열풍이 분사되는 지점의 타면에 커버 윈도우 기판을 지지하는 곡률 형성부가 배치되고, 상기 단부의 일면에서 가압부가 상기 단부를 가압하고, 열풍 분사 지점을 기준으로 상기 단부의 타측은 고정부로 고정되는, 커버 윈도우 기판의 제조 방법.
The method according to claim 18, In the step (S2),
A curvature forming part for supporting the cover window substrate is disposed on the other surface of the base film at the point where the hot air is sprayed, the pressing part presses the end on one surface of the end, and the other side of the end is fixed with respect to the hot air spraying point. A method of manufacturing a cover window substrate that is fixed to
An image display device comprising the cover window substrate of any one of claims 1 to 3, 5 to 17.
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KR1020150124916A KR102346796B1 (en) | 2015-09-03 | 2015-09-03 | Cover window plate and manufacturing method thereof |
PCT/KR2016/009308 WO2017039209A1 (en) | 2015-09-03 | 2016-08-23 | Cover window substrate and image display device comprising same |
CN201680051367.3A CN107949876B (en) | 2015-09-03 | 2016-08-23 | Window substrate, method of manufacturing the same, and image display device having the same |
US15/757,071 US10391750B2 (en) | 2015-09-03 | 2016-08-23 | Cover window plate and image display device including the same |
TW105127934A TWI695858B (en) | 2015-09-03 | 2016-08-30 | Cover window plate and image display device having the same |
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KR102184393B1 (en) * | 2017-08-24 | 2020-11-30 | 주식회사 엘지화학 | Functional film comprising organic-inorganic hybrid coating layer |
KR102178559B1 (en) * | 2018-01-12 | 2020-11-17 | 한국다이카텍(주) | Hard coating protector manufacturing method and protector using the same |
JP6462941B1 (en) * | 2018-05-28 | 2019-01-30 | グンゼ株式会社 | Cover film |
KR20210107197A (en) | 2020-02-21 | 2021-09-01 | 삼성디스플레이 주식회사 | Window, method of manufacturing the same and electronic device having the same |
KR102286207B1 (en) | 2020-05-04 | 2021-08-06 | 에스케이이노베이션 주식회사 | Polyimide film and flexible display panel including the same |
KR102219722B1 (en) | 2020-05-04 | 2021-02-24 | 에스케이이노베이션 주식회사 | Polyimide film and flexible display panel including the same |
KR102166032B1 (en) | 2020-06-17 | 2020-10-15 | 에스케이이노베이션 주식회사 | Polyimide film and flexible display panel including the same |
KR102286213B1 (en) | 2020-07-30 | 2021-08-06 | 에스케이이노베이션 주식회사 | Polyimide film and flexible display panel including the same |
KR102286198B1 (en) | 2020-08-06 | 2021-08-06 | 에스케이이노베이션 주식회사 | Polyimide film and flexible display panel including the same |
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