KR102328783B1 - Apparatus and Method for cleaning a coupler of chemical supply device - Google Patents

Abstract

An object of the present invention is to provide a device and method for cleaning a coupler of a chemical supply device, which can improve the cleaning power and drying power of the coupler of the chemical supply device before and after chemical filling. The device for cleaning a coupler of a chemical supply device of the present invention comprises: a high-temperature water supply unit for supplying cleaning water heated to a temperature higher than room temperature to the inside of a coupler to remove chemicals and foreign substances remaining inside the coupler of a chemical supply device connected to a chemical connector of a tank lorry; a room temperature water supply unit for additionally removing chemicals and foreign substances remaining inside the coupler after cleaning the coupler by the heated cleaning water and supplying cleaning water at room temperature so that the temperature of the coupler is maintained at room temperature; and a drain unit through which the cleaning water and the chemicals and foreign substances discharged from the coupler are discharged.

Description

Apparatus and Method for cleaning a coupler of chemical supply device

The present invention relates to an apparatus and method for cleaning a coupler of a chemical supply apparatus, and more particularly, to an apparatus and method for cleaning a coupler of a chemical supply apparatus for cleaning and drying the coupler of the chemical supply apparatus before and after chemical filling.

In general, companies that manufacture semiconductors, semiconductor devices, LCDs, and OLEDs, pharmaceutical companies, and paint companies use various types of chemicals, and the methods of safely supplying these chemicals are diversifying. .

Referring to FIG. 1 , these chemicals are transferred from the chemical tank 10 of the tank lorry 1 stopped outside the building to the chemical supply device 2 , and then the chemical supply unit 2 in the unit This is done in a way that the process is transferred to the chamber. On one side of the chemical tank 10, a hose 11 for nitrogen and a hose 12 for a chemical are connected, and a connector 13 for nitrogen is provided at an end of the hose for nitrogen 11, the chemical A chemical connector 14 is provided at the end of the hose 12 .

At one side of the chemical supply device (2), a nitrogen supply pipe (23) and a chemical supply pipe (24) are connected, and at an end of the nitrogen supply pipe (23), a nitrogen coupler (21) connected to the nitrogen connector (13) ) is provided, and the chemical coupler 22 connected to the chemical connector 14 is provided at the end of the chemical supply pipe 24 .

When the chemical stored in the chemical tank 10 of the tank lorry 1 is transferred to the chemical supply device 2 side, the nitrogen connector 13 and the nitrogen coupler 21 are connected, and the chemical connector ( After connecting 14) and the chemical coupler 22, the inside of the chemical tank 10 is pressurized with nitrogen, and the chemical stored in the chemical tank 10 is transferred to the chemical supply device 2 side and filled.

When the filling operation of transferring the chemical stored in the chemical tank 10 to the chemical supply device 2 is completed, the nitrogen connector 13 and the nitrogen coupler 21 are separated, and the chemical connector 14 ) and the chemical coupler 22 are separated, and cleaning and drying operations of the chemical coupler 22 are performed.

Referring to FIG. 2 , in the related art, as a configuration for cleaning the chemical coupler 22, a cleaning solution (DIW) at room temperature is supplied to the coupler 22 through a cleaning solution supply pipe 25, and from the coupler 22 The discharged cleaning solution and chemicals pass through the discharge pipe 27 and are collected to the drain unit 28 and then drain through the drain pipe 29 connected to one side of the drain unit 28 . When the cleaning of the coupler 22 using the washing water is completed, the drying gas (N2) is supplied to the coupler 22 through the drying gas supply pipe 26, and the washing water remaining inside the coupler 22 is dried and removed. will do

As such, in the prior art, cleaning water at room temperature is flowed for a predetermined time for cleaning the coupler 22 before and after chemical filling, and the cleaning water remaining inside the coupler 22 is discharged to the lower side of the coupler 22 by gravity. After that, a method of drying the inside of the coupler 22 by supplying a drying gas for a certain period of time to remove the remaining amount of washing water was adopted. High viscosity or foreign matter is not properly removed, and if the chemical is subsequently supplied in this state, there is a problem that the purity of the chemical drops to a level that does not satisfy the process conditions, and in the case of drying only with dry gas, the inside of the coupler 22 There was a problem that the coupler 22 was not properly fastened to the chemical connector 14 due to the freezing in the winter season because the washing water buried in the washer was scattered and stayed in another space, so it was not completely removed.

The prior art related to the coupler of the conventional chemical supply device is shown in Korean Patent Registration No. 10-1710563.

The present invention has been devised to solve the above-mentioned problems, and it provides an apparatus and method for cleaning a coupler of a chemical supply device so that the cleaning power and drying power of the coupler of the chemical supply device can be improved before and after filling the chemical. There is a purpose.

The coupler cleaning device of the chemical supply device of the present invention for realizing the object as described above is inside the coupler to remove chemicals and foreign substances remaining inside the coupler of the chemical supply device connected to the chemical connector of the tank lorry. a hot water supply unit for supplying washing water heated to a temperature higher than room temperature; a room temperature water supply unit for additionally removing chemicals and foreign substances remaining inside the coupler after cleaning the coupler by the heated washing water and supplying washing water at room temperature so that the temperature of the coupler is maintained at room temperature; and a drain unit through which the washing water discharged from the coupler and chemicals and foreign substances are discharged.

It may further include a high-temperature water storage tank for storing the heated washing water supplied from the high-temperature water supply unit, generating the stored washing water at a set temperature and pressure, and supplying the stored washing water to the coupler.

The hot water supply unit may supply the heated washing water to the coupler for a set time, and when the set time elapses, the room temperature water supply unit may be configured to supply room temperature washing water to the coupler.

In the drain pipe connecting the coupler and the drain part, a PH meter for detecting the hydrogen ion concentration of the washing water passing through the drain pipe, and particles for detecting the number of particles included in the washing water passing through the drain pipe A counter may be provided.

When the hydrogen ion concentration detected by the PH meter is detected to be neutral and the number of particles detected by the particle counter is detected to be less than a set value, the room temperature water supply unit may be configured to stop supplying the washing water at room temperature.

It may further include a drying gas supply unit for supplying a drying gas to the inside of the coupler the supply of the washing water at room temperature is stopped.

A first drain pipe having a relatively wide cross-sectional area and a second drain pipe having a relatively narrower cross-sectional area than the first drain pipe are connected to a lower portion of the coupler so that the washing water remaining in the coupler is discharged, and located on the discharge side of the coupler It may further include a first sensor for detecting moisture inside the first drain pipe, and a second sensor for detecting moisture inside the second drain pipe located on the discharge side of the coupler.

A vacuum tube is connected to the second drain tube, and the vacuum tube is provided with a vacuum pump for sucking moisture remaining in the second drain tube, and when the moisture detected by the first sensor is less than a set value, the vacuum The pump can be configured to run.

The first drain pipe or the second drain pipe is further provided with a moisture meter for measuring the moisture inside the first drain pipe or the second drain pipe, and when the moisture measured by the moisture meter is less than a set value, the It can be configured to stop the operation of the vacuum pump.

The vacuum tube may be further provided with a gas-liquid separator for separating the liquid contained in the fluid flowing toward the vacuum pump.

A purifier for filtering impurities contained in the dry gas supplied to the inside of the coupler from the dry gas supply unit may be further included.

When the cleaning and drying of the coupler is completed, the dry gas supplied from the dry gas supply unit to maintain a positive pressure inside the coupler may be filtered through the purifier and then supplied to the inside of the coupler.

In the coupler cleaning method of the chemical supply device of the present invention, the washing water heated to a temperature higher than room temperature inside the coupler to remove the chemical and foreign substances remaining inside the coupler of the chemical supply device connected to the chemical connector of the tank lorry supplying and draining and supplying and draining cleaning water at room temperature to maintain the temperature of the coupler at room temperature while additionally removing chemicals and foreign substances remaining inside the coupler after cleaning the coupler with the heated washing water.

The supplying and draining of the washing water at room temperature further comprises detecting a hydrogen ion concentration of the drained washing water and the number of particles included in the drained washing water, wherein the detected hydrogen ion concentration is detected as neutral. and if the number of detected particles is less than a set value, it may be configured to stop supplying the washing water at room temperature.

When the supply of the washing water at room temperature is stopped, the method may further include supplying a drying gas to the inside of the coupler.

Further comprising the step of detecting moisture inside the coupler, when it is confirmed that there is no residual water inside the coupler as a result of detecting moisture inside the coupler, a vacuum pump provided in a vacuum tube connected to a drain pipe from which the washing water is drained is operated The method may further include removing moisture remaining in the drain pipe.

The method may further include detecting moisture in the drain pipe when the vacuum pump is operated, and when the moisture in the drain pipe is detected to be less than a set value, it may be configured to stop the operation of the vacuum pump.

When the operation of the vacuum pump is stopped, supplying a drying gas to the inside of the coupler may further include the step of maintaining the inside of the coupler in a positive pressure state.

According to the coupler cleaning apparatus and method of the chemical supply device according to the present invention, by supplying the cleaning water heated to a temperature higher than room temperature to the coupler when cleaning the coupler before and after chemical filling, the high-viscosity chemicals remaining inside the coupler and Since foreign substances can be removed smoothly, conditions for transferring high-purity chemicals can be provided by increasing the cleaning power compared to conventional cleaning only with cleaning water at room temperature, and cleaning time can be shortened.

In addition, in the prior art, there was a problem in that the connection between the connector of the tank lorry and the coupler of the chemical supply device was defective due to freezing in winter as the residual amount of washing water exists inside the coupler due to poor drying after washing. However, according to the present invention, the washing water After cleaning the used coupler, drying gas is supplied to the coupler to dry the coupler, and the coupler, drain, and moisture remaining inside are completely removed using a vacuum pump to prevent freezing of the coupler even in the winter season. It is possible to solve the problem of causing a defective coupling between the coupler of the chemical supply device.

1 is a view for explaining a structure in which a coupler of a conventional chemical supply device and a connector of a tank lorry are connected;
2 is a schematic diagram showing the configuration of a coupler cleaning device of a conventional chemical supply device,
3 is a schematic diagram showing the configuration of a coupler cleaning device of a chemical supply device according to the present invention;
Figure 4 is a flow chart of the coupler cleaning method of the chemical supply device according to the present invention.

Hereinafter, the configuration and operation of the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. Here, the same reference numerals are used for the same components as those of the prior art, and detailed descriptions for contents overlapping with those described in the prior art are omitted, focusing on the components newly added to the present invention. to explain

3, the coupler cleaning device 100 of the chemical supply device 2 of the present invention, the coupler 22 of the chemical supply device 2 connected to the chemical connector 14 of the tank lorry 1 As a device for cleaning before and after chemical filling, high temperature water for supplying cleaning water heated to a temperature higher than room temperature to the inside of the coupler 22 to remove chemicals and foreign substances remaining inside the coupler 22 After cleaning the coupler 22 by the supply part 100a and the heated washing water, the chemical and foreign substances remaining inside the coupler 22 are further removed and the temperature of the coupler 22 is maintained at room temperature. It includes a room temperature water supply unit 100b for supplying washing water at room temperature, and a drain unit 125 from which washing water discharged from the coupler 22 and chemicals and foreign substances are collected and discharged.

In addition, the coupler cleaning device 100 of the chemical supply device 2 of the present invention is dried to dry the inside of the coupler 22 after the cleaning of the coupler 22 using the high temperature and room temperature washing water is completed. After drying the inside of the dry gas supply unit 100c for supplying air and the coupler 22 using the dry air, moisture remaining in the pipe connected to the coupler 22 and the drain unit 125 is sucked and completely removed. It is configured to include a vacuum pump 180 for

The washing water heated to a temperature higher than room temperature supplied from the high-temperature water supply unit 100a is stored in the high-temperature water storage tank 120 along the high-temperature water supply pipe 101 .

The high-temperature water storage tank 120 stores the heated washing water supplied from the high-temperature water supply unit 100a, generates the stored washing water at a set temperature and pressure, and supplies it to the coupler 22 .

In one embodiment, the coupler 22 may be made of a Teflon material, and in consideration of the heat resistance of the Teflon material, the temperature of the washing water supplied to the coupler 22 through the high temperature water storage tank 120 is 50 It can be set to ~70°C. However, when the coupler 22 is made of a material having better heat resistance than Teflon, the set temperature of the washing water may be set to 70° C. or higher.

A washing water bypass pipe 103 branched from the room temperature water supply pipe 102 to which the normal temperature washing water supplied from the room temperature water supply unit 100b is supplied is connected to one side of the high temperature water storage tank 120 , and the high temperature water storage tank One end of the hot water supply pipe 104 is connected to the lower portion of 120 , the other end of the hot water supply pipe 104 is connected to the room temperature water supply pipe 102 , and the lower end of the room temperature water supply pipe 102 is the main supply pipe (105), the main supply pipe (105) is connected to the upper end of the coupler (22).

The high-temperature water supply pipe 101, the normal-temperature water supply pipe 102, the washing water bypass pipe 103, and the high-temperature water supply pipe 104 are provided with valves for opening and closing the pipes, respectively.

The hot water storage tank 120 stores the heated washing water supplied from the high temperature water supply unit 100a, and when the temperature of the washing water stored in the high temperature water storage tank 120 is higher than the set temperature, the washing water The washing water at room temperature is supplied to the high temperature water storage tank 120 through the bypass pipe 103 and mixed to adjust the washing water to the set temperature. In addition, by supplying the washing water to the coupler 22 after storing the washing water at a set water level in the high temperature water storage tank 120 , the washing water can be supplied at a pressure suitable for washing the coupler 22 .

The room temperature water supply unit 100b supplies cleaning water at room temperature to the coupler 22 through the room temperature water supply pipe 102 and the main supply pipe 105 .

The hot water supply unit 100a supplies the heated washing water to the coupler 22 for a set time, and when the set time elapses, the room temperature water supply unit 100b supplies the washing water at room temperature to the coupler 22 . will be supplied to That is, by supplying the heated washing water to first clean the inside of the coupler 22 for a set time, and after the set time has elapsed, by supplying the washing water at room temperature to secondly clean the inside of the coupler 22, The chemical and foreign substances remaining inside the coupler 22 are completely removed, and the temperature of the coupler 22, which is heated by the heated washing water, is lowered to room temperature to maintain it at room temperature. Do not be affected by deterioration, etc.

The drying gas supplied from the drying gas supply unit 100c is supplied to the coupler 22 through the first drying gas supply pipe 106 and the main supply pipe 105 connected thereto, and the coupler 22 is cleaned by washing water. ) to dry the inside.

A second dry gas supply pipe 107 is branched from one side of the first dry gas supply pipe 106 and is connected to the coupler 22, and the second dry gas supply pipe 107 is provided to filter impurities contained in the drying gas. For the purifier (195, Purifier) is provided.

The purifier 195 is a high-purity dry gas in which impurities are filtered in detecting moisture, hydrogen ion concentration (pH), and the number of particles, respectively, from the moisture meter 150, the PH meter 160, and the particle counter 170, which will be described later. By supplying (N2), it functions to improve the reliability of the detection result.

In addition, the purifier 195 also supplies the drying gas supplied to the coupler 22 in order to maintain the inside of the coupler 22 in a positive pressure state after the cleaning and drying of the coupler 22 is completed, as will be described later. A function of maintaining the cleanliness of the inside of the coupler 22 by allowing the dry gas supplied from the supply unit 100c to pass through the purifier 195 provided in the second dry gas supply pipe 107 to supply impurities in a filtered state. do

A dry gas bypass pipe 108 is branched from the other side of the first dry gas supply pipe 106 and is connected to the high temperature water storage tank 120 . By supplying dry gas to the hot water storage tank 120 through the dry gas bypass pipe 108 , the washing water stored in the hot water storage tank 120 is generated at a set pressure state and supplied to the coupler 22 . .

The first drying gas supply pipe 106 , the second drying gas supply pipe 107 , and the drying gas bypass pipe 108 are provided with valves for opening and closing the respective pipes.

Meanwhile, a plurality of drain pipes 110 , 111 , 112 , 113 , 114 , 115 , and 116 are connected between the lower portion of the coupler 22 and the drain part 125 .

In the lower portion of the coupler 22 , a first drain pipe 110 having a relatively wide cross-sectional area so that the washing water remaining in the coupler 22 is discharged, and a second drain pipe having a relatively narrow cross-sectional area than the first drain pipe 110 . A drain pipe 113 is connected.

The first drain pipe 110 located on the discharge side of the coupler 22 is provided with a first sensor 130 for detecting moisture therein, and is located on the discharge side of the coupler 22 . The second drain pipe 113 is provided with a second sensor 130 for detecting moisture therein.

The first drain pipe 110 is branched into a first drain branch pipe 111 and a second drain branch pipe 112 , and the first drain branch pipe 111 and the second drain branch pipe 112 are Each is connected to an upper portion of the drain unit 125 . The second drain branch pipe 112 is provided with a moisture meter 150 for measuring moisture inside the first drain pipe 110 , the first drain branch pipe 111 , and the second drain branch pipe 112 . .

The second drain pipe 113 branches into a third drain branch pipe 114 , a fourth drain branch pipe 115 , a fifth drain branch pipe 116 , and a sixth drain branch pipe 117 , and the The third drain branch pipe 114 , the fourth drain branch pipe 115 , the fifth drain branch pipe 116 , and the sixth drain branch pipe 117 are respectively connected to the upper part of the drain part 125 .

The fourth drain branch pipe 115 is provided with a PH meter 160 for detecting a hydrogen ion concentration (pH) of the washing water discharged from the coupler 22 , and the fifth drain branch pipe 116 has a coupler A particle counter 170 for detecting the number of particles contained in the washing water discharged from 22 is provided.

It can be determined whether the chemical remains from the acid or alkali level of the washing water detected by the H meter 160, and when the hydrogen ion concentration (pH) detected by the PH meter 160 is detected as neutral, the coupler 22 ), it can be judged that no chemical remains inside.

Whether to clean the coupler 22 can be determined from the number of particles detected by the particle counter 170, and when the number of particles detected by the particle counter 170 is detected to be less than a set value, cleaning of the coupler 22 is properly performed. can be considered to have been made.

When the hydrogen ion concentration (pH) detected by the PH meter 160 is detected as neutral and the number of particles detected by the particle counter 170 is detected to be less than a set value, the room temperature water supply unit 100b supplies cleaning water at room temperature. will stop

A vacuum tube 118 is connected to one side of the sixth drain branch pipe 117 , and the second drain pipe 113 and the third to sixth drain branch pipes 114 , 115 , 116 and 117 connected thereto are connected to the vacuum tube 118 . A vacuum pump 180 for sucking and removing the moisture is provided.

In addition, the vacuum tube 118 is provided with a gas-liquid separator 190 for separating the liquid contained in the fluid flowing toward the vacuum pump (180). The gas-liquid separator 190 separates the liquid contained in the fluid flowing toward the vacuum pump 180 along the vacuum tube 118 by the operation of the vacuum pump 180, so that only the gas component is present in the vacuum pump 180. Since it is sucked, it is possible to prevent the vacuum suction power of the vacuum pump 180 from being lowered.

When the moisture detected by the first sensor 130 provided in the first drain pipe 110 having a large cross-sectional area is less than a set value, the second sensor 140 provided in the second drain pipe 113 having a narrow cross-sectional area ) can be determined that there is no residual water inside the coupler 22 even if the moisture detected in the exceeds the set value, in this case, the vacuum pump 180 can be configured to operate. That is, since the washing water discharged from the coupler 22 is rapidly discharged through the first drain pipe 110 with a large cross-sectional area by gravity, when the moisture content detected by the first sensor 140 is less than a set value It can be determined that there is no residual water in the coupler 22 even if some moisture is detected in the second drain pipe 110 with a narrow cross-sectional area. In this case, the vacuum pump 180 is operated to operate the second drain pipe 113 ) and the third to sixth drain branch pipes 114 , 115 , 116 , and 117 connected thereto are completely removed from moisture.

In one embodiment, the vacuum pump 180 may be configured to operate until the moisture measured by the moisture meter 150 is measured to be less than a set value.

In another embodiment, the vacuum pump 180 may be configured to be operated for a set time.

On the other hand, in the second drain branch pipe 112, the fourth drain branch pipe 115, the fifth drain branch pipe 116, and the sixth drain branch pipe 117, the moisture meter 150 and the PH meter ( 160), a particle counter 170, and a valve for controlling the inflow of the washing water to the vacuum tube 118 are provided, respectively.

A drain pipe 119 through which the washing water collected in the drain unit 125 and chemicals and foreign substances is discharged is connected to one side of the drain unit 125 .

The primary cleaning of the coupler 22 using the heated washing water supplied from the high-temperature water supply unit 100a, and the secondary washing of the coupler 22 using the normal-temperature washing water supplied from the normal temperature water supply unit 100b, and , when the drying of the coupler 22 using the drying gas supplied from the drying gas supply unit 100c, and the removal of moisture in the pipe using the vacuum pump 180 are completed, the inside of the coupler 22 is in a positive pressure state. The dry gas supplied from the dry gas supply unit 100c passes through the purifier 195 to filter out impurities from the inside of the coupler 22 so as to maintain and block foreign substances from flowing into the coupler 22 . It can be configured to be supplied as

Hereinafter, a cleaning method of the coupler 22 of the chemical supply device 2 of the present invention will be described with reference to FIGS. 3 and 4 .

First, the chemical and foreign substances remaining inside the coupler 22 are first cleaned using the heated washing water (hot water) supplied from the high-temperature water supply unit 100a, and the washing water discharged from the coupler 22 and this Drain the contained chemicals and foreign substances (S1).

When the first cleaning of the coupler 22 using the high temperature water is completed, the chemical and foreign substances remaining inside the coupler 22 are secondarily cleaned using the cleaning water at room temperature supplied from the room temperature water supply unit 100b. The temperature of (22) is lowered to be maintained at room temperature, and the washing water discharged from the coupler 22 and the chemicals and foreign substances contained therein are drained (S2).

In the process of proceeding to step S2, the PH meter 160 detects the hydrogen ion concentration (pH) of the drained washing water, and the particle counter 170 detects the number of particles included in the drained washing water (S3) ).

The detected hydrogen ion concentration (pH) is detected as neutral, it is determined whether the number of detected particles is less than a set value (S4), and when the conditions are satisfied, the supply of washing water at room temperature is stopped, and the drying gas supply unit (100c) The inside of the coupler 22 is dried using the drying gas supplied from the coupler 22 to drain the residual water inside the coupler 22 (S5).

In the process of performing the step S5, moisture is measured using the first sensor 130 and the second sensor 140 (S6).

As a result of detecting moisture inside the coupler 22, if no moisture is detected by the first sensor 130, it is confirmed that there is no residual water inside the coupler 22 (S7), and the vacuum pump 180 is operated to remove the water. 2 The water remaining in the drain pipe 113 and the third to sixth drain branch pipes 114, 115, 116, and 117 connected thereto is sucked and completely removed (S8).

In the process of performing the step S8, the moisture meter 150 measures the moisture inside the first drain pipe 110 and the first drain branch pipe 111 and the second drain pipe 113 connected thereto (S9). .

As a result of the moisture measurement by the moisture meter 150, when the measured moisture is detected to be less than the set value, the operation of the vacuum pump 180 is stopped (S10, S11).

When the operation of the vacuum pump 180 is stopped, a drying gas is supplied to the inside of the coupler 22 to maintain the inside of the coupler 22 in a positive pressure state, and foreign substances from the outside of the coupler 22 are removed from the inside of the coupler 22 . Block the inflow into the coupler 22 so that the inside is maintained in a clean state (S12).

As described above, the present invention is not limited to the above-described embodiments, and obvious modifications can be made by those of ordinary skill in the art to which the invention pertains without departing from the technical spirit of the invention as claimed in the claims. It is possible, and such modifications fall within the scope of the present invention.

1: Tank lorry 2: Chemical supply device
10: chemical tank 11: nitrogen hose
12: chemical hose 13: nitrogen connector
14: chemical connector 21: nitrogen coupler
22: coupler for chemical 23: nitrogen supply pipe
24: chemical supply pipe 25: cleaning solution supply pipe
26: dry gas supply pipe 27: exhaust pipe
28: drain part 29: drain pipe
100: coupler cleaning device 100a: hot water supply
100b: room temperature water supply unit 100c: dry gas supply unit
101: hot water supply pipe 102: room temperature water supply pipe
103: washing water bypass pipe 104: hot water supply pipe
105: main supply pipe 106: first dry gas supply pipe
107: second dry gas supply pipe 108: dry gas bypass pipe
110: first drain pipe 111: first drain branch pipe
112: second drain branch pipe 113: second drain pipe
114: second drain branch pipe 115: fourth drain branch pipe
116: fifth drain branch pipe 117: sixth drain branch pipe
118: vacuum tube 119: discharge tube
120: high temperature water storage tank 125: drain part
130: first sensor 140: second sensor
150: moisture meter 160: PH meter
170: particle counter 180: vacuum pump
190: gas-liquid separator 195: Purifier

Claims (18)

A high-temperature water supply unit for supplying washing water heated to a temperature higher than room temperature inside the coupler to remove chemicals and foreign substances remaining inside the coupler of the chemical supply device connected to the chemical connector of the tank lorry;
a room temperature water supply unit for additionally removing chemicals and foreign substances remaining inside the coupler after cleaning the coupler by the heated washing water and supplying washing water at room temperature so that the temperature of the coupler is maintained at room temperature; and
a drain unit through which the washing water discharged from the coupler and chemicals and foreign substances are discharged;
Coupler cleaning device of the chemical supply device comprising a. According to claim 1,
The coupler cleaning apparatus of the chemical supply device further comprising a high-temperature water storage tank for storing the heated washing water supplied from the high-temperature water supply unit, and for supplying the stored washing water to the coupler by generating the stored washing water at a set temperature and pressure. According to claim 1,
The hot water supply unit supplies the heated washing water to the coupler for a set time,
When the set time elapses, the room temperature water supply unit is a coupler cleaning apparatus of a chemical supply device, characterized in that for supplying the cleaning water at room temperature to the coupler. According to claim 1,
In the drain pipe connecting the coupler and the drain part, a PH meter for detecting the hydrogen ion concentration of the washing water passing through the drain pipe, and particles for detecting the number of particles included in the washing water passing through the drain pipe Coupler cleaning device of the chemical supply device, characterized in that the counter is provided. 5. The method of claim 4,
When the hydrogen ion concentration detected by the PH meter is detected to be neutral and the number of particles detected by the particle counter is detected to be less than a set value, the room temperature water supply unit stops supplying the cleaning water at room temperature. cleaning device. According to claim 1,
The coupler cleaning device of the chemical supply device further comprising a drying gas supply unit for supplying a drying gas to the inside of the coupler where the supply of the cleaning water at room temperature is stopped. 7. The method of claim 6,
A first drain pipe having a relatively wide cross-sectional area and a second drain pipe having a relatively narrower cross-sectional area than the first drain pipe are connected to a lower portion of the coupler so that the washing water remaining in the coupler is discharged;
a first sensor for detecting moisture inside the first drain pipe located on the discharge side of the coupler;
The coupler cleaning apparatus of the chemical supply device further comprising a second sensor for detecting moisture inside the second drain pipe located on the discharge side of the coupler. 8. The method of claim 7,
A vacuum tube is connected to the second drain tube,
The vacuum tube is provided with a vacuum pump for sucking the moisture remaining inside the second drain tube,
When the moisture detected by the first sensor is less than a set value, the coupler cleaning device of the chemical supply device, characterized in that the operation of the vacuum pump. 9. The method of claim 8,
The first drain pipe is further provided with a moisture meter for measuring moisture inside the first drain pipe,
Coupler cleaning apparatus of a chemical supply device, characterized in that the operation of the vacuum pump is stopped when the moisture measured by the moisture meter is less than the set value. 9. The method of claim 8,
The vacuum tube has a coupler cleaning apparatus of a chemical supply device, characterized in that the gas-liquid separator for separating the liquid contained in the fluid flowing toward the vacuum pump is additionally provided. 7. The method of claim 6,
The coupler cleaning apparatus of a chemical supply device further comprising a purifier for filtering impurities contained in the dry gas supplied into the coupler from the dry gas supply unit. 12. The method of claim 11,
When the cleaning and drying of the coupler is completed, the dry gas supplied from the dry gas supply unit passes through the purifier and is filtered to maintain a positive pressure inside the coupler, and then is supplied to the inside of the coupler. The device's coupler cleaning device. supplying and draining washing water heated to a temperature higher than room temperature inside the coupler to remove chemicals and foreign substances remaining inside the coupler of the chemical supply device connected to the chemical connector of the tank lorry; and
supplying and draining cleaning water at room temperature to further remove chemicals and foreign substances remaining inside the coupler after cleaning the coupler by the heated washing water and to maintain the temperature of the coupler at room temperature;
A coupler cleaning method of a chemical supply device comprising a. 14. The method of claim 13,
The step of supplying and draining the washing water at room temperature,
Further comprising the step of detecting the hydrogen ion concentration of the drained washing water and the number of particles contained in the drained washing water,
When the detected hydrogen ion concentration is detected as neutral and the detected number of particles is less than a set value, the cleaning method of a coupler of a chemical supply device, characterized in that the supply of the cleaning water at room temperature is stopped. 15. The method of claim 14,
When the supply of the washing water at room temperature is stopped, the coupler cleaning method of the chemical supply device further comprising the step of supplying a drying gas to the inside of the coupler. 14. The method of claim 13,
Further comprising the step of detecting moisture inside the coupler,
As a result of detecting moisture inside the coupler, if it is confirmed that there is no residual water inside the coupler, the step of removing moisture remaining in the drain pipe by operating a vacuum pump provided in a vacuum pipe connected to the drain pipe from which the washing water is drained is further performed A method for cleaning a coupler of a chemical supply device comprising a. 17. The method of claim 16,
When the vacuum pump is operated, further comprising the step of detecting moisture in the drain pipe,
When the moisture inside the drain pipe is detected to be less than a set value, the coupler cleaning method of the chemical supply device, characterized in that the operation of the vacuum pump is stopped. 18. The method of claim 17,
When the operation of the vacuum pump is stopped, the coupler cleaning method of the chemical supply device further comprising the step of supplying a dry gas to the inside of the coupler to maintain the inside of the coupler in a positive pressure state.

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