KR102298835B1 - Component composition measurement system and method for component composition measurement - Google Patents

Abstract

The component composition measurement system comprises a first laser light source that irradiates a first laser light L1 having an intensity that generates plasma to a measurement target, and a second laser light L2 that has an intensity that does not generate plasma. ) a second laser light source for irradiating the measurement target, a spectrum measuring device for measuring an emission spectrum representing an intensity for each wavelength from emission of plasma generated by irradiation of the first laser light to the measurement target, and the measured emission spectrum A control device is provided for analyzing the composition of the measurement target using the data of The second laser light source starts irradiation of the second laser light L2 before the start of irradiation of the first laser light L1, and irradiation of the second laser light L2 after completion of the irradiation of the first laser light L1 to quit

Description

Component composition measurement system and method for component composition measurement

The present invention relates to an apparatus and method for measuring a component composition of an object to be measured using laser induced breakdown spectroscopy.

As a method for analyzing the component composition of a material, there is a laser induced breakdown spectroscopy (LIBS). In laser induced breakdown spectroscopy, a laser beam is irradiated to the surface of a measurement object, plasma is generated, and the element component constituting the inspection object is measured by analyzing the emission spectrum of the plasma.

More specifically, in laser induced breakdown spectroscopy, a plasma including ions in an excited state is generated on the measurement target surface by condensing and irradiating a laser to the measurement object and rapidly heating the surface of the measurement object. When excited electrons fall to a lower energy level, they emit light with a frequency characteristic of the component. Since the emission intensity is correlated with the atomic number density, by obtaining the wavelength and spectral line intensity of each spectrum, it is possible to identify and measure the substance present in the measurement object. Here, the emission spectral intensity Ii of atom i by natural emission is expressed by the following formula.

n _(i) is the concentration of element i, K _(i),j is the variable containing the Einstein coefficient, g _(i),j is the degree of degeneracy, E _(i),j is the upper energy, K _B is the Boltzmann constant, T represents the plasma temperature. When performing quantitative analysis, clarification of factors affecting the _{luminescence intensity I(i), such as plasma temperature, becomes important.}

Laser organic breakdown spectroscopy is applied for quantitative and elemental analysis of various samples. For example, Patent Document 1 discloses a system for detecting harmful substances in waste wood using laser organic breakdown spectroscopy. The system of Patent Document 1 is a system for detecting harmful substances in waste wood, and includes a conveying device for conveying the waste wood, a laser organic breakdown (LIBS) device for detecting hazardous materials in the waste wood conveyed to the conveying device, and a laser organic brake It consists of a classification apparatus which classifies only the harmful|toxic wood containing a hazardous|toxic material from harmless wood by the signal from a down device. According to the system of patent document 1, harmful substances, such as a preservative applied to waste wood from a building etc., can be detected simply and quickly in real time.

In addition, Patent Document 2 and Non-Patent Document 1 disclose a LIBS device using a short laser pulse and a long laser pulse. Patent Document 2 discloses a LIBS device in which a short laser pulse that causes breakdown and a long laser pulse that does not cause breakdown alone are combined. Non-Patent Document 1 discloses a LIBS device in which the optical axes of a short laser pulse and a long laser pulse coincide.

Japanese Patent Laid-Open No. 2007-10371 Specification of U.S. Patent No. 8,125,627

"Double-pulse LIBS combining short and long nanosecond pulses in the microjoule range", Islam Y. Elnasharty et al., J. Anal. At. Spectrom., 2014, 29, 1660-1666.

Laser induced breakdown spectroscopy has the advantage of being able to measure the elemental composition of the measurement target in real time, but on the other hand, if there is a fluctuation in the plasma generation process, the precision decreases, and it is difficult to apply when the position or shape of the target changes. there is a problem.

An object of the present invention is to provide an apparatus and method for analyzing the composition of a measurement target by using laser induced breakdown spectroscopy, and to provide an apparatus and method that enable accurate composition analysis.

A component composition measurement system according to the present invention comprises a first laser light source that irradiates a first laser beam having an intensity that generates plasma to a measurement target, and a second laser beam that has an intensity that does not generate plasma. a second laser light source irradiating the measurement object; a spectrum measuring device for measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by irradiation of the first laser light from the first laser light source to the measurement object; A control device is provided for analyzing the composition of the measurement target by using the obtained emission spectrum data. The second laser light source starts irradiation of the second laser light before the start of the irradiation of the first laser light, and ends the irradiation of the second laser light after the end of the irradiation of the first laser light.

A component composition measurement method according to the present invention comprises the steps of irradiating a first laser beam having an intensity that generates plasma to a measurement target, and applying a second laser beam having an intensity that does not generate plasma to the measurement target The step of irradiating, the step of measuring an emission spectrum representing the intensity for each wavelength from the emission of plasma generated by irradiation of the first laser light to the measurement object, and the measurement of the composition of the measurement object using the measured emission spectrum data Steps to analyze are provided. The irradiation of the second laser light is started before the start of the irradiation of the first laser light, and the irradiation of the second laser light is finished after the end of the irradiation of the first laser light.

According to the component composition measurement system and component composition measurement method of the present invention, the measurement target before plasma generation can be heated, and the temperature (intensity) of the plasma once generated can be maintained, and its deterioration (attenuation) can be slowed down. . As a result, a spectrum including a high-level signal that does not depend on the properties of the measurement target can be obtained, so that high measurement accuracy can be ensured.

BRIEF DESCRIPTION OF THE DRAWINGS It is the figure which showed the structure of the component composition measuring system in Embodiment 1 of this invention.
FIG. 2 is a view for explaining the temporal change of the intensity of light emission and the emission spectrum observed in laser induced breakdown spectroscopy (LIBS).
It is a figure explaining the timing of laser pulse irradiation and plasma measurement in a component composition measurement system.
4 is a flowchart showing the operation of the component composition measurement system.
5 is a view for explaining an example of a spectrum observed in laser induced breakdown spectroscopy.
Fig. 6 is a diagram showing the configuration of a component composition measurement system according to a second embodiment of the present invention.
7 is a diagram for explaining double pulse irradiation in the second embodiment.
Fig. 8 (A) is a diagram showing changes in the intensity of plasma emission when single pulse irradiation is performed, and (B) is a diagram showing changes in plasma emission intensity when irradiating with double pulses.
9 is a diagram for explaining the waveform of each pulse used for the first and second measurements.
It is a figure which shows the result of 1st measurement (measurement object = iron plate (stainless steel plate) installed in air).
It is a figure which shows the result of 2nd measurement (measurement object = aluminum plate installed in water).
It is a figure explaining irradiation timing in various irradiation methods of a laser pulse.
Fig. 13 is a diagram showing measurement results performed on a sample whose surface has been polished.
Fig. 14 is a view showing measurement results performed on a sample with a rusty surface.
Fig. 15(A) is a diagram showing an SEM image of the measurement target surface after single pulse irradiation of the measurement target, and (B) is a diagram showing an SEM image of the measurement target surface after double pulse irradiation of the measurement target.
Fig. 16 is a view showing measurement results when single-pulse irradiation or double-pulse irradiation (after) is performed on solid steel and molten steel in order to confirm the pretreatment effect (heating effect).
Fig. 17 is a diagram showing measurement results when double-pulse irradiation (before) is performed on solid steel and molten steel in order to confirm the pretreatment effect (heating effect).
18 is a diagram showing an example of the configuration of a light source device capable of irradiating two types of laser beams.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of a component composition measurement system according to the present invention will be described with reference to the accompanying drawings. The component composition measurement system described below is a system for measuring the composition of a measurement target using laser induced breakdown spectroscopy (LIBS).

(Embodiment 1)

1. System configuration

Fig. 1 shows the configuration of a first embodiment of the component composition measurement system of the present invention. The component composition measurement system 100 includes a laser light source 10 , a beam splitter 12 , a focus lens 14 , a focus adjustment unit 16 , an optical path changing optical member 18 , and an irradiation position changing unit 20 , a condensing lens 22 , a spectrum measuring device 30 , a three-dimensional shape measuring device 40 , and a control device 50 (analyzing device) are provided.

The laser light source 10 is a light source device that has an intensity that does not generate plasma and can output laser light in a predetermined wavelength band, and is made of, for example, a YAG laser.

The focus adjusting unit 16 is a means for adjusting the focus of the laser light irradiated from the laser light source 10 , and includes a motor or an actuator for moving the focus lens 14 along an optical axis.

The optical path changing optical member 18 is an optical member for changing the optical path of the laser light irradiated from the laser light source 10, and is composed of a mirror, a prism, or flat glass or the like. The irradiation position changing unit 20 is a means for rotating or moving the optical path changing optical member 18 in parallel to change the optical path of the laser light, and includes a motor, an actuator, and the like.

The beam splitter 12 transmits the laser light irradiated from the laser light source 10 and has a function of reflecting the light incident from the measurement target 200 side to the spectrum measuring device 30 side.

The spectrum measuring device 30 is a device that measures the intensity distribution (emission spectrum) for each wavelength with respect to the incident light. The spectrum measuring device 30 includes a spectrometer 32 and an ICCD (Intensified Charge Coupled Device) camera 35 . The spectrometer 32 includes, for example, a diffraction grating or a bandpass filter. The ICCD camera 35 converts a signal of light spatially modulated based on the wavelength by the spectrometer 32 into an electrical signal (image signal), thereby generating an emission spectrum. In addition, the spectrum measuring apparatus 30 is not limited to the structure shown in FIG. 1, As long as it can measure an emission spectrum, it can take arbitrary structures.

The three-dimensional shape measuring apparatus 40 is an apparatus for three-dimensionally measuring the shape (ie, distance) of the measurement target 200 . As the three-dimensional measurement device, any configuration (technique) can be used as long as it is a configuration capable of measuring the three-dimensional shape of an object. For example, the three-dimensional measurement device 40 may include a TOF (Time Of Flight) sensor. Alternatively, the three-dimensional measurement device 40 may include two cameras arranged in a shifted position, and three-dimensionally measure the shape of the measurement target by stereo method using images captured by the two cameras. The three-dimensional shape measuring device 40 transmits information indicating the measurement result of the measurement target 200 to the control device 50 .

The control device 50 (analysis device) acquires emission spectrum data from the spectrum measurement device 30 , and analyzes it to analyze the component composition of the measurement target 200 . The control device 50 determines the shape and distance of the measurement target 200 based on the measurement result by the three-dimensional shape measurement device 40 in addition to the analysis of the emission spectrum, and based on the determination result, the focus adjustment unit 16 ) and the irradiation position change unit 20 are also controlled. The control device 50 is an information processing device (eg, a personal computer) including a CPU, and realizes a predetermined function by the CPU executing a predetermined program. In addition, you may implement|achieve the analysis function of the emission spectrum and the control function of the focus adjustment part 16 and the irradiation position change part 20 by each computer (CPU). In addition, instead of realizing the function of the control device 50 by a combination of hardware (CPU) and software, only hardware (electronic circuit) designed exclusively for realizing a predetermined function may be realized. That is, the control device 50 may include an MPU, DSP, FPGA, ASIC, or the like instead of the CPU.

2. Behavior of the system

The operation of the component composition measurement system 100 configured as described above will be described. The component composition measurement system 100 measures the composition of the measurement object 200 using laser organic breakdown spectroscopy (LIBS).

The component composition measurement system 100 irradiates laser light from the laser light source 10 to the surface of the measurement object 200 . The focus of the irradiated laser light is adjusted by the focus adjusting unit 16 . In addition, the irradiation position of the laser beam on the measurement object 200 (that is, the optical path of the laser light) is changed by the irradiation position changing unit 20 . The three-dimensional shape measuring device 40 three-dimensionally measures the shape (distance) of the measurement target 200 and transmits it to the control device 50 . The control device 50 controls the focus adjusting unit 16 and the irradiation position changing unit 20 based on the measurement result from the three-dimensional shape measuring device 40 .

The laser light source 10 irradiates pulsed laser light (laser pulse). Laser light (laser pulse) passes through the focus lens 14 , the optical path changing optical member 18 , and the beam splitter 12 , and is irradiated onto the surface of the measurement object 200 . A high-temperature plasma is generated on the surface of the measurement object 200 by irradiating the laser beam onto the surface of the measurement object 200 . The plasma emission is reflected by the beam splitter 12 and is incident on the spectrum measuring device 30 through the lens 22 .

The spectrum measuring device 30 measures the intensity of light from the plasma for each wavelength to obtain an emission spectrum. The data of this emission spectrum is transmitted to the control device 50 . The control device 50 analyzes the data of the emission spectrum to analyze the composition of the measurement target 200 .

2 is a view for explaining laser induced breakdown spectroscopy. Fig. 2(A) is a diagram showing the temporal change of plasma emission observed in laser induced breakdown spectroscopy. As shown in Fig. 2(A), when laser light (laser pulse) is irradiated to the measurement target surface at time t0, plasma is generated on the measurement target surface. The light emission intensity of plasma shows the highest value immediately after laser pulse irradiation, and then decreases as the plasma cools with the lapse of time. In the cooling process of this plasma, atomic emission is measured. At this time, the composition of the measurement target is measured based on the measured atomic emission.

2(B), (C), and (D) are diagrams showing emission spectra observed with the plasma emission shown in FIG. 2(A), respectively, showing emission spectra observed at times t1, t2, and t3. At time t1 immediately after laser pulse irradiation, as shown in Fig. 2(B), since the noise due to blackbody radiation is large, the spectrum of atomic emission is hidden by the noise and cannot be observed. As time elapses, as shown in Figs. 2(C) and 2(D), when the noise is reduced and the level of atomic emission with respect to noise is relatively high (that is, when the S/N ratio is increased), atomic emission becomes observable. .

For this reason, in the component composition measurement system 100, as shown in FIG. 3, after a predetermined delay time D has elapsed from the irradiation of the laser pulse, for a predetermined width of the observation time Tm, plasma emission, i.e., atomic emission, is emitted. Take measurements. The delay time D is set to a time at which noise is sufficiently reduced and atomic emission can be sufficiently observed (that is, a time at which a sufficient S/N ratio is obtained).

Here, even if the delay time D and the observation time Tm are constant, if the plasma state to be generated fluctuates for each measurement, the observed atomic emission also fluctuates greatly, making it difficult to measure with high precision. Therefore, the component composition measurement system 100 of the present embodiment controls the irradiation conditions of the laser pulse so that the generated plasma state does not fluctuate, and does not use the measurement results measured in the plasma state with fluctuations for analysis. do. Thereby, the precision of composition analysis is improved.

Hereinafter, the operation of the component composition measurement system 100 will be described using the flowchart of FIG. 4 .

In the component composition measurement system 100 , the shape and distance of the measurement target 200 are measured by the three-dimensional shape measurement device 40 ( S11 ). The measurement result is transmitted to the control device 50 .

Based on the measurement result (distance, shape) by the three-dimensional shape measuring device 40, the control device 50 determines that the measurement target 200 is in the in-focus position and the laser pulse irradiation position on the measurement target. It is determined whether the shape is a flat area in which there is no sudden shape change (S12).

The control device 50 determines the distance of the portion of the laser pulse irradiation position in the measurement target 200 based on the measurement result by the three-dimensional shape measuring device 40, and from the distance, the measurement target 200 It is determined whether it is in the in-focus position. In addition, the control device 50 determines the shape of the area at the irradiation position of the laser pulse in the measurement target 200 based on the measurement result by the three-dimensional shape measuring device 40, and the shape of the area is sharply decreased. It is determined whether the shape is flat without change. Whether or not the shape is a flat shape without a sharp shape change is determined based on, for example, the angle between the laser irradiation direction and the measurement surface. Specifically, when the angle between the laser irradiation direction and the measurement surface is equal to or less than a predetermined angle (X°), it is determined that the shape is flat without a sharp change in shape. The control device 50 stores the information of the predetermined angle (X°), calculates the angle of the laser irradiation direction and the measurement surface from the shape measurement result, and compares the calculated angle with the predetermined angle (X°), It is determined whether the shape is flat without a sharp shape change. The angle X is set according to the measurement object (for example, ferrous material, slag, molten metal, etc.).

At least, when the measurement object 200 is not at the in-focus position or the shape at the irradiation position of the laser pulse on the measurement object 200 is not flat (when there is a sharp shape change) (NO in S12), the control device At (50), the laser light irradiation conditions are adjusted (S19).

That is, when the measurement target 200 is not at the in-focus position, the control device 50 controls the focus adjusting unit 16 so that the measurement target 200 is located at the in-focus position to adjust the position of the focus lens 14 . . Thereby, even when the position of the measurement object 200 fluctuates|varies, the laser beam can be irradiated in the state always focused on the measurement object 200 .

In addition, when the shape at the irradiation position of the laser pulse on the measurement target 200 is not flat (that is, when there is a sharp shape change), the control device 50 determines that the laser pulse on the measurement target 200 is measured. The irradiation position change unit 20 is controlled to change the irradiation position of the laser pulse so that it is irradiated to a flat area on the target 200 (ie, an area without a sharp change in shape) (S19). After that, the process returns to step S11.

Here, the reason for controlling the laser light to be irradiated to the flat area as described above will be described. When laser light is irradiated to a flat region and when laser light is irradiated to a region having a rapid shape change, the temperature of the generated plasma is different. In a region with a rapid shape change, the laser irradiation area mainly increases, and the amount of laser energy irradiated per unit area decreases. When the angle between the laser irradiation direction and the measurement surface is X°, the amount of laser energy irradiated per unit area is multiplied by sin(X). sin(X) is 1 or less, and when X=90° (a laser beam at right angles to the measurement surface is irradiated), sin(X)=1, X=45° (laser light at an angle of 45° to the measurement surface) This irradiation), sin(X) = 1/√2. That is, as the angle X deviates from 90°, the attenuation of the amount of energy irradiated per unit area increases. Therefore, the temperature of plasma generated by irradiation of laser light to a region with abrupt shape change (that is, a region with irregularities) is lower than the temperature of plasma generated by irradiation of laser light to a flat region. As described above, the plasma state (temperature) generated differs depending on the shape of the laser beam irradiation area, and the fluctuation of the plasma state affects the measurement accuracy. Therefore, in order to reduce such a fluctuation|variation in a plasma state, in this embodiment, the shape of the measurement object 200 is determined, and control is carried out so that a laser beam may be irradiated to a flat area (S12, S19).

On the other hand, when the measurement object 200 is in the in-focus position and the shape at the irradiation position of the laser pulse on the measurement object is flat (that is, there is no sharp shape change) (YES in S12), the control device 50 ) irradiates a laser pulse from the laser light source 10, generates plasma on the surface of the measurement target 200, and acquires an emission spectrum from the plasma (S13).

The control device 50 calculates the signal intensity and the plasma temperature from the acquired emission spectrum (S14). The signal intensity of the emission spectrum may be calculated using, for example, the intensity of a signal of a predetermined element, or may be calculated using the intensity of a signal representing the maximum amplitude.

The temperature of the plasma can be calculated from the emission spectrum by the following method. 5 shows an emission spectrum obtained from plasma. In the emission spectrum of plasma shown in FIG. 5, a plurality of spectra resulting from magnesium (Mg) are observed. _{The intensity ratio I Mg1} /I _Mg2 of the plurality of magnesium spectra Mg1 and Mg2 fluctuates with temperature. Accordingly, the plasma temperature can be detected by detecting _{the intensity ratio I Mg1} /I _Mg2 of the plurality of magnesium spectra Mg1 and Mg2. In addition, the spectrum used in temperature detection is not limited to the spectrum of magnesium, You may use the spectrum of other elements (iron, aluminum, etc.).

Returning to the flowchart of FIG. 4 , the control device 50 determines whether the calculated signal strength and plasma temperature are within predetermined ranges, respectively (S15). For example, the control device 50 determines whether the calculated signal intensity is equal to or greater than a predetermined value, and further determines whether the plasma temperature is equal to or greater than a predetermined value. When at least one of the signal strength and the plasma temperature is not within the predetermined range (NO in S15), the control device 50 returns to step S11. In this case, the measured data is not used for composition analysis. On the other hand, after changing the irradiation position of a laser beam, you may make it return to step S11.

On the other hand, when both the signal strength and the plasma temperature are within a predetermined range (YES in S15), the control device 50 integrates the data of the signal strength measured at that time to the data of the signal strength measured in the past (S16).

As described above, in the present embodiment, when at least one of the signal intensity and the plasma temperature does not satisfy a predetermined condition, the measurement result is not used. That is, only the measurement results indicating a good plasma state in which the plasma state satisfies certain conditions (signal intensity, temperature) are used. As described above, by using only the measurement results showing the favorable plasma state, the decrease in measurement accuracy is prevented.

The control device 50 determines whether the number of times of integrating the signal strengths of the spectrum has reached a predetermined number of integrations (S17). When the predetermined number of times of integration has not been reached (NO in S17), the control device 50 returns to step S11, repeats the above processes (S11 to S16), and acquires data for the predetermined number of times of integration. On the other hand, after changing the irradiation position of a laser beam, you may make it return to step S11. In this way, by integrating and using the measurement data of a plurality of times, the influence of noise is eliminated and the measurement accuracy is improved. When the predetermined number of times of integration is reached (YES in S17), the control device 50 calculates the concentration of each element constituting the measurement target 200 from the spectrum in which the signal intensity is integrated (S18). The calculated density information may be recorded on a recording medium (SSD, HDD) in the control device 50, displayed on a display, or printed by a printer. Alternatively, it may be transmitted to another device (control device, server, etc.).

3. Clean up

As described above, the component composition measurement system 100 of the present embodiment includes a laser light source 10 that irradiates laser light (laser pulse) to the measurement object 200 , and a laser from the laser light source to the measurement object 200 . A spectrum measuring device 30 for measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by light irradiation, and a control device 50 for analyzing a composition of a measurement target using the measured emission spectrum data. be prepared The control device 50 determines the properties of the emission spectrum (S15 in Fig. 4), and analyzes the composition of the measurement target using only the data of the emission spectrum in which the properties are in a predetermined state.

As described above, according to the component composition measurement system 100 of the present embodiment, when laser induced breakdown spectroscopy is applied, the property of the emission spectrum is determined, and a signal with a possibility of a decrease in precision is analyzed based on the property. excluded from the data used for Thereby, fluctuations in the generated plasma state can be reduced, and high measurement accuracy can be ensured.

For example, the control device 50 may determine the plasma temperature and/or signal intensity from the emission spectrum (S15), and analyze the composition of the measurement target using the emission spectrum in which the plasma temperature is a predetermined temperature or higher.

Moreover, the component composition measurement system 100 may measure the emission spectrum multiple times, and may analyze the composition of a measurement object using the result of integrating|accumulating the data of several emission spectrum. Accuracy of measurement data can be improved by integrating and using the data measured a plurality of times.

In addition, the component composition measurement system 100 includes a three-dimensional shape measurement device 40 for measuring the three-dimensional shape of the measurement object 200 and a focal point for adjusting a focal length of a laser beam irradiated from the laser light source 10 to the measurement object You may further provide the adjustment part 16.

The control apparatus 50 may control the focus adjustment part 16 based on the measurement result by the three-dimensional shape measuring apparatus 40, and may adjust the focal length of a laser beam. Thereby, the laser beam can always be focused and irradiated to the measurement object 200 irrespective of the shape (distance) of the measurement object 200, and a laser beam can be irradiated with a fixed intensity|strength. Accordingly, it is possible to obtain an emission spectrum in a constant state without depending on the shape of the measurement target 200, and the accuracy of measurement data is improved.

Moreover, the component composition measurement system 100 may further be equipped with the irradiation position change part 20 which adjusts the irradiation position on the measurement object of a laser beam. The control device 50 may control the irradiation position change unit 20 based on the measurement result by the three-dimensional shape measuring device 40 to adjust the irradiation position of the laser beam on the measurement object 200 . Thereby, laser light can be irradiated to a position (region) in which a favorable plasma state is obtained, and an emission spectrum in a constant state can be obtained without depending on the shape of the measurement target, and the precision of measurement data is improved.

(Embodiment 2)

In Embodiment 1, as shown in FIG. 3, one type of laser pulse was irradiated to the measurement object 200, and plasma was generated. In contrast to this, in the present embodiment, in addition to the laser pulse for generating plasma, a second laser pulse having an intensity that does not further generate plasma is irradiated. By irradiating the second laser pulse in this way, the intensity of the generated plasma can be stabilized at a high level, and the intensity of the signal indicating atomic emission can be stabilized regardless of the fluctuation of the plasma.

On the other hand, in the following description, as in the first embodiment, irradiating only a laser pulse for generating plasma is referred to as "single pulse irradiation", and as in this embodiment, in addition to irradiation of a laser pulse for generating plasma, , irradiating different laser pulses in order to maintain the plasma temperature is called "double pulse irradiation".

1. System configuration

6 is a diagram showing the configuration of a component composition measurement system according to the second embodiment. The component composition measurement system 100b in Embodiment 2 adds the 2nd laser light source 10b and the beam combiner 24 in addition to the structure of the component composition measurement system 100 in Embodiment 1 is provided with Hereinafter, the laser light source 10 is called "a 1st laser light source". The beam combiner 24 is an optical member for synthesizing the laser light from the first laser light source 10 and the laser light from the second laser light source 10b to the beam splitter 12 . The first and second laser light sources 10, so that the laser light from the first laser light source 10 and the laser light from the second laser light source 10b are irradiated to the measurement object 200 in a state where their optical axes coincide The optical axis of 10b) is adjusted.

2. Double pulse irradiation

7 is a diagram illustrating laser pulses emitted from the first and second laser light sources 10 and 10b. As shown in FIG. 7 , the laser pulse (hereinafter also referred to as “long pulse”) L2 output from the second laser light source 10b is a laser pulse output from the first laser light source 10 (hereinafter also referred to as “short pulse”). It has a pulse width sufficiently larger than the pulse width of L1. For example, while the pulse width of the laser pulse L1 from the first laser light source 10 is 6 ns, the pulse width of the laser pulse L2 from the second laser light source 10b is 10,000 ns. The intensity of the laser pulse L1 output from the first laser light source 10 is set to an intensity sufficient to generate plasma by itself. On the other hand, the intensity of the laser pulse L2 output from the second laser light source 10b is set to such an intensity that plasma cannot be generated by itself. The ratio of the intensity of the laser pulse L1 (short pulse) to the laser pulse L2 (long pulse) is, for example, L1:L2 = 1:10 to 15.

In addition, the output of the laser pulse L2 is started before the laser pulse L1 is output, and its output is completed after the output of the laser pulse L1 is completed. By outputting the laser pulse L2 (long pulse) at such a timing, the measurement target can be heated in advance before the laser pulse L1 is output, and the effect of cleaning the measurement target surface (hereinafter referred to as “surface cleaning/pretreatment effect”) ) is obtained. Thereby, it can be made easy to generate|occur|produce plasma. Moreover, the effect that the fall of the plasma temperature can be delayed after plasma generation (hereinafter referred to as a "surface heating effect") is acquired.

Fig. 8(A) is a diagram showing the temperature change of plasma P1 generated when single-pulse irradiation is performed, and Fig. 8(B) is a diagram showing the temperature change of plasma P2 generated when double-pulsing irradiation is performed. In the case of single-pulse irradiation, as shown in Fig. 8(A) , the temperature (intensity) of the plasma emission P1 decreases rapidly with time after the irradiation of the laser pulse L1.

In the case of double pulse irradiation, as shown in Fig. 8(B), irradiation of laser pulse L2 is started before irradiation of laser pulse L1 for plasma generation. Thereby, the measurement object is heated in advance (pre-treatment effect (heating effect)) before irradiation of the laser pulse L1, the temperature rises, and the measurement object surface is cleaned (surface cleaning effect). After that, when plasma is generated by the laser pulse L1, the generated high-temperature plasma is maintained at a high temperature by the laser pulse L2 (heating effect). For this reason, compared with the case shown in FIG.8(A), the intensity|strength (temperature) of the light emission P2 from plasma becomes higher, and its rate of decline can be reduced. In this way, since the decrease in plasma emission intensity can be delayed, the timing of plasma measurement (that is, delay time D) can be set slower than in the case of single-pulse irradiation, and high-precision measurement that does not depend on plasma fluctuations this becomes possible

3. Measurement result

Hereinafter, an example of the measurement result of the emission spectrum of plasma using the double pulse irradiation shown in this embodiment is shown. 9 is a diagram for explaining the waveform of each pulse used for measurement. As laser light (laser pulse L1) for generating plasma, laser light having a wavelength of 532 nm was used. In addition, as a laser beam (laser pulse L2) for plasma temperature maintenance etc., the laser beam whose wavelength is 1064 nm was used. Two targets were prepared as measurement objects. The first target is an iron plate (stainless steel plate) installed in the air, and the second target is an aluminum plate installed in water.

(A) First measurement result

As a 1st measurement, the plasma emission spectrum by double pulse irradiation of the iron plate (stainless steel plate) provided in the air was measured. The composition analysis of such a target installed in the air can be applied to the measurement of the iron component in a furnace, for example.

Fig. 10(C) is a diagram showing a spectrum observed by double pulse irradiation. 10(A) and (B) are measurement results by one pulse irradiation for contrast. Specifically, Fig. 10(A) shows the emission spectrum observed when irradiating only the laser light L1 having a wavelength of 532 nm with single pulse irradiation. In the measurement result shown in FIG. 10(A), although a signal representing an iron (Fe) element can be observed, the intensity is small. Fig. 10(B) shows the emission spectrum observed when only laser light having a wavelength of 1064 nm (that is, laser light L2 for maintaining plasma temperature) is irradiated. In this case, a signal representing an elemental component is not observed. Fig. 10(C) shows the emission spectrum observed by double pulse irradiation (ie, laser light L1 having a wavelength of 532 nm and laser light L2 having a wavelength of 1064 nm). As shown in FIG.10(C), it turns out that a higher signal intensity (4.5 times) is obtained by double-pulse irradiation compared with the case of single-pulse irradiation (refer FIG.10(A)).

(B) Second measurement result

As a 2nd measurement, the plasma emission spectrum by double pulse irradiation was measured about the aluminum plate provided in water. Such composition analysis of a target installed in water can be applied to, for example, measurement of debris in a melt-down reactor.

Fig. 11(C) is a diagram showing a spectrum observed by double pulse irradiation. 11(A) and (B) are measurement results by one pulse irradiation for contrast.

Specifically, Fig. 11(A) shows the emission spectrum observed when only the laser light L1 having a wavelength of 532 nm is irradiated with single pulse irradiation. In the measurement result shown in FIG. 11(A), the signal which shows the aluminum element (Al) was not observed. This is because, in water, since the generated plasma is extinguished in a short time, measurement becomes more difficult. Fig. 11(B) shows the emission spectrum observed when only laser light having a wavelength of 1064 nm (that is, laser light L2 for maintaining plasma temperature) is irradiated. Also in this case, a signal indicating an aluminum element is not observed. Fig. 11(C) shows the emission spectrum observed by double pulse irradiation (ie, laser light L1 having a wavelength of 532 nm and laser light L2 having a wavelength of 1064 nm). Although it could not be observed by single pulse irradiation, a signal representing aluminum element (Al) was observed by double pulse irradiation.

In this way, in addition to the laser light L1 (short pulse) for generating plasma, another laser light L2 (long pulse) is irradiated. Thereby, the influence of surface properties (temperature, uneven|corrugated shape) is reduced by the surface cleaning effect and a pre-processing effect, and plasma becomes easy to generate|occur|produce. Moreover, the temperature of the generated plasma can be maintained by the heating effect, and the rate of temperature drop (intensity fall) can be slowed down. As a result, in the plasma emission spectrum, the signal representing the element can be observed more clearly.

(C) Third measurement result

Moreover, this inventor performed the measurement for confirming the surface cleaning effect. For comparison, each of the three types of laser pulse irradiation methods shown in FIG. 12 was used for measurement. That is, as shown in Fig. 12(A), when only the short pulse L1 is irradiated (hereinafter referred to as "single pulse irradiation"), and as shown in Fig. 12(B), the irradiation of the long pulse L2 after the irradiation of the short pulse L1 is performed. When the irradiation of the long pulse L2 is started before the start of the irradiation of the short pulse L1 as shown in Fig. 12(C) (hereinafter referred to as "double pulse irradiation (after)") (hereinafter referred to as "double pulse irradiation (hereinafter)") Before)"), the plasma emission spectrum was measured, respectively.

In order to verify the surface cleaning, measurements were made using a sample with a polished surface and a sample with a rusty surface. Fig. 13 shows the measurement results of a sample with a polished surface, and Fig. 14 shows the measurement results of a sample with a rusted surface. 13(A) and 14(A) are the measurement results of the spectrum in the case of single-pulse irradiation. 13(B) and 14(B) are the measurement results of the spectrum in the case of double pulse irradiation (after). 13(C) and 14(C) are the measurement results of the spectrum in the case of double pulse irradiation (before).

Referring to Figs. 13(A) to 13(C), in the case of double-pulse irradiation (before), slightly favorable spectra were obtained for samples with polished surfaces, but no significant difference was observed. It is considered that the cleaning effect was not affected because the sample surface was polished. On the other hand, for a sample with a rusty surface, as shown in Figs. 14(A) and (B), in single-pulse irradiation and double-pulse irradiation (after), a spectral waveform with a lot of noise was obtained, and no usable measurement results were obtained. . However, as shown in Fig. 14(C), in the case of double pulse irradiation (before), good measurement results are obtained due to the surface cleaning effect. This is thought to be because the surface rust was removed by the surface cleaning effect.

Fig. 15(A) is an SEM image obtained by photographing the state of the target surface after single-pulse irradiation with a rusted measurement target with a scanning electron microscope (SEM). Fig. 15(B) is an SEM image of the state of the target surface after double-pulse irradiation (before) to the rusted target. In Fig. 15A, the laser pulse L1 having a short pulse width is irradiated twice. In the case of single-pulse irradiation, as shown in FIG. 15(A), a relatively large amount of rust 80 remains. In contrast, in the case of double pulse irradiation, it can be seen that a relatively large amount of rust is removed as shown in FIG. 15(B) . From this, it turns out that there exists a cleaning effect of the target surface by double pulse irradiation (before).

(D) 4th measurement result

Moreover, this inventor performed the measurement for confirming the pretreatment effect (heating effect). 16 and 17 are diagrams showing measurement results performed on solid steel (room temperature) and molten steel (1600° C.) in order to confirm the pretreatment effect (heating effect). Also in this measurement, the spectrum was measured using each of the three types of laser pulse irradiation methods shown in FIG. In addition, below, attention is paid to the measurement of the manganese (Mn) component contained in steel. 16(A) and (B) show the measurement results when single-pulse irradiation or double-pulse irradiation (after) is performed on solid steel and molten steel, respectively. 17(A) and (B) show the measurement results when double-pulse irradiation (before) was performed on solid steel and molten steel, respectively.

Referring to FIG. 16 , in the case of single pulse irradiation or double pulse irradiation (after), the spectrum of manganese (Mn) cannot be confirmed from the measurement results for solid steel, but in the measurement results for molten steel, manganese The spectrum of the needs Mn is confirmed. This is considered to be because, in the case of molten steel, the temperature is sufficient to measure the spectrum of manganese (Mn), but the temperature of solid steel is low and the temperature is not reached enough for measurement.

On the other hand, in the case of double pulse irradiation (before), as shown in FIG. 17, the spectrum of manganese (Mn) is also measured for solid steel. This is considered to be because the surface of the measurement object is heated to a sufficient high temperature (heating effect) by irradiating the long pulse L2 before the irradiation of the short pulse L1. In this way, favorable measurement results are obtained by double-pulse irradiation (before) whether the measurement object is a solid or a liquid. That is, it is possible to measure the spectrum of manganese without being affected by the properties of the surface to be measured.

As described above, by irradiating the long pulse L2 before the irradiation of the short pulse L1 for generating plasma (double pulse irradiation (before)), the temperature of the measurement target can be raised in advance (pre-processing effect). In addition, when the target surface is flattened by the cleaning effect (that is, when the abrupt shape change of the target surface is eliminated), laser irradiation is performed more effectively, so that it is possible to efficiently generate plasma. Thereby, plasma can be generated irrespective of the property of a measurement object.

Moreover, by continuing to irradiate the laser pulse L2 even after irradiation of the laser pulse L1, the temperature of plasma can be maintained and the fall of plasma temperature can be suppressed (heating effect).

4. Clean up

As mentioned above, the component composition measurement system 100b of this embodiment generate|occur|produces the 1st laser light source 10 which irradiates the laser beam L1 which has intensity|strength of the grade which generates plasma to the measurement object 200, and plasma A second laser light source 10b that irradiates a laser light L2 having an intensity that is not high enough to the measurement object 200, and a plasma generated by irradiation of the laser light from the first laser light source 10 to the measurement object 200 A spectrum measuring device (30) for measuring an emission spectrum indicating the intensity for each wavelength from light emission, and a control device (50) for analyzing the composition of the measurement target using the measured emission spectrum data. The second laser light source 10b irradiates the laser light L2 to the measurement object 200 during a period longer than the period in which the laser light L2 of the first laser light source 10 is irradiated to the measurement object 200 . By irradiating the laser light L2 from the second laser light source 10 in addition to the laser light L1 from the first laser light source, the decrease (attenuation) of the temperature (intensity) of the plasma once generated can be delayed.

In particular, as shown in FIG. 7, the 2nd laser light source 10b starts irradiation of laser-beam L2 before the start of irradiation of laser-beam L1, and complete|finishes irradiation of laser-beam L2 after completion|finish of irradiation of laser-beam L1. Thereby, the measurement object 200 is heated in advance before irradiation of laser-beam L1, and it becomes high temperature. In addition, if there is rust or the like on the measurement target surface, it is cleaned. Thereby, it becomes easy to generate|occur|produce plasma, and a measurement becomes possible without being influenced by the property of a measurement object. In addition, since the laser light from the second laser light source 10b is irradiated at the point in time when plasma is generated by the irradiation of the laser light L1 from the first laser light source 10, the plasma can be kept warm from the point in time when the plasma is generated. , it is possible to more effectively reduce the decrease in plasma temperature. As a result, a spectrum including a high-level signal that does not depend on the strength or weakness of the plasma is obtained, so that high measurement accuracy can be ensured.

Patent Document 1 and Non-Patent Document 1 also disclose a LIBS apparatus for irradiating two types of laser pulses. However, in these documents, before the start of irradiation of one laser pulse having an intensity enough to generate plasma, the irradiation of the other laser pulse having an intensity that does not generate plasma is started, and the irradiation of one laser pulse is finished. The technical idea of terminating the irradiation of the other laser pulse later is not disclosed. Therefore, from the techniques disclosed in Patent Document 1 and Non-Patent Document 1, the surface cleaning effect and pretreatment effect shown in the present embodiment cannot be obtained.

According to the component composition measurement systems 100 and 100b described in the above embodiment, the measurement accuracy in laser induced breakdown spectroscopy is improved, and the component concentration measurement in real time even when the position or shape of the measurement target in the process changes. this becomes possible The idea of the component composition measurement system described in the above embodiment can be applied to an apparatus or system for monitoring specific components included in raw materials or products for quality control and control in production processes such as synthetic chemical plants and steel plants. have.

As described above, the first and second embodiments have been described as examples of the embodiments of the present invention. However, the spirit of the present invention is not limited to these examples, and is applicable to embodiments in which changes, substitutions, additions, omissions, and the like are appropriately performed. Moreover, it is also possible to set it as a new embodiment by combining each component demonstrated in the said embodiment. That is, the above-described embodiment shows some specific examples of the technology in the present invention, and various changes, substitutions, additions, omissions, etc. can be made within the scope of the claims or their equivalents.

(Other embodiment)

In the configuration of the component composition measurement system 100b of the second embodiment, the laser light from the second laser light source 10b may be transmitted to the vicinity of the beam combiner 24 by an optical fiber. Thereby, the 2nd laser light source 10b can be arrange|positioned at an arbitrary position. In general, the second laser light source 10b for outputting long pulsed laser light is a large device, and there is a restriction on the installation position. Therefore, transmitting the laser light of the second laser light source 10b to the optical fiber is useful in that the degree of freedom of the layout of the second laser light source 10b is increased.

In the second embodiment, the functions of the first laser light source 10 for outputting a short pulse and the second laser light source 10b for outputting a long pulse may be realized by a single light source device. Fig. 18 shows an example of the configuration of such a light source device. The laser light source 10c includes an excitation source 51 , laser media 52 , 53 , and mirrors 55 disposed at both ends on the optical path of the laser media 52 , 53 . Furthermore, the laser light source 10c includes a Pockel cell 57 , a mirror 59 , a wave plate 61 , and a beam combiner 63 .

The excitation source 51 is constituted by, for example, a flash lamp, and outputs excitation light. Laser media 52 and 53 contain Nd:YAG crystals that are excited by excitation light to generate laser light. The beam combiner 63 combines the beams using the polarization characteristics of laser light. The Pockels cell 57 is an element for short-pulse oscillation of laser light. The wave plate 61 is an element that changes the polarization characteristics of laser light.

The laser media 52 and 53 are excited by the excitation light from the excitation source 51, and output light. The light generated by the laser media 52 and 53 is reflected between the mirrors 55, and is output as laser light. The laser light from the laser medium 52 is output to the mirror 59 as a short pulse laser light through the Pockel cell 57 . On the other hand, the laser medium 53 outputs laser light of a long pulse. The mirror 59 changes the optical path of the laser light from the Pockels cell 57 so that it is incident on the wave plate 61 . The laser light of the short pulse passing through the wave plate 61 is incident on the combiner 63 . The combiner 63 synthesizes the laser light of the short pulse from the laser medium 52 and the laser light of the long pulse from the laser medium 553, and outputs it.

With the above configuration, two laser beams having different pulse widths can be output from one laser light source 10c. By replacing the laser light source 10c having such a configuration with the laser light source 10 in the component composition measurement system 100 shown in Fig. 1, a function equivalent to that of the component composition measurement system 100b shown in the second embodiment can be realized. can

(this disclosure)

It goes without saying that the ideas disclosed in each of the first and second embodiments described above can be combined. That is, the present disclosure discloses the following component composition measurement system.

(1) a first laser light source for irradiating a first laser light L1 having an intensity sufficient to generate plasma to a measurement object;

a second laser light source for irradiating a second laser light L2 having an intensity that does not generate plasma to the measurement target;

a spectrum measuring device for measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by irradiation of laser light from a first laser light source to the measurement target;

A control device for analyzing the composition of the measurement target using the measured emission spectrum data,

The second laser light source starts irradiation of the second laser light before the start of irradiation of the first laser light, and ends irradiation of the second laser light after the irradiation of the first laser light is finished.

Ingredient composition measurement system.

According to this component composition measurement system, while a measurement object can be heated before plasma generation, a measurement object can be cleaned. In addition, after the plasma is generated, the decrease in the temperature of the plasma can be delayed. Thereby, since a spectrum including a high level signal is obtained, high measurement accuracy can be ensured.

(2) In the component composition measurement system of (1), the optical axes of the first and second laser light sources may be adjusted so that the first and second laser beams are irradiated to the measurement object in a state where their optical axes coincide. . Thereby, the 1st laser beam can be irradiated to the part of the measurement object heated by the 2nd laser beam. Moreover, the temperature of the plasma generated by the 1st laser beam can be kept warm by the 2nd laser beam.

(3) In the component composition measurement system of (1), the control device may determine the properties of the emission spectrum and analyze the composition of the measurement target using only the data of the emission spectrum in which the properties are in a predetermined state. This makes it possible to exclude a signal that may cause a decrease in precision from the data used for analysis, thereby ensuring high measurement accuracy.

(4) The component composition measurement system of (3) WHEREIN: The control apparatus may determine the temperature of plasma from an emission spectrum, and may analyze the composition of a measurement object using the emission spectrum whose plasma temperature is a predetermined temperature or more. In this way, a signal that may cause a decrease in precision can be excluded from the data used for analysis.

(5) The component composition measurement system of (3) WHEREIN: The control apparatus may determine the signal intensity|strength of an emission spectrum, and may analyze the composition of a measurement object using the data of the emission spectrum whose signal intensity|strength becomes a predetermined value or more. In this way, a signal that may cause a decrease in precision can be excluded from the data used for analysis.

(6) In the component composition measurement system of (3), the control device may measure the emission spectrum a plurality of times and analyze the composition of the measurement target using the result of integrating the data of the plurality of emission spectra. Accuracy of measurement data can be improved by integrating and using data measured a plurality of times.

(7) The component composition measurement system of (1) to (6) includes a three-dimensional shape measuring device for measuring the three-dimensional shape and distance of the measurement target, and adjusting the focal length of the laser light irradiated from the first laser light source to the measurement target You may further provide focus adjustment means. The control device may control the focus adjusting means based on the measurement result by the three-dimensional shape measuring device to adjust the focal length of the laser beam. Thereby, regardless of the shape (distance) of a measurement object, a laser beam can always be focused, and a measurement object can be irradiated, and a laser beam can be irradiated with fixed intensity|strength.

(8) The component composition measurement system of (1) to (6) may further comprise a three-dimensional shape measuring device and irradiation position changing means for adjusting the irradiation position of the laser beam on the measurement target. The control apparatus may control the irradiation position changing means based on the measurement result by the three-dimensional shape measuring apparatus, and may adjust the irradiation position of the laser beam on a measurement object. Thereby, the laser beam can be irradiated to the position (region) from which a favorable plasma state is obtained, and the emission spectrum of a fixed state can be obtained irrespective of the shape of a measurement object.

(9) Furthermore, the present disclosure discloses the following component composition measurement method.

A step of irradiating a first laser beam having an intensity of a degree to generate plasma to the measurement target;

a step of irradiating a second laser beam having an intensity that does not generate plasma to the measurement target;

measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by irradiation of a first laser beam to a measurement target;

A step of analyzing the composition of the measurement target using the measured emission spectrum data,

Initiating the irradiation of the second laser light before the start of the irradiation of the first laser light, and ending the irradiation of the second laser light after the end of the irradiation of the first laser light

Component composition measurement method.

(10) In the component composition measurement method of (9), in the analyzing step, the properties of the emission spectrum may be determined and the composition of the measurement target may be analyzed using only the data of the emission spectrum in which the properties are in a predetermined state.

Claims (10)

a first laser light source for irradiating a first laser light having an intensity of a degree to generate plasma to a measurement object;
a second laser light source that irradiates a second laser beam having an intensity that does not generate plasma to the measurement target;
a spectrum measuring device for measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by irradiation of a first laser light from the first laser light source to the measurement object;
A control device for analyzing the composition of the measurement target using the measured emission spectrum data,
The second laser light source starts the irradiation of the second laser light before the start of the irradiation of the first laser light, and ends the irradiation of the second laser light after the irradiation of the first laser light is finished,
The optical axes of the first and second laser light sources are adjusted so that the first laser light and the second laser light are irradiated to the measurement object in a state where their optical axes coincide with the first laser beam and the first laser light in the measurement object The second laser is irradiated to the same position,
Ingredient composition measurement system. The method of claim 1,
the control device determines the properties of the emission spectrum and analyzes the composition of the measurement target using only the data of the emission spectrum in which the properties are in a predetermined state;
Ingredient composition measurement system. 3. The method of claim 2,
The control device determines the temperature of the plasma from the emission spectrum, and analyzes the composition of the measurement target using the emission spectrum in which the plasma temperature is a predetermined temperature or higher;
Ingredient composition measurement system. 3. The method of claim 2,
the control device determines the signal intensity of the emission spectrum, and analyzes the composition of the measurement target using data of the emission spectrum in which the signal strength is equal to or greater than a predetermined value;
Ingredient composition measurement system. 3. The method of claim 2,
The control device measures the emission spectrum a plurality of times and analyzes the composition of the measurement target using a result of integrating the data of the plurality of emission spectra;
Ingredient composition measurement system. 6. The method according to any one of claims 1 to 5,
A three-dimensional shape measuring device for measuring a three-dimensional shape and a distance of a measurement target;
Further comprising a focus adjusting means for adjusting the focal length of the laser light irradiated from the first laser light source to the measurement object,
the control device controls a focus adjusting means based on a measurement result by the three-dimensional shape measuring device to adjust a focal length of the laser light;
Ingredient composition measurement system. 6. The method according to any one of claims 1 to 5,
A three-dimensional shape measuring device for measuring a three-dimensional shape and a distance of a measurement target;
Further comprising irradiation position changing means for adjusting the irradiation position of the first laser light on the measurement object,
the control device controls the irradiation position changing means based on a measurement result by the three-dimensional shape measuring device to adjust the irradiation position of the laser light on the measurement target;
Ingredient composition measurement system. A step of irradiating a first laser beam having an intensity of a degree to generate plasma to the measurement target;
irradiating the measurement target with a second laser beam having an intensity that does not generate plasma;
measuring an emission spectrum indicating an intensity for each wavelength from emission of plasma generated by irradiation of the first laser beam to the measurement target;
and analyzing the composition of the measurement target using the measured emission spectrum data,
Start the irradiation of the second laser light before the start of the irradiation of the first laser light, and end the irradiation of the second laser light after the irradiation of the first laser light is finished,
The optical axes of the first and second laser light sources are adjusted so that the first laser light and the second laser light are irradiated to the measurement object in a state where their optical axes coincide with the first laser beam and the first laser light in the measurement object The second laser is irradiated to the same position,
Component composition measurement method. 9. The method of claim 8,
In the analyzing step, a property of the emission spectrum is determined, and the composition of the measurement target is analyzed using only the data of the emission spectrum in which the property is in a predetermined state;
Component composition measurement method. delete

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