KR102291689B1 - Sealed actuator for vacuum deposition of large area substrates without particles - Google Patents

Abstract

The present invention comprises: a vacuum chamber where a large area substrate is disposed; a substrate rotating and tilting device enabling a substrate to revolve and be tiltedly rotated; a lifting device connected to the substrate rotating and tilting device to lift the substrate inside the vacuum chamber; an inner chamber installed to be liftable in the lifting device and sealing a portion of the rotating and tilting device exposed to the outside of the vacuum chamber; and an outer chamber, where a portion of the lifting device is installed, fixated to an outer surface unit of the vacuum chamber and surrounding the other portion of the lifting device and the inner chamber. Thus, the present invention arranges the rotating (revolving) device for large area deposition, the tilting device, and the lifting device on a left side or a right side to reduce a facility volume, removes movement restriction of the lifting device in a small space, and perform uniform coating without introduction of foreign particles.

Description

Sealed actuator for vacuum deposition of large area substrates without particles

The present invention provides a compact internal structure for large-area deposition, and relates to a sealed driving device for vacuum deposition of a large-area substrate without particles capable of uniform deposition while blocking the inflow of foreign substances.

In the conventional large-area vacuum evaporation deposition technique, the deposition material is positioned at the bottom, and a rotating disk or dome is installed on the upper part of the chamber to make it orbit, or a separate rotation (rotation) passing through the rotating disc (revolution) and the rotating disc ) device and servo motor to tilt the rotating (rotating) device, an open structure is applied.

In this large-area vacuum evaporation deposition technique, foreign substances generated while rotating due to the operation structure of the devices move in the lower direction of the evaporation source, prevent the movement of the evaporation material having radiation or straightness, or are attached to the substrate together with the evaporation material. It may deteriorate the thin film quality. In particular, when applied to semiconductor substrates, etc., evaporation materials introduced together with foreign substances lead to performance degradation and defects of electronic devices formed on the substrate. It is necessary to introduce a hermetic actuator.

In addition, since the driving device for rotating the rotating disk or dome applied in the prior art is located at the upper part of the chamber, there is a restriction on space when the lifting device is driven in the Z-axis direction, so the movement of the substrate in the vertical direction is limited, and a large area For coating application, since the size of the rotating body itself becomes large, the overall volume of the equipment increases, thereby increasing the manufacturing cost.

As a related conventional reference technology, there is an aligner capable of tilting a substrate disclosed in Korean Patent No. 10-2200693 and a thin film deposition apparatus disclosed in Korean Patent No. 10-1156441.

The present invention can reduce the volume of equipment by arranging a rotation (rotation) device, a tilt device, and a lifting device for large-area deposition on the left or right side, and can solve the movement restriction of the lifting device in a narrow space, and foreign substances (Particle) To provide a sealed driving device for vacuum deposition of a large area substrate without particles that can be coated uniformly without inflow.

A sealed driving device for vacuum deposition of a large area substrate without particles according to the present invention for solving the above problems includes: a vacuum chamber in which an evaporation source for providing a deposition material is disposed at an inner lower portion; a rotation and tilt device installed from the inside to the outside of the vacuum chamber to position and fix the substrate on the evaporation source so that the deposition material of the evaporation source is deposited; a lifting device coupled to the rotating and tilting device from the outside of the vacuum chamber and configured to vertically elevate the rotating and tilting device; an inner chamber installed in the lifting device so as to be lifted and sealing a portion of the rotation and tilt device exposed to the outside of the vacuum chamber; and an outer chamber fixed to the outer surface of the vacuum chamber and provided with a part of the elevating device, the outer chamber surrounding the inner chamber and the other portion of the elevating device, wherein the rotating and tilting device is vertically disposed in the vacuum chamber and the elevating device An upper and lower penetrating portion arranged to be movable is provided.

The rotation and tilt device may include: a substrate seating unit to which the substrate is fixed; a rotating device in which the substrate seating unit is installed and rotating the substrate; and a tilt device coupled to the rotation device and tilting the substrate, wherein the rotation device rotates the substrate based on an upper and lower center line, and the tilt device rotates based on a left and right center line of the substrate make it work

The rotating device may include a timing pulley box disposed so as to be able to move up and down through the vacuum chamber, in which electric transmission elements of the rotating device for rotation of the substrate are airtightly disposed.

The tilt device may include an inner stage to which the timing pulley box is hermetically coupled to one side and electrically connected to the tilt device; an O-ring housing into which a portion of the inner stage is fitted and rotatably coupled; and a housing in which the O-ring housing is fitted to one side, the other part of the inner stage is rotatably fitted to the other side, and is installed in the lifting device.

The rotating device may include a rotating servomotor installed on the inner stage; a first timing pulley connected to the rotary servomotor and rotated; and a second timing pulley connected to the first timing pulley at a horizontal interval and airtightly installed in the timing pulley box.

The rotating device may include: a first gear socket coaxially connected to the second timing pulley; a chain box horizontally coupled to the timing pulley box and provided with a chain connected to the first gear socket; a tension adjusting device having a second gear socket installed movably in the central portion of the chain box to adjust the tension of the chain; and a third gear socket provided at an end of the chain box and connected to the chain to rotate the substrate.

The tilt device may include a tilt servomotor installed in the housing; a first tilt gear installed in the housing and connected to the tilt servomotor to rotate; and a second tilt gear that is annularly coupled to the side surface of the inner stage and gear-coupled to the first tilt gear.

The timing pulley box may include a plurality of horizontal bearings to which the second timing pulley and the first gear socket are rotatably coupled; a plurality of bearing covers to which the plurality of horizontal bearings are fitted and installed to seal the second timing pulley; and an oil seal installed so that the second timing pulley and the coaxial of the first gear socket are rotatably coupled.

The lifting device may include a guide block installed in the vacuum chamber and having a guide rail; an elevating block slidably coupled to the upper and lower rails of the guide block; a lifting motor installed on the upper part of the outer chamber; a ball screw connecting the elevating block and the elevating motor; and a female screw to which the ball screw is screwed and installed on the lifting block, wherein the inner chamber and the housing may be coupled to the lifting block.

The outer chamber may be maintained at a vacuum, and the inner chamber may be maintained at atmospheric pressure.

The present invention described above reduces the volume of equipment by arranging a rotation (rotation) device, a tilt device, and a lifting device for large-area deposition on the left or right side, and restricts the movement of the lifting device in a narrow space. It is possible to solve the problem, and it is possible to provide a sealed driving device for vacuum deposition of a large area substrate without particles that can be coated uniformly without introducing foreign substances.

1 is a three-dimensional view showing the inside of the vacuum chamber and the outer chamber.
FIG. 2 is an exploded view of some elements in the vacuum chamber of FIG. 1 .
FIG. 3 is an exploded view in another direction in which other elements are further exploded in FIG. 2 .
FIG. 4 is a cross-sectional view taken along line AA of FIG. 1 .
5 is a detailed view of the housing and timing pulley box portion of FIG. 4 ;
FIG. 6 is a front view of FIG. 1 ;
FIG. 7 is a cross-sectional view taken along line BB of FIG. 6 .

Hereinafter, various embodiments of the present invention will be described with reference to specific embodiments shown in the accompanying drawings. The differences in the embodiments are not mutually exclusive and should be understood in a complex manner, and without departing from the spirit and scope of the present invention, specific shapes, structures and characteristics described in relation to the embodiments are implemented in other embodiments. can be

The position or arrangement of individual components according to embodiments of the present invention is to be understood as a combination of the drawings as being changeable, and like reference numerals in the drawings may refer to the same or similar functions throughout various aspects, and length, area, and thickness. The specific form and the like may be exaggerated for convenience of description.

It is assumed that each unit, module, part, member, or arbitrary structure in which sub-elements are not described includes or can contain common sub-elements for each assigned function, limited to the sub-elements or detailed structures shown in the drawings. don't It should be understood that the components shown but whose description is omitted as a general description are inherent in the detailed description of the embodiments.

With reference to the conventional matters as described above, the practical implementation of various embodiments of the present invention is high,

A sealed driving device for vacuum deposition of a large-area substrate without particles according to an embodiment with high industrial applicability will be described.

Hereinafter, the main components of the hermetic driving device for vacuum deposition of a large area substrate without particles according to an embodiment of the present invention will be described with reference to the drawings.

1 is a three-dimensional view showing the inside of the vacuum chamber and the outer chamber, FIG. 2 is an exploded view in which some elements are exploded in the vacuum chamber of FIG. 1, and FIG. 3 is another detailed exploded view in which other elements are further exploded in FIG. , FIG. 4 is a cross-sectional view taken along line AA of FIG. 1 , FIG. 5 is a detailed view of the housing and timing pulley box of FIG. 4 , FIG. 6 is a front view of FIG. 1 , and FIG. 7 is a cross-sectional view BB of FIG.

1 to 3, the sealed driving device for vacuum deposition of a large-area substrate without particles according to an embodiment of the present invention, the vacuum chamber 100 in which the large-area substrate G is disposed, the substrate G ) to rotate and tilt the substrate rotating and tilting device 120, a lifting device 170 connected to the substrate rotating and tilting device 120 to elevate the substrate G in the vacuum chamber 100, elevating It is installed in the device 170 to be elevating and is fixed to the outer surface of the inner chamber 181 sealing a part of the rotation and tilt device 120 exposed to the outside of the vacuum chamber 100, and the vacuum chamber 100, A part of the elevating device 170 is installed and includes an inner chamber 181 and an outer chamber 182 surrounding the other portion of the elevating device 170 , and the vacuum chamber 100 and the elevating device 170 have a rotation and tilt device. The upper and lower penetrating portions 185 are provided so that the 120 can move up and down.

In the vacuum chamber 100 , the evaporation source 112 for providing the deposition material is disposed at the lower inner side, and one or more evaporation sources 112 are installed at the inner bottom portion.

The rotation and tilt device 120 is installed from the inside to the outside of the vacuum chamber 100 to position and fix the substrate G on the evaporation source 112 so that the deposition material of the evaporation source 112 is deposited. It may be coupled through the left or right side of the chamber 100 , and the inflow of foreign substances into the evaporation material is blocked by the inner chamber 181 and the outer chamber 182 .

That is, the rotation and tilt (Tilt) device for the rotation of the substrate (G) is a large-area substrate (G) of the vacuum chamber (100) structurally generated in the state that the rotation and tilt (Tilt) rotation driving state (Particle) A sealed structure is applied so that the driving device is not exposed to the outside to prevent inflow.

1 to 7 , the rotation and tilt device 120 includes a substrate receiving unit 150 to which a substrate G is fixed, a substrate receiving unit 150 installed therein, and a rotating device for rotating the substrate G. (121), and a tilt device 141 coupled to the rotation device 121 and tilting the substrate (G).

As such, the rotation and tilt device 120 includes a rotation device 121 and a tilt device 141 , and the substrate G is provided with a substrate seating unit 150 arranged in alignment with respect to the evaporation source 112 .

The rotation device 121 rotates the substrate G with respect to the upper and lower center lines, and is disposed to be elevated through the vacuum chamber 100 , and the rotation device 121 for rotation of the substrate G is provided. It has a timing pulley box 160 in which the transmission transmission elements are hermetically arranged.

The rotating device 121 includes a rotation servo motor 123 installed on the inner stage 142 , a first timing pulley 124 connected to the rotation servo motor 123 and rotated, and a first timing pulley 124 . It includes a second timing pulley 125 that is spaced apart from each other and connected at a horizontal interval and is airtightly installed in the timing pulley box 160 , and a first gear socket 126 that is coaxially connected to the second timing pulley 125 .

The timing pulley box 160 is provided with a chain box 127 that is horizontally coupled and is provided with a chain 128 connected to the first gear socket 126 .

The chain box 127 has a tension adjusting device 130 having a second gear socket 131 installed movably in the central portion of the chain box 127 to adjust the tension of the chain 128 , and the chain box 127 . ) is provided at the end of the third gear socket 133 is connected to the chain 128 to rotate the substrate (G) is included.

The rotation device 121 is coupled to a tilt device, and a structure in which rotation and tilt of the substrate G are possible at the same time is applied. Servo motors for each rotation and tilt are installed in the rotation device 121 and the tilt device 141 .

In the rotating device 121 , when the rotating servomotor 123 located inside the inner chamber 181 is driven, the belt connected to the first timing pulley 124 is driven, and accordingly, the second timing pulley 125 and the second timing The first gear socket 126 located above the pulley 125 is configured to be driven.

The chain 128 connected to the first gear socket 126 is configured to drive the second gear socket 131 and the third gear socket 133, which are the tension adjusting device 130, and by this configuration, the substrate ( G) can be rotated.

The gears of the first to third gear sockets of these rotating devices 121 are connected by a chain 128 with strong durability, and the second gear socket ( 131), a separate tension control device 130 is provided. The tension adjusting device 130 of the second gear socket 131 is provided to be movable by 15 mm in the front-rear direction with respect to the central axis in the tension box. Accordingly, the chain 128 is maintained at an appropriate tension.

The tilt device 141 rotates based on the left and right center lines of the substrate G, and the timing pulley box 160 is hermetically coupled to one side of the inner stage 142 and electrically connected to the tilt device 141 . , a part of the inner stage 142 is fitted and rotatably coupled, the O-ring housing 143 and the O-ring housing 143 are fitted on one side, and the other part of the inner stage 142 is rotatably coupled with the other side. and a housing 145 installed in the lifting device 170 .

In addition, the tilt device 141 includes a tilt servomotor 146 installed in the housing 145 , a first tilt gear 147 installed in the housing 145 and connected to the tilt servomotor 146 to rotate, and an inner. It may further include a second tilt gear 148 coupled to the side of the stage 142 in an annular shape and gear-coupled to the first tilt gear 147 .

Practically, the tilt device 141 includes an inner stage 142 provided with an inner cap 142a having a passage slot of the timing belt, tilt bearings 144 positioned on both sides of the inner stage 142, and a vacuum when tilting. An O-ring cap 149 positioned between the inner stage 142 and the O-ring housing 143 and having O-rings disposed in the groove to maintain airtightness, an O-ring housing 143 surrounding the O-ring cap 149, and an O-ring housing 143 It is configured to include a housing 145 surrounding the.

The inner stage 142 of the tilt device 141 coupled through the inner chamber 181 is coupled to a sealing surface of a side surface of the timing pulley box 160 of the rotation device 121 .

The O-ring housing 143 is assembled on the sealing surface of the wall surface of the inner chamber 181 in the direction of the vacuum chamber 100 and serves to maintain the vacuum airtightness by maintaining the seal toward the inner chamber 181 from the outside. That is, the vacuum chamber. As the rotation device 121 of the substrate is positioned inside ( 100 ), deposition on the substrate is possible in a vacuum state.

When the tilt servomotor 146 located inside the inner chamber 181 drives the tilt device 141, the first tilt gear 147 coupled to the tilt servomotor 146 rotates, and the first tilt gear 147 ) rotates the second tilt gear 148 coupled to the inner stage 142 . Accordingly, the rotation device 121 coupled to the inner stage 142 is tilt-rotated like a rolling rotation.

The tilt device 141 tilts the rotation device 121 by up to 50°, and a sensor capable of stable detection with little influence from external light can be applied to adjust the tilt angle. Accordingly, the rotation device 121 and the tilt device 141 operate at the same time to provide a structure in which rotation and tilt of the substrate G are possible.

Meanwhile, the timing pulley box 160 of the rotating device 121 positioned inside the vacuum chamber 100 passes through the inner chamber 181 and is coupled to the inner stage 142 of the tilt device 141 . .

The timing pulley box 160 includes a plurality of horizontal bearings 161 to which the second timing pulley 125 and the coaxial of the first gear socket 126 are rotatably coupled, and a plurality of horizontal bearings 161 are fitted. A plurality of bearing covers 162 are installed and arranged to seal the second timing pulley 125 , and an oil seal installed so that the second timing pulley 125 and the coaxial of the first gear socket 126 are rotatably coupled. (163) may be included.

The timing pulley box 160 coupled to the rotating device 121 passes through the vacuum chamber 100 and can be installed on the left or right side, and is provided with a bearing cover ( 162) is assembled.

The upper bearing cover 162 has a structure in which an oil seal 163 is inserted into the bearing cover 162 to maintain the vacuum tightness of the second pulley shaft 165 corresponding to the coaxial rotational motion, and the timing pulley A vacuum tightness is maintained with respect to the box 160 .

On the other hand, with further reference to FIGS. 1 to 7 , the lifting device 170 is coupled to the rotation and tilt device 120 outside the vacuum chamber 100 to raise and lower the rotation and tilt device 120 up and down, A guide block 171 installed in the vacuum chamber 100 and having a guide rail, a lifting block 172 that is slide-coupled to the guide rail of the guide block 171, a lifting motor installed in the upper part of the outer chamber 182 ( 173), a ball screw 174 connecting the elevating block 172 and the elevating motor 173, and a female screw 175 to which the ball screw 174 is screwed and installed in the elevating block 172. The inner chamber 181 and the housing 145 are coupled to the lifting block 172 .

The lifting device 170 may be located on one side of the inner space of the outer chamber 182 (vacuum holding) on the left or right side of the vacuum chamber 100 , and the vacuum chamber 100 in the space where the inner chamber 181 is located. ) direction, two guide rails are arranged in the vertical direction on the left and right wall surfaces.

The inner chamber 181 is connected to the guide rail, the ball screw 174 guide of the elevating device 170 is connected to the left or right upper part of the inner chamber 181 , and the elevating motor 173 installed outside the outer chamber 182 . ) and the oil seal 163 is inserted into the driving part to maintain the vacuum tightness.

The lifting device 170 is capable of ascending or descending control using a position sensor when ascending and descending in the Z-axis direction. The inner chamber 181 is raised or lowered, and as a result, the rotation device 121 and the tilt device 141 are raised or lowered.

The pipe connected to the inner chamber 181 passes through the outer chamber 182 and is connected to the outside of the chambers, and the pipe connected to the inner chamber 181 is a bellows type with excellent vacuum tightness and good durability due to repeated up-and-down reciprocating motion. This applies.

In this embodiment, the elevating device 170 capable of ascending and descending so as not to interfere with the evaporation source 112 during adjustment of the distance between the evaporation source 112 and the substrate G and tilting the substrate in the Z-axis direction. (G) It can be located on the left or right side of the process chamber so that there is no restriction of movement, and the evaporation source 112 and the substrate ( The distance to G) can be adjusted.

When the elevating device 170 for adjusting the distance between the evaporation source 112 and the substrate G is driven by the elevating motor 173 installed outside the outer chamber 182, the ball screw 174 (rotational movement is linear). converted into motion) is rotated, and the unit including the rotation and tilt device 120 , that is, the inner chamber 181 itself, is raised or lowered.

As such, the elevating device 170 can move up to 250 mm in the Z-axis direction, and since it is located on the left or right side of the process chamber, there is no restriction on movement in the Z-axis direction, so compact equipment can be manufactured, and large-area evaporation coating provides a favorable advantage to

Conventionally, a method of applying a rotating body or a dome and a tilt device in the upper (Z-axis) direction of the vacuum chamber 100 is used to deposit the evaporated material on the substrate G, and the evaporation state is detected at the center And since there is a crystal sensor for measuring the film thickness, the application area is limited when coating a large area.

In this embodiment, which has improved this, by applying the rotation and tilt device 120 and the elevation device 170 to the left or right side of the vacuum chamber 100, a large area (equal to or greater than 600 mm * 600 mm) substrate vacuum without changing the equipment volume It provides the advantage that deposition is possible.

Meanwhile, the outer chamber 182 is maintained at a vacuum, and the inner chamber 181 is configured to be maintained at atmospheric pressure.

The space and tilt ( ) in which the second timing pulley 125 positioned in the inner space of the timing pulley box 160 of the rotating device 121 and the first timing pulley 124 positioned in the inner chamber 181 are connected by a belt. Tilt) The portion including the driving device is covered with a separate inner chamber 181 to enable driving in the standby state. On the other hand, the outer chamber 182 surrounding the inner chamber 181 maintains a vacuum like the vacuum chamber 100 .

The rotation device 121 and the tilt device 141 maintain the inner chamber 181 in a standby state for input and output power of rotation and tilt servomotors and other wiring work, and a separate enclosing inner chamber 181 is provided. The outer chamber 182 (vacuum) of the two-chamber structure is applied so that atmospheric pressure and vacuum state coexist, and in this state, the inner chamber 181 itself rises or falls, and the rotating device 121 itself tilts. It is configured to be (Tilt).

It is pointed out that other application examples of the present invention are not limited to the embodiments shown above, and the embodiments can be configured by appropriately combining claims that are not explicitly cited in the claims.

Although the embodiments of the present invention have been described as described above, those of ordinary skill in the art based thereon can add or change components within the scope that does not depart from the essential technical spirit of the present invention described in the claims. , it will be possible to variously modify and change the present invention by deletion or addition, which is also included within the scope of the present invention.

G: substrate 100: vacuum chamber
112: evaporation source
120: rotation and tilt device
121: rotation device 123: rotation servomotor
124: first timing pulley 125: second timing pulley
126: first gear socket 127: chain box
128: chain 130: tension adjustment device
131: second gear socket 133: third gear socket
141: tilt device 142: inner stage
143: O-ring housing 144: tilt bearing
145: housing
146: tilt servomotor 147: first tilt gear
148: second tilt gear 149: O-ring cap
150: substrate seating unit 160: timing pulley box
161: horizontal bearing 162: bearing cover
163: oil seal
165: rotating shaft 170: lifting device
171: guide block 172: elevating block
173: elevating motor 174: ball screw
175: female screw 181: inner chamber
182: outer chamber 185: upper and lower penetrations

Claims (10)

a vacuum chamber in which an evaporation source for providing a deposition material is disposed underneath;
a rotation and tilt device installed from the inside to the outside of the vacuum chamber to position and fix the substrate on the evaporation source so that the deposition material of the evaporation source is deposited;
a lifting device coupled to the rotating and tilting device from the outside of the vacuum chamber to vertically elevate the rotating and tilting device;
an inner chamber installed in the lifting device so as to be lifted and sealing a portion of the rotation and tilt device exposed to the outside of the vacuum chamber; and
It is fixed to the outer surface of the vacuum chamber, and a part of the lifting device is installed, and it includes an outer chamber surrounding the inner chamber and the other part of the lifting device,
A sealed driving device for vacuum deposition of large-area substrates without particles, characterized in that the vacuum chamber and the elevating device are provided with upper and lower penetrating portions arranged to enable the rotation and tilt device to move up and down. The method of claim 1,
The rotation and tilt device,
a substrate seating portion to which the substrate is fixed;
a rotating device in which the substrate seating unit is installed and rotating the substrate; and
It is coupled to the rotation device, comprising a tilt device for tilting the substrate,
The rotating device rotates the substrate based on the upper and lower center lines,
The tilt device is a closed driving device for vacuum deposition of a large area without particles, characterized in that the rotation operation based on the left and right center line of the substrate. 3. The method of claim 2,
The rotating device is disposed so as to be able to move up and down through the vacuum chamber, and includes a timing pulley box in which the electric transmission elements of the rotating device for rotation of the substrate are airtightly disposed. Sealed actuator for substrate vacuum deposition. 4. The method of claim 3,
The tilt device is
an inner stage to which the timing pulley box is hermetically coupled to one side and electrically connected to the tilt device;
an O-ring housing into which a portion of the inner stage is fitted and rotatably coupled; and
The O-ring housing is fitted to one side, the other part of the inner stage is rotatably fitted to the other side, and a sealed type for vacuum deposition of a large-area substrate without particles, characterized in that it includes a housing installed in the elevating device drive device. 5. The method of claim 4,
The rotating device is
a rotary servo motor installed on the inner stage;
a first timing pulley connected to the rotary servomotor and rotated; and
A sealed driving device for vacuum deposition of large-area substrates without particles, characterized in that it includes a second timing pulley that is connected to the first timing pulley at a horizontal interval and is airtightly installed in the timing pulley box. 6. The method of claim 5,
The rotating device is
a first gear socket coaxially connected to the second timing pulley;
a chain box horizontally coupled to the timing pulley box and provided with a chain connected to the first gear socket;
a tension adjusting device having a second gear socket installed movably in the central portion of the chain box to adjust the tension of the chain; and
A sealed driving device for vacuum deposition of a large area without particles, which is provided at an end of the chain box, is connected to the chain, and further comprises a third gear socket for rotating the substrate. 5. The method of claim 4,
The tilt device is
a tilt servomotor installed in the housing;
a first tilt gear installed in the housing and connected to the tilt servomotor to rotate; and
A sealed driving device for vacuum deposition of a large area without particles, characterized in that it comprises a second tilt gear coupled to the inner stage in an annular shape to the side portion and gear-coupled to the first tilt gear. 7. The method of claim 6,
The timing pulley box,
a plurality of horizontal bearings coaxially rotatably coupled to the second timing pulley and the first gear socket;
a plurality of bearing covers to which the plurality of horizontal bearings are fitted and installed to seal the second timing pulley; and
and an oil seal installed so that the second timing pulley and the coaxial of the first gear socket are rotatably coupled. The method of claim 1,
The lifting device is
a guide block installed in the vacuum chamber and having a guide rail;
an elevating block that is slide-coupled to the guide rail of the guide block;
a lifting motor installed on the upper part of the outer chamber;
a ball screw connecting the elevating block and the elevating motor; and
The ball screw is screwed, and it includes a female screw installed in the elevating block,
The inner chamber and the housing are sealed driving device for vacuum deposition of a large area substrate without particles, characterized in that coupled to the lifting block. The method of claim 1,
The outer chamber is maintained in a vacuum, and the inner chamber is a sealed driving device for vacuum deposition of a large area substrate without particles, characterized in that it is maintained at atmospheric pressure.

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