KR102223738B1 - 일차원 나노 사슬 구조체 및 이의 제조 방법 - Google Patents
일차원 나노 사슬 구조체 및 이의 제조 방법 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 19
- 239000013078 crystal Substances 0.000 claims abstract description 33
- 239000013590 bulk material Substances 0.000 claims abstract description 26
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000002243 precursor Substances 0.000 claims abstract description 11
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 10
- 239000011593 sulfur Substances 0.000 claims abstract description 10
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 7
- 230000002194 synthesizing effect Effects 0.000 claims abstract description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 4
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 150000002367 halogens Chemical class 0.000 claims abstract description 4
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 4
- 150000003624 transition metals Chemical class 0.000 claims abstract description 4
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 4
- 238000004299 exfoliation Methods 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 11
- 238000010574 gas phase reaction Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 239000007791 liquid phase Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- 238000005411 Van der Waals force Methods 0.000 claims description 4
- 230000002687 intercalation Effects 0.000 claims description 3
- 238000009830 intercalation Methods 0.000 claims description 3
- 239000011229 interlayer Substances 0.000 claims description 3
- 239000002070 nanowire Substances 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 9
- 239000000843 powder Substances 0.000 description 7
- 238000000089 atomic force micrograph Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000003708 ampul Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000002086 nanomaterial Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 239000006250 one-dimensional material Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 238000000527 sonication Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- OCVXZQOKBHXGRU-UHFFFAOYSA-N iodine(1+) Chemical compound [I+] OCVXZQOKBHXGRU-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B1/00—Single-crystal growth directly from the solid state
- C30B1/02—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
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- C30B23/002—Controlling or regulating
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
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Abstract
[화학식 1]
MX2;
[화학식 2]
M6S9 - aXa ;
(상기 화학식 1 또는 2 에서, M 은 Mo, Cr, W 및 이들의 조합들로 이루어진 군으로부터 선택된 전이금속을 포함하고, X 는 I, F, Cl, Br 및 이들의 조합들로 이루어진 군으로부터 선택된 할로겐을 포함하고, a 는 4 내지 8 의 정수인 것임).
Description
도 2 는 본원의 일 실시예에 따른 일차원 단결정 벌크 물질의 X 선 회절패턴(XRD) 분석 결과 그래프 및 주사전자현미경(SEM) 이미지이다.
도 3 은 본원의 일 실시예 및 비교예에 따른 일차원 단결정 벌크 물질을 촬영한 사진이다.
도 4 의 (a)는 본원의 일 실시예에 따른 일차원 나노 사슬 구조체의 원자간력 현미경(AFM) 이미지이고, 도 4 의 (b)는 본원의 일 실시예에 따른 일차원 나노 사슬 구조체의 높이 프로파일(Height Profile) 분석 결과 그래프이다.
도 5 는 본원의 일 실시예에 따른 기계적 박리에 의한 일차원 나노 사슬 구조체의 원자간력 현미경(AFM) 이미지 및 높이 프로파일(Height Profile) 분석 결과 그래프이다.
도 6 은 본원의 일 실시예에 따른 액상 박리에 의한 일차원 나노 사슬 구조체의 UV-vis 분석 결과 그래프 및 원자간력 현미경(AFM) 이미지이다.
Claims (10)
- 하기 화학식 1 로서 표시되는 전구체 및 황을 반응시켜 하기 화학식 2 로서 표시되는 일차원 단결정 벌크 물질을 합성하는 단계; 및
상기 일차원 단결정 벌크 물질로부터 일차원 나노 사슬 구조체를 분리하는 단계를 포함하는,
일차원 나노 사슬 구조체의 제조 방법:
[화학식 1]
MX2;
[화학식 2]
M6S9-aXa;
(상기 화학식 1 또는 2 에서,
M 은 Mo, Cr, W 및 이들의 조합들로 이루어진 군으로부터 선택된 전이금속을 포함하고,
X 는 I, F, Cl, Br 및 이들의 조합들로 이루어진 군으로부터 선택된 할로겐을 포함하고,
a 는 4 내지 8 의 정수인 것임).
- 제 1 항에 있어서,
상기 일차원 단결정 벌크 물질을 합성하는 단계는 기상 반응을 통해 수행되는 것인, 일차원 나노 사슬 구조체의 제조 방법.
- 제 2 항에 있어서,
상기 기상 반응은 상기 전구체 및 상기 황을 혼합하여 1,000℃ 내지 1,200℃의 온도에서 열처리하는 것인, 일차원 나노 사슬 구조체의 제조 방법.
- 제 1 항에 있어서,
상기 일차원 단결정 벌크 물질은 상기 일차원 나노 사슬 구조체들이 반 데르 발스 힘에 의해 결합된 것인, 일차원 나노 사슬 구조체의 제조 방법.
- 제 1 항에 있어서,
상기 일차원 나노 사슬 구조체를 분리하는 단계는 박리법에 의해 수행되는 것인, 일차원 나노 사슬 구조체의 제조 방법.
- 제 5 항에 있어서,
상기 박리법은 액상 박리, 초음파 공정, 기계적 박리, 층간 물질 삽입, 전기 화학적 박리, 습식 화학 박리, 환원 박리, 및 이들의 조합들로 이루어진 군으로부터 선택된 방법을 포함하는 것인, 일차원 나노 사슬 구조체의 제조 방법.
- 삭제
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Citations (1)
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JP2016119441A (ja) | 2014-12-22 | 2016-06-30 | 財團法人工業技術研究院Industrial Technology Research Institute | 化合物太陽電池および硫化物単結晶ナノ粒子を有する薄膜の形成方法 |
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JP2016119441A (ja) | 2014-12-22 | 2016-06-30 | 財團法人工業技術研究院Industrial Technology Research Institute | 化合物太陽電池および硫化物単結晶ナノ粒子を有する薄膜の形成方法 |
Non-Patent Citations (2)
Title |
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1차원 무기 반도체 신 물질 재료의 연구 개발 동향_DBpia, 제21권, 제2호(2018.06월)* |
A novel facile synthesis and characterization of molybdenum nanowires_Nanoscale Research letteres, 7:567 (2012년) |
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