KR102112003B1 - 빔 분할 다중 접속 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치 및 방법 - Google Patents
빔 분할 다중 접속 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치 및 방법 Download PDFInfo
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- H01Q3/28—Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system varying the relative phase or relative amplitude of energisation between two or more active radiating elements; varying the distribution of energy across a radiating aperture varying the amplitude
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- H04B7/00—Radio transmission systems, i.e. using radiation field
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- H04B7/0615—Diversity systems; Multi-antenna system, i.e. transmission or reception using multiple antennas using two or more spaced independent antennas at the transmitting station using simultaneous transmission of weighted versions of same signal
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Abstract
Description
도 1은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치의 동작 상황을 개략적으로 도시한 도면;
도 2는 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치의 내부 구조를 개략적으로 도시한 도면;
도 3은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치의 동작 과정을 개략적으로 도시한 도면;
도 4는 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 안테나 가려짐 현상을 개략적으로 도시한 도면;
도 5는 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 안테나 가려짐 현상에 따른 반사 계수의 값을 개략적으로 도시한 도면;
도 6은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 1x4 배열 안테나가 사용될 경우의 안테나 가려짐 현상에 따른 반사 계수의 값을 개략적으로 도시한 도면;
도 7은 참조하여 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 배열 안테나와 인체간의 거리에 따른 반사 계수의 값을 개략적으로 도시한 도면;
도 8은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 배열 안테나의 가려짐 정도에 따른 반사 계수의 값을 개략적으로 도시한 도면;
도 9는 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 배열 안테나의 가려짐 정도에 따른 빔 패턴의 변화를 개략적으로 도시한 도면;
도 10은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 안테나 엘리먼트들의 동작 가능 여부에 대해서 결정하는 과정을 개략적으로 도시한 도면;
도 11은 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 정상적으로 동작하는 안테나 엘리먼트들을 사용하여 빔을 복원하는 과정의 일 예를 개략적으로 도시한 도면;
도 12는 본 발명의 일 실시예에 따른 BDMA 방식을 지원하는 통신 시스템에서 정상적으로 동작하는 안테나 엘리먼트들을 사용하여 빔을 복원하는 과정의 다른 예를 개략적으로 도시한 도면.
상기 도면들을 통해, 유사 참조 번호들은 동일한 혹은 유사한 엘리먼트들과, 특징들 및 구조들을 도시하기 위해 사용된다는 것에 유의해야만 한다.
Claims (20)
- 빔 분할 다중 접속(beam division multiple access: BDMA) 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치의 빔 패턴 조정 방법에 있어서,
상기 빔 패턴 조정 장치에 포함된 배열 안테나에 포함된 안테나 엘리먼트(element)들 각각에 대한 전압 정재파비(voltage standing wave ratio: VSWR) 값이 임계 VSWR 값 이상인지 여부를 결정하는 과정;
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트의 VSWR 값이 임계 VSWR 값 이상인 경우, 상기 안테나 엘리먼트들 각각에 대한 동작 가능 여부를 검출하는 과정; 및
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트가 동작 가능함을 검출한 경우, 상기 동작 가능한 적어도 하나의 안테나 엘리먼트의 빔 패턴을 조정하는 과정을 포함하는 방법.
- 제1항에 있어서,
상기 빔 패턴을 조정하는 과정은,
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 각각에 대한 크기/위상 조정이 필요한지 여부를 결정하는 과정; 및
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 중 크기/위상 조정이 필요한 적어도 하나의 안테나 엘리먼트에 대한 크기/위상을 조정하는 과정을 더 포함함을 특징으로 하는 방법.
- 제1항에 있어서,
상기 안테나 엘리먼트들 각각에 대한 동작 가능 여부를 결정하는 과정은,
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 각각에 대한 동작 불가능 여부를 검출하는 과정을 더 포함함을 특징으로 하는 방법.
- 제3항에 있어서,
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 중 적어도 하나의 안테나 엘리먼트가 동작 불가능함이 검출된 경우, 상기 동작 불가능한 적어도 하나의 안테나 엘리먼트를 동작이 가능한 적어도 하나의 안테나 엘리먼트 중 하나로 대체하는 과정을 더 포함함을 특징으로 하는 방법.
- 제1항에 있어서,
VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트는 상기 VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트에서 안테나 가려짐 현상이 발생된 상태임을 나타냄을 특징으로 하는 방법.
- 제5항에 있어서,
상기 안테나 가려짐 현상은 상기 VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트에 대한 반사 계수 값이 미리 설정되어 있는 임계 반사 계수 값 이하인 상태를 나타냄을 특징으로 하는 방법.
- 빔 분할 다중 접속(beam division multiple access: BDMA) 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치에 있어서,
상기 빔 패턴 조정 장치에 포함된 배열 안테나에 포함된 안테나 엘리먼트(element)들 각각에 대한 전압 정재파비(voltage standing wave ratio: VSWR) 값이 임계 VSWR 값 이상인지 여부를 결정하고,
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트의 VSWR 값이 임계 VSWR 값 이상인 경우, 상기 안테나 엘리먼트들 각각에 대한 동작 가능 여부를 검출하도록 구성된 제어부; 및
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트가 동작 가능함을 검출한 경우, 상기 동작 가능한 적어도 하나의 안테나 엘리먼트의 빔 패턴을 조정하도록 구성된 조정부;를 포함하는 장치.
- 제7항에 있어서,
상기 제어부는,
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 각각에 대한 크기/위상 조정이 필요한지 여부를 결정하고,
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 중 크기/위상 조정이 필요한 적어도 하나의 안테나 엘리먼트에 대한 크기/위상을 조정하도록 상기 조정부를 제어하도록 더 구성됨을 특징으로 하는 장치.
- 제7항에 있어서,
상기 제어부는;
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 각각에 대한 동작 불가능 여부를 검출하도록 더 구성됨을 특징으로 하는 장치.
- 제9항에 있어서,
상기 제어부는,
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 중 적어도 하나의 안테나 엘리먼트가 동작 불가능함이 검출된 경우, 상기 동작 불가능한 적어도 하나의 안테나 엘리먼트를 동작이 가능한 적어도 하나의 안테나 엘리먼트 중 하나로 대체하도록 더 구성됨을 특징으로 하는 장치.
- 제7항에 있어서,
VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트는 상기 VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트에서 안테나 가려짐 현상이 발생된 상태임을 나타냄을 특징으로 하는 장치.
- 제11항에 있어서,
상기 안테나 가려짐 현상은 상기 VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트에 대한 반사 계수 값이 미리 설정되어 있는 임계 반사 계수 값 이하인 상태를 나타냄을 특징으로 하는 장치.
- 제7항에 있어서,
상기 조정부는;
증폭기; 및
위상 쉬프터(shifter)를 포함함을 특징으로 하는 장치.
- 제7항에 있어서,
상기 배열 안테나가 포함하는 안테나 엘리먼트들 각각에 대한 VSWR 값을 검출하도록 구성된 검출부를 더 포함함을 특징으로 하는 장치.
- 빔 분할 다중 접속(beam division multiple access: BDMA) 방식을 지원하는 통신 시스템에서 빔 패턴 조정 장치에 있어서,
상기 빔 패턴 조정 장치에 포함된 배열 안테나에 포함된 안테나 엘리먼트(element)들 각각에 대한 전압 정재파비(voltage standing wave ratio: VSWR) 값이 임계 VSWR 값 이상인지 여부를 결정하고,
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트의 VSWR 값이 임계 VSWR 값 이상인 경우, 상기 안테나 엘리먼트들 각각에 대한 동작 가능 여부를 검출하고,
상기 안테나 엘리먼트들 중 적어도 하나의 안테나 엘리먼트가 동작 가능함을 검출한 경우, 상기 동작 가능한 적어도 하나의 안테나 엘리먼트의 빔 패턴을 조정하도록 구성된 프로세서를 포함하는 장치.
- 제15항에 있어서,
상기 프로세서는,
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 각각에 대한 크기/위상 조정이 필요한지 여부를 결정하고,
상기 동작 가능한 적어도 하나의 안테나 엘리먼트 중 크기/위상 조정이 필요한 적어도 하나의 안테나 엘리먼트에 대한 크기/위상을 조정하도록 더 구성됨을 특징으로 하는 장치.
- 제15항에 있어서,
상기 프로세서는;
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 각각에 대한 동작 불가능 여부를 검출하도록 더 구성됨을 특징으로 하는 장치.
- 제17항에 있어서,
상기 프로세서는,
상기 안테나 엘리먼트들 중 VSWR 값이 임계 VSWR 값 이상인 적어도 하나의 안테나 엘리먼트 중 적어도 하나의 안테나 엘리먼트가 동작 불가능함이 검출된 경우, 상기 동작 불가능한 적어도 하나의 안테나 엘리먼트를 동작이 가능한 적어도 하나의 안테나 엘리먼트 중 하나로 대체하도록 더 구성됨을 특징으로 하는 장치.
- 제15항에 있어서,
VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트는 상기 VSWR 값이 임계 VSWR 값 이상인 안테나 엘리먼트에서 안테나 가려짐 현상이 발생된 상태임을 나타냄을 특징으로 하는 장치.
- 제19항에 있어서,
상기 안테나 가려짐 현상은 상기 VSWR 값이 임계 VSWR 값 이상인안테나 엘리먼트에 대한 반사 계수 값이 미리 설정되어 있는 임계 반사 계수 값 이하인 상태를 나타냄을 특징으로 하는 장치.
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US14/701,117 US9461360B2 (en) | 2014-04-30 | 2015-04-30 | Apparatus and method for adjusting beam pattern in communication system supporting beam division multiple access scheme |
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