KR102091108B1 - 불소계 유기폴리실라잔 또는 이의 제조방법 - Google Patents
불소계 유기폴리실라잔 또는 이의 제조방법 Download PDFInfo
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- KR102091108B1 KR102091108B1 KR1020180070383A KR20180070383A KR102091108B1 KR 102091108 B1 KR102091108 B1 KR 102091108B1 KR 1020180070383 A KR1020180070383 A KR 1020180070383A KR 20180070383 A KR20180070383 A KR 20180070383A KR 102091108 B1 KR102091108 B1 KR 102091108B1
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- fluorine
- polysilazane
- based organic
- organic polysilazane
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- 229920001709 polysilazane Polymers 0.000 title claims abstract description 53
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 37
- 239000011737 fluorine Substances 0.000 title claims abstract description 36
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 238000002360 preparation method Methods 0.000 title description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 15
- LNUZHCSQTRPPPK-UHFFFAOYSA-N dichloro(difluoro)silane Chemical compound F[Si](F)(Cl)Cl LNUZHCSQTRPPPK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 9
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 16
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 10
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 8
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 8
- PVBMWIXRKLGXPI-UHFFFAOYSA-N dichloro-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PVBMWIXRKLGXPI-UHFFFAOYSA-N 0.000 claims description 7
- -1 trimethyl stipine Natural products 0.000 claims description 7
- 239000012467 final product Substances 0.000 claims description 5
- 239000011259 mixed solution Substances 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 230000032683 aging Effects 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- HTDIUWINAKAPER-UHFFFAOYSA-N trimethylarsine Chemical compound C[As](C)C HTDIUWINAKAPER-UHFFFAOYSA-N 0.000 claims description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 claims description 4
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 claims description 3
- OHABWQNEJUUFAV-UHFFFAOYSA-N dichloro-methyl-(3,3,3-trifluoropropyl)silane Chemical group C[Si](Cl)(Cl)CCC(F)(F)F OHABWQNEJUUFAV-UHFFFAOYSA-N 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000005048 methyldichlorosilane Substances 0.000 claims description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 2
- HZHUAESPXGNNFV-UHFFFAOYSA-N diethyl(methyl)phosphane Chemical compound CCP(C)CC HZHUAESPXGNNFV-UHFFFAOYSA-N 0.000 claims description 2
- LEMQFDHLRUSMPZ-UHFFFAOYSA-N ethyl(dimethyl)phosphane Chemical compound CCP(C)C LEMQFDHLRUSMPZ-UHFFFAOYSA-N 0.000 claims description 2
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 claims description 2
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 claims description 2
- 239000013557 residual solvent Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 claims 1
- 125000002729 alkyl fluoride group Chemical group 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000000243 solution Substances 0.000 description 9
- 239000003921 oil Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- UWGIJJRGSGDBFJ-UHFFFAOYSA-N dichloromethylsilane Chemical compound [SiH3]C(Cl)Cl UWGIJJRGSGDBFJ-UHFFFAOYSA-N 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 3
- KUDPIUYHGSRVGM-UHFFFAOYSA-N dichloro-(3,3,4,4,5,5,5-heptafluoropentyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)C(F)(F)C(F)(F)F KUDPIUYHGSRVGM-UHFFFAOYSA-N 0.000 description 3
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- NKAMGQZDVMQEJL-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodec-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C NKAMGQZDVMQEJL-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- SBJSYSHFIFOUFO-UHFFFAOYSA-N CC(C)CC[SiH](Cl)Cl Chemical compound CC(C)CC[SiH](Cl)Cl SBJSYSHFIFOUFO-UHFFFAOYSA-N 0.000 description 1
- LWWFOCUDNWWRTJ-UHFFFAOYSA-N CC=C[SiH](Cl)Cl Chemical compound CC=C[SiH](Cl)Cl LWWFOCUDNWWRTJ-UHFFFAOYSA-N 0.000 description 1
- AVAKDRTWBDKXJJ-UHFFFAOYSA-N Cl[SiH](Cl)C#C Chemical compound Cl[SiH](Cl)C#C AVAKDRTWBDKXJJ-UHFFFAOYSA-N 0.000 description 1
- NZXAQQZPKOVSSQ-UHFFFAOYSA-N FC(C=C)(C(C(F)(F)F)(F)F)F.FC(C=C)(C(C(F)(F)F)(F)F)F Chemical compound FC(C=C)(C(C(F)(F)F)(F)F)F.FC(C=C)(C(C(F)(F)F)(F)F)F NZXAQQZPKOVSSQ-UHFFFAOYSA-N 0.000 description 1
- MZOLOMNHGCTGGL-UHFFFAOYSA-N FC(CC[SiH2]C(Cl)Cl)(F)F.FC(CC[SiH2]C(Cl)Cl)(F)F Chemical compound FC(CC[SiH2]C(Cl)Cl)(F)F.FC(CC[SiH2]C(Cl)Cl)(F)F MZOLOMNHGCTGGL-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- XRBZWUQAUXLFDY-UHFFFAOYSA-N benzyl(dichloro)silane Chemical compound Cl[SiH](Cl)CC1=CC=CC=C1 XRBZWUQAUXLFDY-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- IOBUYOYOZJVCGU-UHFFFAOYSA-N chloro(dicyclohexyl)silane Chemical compound C1CCCCC1[SiH](Cl)C1CCCCC1 IOBUYOYOZJVCGU-UHFFFAOYSA-N 0.000 description 1
- WRNUBMATUCAXHM-UHFFFAOYSA-N chloro(prop-2-enyl)silane Chemical compound Cl[SiH2]CC=C WRNUBMATUCAXHM-UHFFFAOYSA-N 0.000 description 1
- FXMNVBZEWMANSQ-UHFFFAOYSA-N chloro(silyl)silane Chemical compound [SiH3][SiH2]Cl FXMNVBZEWMANSQ-UHFFFAOYSA-N 0.000 description 1
- SGYSOPIROMCESS-UHFFFAOYSA-N chloro-[(4-chlorophenyl)methyl]silane Chemical compound Cl[SiH2]Cc1ccc(Cl)cc1 SGYSOPIROMCESS-UHFFFAOYSA-N 0.000 description 1
- LVFFNMMFDNKFDK-UHFFFAOYSA-N chloro-bis(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)CC(C)C LVFFNMMFDNKFDK-UHFFFAOYSA-N 0.000 description 1
- WSGBJEXMYYBFCD-UHFFFAOYSA-N chloro-bis(4-methylphenyl)silane Chemical compound Cc1ccc(cc1)[SiH](Cl)c1ccc(C)cc1 WSGBJEXMYYBFCD-UHFFFAOYSA-N 0.000 description 1
- ZUKYLGDWMRLIKI-UHFFFAOYSA-N chloro-ethyl-methylsilicon Chemical compound CC[Si](C)Cl ZUKYLGDWMRLIKI-UHFFFAOYSA-N 0.000 description 1
- IPAIXTZQWAGRPZ-UHFFFAOYSA-N chloro-methyl-phenylsilicon Chemical compound C[Si](Cl)C1=CC=CC=C1 IPAIXTZQWAGRPZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- UNJIGALTJKOEIR-UHFFFAOYSA-N dibenzyl(chloro)silane Chemical compound C=1C=CC=CC=1C[SiH](Cl)CC1=CC=CC=C1 UNJIGALTJKOEIR-UHFFFAOYSA-N 0.000 description 1
- PMRZHVOZUPJRSI-UHFFFAOYSA-N dibromo(propyl)silane Chemical compound CCC[SiH](Br)Br PMRZHVOZUPJRSI-UHFFFAOYSA-N 0.000 description 1
- MYWFLJDFFCFHNT-UHFFFAOYSA-N dichloro(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)Cl MYWFLJDFFCFHNT-UHFFFAOYSA-N 0.000 description 1
- YUKZTICWNSSDIL-UHFFFAOYSA-N dichloro(cyclohexyl)silane Chemical compound Cl[SiH](Cl)C1CCCCC1 YUKZTICWNSSDIL-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- FRALJFRRPFOSQB-UHFFFAOYSA-N dichloro(fluoro)silane Chemical compound F[SiH](Cl)Cl FRALJFRRPFOSQB-UHFFFAOYSA-N 0.000 description 1
- NYKYPUSQZAJABL-UHFFFAOYSA-N dichloro(hexyl)silane Chemical compound CCCCCC[SiH](Cl)Cl NYKYPUSQZAJABL-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- HAKOAQCVDUCPTM-UHFFFAOYSA-N dichloro(propan-2-yl)silane Chemical compound CC(C)[SiH](Cl)Cl HAKOAQCVDUCPTM-UHFFFAOYSA-N 0.000 description 1
- WWAUWWYCNBROND-UHFFFAOYSA-N dichloro-(1,1,2,2,5,5,5-heptafluoropentyl)-methylsilane Chemical compound C[Si](Cl)(Cl)C(F)(F)C(F)(F)CCC(F)(F)F WWAUWWYCNBROND-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- ZUBAIVQCZYOVOJ-UHFFFAOYSA-N ethyl(difluoro)silane Chemical compound CC[SiH](F)F ZUBAIVQCZYOVOJ-UHFFFAOYSA-N 0.000 description 1
- XKUVPZDIAKROHE-UHFFFAOYSA-N ethyl(diiodo)silane Chemical compound CC[SiH](I)I XKUVPZDIAKROHE-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical group FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/126—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-Y linkages, where Y is not a carbon or halogen atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/385—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Polymers (AREA)
Abstract
Description
조건 | 접촉각(°) | |
물 | 기름 | |
제조예 1 | 118 | 84 |
제조예 2 | 117 | 86 |
제조예 3 | 119 | 85 |
비교예 1 | 114 | 78 |
비교예 2 | 115 | 74 |
Claims (10)
- 삭제
- 삭제
- 삭제
- (1단계) 퍼플루오로디클로로실란 및 할로실란을 염기성 용매에 용해시켜 혼합용액을 제조한 후 교반하는 단계;
(2단계) 상기 혼합용액에 암모니아 가스를 주입하고 교반하는 단계;
(3단계) 침전된 염 및 잔류 용매를 제거하는 단계; 및
(4단계) 최종 생성물을 숙성하여 하기 화학식 2 내지 4로 이루어진 군에선 선택되는 1종의 불소계 유기폴리실라잔을 제조하되,
상기 1단계 및 2단계에서 교반은 -10 ~ 10℃ 범위의 온도에서 수행되어 가암모니아 분해를 유도하고, 상기 4단계에서 숙성은 70 ~ 80℃의 온도에서 수행되는 것을 특징으로 하는 불소계 유리폴리실라잔의 제조방법.
[화학식 2]
[화학식 3]
[화학식 4]
(화학식 2 내지 4에서, x 및 y = 1 ~ 120이다.) - 제4항에 있어서,
상기 퍼플루오로디클로로실란은 (3,3,3-트리플루오로프로필)디클로로메틸실란, 3,3,4,4,5,5,5,-헵타플루오로펜틸메틸디클로로실란 및 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란으로 이루어진 군에서 선택된 1종인 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법. - 제4항에 있어서,
상기 할로실란은 메틸디클로로실란인 불소계 유기폴리실라잔의 제조방법. - 제4항에 있어서,
상기 암모니아 가스는 10 ~ 30 ml/min의 속도로 주입되는 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법. - 제4항에 있어서,
상기 2단계는 24 ~ 48시간 수행되는 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법. - 삭제
- 제4항에 있어서,
상기 1단계에서 염기성 용매는 트리메틸아민, 디메틸에틸아민, 디에틸메틸아민, 트리에틸아민, 피리딘, 피콜린, 디메틸아닐린, 트리메틸포스핀, 디메틸에틸포스핀, 메틸디에틸포스핀, 트리에틸포스핀, 트리메틸아르신, 트리메틸스티핀, 트리메틸아민, 트리에틸아민, 트리아진으로 이루어진 군에서 선택된 1종 이상인 것을 특징으로 하는 불소계 유기 폴리실라잔의 제조방법.
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