KR101930723B1 - 펠리클 및 그 제조 방법 - Google Patents
펠리클 및 그 제조 방법 Download PDFInfo
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- KR101930723B1 KR101930723B1 KR1020120060316A KR20120060316A KR101930723B1 KR 101930723 B1 KR101930723 B1 KR 101930723B1 KR 1020120060316 A KR1020120060316 A KR 1020120060316A KR 20120060316 A KR20120060316 A KR 20120060316A KR 101930723 B1 KR101930723 B1 KR 101930723B1
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- pellicle
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- 238000004519 manufacturing process Methods 0.000 title abstract description 9
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims abstract description 69
- 239000010410 layer Substances 0.000 claims abstract description 43
- 239000011247 coating layer Substances 0.000 claims abstract description 28
- 229920002050 silicone resin Polymers 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000011521 glass Substances 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 10
- 239000004925 Acrylic resin Substances 0.000 claims description 3
- 229920000178 Acrylic resin Polymers 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000012790 adhesive layer Substances 0.000 abstract description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004129 EU approved improving agent Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
외관 불량의 원인이 되는 점착재층의 기포의 발생이 억제된 펠리클, 및 상기 펠리클의 제조 방법의 제공.
[수단]
펠리클 프레임의 한쪽 면 상의 전체 둘레에 펠리클을 유리 기판에 부착하기 위한 점착제층이 형성되고, 다른쪽 면에 펠리클막이 부착된 펠리클로서, 상기 펠리클 프레임의 면과 점착제층 사이에 실리콘 수지에 의한 코팅층을 갖는 것을 특징으로 하는 펠리클.
Description
도 2는 펠리클 프레임의 단면도이다.
도 3은 표면에 실리콘 수지 코팅층을 형성하지 않고 점착제층이 형성된 펠리클 프레임의 단면도이다.
도 4는 표면에 실리콘 수지 코팅층을 형성한 펠리클 프레임의 단면도이다.
도 5는 표면에 실리콘 수지 코팅층을 형성한 후 점착제층을 형성한 본 발명의 펠리클 프레임의 단면도이다.
12 : 펠리클 프레임 13 : 실리콘 수지 코팅층
14 : 점착제층 15 : 박리 시트
21 : 펠리클 프레임 22 : 펠리클 프레임 상의 오목부
23 : 기포 24 : 점착제층
25 : 실리콘 수지 코팅층
Claims (8)
- 펠리클 프레임의 한쪽 면 상의 전체 둘레에 펠리클을 유리 기판에 부착하기 위한 점착제층이 형성되고, 다른쪽 면에 펠리클막이 부착된 펠리클로서:
상기 펠리클 프레임의 면과 점착제층 사이에 실리콘 수지 코팅층을 갖고,
상기 코팅층은, 점도가 1mPa·s∼100mPa·s가 되도록 유기용제로 희석한 실리콘 수지 코팅제로 이루어지고,
상기 코팅층의 두께는 1㎛ 이상 500㎛ 이하인 것을 특징으로 하는 펠리클. - 삭제
- 제 1 항에 있어서,
상기 점착제층은 실리콘 수지 점착제의 층인 것을 특징으로 하는 펠리클. - 제 1 항에 있어서,
상기 점착제층은 아크릴 수지 점착제의 층인 것을 특징으로 하는 펠리클. - 펠리클 프레임의 한쪽 면의 전체 둘레에 펠리클을 유리 기판에 부착하기 위한 점착제층을 형성하는 공정, 및 상기 펠리클 프레임의 다른쪽 면에 펠리클막을 부착하는 공정을 포함하는 펠리클의 제조 방법으로서:
상기 점착제층을 형성하는 펠리클 프레임의 면 상에 실리콘 수지 코팅층을 형성한 후에 상기 코팅층 상에 상기 점착제층을 형성하고,
상기 코팅층은, 점도가 1mPa·s∼100mPa·s가 되도록 유기용제로 희석한 실리콘 수지 코팅제로 이루어지고,
상기 코팅층의 두께는 1㎛ 이상 500㎛ 이하인 것을 특징으로 하는 펠리클의 제조 방법. - 삭제
- 제 5 항에 있어서,
상기 점착제층은 실리콘 수지 점착제의 층인 것을 특징으로 하는 펠리클의 제조 방법. - 제 5 항에 있어서,
상기 점착제층은 아크릴 수지 점착제의 층인 것을 특징으로 하는 펠리클의 제조 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-149102 | 2011-07-05 | ||
JP2011149102A JP5517360B2 (ja) | 2011-07-05 | 2011-07-05 | ペリクル及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20130005219A KR20130005219A (ko) | 2013-01-15 |
KR101930723B1 true KR101930723B1 (ko) | 2018-12-19 |
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KR1020120060316A Active KR101930723B1 (ko) | 2011-07-05 | 2012-06-05 | 펠리클 및 그 제조 방법 |
Country Status (2)
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JP (1) | JP5517360B2 (ko) |
KR (1) | KR101930723B1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016175019A1 (ja) | 2015-04-27 | 2016-11-03 | 三井化学株式会社 | ペリクルの製造方法およびペリクル付フォトマスクの製造方法 |
GB201517471D0 (en) * | 2015-10-02 | 2015-11-18 | British American Tobacco Co | Apparatus for generating an inhalable medium |
JP6787799B2 (ja) | 2017-01-24 | 2020-11-18 | 信越化学工業株式会社 | 粘着剤の成形方法及びこの成形方法によるペリクルの製造方法 |
KR102782966B1 (ko) | 2019-10-22 | 2025-03-18 | 삼성전자주식회사 | 반사형 마스크용 펠리클 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000227653A (ja) * | 1999-02-05 | 2000-08-15 | Shin Etsu Chem Co Ltd | リソグラフィー用ペリクル |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3027073B2 (ja) * | 1993-07-28 | 2000-03-27 | 信越化学工業株式会社 | ペリクル |
JP3758339B2 (ja) * | 1997-10-31 | 2006-03-22 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
JP4319757B2 (ja) * | 2000-02-16 | 2009-08-26 | 信越化学工業株式会社 | ペリクルの製造方法 |
JP2006184704A (ja) * | 2004-12-28 | 2006-07-13 | Asahi Kasei Electronics Co Ltd | 液晶用大型ペリクル |
JP5432855B2 (ja) * | 2010-08-04 | 2014-03-05 | 信越化学工業株式会社 | ペリクルの製造方法および装置 |
JP5767535B2 (ja) * | 2010-09-01 | 2015-08-19 | 旭化成イーマテリアルズ株式会社 | ペリクル枠体、ペリクル及びペリクル枠体の製造方法 |
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2011
- 2011-07-05 JP JP2011149102A patent/JP5517360B2/ja active Active
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Patent Citations (1)
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JP2000227653A (ja) * | 1999-02-05 | 2000-08-15 | Shin Etsu Chem Co Ltd | リソグラフィー用ペリクル |
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Publication number | Publication date |
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KR20130005219A (ko) | 2013-01-15 |
JP5517360B2 (ja) | 2014-06-11 |
JP2013015710A (ja) | 2013-01-24 |
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