KR101906258B1 - Manufacturing method of dental implants using anodic titanium oxide and plasma electrolytic oxidation - Google Patents

Abstract

The present invention relates to a method for manufacturing a dental implant. More specifically, the present invention relates to a method for manufacturing a dental implant using an anodizing method and a plasma electrolytic oxidation method, which anodizes a titanium alloy to form a nanotube array layer, and then performs plasma electrolytic oxidation treatment to increase the surface roughness, maximize formation of a functional element material, and increase formation of anatase phase, thereby enhancing biocompatibility.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method,

More particularly, the present invention relates to a method for manufacturing a dental implant, and more particularly, to an anodic oxidation treatment of a titanium-based alloy to form a nanotube array layer and then a plasma electrolytic oxidation treatment to increase the surface roughness, And an anatase phase can be increased, so that an anodic oxidation method capable of improving biocompatibility and a method for manufacturing a dental implant using the plasma electrolytic oxidation method.

Generally, dental implants mechanically process titanium or titanium alloys and then perform a variety of surface treatment processes to improve the intraosseous fit of the implant.

Conventional dental implant surface treatment methods include acid etching, plasma spraying, ion implantation, thermal oxidation, sol-gel coating, physical vapor deposition (PVD), and electrochemical deposition have.

However, in the case of an implant surface treated with an acid etching method, an inflammation reaction occurs due to the acid remaining on the surface, or corrosion occurs on the surface of the implant, thereby causing clinical problems.

Plasma spraying is a method commonly used to coat bioceramics commercially on commercial occasions. However, plasma spraying is a method commonly used for coating commercially available bioceramics on an implant, but also involves microcracks, low bonding strength between the coating layer and the implant surface, phase change due to exposure at high temperatures, Irregular fine structure control, and the like.

In addition, the electrochemical vapor deposition method has a weak binding force between a coating layer formed by coating titanium or a titanium alloy with calcium phosphate or hydroxyapatite and an implant (a titanium or a titanium alloy), resulting in peeling from the implant or an interface between the implant and the coating layer, There is a problem that chronic inflammation occurs in the bone tissue around the implant due to biodegradation,

That is, conventional surface treatment methods of implants have serious problems that are resulted from implantation failure due to poor biocompatibility problems.

SUMMARY OF THE INVENTION The present invention has been conceived to solve such problems, and an object of the present invention is to provide a nanotube array layer by anodic oxidation treatment of a titanium-based alloy, and then plasma electrolytic oxidation treatment, And a method of manufacturing a dental implant using the plasma electrolytic oxidation method.

The objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

In order to accomplish the above object, the present invention provides a method for preparing a titanium-based alloy, comprising: preparing a titanium- A first nanotube array layer forming step of forming the first nanotube array layer by titanium anodizing treatment of the prepared titanium alloy; A first nanotube array layer removing step of removing the first nanotube array layer formed on a surface of the titanium-based alloy; And a plasma electrolytic oxidation treatment step of plasma-electrolytically oxidizing the titanium-based alloy having the cross-section of the mesh-like shape by removing the first nanotube array layer. The method of claim 1, And a manufacturing method thereof.

In a preferred embodiment, Ti-6Al-4V is used for the titanium-based alloy.

In a preferred embodiment, the first nanotube array layer forming step includes forming a first nanotube array layer on the first electrode, the titanium alloy being connected to the cathode electrode, the platinum electrode being connected to the node electrode, and an electrolyte for anodizing comprising H ₃ PO ₄ and NaF And is electrochemically oxidized by using an oxidizing agent.

In a preferred embodiment, the electrolyte for anodizing includes 1M H ₃ PO ₄ and 0.8 wt% NaF.

In a preferred embodiment, the first nanotube array layer is removed by ultrasonic treatment.

In a preferred embodiment, the plasma electrolytic oxidation treatment step is a plasma-phone oxidation treatment using an electrolyte for plasma electrolytic oxidation comprising magnesium ions and zinc ions.

In a preferred embodiment, the electrolyte for plasma electrolytic oxidation comprises magnesium ions 5 mol% and 5 mol% zinc ions.

In a preferred embodiment, a precipitate removing step for removing the precipitate formed in the oxide film layer after the plasma electrolytic oxidation treatment step is further performed.

In a preferred embodiment, the precipitate removal step is performed by ultrasonic treatment.

The present invention further provides a dental implant manufactured by the method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method of the present invention.

In a preferred embodiment, an oxide film containing magnesium and zinc is formed on the surface of the implant, and the oxide film includes an anatase phase and a rutile phase.

The present invention also provides a method for preparing a titanium-based alloy, comprising: preparing a titanium-based alloy for preparing a titanium-based alloy; A first nanotube array layer forming step of forming the first nanotube array layer by titanium anodizing treatment of the prepared titanium alloy; A first nanotube array layer removing step of removing the first nanotube array layer formed on a surface of the titanium-based alloy; A second nanotube array layer forming step of forming a second nanotube array layer by titanium anodizing the titanium-based alloy having a cross-section of a mesh shape by removing the first nanotube array layer; A second nanotube array layer removing step of removing the second nanotube array layer formed on the surface of the titanium-based alloy; And a plasma electrolytic oxidation treatment step of plasma-electrolytically oxidizing the titanium-based alloy having the cross-section of the mesh-like shape by removing the second nanotube array layer. The surface of the dental implant using the anodic oxidation method and the plasma electrolytic oxidation method And further provides a processing method.

In a preferred embodiment, the second nanotube array layer forming step and the second nanotube array layer removing step are sequentially performed.

In a preferred embodiment, Ti-6Al-4V is used for the titanium-based alloy.

In a preferred embodiment, the first nanotube array layer forming step and the second nanotube array layer forming step are such that the titanium-based alloy is connected to the cathode electrode, the platinum electrode is connected to the node electrode, and H ₃ PO _4, and NaF, which are used for anodization.

In a preferred embodiment, the electrolyte for anodizing includes 1M H ₃ PO ₄ and 0.8 wt% NaF.

In a preferred embodiment, the first nanotube array layer and the second nanotube array layer are removed through ultrasonic treatment.

In a preferred embodiment, the plasma electrolytic oxidation treatment step is a plasma-phone oxidation treatment using an electrolyte for plasma electrolytic oxidation comprising magnesium ions and zinc ions.

In a preferred embodiment, the electrolyte for plasma electrolytic oxidation comprises magnesium ions 5 mol% and 5 mol% zinc ions.

In a preferred embodiment, a precipitate removing step for removing the precipitate formed in the oxide film layer after the plasma electrolytic oxidation treatment step is further performed.

In a preferred embodiment, the precipitate removal step is performed by ultrasonic treatment.

The present invention has the following excellent effects.

According to the method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method of the present invention, an anodic oxidation treatment is performed on a titanium alloy to form a nanotube array layer, and then plasma electrolytic oxidation treatment is performed to increase surface roughness, And zinc ions, thereby increasing the formation of the anatase phase and improving the biocompatibility.

1 is a view illustrating a method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to an embodiment of the present invention.
2 is a schematic view for explaining a first nanotube array layer forming step and a first nanotube array layer removing step according to an embodiment of the present invention.
3 is a diagram illustrating a method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to an embodiment of the present invention.
FIG. 4 is a view for explaining a step of forming a first nanotube array layer and a step of removing a first nanotube array layer, a step of forming a second nanotube array layer, and a step of forming a second nanotube array layer according to an embodiment of the present invention. Fig.
FIG. 5 is a FE-SEM image of a surface of a titanium alloy after the first nanotube array layer removing step according to an embodiment of the present invention. FIG. 5 (a) ) Is 5000 magnification, and (d) is 10,000 magnification.
FIG. 6 is an FE-SEM image showing the surface of a titanium alloy after the step of removing the second nanotube array layer according to an embodiment of the present invention. FIG. 6 (a) ) Is 5000 magnification, and (d) is 10,000 magnification.
FIG. 7 is an FE-SEM image of a surface of a PEO-treated titanium alloy after the step of removing the first nanotube array layer according to an embodiment of the present invention. FIG. 7 (a) , (c) is 5000 magnification, and (d) is 10000 magnification.
FIG. 8 is an FE-SEM image of a surface of a PEO-treated ultrasound treated titanium alloy after the step of removing the first nanotube array layer according to an embodiment of the present invention. FIG. 8 (a) ) Is 1000 magnification, (c) is 5000 magnification, and (d) is 10000 magnification.
9 is an FE-SEM image of a surface of a PEO-treated titanium alloy after the step of removing the second nanotube array layer according to an embodiment of the present invention, wherein (a) shows a magnification of 200, (b) , (c) is 5000 magnification, and (d) is 10000 magnification.
FIG. 10 is an FE-SEM image of a surface of a PEO-treated ultrasound treated titanium alloy after the step of removing a second nanotube array layer according to an embodiment of the present invention. FIG. 10 (a) ) Is 1000 magnification, (c) is 5000 magnification, and (d) is 10000 magnification.
11 is a view showing an FE-SEM image and an EDS mapping result of observing the surface of the PEO-treated titanium alloy after the step of removing the first nanotube array layer according to an embodiment of the present invention.
FIG. 12 is a view showing an FE-SEM image and an EDS mapping result of a surface of a PEO-treated titanium alloy after a step of removing a second nanotube array layer according to an embodiment of the present invention.
13 is a view showing the XRD analysis result of the titanium based alloy according to one embodiment of the present invention.

Although the terms used in the present invention have been selected as general terms that are widely used at present, there are some terms selected arbitrarily by the applicant in a specific case. In this case, the meaning described or used in the detailed description part of the invention The meaning must be grasped.

Hereinafter, the technical structure of the present invention will be described in detail with reference to preferred embodiments shown in the accompanying drawings.

However, the present invention is not limited to the embodiments described herein but may be embodied in other forms. Like reference numerals designate like elements throughout the specification.

1 is a view illustrating a method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to a first embodiment of the present invention.

Referring to FIG. 1, an anodic oxidation method and a plasma electrolytic oxidation method for manufacturing a dental implant according to an embodiment of the present invention include anodizing a titanium-based alloy, removing a formed nanotube array layer, In order to improve the biocompatibility of the dental implant, a titanium-based alloy is first prepared (S100).

Here, Ti-6Al-4V is preferably used as the titanium-based alloy.

This is because the Ti-6Al-4V is an alloy excellent in mechanical characteristics and corrosion resistance.

Next, as shown in FIG. 2, the prepared titanium alloy is anodized to form a first nanotube array layer (S200).

At this time, the titanium-based alloy is connected to the cathode electrode, the platinum electrode is connected to the node electrode, and electrochemical oxidation treatment is performed using an electrolyte including 1M H ₃ PO ₄ and 0.8 wt% NaF.

Next, the first nanotube array layer formed on the surface of the titanium-based alloy is removed (S300).

At this time, the first nanotube array layer is preferably removed by ultrasonic treatment.

Next, the first nanotube array layer is removed, and a titanium alloy having a cross-sectional shape of a mesh shape and a plurality of grooves formed in an array type is subjected to plasma electrolytic oxidation (S400).

At this time, the electrolyte for plasma electrolytic oxidation is a magnesium ion 5 mol (mol)% of zinc ions and 5 mol (mol)% of zinc ions.

The reason for this is that magnesium ion, which is an element related to bone growth and osteoblast activity, and zinc ion, which is one of very important trace elements in human bone, are doped to the surface through a plasma electrolytic oxidation treatment.

In addition, the method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method according to the present invention may further include a precipitate removing step of removing the precipitate formed in the oxide film layer after the plasma electrolytic oxidation treatment step (S400).

More specifically, while the plasma electrolytic oxidation treatment process is performed, precipitates (precipitates) may be generated in the grooves of the titanium-based alloy in which a plurality of grooves are formed in the array type, and such precipitates may have a negative influence on cell proliferation So that it is preferable to remove it.

At this time, the precipitate can be carried out through ultrasonic treatment.

3 is a diagram illustrating a method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to a second embodiment of the present invention.

3, the method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to a second embodiment of the present invention is characterized in that after the step of removing the first nanotube array layer in the first embodiment of the present invention, The nanotube array layer is formed, the second nanotube array layer is removed, and then the plasma electrolytic oxidation treatment is performed.

That is, in the method of manufacturing a dental implant using an anodic oxidation method and a plasma electrolytic oxidation method according to the second embodiment of the present invention, the second nanotube array layer is further formed, After the nanotube array layer is removed, a plasma electrolytic oxidation treatment is performed.

Accordingly, in the titanium alloy preparation step (S100), the first nanotube array layer forming step (S200), the first nanotube array layer removing step (S300), the plasma electrolytic oxidation treatment Step S500 is a step of preparing a titanium alloy (S1000), a first nanotube array layer forming step (S2000), a first nanotube array layer removing step (S3000), a plasma electrolytic oxidation treatment step (S6000). Therefore, redundant description is omitted.

4, the first nanotube array layer formed on the surface of the titanium-based alloy is removed, and a titanium-based alloy having a mesh-like cross-section is titanium-anodized to form a second nanotube array layer (S4000).

At this time, the titanium-based alloy is connected to the cathode electrode, the platinum electrode is connected to the node electrode, an electrolyte including 1M H ₃ PO ₄ and 0.8 wt% NaF is used, and an electrochemical oxidation process is performed.

Next, the second nanotube array layer formed on the surface of the titanium-based alloy is removed (S5000).

At this time, it is preferable that the second nanotube array layer is removed through ultrasonic treatment.

Thereafter, the titanium-based alloy from which the second nanotube array layer has been removed is subjected to plasma electrolytic oxidation (S6000).

Further, after the plasma electrolytic oxidation treatment step (S6000), a precipitate removing step for removing the precipitate formed in the oxide film layer may be further performed. In this case, the precipitate formed in the titanium alloy is removed, To form a surface suitable for cell proliferation.

Further, the second nanotube array layer forming step (S4000) and the second nanotube array layer removing step (S5000) may be sequentially performed.

That is, after the third nanotube array layer is formed and the third nanotube array layer is removed, a plasma electrolytic oxidation treatment step can be performed.

The present invention further provides a dental implant manufactured by the method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method according to the present invention.

Here, an oxide film containing magnesium and zinc is formed on the surface of the implant, and the oxide film includes an anatase phase and a rutile phase. The anatase phase has an excellent biocompatibility.

Comparative Example 1

Ti-6Al-4V having a diameter of 10 mm and a thickness of 4 mm was prepared, and nanotube arrays were formed using sandpaper # 100 to # 2000.

Example 1 (Titanium-based alloy after the step of removing the first nanotube array layer)

Ti-6Al-4V having a diameter of 10 mm and a thickness of 4 mm was connected to the cathode electrode, a platinum electrode was connected to the node electrode, and electrochemical oxidation using an electrolyte including 1 M H ₃ PO ₄ and 0.8 wt% NaF Treatment was performed to form a first nanotube array layer on the surface of the titanium-based alloy.

Thereafter, the first nanotube array layer was removed by ultrasonic treatment to obtain Example 1.

Example 2 (Titanium-based alloy after the step of removing the second nanotube array layer)

Example 1 was connected to the cathode electrode, the platinum electrode was connected to the node electrode, and an electrochemical oxidation treatment was performed using an electrolyte including 1M H ₃ PO ₄ and 0.8 wt% NaF to form a titanium alloy A second nanotube array layer was formed on the surface of the second nanotube array layer.

Thereafter, the second nanotube array layer was removed by ultrasonic treatment to obtain Example 2.

Example 3 (PEO-treated titanium-based alloy after the step of removing the first nanotube array layer)

Magnesium ion 5 mol (mol) and 5 mol (mol)% of zinc ions, Example 1 was subjected to a plasma electrolytic oxidation treatment to obtain Example 3 in which an oxide film layer was formed.

Example 4 (PEO-treated subsequent ultrasonic treated titanium-based alloy after the first nanotube array layer removal step)

Example 3 was subjected to ultrasonic treatment to obtain Example 4 in which the precipitate formed in the groove of the oxide film layer was removed.

Example 5 (PEO-treated titanium-based alloy after the second step of removing the nanotube array layer)

Magnesium ion 5 mol (mol) and 5 mol (mol)% of zinc ions were subjected to a plasma electrolytic oxidation treatment of Example 2 to obtain Example 5 in which an oxide coating layer was formed.

Example 6 (PEO-treated subsequent ultrasound treated titanium-based alloy after the second nanotube array layer removal step)

Example 5 was ultrasonicated to obtain Example 6 in which the precipitate formed in the groove of the oxide film layer was removed.

Experimental Example 1 (FE-SEM observation)

The surfaces of the obtained Examples 1 to 6 were observed by FE-SEM, and the images thereof are shown in Figs. 5 to 10, respectively.

Referring to FIG. 5, it was confirmed that a plurality of grooves were formed in the shape of a mesh having a cross-sectional shape on the surface in the case of Example 1, and that the average surface roughness was 1.038 占 퐉 and the average surface roughness was 0.234 占 퐉 As compared with Comparative Example 1, it was confirmed that the surface roughness was increased about 4 times.

It is considered that the surface roughness is increased as the surface oxide film is destroyed by fluorine in the nanotube array layer shape step.

Referring to FIG. 6, it was confirmed that the second embodiment formed an irregular mesh shape of the cross-sectional shape of the surface, and that the average surface roughness was 2.330 μm and the average surface roughness was 1.038 μm. By comparison, it was confirmed that the surface roughness was increased about twice.

Referring to FIG. 7, in the case of Example 3, precipitates were precipitated on the inner side of the grooves by the plasma oxidation treatment process, and it was confirmed that the average surface roughness was 1.205 占 퐉. Compared with Example 1 having an average surface roughness of 1.038 占 퐉 , It was confirmed that the surface roughness was finely high.

Referring to FIG. 8, in the case of Example 4, it was confirmed that most of the sediment was removed by the ultrasonic treatment for 5 minutes as compared with Example 2. FIG.

Referring to FIG. 9, in the case of Example 5, precipitates were deposited on the inside of the grooves by the plasma oxidation treatment process, and it was confirmed that the average surface roughness was 2.150 占 퐉 and compared with Example 2 where the average surface roughness was 2.330 占 퐉 , The surface roughness was found to be finely small.

Referring to FIG. 10, in the case of Example 6, it was confirmed that most of the sediment was removed by the ultrasonic treatment for 5 minutes as compared with Example 5.

Experimental Example 2 (FE-SEM image and EDS mapping result)

The FE-SEM image was confirmed and the EDS analysis was performed using Example 3 and Example 5, and the results are shown in FIG. 11 and FIG. 12, respectively.

Referring to FIG. 11, it was confirmed that magnesium ions and zinc ions were detected on the surface in Example 3, and it was confirmed that the content thereof was 0.42% by weight of magnesium ions and 0.87% by weight of zinc ions.

Referring to FIG. 12, in Example 5, it was confirmed that 0.16% by weight of magnesium ions and 1.08% by weight of zinc ions were present.

Experimental Example 2 demonstrates that the anodic oxidation method and the plasma electrolytic oxidation method according to the present invention are well doped with functional element materials on the surface.

Experimental Example 4 (XRD analysis result)

XRD analysis was performed using Comparative Example 1, Example 3, and Example 5, and the results are shown in FIG.

As shown in Fig. 13, compared with Comparative Example 1, the alpha phase peak decreased in Example 3 and Example 5, and the anatase peak and rutile peak not shown in Comparative Example 1 were detected.

Particularly, since the anatase phase is increased in Examples 3 and 5 as compared with Comparative Example 1, the anodic oxidation method and the plasma electrolytic oxidation method according to the present invention can provide an implant having excellent biocompatibility It is confirmed that it can provide.

It was also found that, in Example 5, the anatase phase increased more than in Example 1.

As described above, the method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method according to the present invention increases the surface roughness, facilitates the formation of a functional element material including magnesium ions and zinc ions on the surface, And thus has an excellent biocompatibility.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, Various changes and modifications will be possible.

Claims (23)

A titanium-based alloy preparing step of preparing a titanium-based alloy;
A first nanotube array layer forming step of forming the first nanotube array layer by titanium anodizing treatment of the prepared titanium alloy;
A first nanotube array layer removing step of removing the first nanotube array layer formed on a surface of the titanium-based alloy; And
And a plasma electrolytic oxidation treatment step of plasma-electrolytically oxidizing the titanium-based alloy having a mesh-like cross section by removing the first nanotube array layer,
Wherein the titanium-based alloy is Ti-6Al-4V, and the plasma electrolytic oxidation treatment step is a plasma-phone oxidation treatment using an electrolyte for plasma electrolytic oxidation comprising magnesium ions and zinc ions. Method of manufacturing dental implants using electrolytic oxidation.
delete The method according to claim 1,
The first nanotube array layer forming step
Wherein the titanium-based alloy is connected to the cathode electrode, the platinum electrode is connected to the node electrode, and is formed by an electrochemical oxidation process using an electrolyte for anodizing comprising H ₃ PO ₄ and NaF And a method of manufacturing a dental implant using plasma electrolytic oxidation.
The method of claim 3,
Wherein the electrolyte for anodizing comprises 1M H ₃ PO ₄ and 0.8 wt% NaF. 2. The method of claim 1, wherein the anodic oxidation electrolyte comprises 1M H ₃ PO ₄ and 0.8 wt% NaF.
The method according to claim 1,
Wherein the first nanotube array layer is removed through ultrasonic treatment. ≪ RTI ID = 0.0 > 11. < / RTI >
delete The method according to claim 1,
The electrolyte for plasma electrolytic oxidation is preferably a magnesium ion 5 mol (mol%) and 5 mol (mol)% of zinc ions, and a method for producing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method.
The method according to claim 1,
And a precipitate removing step of removing precipitates formed in the oxide film layer after the plasma electrolytic oxidation treatment step is further performed. The method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method.
9. The method of claim 8,
The precipitate removal step
The method of claim 1, wherein the implantation is performed by ultrasonic treatment.
A method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method according to any one of claims 1, 3, 4, 5, and 9 to 9, Wherein the oxide film comprises an anatase phase and a rutile phase.
delete A titanium-based alloy preparing step of preparing a titanium-based alloy;
A first nanotube array layer forming step of forming the first nanotube array layer by titanium anodizing treatment of the prepared titanium alloy;
A first nanotube array layer removing step of removing the first nanotube array layer formed on a surface of the titanium-based alloy;
A second nanotube array layer forming step of forming a second nanotube array layer by titanium anodizing the titanium-based alloy having a cross-section of a mesh shape by removing the first nanotube array layer;
A second nanotube array layer removing step of removing the second nanotube array layer formed on the surface of the titanium-based alloy;
And a plasma electrolytic oxidation treatment step of plasma-electrolytically oxidizing the titanium-based alloy having a mesh-like cross section by removing the second nanotube array layer,
Ti-6Al-4V is used as the titanium-based alloy, and the plasma electrolytic oxidation treatment step is plasma-plasma oxidation treatment using an electrolyte for plasma electrolytic oxidation including magnesium ions and zinc ions. The anodic oxidation method and the plasma electrolysis Method of manufacturing dental implants using oxidation method.
13. The method of claim 12,
Wherein the step of forming the second nanotube array layer and the step of removing the second nanotube array layer are sequentially performed in sequence.
delete 13. The method of claim 12,
The first nanotube array layer forming step and the second nanotube array layer forming step may comprise:
Wherein the titanium-based alloy is connected to the cathode electrode, the platinum electrode is connected to the node electrode, and is formed by an electrochemical oxidation process using an electrolyte for anodizing comprising H ₃ PO ₄ and NaF And a method of manufacturing a dental implant using plasma electrolytic oxidation.
16. The method of claim 15,
Wherein the electrolyte for anodizing comprises 1M H ₃ PO ₄ and 0.8 wt% NaF. 2. The method of claim 1, wherein the anodic oxidation electrolyte comprises 1M H ₃ PO ₄ and 0.8 wt% NaF.
13. The method of claim 12,
Wherein the first nanotube array layer and the second nanotube array layer are removed by ultrasonic treatment. ≪ RTI ID = 0.0 > 8. < / RTI >
delete 13. The method of claim 12,
The electrolyte for plasma electrolytic oxidation is preferably a magnesium ion 5 mol (mol%) and 5 mol (mol)% of zinc ions, and a method for producing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method.
13. The method of claim 12,
And a precipitate removing step of removing precipitates formed in the oxide film layer after the plasma electrolytic oxidation treatment step is further performed. The method of manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method.
21. The method of claim 20,
The precipitate removal step
The method of claim 1, wherein the implantation is performed by ultrasonic treatment.
A method for manufacturing a dental implant using the anodic oxidation method and the plasma electrolytic oxidation method according to any one of claims 12, 13, 15 to 17, 19 to 21, wherein the surface of the implant is coated with magnesium and / Wherein an oxide film containing zinc is formed, and the oxide film includes an anatase phase and a rutile phase.
delete

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