KR101869385B1 - 장쇄 알킬에스터 및 하이드록시에틸기를 가지는 메타아크릴레이트계 고분자를 포함하는 극소수성막 형성용 조성물 - Google Patents
장쇄 알킬에스터 및 하이드록시에틸기를 가지는 메타아크릴레이트계 고분자를 포함하는 극소수성막 형성용 조성물 Download PDFInfo
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- KR101869385B1 KR101869385B1 KR1020150167500A KR20150167500A KR101869385B1 KR 101869385 B1 KR101869385 B1 KR 101869385B1 KR 1020150167500 A KR1020150167500 A KR 1020150167500A KR 20150167500 A KR20150167500 A KR 20150167500A KR 101869385 B1 KR101869385 B1 KR 101869385B1
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- 229920000642 polymer Polymers 0.000 title claims abstract description 56
- 239000000203 mixture Substances 0.000 title claims abstract description 30
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 title claims abstract description 13
- -1 hydroxyethyl groups Chemical group 0.000 title abstract description 24
- 125000005907 alkyl ester group Chemical group 0.000 title abstract description 22
- 230000002209 hydrophobic effect Effects 0.000 title description 8
- 238000000576 coating method Methods 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 239000012528 membrane Substances 0.000 claims abstract description 11
- 239000003921 oil Substances 0.000 claims description 27
- 239000010408 film Substances 0.000 claims description 26
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 24
- 239000000123 paper Substances 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 16
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 6
- 239000000835 fiber Substances 0.000 claims description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 229940117389 dichlorobenzene Drugs 0.000 claims description 2
- 238000003618 dip coating Methods 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- 239000002250 absorbent Substances 0.000 claims 1
- 230000002745 absorbent Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 15
- 238000001471 micro-filtration Methods 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 229920005597 polymer membrane Polymers 0.000 description 15
- 125000005395 methacrylic acid group Chemical group 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 230000003746 surface roughness Effects 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229920002678 cellulose Polymers 0.000 description 5
- 239000001913 cellulose Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 230000005661 hydrophobic surface Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
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- 239000011342 resin composition Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- 238000006065 biodegradation reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
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- 230000008021 deposition Effects 0.000 description 1
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- 229910052618 mica group Inorganic materials 0.000 description 1
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- 239000005871 repellent Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
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- 229920002994 synthetic fiber Polymers 0.000 description 1
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- 238000009736 wetting Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
-
- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02B—HYDRAULIC ENGINEERING
- E02B15/00—Cleaning or keeping clear the surface of open water; Apparatus therefor
- E02B15/04—Devices for cleaning or keeping clear the surface of open water from oil or like floating materials by separating or removing these materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A20/00—Water conservation; Efficient water supply; Efficient water use
- Y02A20/20—Controlling water pollution; Waste water treatment
- Y02A20/204—Keeping clear the surface of open water from oil spills
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Mechanical Engineering (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
m 및 n은 0보다 큰 정수이되,
m 및 n은 0보다 큰 정수이되,
도 2는 본 발명에 따른 극소수성막 형성용 조성물이 담지된 필터용 종이의 접촉각 측정 시 촬영한 사진이다(a: 실시예 4, b: 실시예 6, c: 실시예 5, d: 실시예7).
도 3은 실시예 1 내지 3 에서 제조된 고분자의 알킬측쇄치환율(몰%)에 따른 C/O 비율을 나타낸 그래프이다.
m 및 n은 0보다 큰 정수이되,
m 및 n은 0보다 큰 정수이되,
물접촉각 | 표면거칠기 | |
비교예 1 | 107.6 | 45 nm |
실시예 1 | 118.0 | 163 nm |
실시예 2 | 107.8 | 1.1 nm |
실시예 3 | 105.1 | 0.9 nm |
비교예 2 | 134.5 | > 1 μm |
실시예 4 | 141.9 | |
실시예 5 | 134.6 | |
실시예 6 | 144.7 | |
실시예 7 | 130.0 |
데칸 | 도데칸 | 헥사데칸 | |
비교예 2 | ○ | △ | X |
실시예 4 | ○ | ○ | ○ |
실시예 5 | ○ | ○ | △ |
실시예 6 | ○ | ○ | ○ |
실시예 7 | ○ | ○ | △ |
Claims (10)
- 제1항 또는 제2항의 조성물을 도포하여 형성된 극소수성막.
- 제3항에 있어서,
상기 극소수성막은 118° 내지 144°의 접촉각을 갖는 것을 특징으로 하는 극소수성막.
- 제3항의 극소수성막을 포함하는 유흡착제.
- 제5항에 있어서,
상기 유흡착제는 유리, 종이, 금속, 섬유, 플라스틱 및 세라믹으로 이루어지는 군으로부터 선택되는 1종에 극소수성막이 코팅된 것을 특징으로 하는 유흡착제.
- 제5항에 있어서,
상기 유흡착제는 해양 누유 제거용인 것을 특징으로 하는 유흡착제.
- 제1항 또는 제2항의 조성물을 용매에 용해시켜 용액을 제조하는 단계(단계 1); 및
상기 단계 1에서 제조한 용액을 기재에 코팅하는 단계(단계 2);를 포함하는 제5항의 유흡착제의 제조방법.
- 제8항에 있어서,
상기 단계 1의 용매는 클로로포름, 디클로로메탄, 아세톤, 피리딘, 테트라하이드로퓨란, 클로로벤젠 및 디크롤로벤젠으로 이루어진 군으로부터 선택되는 1종 이상을 단독 또는 혼합하여 사용하는 것을 특징으로 하는 유흡착제의 제조방법.
- 제8항에 있어서,
상기 단계 2의 코팅은 스핀 코팅, 딥 코팅, 롤 코팅, 용액 코팅 및 스프레이 코팅으로 이루어진 군으로부터 선택되는 1종 이상인 것을 특징으로 하는 유흡착제의 제조방법.
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Citations (2)
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JP2009000655A (ja) * | 2007-06-22 | 2009-01-08 | Nippon Petroleum Refining Co Ltd | 油吸着材およびその製造方法 |
KR20130138882A (ko) * | 2012-06-11 | 2013-12-20 | (주)탑나노시스 | 탄소나노튜브 코팅막 및 상기 탄소나노튜브 코팅막을 형성하는 탄소나노튜브 용액 조성물 |
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AU2010251571B2 (en) | 2009-05-19 | 2015-03-19 | Basf Se | Semiconducting component |
KR101577427B1 (ko) * | 2014-01-13 | 2015-12-14 | 한국화학연구원 | 폴리옥시에틸렌계 고분자를 포함하는 극소수성막 형성용 조성물 |
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Patent Citations (2)
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JP2009000655A (ja) * | 2007-06-22 | 2009-01-08 | Nippon Petroleum Refining Co Ltd | 油吸着材およびその製造方法 |
KR20130138882A (ko) * | 2012-06-11 | 2013-12-20 | (주)탑나노시스 | 탄소나노튜브 코팅막 및 상기 탄소나노튜브 코팅막을 형성하는 탄소나노튜브 용액 조성물 |
Non-Patent Citations (5)
Title |
---|
JOURNAL OF COLLOID AND INTERFACE SCIENCE(2011) * |
MACROMOL. MATER. ENG.(2002) * |
POLYMER(1993) * |
Surface properties and liquid crystal alignment behavior of poly(2-hydroxyethyl methacrylate) derivatives with alkyl ester side chains, Eun-Ho Sohn 외 4인, p623-632, Journal of Colloid and Interface Sci * |
Surface properties and liquid crystal alignment behavior., Eun-Ho Sohn 외 4인, p623-632, Journal of Colloid and Interface Science 360(2011.4.24.) 1부. * |
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