KR101844030B1 - 광학렌즈의 dlc 코팅 장치 및 방법 - Google Patents
광학렌즈의 dlc 코팅 장치 및 방법 Download PDFInfo
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- KR101844030B1 KR101844030B1 KR1020160109337A KR20160109337A KR101844030B1 KR 101844030 B1 KR101844030 B1 KR 101844030B1 KR 1020160109337 A KR1020160109337 A KR 1020160109337A KR 20160109337 A KR20160109337 A KR 20160109337A KR 101844030 B1 KR101844030 B1 KR 101844030B1
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- 230000003287 optical effect Effects 0.000 title claims abstract description 71
- 239000011248 coating agent Substances 0.000 title claims abstract description 30
- 238000000576 coating method Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 239000002184 metal Substances 0.000 claims abstract description 44
- 150000002500 ions Chemical class 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 7
- 239000010439 graphite Substances 0.000 claims abstract description 7
- 125000006850 spacer group Chemical group 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 7
- 229910010293 ceramic material Inorganic materials 0.000 claims description 4
- 239000004809 Teflon Substances 0.000 claims description 3
- 229920006362 Teflon® Polymers 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims description 3
- 238000006748 scratching Methods 0.000 claims description 3
- 230000002393 scratching effect Effects 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 18
- 239000002245 particle Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- -1 carbon ions Chemical class 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Eyeglasses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
도 2는 도 1의 광학렌즈가 장착된 금속기판 부분을 확대 도시한 도면이고,
도 3은 본 발명의 또 다른 실시예에 따른 스페이서에 대응한 금속기판의 구조를 적용한 도면이다.
33: 플랜지부분 50: 금속기판
53: 곡률밀착부분 80: 스페이서
Claims (7)
- 삭제
- 삭제
- 챔버 내에 장착된 흑연소재의 타겟체로부터 플라즈마화된 이온을 발생시켜 바이어스가 인가된 금속기판에 안착되게 장착된 광학 렌즈의 표면에 막을 코팅하는 DLC 코팅장치에 있어서,
상기 광학 렌즈는 곡률을 갖게 형성된 렌즈부분과, 렌즈부분의 가장자리에서 판형상으로 연장된 플렌지부분을 구비하고,
상기 금속기판은 상기 렌즈부분의 표면형상에 대응되게 곡률을 갖게 형성되어 상기 렌즈부분과 밀착되는 곡률밀착부분을 갖는 구조로 형성되어 있고,
상기 광학렌즈는 복수개가 상호 이격되게 상기 금속기판에 어레이되어 있고, 상기 광학렌즈들 사이에 삽입되어 상기 광학렌즈를 상기 금속기판에 대해 지지시키며 절연체 소재로 형성된 스페이서;를 구비하며,
상기 스페이서는 상기 광학렌즈보다 유전율이 높은 세라믹 소재로 형성되어 있고, 상기 금속기판의 상기 스페이서와 대향되는 부분에는 상기 광학렌즈에 대응되게 유효 유전율을 보정하기 위한 보정공간이 상기 스페이서에 대해 멀어지는 방향으로 형성된 인입홈을 갖는 것을 특징으로 하는 광학렌즈의 DLC 코팅장치. - 제3항에 있어서, 상기 금속기판의 표면은 상기 광학렌즈의 스크래치 방지를 위해 테프론소재로 코팅처리된 스크래치 방지막;이 형성된 것을 특징으로 하는 광학렌즈의 DLC 코팅장치.
- 삭제
- 삭제
- 삭제
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KR1020160109337A KR101844030B1 (ko) | 2016-08-26 | 2016-08-26 | 광학렌즈의 dlc 코팅 장치 및 방법 |
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KR1020160109337A KR101844030B1 (ko) | 2016-08-26 | 2016-08-26 | 광학렌즈의 dlc 코팅 장치 및 방법 |
Publications (2)
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KR20180023650A KR20180023650A (ko) | 2018-03-07 |
KR101844030B1 true KR101844030B1 (ko) | 2018-03-30 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102256056B1 (ko) * | 2019-08-30 | 2021-05-25 | 한국광기술원 | 금형에 코팅막을 증착하는 장치 및 방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011207192A (ja) | 2010-03-30 | 2011-10-20 | Fujifilm Corp | マスタの製造方法 |
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Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011207192A (ja) | 2010-03-30 | 2011-10-20 | Fujifilm Corp | マスタの製造方法 |
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