KR101769062B1 - 정전 척 장치 - Google Patents
정전 척 장치 Download PDFInfo
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- KR101769062B1 KR101769062B1 KR1020137027046A KR20137027046A KR101769062B1 KR 101769062 B1 KR101769062 B1 KR 101769062B1 KR 1020137027046 A KR1020137027046 A KR 1020137027046A KR 20137027046 A KR20137027046 A KR 20137027046A KR 101769062 B1 KR101769062 B1 KR 101769062B1
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- electrostatic chuck
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/23—Chucks or sockets with magnetic or electrostatic means
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
도 2는, 본 발명의 실시예의 정전 척 장치를 60℃로 유지했을 때의, 실리콘 웨이퍼의 면내 온도 분포를 나타낸 도면이다.
도 3은, 본 발명의 실시예의 정전 척 장치의 승온시의, 실리콘 웨이퍼의 면내 온도 분포를 나타낸 도면이다.
도 4는, 본 발명의 실시예의 정전 척 장치의 강온(降溫)시의, 실리콘 웨이퍼의 면내 온도 분포를 나타낸 도면이다.
3: 온도 조정용 베이스부 4: 절연재
5: 히터 엘리먼트 6: 유기계 접착제층
7: 스페이서 11: 재치판
12: 지지판 13: 정전 흡착용 내부 전극
14: 절연재층 15, 15a, 15b: 급전용 단자
16: 돌기부 17: 절연 애자
21: 유로 22: 접착제층
23: 접착제층 24: 접착제층
31: 급전용 단자 32: 절연 애자
W: 판 형상 시료
Claims (6)
- 판 형상 시료를 재치(載置)하는 재치면인 하나의 주면을 가지고, 또한 정전 흡착용 내부 전극을 내장하는 정전 척부와,
상기 정전 척부의 온도를 조정하는 온도 조정용 베이스부를 구비하고,
상기 온도 조정용 베이스부의, 상기 정전 척부측에 위치하는 면의 일부 또는 전체는, 시트 형상 또는 필름 형상의 절연재에 의해, 상기 절연재와 실질적으로 동일한 형상의, 제 1 접착제층을 개재하여 피복되며,
상기 절연재의, 상기 재치면측에 위치하는 면에는, 박판(薄板) 형상의 가열 부재가 상기 가열 부재와 실질적으로 동일한 형상의, 제 2 접착제층을 개재하여 접착되고,
상기 정전 척부와 상기 온도 조정용 베이스부가, 액상의 접착제를 경화한, 제 3 접착제층으로서의 절연성의 유기계 접착제층을 개재하여, 접착에 의해 일체화된 것을 특징으로 하는 정전 척 장치. - 제 1항에 있어서,
상기 가열 부재는, 비자성 금속으로 이루어지는 두께가 0.2mm 이하의 박판 형상의 히터 엘리먼트인 것을 특징으로 하는 정전 척 장치. - 제 1항에 있어서,
상기 절연재의 두께의 편차는, 10㎛ 이하인 것을 특징으로 하는 정전 척 장치. - 제 1항에 있어서,
상기 유기계 접착제층의 쇼어 경도는 A90 이하, 또한 열전도율은 0.15W/mk 이상인 것을 특징으로 하는 정전 척 장치. - 제 1항에 있어서,
상기 유기계 접착제층의 두께는 50㎛ 이상이며, 상기 정전 척부와 상기 가열 부재의 사이에 배치되는 스페이서의 신장 탄성률은 10GPa 이하인 것을 특징으로 하는 정전 척 장치. - 제 1항에 있어서,
상기 가열 부재와 상기 온도 조정용 베이스부의 사이의 열전달률은, 상기 가열 부재와 상기 정전 척부의 사이의 열전달률보다 작은 것을 특징으로 하는 정전 척 장치.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-099982 | 2011-04-27 | ||
JP2011099982 | 2011-04-27 | ||
PCT/JP2012/061402 WO2012147931A1 (ja) | 2011-04-27 | 2012-04-27 | 静電チャック装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140012730A KR20140012730A (ko) | 2014-02-03 |
KR101769062B1 true KR101769062B1 (ko) | 2017-08-17 |
Family
ID=47072443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020137027046A Active KR101769062B1 (ko) | 2011-04-27 | 2012-04-27 | 정전 척 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9269600B2 (ko) |
JP (1) | JP6052169B2 (ko) |
KR (1) | KR101769062B1 (ko) |
CN (1) | CN103503128B (ko) |
TW (1) | TWI544569B (ko) |
WO (1) | WO2012147931A1 (ko) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5817646B2 (ja) * | 2012-05-29 | 2015-11-18 | 株式会社島津製作所 | サンプルホルダ |
TWI533401B (zh) | 2013-08-29 | 2016-05-11 | Bridgestone Corp | 晶座 |
JP6244804B2 (ja) | 2013-10-15 | 2017-12-13 | 住友大阪セメント株式会社 | 静電チャック装置 |
JP6277015B2 (ja) * | 2014-02-28 | 2018-02-07 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
DE102014008031B4 (de) * | 2014-05-28 | 2020-06-25 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. | Elektrostatische Haltevorrichtung mit einer Keramik-Elektrode und Verfahren zur Herstellung einer solchen Haltevorrichtung |
DE102014008030A1 (de) * | 2014-05-28 | 2015-12-03 | Berliner Glas Kgaa Herbert Kubatz Gmbh & Co | Verfahren zur Herstellung einer elektrostatischen Haltevorrichtung |
DE102014008029B4 (de) | 2014-05-28 | 2023-05-17 | Asml Netherlands B.V. | Elektrostatische Haltevorrichtung mit einer Elektroden-Trägerscheibe und Verfahren zur Herstellung der Haltevorrichtung |
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CN103503128B (zh) | 2017-03-22 |
JPWO2012147931A1 (ja) | 2014-07-28 |
WO2012147931A1 (ja) | 2012-11-01 |
CN103503128A (zh) | 2014-01-08 |
KR20140012730A (ko) | 2014-02-03 |
US9269600B2 (en) | 2016-02-23 |
US20140042716A1 (en) | 2014-02-13 |
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TW201304049A (zh) | 2013-01-16 |
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