KR101768519B1 - Apparatus for Processing Substrate - Google Patents

Abstract

The substrate processing apparatus of the present invention includes an index chamber for providing a moving path; An index robot movably installed along a moving path of the index chamber; A first load port provided at a front end of the index chamber and in which a substrate transfer container for accommodating a substrate is placed; A first load port provided at a rear end of the index chamber and in which a substrate transfer container for accommodating a substrate is placed; And a first and second processing unit having a plurality of chambers arranged side by side along the moving passage with the index chamber interposed therebetween and for processing the substrate.

Description

[0001] Apparatus for Processing Substrate [

The present invention relates to a substrate processing facility, and more particularly, to a substrate processing facility that performs a cleaning process.

In general, in the substrate manufacturing process, deposition, etching, coating of a photoresist, development, asher removal, and the like of an insulating film and a metal material are repeated a few times to form a patterning ). As the process progresses, a foreign material remains in the substrate that has not been completely removed by the etching or asher removal process. As a process for removing such foreign substances, there is a wet cleaning process using pure water (Deionized Water) or a chemical (chemical).

In a substrate cleaning apparatus, a substrate is fixed by a substrate chuck in a small-sized chamber capable of processing a single substrate, and then a substrate is rotated by a motor, and a nozzle Thereby providing a chemical or pure water to the substrate. By the rotational force of the substrate, the chemical liquid or the pure water or the like spreads over the substrate, thereby removing the foreign matter adhering to the substrate.

FIG. 1 is a view showing an arrangement structure of a conventional substrate cleaning apparatus 1000, and includes a loading / unloading section 1100, an index robot 1200, a buffer section 1300, a process chamber 1400, And a robot 1500. The index robot 1200 transfers the substrate between the buffer unit 1300 and the loading / unloading unit 1100 and the main transfer robot 1500 transfers the substrate between the buffer unit 1300 and the process chamber 1400.

In this substrate cleaning apparatus 1000, since one main transfer robot 1500 draws and draws a substrate into / from a plurality of process chambers 1400, as the moving distance of the main transfer robot 1500 becomes longer, The tact time is increased.

A method of increasing the number of hands and buffer slots of the index robot 1200 and the main transfer robot 1500 has been proposed in order to increase the facility production amount in the substrate cleaning apparatus 1000. However, There are limitations when it comes to.

Meanwhile, as shown in FIG. 2, when two main transfer robots 1500 are installed to increase the facility production amount, the facility width L increases from 2230 mm to 280 mm.

Embodiments of the present invention seek to provide a substrate processing facility that can reduce tact time.

Embodiments of the present invention provide a substrate processing facility capable of maximizing the throughput of a facility.

The problems to be solved by the present invention are not limited thereto, and other matters not mentioned can be clearly understood by those skilled in the art from the following description.

According to an aspect of the present invention, there is provided an index chamber for providing a moving passage; An index robot movably installed along a moving path of the index chamber; A first load port provided at a front end of the index chamber and in which a substrate transfer container for accommodating a substrate is placed; A first load port provided at a rear end of the index chamber and in which a substrate transfer container for accommodating a substrate is placed; And a first and a second processing unit arranged side by side along the moving passage with the index chamber interposed therebetween and having a plurality of chambers for processing the substrate.

The substrate processing apparatus may further include: an atmospheric port in which the substrate transfer container to be placed on the first load port temporarily stands by; And a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the first load port.

Further, the first load port and the standby port may be located under the movement path of the goods transfer apparatus (OHT).

The substrate processing facility may further include: an atmospheric port in which the substrate transfer container to be placed in the second load port temporarily waits; And a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the second load port.

In addition, the second load port and the standby port may be located under the movement path of the goods transport apparatus (OHT).

In addition, the first processing unit may include a first chamber part in which at least two process chambers are stacked; A second chamber spaced from the first chamber and having at least two or more process chambers stacked; A first main transport robot positioned between the first chamber portion and the second chamber portion; And a first buffer unit disposed between the first main transport robot and the moving path.

The second processing unit may include a third chamber part in which at least two process chambers are stacked; A fourth chamber disposed apart from the third chamber and having at least two or more process chambers stacked; A second main transport robot positioned between the third chamber part and the fourth chamber part; And a second buffer unit disposed between the second main transport robot and the moving path.

The first buffer unit and the second buffer unit may include a first buffer module on which the substrate is placed before the processing; And a second buffer module on which the substrate is placed after processing.

In addition, the index robot may include a plurality of transfer hands capable of carrying in and carrying out the substrates stored in the substrate transfer container at a time.

According to an aspect of the present invention, a load port is disposed at both ends of a moving path through which the index robot is moved, process chambers are disposed on both sides of the moving path with a main transport robot interposed therebetween, A substrate processing apparatus in which a buffer section is disposed between transfer passages can be provided.

A standby port disposed on both sides of the load port and temporarily waiting for the substrate transfer container; And a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the load port.

The buffer unit may further include: a first buffer module on which substrates are placed before processing; And a second buffer module on which the processed substrates are placed.

According to the present invention, it is possible to arrange a total of 12 process chambers, four in total, without increasing the width of the equipment.

According to the present invention, since the substrate transfer between the buffer unit and the process chambers is carried out quickly only by lifting and rotating (direction dialing) of the main transfer robot, the tact time for transferring the substrate is remarkably reduced, Is increased.

According to the present invention, by arranging the main transport robot on both sides of the index chamber within the same facility area as the conventional one, it is possible to minimize the quantity of hand and improve the facility production due to the reduction of the tact time.

1 and 2 are views showing the arrangement structure of a conventional substrate cleaning apparatus.
3 is a plan view showing a substrate processing apparatus according to an embodiment of the present invention.
4 is a view showing an index robot.
5 is a view for explaining the first load port.
Fig. 6 is a plan structural view for explaining the first process processing unit. Fig.
Fig. 7 is a perspective view of the first processing unit shown in Fig. 6;

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and specific embodiments are illustrated in the drawings and will be described in detail in the detailed description. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprises" or "having" and the like are used to specify that there is a feature, a number, a step, an operation, an element, a component or a combination thereof described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout the specification and claims. The description will be omitted.

In this embodiment, a semiconductor wafer will be described as an example of a substrate. However, the substrate may be various kinds of substrates such as a photomask, a flat display panel, etc. in addition to a semiconductor wafer. In this embodiment, the substrate processing apparatus is an apparatus for performing a substrate cleaning process.

Referring to FIG. 3, the substrate processing system 1 of the present invention may include an index unit 10 and first and second process units 20a and 20b. The index chamber 100 of the index unit 10 and the first and second processing units 20a and 20b are arranged in parallel. Hereinafter, the longitudinal direction of the index chamber 100 will be referred to as a first direction X. A direction perpendicular to the first direction X is referred to as a second direction Y when viewed from above, X) and the second direction (Y) is defined as a third direction (Z).

The index unit 10 includes an index chamber 100 and an index robot 120, a first load port 130-1, and a second load port 130-2.

The index chamber 100 includes an index rail 110 and an index robot 120.

The transfer passage 102 of the index chamber 100 is positioned between the first load port 130-1 and the second load port 130-2. The moving passages 102 are arranged in the longitudinal direction along the first direction X. The moving path 102 provides a passage through which the index robot 120 moves. The first load port 130-1 and the second load port 130-2 are disposed opposite to each other at the front end and the rear end of the transfer passage 102. [ The index robot 120 moves along the first direction X to the moving path 102, and the index rail 110 is installed for this purpose.

The index robot 120 is installed in the moving path 102. The index robot 120 transfers the substrate W between the first load port 130-1 and the second load port 130-2 and between the first and second process ports 20a and 20b. As shown in FIG. 4, the index robot 120 linearly moves along the index rail 110 in the first direction, and moves up and down about the third direction Z as an axis. The index robot 120 includes a plurality of transfer hands 122 capable of carrying in and out the substrates stored in the substrate transfer container C at one time. For example, the index robot 120 may include 25 transfer hands 122 to collectively carry out 25 substrates from a substrate transfer container C that accommodates 25 substrates. The 25 sheets thus drawn out can be transported to the first buffer module of the first buffer unit.

The first load port 130-1 and the second load port 130-2 are disposed at the front and rear of the facility, respectively. The first load port 130-1 and the second load port 130-2 may receive the carriers 11 accommodating the substrate W, respectively. The first load port 130-1 and the second load port 130-2 may be provided at the front end and the rear end of the index chamber 100, respectively.

The container transfer unit 140 for transferring the substrate transfer container between the standby port 150 and the first load port (second load port) is provided at the front and rear of the facility, / RTI > For example, the standby port 150 may be disposed along the second direction Y on both sides of the load port.

In this embodiment, the first load port 130-1 and the second load port 130-2 have the same configuration. Therefore, the configuration of each load port will be described in detail below with reference to the first load port 130-1, and a description of the configuration of the second load port will be omitted.

As shown in FIG. 5, the first load port 130-1 is disposed adjacent to the index chamber 100 where the substrate transfer container C is placed. The first load port 130-1 includes a vertical frame 132 having an opener 131 which is engaged with the door of the substrate transfer container C on which the substrate is loaded to open the door, A stage 135 having a moving plate 134 extending outward and having a top surface on which a substrate transfer container C is mounted, and a driving unit (not shown for convenience of illustration) for moving the opener 131.

The substrate transfer container C may be mounted on the first load port 130-1 by a logistics transfer device (for example, overhead hoist transport; OHT) or by an operator.

The substrate transfer container C includes a body which is provided with a plurality of slots through which the substrate can be loaded in the inner space, and one side is opened and selectively opened and closed by the door. For example, a front opening unified pod (FOUP) can be used as the substrate transfer container (C). The door is inserted into the open side to provide a plurality of grooves capable of sealing the inside of the substrate transfer container C with the outside and engaging with the opener.

The first load port 130-1 is capable of receiving the container supporting portion 141 and forms a first opening 133 for providing a space in which the container supporting portion 141 can move up and down. The shape of the first opening 133 may be determined according to the shape of the support plate 142.

The standby port 150 is disposed adjacent to the first load port 130-1 at a position where the substrate transfer container C is temporarily placed before moving to the first load port 130-1. The standby port 150 includes a table-shaped table on which the substrate transfer container C can be placed. The standby port 150 forms a second opening 152 that can receive the container support 141 and provides a space for the container support 141 to move up and down. The shape of the second opening 152 is determined according to the shape of the support plate 142.

According to the present embodiment, the lack of the index robot can be eliminated by disposing the load port in front of and behind the facility, and by arranging the standby port on both sides of the load port, It is possible to hold six substrate transfer containers in total, three at the front and at the rear of the substrate transfer container.

A container transfer unit 140 is provided for transferring the substrate transfer container between the first load port 130-1 and the two atmosphere pods 150. [ The container transporting unit 140 may include a container supporting portion 141, a first driving portion 144, a moving plate 145, and a second driving portion 146.

The container supporting portion 141 includes a supporting plate 142 on which the substrate transfer container C is placed and a supporting shaft 143 for supporting the supporting plate 142. The support plate 142 may be provided in various shapes as a flat plate. A plurality of protrusions are formed on the upper end of the support plate 142 to prevent the substrate transfer container C from being detached from the support plate 142 during movement of the container transfer unit 140 and rotation of the support plate 142. The lower end of the support plate 142 is connected to one end of the support shaft 143. The support shaft 143 supports the support plate 142, and lifts and rotates the support plate 142. The other end of the supporting shaft 143 engages with the first driving portion 144. The first driving part 144 lifts and rotates the supporting shaft 143 using electric power applied from the outside. The support plate 142 is moved up and down by the lifting and rotating of the support shaft 143. The first driving part 144 engages with the upper end of the moving plate 145. The moving plate 145 moves in the second direction by the second driving unit 146 in a flat plate shape.

The substrate transfer vessel C may be mounted on the first load port 130-1 or the standby port 150 by a logistics transfer device (e.g., overhead hoist transport; OHT) or by an operator. The first load port 130-1 and the standby port 150 may be located under the movement path of the goods transfer apparatus OHT.

The first process processing unit 20a and the second process processing unit 20b are arranged side by side along the moving passage 102 with the index chamber 100 interposed therebetween.

In the present embodiment, the first process processing section 20a and the second process processing section 20b have the same configuration. Therefore, the configuration of each process processing unit will be described in detail below with reference to the first process processing unit 20a as an example, and a description of the configuration of the second process processing unit will be omitted.

6 and 7 are views showing the configuration of the first process processing unit.

6 and 7, the first processing unit 20a includes a first chamber 200-1 and a second chamber 200-2, a first chamber 200-1 and a second chamber 200-2. A first main transport robot 230 and a first buffer 240 positioned between the first and second transporting units 200-2.

The first chamber part 200-1 and the second chamber part include process chambers 200 stacked in a third direction Z. [ In the present embodiment, the three process chambers 200 are stacked so that the first process chamber 200-1 has a total of six process chambers 200 in the vicinity of which the first main transfer robot 230 is accessible. Respectively.

The first main transport robot 230 has a structure in which there is no traveling axis and is capable of moving up and down and about the third direction Z as an axis. In this manner, in the first process processing unit 20a, three process chambers 200 are disposed on both sides of the first main transport robot 230, and the first main transport robot 230 is omitted from the traveling operation Therefore, the tact time for transferring the substrate can be remarkably reduced, and the facility production can be improved.

The first buffer unit 240 is disposed between the first main transport robot 230 and the moving path 102. The first buffer unit 240 may be positioned near the center of the index chamber 10). The first buffer portion 240 includes a first buffer module 242 on which a substrate is placed before processing and a second buffer module 244 on which the processed substrate is placed, . The first buffer module 242 and the second buffer module 244 include a plurality of slots capable of simultaneously storing 25 substrates.

Meanwhile, the pitch between the slots of the first buffer module 242 and the second buffer module 244 may be variable. For example, the slot pitch when the index robot 120 is transferred to and from the 25 sheets of substrates corresponds to the reference pitch (interval between the transfer hands of the index robot), which is the slot interval in the substrate transfer container C, The slot pitch when the transfer robot 230 and the substrate are transferred to each other can be wider than the reference pitch. Although not shown, the first buffer module 242 and the second buffer module 244 may include a device for pitch conversion between the slots.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined in the appended claims. It will be possible.

10: Index section 20a: First process processing section
20b: second process processing section 100: index chamber
120: index robot 130-1: first load port
130-2: second load port

Claims (12)

A substrate processing facility comprising:
An index chamber providing a transfer path;
An index robot movably installed along a moving path of the index chamber;
A first load port provided at a front end of the index chamber and in which a substrate transfer container for accommodating a substrate is placed;
A second load port provided at a rear end of the index chamber and on which a substrate transfer container for accommodating a substrate is placed; And
And a plurality of chambers arranged side by side along the transfer passage with the index chamber interposed therebetween and in which processing of the substrate is performed. The method according to claim 1,
The substrate processing facility
An atmospheric port in which the substrate transfer container to be placed on the first load port temporarily waits; And
Further comprising a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the first load port. 3. The method of claim 2,
Wherein the first load port and the atmospheric port are located under a path of movement of the goods transport apparatus (OHT). The method according to claim 1,
The substrate processing facility
An atmospheric port temporarily waiting for the substrate transfer container to be placed in the second load port; And
Further comprising a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the second load port. 5. The method of claim 4,
Wherein the second load port and the atmospheric port are located under a movement path of the goods transfer apparatus (OHT). The method according to claim 1,
The first processing unit
A first chamber part in which at least two process chambers are stacked;
A second chamber part in which at least two process chambers are stacked;
A first main transport robot positioned between the first chamber portion and the second chamber portion; And
And a first buffer portion disposed between the first main transport robot and the moving path,
Wherein the first chamber portion and the second chamber portion are spaced apart in the longitudinal direction of the moving path. The method according to claim 6,
The second processing unit
A third chamber part in which at least two process chambers are stacked;
A fourth chamber part in which at least two process chambers are stacked;
A second main transport robot positioned between the third chamber part and the fourth chamber part; And
And a second buffer portion disposed between the moving passages of the second main transporting robot,
Wherein the third chamber portion and the fourth chamber portion are spaced apart in the longitudinal direction of the moving passage. 8. The method of claim 7,
The first buffer unit and the second buffer unit
A first buffer module on which a substrate is placed before processing; And
And a second buffer module on which a substrate is placed after processing. The method according to claim 1,
The index robot
And a plurality of transfer hands capable of carrying in and out of the substrates accommodated in the substrate transfer container at a time. A substrate processing facility comprising:
Wherein a load port is disposed at both ends of a moving path through which the index robot is moved and process chambers on one side of the moving path are arranged in the longitudinal direction of the moving path with the main transport robot therebetween, A substrate processing apparatus in which a buffer section is disposed between transfer passages. 11. The method of claim 10,
An atmospheric port disposed on both sides of the load port and temporarily waiting for the substrate transfer container; And
Further comprising a substrate transfer container transfer unit for transferring the substrate transfer container between the standby port and the load port. 11. The method of claim 10,
The buffer unit
A first buffer module on which substrates are placed before processing; And
And a second buffer module on which the processed substrates are placed.

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