KR101768246B1 - Curable composition, hardened material, and method for using curable composition - Google Patents
Curable composition, hardened material, and method for using curable composition Download PDFInfo
- Publication number
- KR101768246B1 KR101768246B1 KR1020127023138A KR20127023138A KR101768246B1 KR 101768246 B1 KR101768246 B1 KR 101768246B1 KR 1020127023138 A KR1020127023138 A KR 1020127023138A KR 20127023138 A KR20127023138 A KR 20127023138A KR 101768246 B1 KR101768246 B1 KR 101768246B1
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- KR
- South Korea
- Prior art keywords
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- acid anhydride
- silane compound
- anhydride
- carbon atoms
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 109
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000000463 material Substances 0.000 title claims abstract description 25
- -1 alicyclic acid anhydride Chemical class 0.000 claims abstract description 126
- 229910000077 silane Inorganic materials 0.000 claims abstract description 124
- 229920001577 copolymer Polymers 0.000 claims abstract description 80
- 230000003287 optical effect Effects 0.000 claims abstract description 60
- 150000001875 compounds Chemical class 0.000 claims abstract description 56
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 41
- 239000000853 adhesive Substances 0.000 claims abstract description 40
- 230000001070 adhesive effect Effects 0.000 claims abstract description 38
- 239000004593 Epoxy Substances 0.000 claims abstract description 37
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 27
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 21
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims abstract description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 50
- 125000000217 alkyl group Chemical group 0.000 claims description 44
- 125000001424 substituent group Chemical group 0.000 claims description 40
- 125000005843 halogen group Chemical group 0.000 claims description 31
- 125000006239 protecting group Chemical group 0.000 claims description 24
- 239000000126 substance Substances 0.000 claims description 23
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 19
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 17
- 125000002947 alkylene group Chemical group 0.000 claims description 15
- 125000004450 alkenylene group Chemical group 0.000 claims description 14
- 125000004419 alkynylene group Chemical group 0.000 claims description 14
- 125000000732 arylene group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 150000008065 acid anhydrides Chemical group 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 125000005647 linker group Chemical group 0.000 claims description 11
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 10
- 125000004414 alkyl thio group Chemical group 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 claims description 7
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 claims description 6
- 239000007983 Tris buffer Substances 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 5
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 claims description 4
- 239000008393 encapsulating agent Substances 0.000 claims description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 claims description 3
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 claims description 3
- QXBYUPMEYVDXIQ-UHFFFAOYSA-N 4-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound CC1CCCC2C(=O)OC(=O)C12 QXBYUPMEYVDXIQ-UHFFFAOYSA-N 0.000 claims description 3
- XPEKVUUBSDFMDR-UHFFFAOYSA-N 4-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound CC1C=CCC2C(=O)OC(=O)C12 XPEKVUUBSDFMDR-UHFFFAOYSA-N 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- OEMSKMUAMXLNKL-UHFFFAOYSA-N 5-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)=CCC2C(=O)OC(=O)C12 OEMSKMUAMXLNKL-UHFFFAOYSA-N 0.000 claims description 2
- OZEHOHQZIRILDX-UHFFFAOYSA-N ctk1b7797 Chemical compound O=C1OC(=O)C2C1C1(C)CC2CC1 OZEHOHQZIRILDX-UHFFFAOYSA-N 0.000 claims description 2
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 125000004036 acetal group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- KNRCVAANTQNTPT-UHFFFAOYSA-N methyl-5-norbornene-2,3-dicarboxylic anhydride Chemical compound O=C1OC(=O)C2C1C1(C)C=CC2C1 KNRCVAANTQNTPT-UHFFFAOYSA-N 0.000 claims 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 2
- JDBDDNFATWXGQZ-UHFFFAOYSA-N 5-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1=CC(C)CC2C(=O)OC(=O)C12 JDBDDNFATWXGQZ-UHFFFAOYSA-N 0.000 claims 1
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 claims 1
- 150000008064 anhydrides Chemical group 0.000 abstract description 2
- 238000004040 coloring Methods 0.000 abstract description 2
- 239000003566 sealing material Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 42
- 238000001723 curing Methods 0.000 description 39
- 150000004756 silanes Chemical class 0.000 description 31
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 238000002834 transmittance Methods 0.000 description 20
- 238000010438 heat treatment Methods 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 18
- 238000002329 infrared spectrum Methods 0.000 description 14
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 14
- 125000001309 chloro group Chemical group Cl* 0.000 description 13
- 238000009826 distribution Methods 0.000 description 13
- 229910018557 Si O Inorganic materials 0.000 description 12
- 239000003963 antioxidant agent Substances 0.000 description 12
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 11
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 229910052801 chlorine Inorganic materials 0.000 description 9
- QIJFOMIKTSUIRK-UHFFFAOYSA-N 2,2-dimethoxyethoxy(phenyl)silane Chemical compound C1(=CC=CC=C1)[SiH2]OCC(OC)OC QIJFOMIKTSUIRK-UHFFFAOYSA-N 0.000 description 8
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 8
- 230000003078 antioxidant effect Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 125000001153 fluoro group Chemical group F* 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 6
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 6
- VAZGKQJHXXBSSK-UHFFFAOYSA-N 3-trichlorosilylpropyl acetate Chemical compound CC(=O)OCCC[Si](Cl)(Cl)Cl VAZGKQJHXXBSSK-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- CRSOQBOWXPBRES-UHFFFAOYSA-N neopentane Chemical compound CC(C)(C)C CRSOQBOWXPBRES-UHFFFAOYSA-N 0.000 description 6
- YFAPBUKTSPHXQA-UHFFFAOYSA-N 3-chloropropyl(2,2-dichloroethoxy)silane Chemical compound ClCCC[SiH2]OCC(Cl)Cl YFAPBUKTSPHXQA-UHFFFAOYSA-N 0.000 description 5
- KVUMYOWDFZAGPN-UHFFFAOYSA-N 3-trimethoxysilylpropanenitrile Chemical compound CO[Si](OC)(OC)CCC#N KVUMYOWDFZAGPN-UHFFFAOYSA-N 0.000 description 5
- FZTPAOAMKBXNSH-UHFFFAOYSA-N 3-trimethoxysilylpropyl acetate Chemical compound CO[Si](OC)(OC)CCCOC(C)=O FZTPAOAMKBXNSH-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- 239000004611 light stabiliser Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- OOXSLJBUMMHDKW-UHFFFAOYSA-N trichloro(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)Cl OOXSLJBUMMHDKW-UHFFFAOYSA-N 0.000 description 5
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 4
- ADBORBCPXCNQOI-UHFFFAOYSA-N 3-triethoxysilylpropyl acetate Chemical compound CCO[Si](OCC)(OCC)CCCOC(C)=O ADBORBCPXCNQOI-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- 239000003377 acid catalyst Substances 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 239000003085 diluting agent Substances 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- OPMAXPVCTSDVDC-UHFFFAOYSA-N trichloro(3-fluoropropyl)silane Chemical compound FCCC[Si](Cl)(Cl)Cl OPMAXPVCTSDVDC-UHFFFAOYSA-N 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 description 3
- VGIURMCNTDVGJM-UHFFFAOYSA-N 4-triethoxysilylbutanenitrile Chemical compound CCO[Si](OCC)(OCC)CCCC#N VGIURMCNTDVGJM-UHFFFAOYSA-N 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000012964 benzotriazole Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000013007 heat curing Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000001925 cycloalkenes Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 description 2
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
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- 150000003512 tertiary amines Chemical class 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004187 tetrahydropyran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- ZFXYFBGIUFBOJW-UHFFFAOYSA-N theophylline Chemical compound O=C1N(C)C(=O)N(C)C2=C1NC=N2 ZFXYFBGIUFBOJW-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- GNFASNGPRPMXAG-UHFFFAOYSA-N tribromo(3-phenylmethoxypropyl)silane Chemical compound Br[Si](Br)(Br)CCCOCC1=CC=CC=C1 GNFASNGPRPMXAG-UHFFFAOYSA-N 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- HPTIEXHGTPSFDC-UHFFFAOYSA-N tribromo(phenyl)silane Chemical group Br[Si](Br)(Br)C1=CC=CC=C1 HPTIEXHGTPSFDC-UHFFFAOYSA-N 0.000 description 1
- SSZIBXDZTVQYGY-UHFFFAOYSA-N tribromo-[3-(methoxymethoxy)propyl]silane Chemical compound COCOCCC[Si](Br)(Br)Br SSZIBXDZTVQYGY-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical group Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- NYQDBZQWFXNBRZ-UHFFFAOYSA-N trichloro-(2-chlorophenyl)silane Chemical group ClC1=CC=CC=C1[Si](Cl)(Cl)Cl NYQDBZQWFXNBRZ-UHFFFAOYSA-N 0.000 description 1
- QDGORAVIRGNDBW-UHFFFAOYSA-N trichloro-(2-ethoxyphenyl)silane Chemical group CCOC1=CC=CC=C1[Si](Cl)(Cl)Cl QDGORAVIRGNDBW-UHFFFAOYSA-N 0.000 description 1
- NNWMTCDMYFZDHA-UHFFFAOYSA-N trichloro-(4-methoxyphenyl)silane Chemical group COC1=CC=C([Si](Cl)(Cl)Cl)C=C1 NNWMTCDMYFZDHA-UHFFFAOYSA-N 0.000 description 1
- KLNCGPCJQOMUSQ-UHFFFAOYSA-N trichloro-[3-(2-methoxyethoxymethoxy)propyl]silane Chemical compound COCCOCOCCC[Si](Cl)(Cl)Cl KLNCGPCJQOMUSQ-UHFFFAOYSA-N 0.000 description 1
- UXRBHEQFVKYHRG-UHFFFAOYSA-N triethoxy(3-fluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCF UXRBHEQFVKYHRG-UHFFFAOYSA-N 0.000 description 1
- JZYKVBRBIWTMEB-UHFFFAOYSA-N triethoxy(3-triethylsilyloxypropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCO[Si](CC)(CC)CC JZYKVBRBIWTMEB-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
- PGBUIPONYKQQMF-UHFFFAOYSA-N triethoxy-[3-(2-methoxyethoxymethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCOCCOC PGBUIPONYKQQMF-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- YOGRNCSVLDKNCY-UHFFFAOYSA-N trimethoxy(2-trimethylsilyloxyethyl)silane Chemical compound CO[Si](OC)(OC)CCO[Si](C)(C)C YOGRNCSVLDKNCY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- IDYFTCYABIBGGM-UHFFFAOYSA-N trimethoxy-[2-methyl-3-(oxan-2-yloxy)propyl]silane Chemical compound O1C(CCCC1)OCC(C[Si](OC)(OC)OC)C IDYFTCYABIBGGM-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4215—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
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- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
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- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/06—Triglycidylisocyanurates
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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- C09J183/04—Polysiloxanes
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- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
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Abstract
본 발명은 (A) 특정의 반복 단위를 갖는 실란 화합물 공중합체, (B) 이소시아누레이트 골격을 갖는 에폭시 화합물, (C) 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제, 및 (D) 산무수물 구조를 갖는 실란 커플링제를 함유하는 경화성 조성물, 이 조성물을 경화시켜 이루어지는 경화물, 그리고, 상기 조성물을 광소자 고정재용 접착제 및 광소자 고정재용 밀봉재로서 사용하는 방법이다. 본 발명의 경화성 조성물에 의하면, 고에너지의 광이 조사되는 경우나 고온 상태라도, 착색하여 투명성이 저하되거나 하는 경우가 없어, 장기에 걸쳐 우수한 투명성을 가지며, 또한, 고온에 있어서도 높은 접착력을 갖는 경화물을 얻을 수 있다. 본 발명의 경화성 조성물은 광소자 고정재를 형성할 때에 사용할 수 있고, 특히, 광소자 고정재용 접착제, 및 광소자 고정재용 밀봉제로서 바람직하게 사용할 수 있다.The present invention relates to (A) a silane compound copolymer having a specific repeating unit, (B) an epoxy compound having an isocyanurate skeleton, (C) a curing agent containing an alicyclic acid anhydride having a carboxyl group, and (D) A curing composition containing a silane coupling agent having an anhydride structure, a cured product obtained by curing the composition, and a method of using the composition as an adhesive for optical device fixing material and a sealing material for optical device fixing material. According to the curable composition of the present invention, even when a high-energy light is irradiated or in a high-temperature state, there is no case where the transparency is lowered due to coloring, and it has excellent transparency for a long period of time, Cargo can be obtained. The curable composition of the present invention can be used for forming an optical element fixing material, and can be preferably used as an optical element fixing agent and an optical element fixing agent.
Description
본 발명은 투명성 및 내열성이 우수하고, 또한, 높은 접착력을 갖는 경화물이 얻어지는 경화성 조성물, 이 조성물을 경화시켜 이루어지는 경화물, 그리고, 상기 조성물을 광소자 고정재용 접착제 또는 광소자 고정재용 밀봉제로서 사용하는 방법에 관한 것이다.The present invention relates to a curable composition which is excellent in transparency and heat resistance and which can obtain a cured product having a high adhesive strength, a cured product obtained by curing the composition, and an adhesive for an optical element fixing agent or an optical element fixing agent And a method of using the same.
종래, 경화성 조성물은 용도에 따라 여러가지 개량이 이루어져, 광학 부품이나 성형체의 원료, 접착제, 코팅제 등으로서 산업상 널리 이용되어 오고 있다. 예를 들어, 투명성이 우수한 경화물을 형성하는 경화성 조성물은, 광학 부품의 원료나, 그 코팅제로서, 또 높은 접착력을 갖는 경화물을 형성하는 경화성 조성물은, 접착제나 코팅제로서 바람직하게 사용되는 경우가 많다. BACKGROUND ART [0002] Conventionally, curable compositions have been variously improved depending on their applications and have been widely used as raw materials for optical parts and molded articles, adhesives, coating agents, and the like. For example, a curable composition for forming a cured product having excellent transparency is preferably used as a raw material for an optical component, a curable composition for forming the cured product having a high adhesive force as a coating material thereof, many.
또, 최근, 경화성 조성물은 광소자 밀봉체를 제조할 때에, 광소자 고정재용 접착제나 광소자 고정재용 밀봉제 등의 광소자 고정재용 조성물로서도 이용되어 오고 있다.In recent years, the curable composition has also been used as a composition for an optical element fixing agent such as an adhesive for an optical element fixing agent or a sealing agent for an optical element fixing agent when manufacturing an optical element sealing member.
광소자에는, 반도체 레이저 (LD) 등의 각종 레이저나 발광 다이오드 (LED) 등의 발광 소자, 수광 소자, 복합 광소자, 광 집적 회로 등이 있다. 최근에는, 발광의 피크 파장이 보다 단파장인 청색광이나 백색광의 광소자가 개발되어 널리 사용되어 오고 있다. 이와 같은 발광의 피크 파장이 짧은 발광 소자의 고휘도화가 비약적으로 진행되고, 이것에 수반하여 광소자의 발열량이 더욱 커져 가는 경향이 있다.Optical devices include various lasers such as semiconductor lasers (LD), light emitting devices such as light emitting diodes (LED), light receiving devices, composite optical devices, and optical integrated circuits. In recent years, an optical element of blue light or white light having a shorter peak wavelength of light emission has been developed and widely used. Such a light emitting device having a short peak wavelength of light emission has been remarkably advanced in brightness, and the amount of heat generated by the optical device tends to become larger.
그런데, 최근에 있어서의 광소자의 고휘도화에 수반하여, 광소자 고정재용 조성물의 경화물이, 보다 높은 에너지의 광이나 광소자로부터 발생하는 보다 고온의 열에 장시간 노출되어, 열화되어 크랙이 발생하거나 박리되거나 한다는 문제가 발생하였다.However, in recent years, with the increase in brightness of optical devices, a cured product of the optical element fixing composition is exposed to heat of a higher temperature generated from light of higher energy or optical element for a long time and is deteriorated, Or the like.
이 문제를 해결하기 위하여, 특허문헌 1 ∼ 3 에 있어서, 폴리실세스퀴옥산 화합물을 주성분으로 하는 광소자 고정재용 조성물이 제안되어 있다. In order to solve this problem, in Patent Documents 1 to 3, a composition for an optical element fixing material comprising a polysilsesquioxane compound as a main component has been proposed.
그러나, 특허문헌 1 ∼ 3 에 기재된 폴리실세스퀴옥산 화합물을 주성분으로 하는 광소자 고정재용 조성물의 경화물이어도, 충분한 접착력을 유지하면서, 내열성 및 투명성을 얻는 것은 곤란한 경우가 있었다.However, even in the case of a cured product of a composition for optical element fixing using a polysilsesquioxane compound as a main component described in Patent Documents 1 to 3, it has been difficult to obtain heat resistance and transparency while maintaining a sufficient adhesive strength.
또, 광소자 밀봉용으로 사용하는 조성물로서 특허문헌 4 에는, 지환식 에폭시 수지를 사용하는 에폭시 수지 조성물이, 특허문헌 5 에는, 폴리티올 화합물을 함유하는 에폭시 수지 조성물이 제안되어 있다. Patent Document 4 discloses an epoxy resin composition using an alicyclic epoxy resin, and Patent Document 5 proposes an epoxy resin composition containing a polythiol compound as a composition used for optical device sealing.
그러나, 이들의 조성물을 사용하는 경우라도, 시간 경과적 변화에 수반하는 충분한 내광 열화성을 만족시킬 수 없거나, 접착력이 저하되는 경우가 있었다.However, even in the case of using these compositions, sufficient light fastness deterioration accompanying temporal change can not be satisfied, or the adhesive strength is lowered in some cases.
본 발명은 이러한 종래 기술의 실정을 감안하여 이루어진 것으로서, 내열성 및 투명성이 우수하고, 또한, 높은 접착력을 갖는 경화물이 얻어지는 경화성 조성물, 이 조성물을 경화시켜 이루어지는 경화물, 그리고, 상기 조성물을 광소자 고정재용 접착제 또는 광소자 고정재용 밀봉제로서 사용하는 방법을 제공하는 것을 과제로 한다.SUMMARY OF THE INVENTION The present invention has been made in view of the conventional state of the art, and an object of the present invention is to provide a curable composition which is excellent in heat resistance and transparency and which can obtain a cured product having a high adhesive force, a cured product obtained by curing the composition, And a method of using the same as a sealant for a fixing agent or an optical element fixing agent.
본 발명자들은 상기 과제를 해결하기 위하여 예의 연구를 거듭한 결과, (A) 특정의 실란 화합물 공중합체, (B) 이소시아누레이트 골격을 갖는 에폭시 화합물, (C) 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제, 그리고 (D) 산무수물 구조를 갖는 실란 커플링제를 함유하는 조성물의 경화물은, 장기에 걸쳐 우수한 투명성, 내열성을 유지하면서, 또한, 고온에 있어서도 높은 접착력을 갖는 경화물이 되는 것을 알아내어, 본 발명을 완성하기에 이르렀다. As a result of intensive studies to solve the above problems, the present inventors have found that (A) a specific silane compound copolymer, (B) an epoxy compound having an isocyanurate skeleton, (C) an alicyclic acid anhydride having a carboxyl group , And a silane coupling agent (D) having an acid anhydride structure, is a cured product having a high adhesive force even at a high temperature while maintaining excellent transparency and heat resistance over a long period of time The present invention has been accomplished on the basis of these findings.
이렇게 하여 본 발명의 제 1 에 의하면, 하기 [1] ∼ [9] 의 경화성 조성물이 제공된다. Thus, according to the first aspect of the present invention, there is provided a curable composition as described in the following [1] to [9].
[1] (A) 분자 내에, 하기 식 (i), (ii) 및 (iii)(I), (ii) and (iii) in the molecule,
[화학식 1][Chemical Formula 1]
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다.] : Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group for a hydroxyl group) Represents a single bond or a linking group. R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent.]
으로 나타내는 반복 단위 중, (i) 및 (ii), (i) 및 (iii), (ii) 및 (iii), 또는 (i), (ii) 및 (iii) 의 반복 단위를 갖고, 중량 평균 분자량이, 1,000 ∼ 30,000 인 실란 화합물 공중합체, (Ii), (i) and (iii), (ii) and (iii) or the repeating units (i), (ii) and (iii) A silane compound copolymer having a molecular weight of 1,000 to 30,000,
(B) 이소시아누레이트 골격을 갖는 에폭시 화합물, (B) an epoxy compound having an isocyanurate skeleton,
(C) 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제, 그리고 (C) a curing agent containing an alicyclic acid anhydride having a carboxyl group, and
(D) 산무수물 구조를 갖는 실란 커플링제 (D) Silane coupling agent having an acid anhydride structure
를 함유하는 경화성 조성물.≪ / RTI >
[2] 상기 (A) 의 실란 화합물 공중합체가, 식 : R1-CH(XO)-D- 로 나타내는 기의 존재량 ([R1-CH(XO)-D]) 과 R2 의 존재량 ([R2]) 의 몰비로, [R1-CH(XO)-D]:[R2] = 60:40 ∼ 5:95 의 실란 화합물 공중합체인 [1] 에 기재된 경화성 조성물. [2] The silane compound, a copolymer of the (A), formula: R 1 -CH (X O) existing amount ([R 1 -CH (X O ) -D]) of the group represented by R 2 and -D- Is a silane compound copolymer of [R 1 -CH (X O ) -D]: [R 2 ] = 60:40 to 5:95 at a molar ratio of the amount [R 2 ] .
[3] 상기 (A), (B), (C) 및 (D) 성분의 함유 비율이, (A) 와 [(B)+(C)+(D)] 의 질량비로, (A):[(B)+(C)+(D)] = 90:10 ∼ 50:50 인 것을 특징으로 하는 [1] 또는 [2] 에 기재된 경화성 조성물. [3] The positive electrode active material as described in any of [1] to [4], wherein the content ratio of the components (A), (B), (C) The curable composition according to (1) or (2), wherein [(B) + (C) + (D)] is 90:10 to 50:50.
[4] (A') 식 (1) : R1-CH(XO)-D-Si(OR3)p(X1)3-p (1): R 1 -CH (X O ) -D-Si (OR 3 ) p (X 1 ) 3-p
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. R3 은 탄소수 1 ∼ 6 의 알킬기를 나타내고, X1 은 할로겐 원자를 나타내고, p 는 0 ∼ 3 의 정수를 나타낸다.] : Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group for a hydroxyl group) Represents a single bond or a linking group. R 3 represents an alkyl group having 1 to 6 carbon atoms, X 1 represents a halogen atom, and p represents an integer of 0 to 3.
로 나타내는 실란 화합물 (1) 의 적어도 1 종, 및At least one silane compound (1) represented by the formula
식 (2) : R2Si(OR4)q(X2)3-q ???????? R 2 Si (OR 4 ) q (X 2 ) 3-q ?????
(식 중, R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, R4 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X2 는 할로겐 원자를 나타내고, q 는 0 ∼ 3 의 정수를 나타낸다) (Wherein R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent, R 4 represents an alkyl group having 1 to 6 carbon atoms, X 2 represents a halogen atom, and q represents an integer of 0 to 3 Lt; / RTI &
로 나타내는 실란 화합물 (2) 의 적어도 1 종을 함유하는 실란 화합물의 혼합물을 축합시켜 얻어지는 중량 평균 분자량이 1,000 ∼ 30,000 인 실란 화합물 공중합체, A silane compound copolymer having a weight average molecular weight of 1,000 to 30,000, obtained by condensing a mixture of silane compounds containing at least one kind of silane compound (2)
(B) 이소시아누레이트 골격을 갖는 에폭시 화합물, (B) an epoxy compound having an isocyanurate skeleton,
(C) 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제, 그리고 (C) a curing agent containing an alicyclic acid anhydride having a carboxyl group, and
(D) 산무수물 구조를 갖는 실란 커플링제 (D) Silane coupling agent having an acid anhydride structure
를 함유하는 경화성 조성물.≪ / RTI >
[5] 상기 (A') 의 실란 화합물 공중합체가, 실란 화합물 (1) 과 실란 화합물 (2) 를, 몰비로, [실란 화합물 (1)]:[실란 화합물 (2)] = 60:40 ∼ 5:95 의 비율로 축합시켜 얻어지는 것인 [4] 에 기재된 경화성 조성물. [5] A process for producing a silane coupling agent according to any one of [1] to [4], wherein the silane compound (A ') comprises a silane compound (1) and a silane compound (2) To 5:95. The curable composition according to < 4 >
[6] 상기 (A'), (B), (C) 및 (D) 성분의 함유 비율이, (A') 와 [(B)+(C)+(D)] 의 질량비로, (A'):[(B)+(C)+(D)] = 90:10 ∼ 50:50 인 것을 특징으로 하는 [4] 또는 [5] 에 기재된 경화성 조성물.[6] A method of producing a cement admixture, comprising the steps of: (A) mixing the components (A '), (B), (C) (B) + (C) + (D)] is 90:10 to 50:50. The curable composition according to [4] or [5]
[7] 상기 (B), (C) 및 (D) 성분의 함유 비율이, [(B)+(C)] 와 (D) 의 질량비로, [(B)+(C)]:(D) = 90:10 ∼ 10:90 인 것을 특징으로 하는 [1] 또는 [4] 에 기재된 경화성 조성물. (B) + (C)] :( D (B) + (C)) and (D) by the mass ratio of [ ) = 90:10 to 10:90. [3] The curable composition according to [1] or [4]
[8] 상기 (C) 의 경화제가 카르복실기를 갖는 지환식 산무수물 및 그 밖의 지환식 산무수물로부터 선택되는 1 종 또는 2 종 이상으로 이루어지고, 그 질량비가, (카르복실기를 갖는 지환식 산무수물):(그 밖의 지환식 산무수물) = 100:0 ∼ 10:90 인 [1] 또는 [4] 에 기재된 경화성 조성물. [8] The curing agent as described in the above (C), wherein the curing agent (C) is composed of one or more kinds selected from alicyclic acid anhydrides having a carboxyl group and other alicyclic acid anhydrides and whose mass ratio is (alicyclic acid anhydride having a carboxyl group) : (Other alicyclic acid anhydride) = 100: 0 to 10: 90.
[9] 광소자 고정재용 조성물인 [1] 또는 [4] 에 기재된 경화성 조성물.[9] The curable composition according to [1] or [4], which is a composition for an optical element fixing material.
본 발명의 제 2 에 의하면, 하기 [10], [11] 의 경화물이 제공된다. According to a second aspect of the present invention, there is provided a cured product of the following [10] and [11].
[10] [1] 또는 [4] 에 기재된 경화성 조성물을 경화시켜 이루어지는 경화물. [10] A cured product obtained by curing the curable composition according to [1] or [4].
[11] 광소자 고정재인 [10] 에 기재된 경화물.[11] A cured product according to [10], which is an optical element fixing material.
본 발명의 제 3 에 의하면, 하기 [12], [13] 의 본 발명의 경화성 조성물을 사용하는 방법이 제공된다. According to a third aspect of the present invention, there is provided a method of using the curable composition of the present invention of the following [12] or [13].
[12] [1] 또는 [4] 에 기재된 경화성 조성물을, 광소자 고정재용 접착제로서 사용하는 방법. [12] A method of using the curable composition according to [1] or [4] as an adhesive for an optical element fixing material.
[13] [1] 또는 [4] 에 기재된 경화성 조성물을, 광소자 고정재용 밀봉제로서 사용하는 방법.[13] A method of using the curable composition according to [1] or [4] as a sealing agent for an optical element fixing material.
본 발명의 경화성 조성물에 의하면, 고에너지의 광이 조사되는 경우나 고온 상태라도, 착색하여 투명성이 저하되거나 하는 경우가 없어, 장기에 걸쳐 우수한 투명성을 가지며, 또한, 고온에 있어서도 높은 접착력을 갖는 경화물을 얻을 수 있다. According to the curable composition of the present invention, even when a high-energy light is irradiated or in a high-temperature state, there is no case where the transparency is lowered due to coloring, and it has excellent transparency for a long period of time, Cargo can be obtained.
본 발명의 경화성 조성물은 광소자 고정재를 형성할 때에 사용할 수 있고, 특히, 광소자 고정재용 접착제, 및 광소자 고정재용 밀봉제로서 바람직하게 사용할 수 있다.The curable composition of the present invention can be used for forming an optical element fixing material, and can be preferably used as an optical element fixing agent and an optical element fixing agent.
이하, 본 발명을, 1) 경화성 조성물, 2) 경화물, 및, 3) 경화성 조성물의 사용 방법으로 항 분류하여 상세하게 설명한다. Hereinafter, the present invention will be described in detail in terms of 1) curing composition, 2) cured product, and 3) method of using the curing composition.
1) 경화성 조성물 1) Curable composition
본 발명의 경화성 조성물은, The curable composition of the present invention comprises
(A) 분자 내에, 하기 식 (i), (ii) 및 (iii)(I), (ii) and (iii) in the molecule (A)
[화학식 2](2)
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다.] : Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group for a hydroxyl group) Represents a single bond or a linking group. R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent.]
로 나타내는 반복 단위 중, (i) 및 (ii), (i) 및 (iii), (ii) 및 (iii), 또는 (i), (ii) 및 (iii) 의 반복 단위를 갖고, 중량 평균 분자량이, 1,000 ∼ 30,000 인 실란 화합물 공중합체, (B) 이소시아누레이트 골격을 갖는 에폭시 화합물, (C) 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제, 그리고 (D) 산무수물 구조를 갖는 실란 커플링제를 함유하는 것을 특징으로 한다. (I) and (ii), (i) and (iii), (ii) and (iii) or repeating units (i), (ii) and (iii) A silane compound copolymer having a molecular weight of 1,000 to 30,000, (B) an epoxy compound having an isocyanurate skeleton, (C) a curing agent containing an alicyclic acid anhydride having a carboxyl group, and (D) a silane compound having an acid anhydride structure And a coupling agent.
(A) 실란 화합물 공중합체 (A) a silane compound copolymer
본 발명의 경화성 조성물은, (A) 성분으로서 상기 식 (i), (ii) 및 (iii) 으로 나타내는 반복 단위 중, (i) 및 (ii), (i) 및 (iii), (ii) 및 (iii), 또는 (i), (ii) 및 (iii) 의 반복 단위를 갖고, 중량 평균 분자량이, 1,000 ∼ 30,000 인 실란 화합물 공중합체 (이하, 「실란 화합물 공중합체 (A)」라고 하는 경우가 있다) 를 함유한다. (I) and (ii), (i) and (iii) and (ii) of the repeating units represented by the above formulas (i), (ii) and (iii) And a silane compound copolymer having repeating units (i), (ii) and (iii) and having a weight average molecular weight of 1,000 to 30,000 (hereinafter referred to as "silane compound copolymer In some cases).
실란 화합물 공중합체 (A) 는, (i), (ii), (iii) 으로 나타내는 반복 단위를 각각 1 종 갖고 있어도 되고, 2 종 이상 갖고 있어도 된다.The silane compound copolymer (A) may have one kind of each of the repeating units (i), (ii) and (iii), or two or more kinds thereof.
식 (i) ∼ (iii) 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, 수소 원자가 바람직하다. In the formulas (i) to (iii), R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom.
R1 로 나타내는 탄소수 1 ∼ 6 의 알킬기로는, 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, t-부틸기, i-부틸기, s-부틸기, n-펜틸기, n-헥실기 등을 들 수 있다.Examples of the alkyl group having 1 to 6 carbon atoms represented by R 1 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a t-butyl group, N-hexyl group, and the like.
X0 은 불소 원자, 염소 원자, 브롬 원자, 요오드 원자 등의 할로겐 원자 ; 시아노기 ; 또는 식 : OG 로 나타내는 기 ; 를 나타낸다.X 0 is a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom; Cyano; Or a group represented by formula: OG; .
G 는 수산기의 보호기를 나타낸다. 수산기의 보호기로는, 특별히 제약되지 않고, 수산기의 보호기로서 알려져 있는 공지된 보호기를 들 수 있다. 예를 들어, 아실계 보호기 ; 트리메틸실릴기, 트리에틸실릴기, t-부틸디메틸실릴기, t-부틸디페닐실릴기 등의 실릴계 보호기 ; 메톡시메틸기, 메톡시에톡시메틸기, 1-에톡시에틸기, 테트라하이드로피란-2-일기, 테트라하이드로푸란-2-일기 등의 아세탈계 보호기 ; t-부톡시카르보닐기 등의 알콕시카르보닐계 보호기 ; 메틸기, 에틸기, t-부틸기, 옥틸기, 알릴기, 트리페닐메틸기, 벤질기, p-메톡시벤질기, 플루오레닐기, 트리틸기, 벤즈하이드릴기 등의 에테르계 보호기 ; 등을 들 수 있다. 이들 중에서도, G 로는, 아실계 보호기가 바람직하다.G represents a protecting group of a hydroxyl group. The protecting group for the hydroxyl group is not particularly limited and includes known protecting groups known as protecting groups for hydroxyl groups. For example, an acyl protecting group; Silyl protecting groups such as a trimethylsilyl group, a triethylsilyl group, a t-butyldimethylsilyl group, and a t-butyldiphenylsilyl group; Acetal-based protecting groups such as a methoxymethyl group, a methoxyethoxymethyl group, a 1-ethoxyethyl group, a tetrahydropyran-2-yl group, and a tetrahydrofuran-2-yl group; an alkoxycarbonyl group protecting group such as a t-butoxycarbonyl group; Ether-based protecting groups such as methyl, ethyl, t-butyl, octyl, allyl, triphenylmethyl, benzyl, p-methoxybenzyl, fluorenyl, trityl and benzhydryl groups; And the like. Of those, G is preferably an acyl group-protecting group.
아실계 보호기는, 구체적으로는, 식 : -C(=O)R5 로 나타내는 기이다. 식 중, R5 는 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, i-부틸기, s-부틸기, t-부틸기, n-펜틸기 등의 탄소수 1 ∼ 6 의 알킬기 ; 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다.The acyl group-protecting group is specifically a group represented by the formula -C (= O) R 5 . In the formula, R 5 represents an alkyl group having 1 to 6 carbon atoms such as methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i- An alkyl group; Or a phenyl group which may have a substituent.
R5 로 나타내는 치환기를 갖고 있어도 되는 페닐기의 치환기로는, 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, s-부틸기, i-부틸기, t-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기, i-옥틸기 등의 알킬기 ; 불소 원자, 염소 원자, 브롬 원자 등의 할로겐 원자 ; 메톡시기, 에톡시기 등의 알콕시기 ; 를 들 수 있다.Examples of the substituent of the phenyl group which may have a substituent represented by R 5 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an s- An alkyl group such as a pentyl group, an n-hexyl group, an n-heptyl group, an n-octyl group or an i-octyl group; Halogen atoms such as a fluorine atom, a chlorine atom and a bromine atom; An alkoxy group such as a methoxy group or an ethoxy group; .
이들 중에서도, X0 으로는, 입수 용이성, 및, 높은 접착력을 갖는 경화물이 얻어지는 점에서, 염소 원자, 식 : OG' 로 나타내는 기 (식 중, G' 는 아실계 보호기를 나타낸다), 및 시아노기로부터 선택되는 기가 바람직하고, 염소 원자, 아세톡시기 및 시아노기로부터 선택되는 기가 보다 바람직하고, 아세톡시기가 특히 바람직하다.Among them, X 0 is preferably a chlorine atom, a group represented by the formula: OG '(wherein G' represents an acyl group protecting group), and a group represented by the formula: OG ', from the viewpoint of obtaining a cured product having high availability and high adhesion. A group selected from nitrogen, nitrogen and the like is preferable, a group selected from a chlorine atom, an acetoxy group and a cyano group is more preferable, and an acetoxy group is particularly preferable.
D 는 단결합 또는 연결기를 나타낸다. D represents a single bond or a linking group.
연결기로는 치환기를 갖고 있어도 되는 2 가의 유기기를 들 수 있다. 당해 유기기의 탄소수는 1 ∼ 20 이 바람직하고, 1 ∼ 10 이 보다 바람직하다. The linking group includes a divalent organic group which may have a substituent. The number of carbon atoms of the organic group is preferably 1 to 20, more preferably 1 to 10.
치환기를 갖고 있어도 되는 2 가의 유기기로는, 예를 들어, 치환기를 갖고 있어도 되는 알킬렌기, 치환기를 갖고 있어도 되는 알케닐렌기, 치환기를 갖고 있어도 되는 알키닐렌기, 치환기를 갖고 있어도 되는 아릴렌기, 치환기를 갖고 있어도 되는 (알킬렌기, 알케닐렌기, 또는 알키닐렌기) 와 치환기를 갖고 있어도 되는 아릴렌기의 조합으로 이루어지는 2 가의 기 등을 들 수 있다.Examples of the divalent organic group which may have a substituent include an alkylene group which may have a substituent, an alkenylene group which may have a substituent, an alkynylene group which may have a substituent, an arylene group which may have a substituent, (Alkylene group, alkenylene group, or alkynylene group) which may have a substituent and an arylene group which may have a substituent, and the like.
치환기를 갖고 있어도 되는 알킬렌기의 알킬렌기로는, 메틸렌기, 에틸렌기, 프로필렌기, 트리메틸렌기, 테트라메틸렌기, 펜타메틸렌기, 헥사메틸렌기 등의 탄소수 1 ∼ 20, 바람직하게는 탄소수 1 ∼ 10 의 알킬렌기를 들 수 있다. Examples of the alkylene group of the alkylene group which may have a substituent include a methylene group, an ethylene group, a propylene group, a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group and the like having 1 to 20 carbon atoms, Alkylene group having 1 to 10 carbon atoms.
치환기를 갖고 있어도 되는 알케닐렌기의 알케닐렌기로는, 비닐렌기, 프로페닐렌기, 부테닐렌기, 펜테닐렌기 등의 탄소수 2 ∼ 20 의 알케닐렌기, 바람직하게는, 탄소수 2 ∼ 10 의 알케닐렌기를 들 수 있다. Examples of the alkenylene group of the alkenylene group which may have a substituent include an alkenylene group having 2 to 20 carbon atoms such as a vinylene group, a propenylene group, a butenylene group and a pentenylene group, preferably an alkenylene group having 2 to 10 carbon atoms .
치환기를 갖고 있어도 되는 알키닐렌기의 알키닐렌기로는, 에티닐렌기, 프로피닐렌기 등의 탄소수 2 ∼ 20 의 알키닐렌기, 바람직하게는 탄소수 2 ∼ 10 의 알키닐렌기를 들 수 있다. The alkynylene group of the alkynylene group which may have a substituent includes an alkynylene group having 2 to 20 carbon atoms such as an ethynylene group and a propynylene group, preferably an alkynylene group having 2 to 10 carbon atoms.
치환기를 갖고 있어도 되는 아릴렌기의 아릴렌기로는, o-페닐렌기, m-페닐렌기, p-페닐렌기, 2,6-나프틸렌기 등의 탄소수 6 ∼ 20 의 아릴렌기, 바람직하게는 탄소수 6 ∼ 10 의 아릴렌기를 들 수 있다.The arylene group of the arylene group which may have a substituent includes an arylene group having 6 to 20 carbon atoms such as an o-phenylene group, a m-phenylene group, a p-phenylene group and a 2,6-naphthylene group, And an arylene group having 1 to 10 carbon atoms.
상기 알킬렌기, 알케닐렌기, 및 알키닐렌기의 치환기로는, 불소 원자, 염소 원자 등의 할로겐 원자 ; 메톡시기, 에톡시기 등의 알콕시기 ; 메틸티오기, 에틸티오기 등의 알킬티오기 ; 메톡시카르보닐기, 에톡시카르보닐기 등의 알콕시카르보닐기 ; 등을 들 수 있다.Examples of the substituent of the alkylene group, alkenylene group, and alkynylene group include a halogen atom such as a fluorine atom and a chlorine atom; An alkoxy group such as a methoxy group or an ethoxy group; Alkylthio groups such as methylthio group and ethylthio group; An alkoxycarbonyl group such as a methoxycarbonyl group or an ethoxycarbonyl group; And the like.
상기 아릴렌기의 치환기로는, 시아노기 ; 니트로기 ; 불소 원자, 염소 원자, 브롬 원자 등의 할로겐 원자 ; 메틸기, 에틸기 등의 알킬기 ; 메톡시기, 에톡시기 등의 알콕시기 ; 메틸티오기, 에틸티오기 등의 알킬티오기 ; 등을 들 수 있다. Examples of the substituent of the arylene group include a cyano group; A nitro group; Halogen atoms such as a fluorine atom, a chlorine atom and a bromine atom; Alkyl groups such as methyl group and ethyl group; An alkoxy group such as a methoxy group or an ethoxy group; Alkylthio groups such as methylthio group and ethylthio group; And the like.
이들의 치환기는, 알킬렌기, 알케닐렌기, 알키닐렌기 및 아릴렌기 등의 기에 있어서 임의의 위치에 결합하고 있어도 되고, 동일 또는 상이하게 복수 개가 결합하고 있어도 된다.These substituents may be bonded at arbitrary positions in groups such as an alkylene group, an alkenylene group, an alkynylene group, and an arylene group, or they may be bonded to one another in the same or different manner.
치환기를 갖고 있어도 되는 (알킬렌기, 알케닐렌기, 또는 알키닐렌기) 와 치환기를 갖고 있어도 되는 아릴렌기의 조합으로 이루어지는 2 가의 기로는, 상기 치환기를 갖고 있어도 되는 (알킬렌기, 알케닐렌기, 또는 알키닐렌기) 의 적어도 1 종과, 상기 치환기를 갖고 있어도 되는 아릴렌기의 적어도 1 종이 직렬로 결합한 기를 들 수 있다. 구체적으로는, 하기 식으로 나타내는 기를 들 수 있다.The divalent group consisting of a combination of an alkylene group, an alkenylene group, or an alkynylene group which may have a substituent and an arylene group which may have a substituent includes an alkylene group, an alkenylene group, An alkynylene group), and a group in which at least one kind of an arylene group which may have the above-mentioned substituent is bonded in series. Specifically, a group represented by the following formula can be mentioned.
[화학식 3](3)
이들 중에서도, D 로는, 높은 접착력을 갖는 경화물이 얻어지는 점에서, 탄소수 1 ∼ 10 의 알킬렌기가 바람직하고, 탄소수 1 ∼ 6 의 알킬렌기가 보다 바람직하고, 메틸렌기 또는 에틸렌기가 특히 바람직하다.Of these, D is preferably an alkylene group of 1 to 10 carbon atoms, more preferably an alkylene group of 1 to 6 carbon atoms, particularly preferably a methylene group or an ethylene group because a cured product having a high adhesive strength can be obtained.
식 (i) ∼ (iii) 중, R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다. In the formulas (i) to (iii), R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent.
R2 로 나타내는 탄소수 1 ∼ 20 의 알킬기로는, 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, s-부틸기, i-부틸기, t-부틸기, n-펜틸기, n-헥실기, n-옥틸기, i-옥틸기, n-노닐기, n-데실기, n-도데실기 등을 들 수 있다.Examples of the alkyl group having 1 to 20 carbon atoms represented by R 2 include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an s- N-hexyl group, n-octyl group, i-octyl group, n-nonyl group, n-decyl group and n-dodecyl group.
R2 로 나타내는 치환기를 갖고 있어도 되는 페닐기의 치환기로는, 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, s-부틸기, i-부틸기, t-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기, i-옥틸기 등의 알킬기 ; 메톡시기, 에톡시기 등의 알콕시기 ; 불소 원자, 염소 원자 등의 할로겐 원자 등을 들 수 있다.Examples of the substituent of the phenyl group which may have a substituent represented by R 2 include methyl, ethyl, n-propyl, i-propyl, n-butyl, An alkyl group such as a pentyl group, an n-hexyl group, an n-heptyl group, an n-octyl group or an i-octyl group; An alkoxy group such as a methoxy group or an ethoxy group; Halogen atoms such as a fluorine atom and a chlorine atom, and the like.
R2 로 나타내는 치환기를 갖고 있어도 되는 페닐기의 구체예로는, 페닐기, 2-클로로페닐기, 4-메틸페닐기, 3-에틸페닐기, 2,4-디메틸페닐기, 2-메톡시페닐기 등을 들 수 있다.Specific examples of the phenyl group which may have a substituent represented by R 2 include a phenyl group, 2-chlorophenyl group, 4-methylphenyl group, 3-ethylphenyl group, 2,4-dimethylphenyl group and 2-methoxyphenyl group .
실란 화합물 공중합체 (A) 에 있어서는, 식 : R1-CH(XO)-D- 로 나타내는 기의 존재량 ([R1-CH(XO)-D]) 과 R2 의 존재량 ([R2]) 의 몰비가, [R1-CH(XO)-D]:[R2] = 60:40 ∼ 5:95 가 바람직하고, 50:50 ∼ 5:95 가 보다 바람직하고, 50:50 ∼ 10:90 이 특히 바람직하다. 이와 같은 범위 내임으로써, 투명성 및 접착성이 우수하고, 또한, 내열성이 우수한 경화물이 얻어진다. In the silane compound copolymer (A), the formula: R 1 -CH (X O) of the group represented by the amount present -D- ([R 1 -CH (X O) -D]) and the amount present in the R 2 ( the molar ratio of [R 2]), [R 1 -CH (X O) -D]: [R 2] = 60:40 ~ 5:95 is preferred, and 50: 50 ~ 5: 95 is more preferred, and Particularly preferred is 50:50 to 10:90. Within this range, a cured product excellent in transparency and adhesiveness and excellent in heat resistance can be obtained.
식 : R1-CH(XO)-D- 로 나타내는 기 및 R2 의 존재량은, 예를 들어, 실란 화합물 공중합체 (A) 의 NMR 스펙트럼을 측정하여 정량할 수 있다.The amount of the group represented by the formula: R 1 -CH (X O ) -D- and the amount of R 2 present can be quantified, for example, by measuring the NMR spectrum of the silane compound copolymer (A).
실란 화합물 공중합체 (A) 는 랜덤 공중합체, 블록 공중합체, 그래프트 공중합체, 교호 공중합체 등의 어느 공중합체이어도 되는데, 랜덤 공중합체가 특히 바람직하다.The silane compound copolymer (A) may be any copolymer such as a random copolymer, a block copolymer, a graft copolymer, and an alternating copolymer, and a random copolymer is particularly preferable.
실란 화합물 공중합체 (A) 의 중량 평균 분자량 (Mw) 은, 1,000 ∼ 30,000 의 범위이고, 바람직하게는 1,500 ∼ 6,000 의 범위이다. 당해 범위 내에 있음으로써, 조성물의 취급성이 우수하고, 또한, 접착성, 내열성이 우수한 경화물이 얻어진다. 중량 평균 분자량 (Mw) 은 예를 들어, 테트라하이드로푸란 (THF) 을 용매로 하는 겔·퍼미에이션·크로마토그래피 (GPC) 에 의한 표준 폴리스티렌 환산값으로서 구할 수 있다.The weight average molecular weight (Mw) of the silane compound copolymer (A) is in the range of 1,000 to 30,000, preferably 1,500 to 6,000. Within this range, a cured product excellent in handleability of the composition and excellent in adhesiveness and heat resistance can be obtained. The weight average molecular weight (Mw) can be determined, for example, as a standard polystyrene conversion value by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
실란 화합물 공중합체 (A) 의 분자량 분포 (Mw/Mn) 는, 특별히 제한되지 않지만, 통상적으로는 1.0 ∼ 3.0 바람직하게는 1.1 ∼ 2.0 의 범위이다. 당해 범위 내에 있음으로써, 접착성, 내열성이 우수한 경화물이 얻어진다.The molecular weight distribution (Mw / Mn) of the silane compound copolymer (A) is not particularly limited, but is usually in the range of 1.0 to 3.0, preferably 1.1 to 2.0. Within the range, a cured product having excellent adhesion and heat resistance can be obtained.
실란 화합물 공중합체 (A) 는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.The silane compound copolymer (A) may be used singly or in combination of two or more.
실란 화합물 공중합체 (A) 는 래더형 구조를 갖는 폴리실세스퀴옥산 화합물이다. The silane compound copolymer (A) is a polysilsesquioxane compound having a ladder structure.
실란 화합물 공중합체가 래더형 구조를 갖고 있는 것은, 예를 들어, 반응 생성물의 적외선 흡수 스펙트럼 측정, X 선 회절 측정, NMR 측정을 실시함으로써 확인할 수 있다.The fact that the silane compound copolymer has a ladder-like structure can be confirmed, for example, by measuring the infrared absorption spectrum of the reaction product, X-ray diffraction measurement, and NMR measurement.
본 발명의 경화성 조성물에 있어서는, 상기 (A) 성분이, In the curable composition of the present invention, the component (A)
(A') 식 (1) : R1-CH(XO)-D-Si(OR3)p(X1)3-p (A ') ???????? R 1 -CH (X O ) -D-Si (OR 3 ) p (X 1 ) 3-p ?????
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. R3 은 탄소수 1 ∼ 6 의 알킬기를 나타내고, X1 은 할로겐 원자를 나타내고, p 는 0 ∼ 3 의 정수를 나타낸다.] : Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group for a hydroxyl group) Represents a single bond or a linking group. R 3 represents an alkyl group having 1 to 6 carbon atoms, X 1 represents a halogen atom, and p represents an integer of 0 to 3.
로 나타내는 실란 화합물 (1) 의 적어도 1 종, 및 At least one silane compound (1) represented by the formula
식 (2) : R2Si(OR4)q(X2)3-q ???????? R 2 Si (OR 4 ) q (X 2 ) 3-q ?????
(식 중, R2 는, 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, R4 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X2 는 할로겐 원자를 나타내고, q 는 0 ∼ 3 의 정수를 나타낸다) (Wherein R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent, R 4 represents an alkyl group having 1 to 6 carbon atoms, X 2 represents a halogen atom, and q represents an integer of 0 to 3 Lt; / RTI >
로 나타내는 실란 화합물 (2) 의 적어도 1 종을 함유하는 실란 화합물의 혼합물을 축합시켜 얻어지는, 중량 평균 분자량이 1,000 ∼ 30,000 인 실란 화합물 공중합체 (이하, 「실란 화합물 공중합체 (A')」라고 하는 경우가 있다) 이어도 되고, 실란 화합물 공중합체 (A) 가 실란 화합물 공중합체 (A') 인 것이 바람직하다.Silane compound copolymer (A ') having a weight average molecular weight of 1,000 to 30,000, obtained by condensing a mixture of a silane compound containing at least one silane compound (2) represented by the following formula , And the silane compound copolymer (A) is preferably the silane compound copolymer (A ').
[실란 화합물 (1)][Silane compound (1)]
실란 화합물 (1) 은 식 (1) : R1-CH(XO)-D-Si(OR3)p(X1)3- p 로 나타내는 화합물이다. 실란 화합물 (1) 을 사용함으로써, 경화 후에 있어서도 투명성, 접착력이 양호한 실란 화합물 공중합체를 얻을 수 있다.The silane compound (1) is a compound represented by the formula (1): R 1 -CH (X O ) -D-Si (OR 3 ) p (X 1 ) 3- p . By using the silane compound (1), it is possible to obtain a silane compound copolymer having good transparency and adhesion even after curing.
식 (1) 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, 수소 원자가 바람직하다. 구체예로는, 실란 화합물 공중합체 (A) 에 있어서의 R1 로서 예시한 것을 들 수 있다. In the formula (1), R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, preferably a hydrogen atom. Specific examples include those exemplified as R 1 in the silane compound copolymer (A).
식 (1) 중, X0 은 불소 원자, 염소 원자, 브롬 원자, 요오드 원자 등의 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. X0 과 D 로 나타내는 것의 구체예로는, 각각, 실란 화합물 공중합체 (A) 에 있어서의 X0 과 D 로서 예시한 것을 들 수 있다.In the formula (1), X 0 represents a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, a cyano group or a group represented by the formula OG (wherein G represents a protecting group of a hydroxyl group) Represents a single bond or a linking group. Specific examples of what represented by X 0 and D are, respectively, those exemplified as X 0 and D of the silane compound copolymer (A).
R3 은 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, s-부틸기, i-부틸기, t-부틸기, n-펜틸기, n-헥실기 등의 탄소수 1 ∼ 6 의 알킬기를 나타낸다. R 3 represents an alkyl group having 1 to 6 carbon atoms such as methyl, ethyl, n-propyl, i-propyl, n-butyl, Lt; 6 >
X1 은 불소 원자, 염소 원자, 브롬 원자, 요오드 원자 등의 할로겐 원자를 나타낸다. X 1 represents a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
p 는 0 ∼ 3 의 정수를 나타낸다. p represents an integer of 0 to 3;
p 가 2 이상일 때, OR3 끼리는 동일하거나, 상이해도 된다. 또, (3-p) 가 2 이상일 때, X1 끼리는 동일하거나, 상이해도 된다.When p is 2 or more, the OR 3 s may be the same or different. When (3-p) is 2 or more, X 1s may be the same or different.
실란 화합물 (1) 의 구체예로는, 클로로메틸트리메톡시실란, 브로모메틸트리에톡시실란, 2-클로로에틸트리프로폭시실란, 2-브로모에틸트리부톡시실란, 3-클로로프로필트리메톡시실란, 3-클로로프로필트리에톡시실란, 3-클로로프로필트리프로폭시실란, 3-클로로프로필트리부톡시실란, 3-브로모프로필트리메톡시실란, 3-브로모프로필트리에톡시실란, 3-브로모프로필트리프로폭시실란, 3-브로모프로필트리부톡시실란, 3-플루오로프로필트리메톡시실란, 3-플루오로프로필트리에톡시실란, 3-플루오로프로필트리프로폭시실란, 3-플루오로프로필트리부톡시실란, 3-요오드프로필트리메톡시실란, 2-클로로에틸트리메톡시실란, 3-클로로프로필트리에톡시실란, 4-클로로부틸트리프로폭시실란, 5-클로로펜틸트리프로폭시실란, 2-클로로프로필트리메톡시실란, 3-클로로-3-아세틸프로필트리메톡시실란, 3-클로로-3-메톡시카르보닐프로필트리메톡시실란, o-(2-클로로에틸)페닐트리프로폭시실란, m-(2-클로로에틸)페닐트리메톡시실란, p-(2-클로로에틸)페닐트리에톡시실란, p-(2-플루오로에틸)페닐트리메톡시실란 등의, X0 이 할로겐 원자인 트리알콕시실란 화합물류 ; Specific examples of the silane compound (1) include chloromethyltrimethoxysilane, bromomethyltriethoxysilane, 2-chloroethyltripropoxysilane, 2-bromoethyltributoxysilane, 3-chloropropyltri 3-chloropropyltriethoxysilane, 3-chloropropyltriethoxysilane, 3-chloropropyltriethoxysilane, 3-bromopropyltrimethoxysilane, 3-chloropropyltriethoxysilane, , 3-bromopropyltripropoxysilane, 3-bromopropyltributoxysilane, 3-fluoropropyltrimethoxysilane, 3-fluoropropyltriethoxysilane, 3-fluoropropyltripropoxysilane Chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 4-chlorobutyltripropoxysilane, 5-chlorobutyltrimethoxysilane, 3-chloropropyltrimethoxysilane, Pentyltrifluoroxysilane, 2-chloropropyltrimethoxysilane, 3- (3-chloro-3-methoxycarbonylpropyltrimethoxysilane, o- (2-chloroethyl) phenyltripropoxysilane, m- (2-chloroethyl) phenyl Trialkoxysilane compounds wherein X 0 is a halogen atom, such as trimethoxysilane, p- (2-chloroethyl) phenyltriethoxysilane and p- (2-fluoroethyl) phenyltrimethoxysilane;
클로로메틸트리클로로실란, 브로모메틸브로모디메톡시실란, 2-클로로에틸디클로로메톡시실란, 2-브로모에틸디클로로에톡시실란, 3-클로로프로필트리클로로실란, 3-클로로프로필트리브로모실란, 3-클로로프로필디클로로메톡시실란, 3-클로로프로필디클로로에톡시실란, 3-클로로프로필클로로디메톡시실란, 3-클로로프로필클로로디에톡시실란, 3-브로모프로필디클로로에톡시실란, 3-브로모프로필트리브로모실란, 3-브로모프로필트리클로로실란, 3-브로모프로필클로로디메톡시실란, 3-플루오로프로필트리클로로실란, 3-플루오로프로필클로로디메톡시실란, 3-플루오로프로필디클로로메톡시실란, 3-플루오로프로필클로로디에톡시실란, 3-요오드프로필트리클로로실란, 4-클로로부틸클로로디에톡시실란, 3-클로로-n-부틸클로로디에톡시실란, 3-클로로-3-아세틸프로필디클로로에톡시실란, 3-클로로-3-메톡시카르보닐프로필트리브로모실란 등의, X0 이 할로겐 원자인 할로게노실란 화합물류 ; Chloromethyltrichlorosilane, 3-chloropropyltrichlorosilane, 3-chloropropyltrichlorosilane, 3-chloropropyltrichlorosilane, 3-chloropropyltrichlorosilane, 3-chloropropyltrichlorosilane, 3-chloropropyldichloroethoxysilane, 3-chloropropyldichloroethoxysilane, 3-chloropropyldichloroethoxysilane, 3-chloropropyldichloroethoxysilane, 3-chloropropyldichloroethoxysilane, 3- Propyl trichlorosilane, 3-fluoropropyl trichlorosilane, 3-fluoropropyl trichlorosilane, 3-fluoropropyl trichlorosilane, 3-fluoropropyl trichlorosilane, 3-chloropropyl dimethoxysilane, Chloro-n-butyl chlorodiethoxysilane, 3-chloro-3-acetic acid, 3-chlorobutylchlorodiethoxysilane, 3-chloropropyltriethoxysilane, 3- Halogeno silane compounds in which X 0 is a halogen atom, such as t-butyldichloroethoxy silane and 3-chloro-3-methoxycarbonylpropyltribromosilane;
시아노메틸트리메톡시실란, 시아노메틸트리에톡시실란, 1-시아노에틸트리메톡시실란, 2-시아노에틸트리메톡시실란, 2-시아노에틸트리에톡시실란, 2-시아노에틸트리프로폭시실란, 3-시아노프로필트리메톡시실란, 3-시아노프로필트리에톡시실란, 3-시아노프로필트리프로폭시실란, 3-시아노프로필트리부톡시실란, 4-시아노부틸트리메톡시실란, 5-시아노펜틸트리메톡시실란, 2-시아노프로필트리메톡시실란, 2-(시아노메톡시)에틸트리메톡시실란, 2-(2-시아노에톡시)에틸트리메톡시실란, o-(시아노메틸)페닐트리프로폭시실란, m-(시아노메틸)페닐트리메톡시실란, p-(시아노메틸)페닐트리에톡시실란, p-(2-시아노에틸)페닐트리메톡시실란 등의, X0 이 시아노기인 트리알콕시실란 화합물류 ; Cyanomethyltrimethoxysilane, cyanomethyltriethoxysilane, 1-cyanoethyltrimethoxysilane, 2-cyanoethyltrimethoxysilane, 2-cyanoethyltriethoxysilane, 2-cyano Cyanopropyltriethoxysilane, 3-cyanopropyltriethoxysilane, 3-cyanopropyltriethoxysilane, 3-cyanopropyltrimethoxysilane, 3-cyanopropyltriethoxysilane, 3- 2-cyanopentyltrimethoxysilane, 2-cyanopropyltrimethoxysilane, 2- (cyanomethoxy) ethyltrimethoxysilane, 2- (2-cyanoethoxy) ethyl tri (Cyanomethyl) phenyltriethoxysilane, p- (2-cyano) phenyltriethoxysilane, m- (cyanomethyl) phenyltrimethoxysilane, p- Ethyl) phenyltrimethoxysilane; trialkoxysilane compounds wherein X 0 is a cyano group;
시아노메틸트리클로로실란, 시아노메틸브로모디메톡시실란, 2-시아노에틸디클로로메톡시실란, 2-시아노에틸디클로로에톡시실란, 3-시아노프로필트리클로로실란, 3-시아노프로필트리브로모실란, 3-시아노프로필디클로로메톡시실란, 3-시아노프로필디클로로에톡시실란, 3-시아노프로필클로로디메톡시실란, 3-시아노프로필클로로디에톡시실란, 4-시아노부틸클로로디에톡시실란, 3-시아노-n-부틸클로로디에톡시실란, 2-(2-시아노에톡시)에틸트리클로로실란, 2-(2-시아노에톡시)에틸브로모디에톡시실란, 2-(2-시아노에톡시)에틸디클로로프로폭시실란, o-(2-시아노에틸)페닐트리클로로실란, m-(2-시아노에틸)페닐메톡시디브로모실란, p-(2-시아노에틸)페닐디메톡시클로로실란, p-(2-시아노에틸)페닐트리브로모실란 등의, X0 이 시아노기인 할로게노실란 화합물류 ; Cyanomethyl trichlorosilane, cyanomethyl bromodimethoxysilane, 2-cyanoethyl dichloromethoxysilane, 2-cyanoethyl dichloroethoxysilane, 3-cyanopropyl trichlorosilane, 3-cyanopropyl 3-cyanopropyldichloroethoxysilane, 3-cyanopropylpropylchlorodimethoxysilane, 3-cyanopropylchlorodiethoxysilane, 4-cyanobutylchloro 2- (2-cyanoethoxy) ethyl bromodiethoxy silane, 2 (2-cyanoethoxy) ethyl trichlorosilane, 2-cyanoethoxy silane, - (2-cyanoethoxy) ethyldichloropropoxy silane, o- (2-cyanoethyl) phenyl trichlorosilane, m- (2- cyanoethyl) phenylmethoxy dibromosilane, p- Halogeno silane compounds in which X 0 is a cyano group, such as p- (2-cyanoethyl) phenyldimethoxychlorosilane and p- (2-cyanoethyl) ;
3-아세톡시프로필트리메톡시실란, 3-아세톡시프로필트리에톡시실란, 3-아세톡시프로필트리프로폭시실란, 3-아세톡시프로필트리부톡시실란, 3-프로피오닐옥시프로필트리메톡시실란, 3-프로피오닐옥시프로필트리에톡시실란, 3-벤조일옥시프로필트리메톡시실란, 3-벤조일옥시프로필트리에톡시실란, 3-벤조일옥시프로필트리프로폭시실란, 3-벤조일옥시프로필트리부톡시실란, 2-트리메틸실릴옥시에틸트리메톡시실란, 3-트리에틸실릴옥시프로필트리에톡시실란, 3-(2-테트라하이드로피라닐옥시)프로필트리프로폭시실란, 3-(2-테트라하이드로푸라닐옥시)프로필트리부톡시실란, 3-메톡시메틸옥시프로필트리메톡시실란, 3-메톡시에톡시메틸옥시프로필트리에톡시실란, 3-(1-에톡시에틸옥시)프로필트리프로폭시실란, 3-(t-부톡시카르보닐옥시)프로필트리메톡시실란, 3-t-부톡시프로필트리메톡시실란, 3-벤질옥시프로필트리에톡시실란, 3-트리페닐메톡시프로필트리에톡시실란 등의, X0 이 상기 식 : OG 로 나타내는 기인 트리알콕시실란 화합물류 ; 3-acetoxypropyltrimethoxysilane, 3-acetoxypropyltriethoxysilane, 3-acetoxypropyltriethoxysilane, 3-acetoxypropyltriethoxysilane, 3-acetoxypropyltriethoxysilane, 3- , 3-propionyloxypropyltriethoxysilane, 3-benzoyloxypropyltrimethoxysilane, 3-benzoyloxypropyltriethoxysilane, 3-benzoyloxypropyltripropoxysilane, 3-benzoyloxypropyltributoxy (2-tetrahydropyranyloxy) propyltripropoxysilane, 3- (2-tetrahydropyranyloxy) silane, 2-trimethylsilyloxyethyltrimethoxysilane, 3-triethylsilyloxypropyltriethoxysilane, 3- 3-methoxymethyloxypropyltrimethoxysilane, 3-methoxyethoxymethyloxypropyltriethoxysilane, 3- (1-ethoxyethyloxy) propyltripropoxysilane , 3- (t-butoxycarbonyloxy) propyltrimethoxy Is, 3-t- butoxy-trimethoxysilane, 3-benzyloxy, such as the profile triethoxysilane, 3-triphenyl methoxy-ethoxy propyl triethoxysilane, X 0 is the formula: trialkoxy group represented by OG Silane compounds;
3-아세톡시프로필트리클로로실란, 3-아세톡시프로필트리브로모실란, 3-아세톡시프로필디클로로메톡시실란, 3-아세톡시프로필디클로로에톡시실란, 3-아세톡시프로필클로로디메톡시실란, 3-아세톡시프로필클로로디에톡시실란, 3-벤조일옥시프로필트리클로로실란, 3-트리메틸실릴옥시프로필클로로디메톡시실란, 3-트리에틸실릴옥시프로필디클로로메톡시실란, 3-(2-테트라하이드로피라닐옥시)프로필클로로디에톡시실란, 3-(2-테트라하이드로푸라닐옥시)프로필디클로로에톡시실란, 3-메톡시메틸옥시프로필트리브로모실란, 3-메톡시에톡시메틸옥시프로필트리클로로실란, 3-(1-에톡시에틸옥시)프로필클로로디메톡시실란, 3-t-부톡시카르보닐옥시프로필디클로로메톡시실란, 3-t-부톡시프로필클로로디에톡시실란, 3-트리페닐메톡시프로필디클로로에톡시실란, 3-벤질옥시프로필트리브로모실란 등의, X0 이 상기 식 : OG 로 나타내는 기인 할로게노실란 화합물류 ; 등을 들 수 있다. Acetoxypropyltrichlorosilane, 3-acetoxypropyltrichlorosilane, 3-acetoxypropyltrichlorosilane, 3-acetoxypropyltrichlorosilane, 3-acetoxypropyltrichlorosilane, 3-acetoxypropyltrichlorosilane, 3- 3-trimethylsilyloxypropylchlorodimethoxysilane, 3-triethylsilyloxypropyldichloromethoxysilane, 3- (2-tetrahydropyranyloxy) -2-methylpropyltrimethoxysilane, 3- ) Propyl chlorodiethoxysilane, 3- (2-tetrahydrofuranyloxy) propyldichloroethoxysilane, 3-methoxymethyloxypropyltribromosilane, 3-methoxyethoxymethyloxypropyltrichlorosilane, 3- Butoxycarbonyloxypropyldichlorosilane, 3-t-butoxypropylchlorodiethoxysilane, 3-tributylmethoxypropyldichloroethane, 3-t-butoxycarbonyloxypropyldichloromethoxysilane, 3- Gt; , 3-benzyloxypropyltribromosilane, halogeno silane compounds wherein X 0 is a group represented by the formula: OG; And the like.
이들의 실란 화합물 (1) 은 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.These silane compounds (1) may be used singly or in combination of two or more.
이들 중에서도, 실란 화합물 (1) 로는, 보다 우수한 접착성을 갖는 경화물이 얻어지는 점에서, X0 이 할로겐 원자인 트리알콕시실란 화합물류, X0 이 시아노기인 트리알콕시실란 화합물류, 또는 X0 이 상기 식 : OG 로 나타내는 기인 트리알콕시실란 화합물류가 바람직하고, 3-클로로프로필기를 갖는 트리알콕시실란 화합물류, 3-아세톡시프로필기를 갖는 트리알콕시실란 화합물류, 2-시아노에틸기를 갖는 트리알콕시실란 화합물류, 또는 3-시아노프로필기를 갖는 트리알콕시실란 화합물류가 보다 바람직하다.Among them, as the silane compound (1), trialkoxysilane compounds wherein X 0 is a halogen atom, trialkoxysilane compounds wherein X 0 is a cyano group, or compounds represented by X 0 Is preferably a trialkoxysilane compound having a 3-chloropropyl group, a trialkoxysilane compound having a 3-acetoxypropyl group, a trialkoxysilane compound having a 2-cyanoethyl group Alkoxysilane compounds, or trialkoxysilane compounds having a 3-cyanopropyl group are more preferable.
[실란 화합물 (2)] [Silane compound (2)]
실란 화합물 (2) 는, 식 (2) : R2Si(OR4)q(X2)3- q 로 나타내는 화합물이다. The silane compound (2) is a compound represented by the formula (2): R 2 Si (OR 4 ) q (X 2 ) 3- q .
식 (2) 중, R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다. 구체예로는, 실란 화합물 공중합체 (A) 에 있어서의 R2 로서 예시한 것을 들 수 있다.In the formula (2), R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent. Specific examples include those exemplified as R 2 in the silane compound copolymer (A).
R4 는 상기 R3 과 동일한 탄소수 1 ∼ 6 의 알킬기를 나타낸다. R 4 represents an alkyl group having 1 to 6 carbon atoms which is the same as R 3 above.
X2 는, 상기 X1 과 동일한 할로겐 원자를 나타낸다. X 2 represents the same halogen atom as X 1 .
q 는 0 ∼ 3 중 어느 정수를 나타낸다. q represents any integer of 0 to 3;
q 가 2 이상일 때, OR4 끼리는 동일하거나, 상이해도 된다. 또, (3-q) 가 2 이상일 때, X2 끼리는 동일하거나, 상이해도 된다.When q is 2 or more, the OR 4 s may be the same or different. When (3-q) is 2 or more, X 2 may be the same or different.
실란 화합물 (2) 의 구체예로는, 메틸트리메톡시실란, 메틸트리에톡시실란, 에틸트리메톡시실란, 에틸트리에톡시실란, n-프로필트리메톡시실란, n-부틸트리에톡시실란, i-부틸트리메톡시실란, n-펜틸트리에톡시실란, n-헥실트리메톡시실란, i-옥틸트리에톡시실란, 도데실트리메톡시실란, 메틸디메톡시에톡시실란, 메틸디에톡시메톡시실란 등의 알킬트리알콕시실란 화합물류 ; Specific examples of the silane compound (2) include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-butyltriethoxysilane butyltrimethoxysilane, n-pentyltriethoxysilane, n-hexyltrimethoxysilane, i-octyltriethoxysilane, dodecyltrimethoxysilane, methyldimethoxyethoxysilane, methyldiethoxy Alkyltrialkoxysilane compounds such as methoxysilane;
메틸클로로디메톡시실란, 메틸디클로로메톡시실란, 메틸클로로디에톡시실란, 에틸클로로디메톡시실란, 에틸디클로로메톡시실란, n-프로필클로로디메톡시실란, n-프로필디클로로메톡시실란 등의 알킬할로게노알콕시실란 화합물류 ; Alkyl halides such as methyl chlorodymethoxysilane, methyl dichloromethoxysilane, methyl chlorodiethoxysilane, ethyl chlorodymethoxysilane, ethyl dichloromethoxysilane, n-propyl chlorodymethoxysilane, n-propyldichloromethoxysilane, Geno alkoxy silane compounds;
메틸트리클로로실란, 메틸트리브로모실란, 에틸트리클로로실란, 에틸트리브로모실란, n-프로필트리클로로실란 등의 알킬트리할로게노실란 화합물류 ; Alkyltrihalogenosilane compounds such as methyltrichlorosilane, methyltribromosilane, ethyltrichlorosilane, ethyltribromosilane and n-propyltrichlorosilane;
페닐트리메톡시실란, 4-메톡시페닐트리메톡시실란, 2-클로로페닐트리메톡시실란, 페닐트리에톡시실란, 2-메톡시페닐트리에톡시실란, 페닐디메톡시에톡시실란, 페닐디에톡시메톡시실란 등의 치환기를 갖고 있어도 되는 페닐트리알콕시실란 화합물류 ; Phenyltrimethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, phenyldimethoxyethoxysilane, Phenyltrialkoxysilane compounds which may have a substituent such as methoxymethoxysilane;
페닐클로로디메톡시실란, 페닐디클로로메톡시실란, 페닐클로로메톡시에톡시실란, 페닐클로로디에톡시실란, 페닐디클로로에톡시실란 등의 치환기를 갖고 있어도 되는 페닐할로게노알콕시실란 화합물류 ; Phenylhalogenoalkoxysilane compounds which may have a substituent such as phenylchlorodimethoxysilane, phenyldichloromethoxysilane, phenylchloromethoxyethoxysilane, phenylchlorodiethoxysilane, and phenyldichloroethoxysilane;
페닐트리클로로실란, 페닐트리브로모실란, 4-메톡시페닐트리클로로실란, 2-클로로페닐트리클로로실란, 2-에톡시페닐트리클로로실란 등의 치환기를 갖고 있어도 되는 페닐트리할로게노실란 화합물 ; 을 들 수 있다. A phenyltrihalogenosilane compound which may have a substituent such as phenyltrichlorosilane, phenyltribromosilane, 4-methoxyphenyltrichlorosilane, 2-chlorophenyltrichlorosilane or 2-ethoxyphenyltrichlorosilane; .
이들의 실란 화합물 (2) 는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.These silane compounds (2) may be used singly or in combination of two or more.
[실란 화합물의 혼합물] [Mixture of silane compounds]
실란 화합물 공중합체 (A') 를 제조할 때에 사용되는 실란 화합물의 혼합물로는, 실란 화합물 (1) 및 실란 화합물 (2) 로 이루어지는 혼합물이어도 되고, 또한 본 발명의 목적을 저해하지 않는 범위에서 그 밖의 실란 화합물을 함유하는 혼합물이어도 되는데, 실란 화합물 (1) 및 실란 화합물 (2) 로 이루어지는 혼합물이 바람직하다.The mixture of the silane compound used in producing the silane compound copolymer (A ') may be a mixture of the silane compound (1) and the silane compound (2), and may be a mixture of the silane compound A mixture containing the silane compound (1) and the silane compound (2) is preferable.
실란 화합물 (1) 과 실란 화합물 (2) 의 사용 비율은, 몰비로, [실란 화합물 (1)]:[실란 화합물 (2)] = 60:40 ∼ 5:95 의 비율인 것이 바람직하고, 50:50 ∼ 5:95 인 것이 보다 바람직하고, 50:50 ∼ 10:90 인 것이 특히 바람직하다.The ratio of [silane compound (1)]: [silane compound (2)] = 60: 40 to 5:95 in terms of the molar ratio of the silane compound (1) to the silane compound (2) : 50 to 5:95, and particularly preferably 50:50 to 10:90.
상기 실란 화합물의 혼합물을 축합시키는 방법으로는, 특별히 제한되지 않지만, 실란 화합물 (1), 실란 화합물 (2), 및 원하는 바에 따라 그 밖의 실란 화합물을 용매에 용해시키고, 소정량의 촉매를 첨가하여, 소정 온도에서 교반하는 방법을 들 수 있다.The method of condensing the silane compound mixture is not particularly limited, but a silane compound (1), a silane compound (2) and other silane compounds as required are dissolved in a solvent, and a predetermined amount of a catalyst is added , And stirring at a predetermined temperature.
사용하는 촉매는, 산 촉매 및 염기 촉매 중 어느 것이어도 된다. The catalyst to be used may be either an acid catalyst or a base catalyst.
산 촉매로는 염산, 황산, 질산, 인산 등의 무기산 ; 메탄술폰산, 트리플루오로메탄술폰산, 벤젠술폰산, p-톨루엔술폰산, 아세트산, 트리플루오로아세트산 등의 유기산 ; 등을 들 수 있다.Examples of the acid catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid; Organic acids such as methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, acetic acid, and trifluoroacetic acid; And the like.
염기 촉매로는, 트리메틸아민, 트리에틸아민, 리튬디이소프로필아미드, 리튬비스(트리메틸실릴)아미드, 피리딘, 1,8-디아자비시클로[5.4.0]-7-운데센, 아닐린, 피콜린, 1,4-디아자비시클로[2.2.2]옥탄, 이미다졸 등의 유기염기 ; 수산화테트라메틸암모늄, 수산화테트라에틸암모늄 등의 유기염 수산화물 ; 나트륨메톡사이드, 나트륨에톡사이드, 나트륨t-부톡사이드, 칼륨t-부톡사이드 등의 금속 알코올레이트 ; 수소화나트륨, 수소화칼슘 등의 금속 수소화물 ; 수산화나트륨, 수산화칼륨, 수산화칼슘 등의 금속 수산화물 ; 탄산나트륨, 탄산칼륨, 탄산마그네슘 등의 금속 탄산염 ; 탄산수소나트륨, 탄산수소칼륨 등의 금속 탄산수소염 ; 등을 들 수 있다.Examples of the base catalyst include trimethylamine, triethylamine, lithium diisopropylamide, lithium bis (trimethylsilyl) amide, pyridine, 1,8-diazabicyclo [5.4.0] -7- undecene, aniline, , 1,4-diazabicyclo [2.2.2] octane, imidazole and the like; Organic salt hydroxides such as tetramethylammonium hydroxide and tetraethylammonium hydroxide; Metal alcoholates such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide; Metal hydrides such as sodium hydride and calcium hydride; Metal hydroxides such as sodium hydroxide, potassium hydroxide and calcium hydroxide; Metal carbonates such as sodium carbonate, potassium carbonate, and magnesium carbonate; Metal hydrogencarbonates such as sodium hydrogencarbonate and potassium hydrogencarbonate; And the like.
이들 중에서도, 사용하는 촉매로는, 산 촉매가 바람직하고, 무기산이 보다 바람직하다.Among these, as the catalyst to be used, an acid catalyst is preferable, and an inorganic acid is more preferable.
촉매의 사용량은 실란 화합물의 총 몰량에 대해, 통상적으로, 0.1 ㏖% ∼ 10 ㏖%, 바람직하게는 1 ㏖% ∼ 5 ㏖% 의 범위이다.The amount of the catalyst to be used is usually in the range of 0.1 mol% to 10 mol%, preferably 1 mol% to 5 mol%, based on the total molar amount of the silane compound.
사용하는 용매는 실란 화합물의 종류 등에 따라, 적절히 선택할 수 있다. 예를 들어, 물 ; 벤젠, 톨루엔, 자일렌 등의 방향족 탄화수소류 ; 아세트산메틸, 아세트산에틸, 아세트산프로필, 프로피온산메틸 등의 에스테르류 ; 아세톤, 메틸에틸케톤, 메틸i-부틸케톤, 시클로헥사논 등의 케톤류 ; 메틸알코올, 에틸알코올, n-프로필알코올, i-프로필알코올, n-부틸알코올, i-부틸알코올, s-부틸알코올, t-부틸알코올 등의 알코올류 ; 등을 들 수 있다. 이들의 용매는 1 종 단독으로, 또는 2 종 이상을 혼합하여 사용할 수 있다.The solvent to be used may be appropriately selected depending on the kind of the silane compound and the like. For example, water; Aromatic hydrocarbons such as benzene, toluene and xylene; Esters such as methyl acetate, ethyl acetate, propyl acetate and methyl propionate; Ketones such as acetone, methyl ethyl ketone, methyl i-butyl ketone, and cyclohexanone; Alcohols such as methyl alcohol, ethyl alcohol, n-propyl alcohol, i-propyl alcohol, n-butyl alcohol, i-butyl alcohol, s-butyl alcohol and t-butyl alcohol; And the like. These solvents may be used alone or in combination of two or more.
이들 중에서도, 물, 방향족 탄화수소류, 및 이들의 혼합 용매가 바람직하고, 물과 톨루엔의 혼합 용매가 특히 바람직하다. 물과 톨루엔을 사용하는 경우, 물과 톨루엔의 비율 (용적비) 은, 바람직하게는 1:9 ∼ 9:1, 보다 바람직하게는 7:3 ∼ 3:7 이다.Among them, water, aromatic hydrocarbons and mixed solvents thereof are preferable, and mixed solvents of water and toluene are particularly preferable. When water and toluene are used, the ratio of water to toluene (volume ratio) is preferably 1: 9 to 9: 1, more preferably 7: 3 to 3: 7.
용매의 사용량은 용매 1 리터당, 실란 화합물의 총 몰량이, 통상적으로는 0.1 ㏖ ∼ 10 ㏖, 바람직하게는 0.5 ㏖ ∼ 10 ㏖ 이 되는 양이다.The amount of the solvent to be used is such that the total molar amount of the silane compound per liter of the solvent is usually 0.1 to 10 mol, preferably 0.5 to 10 mol.
실란 화합물을 축합 (반응) 시킬 때의 온도는, 통상적으로는 0 ℃ 에서부터 사용하는 용매의 비점까지의 온도 범위, 바람직하게는 20 ℃ ∼ 100 ℃ 의 범위이다. 반응 온도가 지나치게 낮으면 축합 반응의 진행이 불충분해지는 경우가 있다. 한편, 반응 온도가 지나치게 높아지면 겔화 억제가 곤란해진다. 반응은, 통상적으로는 30 분 내지 20 시간으로 완결된다.The temperature at which the silane compound is condensed (reacted) is usually from 0 占 폚 to the boiling point of the solvent used, preferably from 20 占 폚 to 100 占 폚. If the reaction temperature is too low, the progress of the condensation reaction may become insufficient. On the other hand, if the reaction temperature is excessively high, it becomes difficult to suppress gelation. The reaction is usually completed in 30 minutes to 20 hours.
반응 종료 후에는, 산 촉매를 사용한 경우에는, 반응 용액에 탄산수소나트륨 수용액 등의 알칼리 수용액을 첨가함으로써, 염기 촉매를 사용한 경우에는, 반응 용액에 염산 등의 산을 첨가함으로써 중화를 실시하고, 그 때에 발생하는 염을 여과 분리 또는 수세 등에 의해 제거하여, 목적으로 하는 실란 화합물 공중합체를 얻을 수 있다.After the completion of the reaction, when an acid catalyst is used, an alkaline aqueous solution such as an aqueous solution of sodium hydrogencarbonate is added to the reaction solution. When a base catalyst is used, neutralization is performed by adding an acid such as hydrochloric acid to the reaction solution, Is removed by filtration or washing with water or the like to obtain a desired silane compound copolymer.
(B) 이소시아누레이트 골격을 갖는 에폭시 화합물(B) an epoxy compound having an isocyanurate skeleton
본 발명의 경화성 조성물은 (B) 성분으로서 이소시아누레이트 골격을 갖는 에폭시 화합물 (이하, 「에폭시 화합물 (B)」라고 하는 경우가 있다) 을 함유한다. The curable composition of the present invention contains an epoxy compound having an isocyanurate skeleton (hereinafter sometimes referred to as "epoxy compound (B)") as the component (B).
본 발명의 경화성 조성물은 에폭시 화합물 (B) 를 함유하기 때문에 열이력 후에 있어서도, 내열성, 투명성이 우수한 경화물을 얻을 수 있다.Since the curable composition of the present invention contains the epoxy compound (B), a cured product excellent in heat resistance and transparency can be obtained even after the thermal history.
에폭시 화합물 (B) 로는, 분자 내에, 이소시아누레이트 골격 (하기 (c), 식 중, - 은 결합손을 나타낸다) 및 에폭시 고리를 갖는 화합물이면 특별히 제약되지는 않는다. 또한, 이소시아누레이트 골격 (c) 에는, 하기에 나타내는 바와 같은 호변이성체 (시아누레이트 골격 (c'), 식 중, - 은 결합손을 나타낸다) 가 존재할 수 있지만, 이 골격을 갖는 에폭시 화합물도, 본 발명에 사용하는 에폭시 화합물 (B) 에 함유되는 것으로 한다.The epoxy compound (B) is not particularly limited as far as it is a compound having an isocyanurate skeleton (the following (c), in the formula, - represents a bonding hand) and an epoxy ring in the molecule. In the isocyanurate skeleton (c), there may be a tautomer as shown below (cyanurate skeleton (c '), in the formula, - indicates a binding partner), but an epoxy compound having this skeleton Is also contained in the epoxy compound (B) used in the present invention.
[화학식 4][Chemical Formula 4]
그 중에서도, 에폭시 화합물 (B) 로는, 하기 식 (c-1) ∼ (c-3) 에 나타내는 바와 같이, 이소시아누레이트 고리의 1, 3, 5 위치의 질소 원자에 결합하는 수소 원자의 적어도 하나를, 에폭시 고리를 갖는 기 (E) 로 치환한 화합물이 바람직하다.Among them, the epoxy compound (B) is preferably at least one of hydrogen atoms bonded to nitrogen atoms at positions 1, 3 and 5 of the isocyanurate ring, as shown in the following formulas (c-1) to (E) having an epoxy ring are preferable.
[화학식 5][Chemical Formula 5]
(상기 식 중, E 는 에폭시 고리를 갖는 기를 나타내고, R 은 수소 원자, 유기기 등의 에폭시 고리를 갖는 기 이외의 임의의 기를 나타낸다) (Wherein E represents a group having an epoxy ring and R represents any group other than a group having an epoxy ring such as a hydrogen atom or an organic group)
상기 에폭시 고리를 갖는 기 (E) 로는, 예를 들어, 하기 식As the group (E) having the epoxy ring, for example,
[화학식 6][Chemical Formula 6]
(식 중, a, b, c 는 각각 1 ∼ 20 의 정수를 나타내고, 메틸렌기로는, 메틸기, 에틸기 등의 알킬기가 치환되어 있어도 된다) 로 나타내는 기를 들 수 있다.(Wherein a, b, and c each represent an integer of 1 to 20, and the methylene group may be substituted with an alkyl group such as a methyl group or an ethyl group).
에폭시 화합물 (B) 의 구체예로는, 높은 접착력을 갖는 경화물이 얻어지는 관점에서, 글리시딜이소시아누레이트, 디글리시딜이소시아누레이트, 트리스(2,3-에폭시프로필)이소시아누레이트, 트리스(글리시독시프로필)이소시아누레이트, 트리스(α-메틸글리시딜)이소시아누레이트, 및 이들의 화합물의 2 종 이상을 함유하는 혼합물 등을 들 수 있다.As specific examples of the epoxy compound (B), glycidyl isocyanurate, diglycidyl isocyanurate, tris (2,3-epoxypropyl) iso And a mixture containing two or more of these compounds, and the like can be given as examples of the above-mentioned monomers. These monomers may be used alone or in combination of two or more.
또, 에폭시 화합물 (B) 로는, 이소시아누레이트 골격을 갖는 에폭시 화합물로서 시판되고 있는 것 (예를 들어, 상품명 : TEPIC-S, TEPIC-PAS B22, 상품명 : TEPIC-PAS B26 등, 모두 닛산 화학 공업사 제조) 를 그대로 사용할 수도 있다.Examples of the epoxy compound (B) include commercially available epoxy compounds having an isocyanurate skeleton (for example, TEPIC-S, TEPIC-PAS B22, TEPIC-PAS B26, Ltd.) may be used as it is.
에폭시 화합물 (B) 의 배합량은 특별히 한정되지 않지만, 보다 높은 접착력을 갖는 경화물이 얻어지는 관점에서, 에폭시 당량으로서 50 ∼ 300 g/eq 가 바람직하고, 100 ∼ 200 g/eq 가 특히 바람직하다. 또한, 에폭시 당량은 JIS K 7236 : 2001 에 준하여 측정되는 값이다.The compounding amount of the epoxy compound (B) is not particularly limited, but is preferably 50 to 300 g / eq, more preferably 100 to 200 g / eq, in view of obtaining a cured product having a higher adhesive strength. The epoxy equivalent is a value measured in accordance with JIS K 7236: 2001.
(C) 경화제 (C) Curing agent
본 발명의 경화성 조성물은 (C) 성분으로서, 카르복실기를 갖는 지환식 산무수물을 함유하는 경화제 (이하, 「경화제 (C)」라고 하는 경우가 있다) 를 함유한다. 본 발명의 경화성 조성물은, 경화제 (C) 를 함유하기 때문에, 내열성이 우수한 경화물을 얻을 수 있다.The curable composition of the present invention contains, as the component (C), a curing agent containing an alicyclic acid anhydride having a carboxyl group (hereinafter sometimes referred to as "curing agent (C)"). Since the curable composition of the present invention contains the curing agent (C), a cured product having excellent heat resistance can be obtained.
카르복실기를 갖는 지환식 산무수물은, 적어도 하나의 카르복실기가 치환된 지환식 구조를 갖는 산무수물이다. 지환식 구조로는, 포화 고리형 탄화수소 (시클로알칸) 구조, 불포화 고리형 탄화수소 (시클로알켄, 시클로알킨) 구조 등을 들 수 있다.The alicyclic acid anhydride having a carboxyl group is an acid anhydride having an alicyclic structure substituted with at least one carboxyl group. Examples of the alicyclic structure include a saturated cyclic hydrocarbon (cycloalkane) structure, an unsaturated cyclic hydrocarbon (cycloalkene, cycloalkane) structure, and the like.
지환식 산무수물로는, 3-메틸-1,2,3,6-테트라하이드로 무수프탈산, 4-메틸-1,2,3,6-테트라하이드로 무수프탈산, 테트라하이드로 무수프탈산, 3-메틸-헥사하이드로 무수프탈산, 4-메틸-헥사하이드로 무수프탈산, 헥사하이드로 무수프탈산, 무수메틸나딕산, 5-노르보르넨-2,3-디카르복실산 무수물, 노르보르난-2,3-디카르복실산 무수물, 메틸-5-노르보르넨-2,3-디카르복실산 무수물, 메틸-노르보르난-2,3-디카르복실산 무수물 등을 들 수 있다. Examples of the alicyclic acid anhydride include 3-methyl-1,2,3,6-tetrahydrophthalic anhydride, 4-methyl-1,2,3,6-tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, Hexahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, hexahydrophthalic anhydride, methylnadic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, norbornane- Methyl-5-norbornene-2,3-dicarboxylic acid anhydride, methyl-norbornane-2,3-dicarboxylic anhydride, and the like.
카르복실기는 지환식 산무수물의 지환식 구조의 임의의 위치에서 치환해도 되고, 치환 위치나 치환하는 카르복실기의 수는 특별히 한정되지 않는다.The carboxyl group may be substituted at any position of the alicyclic structure of the alicyclic acid anhydride, and the substitution position and the number of the substituted carboxyl groups are not particularly limited.
이들 중에서도, 헥사하이드로 무수프탈산에 카르복실기가 치환된, 시클로헥산-1,2,4-트리카르복실산-1,2무수물, 시클로헥산-1,2,3-트리카르복실산-1,2무수물이 바람직하고, 시클로헥산-1,2,4-트리카르복실산-1,2무수물이 특히 바람직하다. 이 화합물은 입체 이성체가 존재할 수 있지만, 어느 이성체이어도 된다. Of these, cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride in which a carboxyl group is substituted for hexahydrophthalic anhydride, cyclohexane-1,2,3-tricarboxylic acid-1,2-anhydride And cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride are particularly preferable. This compound may have any stereoisomer, but may be any isomer.
카르복실기를 갖는 지환식 산무수물은, 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.The alicyclic acid anhydride having a carboxyl group may be used singly or in combination of two or more kinds.
경화제 (C) 는 추가로, 다른 경화제를 함유하고 있어도 된다. The curing agent (C) may further contain another curing agent.
다른 경화제로는, 카르복실기를 갖지 않는 지환식 산무수물 (이하, 「그 밖의 지환식 산무수물」이라고 한다), 폴리아젤라인산 무수물 등의 지방족 산무수물, 지방족아민계 경화제, 지환식 아민계 경화제, 제2급 또는 제3급 아민계 경화제, 방향족 아민계 경화제, 디시안디아미드, 삼불화붕소아민 착염, 이미다졸 화합물 등을 들 수 있다. Examples of other curing agents include aliphatic acid anhydrides such as alicyclic acid anhydrides having no carboxyl group (hereinafter referred to as "other alicyclic acid anhydrides") and polyazelaic anhydride, aliphatic amine curing agents, alicyclic amine curing agents, Secondary or tertiary amine curing agents, aromatic amine curing agents, dicyandiamide, boron trifluoride amine complexes, imidazole compounds, and the like.
다른 경화제는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.The other curing agents may be used alone or in combination of two or more.
다른 경화제로는, 고온에 있어서도 높은 접착력을 갖는 경화물이 얻어지는 점에서, 그 밖의 지환식 산무수물이 바람직하다. 그 밖의 지환식 산무수물로는, 상기 카르복실기를 갖는 지환식 산무수물의 지환식 산무수물로서 예시한 것과 동일한 것을 들 수 있다. 그 중에서도, 3-메틸-헥사하이드로 무수프탈산, 4-메틸-헥사하이드로 무수프탈산이 바람직하고, 4-메틸-헥사하이드로 무수프탈산이 특히 바람직하다.As other curing agents, other alicyclic acid anhydrides are preferable in that a cured product having a high adhesive strength even at a high temperature can be obtained. Examples of other alicyclic acid anhydrides include the same alicyclic acid anhydrides as the alicyclic acid anhydrides having a carboxyl group. Among them, 3-methyl-hexahydrophthalic anhydride and 4-methyl-hexahydrophthalic anhydride are preferable, and 4-methyl-hexahydrophthalic anhydride is particularly preferable.
경화제 (C) 는 카르복실기를 갖는 지환식 산무수물 및 그 밖의 지환식 산무수물로부터 선택되는 1 종 또는 2 종 이상으로 이루어지는 것이 바람직하고, 그 질량비는, (카르복실기를 갖는 지환식 산무수물):(그 밖의 지환식 산무수물) = 100:0 ∼ 10:90 인 것이 바람직하고, 50:50 ∼ 10:90 인 것이 보다 바람직하다.The curing agent (C) is preferably composed of one or more kinds selected from alicyclic acid anhydrides having a carboxyl group and other alicyclic acid anhydrides, and the mass ratio thereof is (alicyclic acid anhydride having a carboxyl group): Is preferably 100: 0 to 10:90, and more preferably 50:50 to 10:90.
(D) 실란 커플링제 (D) Silane coupling agent
본 발명의 경화성 조성물은 (D) 성분으로서 산무수물 구조를 갖는 실란 커플링제 (이하, 「실란 커플링제 (D)」라고 하는 경우가 있다) 를 함유한다. 본 발명의 경화성 조성물은 실란 커플링제 (D) 를 함유하기 때문에 상 분리 (백탁) 되는 일 없이, 투명성이 우수하고, 높은 접착력을 갖는 경화물을 얻을 수 있다.The curable composition of the present invention contains a silane coupling agent having an acid anhydride structure (hereinafter occasionally referred to as "silane coupling agent (D)") as the component (D). Since the curable composition of the present invention contains the silane coupling agent (D), the cured product having excellent transparency and high adhesive strength can be obtained without phase separation (cloudiness).
실란 커플링제 (D) 는 1 개의 분자 중에, 산무수물 구조를 갖는 기 (Y) 와 가수분해성기 (ORb) 의 양자를 겸비하는 유기 규소 화합물이다. 구체적으로는 하기 식 (d) 로 나타내는 화합물이다.The silane coupling agent (D) is an organosilicon compound having both a group (Y) having an acid anhydride structure and a hydrolyzable group (OR b ) in one molecule. Specifically, it is a compound represented by the following formula (d).
[화학식 7](7)
식 중, Y 는 산무수물 구조를 나타내고, Ra 는 탄소수 1 ∼ 6 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, Rb 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, i 는 1 ∼ 3 의 정수를 나타내고, j 는 0 ∼ 2 의 정수를 나타내고, k 는 1 ∼ 3 의 정수를 나타내고, i+j+k = 4 이다. R a represents an alkyl group having 1 to 6 carbon atoms or a phenyl group which may have a substituent, R b represents an alkyl group having 1 to 6 carbon atoms, i represents an integer of 1 to 3, and Y represents an acid anhydride structure, , J represents an integer of 0 to 2, k represents an integer of 1 to 3, and i + j + k = 4.
Y 로는, 하기 식Y is a group represented by the following formula
[화학식 8][Chemical Formula 8]
(식 중, h 는 0 ∼ 10 의 정수를 나타낸다) 로 나타내는 기 등을 들 수 있고, (Y1) 로 나타내는 기가 특히 바람직하다. (Wherein h represents an integer of 0 to 10), and the group represented by (Y1) is particularly preferable.
식 (d) 중, Ra, Rb 로 나타내는 탄소수 1 ∼ 6 의 알킬기로는, 상기 R1 로 나타내는 탄소수 1 ∼ 6 의 알킬기로서 먼저 예시한 것과 동일한 기를 들 수 있고, 상기 Ra 로 나타내는 치환기를 갖고 있어도 되는 페닐기로는, 상기 R2 로 나타내는 치환기를 갖고 있어도 되는 페닐기로서 먼저 예시한 것과 동일한 기를 들 수 있다.Formula (d) wherein the alkyl group of 1 to 6 carbon atoms represented by R a, R b is, there may be mentioned the same groups as alkyl groups having 1 to 6 carbon atoms represented by the R 1 as a first example, the substituent represented by the above R a May be the same groups as those exemplified above as the phenyl group which may have a substituent represented by R 2 .
그 중에서도, 식 (d) 로 나타내는 화합물로는, 하기 식 (d-1)Among them, the compound represented by the formula (d) is preferably a compound represented by the following formula (d-1)
[화학식 9][Chemical Formula 9]
(식 중, Rb, h, i, j, k 는 상기와 동일한 의미를 나타낸다) (Wherein R b , h, i, j and k have the same meanings as defined above)
로 나타내는 화합물이 바람직하다. 식 중, h 는 2 ∼ 8 인 것이 바람직하다.Are preferred. In the formula, h is preferably 2 to 8.
식 (d-1) 로 나타내는 실란 커플링제의 구체예로는, 2-트리메톡시실릴에틸 무수숙신산, 3-트리에톡시실릴프로필 무수숙신산 등을 들 수 있다. Specific examples of the silane coupling agent represented by the formula (d-1) include 2-trimethoxysilylethylsuccinic anhydride, 3-triethoxysilylpropylsuccinic anhydride and the like.
실란 커플링제 (D) 는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.The silane coupling agent (D) may be used singly or in combination of two or more.
본 발명의 경화성 조성물에 있어서는, 상기 (A), (B), (C) 및 (D) 성분의 함유 비율이, (A) 와 [(B)+(C)+(D)] 의 질량비로, (A):[(B)+(C)+(D)] = 90:10 ∼ 50:50 인 것이 바람직하다. 또, 상기 (A'), (B), (C) 및 (D) 성분의 함유 비율이, (A') 와 [(B)+(C)+(D)] 의 질량비로, (A'):[(B)+(C)+(D)] = 90:10 ∼ 50:50 인 것이 바람직하다. The content of the components (A), (B), (C) and (D) in the curable composition of the present invention is preferably in the range of the mass ratio of (A) to (B) + (C) + , And (A): [(B) + (C) + (D)] = 90:10 to 50:50. The content ratio of the components (A '), (B), (C) and (D) is preferably in the range of from (A') to (B ' ): [(B) + (C) + (D)] = 90:10 to 50:50.
또한, 상기 (B), (C) 및 (D) 성분의 함유 비율이, [(B)+(C)] 와 (D) 의 질량비로, [(B)+(C)]:(D) = 90:10 ∼ 10:90 인 것이 바람직하다. The content ratio of the components (B), (C) and (D) is preferably in the range of [(B) + (C)] :( D) = 90:10 to 10:90.
이와 같은 비율로 각 성분을 사용함으로써, 장기에 걸쳐 투명성, 내열성이 우수하고, 고온에 있어서도 높은 접착력을 갖는 경화물이 얻어지는 경화성 조성물을 얻을 수 있다.By using each component at such a ratio, it is possible to obtain a curable composition which is excellent in transparency and heat resistance over a long period of time, and can obtain a cured product having a high adhesive force even at a high temperature.
본 발명의 경화성 조성물에는, 본 발명의 목적을 저해하지 않는 범위에서, 추가로 다른 성분을 함유시켜도 된다. The curable composition of the present invention may further contain other components as long as the object of the present invention is not impaired.
다른 성분으로는, 경화 촉매, 산화 방지제, 자외선 흡수제, 광 안정제, 희석제 등을 들 수 있다.Other components include a curing catalyst, an antioxidant, an ultraviolet absorber, a light stabilizer, and a diluent.
경화 촉매는 경화를 촉진하기 위해서 첨가된다. 경화 촉매로는, 2-메틸이미다졸, 트리페닐포스핀 등을 들 수 있다. 이들 경화 촉매는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.The curing catalyst is added to promote curing. Examples of the curing catalyst include 2-methylimidazole, triphenylphosphine and the like. These curing catalysts may be used alone or in combination of two or more.
산화 방지제는 가열시의 산화 열화를 방지하기 위해서 첨가된다. 산화 방지제로는, 인계 산화 방지제, 페놀계 산화 방지제, 황계 산화 방지제 등을 들 수 있다.The antioxidant is added to prevent oxidation deterioration during heating. Examples of the antioxidant include phosphorus antioxidants, phenol antioxidants, and sulfur-based antioxidants.
인계 산화 방지제로는, 트리페닐포스파이트, 디페닐이소데실포스파이트, 페닐디이소데실포스파이트, 트리스(노닐페닐)포스파이트, 디이소데실펜타에리트리톨포스파이트, 트리스(2,4-디-t-부틸페닐)포스파이트, 시클릭네오펜탄테트라일비스(옥타데실)포스파이트, 시클릭네오펜탄테트라일비스(2,4-디-t-부틸페닐)포스파이트, 시클릭네오펜탄테트라일비스(2,4-디-t-부틸-4-메틸페닐)포스파이트, 비스[2-t-부틸-6-메틸-4-{2-(옥타데실옥시카르보닐)에틸}페닐]하이드로겐포스파이트 등의 포스파이트류 ; 9,10-디하이드로-9-옥사-10-포스파페난트렌-10-옥사이드, 10-(3,5-디-t-부틸-4-하이드록시벤질)-9,10-디하이드로-9-옥사-10-포스파페난트렌-10-옥사이드, 10-데실옥시-9,10-디하이드로-9-옥사-10-포스파페난트렌-10-옥사이드 등의 옥사포스파페난트렌옥사이드류 ; 를 들 수 있다.Examples of the phosphorus antioxidant include triphenyl phosphite, diphenyl isodecyl phosphite, phenyl diisodecyl phosphite, tris (nonylphenyl) phosphite, diisodecyl pentaerythritol phosphite, tris (2,4- t-butylphenyl) phosphite, cyclic neopentane tetraylbis (octadecyl) phosphite, cyclic neopentane tetraylbis (2,4-di-t-butylphenyl) phosphite, cyclic neopentane tetra Bis (2,4-di-t-butyl-4-methylphenyl) phosphite, bis [2-t-butyl- Phosphites such as phosphite; Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5- Oxa-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- ; .
페놀계 산화 방지제로는, 2,6-디-t-부틸-p-크레졸, 디부틸하이드록시톨루엔, 부틸화하이드록시아니솔, 2,6-디-t-부틸-p-에틸페놀, 스테아릴-β-(3,5-디-t-부틸-4-하이드록시페닐)프로피오네이트 등의 모노페놀류 ; 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀), 2,2'-메틸렌비스(4-에틸-6-t-부틸페놀), 4,4'-티오비스(3-메틸-6-t-부틸페놀), 4,4'-부틸리덴비스(3-메틸-6-t-부틸페놀), 3,9-비스[1,1-디메틸-2-{β-(3-t-부틸-4-하이드록시-5-메틸페닐)프로피오닐옥시}에틸]2,4,8,10-테트라옥사스피로[5,5]운데칸 등의 비스페놀류 ; 1,1,3-트리스(2-메틸-4-하이드록시-5-t-부틸페닐)부탄, 1,3,5-트리메틸-2,4,6-트리스(3,5-디-t-부틸-4-하이드록시벤질)벤젠, 테트라키스-[메틸렌-3-(3',5'-디-t-부틸-4'-하이드록시페닐)프로피오네이트]메탄, 비스[3,3'-비스-(4'-하이드록시-3'-t-부틸페닐)부티릭애시드]글리콜에스테르, 1,3,5-트리스(3',5'-디-t-부틸-4'-하이드록시벤질)-S-트리아진-2,4,6-(1H,3H,5H)트리온, 토코페놀 등의 고분자형 페놀류 ; 를 들 수 있다.Examples of the phenol-based antioxidant include 2,6-di-t-butyl-p-cresol, dibutylhydroxytoluene, butylated hydroxyanisole, 2,6- Mono-phenols such as aryl-? - (3,5-di-t-butyl-4-hydroxyphenyl) propionate; (4-methyl-6-t-butylphenol), 2,2'-methylenebis (4-ethyl- Butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 3,9-bis [1,1- 3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] 2,4,8,10-tetraoxaspiro [5,5] undecane; Methyl-4-hydroxy-5-t-butylphenyl) butane, 1,3,5-trimethyl-2,4,6-tris (3,5- (3 ', 5'-di-t-butyl-4'-hydroxyphenyl) propionate] methane, bis [3,3' Tris (3 ', 5'-di-t-butyl-4'-hydroxyphenyl) butyric acid] glycol ester, 1,3,5- Benzyl) -S-triazine-2,4,6- (1H, 3H, 5H) trione, and tocophenol; .
황계 산화 방지제로는, 디라우릴-3,3'-티오디프로피오네이트, 디미리스틸-3,3'-티오디프로피오네이트, 디스테아릴-3,3'-티오디프로피오네이트 등을 들 수 있다.Examples of the sulfur-based antioxidant include dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3,3'-thiodipropionate .
이들 산화 방지제는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다. 단, 본 발명의 경화성 조성물은, (B) 성분, (D) 성분을 함유하고 있기 때문에, 특별히 산화 방지제가 없어도, 가열시의 산화 열화는 잘 일어나지 않는다. 산화 방지제를 사용하는 경우, 그 사용량은, 실란 화합물 공중합체 (A) 또는 (A') 100 질량부에 대해, 통상적으로는 0.01 ∼ 10 질량부이다.These antioxidants may be used alone or in combination of two or more. However, since the curable composition of the present invention contains the component (B) and the component (D), the oxidation deterioration during heating hardly occurs even when no antioxidant is specifically present. When an antioxidant is used, the amount thereof is usually 0.01 to 10 parts by mass based on 100 parts by mass of the silane compound copolymer (A) or (A ').
자외선 흡수제는 얻어지는 경화물의 내광성을 향상시킬 목적으로 첨가된다. The ultraviolet absorber is added for the purpose of improving the light resistance of the resulting cured product.
자외선 흡수제로는, 예를 들어, 페닐살리실레이트, p-t-부틸페닐살리실레이트, p-옥틸페닐살리실레이트 등의 살리실산류 ; 2,4-디하이드록시벤조페논, 2-하이드록시-4-메톡시벤조페논, 2-하이드록시-4-옥톡시벤조페논, 2-하이드록시-4-도데실옥시벤조페논, 2,2'-디하이드록시-4-메톡시벤조페논, 2,2'-디하이드록시-4,4'-디메톡시벤조페논, 2-하이드록시-4-메톡시-5-술포벤조페논 등의 벤조페논류 ; 2-(2'-하이드록시-5'-메틸페닐)벤조트리아졸, 2-(2'-하이드록시-5'-t-부틸페닐)벤조트리아졸, 2-(2'-하이드록시-3',5'-디-t-부틸페닐)벤조트리아졸, 2-(2'-하이드록시-3'-t-부틸-5'-메틸페닐)-5-클로로벤조트리아졸, 2-(2'-하이드록시-3',5'-디-t-부틸페닐)-5-클로로벤조트리아졸, 2-(2'-하이드록시-3',5'-디-t-아밀페닐)벤조트리아졸, 2-{(2'-하이드록시-3',3'',4'',5'',6''-테트라하이드로프탈이미드메틸)-5'-메틸페닐}벤조트리아졸 등의 벤조트리아졸류 ; 비스(2,2,6,6-테트라메틸-4-피페리딜)세바케이트, 비스(1,2,2,6,6-펜타메틸-4-피페리딜)세바케이트, 비스(1,2,2,6,6-펜타메틸-4-피페리딜)[{3,5-비스(1,1-디메틸에틸)-4-하이드록시페닐}메틸]부틸말로네이트 등의 힌더드아민류 ; 등을 들 수 있다.Examples of the ultraviolet absorber include salicylic acids such as phenyl salicylate, p-t-butylphenyl salicylate, and p-octylphenyl salicylate; Dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-octoxybenzophenone, 2-hydroxy-4-dodecyloxybenzophenone, 2,2 Dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone and 2-hydroxy-4-methoxy- Phenones; Benzotriazole, 2- (2'-hydroxy-5'-methylphenyl) benzotriazole, 2- (2'- Butylphenyl) benzotriazole, 2- (2'-hydroxy-3'-t-butyl-5'-methylphenyl) -5- chlorobenzotriazole, 2- Dihydroxy-3 ', 5'-di-t-butylphenyl) -5-chlorobenzotriazole, 2- (2'- Benzotriazole such as 2 - {(2'-hydroxy-3 ', 3 ", 4", 5 ", 6" -tetrahydrophthalimidemethyl) -5'-methylphenyl} benzotriazole Solvation; Bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis Hindered amines such as 2,2,6,6-pentamethyl-4-piperidyl) [{3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl} methyl] butyl malonate; And the like.
이들의 자외선 흡수제는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다. These ultraviolet absorbers may be used singly or in combination of two or more.
자외선 흡수제의 사용량은 실란 화합물 공중합체 (A) 또는 (A') 100 질량부에 대해, 통상적으로는 0.01 ∼ 10 질량부이다.The amount of the ultraviolet absorber to be used is usually 0.01 to 10 parts by mass based on 100 parts by mass of the silane compound copolymer (A) or (A ').
광 안정제는 얻어지는 경화물의 내광성을 향상시킬 목적으로 첨가된다. The light stabilizer is added for the purpose of improving the light resistance of the resulting cured product.
광 안정제로는, 예를 들어, 폴리[{6-(1,1,3,3,-테트라메틸부틸)아미노-1,3,5-트리아진-2,4-디일}{(2,2,6,6-테트라메틸-4-피페리딘)이미노}헥사메틸렌{(2,2,6,6-테트라메틸-4-피페리딘)이미노}] 등의 힌더드아민류 등을 들 수 있다.Examples of the light stabilizer include poly {[6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl} , 6,6-tetramethyl-4-piperidine) imino} hexamethylene {(2,2,6,6-tetramethyl-4-piperidine) imino} .
이들의 광 안정제는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다. These light stabilizers may be used alone or in combination of two or more.
광 안정제의 사용량은 실란 화합물 공중합체 (A) 또는 (A') 100 질량부에 대해, 통상적으로는 0.01 ∼ 10 질량부이다.The amount of the light stabilizer to be used is usually 0.01 to 10 parts by mass based on 100 parts by mass of the silane compound copolymer (A) or (A ').
희석제는 경화성 조성물의 점도를 조정하기 위하여 첨가된다. A diluent is added to adjust the viscosity of the curable composition.
희석제로는, 예를 들어, 글리세린디글리시딜에테르, 부탄디올디글리시딜에테르, 디글리시딜아닐린, 네오펜틸글리콜글리시딜에테르, 시클로헥산디메탄올디글리시딜에테르, 알킬렌디글리시딜에테르, 폴리글리콜디글리시딜에테르, 폴리프로필렌글리콜디글리시딜에테르, 트리메틸올프로판트리글리시딜에테르, 글리세린트리글리시딜에테르, 4-비닐시클로헥센모노옥사이드, 비닐시클로헥센디옥사이드, 메틸화비닐시클로헥센디옥사이드 등을 들 수 있다. As the diluting agent, for example, glycerin diglycidyl ether, butanediol diglycidyl ether, diglycidyl aniline, neopentyl glycol glycidyl ether, cyclohexanedimethanol diglycidyl ether, alkylenediglycidyl Polyvinylpyrrolidone, diallyl ether, polyglycol diglycidyl ether, polypropylene glycol diglycidyl ether, trimethylol propane triglycidyl ether, glycerine triglycidyl ether, 4-vinylcyclohexene monoxide, vinylcyclohexene dioxide, Hexene dioxide, and the like.
이들의 희석제는 1 종 단독으로, 또는 2 종 이상을 조합하여 사용할 수 있다.These diluents may be used singly or in combination of two or more.
본 발명의 경화성 조성물은 예를 들어, 상기 (A) 또는 (A'), (B), (C), (D) 성분, 및 원하는 바에 따라 다른 성분을 소정 비율로 배합하고, 공지된 방법에 의해 혼합, 탈포함으로써 얻을 수 있다.The curable composition of the present invention can be obtained by, for example, mixing the above components (A) or (A '), (B), (C) By mixing and de-mixing.
이상과 같이 하여 얻어지는 본 발명의 경화성 조성물에 의하면, 고에너지의 광이 조사되는 경우나 고온 상태라도, 착색하여 투명성이 저하되거나 하는 경우가 없어, 장기에 걸쳐 우수한 투명성을 가지며, 또한, 높은 접착력을 갖는 경화물을 얻을 수 있다. According to the curable composition of the present invention obtained in the above-described manner, transparency does not decrease due to coloration even in the case of irradiation with high energy light or in a high temperature state, and excellent transparency is ensured over a long period of time, Can be obtained.
따라서, 본 발명의 경화성 조성물은 광학 부품이나 성형체의 원료, 접착제, 코팅제 등으로서 바람직하게 사용된다. 특히, 광소자의 고휘도화에 수반하는, 광소자 고정재의 열화에 관한 문제를 해결할 수 있는 점에서, 본 발명의 경화성 조성물은, 광소자 고정재용 조성물로서 바람직하게 사용할 수 있다.Therefore, the curable composition of the present invention is preferably used as a raw material for an optical component or a molded article, an adhesive agent, a coating agent, and the like. Particularly, the curable composition of the present invention can be preferably used as a composition for an optical element fixing material because the problem of deterioration of the optical element fixing material accompanying the increase in brightness of an optical element can be solved.
2) 경화물 2) Cured goods
본 발명의 제 2 는 본 발명의 경화성 조성물을 경화시켜 이루어지는 경화물이다. A second aspect of the present invention is a cured product obtained by curing the curable composition of the present invention.
본 발명의 경화성 조성물을 경화시키는 방법으로는 가열 경화를 들 수 있다. 경화시킬 때의 가열 온도는 통상적으로, 100 ∼ 200 ℃ 이고, 가열 시간은 통상적으로 10 분 내지 20 시간, 바람직하게는 30 분 내지 10 시간이다.As a method of curing the curable composition of the present invention, a heat curing may be mentioned. The heating temperature for curing is usually from 100 to 200 DEG C, and the heating time is usually from 10 minutes to 20 hours, preferably from 30 minutes to 10 hours.
본 발명의 경화물은 고에너지의 광이 조사되는 경우나 고온 상태라도, 착색하여 투명성이 저하되거나 하는 경우가 없어, 장기에 걸쳐 우수한 투명성을 가지며, 또한, 높은 접착력을 갖는다. The cured product of the present invention is excellent in transparency over a long period of time and has a high adhesive force since it does not suffer from deterioration of transparency when it is colored or colored even when it is irradiated with high energy light or at high temperature.
따라서, 본 발명의 경화물은 광학 부품이나 성형체, 접착층, 코팅층 등으로서 바람직하게 사용된다. 특히, 광소자의 고휘도화에 수반하는, 광소자 고정재의 열화에 관한 문제를 해결할 수 있는 점에서, 본 발명의 경화물은 광소자 고정재로서 바람직하게 사용할 수 있다.Therefore, the cured product of the present invention is preferably used as an optical component, a molded article, an adhesive layer, a coating layer and the like. In particular, the cured product of the present invention can be preferably used as an optical element fixing material because the problem of deterioration of the optical element fixing material accompanying the increase in brightness of the optical element can be solved.
본 발명의 경화물이 높은 접착력을 갖는 것은, 예를 들어, 다음과 같이 하여 접착력을 측정함으로써 확인할 수 있다. 즉, 실리콘 칩의 미러면에 경화성 조성물을 도포하고, 도포면을 피착체 상에 실어 압착하고, 가열 처리하여 경화시킨다. 이것을, 미리 소정 온도 (예를 들어, 23 ℃, 100 ℃) 로 가열한 본드 테스터의 측정 스테이지 상에 30 초간 방치하고, 피착체에서 50 ㎛ 높이의 위치로부터, 접착면에 대해 수평 방향 (전단 방향) 으로 응력을 가하여 시험편과 피착체의 접착력을 측정한다. The high hardness of the cured product of the present invention can be confirmed, for example, by measuring the adhesive strength in the following manner. That is, the curable composition is applied to the mirror surface of the silicon chip, the coated surface is put on the adherend, pressed and cured by heat treatment. This was allowed to stand for 30 seconds on a measurement stage of a bond tester heated in advance at a predetermined temperature (for example, 23 占 폚, 100 占 폚) to remove the adhesive agent from the position of 50 占 퐉 height from the adherend in the horizontal direction ) To measure the adhesive force between the test piece and the adherend.
경화물의 접착력은, 23 ℃ 에 있어서 110 N/2 ㎜□ 이상인 것이 바람직하다.The adhesive strength of the cured product is preferably 110 N / 2 mm □ or more at 23 ° C.
상기 경화물이 투명성이 우수한 것은, 광 투과율을 측정함으로써 확인할 수 있다. 경화물의 광 투과율은, 파장 400 ㎚ 의 광에서는, 80 % 이상이 바람직하고, 84 % 이상이 특히 바람직하고, 파장 450 ㎚ 의 광에서는, 87 % 이상이 바람직하다.The excellent transparency of the cured product can be confirmed by measuring the light transmittance. The light transmittance of the cured product is preferably 80% or more, more preferably 84% or more, and preferably 87% or more for light having a wavelength of 450 nm, for light having a wavelength of 400 nm.
상기 경화물이 장기에 걸쳐 내열성이 우수한 것은, 경화물을 고온 하에 장시간 둔 후에도 투명성의 변화가 작은 점에서 확인할 수 있다. 투명성은 150 ℃에서 500 시간 둔 후에, 파장 400 ㎚ 의 투과율이 초기 투과율의 70 % 이상이 바람직하고, 80 % 이상이 보다 바람직하다.The excellent heat resistance of the cured product over a long period of time can be confirmed from the fact that the change of the transparency is small even after the cured product is left at a high temperature for a long time. The transparency is preferably at least 70%, more preferably at least 80%, of the initial transmittance at a wavelength of 400 nm after being left at 150 DEG C for 500 hours.
3) 경화성 조성물의 사용 방법 3) Method of using the curable composition
본 발명의 제 3 은 본 발명의 경화성 조성물을, 광소자 고정재용 접착제 또는 광소자 고정재용 밀봉제로서 사용하는 방법이다. A third aspect of the present invention is a method of using the curable composition of the present invention as an adhesive for an optical element fixing agent or an optical element fixing agent.
광소자로는, LED, LD 등의 발광 소자, 수광 소자, 복합 광소자, 광 집적 회로 등을 들 수 있다.Examples of the optical element include light emitting elements such as LEDs and LDs, light receiving elements, composite optical elements, and optical integrated circuits.
〈광소자 고정재용 접착제〉 <Adhesive for optical element fixing material>
본 발명의 경화성 조성물은 광소자 고정재용 접착제로서 바람직하게 사용할 수 있다.The curable composition of the present invention can be preferably used as an adhesive for an optical element fixing material.
본 발명의 경화성 조성물을 광소자 고정재용 접착제로서 사용하는 방법으로는, 접착의 대상으로 하는 재료 (광소자와 그 기판 등) 의 일방 또는 양방의 접착면에 그 조성물을 도포하고, 압착한 후, 가열 경화시켜, 접착의 대상으로 하는 재료끼리를 강고하게 접착시키는 방법을 들 수 있다.As a method of using the curable composition of the present invention as an adhesive for optical element fixing materials, there is a method in which the composition is applied to one or both of adhesive surfaces of a material (an optical element and its substrate or the like) to be adhered, And a method in which the materials to be bonded are firmly adhered to each other by heating and curing.
광소자를 접착하기 위한 주된 기판 재료로는, 소다라임 유리, 내열성 경질 유리 등의 유리류 ; 세라믹스 ; 철, 구리, 알루미늄, 금, 은, 백금, 크롬, 티탄 및 이들 금속의 합금, 스테인리스 (SUS302, SUS304, SUS304L, SUS309 등) 등의 금속 류 ; 폴리에틸렌테레프탈레이트, 폴리부틸렌테레프탈레이트, 폴리에틸렌나프탈레이트, 에틸렌-아세트산비닐 공중합체, 폴리스티렌, 폴리카보네이트, 폴리메틸펜텐, 폴리술폰, 폴리에테르에테르케톤, 폴리에테르술폰, 폴리페닐렌술파이드, 폴리에테르이미드, 폴리이미드, 폴리아미드, 아크릴 수지, 노르보르넨계 수지, 시클로올레핀 수지, 유리 에폭시 수지 등의 합성 수지 ; 등을 들 수 있다.As a main substrate material for bonding an optical element, glass such as soda lime glass and heat resistant hard glass; Ceramics; Metals such as iron, copper, aluminum, gold, silver, platinum, chromium, titanium and alloys of these metals, stainless steel (SUS302, SUS304, SUS304L, SUS309 and the like) But are not limited to, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ethylene-vinyl acetate copolymer, polystyrene, polycarbonate, polymethylpentene, polysulfone, polyetheretherketone, polyether sulfone, polyphenylene sulfide, , Synthetic resins such as polyimide, polyamide, acrylic resin, norbornene resin, cycloolefin resin and glass epoxy resin; And the like.
가열 경화시킬 때의 가열 온도는 사용하는 경화성 조성물 등에 따라 상이하기도 하지만, 통상적으로, 100 ∼ 200 ℃ 이다. 가열 시간은 통상적으로 10 분 내지 20 시간, 바람직하게는 30 분 내지 10 시간이다.The heating temperature at the time of heat curing varies depending on the curable composition to be used and the like, but is usually from 100 to 200 ° C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
〈광소자 고정재용 밀봉제〉 <Sealant for Optical Element Fixture>
본 발명의 경화성 조성물은 광소자 밀봉체의 밀봉제로서 바람직하게 사용할 수 있다.The curable composition of the present invention can be preferably used as an encapsulant of an optical device encapsulation material.
본 발명의 경화성 조성물을 광소자 고정재용 밀봉제로서 사용하는 방법으로는, 예를 들어, 그 조성물을 원하는 형상으로 성형하고, 광소자를 내포한 성형체를 얻은 후, 그것을 가열 경화시킴으로써 광소자 밀봉체를 제조하는 방법 등을 들 수 있다. As a method of using the curable composition of the present invention as an encapsulant for optical device fixtures, for example, a method of molding the composition into a desired shape, obtaining a molded article containing the optical device, And the like.
본 발명의 경화성 조성물을 원하는 형상으로 성형하는 방법으로는, 특별히 한정되는 것이 아니라, 통상적인 트랜스퍼 성형법이나, 주형법 등의 공지된 몰드법을 채용할 수 있다.The method for molding the curable composition of the present invention into a desired shape is not particularly limited, and a known transfer molding method such as a common transfer molding method or a casting method can be employed.
가열 경화시킬 때의 가열 온도는 사용하는 경화성 조성물 등에 따라 상이하기도 하지만, 통상적으로, 100 ∼ 200 ℃ 이다. 가열 시간은 통상적으로 10 분 내지 20 시간, 바람직하게는 30 분 내지 10 시간이다.The heating temperature at the time of heat curing varies depending on the curable composition to be used and the like, but is usually from 100 to 200 ° C. The heating time is usually 10 minutes to 20 hours, preferably 30 minutes to 10 hours.
얻어지는 광소자 밀봉체는 본 발명의 경화성 조성물을 사용하고 있으므로, 광소자에, 백색이나 청색 발광 LED 등의, 발광의 피크 파장이 400 ∼ 490 ㎚ 로 단파장인 것을 사용해도, 열이나 광에 의해 착색 열화되는 경우가 없는 투명성, 내열성이 우수한 것이다.Since the obtained optical element encapsulant uses the curable composition of the present invention, even if the optical element has a peak wavelength of 400 to 490 nm in short wavelength, such as a white or blue LED, It is excellent in transparency and heat resistance that is not deteriorated.
실시예Example
다음으로 실시예 및 비교예에 의해 본 발명을 더욱 상세하게 설명하지만, 본 발명은 하기의 실시예에 한정되는 것은 아니다.Next, the present invention will be described in more detail with reference to examples and comparative examples, but the present invention is not limited to the following examples.
(중량 평균 분자량 측정) (Weight average molecular weight measurement)
제조예에서 얻은 실란 화합물 공중합체의 중량 평균 분자량 (Mw) 은 표준 폴리스티렌 환산값으로 하고, 이하의 장치, 및 조건에서 측정하였다. The weight average molecular weight (Mw) of the silane compound copolymer obtained in Production Example was measured in terms of standard polystyrene and measured under the following conditions and conditions.
장치명 : HLC-8220 GPC, 토소사 제조 Device name: HLC-8220 GPC, manufactured by Tosa Corporation
칼럼 : TSKgel GMHXL, TSKgel GMHXL, 및 TSKgel 2000HXL 을 순차 연결한 것 Columns: TSKgel GMHXL, TSKgel GMHXL, and TSKgel 2000HXL connected in series
용매 : 테트라하이드로푸란 Solvent: tetrahydrofuran
주입량 : 80 ㎕ Injection amount: 80 μl
측정 온도 : 40 ℃ Measuring temperature: 40 ° C
유속 : 1 ㎖/분 Flow rate: 1 ml / min
검출기 : 시차 굴절계Detector: differential refractometer
(IR 스펙트럼의 측정)(Measurement of IR spectrum)
제조예에서 얻은 실란 화합물 공중합체의 IR 스펙트럼은 이하의 장치를 사용하여 측정하였다. The IR spectrum of the silane compound copolymer obtained in Production Example was measured using the following apparatus.
푸리에 변환 적외 분광 광도계 (Spectrum 100, 파킨엘머사 제조)Fourier transform infrared spectrophotometer (Spectrum 100, manufactured by Perkin Elmer)
(제조예 1)(Production Example 1)
300 ㎖ 의 가지형 플라스크에, 실란 화합물 (2) 로서 페닐트리메톡시실란 (토쿄 화성 공업사 제조) 16.7 g (84 m㏖) 과, 실란 화합물 (1) 로서 3-아세톡시프로필트리메톡시실란 (아즈맥스사 제조) 8.0 g (36 m㏖), 용매로서 톨루엔 60 ㎖, 및 증류수 30 ㎖ 를 주입한 후, 교반하면서, 촉매로서 인산 (칸토 화학사 제조) 0.15 g (1.5 m㏖) 을 첨가하고, 실온에서 추가로 16 시간 교반을 계속하였다.16.7 g (84 mmol) of phenyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) as the silane compound (2) and 3-acetoxypropyltrimethoxysilane as the silane compound (1) were added to a 300 ml egg- 8.0 g (36 mmol) of toluene as a solvent, 60 ml of toluene and 30 ml of distilled water were charged and 0.15 g (1.5 mmol) of phosphoric acid (manufactured by Kanto Chemical Co., Ltd.) Stirring was continued at room temperature for a further 16 hours.
반응 종료 후, 반응 혼합물에 아세트산에틸 100 ㎖ 를 첨가하고, 포화 탄산수소나트륨 수용액으로 중화시켰다. 잠시 가만히 정지시킨 후, 유기층을 분취하였다. 이어서, 유기층을 증류수로 2 회 세정한 후, 무수황산마그네슘으로 건조시켰다. 황산마그네슘을 여과 분리 후, 여과액을 이배퍼레이터로 50 ㎖ 까지 농축하고, 이것을 다량의 n-헥산 중에 적하하여 침전시켜, 침전물을 데칸테이션에 의해 분리하였다. 얻어진 침전물을 메틸에틸케톤에 용해시켜 회수하고, 이배퍼레이터로 용매를 감압 증류 제거하여, 진공 건조시킴으로써, 실란 화합물 공중합체 (A1) 14.7 g 을 얻었다. After completion of the reaction, 100 ml of ethyl acetate was added to the reaction mixture, and the mixture was neutralized with a saturated aqueous solution of sodium hydrogencarbonate. After a short pause, the organic layer was separated. Subsequently, the organic layer was washed twice with distilled water and then dried over anhydrous magnesium sulfate. The magnesium sulfate was separated by filtration, and the filtrate was concentrated to 50 ml with a separator. The filtrate was dripped into a large amount of n-hexane and precipitated, and the precipitate was separated by decantation. The resulting precipitate was dissolved in methyl ethyl ketone and recovered. The solvent was distilled off under reduced pressure using this distributor, followed by vacuum drying to obtain 14.7 g of the silane compound copolymer (A1).
실란 화합물 공중합체 (A1) 의 중량 평균 분자량 (Mw) 은 2,700, 분자량 분포 (Mw/Mn) 는 1.53 이었다. The silane compound copolymer (A1) had a weight average molecular weight (Mw) of 2,700 and a molecular weight distribution (Mw / Mn) of 1.53.
또, 실란 화합물 공중합체 (A1) 의 IR 스펙트럼 (푸리에 변환 적외 분광 광도계 (FT-IR)) 데이터를 이하에 나타낸다. The IR spectrum (Fourier transform infrared spectrophotometer (FT-IR)) data of the silane compound copolymer (A1) is shown below.
Si-Ph : 699 cm-1, 741 cm-1, Si-O : 1132 cm-1, -CO : 1738 cm-1 Si-Ph: 699 cm -1 , 741 cm -1 , Si-O: 1132 cm -1 , -CO: 1738 cm -1
(제조예 2) (Production Example 2)
제조예 1 에 있어서, 페닐트리메톡시실란의 사용량을 14.3 g (72 m㏖) 으로 하고, 3-아세톡시프로필트리메톡시실란의 사용량을 10.7 g (48 m㏖) 으로 한 것 이외에는 제조예 1 과 동일하게 하여, 실란 화합물 공중합체 (A2) 15.9 g 을 얻었다. The procedure of Preparation Example 1 was repeated except that the amount of phenyltrimethoxysilane used was changed to 14.3 g (72 mmol) and the amount of 3-acetoxypropyltrimethoxysilane was changed to 10.7 g (48 mmol) , 15.9 g of the silane compound copolymer (A2) was obtained.
실란 화합물 공중합체 (A2) 의 중량 평균 분자량 (Mw) 은 2,600, 분자량 분포 (Mw/Mn) 는 1.50 이었다.The silane compound copolymer (A2) had a weight average molecular weight (Mw) of 2,600 and a molecular weight distribution (Mw / Mn) of 1.50.
또, 실란 화합물 공중합체 (A2) 의 IR 스펙트럼 (푸리에 변환 적외 분광 광도계 (FT-IR)) 데이터를 이하에 나타낸다. The IR spectrum (Fourier transform infrared spectrophotometer (FT-IR)) data of the silane compound copolymer (A2) is shown below.
Si-Ph : 699 cm-1, 741 cm-1, Si-O : 1132 cm-1, -CO : 1738 cm-1 Si-Ph: 699 cm -1 , 741 cm -1 , Si-O: 1132 cm -1 , -CO: 1738 cm -1
(제조예 3) (Production Example 3)
제조예 1 에 있어서, 페닐트리메톡시실란의 사용량을 19.0 g (96 m㏖) 으로 하고, 3-아세톡시프로필트리메톡시실란의 사용량을 5.3 g (24 m㏖) 으로 한 것 이외에는 제조예 1 과 동일하게 하여, 실란 화합물 공중합체 (A3) 14.9 g 을 얻었다. The procedure of Preparation Example 1 was repeated except that the amount of phenyltrimethoxysilane used was changed to 19.0 g (96 mmol) and the amount of 3-acetoxypropyltrimethoxysilane to be used was changed to 5.3 g (24 mmol) , 14.9 g of the silane compound copolymer (A3) was obtained.
실란 화합물 공중합체 (A3) 의 중량 평균 분자량 (Mw) 은 2,500, 분자량 분포 (Mw/Mn) 는 1.59 였다. The silane compound copolymer (A3) had a weight average molecular weight (Mw) of 2,500 and a molecular weight distribution (Mw / Mn) of 1.59.
또, 실란 화합물 공중합체 (A3) 의 IR 스펙트럼 (푸리에 변환 적외 분광 광도계 (FT-IR)) 데이터를 이하에 나타낸다. The IR spectrum (Fourier transform infrared spectrophotometer (FT-IR)) data of the silane compound copolymer (A3) is shown below.
Si-Ph : 700 cm-1, 742 cm-1, Si-O : 1132 cm-1, -CO : 1738 cm-1 Si-Ph: 700 cm -1 , 742 cm -1 , Si-O: 1132 cm -1 , -CO: 1738 cm -1
(제조예 4)(Production Example 4)
제조예 1 에 있어서, 페닐트리메톡시실란 16.7 g (84 m㏖) 과 3-아세톡시프로필트리메톡시실란 8.0 g (36 m㏖) 을 사용하는 대신에, 페닐트리메톡시실란 (토쿄 화성 공업사 제조) 11.9 g (60 m㏖) 과 3-글리시독시프로필트리메톡시실란 (토쿄 화성 공업사 제조) (하기 제 1 표, 제 2 표 중, 「GlyTMS」라고 기재한다) 14.2 g (60 m㏖) 을 사용하는 것 이외에는, 제조예 1 과 동일하게 하여, 실란 화합물 공중합체 (A4) 16.3 g 을 얻었다. In the same manner as in Production Example 1, instead of using 16.7 g (84 mmol) of phenyltrimethoxysilane and 8.0 g (36 mmol) of 3-acetoxypropyltrimethoxysilane, phenyltrimethoxysilane 14.2 g (60 mmol) of 11.9 g (60 mmol) of 3-glycidoxypropyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) (hereinafter referred to as "GlyTMS" ), 16.3 g of the silane compound copolymer (A4) was obtained in the same manner as in Production Example 1.
실란 화합물 공중합체 (A4) 의 중량 평균 분자량 (Mw) 은 2,800, 분자량 분포 (Mw/Mn) 는 1.56 이었다. The silane compound copolymer (A4) had a weight average molecular weight (Mw) of 2,800 and a molecular weight distribution (Mw / Mn) of 1.56.
또, 실란 화합물 공중합체 (A4) 의 IR 스펙트럼 (푸리에 변환 적외 분광 광도계 (FT-IR)) 데이터를 이하에 나타낸다. The IR spectrum (Fourier transform infrared spectrophotometer (FT-IR)) data of the silane compound copolymer (A4) is shown below.
Si-Ph : 700 cm-1, 742 cm-1, Si-O : 1132 cm-1, 에폭시기 : 1254 cm-1 Si-Ph: 700 cm -1 , 742 cm -1 , Si-O: 1132 cm -1 , epoxy group: 1254 cm -1
(제조예 5) (Production Example 5)
300 ㎖ 의 가지형 플라스크에 실란 화합물 (2) 로서 페닐트리메톡시실란 (토쿄 화성 공업사 제조) 19.0 g (96 m㏖) 과, 실란 화합물 (1) 로서 3-클로로프로필트리메톡시실란 (토쿄 화성 공업사 제조) 4.77 g (24 m㏖), 용매로서 톨루엔 60 ㎖, 증류수 30 ㎖ 를 주입한 후, 교반하면서, 촉매로서 인산 (칸토 화학사 제조) 0.15 g (1.5 m㏖) 을 첨가하고, 실온에서 추가로 16 시간 교반을 계속하였다.19.0 g (96 mmol) of phenyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) as a silane compound (2) and 3-chloropropyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) (Manufactured by Kanto Chemical Co., Ltd.) (4.77 g, 24 mmol), 60 ml of toluene as a solvent and 30 ml of distilled water were charged, and 0.15 g (1.5 mmol) of phosphoric acid Followed by stirring for 16 hours.
반응 종료 후, 반응 혼합물에 아세트산에틸 100 ㎖ 를 첨가하고, 포화 탄산수소나트륨 수용액으로 중화시켰다. 잠시 가만히 정지시킨 후, 유기층을 분취하였다. 이어서, 유기층을 증류수로 2 회 세정한 후, 무수황산마그네슘으로 건조시켰다. 황산마그네슘을 여과 분리 후, 여과액을 다량의 n-헥산 중에 적하하여 재침전시키고, 헥산을 제거하여 침전물을 꺼냈다. 얻어진 침전물을 메틸에틸케톤에 용해시켜 회수하고, 이배퍼레이터로 용매를 감압 증류 제거하여, 진공 건조시킴으로써, 실란 화합물 공중합체 (A5) 13.6 g 을 얻었다.After completion of the reaction, 100 ml of ethyl acetate was added to the reaction mixture, and the mixture was neutralized with a saturated aqueous solution of sodium hydrogencarbonate. After a short pause, the organic layer was separated. Subsequently, the organic layer was washed twice with distilled water and then dried over anhydrous magnesium sulfate. The magnesium sulfate was separated by filtration, the filtrate was dripped into a large amount of n-hexane to reprecipitate, and hexane was removed to remove the precipitate. The obtained precipitate was dissolved in methyl ethyl ketone and recovered. The solvent was distilled off under reduced pressure using this distributor, and vacuum drying was conducted to obtain 13.6 g of the silane compound copolymer (A5).
실란 화합물 공중합체 (A5) 의 중량 평균 분자량 (Mw) 은 3,000, 분자량 분포 (Mw/Mn) 는 1.59 였다. The silane compound copolymer (A5) had a weight average molecular weight (Mw) of 3,000 and a molecular weight distribution (Mw / Mn) of 1.59.
또, 실란 화합물 공중합체 (A5) 의 IR 스펙트럼 데이터를 이하에 나타낸다. The IR spectrum data of the silane compound copolymer (A5) are shown below.
Si-Ph : 700 cm-1, 741 cm-1, Si-O : 1132 cm-1, -Cl : 648 cm-1 Si-Ph: 700 cm -1 , 741 cm -1 , Si-O: 1132 cm -1 , -Cl: 648 cm -1
(제조예 6)(Production Example 6)
제조예 5 에 있어서, 페닐트리메톡시실란의 사용량을 16.7 g (84 m㏖) 으로 하고, 3-클로로프로필트리메톡시실란의 사용량을 7.15 g (36 m㏖) 으로 한 것 이외에는 제조예 5 와 동일하게 하여, 실란 화합물 공중합체 (A6) 13.4 g 을 얻었다.The procedure of Preparation Example 5 was repeated except that the amount of phenyltrimethoxysilane used was changed to 16.7 g (84 mmol) and the amount of 3-chloropropyltrimethoxysilane to be used was changed to 7.15 g (36 mmol) In the same manner, 13.4 g of the silane compound copolymer (A6) was obtained.
실란 화합물 공중합체 (A6) 의 중량 평균 분자량 (Mw) 은 3,300, 분자량 분포 (Mw/Mn) 는 1.59 였다. The silane compound copolymer (A6) had a weight average molecular weight (Mw) of 3,300 and a molecular weight distribution (Mw / Mn) of 1.59.
또, 실란 화합물 공중합체 (A6) 의 IR 스펙트럼 데이터를 이하에 나타낸다. IR spectrum data of the silane compound copolymer (A6) are shown below.
Si-Ph : 700 cm-1, 742 cm-1, Si-O : 1133 cm-1, -Cl : 648 cm-1 Si-Ph: 700 cm -1 , 742 cm -1 , Si-O: 1133 cm -1 , -Cl: 648 cm -1
(제조예 7) (Production Example 7)
제조예 5 에 있어서, 페닐트리메톡시실란의 사용량을 14.3 g (72 m㏖) 으로 하고, 3-클로로프로필트리메톡시실란의 사용량을 9.54 g (48 m㏖) 으로 한 것 이외에는 제조예 5 와 동일하게 하여, 실란 화합물 공중합체 (A7) 13.0 g 을 얻었다.The procedure of Preparation Example 5 was repeated except that the amount of phenyltrimethoxysilane used was changed to 14.3 g (72 mmol) and the amount of 3-chloropropyltrimethoxysilane was changed to 9.54 g (48 mmol) In the same manner, 13.0 g of the silane compound copolymer (A7) was obtained.
실란 화합물 공중합체 (A7) 의 중량 평균 분자량 (Mw) 은 3,400, 분자량 분포 (Mw/Mn) 는 1.61 이었다. The silane compound copolymer (A7) had a weight average molecular weight (Mw) of 3,400 and a molecular weight distribution (Mw / Mn) of 1.61.
또, 실란 화합물 공중합체 (A7) 의 IR 스펙트럼 데이터를 이하에 나타낸다. The IR spectrum data of the silane compound copolymer (A7) are shown below.
Si-Ph : 699 cm-1, 741 cm-1, Si-O : 1132 cm-1, -Cl : 648 cm-1 Si-Ph: 699 cm -1 , 741 cm -1 , Si-O: 1132 cm -1 , -Cl: 648 cm -1
(제조예 8) (Preparation Example 8)
제조예 5 에 있어서, 페닐트리메톡시실란의 사용량을 11.9 g (60 m㏖) 으로 하고, 3-클로로프로필트리메톡시실란의 사용량을 11.9 g (60 m㏖) 으로 한 것 이외에는 제조예 5 와 동일하게 하여, 실란 화합물 공중합체 (A8) 12.9 g 을 얻었다.The procedure of Preparation Example 5 was repeated except that the amount of phenyltrimethoxysilane used was changed to 11.9 g (60 mmol) and the amount of 3-chloropropyltrimethoxysilane to be used was changed to 11.9 g (60 mmol) In the same manner, 12.9 g of the silane compound copolymer (A8) was obtained.
실란 화합물 공중합체 (A8) 의 중량 평균 분자량 (Mw) 은 3,600, 분자량 분포 (Mw/Mn) 는 1.63 이었다. The silane compound copolymer (A8) had a weight average molecular weight (Mw) of 3,600 and a molecular weight distribution (Mw / Mn) of 1.63.
또, 실란 화합물 공중합체 (A8) 의 IR 스펙트럼 데이터를 이하에 나타낸다. The IR spectrum data of the silane compound copolymer (A8) are shown below.
Si-Ph : 700 cm-1, 741 cm-1, Si-O : 1133 cm-1, -Cl : 648 cm-1 Si-Ph: 700 cm -1 , 741 cm -1 , Si-O: 1133 cm -1 , -Cl: 648 cm -1
(제조예 9)(Preparation Example 9)
제조예 5 에 있어서, 3-클로로프로필트리메톡시실란 4.77 g 대신에, 2-시아노에틸트리메톡시실란 (아즈맥스사 제조) 4.21 g (24 m㏖) 을 사용한 것 이외에는 제조예 5 와 동일하게 하여, 실란 화합물 공중합체 (A9) 13.5 g 을 얻었다.In the same manner as in Production Example 5 except that 4.21 g (24 mmol) of 2-cyanoethyltrimethoxysilane (Azumax) was used instead of 4.77 g of 3-chloropropyltrimethoxysilane in Production Example 5 To obtain 13.5 g of the silane compound copolymer (A9).
실란 화합물 공중합체 (A9) 의 중량 평균 분자량 (Mw) 은 2,900, 분자량 분포 (Mw/Mn) 는 1.58 이었다. The silane compound copolymer (A9) had a weight average molecular weight (Mw) of 2,900 and a molecular weight distribution (Mw / Mn) of 1.58.
또, 실란 화합물 공중합체 (A9) 의 IR 스펙트럼 데이터를 이하에 나타낸다. IR spectrum data of the silane compound copolymer (A9) are shown below.
Si-Ph : 700 cm-1, 741 cm-1, Si-O : 1131 cm-1, -CN : 2252 cm-1 Si-Ph: 700 cm -1 , 741 cm -1 , Si-O: 1131 cm -1 , -CN: 2252 cm -1
(제조예 10)(Preparation Example 10)
제조예 9 에 있어서, 페닐트리메톡시실란의 사용량을 16.7 g (84 m㏖) 으로 하고, 2-시아노에틸트리메톡시실란의 사용량을 6.31 g (36 m㏖) 으로 한 것 이외에는 제조예 9 와 동일하게 하여, 실란 화합물 공중합체 (A10) 13.3 g 을 얻었다.In Production Example 9, except that the amount of phenyltrimethoxysilane used was changed to 16.7 g (84 mmol) and the amount of 2-cyanoethyltrimethoxysilane to be used was changed to 6.31 g (36 mmol) , 13.3 g of the silane compound copolymer (A10) was obtained.
실란 화합물 공중합체 (A10) 의 중량 평균 분자량 (Mw) 은 3,200, 분자량 분포 (Mw/Mn) 는 1.64 였다. The silane compound copolymer (A10) had a weight average molecular weight (Mw) of 3,200 and a molecular weight distribution (Mw / Mn) of 1.64.
또, 실란 화합물 공중합체 (A10) 의 IR 스펙트럼 데이터를 이하에 나타낸다. IR spectrum data of the silane compound copolymer (A10) are shown below.
Si-Ph : 699 cm-1, 742 cm-1, Si-O : 1131 cm-1, -CN : 2253 cm-1 Si-Ph: 699 cm -1 , 742 cm -1 , Si-O: 1131 cm -1 , -CN: 2253 cm -1
(제조예 11) (Preparation Example 11)
제조예 9 에 있어서, 페닐트리메톡시실란의 사용량을 14.3 g (72 m㏖) 으로 하고, 2-시아노에틸트리메톡시실란의 사용량을 8.41 g (48 m㏖) 으로 한 것 이외에는 제조예 9 와 동일하게 하여, 실란 화합물 공중합체 (A11) 12.8 g 을 얻었다.In Production Example 9, except that the amount of phenyltrimethoxysilane used was changed to 14.3 g (72 mmol) and the amount of 2-cyanoethyltrimethoxysilane to be used was changed to 8.41 g (48 mmol) , 12.8 g of the silane compound copolymer (A11) was obtained.
실란 화합물 공중합체 (A11) 의 중량 평균 분자량 (Mw) 은 3,300, 분자량 분포 (Mw/Mn) 는 1.62 였다. The silane compound copolymer (A11) had a weight average molecular weight (Mw) of 3,300 and a molecular weight distribution (Mw / Mn) of 1.62.
또, 실란 화합물 공중합체 (A11) 의 IR 스펙트럼 데이터를 이하에 나타낸다. The IR spectrum data of the silane compound copolymer (A11) are shown below.
Si-Ph : 699 cm-1, 742 cm-1, Si-O : 1131 cm-1, -CN : 2253 cm-1 Si-Ph: 699 cm -1 , 742 cm -1 , Si-O: 1131 cm -1 , -CN: 2253 cm -1
(제조예 12) (Production Example 12)
제조예 9 에 있어서, 페닐트리메톡시실란의 사용량을 11.9 g (60 m㏖) 으로 하고, 2-시아노에틸트리메톡시실란의 사용량을 10.5 g (60 m㏖) 으로 한 것 이외에는 제조예 9 와 동일하게 하여, 실란 화합물 공중합체 (A12) 12.3 g 을 얻었다.In Production Example 9, except that the amount of phenyltrimethoxysilane used was changed to 11.9 g (60 mmol) and the amount of 2-cyanoethyltrimethoxysilane was changed to 10.5 g (60 mmol) , 12.3 g of the silane compound copolymer (A12) was obtained.
실란 화합물 공중합체 (A12) 의 중량 평균 분자량 (Mw) 은 3,500, 분자량 분포 (Mw/Mn) 는 1.61 이었다. The silane compound copolymer (A12) had a weight average molecular weight (Mw) of 3,500 and a molecular weight distribution (Mw / Mn) of 1.61.
또, 실란 화합물 공중합체 (A12) 의 IR 스펙트럼 데이터를 이하에 나타낸다. The IR spectrum data of the silane compound copolymer (A12) are shown below.
Si-Ph : 700 cm-1, 742 cm-1, Si-O : 1133 cm-1, -CN : 2252 cm-1 Si-Ph: 700 cm -1 , 742 cm -1 , Si-O: 1133 cm -1 , -CN: 2252 cm -1
(실시예 1) (Example 1)
제조예 1 에서 얻은 실란 화합물 공중합체 (A1) 10 g 에, 에폭시 화합물 (B) 로서 이소시아누레이트 골격을 갖는 에폭시 화합물 (닛산 화학 공업사 제조 TEPIC-PAS B26, 에폭시 당량 137 g/eq) (하기 제 1 표, 제 2 표 중, 「B1」이라고 기재한다) 1.5 g, 경화제 (C) 로서 4-메틸시클로헥산-1,2-디카르복실산 무수물 (토쿄 화성 공업사 제조) (하기 제 1 표, 제 2 표 중, 「C1」이라고 기재한다) 0.375 g 및 시클로헥산-1,2,4-트리카르복실산-1,2-무수물 (미츠비시 가스 화학사 제조) (카르복실기를 갖는 지환식 산무수물) (하기 제 1 표, 제 2 표 중, 「C2」라고 기재한다) 0.75 g, 그리고, 실란 커플링제 (D) 로서 3-트리에톡시실릴프로필 무수숙신산 (아즈맥스사 제조) (하기 제 1 표, 제 2 표 중, 「D1」이라고 기재한다) 0.375 g 을 첨가하고, 전체 용량을 충분히 혼합, 탈포함으로써, 경화성 조성물 (1) 을 얻었다.(TEPIC-PAS B26, epoxy equivalent weight: 137 g / eq) having an isocyanurate skeleton (manufactured by Nissan Chemical Industries, Ltd.) as an epoxy compound (B) 1.5 g of the curing agent (C), 4-methylcyclohexane-1,2-dicarboxylic acid anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) And 0.375 g of cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride (produced by Mitsubishi Gas Chemical Company, Inc. (alicyclic acid anhydride having a carboxyl group) 0.75 g of a silane coupling agent (hereinafter referred to as " C2 " in the first table and the second table) and 3-triethoxysilylpropylsuccinic anhydride (manufactured by Asmax) , &Quot; D1 " in the second table) was added, and the entire capacity was sufficiently mixed and removed to obtain a curable composition (1) was obtained.
(실시예 2 ∼ 7)(Examples 2 to 7)
하기 제 1 표 에 따라, 실란 화합물 공중합체, 에폭시 화합물, 경화제 및 실란 커플링제를 사용하고, 실시예 1 과 동일하게 하여, 경화성 조성물 (2) ∼ (7) 을 얻었다. (2) to (7) were obtained in the same manner as in Example 1 except that a silane compound copolymer, an epoxy compound, a curing agent and a silane coupling agent were used in accordance with the following Table 1.
또한, 하기 제 1 표, 제 2 표 중, 「B2」는 이소시아누레이트 골격을 갖는 에폭시 화합물 (닛산 화학 공업사 제조 TEPIC-PAS B22, 에폭시 당량 179 g/eq) 을 나타낸다.In the following Tables 1 and 2, "B2" represents an epoxy compound having an isocyanurate skeleton (TEPIC-PAS B22 manufactured by Nissan Chemical Industries, Ltd., epoxy equivalent: 179 g / eq).
(비교예 1, 2) (Comparative Examples 1 and 2)
하기 제 1 표 에 따라, 실란 화합물 공중합체, 에폭시 화합물, 경화제 및 실란 커플링제를 사용하여 실시예 1 과 동일하게 하여, 경화성 조성물 (8), (9) 를 얻었다.(8) and (9) were obtained in the same manner as in Example 1, using the silane compound copolymer, the epoxy compound, the curing agent and the silane coupling agent according to the following Table 1.
(비교예 3) (Comparative Example 3)
실시예 1 에 있어서, 에폭시 화합물 (B) 대신에, 3,4-에폭시시클로헥산카르복실산3,4-에폭시시클로헥실메틸 (시그마 알드리치사 제조) (하기 제 1 표, 제 2 표 중, 「BF1」이라고 기재한다) 1.5 g 을 사용한 것 이외에는, 실시예 1 과 동일하게 하여, 경화성 조성물 (10) 을 얻었다.Epoxycyclohexanecarboxylic acid 3,4-epoxycyclohexylmethyl (manufactured by Sigma Aldrich) (in Table 2, Table 2 below, "Quot; BF1 ") was used in place of the curable composition (10).
(비교예 4) (Comparative Example 4)
실시예 1 에 있어서, 제조예 1 에서 얻은 실란 화합물 공중합체 (A1) 대신에, 제조예 4 에서 얻은 실란 화합물 공중합체 (A4) 를 사용한 것 이외에는, 실시예 1 과 동일하게 하여, 경화성 조성물 (11) 을 얻었다.A curable composition (11) was obtained in the same manner as in Example 1, except that the silane compound copolymer (A4) obtained in Preparation Example 4 was used instead of the silane compound copolymer (A1) obtained in Preparation Example 1, ).
(비교예 5)(Comparative Example 5)
실시예 1 에 있어서, 실란 커플링제 (D1) 대신에, 3-글리시독시프로필트리메톡시실란 (토쿄 화성 공업사 제조) (하기 제 1 표, 제 2 표 중, 「DF1」라고 기재한다) 0.375 g 을 사용한 것 이외에는, 실시예 1 과 동일하게 하여, 경화성 조성물 (12) 를 얻었다.(Hereinafter referred to as " DF1 " in Table 2 below) 0.375 (trade name, manufactured by TOKYO CHEMICAL INDUSTRIES, LTD.) Was used in place of the silane coupling agent g, a curable composition (12) was obtained in the same manner as in Example 1.
(비교예 6) (Comparative Example 6)
실시예 1 의 실란 커플링제 (D1) 로서 오르토규산테트라메틸 (토쿄 화성 공업사 제조) (하기 제 1 표, 제 2 표 중, 「DF2」라고 기재한다) 0.375 g 을 사용한 것 이외에는, 실시예 1 과 동일하게 하여, 경화성 조성물 (13) 을 얻었다.Except that 0.375 g of tetramethyl orthosilicate (manufactured by Tokyo Chemical Industry Co., Ltd.) (hereinafter referred to as "DF2" in Table 1) was used as the silane coupling agent (D1) of Example 1. In the same manner, the curable composition (13) was obtained.
(실시예 8) (Example 8)
제조예 5 에서 얻은 실란 화합물 공중합체 (A5) 10 g 에, 에폭시 화합물 (B) 로서 이소시아누레이트 골격을 갖는 에폭시 화합물 (닛산 화학 공업사 제조 TEPIC-PAS B26, 에폭시 당량 137 g/eq) 1.5 g, 경화제 (C) 로서 4-메틸시클로헥산-1,2-디카르복실산 무수물 (토쿄 화성 공업사 제조) 0.38 g 및 시클로헥산-1,2,4-트리카르복실산-1,2-무수물 (미츠비시 가스 화학사 제조) 0.75 g, 그리고, 실란 커플링제 (D) 로서 3-트리에톡시실릴프로필 무수숙신산 (아즈맥스사 제조) 0.38 g 을 첨가하고, 전체 용량을 충분히 혼합, 탈포함으로써, 경화성 조성물 (14) 를 얻었다.1.5 g of an epoxy compound having an isocyanurate skeleton (TEPIC-PAS B26, manufactured by Nissan Chemical Industries, Ltd., epoxy equivalent: 137 g / eq) as an epoxy compound (B) was added to 10 g of the silane compound copolymer , 0.38 g of 4-methylcyclohexane-1,2-dicarboxylic acid anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) as a curing agent (C), and 0.38 g of cyclohexane-1,2,4-tricarboxylic acid-1,2-anhydride (Manufactured by Mitsubishi Gas Chemical Company, Ltd.) and 0.38 g of 3-triethoxysilylpropylsuccinic anhydride (manufactured by Ajax) as a silane coupling agent (D) were added, (14).
(실시예 9 ∼ 15, 비교예 7 ∼ 16) (Examples 9 to 15 and Comparative Examples 7 to 16)
하기 제 2 표 에 따라, 실란 화합물 공중합체, 에폭시 화합물, 경화제 및 실란 커플링제를 사용하여 실시예 8 과 동일하게 하여, 경화성 조성물 (15) ∼ (31) 을 얻었다.The curable compositions (15) to (31) were obtained in the same manner as in Example 8, using the silane compound copolymer, the epoxy compound, the curing agent and the silane coupling agent according to the following Table 2.
실시예 1 ∼ 15 및 비교예 1 ∼ 16 에서 얻은 경화성 조성물 1 ∼ 31 의 경화물에 대해, 하기와 같이 하여, 접착력, 초기 투과율, 및 가열 후의 투과율을 측정하였다. The cured products of the curable compositions 1 to 31 obtained in Examples 1 to 15 and Comparative Examples 1 to 16 were measured for adhesive force, initial transmittance, and transmittance after heating as follows.
측정 결과를 하기 제 3 표, 제 4 표 에 나타낸다.The measurement results are shown in Tables 3 and 4 below.
(접착력 시험) (Adhesion test)
2 ㎜ 의 사각 실리콘 칩의 미러면에, 경화성 조성물 1 ∼ 31 의 각각을 두께가 약 2 ㎛ 가 되도록 도포하고, 도포면을 피착체 (은도금 구리판) 상에 실어 압착하였다. 그 후, 180 ℃ 에서 2 시간 가열 처리하여 경화시켜 시험편 부착 피착체를 얻었다. 이 시험편 부착 피착체를, 미리 소정 온도 (23 ℃, 100 ℃) 로 가열한 본드 테스터 (시리즈 4000, 데이지사 제조) 의 측정 스테이지 상에 30 초간 방치하고, 피착체에서 50 ㎛ 높이의 위치로부터, 스피드 200 ㎛/s 로 접착면에 대해 수평 방향 (전단 방향) 으로 응력을 가하여 23 ℃ 및 100 ℃ 에 있어서의, 시험편과 피착체의 접착력 (N/2 ㎜□) 을 측정하였다.Each of the curable compositions 1 to 31 was coated on the mirror surface of a square silicon chip of 2 mm so as to have a thickness of about 2 占 퐉 and the coated surface was placed on an adherend (silver plated copper plate) and pressed. Thereafter, it was heat-treated at 180 캜 for 2 hours and cured to obtain an adherend with a test piece. This adherend adhered to the test piece was allowed to stand for 30 seconds on a measuring stage of a bond tester (Series 4000, manufactured by Daisy Ltd.) previously heated to a predetermined temperature (23 ° C, 100 ° C) (N / 2 mm?) Between the test piece and the adherend at 23 占 폚 and 100 占 폚 was measured by applying a stress in the horizontal direction (shear direction) to the adhesive surface at a speed of 200 占 퐉 / s.
(접착 내열성)(Adhesive heat resistance)
접착력 시험에 있어서, 100 ℃ 에 있어서의 접착력이, 23 ℃ 에 있어서의 접착력의 50 % 이상인 경우를 「○」, 50 % 미만인 경우를 「×」로 평가하였다.In the adhesive strength test, the case where the adhesive force at 100 占 폚 was 50% or more of the adhesive force at 23 占 폚 was evaluated as?, And the case where the adhesive force was less than 50% was evaluated as?.
(초기 투과율의 측정)(Measurement of initial transmittance)
경화성 조성물 1 ∼ 31 의 각각을, 길이 25 ㎜, 폭 20 ㎜, 두께 1 ㎜ 가 되도록 주형에 흘려넣고, 140 ℃ 에서 6 시간 가열하여 경화시켜, 시험편을 각각 제작하였다. 얻어진 시험편에 대해, 분광 광도계 (MPC-3100, 시마즈 제작소사 제조) 로, 파장 400 ㎚, 450 ㎚ 의 초기 투과율 (%) 을 측정하였다.Each of the curable compositions 1 to 31 was poured into a mold so as to have a length of 25 mm, a width of 20 mm and a thickness of 1 mm and cured by heating at 140 占 폚 for 6 hours to prepare test pieces. The initial transmittance (%) at a wavelength of 400 nm and 450 nm was measured with a spectrophotometer (MPC-3100, manufactured by Shimadzu Corporation).
(초기 투명성)(Initial transparency)
초기 투과율 측정에 있어서, 400 ㎚ 의 투과율이 80 % 이상을 「○」, 70 % 이상 80 % 미만을 「△」, 70 % 미만을 「×」로 평가하였다.In the initial transmittance measurement, 80% or more of transmittance at 400 nm was evaluated as " ", 70% or more and less than 80% were evaluated as " DELTA "
(가열 후의 투과율의 측정)(Measurement of transmittance after heating)
초기 투과율을 측정한 각 시험편을 150 ℃ 의 오븐에 500 시간 투입하고, 다시 파장 400 ㎚, 450 ㎚ 의 투과율 (%) 을 측정하였다. 이것을 가열 후 투과율로 하였다.Each test piece having the initial transmittance measured was placed in an oven at 150 ° C for 500 hours, and the transmittance (%) of the wavelength 400 nm and 450 nm was measured again. This was taken as the transmittance after heating.
[내열성 (가열 후 투명성)] [Heat resistance (transparency after heating)]
가열 후 투과율 측정에 있어서, 400 ㎚ 의 투과율이, 초기 투과율의 80 % 이상이면 「○」, 70 % 이상 80 % 미만이면 「△」, 70 % 미만이면 「×」로 평가하였다.In the measurement of the transmittance after heating, the transmittance of 400 nm was evaluated as "? &Quot; when the transmittance was 80% or more of the initial transmittance,? When the transmittance was 70% or more and less than 80%
제 3 표, 제 4 표 로부터, 실시예 1 ∼ 15 의 경화성 조성물 (1 ∼ 7, 14 ∼ 21) 의 경화물은, 23 ℃ 에 있어서 134 N/2 ㎜□ 이상의 높은 접착력을 갖고, 고온 (100 ℃) 에 있어서도, 23 ℃ 에 있어서의 접착력의 58 % 이상의 접착력을 유지하고, 접착 내열성이 우수하였다. 또, 파장 400 ㎚, 450 ㎚ 의 초기 투과율, 가열 후 투과율이 모두 높고, 초기 투명성, 내열성 (가열 후 투명성) 이 우수한 것이었다.From the Tables 3 and 4, the cured products of the curable compositions (1 to 7, 14 to 21) of Examples 1 to 15 had a high adhesive strength of 134 N / 2 mm □ or more at 23 ° C, ° C.), an adhesive strength of 58% or more of the adhesive strength at 23 ° C. was maintained, and the adhesive heat resistance was excellent. In addition, the initial transmittance at 400 nm and 450 nm and the transmittance after heating were all high, and the initial transparency and heat resistance (transparency after heating) were excellent.
한편, 비교예 1, 5 ∼ 7, 10 ∼ 12, 15, 16 의 경화성 조성물 (8, 12, 13, 22, 25 ∼ 27, 30, 31) 의 경화물은 초기 투명성이 떨어졌다. 비교예 2, 8, 13 의 경화성 조성물 (9, 23, 28) 의 경화물은 접착력, 접착 내열성 모두 떨어져, 비교예 3, 4, 9, 14 의 경화성 조성물 (10, 11, 24, 29) 의 경화물은 현저하게 내열성 (가열 후 투명성) 이 떨어졌다.On the other hand, the cured products of the curable compositions (8, 12, 13, 22, 25 to 27, 30, 31) of Comparative Examples 1, 5 to 7, 10 to 12, The cured products of the curable compositions (9, 23, 28) of Comparative Examples 2, 8 and 13 were lower in adhesive strength and adhesive heat resistance and the cured products of Comparative Examples 3, 4, 9 and 14 The cured product was remarkably poor in heat resistance (transparency after heating).
Claims (13)
[화학식 1]
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다. 상기 수산기의 보호기는, 아실계 보호기, 실릴계 보호기, 아세탈계 보호기, 알콕시카르보닐계 보호기, 또는 에테르계 보호기이다.) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. 상기 연결기는, 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 1 ~ 20 의 알킬렌기; 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 2 ~ 20 의 알케닐렌기; 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 2 ~ 20 의 알키닐렌기; 시아노기, 니트로기, 할로겐 원자, 알킬기, 알콕시기, 혹은 알킬티오기로 치환될 수 있는, 탄소수 6 ~ 20 의 아릴렌기; 또는 상기 아릴렌기와, 상기 알킬렌기, 알케닐렌기, 혹은 알키닐렌기의 조합으로 이루어지는 기 이다. R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타낸다.]
로 나타내는 반복 단위 중, (i) 및 (ii), (i) 및 (iii), (ii) 및 (iii), 또는 (i), (ii) 및 (iii) 의 반복 단위를 갖고, 중량 평균 분자량이 1,000 ∼ 30,000 인 실란 화합물 공중합체,
(B) 하기 식 (c-1), (c-2), (c-3) 으로 나타내는 이소시아누레이트 골격을 갖는 에폭시 화합물 중 어느 1 종, 또는 이들의 화합물의 2 종 이상을 포함하는 혼합물,
[화학식 2]
[상기 식 중, E 는 하기에 나타내는 어느 기를 나타내고, R 은 수소 원자, 또는 에폭시 고리를 갖는 기 이외의 유기기를 나타낸다.
[화학식 3]
(식 중, a, b, c 는 각각 1 ~ 20 의 정수를 나타내고, 메틸렌기에는, 알킬기가 치환되어 있어도 된다.)]
(C) 카르복실기를 갖는 지환식 산무수물 및 카르복실기를 갖지 않는 지환식 산무수물로부터 선택되는 1 종 또는 2 종 이상으로 이루어지고, 그 질량비가 (카르복실기를 갖는 지환식 산무수물) : (카르복실기를 갖지 않는 지환식 산무수물) = 100 : 0 ∼ 10 : 90 인 경화제, 그리고
(D) 하기 식 (d) 로 나타내는 산무수물 구조를 갖는 실란 커플링제
[화학식 4]
(식 중, Y 는 산무수물 구조를 갖는 기를 나타내고, Ra 는 탄소수 1 ∼ 6 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, Rb 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, i 는 1 ∼ 3 의 정수를 나타내고, j 는 0 ∼ 2 의 정수를 나타내고, k 는 1 ∼ 3 의 정수를 나타내고, i+j+k = 4 이다.)
를 함유하는 경화성 조성물로서,
상기 (A), (B), (C) 및 (D) 성분의 함유 비율이, (A) 와 [(B)+(C)+(D)] 의 질량비로, (A) : [(B)+(C)+(D)] = 90 : 10 ~ 50 : 50 이고, 상기 (B), (C) 및 (D) 성분의 함유 비율이, [(B)+(C)] 와 (D) 의 질량비로, [(B)+(C)] : (D) = 90 : 10 ~ 10 : 90 인 경화성 조성물.(I), (ii) and (iii) in the molecule (A)
[Chemical Formula 1]
Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms and X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group of a hydroxyl group) Is an acyl group protecting group, a silyl group protecting group, an acetal group protecting group, an alkoxycarbonyl group protecting group, or an ether protecting group), and D represents a single bond or a linking group. The linking group is an alkylene group having 1 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An alkenylene group having 2 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An alkynylene group having 2 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An arylene group having 6 to 20 carbon atoms which may be substituted with a cyano group, a nitro group, a halogen atom, an alkyl group, an alkoxy group or an alkylthio group; Or a group formed by combining the arylene group and the alkylene group, alkenylene group, or alkynylene group. R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent.]
(I) and (ii), (i) and (iii), (ii) and (iii) or repeating units (i), (ii) and (iii) A silane compound copolymer having a molecular weight of 1,000 to 30,000,
(B) an epoxy compound having an isocyanurate skeleton represented by the following formula (c-1), (c-2) or (c-3), or a mixture comprising two or more of these compounds ,
(2)
[Wherein E represents any group shown below, and R represents an organic group other than a hydrogen atom or a group having an epoxy ring.
(3)
(Wherein a, b, and c each represent an integer of 1 to 20, and the methylene group may be substituted with an alkyl group.)]
(C) an alicyclic acid anhydride having a carboxyl group and an alicyclic acid anhydride having no carboxyl group, and having a mass ratio of (alicyclic acid anhydride having a carboxyl group): Alicyclic acid anhydride) = 100: 0 to 10: 90, and
(D) a silane coupling agent having an acid anhydride structure represented by the following formula (d)
[Chemical Formula 4]
(Wherein, Y represents a group having an acid anhydride structure, R a represents a phenyl group which may have an alkyl group or a substituent having a carbon number of 1 ~ 6, R b represents an alkyl group having 1 ~ 6, i is 1 to 3 J represents an integer of 0 to 2, k represents an integer of 1 to 3, and i + j + k = 4).
As a curing composition,
Wherein the content ratio of the components (A), (B), (C) and (D) is in the range of mass ratio of (A) to (B) + (C) + (B) + (C) + (D)] = 90: 10 to 50: 50 and the content ratio of the components (B) (B) + (C): (D) = 90: 10 to 10: 90 in terms of mass ratio.
상기 (A) 의 실란 화합물 공중합체가, 식 : R1-CH(XO)-D- 로 나타내는 기의 존재량 ([R1-CH(XO)-D]) 과 R2 의 존재량 ([R2]) 의 몰비로, [R1-CH(XO)-D]:[R2] = 60:40 ∼ 5:95 의 실란 화합물 공중합체인 경화성 조성물.The method according to claim 1,
The silane compound in the copolymer (A), formula: R existing amount of the group represented by 1 -CH (X O) -D- ( [R 1 -CH (X O) -D]) and the amount present in R 2 ([R 2]) in a molar ratio, [R 1 -CH (X O ) -D] of: [R 2] = 60:40 ~ silane compound copolymer composition of the curable 5:95.
[식 중, R1 은 수소 원자 또는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X0 은 할로겐 원자, 시아노기 또는 식 : OG 로 나타내는 기 (식 중, G 는 수산기의 보호기를 나타낸다. 상기 수산기의 보호기는, 아실계 보호기, 실릴계 보호기, 아세탈계 보호기, 알콕시카르보닐계 보호기, 또는 에테르계 보호기이다.) 를 나타내고, D 는 단결합 또는 연결기를 나타낸다. 상기 연결기는, 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 1 ~ 20 의 알킬렌기; 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 2 ~ 20 의 알케닐렌기; 할로겐 원자, 알콕시기, 알킬티오기, 혹은 알콕시카르보닐기로 치환될 수 있는, 탄소수 2 ~ 20 의 알키닐렌기; 시아노기, 니트로기, 할로겐 원자, 알킬기, 알콕시기, 혹은 알킬티오기로 치환될 수 있는, 탄소수 6 ~ 20 의 아릴렌기; 또는 상기 아릴렌기와, 상기 알킬렌기, 알케닐렌기, 혹은 알키닐렌기의 조합으로 이루어지는 기 이다.) 를 나타낸다. R3 은 탄소수 1 ∼ 6 의 알킬기를 나타내고, X1 은 할로겐 원자를 나타내고, p 는 0 ∼ 3 의 정수를 나타낸다.]
로 나타내는 실란 화합물 (1) 의 적어도 1 종, 및
식 (2) : R2Si(OR4)q(X2)3-q
(식 중, R2 는 탄소수 1 ∼ 20 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, R4 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, X2 는 할로겐 원자를 나타내고, q 는 0 ∼ 3 의 정수를 나타낸다)
로 나타내는 실란 화합물 (2) 의 적어도 1 종을 함유하는 실란 화합물의 혼합물을 축합시켜 얻어지는, 중량 평균 분자량이 1,000 ∼ 30,000 인 실란 화합물 공중합체,
(B) 하기 식 (c-1), (c-2), (c-3) 으로 나타내는 이소시아누레이트 골격을 갖는 에폭시 화합물 중 어느 1 종, 또는 이들의 화합물의 2 종 이상을 포함하는 혼합물,
[화학식 5]
[상기 식 중, E 는 하기에 나타내는 어느 기를 나타내고, R 은 수소 원자, 또는 에폭시 고리를 갖는 기 이외의 유기기를 나타낸다.
[화학식 6]
(식 중, a, b, c 는 각각 1 ~ 20 의 정수를 나타내고, 메틸렌기에는, 알킬기가 치환되어 있어도 된다.)]
(C) 카르복실기를 갖는 지환식 산무수물 및 카르복실기를 갖지 않는 지환식 산무수물로부터 선택되는 1 종 또는 2 종 이상으로 이루어지고, 그 질량비가 (카르복실기를 갖는 지환식 산무수물) : (카르복실기를 갖지 않는 지환식 산무수물) = 100 : 0 ∼ 10 : 90 인 경화제, 그리고
(D) 하기 식 (d) 로 나타내는 산무수물 구조를 갖는 실란 커플링제
[화학식 7]
(식 중, Y 는 산무수물 구조를 갖는 기를 나타내고, Ra 는 탄소수 1 ∼ 6 의 알킬기 또는 치환기를 갖고 있어도 되는 페닐기를 나타내고, Rb 는 탄소수 1 ∼ 6 의 알킬기를 나타내고, i 는 1 ∼ 3 의 정수를 나타내고, j 는 0 ∼ 2 의 정수를 나타내고, k 는 1 ∼ 3 의 정수를 나타내고, i+j+k = 4 이다.)
를 함유하는 경화성 조성물로서,
상기 (A'), (B), (C) 및 (D) 성분의 함유 비율이, (A') 와 [(B)+(C)+(D)] 의 질량비로, (A') : [(B)+(C)+(D)] = 90 : 10 ~ 50 : 50 이고, 상기 (B), (C) 및 (D) 성분의 함유 비율이, [(B)+(C)] 와 (D) 의 질량비로, [(B)+(C)] : (D) = 90 : 10 ~ 10 : 90 인 경화성 조성물.(A ') ???????? R 1 -CH (X O ) -D-Si (OR 3 ) p (X 1 ) 3-p ?????
Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms and X 0 represents a halogen atom, a cyano group or a group represented by the formula: OG (wherein G represents a protecting group of a hydroxyl group) Is an acyl group protecting group, a silyl group protecting group, an acetal group protecting group, an alkoxycarbonyl group protecting group, or an ether protecting group), and D represents a single bond or a linking group. The linking group is an alkylene group having 1 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An alkenylene group having 2 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An alkynylene group having 2 to 20 carbon atoms which may be substituted with a halogen atom, an alkoxy group, an alkylthio group, or an alkoxycarbonyl group; An arylene group having 6 to 20 carbon atoms which may be substituted with a cyano group, a nitro group, a halogen atom, an alkyl group, an alkoxy group or an alkylthio group; Or a group formed by combining the arylene group and the alkylene group, alkenylene group, or alkynylene group). R 3 represents an alkyl group having 1 to 6 carbon atoms, X 1 represents a halogen atom, and p represents an integer of 0 to 3.
At least one silane compound (1) represented by the formula
???????? R 2 Si (OR 4 ) q (X 2 ) 3-q ?????
(Wherein R 2 represents an alkyl group having 1 to 20 carbon atoms or a phenyl group which may have a substituent, R 4 represents an alkyl group having 1 to 6 carbon atoms, X 2 represents a halogen atom, and q represents an integer of 0 to 3 Lt; / RTI &
A silane compound copolymer having a weight average molecular weight of 1,000 to 30,000, which is obtained by condensing a mixture of a silane compound containing at least one kind of silane compound (2)
(B) an epoxy compound having an isocyanurate skeleton represented by the following formula (c-1), (c-2) or (c-3), or a mixture comprising two or more of these compounds ,
[Chemical Formula 5]
[Wherein E represents any group shown below, and R represents an organic group other than a hydrogen atom or a group having an epoxy ring.
[Chemical Formula 6]
(Wherein a, b, and c each represent an integer of 1 to 20, and the methylene group may be substituted with an alkyl group.)]
(C) an alicyclic acid anhydride having a carboxyl group and an alicyclic acid anhydride having no carboxyl group, and having a mass ratio of (alicyclic acid anhydride having a carboxyl group): Alicyclic acid anhydride) = 100: 0 to 10: 90, and
(D) a silane coupling agent having an acid anhydride structure represented by the following formula (d)
(7)
(Wherein, Y represents a group having an acid anhydride structure, R a represents a phenyl group which may have an alkyl group or a substituent having a carbon number of 1 ~ 6, R b represents an alkyl group having 1 ~ 6, i is 1 to 3 J represents an integer of 0 to 2, k represents an integer of 1 to 3, and i + j + k = 4).
As a curing composition,
The content ratio of the components (A '), (B), (C) and (D) is preferably in the range of (A'): (B) + (C) + (D)] is 90:10 to 50:50, and the content ratio of the components (B), (C) (B) + (C): (D) = 90: 10 to 10: 90 in terms of mass ratio of (D) to (D).
상기 (A') 의 실란 화합물 공중합체가, 실란 화합물 (1) 과 실란 화합물 (2) 를 몰비로, [실란 화합물 (1)]:[실란 화합물 (2)] = 60:40 ∼ 5:95 의 비율로 축합시켜 얻어지는 것인 경화성 조성물.The method of claim 3,
The silane compound (1) and the silane compound (2) are mixed in the molar ratio of the silane compound (1) to the silane compound (2) in the ratio of 60:40 to 5:95 Based on the total weight of the curable composition.
상기 (B) 가, 글리시딜이소시아누레이트, 디글리시딜이소시아누레이트, 트리스(2,3-에폭시프로필)이소시아누레이트, 트리스(글리시독시프로필)이소시아누레이트, 트리스(α-메틸글리시딜)이소시아누레이트, 또는 이들의 화합물의 2 종 이상을 함유하는 혼합물인 것을 특징으로 하는 경화성 조성물.The method according to claim 1 or 3,
(B) is at least one selected from the group consisting of glycidyl isocyanurate, diglycidyl isocyanurate, tris (2,3-epoxypropyl) isocyanurate, tris (glycidoxypropyl) isocyanurate, tris (? -methyl glycidyl) isocyanurate, or a mixture containing two or more of these compounds.
상기 (C) 에 있어서, 카르복실기를 갖는 지환식 산무수물의 지환식 산무수물이, 3-메틸-1,2,3,6-테트라하이드로 무수프탈산, 4-메틸-1,2,3,6-테트라하이드로 무수프탈산, 테트라하이드로 무수프탈산, 3-메틸-헥사하이드로 무수프탈산, 4-메틸-헥사하이드로 무수프탈산, 헥사하이드로 무수프탈산, 무수메틸나딕산, 5-노르보르넨-2,3-디카르복실산 무수물, 노르보르난-2,3-디카르복실산 무수물, 메틸-5-노르보르넨-2,3-디카르복실산 무수물, 또는 메틸-노르보르난-2,3-디카르복실산 무수물인 것을 특징으로 하는 경화성 조성물.The method according to claim 1 or 3,
In the above (C), the alicyclic acid anhydride of the alicyclic acid anhydride having a carboxyl group is preferably 3-methyl-1,2,3,6-tetrahydrophthalic anhydride, 4-methyl- Tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methylhexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, hexahydrophthalic anhydride, methylnadic anhydride, 5-norbornene-2,3-dicar Norbornane-2,3-dicarboxylic acid anhydride, methyl-5-norbornene-2,3-dicarboxylic acid anhydride, or methyl-norbornane- Lt; / RTI > acid anhydride.
상기 (C) 에 있어서, 카르복실기를 갖지 않는 지환식 산무수물의 지환식 산무수물이, 3-메틸-1,2,3,6-테트라하이드로 무수프탈산, 4-메틸-1,2,3,6-테트라하이드로 무수프탈산, 테트라하이드로 무수프탈산, 3-메틸-헥사하이드로 무수프탈산, 4-메틸-헥사하이드로 무수프탈산, 헥사하이드로 무수프탈산, 무수메틸나딕산, 5-노르보르넨-2,3-디카르복실산 무수물, 노르보르난-2,3-디카르복실산 무수물, 메틸-5-노르보르넨-2,3-디카르복실산 무수물, 또는 메틸-노르보르난-2,3-디카르복실산 무수물인 것을 특징으로 하는 경화성 조성물.The method according to claim 1 or 3,
In the above (C), the alicyclic acid anhydride of an alicyclic acid anhydride having no carboxyl group is preferably 3-methyl-1,2,3,6-tetrahydrophthalic anhydride, 4-methyl-1,2,3,6 -Tetrahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methyl-hexahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, hexahydrophthalic anhydride, methylnadic anhydride, 5-norbornene-2,3-dicar Norbornane-2,3-dicarboxylic acid anhydride, methyl-5-norbornene-2,3-dicarboxylic acid anhydride, or methyl-norbornane-2,3-dicarboxylic acid anhydride, Wherein the curing agent is a carboxylic acid anhydride.
광소자 고정재용 조성물인 경화성 조성물.The method according to claim 1 or 3,
A curable composition which is a composition for optical element fixing.
광소자 고정재인 경화물.10. The method of claim 9,
Cured article which is optical element fixing material.
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WO2009104505A1 (en) * | 2008-02-19 | 2009-08-27 | リンテック株式会社 | Adhesive mainly composed of polyorganosiloxane compound |
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TW201141952A (en) | 2011-12-01 |
KR20130034005A (en) | 2013-04-04 |
CN102906198B (en) | 2014-10-29 |
CN102906198A (en) | 2013-01-30 |
JPWO2011111667A1 (en) | 2013-06-27 |
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TWI504681B (en) | 2015-10-21 |
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