KR101765987B1 - 태양 전지 및 그 제조 방법 - Google Patents
태양 전지 및 그 제조 방법 Download PDFInfo
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- KR101765987B1 KR101765987B1 KR1020140007717A KR20140007717A KR101765987B1 KR 101765987 B1 KR101765987 B1 KR 101765987B1 KR 1020140007717 A KR1020140007717 A KR 1020140007717A KR 20140007717 A KR20140007717 A KR 20140007717A KR 101765987 B1 KR101765987 B1 KR 101765987B1
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- 238000004519 manufacturing process Methods 0.000 title abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 150000001875 compounds Chemical class 0.000 claims description 46
- 230000031700 light absorption Effects 0.000 claims description 26
- 239000013078 crystal Substances 0.000 claims description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 14
- 238000000231 atomic layer deposition Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 5
- 239000011593 sulfur Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 description 16
- 239000002243 precursor Substances 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 229910052733 gallium Inorganic materials 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005457 optimization Methods 0.000 description 4
- 238000010248 power generation Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910052793 cadmium Inorganic materials 0.000 description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- WHXTVQNIFGXMSB-UHFFFAOYSA-N n-methyl-n-[tris(dimethylamino)stannyl]methanamine Chemical compound CN(C)[Sn](N(C)C)(N(C)C)N(C)C WHXTVQNIFGXMSB-UHFFFAOYSA-N 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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Abstract
Description
도 2 내지 4는 본 발명의 실시 예에 따른 태양 전지 및 그 제조 방법을 설명하기 위한 공정 단면도들이다.
도 5는 본 발명의 실시 예에 따른 태양 전지에 포함된 광 흡수층 및 버퍼층의 특성을 설명하기 위한 XRD 그래프이다.
도 6은 본 발명의 실시 예에 따른 태양 전지에 포함된 광 흡수층 및 버퍼층의 특성을 설명하기 위한 TEM 회절 패턴이다.
도 7은 본 발명의 실시 예에 따른 태양 전지에 포함된 광 흡수층 및 버퍼층의 광 투과도를 설명하기 위한 그래프이다.
도 8은 본 발명의 실시 예에 따른 태양 전지에 포함된 광 흡수층 및 버퍼층의 광 밴드 갭을 설명하기 위한 그래프이다.
도 9는 본 발명의 실시 예들에 따른 태양전지를 사용하는 태양전지 어레이를 설명하기 위한 도면이다.
도 10은 본 발명의 실시 예들에 따른 태양전지를 사용하는 태양광 발전시스템의 예를 설명하기 위한 도면이다.
110: 하부 전극층
120: 광 흡수층
130: 버퍼층
140: 윈도우층
150: 상부 전극층
Claims (16)
- 챔버 내에 기판의 준비하는 단계;
상기 챔버 내의 온도를 제1 온도로 설정하고, 상기 챔버 내에 제1 소스를 공급하여, 원자층 증착법으로, 상기 기판 상에 광 흡수층을 형성하는 단계;
상기 광 흡수층을 형성하는 공정 조건과 동일한 공정 조건에서, 상기 챔버 내의 온도를 상기 제1 온도보다 낮은 제2 온도로 설정하고, 상기 챔버 내에 상기 제1 소스를 공급하여, 원자층 증착법으로, 상기 기판 상에 버퍼층을 형성하는 단계; 및
상기 챔버 내에 상기 제1 소스와 다른 제2 소스를 공급하여, 원자층 증착법으로, 상기 기판 상에 윈도우층을 형성하는 단계를 포함하는 태양 전지의 제조 방법.
- 제1 항에 있어서,
상기 제1 소스는, 주석(Sn) 및 황(S)을 포함하고,
상기 제2 소스는, 주석(Sn), 및 산소(O)를 포함하는 태양 전지의 제조 방법.
- 제1 항에 있어서,
상기 버퍼층을 형성하는 단계는,
상기 제1 소스를 공급하기 전 또는 후, 상기 제2 소스를 상기 챔버 내에 공급하는 것을 더 포함하는 태양 전지의 제조 방법.
- 기판을 준비하는 단계;
제1 온도에서 상기 기판 상에, 원자층 증착법으로, 광 흡수층을 형성하는 단계;
상기 광 흡수층을 형성하는 공정 조건과 동일한 공정 조건을 갖되, 상기 제1 온도와 다른 제2 온도에서, 원자층 증착법으로, 상기 광 흡수층 상에 버퍼층을 형성하는 단계; 및
원자층 증착법으로, 상기 버퍼층 상에 윈도우층을 형성하는 단계를 포함하되,
상기 광 흡수층은, 상기 제1 온도에서 제1 소스가 공급되어 형성된 제1 화합물을 포함하고,
상기 버퍼층은, 상기 제2 온도에서 상기 제1 소스가 공급되어 형성된 제2 화합물을 포함하되,
상기 제2 화합물은, 상기 제1 화합물을 구성하는 원소와 동일한 원소를 포함하되 상기 제1 화합물과 다른 조성비를 갖는 태양 전지의 제조 방법.
- 제4 항에 있어서,
상기 제2 온도는 상기 제1 온도보다 낮은 것을 포함하는 태양 전지의 제조 방법.
- 삭제
- 제4 항에 있어서,
상기 제1 화합물은 SnS를 포함하고,
상기 제2 화합물은 SnS2를 포함하는 태양 전지의 제조 방법.
- 제4 항에 있어서,
상기 버퍼층을 형성하는 단계는,
상기 제1 소스에 포함된 금속과 동일한 금속, 및 상기 제1 소스에 포함된 반응가스와 다른 반응가스를 포함하는 제2 소스를 제공하는 것을 더 포함하는 태양 전지의 제조 방법.
- 제8 항에 있어서,
상기 버퍼층은, 상기 제1 소스에 의해 형성된 SnS2, 및 상기 제2 소스 의해 형성된 SnO2를 포함하는 태양 전지의 제조 방법.
- 제4 항에 있어서,
상기 광 흡수층, 상기 버퍼층, 및 상기 윈도우층은 동일한 챔버 내에서 형성되는 것을 포함하는 태양 전지의 제조 방법.
- 제4 항에 있어서,
상기 광 흡수층, 상기 버퍼층, 및 상기 윈도우층은 건식 공정으로 형성되는 것을 포함하는 태양 전지의 제조 방법.
- 기판 상에 배치되고, 제1 화합물을 포함하는 광 흡수층;
상기 광 흡수층 상에 배치되고, 상기 제1 화합물을 구성하는 원소와 동일한 원소를 포함하되 상기 제1 화합물과 다른 조성비를 갖는 제2 화합물을 포함하는 버퍼층; 및
상기 버퍼층 상의 윈도우층을 포함하되,
상기 윈도우층 및 상기 버퍼층은 상기 제1 화합물 및 상기 제2 화합물에 포함된 금속 원소의 산화물을 포함하는 태양 전지.
- 제12 항에 있어서,
상기 광 흡수층 및 상기 버퍼층은 서로 다른 결정 구조(crystal structure)를 갖는 것을 포함하는 태양 전지.
- 제13 항에 있어서,
상기 광 흡수층은 사방정계(orthorhombic) 결정 구조를 갖고,
상기 버퍼층은 육방정계(hexagonal) 결정 구조를 갖는 것을 포함하는 태양 전지.
- 제12 항에 있어서,
상기 제1 화합물은 SnS를 포함하고,
상기 제2 화합물은 SnS2를 포함하는 태양 전지.
- 삭제
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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KR1020140007717A KR101765987B1 (ko) | 2014-01-22 | 2014-01-22 | 태양 전지 및 그 제조 방법 |
US14/602,732 US9466744B2 (en) | 2014-01-22 | 2015-01-22 | Solar cell and method of fabricating the same |
US15/258,367 US9666737B2 (en) | 2014-01-22 | 2016-09-07 | Solar cell and method of fabricating the same |
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KR1020140007717A KR101765987B1 (ko) | 2014-01-22 | 2014-01-22 | 태양 전지 및 그 제조 방법 |
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KR20150087874A KR20150087874A (ko) | 2015-07-31 |
KR101765987B1 true KR101765987B1 (ko) | 2017-08-08 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060180200A1 (en) * | 2003-05-08 | 2006-08-17 | Charlotte Platzer Bjorkman | Thin-film solar cell |
JP2007035677A (ja) | 2005-07-22 | 2007-02-08 | Honda Motor Co Ltd | カルコパイライト型太陽電池 |
US20120138129A1 (en) | 2010-12-07 | 2012-06-07 | Electronics And Telecommunications Reserach Institute | Bifacial solar cell |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4703350B2 (ja) * | 2005-10-13 | 2011-06-15 | 本田技研工業株式会社 | 太陽電池の製造方法 |
US9263609B2 (en) * | 2006-05-24 | 2016-02-16 | Atotech Deutschland Gmbh | Metal plating composition and method for the deposition of copper—zinc—tin suitable for manufacturing thin film solar cell |
US7977139B2 (en) * | 2007-03-28 | 2011-07-12 | Showa Shell Sekiyu K.K. | Method for manufacturing CIS based thin film solar cell device |
US8329138B2 (en) * | 2007-09-10 | 2012-12-11 | Yeda Research And Development Company Ltd. | Fullerene-like nanostructures, their use and process for their production |
KR101072834B1 (ko) | 2007-12-27 | 2011-10-14 | 한국식품연구원 | 인삼을 영지버섯 균사체로 발효시켜서 제조된 혈당강하용다당체 분획물 |
TWI397601B (zh) * | 2008-03-14 | 2013-06-01 | Lam Res Corp | 用於將膜沉積至基材上的方法 |
JP2011523211A (ja) * | 2008-06-04 | 2011-08-04 | ソレクサント・コーポレイション | 背面接点を有するモノリシック集積薄膜太陽電池 |
JP5003698B2 (ja) * | 2009-02-18 | 2012-08-15 | Tdk株式会社 | 太陽電池、及び太陽電池の製造方法 |
KR101129053B1 (ko) | 2009-07-16 | 2012-03-23 | 주식회사 필텍 | 주사 바늘 길이 조절용 안전 주사기 |
US9105796B2 (en) * | 2009-11-25 | 2015-08-11 | E I Du Pont De Nemours And Company | CZTS/Se precursor inks and methods for preparing CZTS/Se thin films and CZTS/Se-based photovoltaic cells |
TWI397189B (zh) * | 2009-12-24 | 2013-05-21 | Au Optronics Corp | 製作太陽能薄膜電池之方法及其結構 |
DE102011004652A1 (de) * | 2010-02-26 | 2011-09-01 | Electronics And Telecommunications Research Institute | Verfahren zur Herstellung einer lichtabsorbierenden Dünnfilmschicht und ein dieses verwendendes Verfahren zur Herstellung einer Dünnfilm-Solarzelle |
KR101172206B1 (ko) * | 2010-10-06 | 2012-08-07 | 엘지이노텍 주식회사 | 태양 전지 |
KR20120079292A (ko) | 2011-01-04 | 2012-07-12 | 서울시립대학교 산학협력단 | 하이브리드 태양전지 및 그 제조방법 |
WO2012100139A2 (en) * | 2011-01-21 | 2012-07-26 | Regents Of The University Of Minnesota | Metal chalcogenides and methods of making and using same |
US8501526B2 (en) * | 2011-04-22 | 2013-08-06 | Alliance For Sustainable Energy, Llc | Synthesizing photovoltaic thin films of high quality copper-zinc-tin alloy with at least one chalcogen species |
KR101210171B1 (ko) * | 2011-04-26 | 2012-12-07 | 중앙대학교 산학협력단 | 태양전지 및 이의 제조방법 |
US9368660B2 (en) * | 2011-08-10 | 2016-06-14 | International Business Machines Corporation | Capping layers for improved crystallization |
WO2013057732A2 (en) * | 2011-10-20 | 2013-04-25 | Yeda Research And Development Co.Ltd. | Ordered stacked sheets of layered inorganic compounds, nanostructures comprising them, processes for their preparation and uses thereof |
US9496426B2 (en) * | 2012-02-10 | 2016-11-15 | Alliance For Sustainable Energy, Llc | Thin film photovoltaic devices with a minimally conductive buffer layer |
US20130319502A1 (en) * | 2012-05-31 | 2013-12-05 | Aqt Solar, Inc. | Bifacial Stack Structures for Thin-Film Photovoltaic Cells |
US8741386B2 (en) * | 2012-09-28 | 2014-06-03 | Uchicago Argonne, Llc | Atomic layer deposition of quaternary chalcogenides |
US20140159120A1 (en) * | 2012-12-06 | 2014-06-12 | Intermolecular, Inc. | Conformal Doping |
US20140230888A1 (en) * | 2013-02-19 | 2014-08-21 | Samsung Sdi Co., Ltd. | Solar cell and method of manufacturing the same |
US8999746B2 (en) * | 2013-08-08 | 2015-04-07 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming metal chalcogenide dispersion, metal chalcogenide dispersion, method of producing light absorbing layer of solar cell, method of producing solar cell |
KR20150019727A (ko) * | 2013-08-14 | 2015-02-25 | 삼성에스디아이 주식회사 | 태양전지모듈 및 이의 제조방법 |
US20150140400A1 (en) * | 2013-11-15 | 2015-05-21 | Semiconductor Energy Laboratory Co., Ltd. | Power storage unit and electronic device including the same |
KR101765987B1 (ko) * | 2014-01-22 | 2017-08-08 | 한양대학교 산학협력단 | 태양 전지 및 그 제조 방법 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060180200A1 (en) * | 2003-05-08 | 2006-08-17 | Charlotte Platzer Bjorkman | Thin-film solar cell |
JP2007035677A (ja) | 2005-07-22 | 2007-02-08 | Honda Motor Co Ltd | カルコパイライト型太陽電池 |
US20120138129A1 (en) | 2010-12-07 | 2012-06-07 | Electronics And Telecommunications Reserach Institute | Bifacial solar cell |
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US20170005213A1 (en) | 2017-01-05 |
US9666737B2 (en) | 2017-05-30 |
US20150207000A1 (en) | 2015-07-23 |
US9466744B2 (en) | 2016-10-11 |
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