KR101757626B1 - 지르코늄계 금속의 제조 시스템 - Google Patents
지르코늄계 금속의 제조 시스템 Download PDFInfo
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- KR101757626B1 KR101757626B1 KR1020160117985A KR20160117985A KR101757626B1 KR 101757626 B1 KR101757626 B1 KR 101757626B1 KR 1020160117985 A KR1020160117985 A KR 1020160117985A KR 20160117985 A KR20160117985 A KR 20160117985A KR 101757626 B1 KR101757626 B1 KR 101757626B1
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 title claims abstract description 103
- 229910052726 zirconium Inorganic materials 0.000 title claims abstract description 91
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 80
- 239000002184 metal Substances 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 89
- 230000008569 process Effects 0.000 claims abstract description 50
- 229910016036 BaF 2 Inorganic materials 0.000 claims description 90
- 239000002253 acid Substances 0.000 claims description 32
- 238000006243 chemical reaction Methods 0.000 claims description 26
- 239000003792 electrolyte Substances 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 16
- 229910017985 Cu—Zr Inorganic materials 0.000 claims description 15
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- 238000000926 separation method Methods 0.000 claims description 12
- 230000002194 synthesizing effect Effects 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 238000001556 precipitation Methods 0.000 claims description 7
- 239000002244 precipitate Substances 0.000 claims description 6
- 229910052788 barium Inorganic materials 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 24
- 238000003723 Smelting Methods 0.000 description 20
- 239000000843 powder Substances 0.000 description 18
- 239000012535 impurity Substances 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- 238000006722 reduction reaction Methods 0.000 description 14
- 238000002441 X-ray diffraction Methods 0.000 description 13
- 238000002844 melting Methods 0.000 description 13
- 230000008018 melting Effects 0.000 description 13
- 230000009467 reduction Effects 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000001228 spectrum Methods 0.000 description 12
- 239000000706 filtrate Substances 0.000 description 11
- 239000003638 chemical reducing agent Substances 0.000 description 10
- 229910007740 Zr—F Inorganic materials 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 9
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 239000012808 vapor phase Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- 238000005554 pickling Methods 0.000 description 6
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 5
- 229910001093 Zr alloy Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 235000013024 sodium fluoride Nutrition 0.000 description 4
- 239000011775 sodium fluoride Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XTYUEDCPRIMJNG-UHFFFAOYSA-N copper zirconium Chemical compound [Cu].[Zr] XTYUEDCPRIMJNG-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000001036 glow-discharge mass spectrometry Methods 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- 239000013585 weight reducing agent Substances 0.000 description 3
- 150000003755 zirconium compounds Chemical class 0.000 description 3
- -1 zirconium ions Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000011946 reduction process Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910016569 AlF 3 Inorganic materials 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 230000002757 inflammatory effect Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003758 nuclear fuel Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000003921 particle size analysis Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
- C25C3/26—Electrolytic production, recovery or refining of metals by electrolysis of melts of titanium, zirconium, hafnium, tantalum or vanadium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F11/00—Compounds of calcium, strontium, or barium
- C01F11/20—Halides
- C01F11/22—Fluorides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing zirconium, with or without oxygen or hydrogen, and containing two or more other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/04—Halides
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/14—Obtaining zirconium or hafnium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
- C25C7/025—Electrodes; Connections thereof used in cells for the electrolysis of melts
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- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
도 2는 실시예 1에 따른 최종 화합물(Ba2ZrF8)의 주사전자현미경 이미지 및 엑스-레이 회절 스펙트럼에 관한 데이터이다.
도 3은 실시예 1에 따른 여액 내 잔존하는 불순물의 주사전자현미경 이미지 및 엑스-레이 회절 스펙트럼에 관한 데이터이다.
도 4는 실시예 1 및 실시예 2에 관한 것으로, BaF2의 입자크기에 따른 여액 내 함유 불순물의 농도를 유도결합플라즈마 분광분석법으로 측정하여 나타낸 그래프이다.
도 5는 본 발명의 일 예에 따른 반응로의 개략도, 실시예 3에 따른 BaF2 분말을 나타낸 이미지 및 실시예 3에 따른 ZrF4 분말을 나타낸 이미지를 도시한 것이다.
도 6은 실시예 3에 따른 BaF2 분말을 확대하여 나타낸 이미지와, 상기 BaF2 분말 성분의 중량비 및 원자비를 나타낸 표이다.
도 7은 실시예 3에 따른 BaF2 분말을 X-선회절분석법으로 측정한 스팩트럼이다.
도 8은 실시예 3에 따른 ZrF4 분말을 확대하여 나타낸 이미지와, 상기 ZrF4 분말 성분의 중량비 및 원자비를 나타낸 표이다.
도 9는 실시예 3에 따른 ZrF4 분말을 X-선회절분석법으로 측정한 스팩트럼이다.
도 10은 실시예 3 내지 실시예 9에 대한 것으로, BaF2 분말의 온도 및 시간에 따른 무게 감소율을 나타낸 그래프 및 표이다.
도 11은 실시예 5에 따른 ZrF4 분말을 X-선회절분석법으로 측정한 스팩트럼이다.
도 12는 실시예 4에 따른 ZrF4 분말을 X-선회절분석법으로 측정한 스팩트럼이다.
도 13은 실시예 10의 순환전류법의 공정 원리를 나타낸 개략도이다.
도 14는 실시예 10에 따라 제조되는 지르코늄의 산화환원 거동을 분석한 데이터이다.
도 15는 실시예 10의 전해제련 공정 중의 일 예를 나타낸 이미지와, 전해제련 공정 시 시간에 따른 전압을 나타낸 그래프이다.
도 16은 실시예 10에 따라 수득된 생성물을 주사전자현미경 및 원소 분석기(Energy Dispersive x-ray Spectroscopy, EDS)로 측정한 결과를 나타낸 데이터이다.
도 17은 실시예 10에 따른 생성물을 X-선회절분석법으로 측정한 스팩트럼이다.
도 18은 실시예 11에 따라 제조된 지르코늄 금속을 X-선회절분석법으로 측정한 스팩트럼이다.
도 19는 실시예 11에 따라 제조된 Zr 금속을 글로우방전질량분석법(Glow Discharge Mass Spectrometry: GDMS)으로 측정한 데이터이다.
도 20은 실시예 12에 따라 제조된 Cu-Zr계 금속의 이미지이다.
도 21은 실시예 12에 따라 제조된 Cu-Zr계 금속을 주사전자현미경 및 원소 분석기(Energy Dispersive x-ray Spectroscopy, EDS)로 측정한 결과를 나타낸 데이터이다.
도 22는 실시예 12에 따라 제조된 Cu-Zr계 금속을 X-선회절분석법으로 측정한 스팩트럼이다.
12 : 용기부
20 : 가열부
Claims (13)
- a) Zr 함유 산용액을 BaF2로 환원 및 Ba2ZrF8으로 침전하는 단계 및
b) 상기 a) 단계에서 침전된 Ba2ZrF8을 수득하는 단계를 포함하는 Ba2ZrF8의 제조 방법. - 제1항에 있어서,
상기 BaF2의 평균입경은 0.1~50 ㎛인 Ba2ZrF8의 제조 방법. - 제2항에 있어서,
상기 b) 단계에서 수득된 Ba2ZrF8의 순도는 99.98% 이상인 Ba2ZrF8의 제조 방법. - 삭제
- Ba2ZrF8을 전해질로서 전해하여 음극으로 지르코늄계 금속을 환원 및 석출하는 단계를 포함하며,
상기 Ba2ZrF8은,
a) Zr 함유 산용액을 BaF2로 환원하여 Ba2ZrF8으로 침전하는 단계 및
b) 상기 a) 단계에서 침전된 Ba2ZrF8을 수득하는 단계를 포함하여 제조되는 지르코늄계 금속의 제조 방법. - 삭제
- BaZrF6를 전해질로서 전해하여 음극으로 지르코늄계 금속을 환원 및 석출하는 단계를 포함하며,
상기 BaZrF6는 Ba2ZrF8과 ZrF4를 혼합하고 가열하여 BaZrF6를 합성하는 단계로부터 제조되며,
상기 BaZrF6를 합성하는 단계에서 Ba2ZrF8은,
a) Zr 함유 산용액을 BaF2로 환원하여 Ba2ZrF8으로 침전하는 단계 및
b) 상기 a) 단계에서 침전된 Ba2ZrF8을 수득하는 단계로부터 제조되는 지르코늄계 금속의 제조 방법. - 제5항에 있어서,
c) Ba2ZrF8을 BaF2 및 ZrF4로 분리하는 단계를 더 포함하며,
상기 a) 단계의 BaF2는 상기 c) 단계에서 분리된 BaF2가 사용되는 지르코늄계 금속의 제조 방법. - 제7항에 있어서,
c) Ba2ZrF8을 BaF2 및 ZrF4로 분리하는 단계를 더 포함하며,
상기 BaZrF6를 합성하는 단계의 ZrF4는 상기 c) 단계에서 분리된 ZrF4가 사용되는 지르코늄계 금속의 제조 방법. - 제7항에 있어서,
c) Ba2ZrF8을 BaF2 및 ZrF4로 분리하는 단계를 더 포함하며,
상기 a) 단계의 BaF2는 상기 c) 단계에서 분리된 BaF2가 사용되는 지르코늄계 금속의 제조 방법. - 제8항 내지 제10항에서 선택되는 어느 한 항에 있어서,
상기 c) 단계는 Ba2ZrF8을 반응로에 투입하고 진공 상태에서 1~15 시간 동안 1,000~1,150℃로 가열하여 BaF2 및 ZrF4로 분리하는 단계를 포함하는 지르코늄계 금속의 제조 방법. - 제5항 또는 제7항에 있어서,
상기 음극은 지르코늄계 금속 전극이며, 상기 환원 및 석출되는 지르코늄계 금속은 Zr 금속인 지르코늄계 금속의 제조 방법. - Ba2ZrF8 또는 BaZrF6를 전해질로서 전해하여 음극으로 지르코늄계 금속을 환원 및 석출하는 단계를 포함하며,
상기 음극은 구리계 금속 전극이며, 상기 환원 및 석출되는 지르코늄계 금속은 Cu-Zr계 합금인 지르코늄계 금속의 제조 방법.
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