KR101674081B1 - Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same - Google Patents
Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same Download PDFInfo
- Publication number
- KR101674081B1 KR101674081B1 KR1020150078536A KR20150078536A KR101674081B1 KR 101674081 B1 KR101674081 B1 KR 101674081B1 KR 1020150078536 A KR1020150078536 A KR 1020150078536A KR 20150078536 A KR20150078536 A KR 20150078536A KR 101674081 B1 KR101674081 B1 KR 101674081B1
- Authority
- KR
- South Korea
- Prior art keywords
- oxide
- film
- thermoplastic polymer
- composition
- dielectric
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 34
- 239000003990 capacitor Substances 0.000 claims abstract description 54
- 239000002105 nanoparticle Substances 0.000 claims abstract description 50
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 46
- 239000010954 inorganic particle Substances 0.000 claims abstract description 28
- 239000002245 particle Substances 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims description 45
- -1 polyethylene Polymers 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 23
- 239000004743 Polypropylene Substances 0.000 claims description 21
- 229920001155 polypropylene Polymers 0.000 claims description 21
- 238000003756 stirring Methods 0.000 claims description 21
- 229920000728 polyester Polymers 0.000 claims description 18
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 8
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 8
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 239000010931 gold Substances 0.000 claims description 7
- 238000001771 vacuum deposition Methods 0.000 claims description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 239000004417 polycarbonate Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 229920006380 polyphenylene oxide Polymers 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 5
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910010272 inorganic material Inorganic materials 0.000 claims description 4
- 239000011147 inorganic material Substances 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 229920002312 polyamide-imide Polymers 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 239000004962 Polyamide-imide Substances 0.000 claims description 3
- 239000004693 Polybenzimidazole Substances 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229920002480 polybenzimidazole Polymers 0.000 claims description 3
- 229920000193 polymethacrylate Polymers 0.000 claims description 3
- 229920001451 polypropylene glycol Polymers 0.000 claims description 3
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 3
- 239000011118 polyvinyl acetate Substances 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- YKIOKAURTKXMSB-UHFFFAOYSA-N adams's catalyst Chemical compound O=[Pt]=O YKIOKAURTKXMSB-UHFFFAOYSA-N 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 238000010891 electric arc Methods 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 2
- 238000000608 laser ablation Methods 0.000 claims description 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 238000001451 molecular beam epitaxy Methods 0.000 claims description 2
- KFAFTZQGYMGWLU-UHFFFAOYSA-N oxo(oxovanadiooxy)vanadium Chemical compound O=[V]O[V]=O KFAFTZQGYMGWLU-UHFFFAOYSA-N 0.000 claims description 2
- UFQXGXDIJMBKTC-UHFFFAOYSA-N oxostrontium Chemical compound [Sr]=O UFQXGXDIJMBKTC-UHFFFAOYSA-N 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 claims description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 229920002050 silicone resin Polymers 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000002207 thermal evaporation Methods 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 239000004698 Polyethylene Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 239000011342 resin composition Substances 0.000 claims 1
- VFWRGKJLLYDFBY-UHFFFAOYSA-N silver;hydrate Chemical compound O.[Ag].[Ag] VFWRGKJLLYDFBY-UHFFFAOYSA-N 0.000 claims 1
- 229920005992 thermoplastic resin Polymers 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 37
- 239000010408 film Substances 0.000 description 109
- 239000002033 PVDF binder Substances 0.000 description 17
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 17
- 238000000576 coating method Methods 0.000 description 12
- 239000005453 ketone based solvent Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229910001369 Brass Inorganic materials 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 239000010951 brass Substances 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 150000001408 amides Chemical class 0.000 description 5
- 239000000395 magnesium oxide Substances 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 5
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 239000005751 Copper oxide Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 239000005456 alcohol based solvent Substances 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 4
- 229910000431 copper oxide Inorganic materials 0.000 description 4
- 239000004210 ether based solvent Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 229920002492 poly(sulfone) Polymers 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000011104 metalized film Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KZNMRPQBBZBTSW-UHFFFAOYSA-N [Au]=O Chemical compound [Au]=O KZNMRPQBBZBTSW-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- IUYOGGFTLHZHEG-UHFFFAOYSA-N copper titanium Chemical compound [Ti].[Cu] IUYOGGFTLHZHEG-UHFFFAOYSA-N 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001922 gold oxide Inorganic materials 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 238000009775 high-speed stirring Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920005678 polyethylene based resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/07—Dielectric layers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
본 발명은 입자의 직경이 100 nm 이하인 고유전성 무기물 입자가 표면에 부착된 열가소성 폴리머를 포함하는 고유전성 필름컨덴서용 조성물, 이의 제조방법 및 이를 포함하는 필름컨덴서용 고유전성 필름에 관한 것이다.
본 발명에 따라 나노 크기의 고유전성 무기물 입자가 형성된 폴리머를 포함하는 조성물은 나노 무기물 입자가 폴리머 중에 균일하게 분산되며, 나노 무기물 입자가 필름 중에서 단단히 결합되므로 공극의 발생을 억제할 수 있어 유전율이 높고 내구성과 안정성이 높은 필름컨덴서용 고유전성 필름을 제조할 수 있다.The present invention relates to a composition for a high dielectric constant film capacitor comprising a thermoplastic polymer having a surface of a high dielectric constant inorganic particle having a particle diameter of 100 nm or less, a method for producing the composition, and a high dielectric constant film for a film capacitor comprising the same.
According to the present invention, a composition including a polymer in which nano-sized high-dielectric inorganic particles are formed has a high dielectric constant because nano inorganic particles are uniformly dispersed in the polymer and nano inorganic particles are tightly bonded in the film, A high dielectric constant film for a film capacitor having high durability and stability can be produced.
Description
본 발명은 고유전성 필름컨덴서용 조성물, 이의 제조방법 및 이를 포함하는 필름컨덴서용 고유전성 필름에 관한 것이다. The present invention relates to a composition for a high dielectric film capacitor, a method for producing the same, and a dielectric film for a film capacitor including the same.
절연특성을 갖는 플라스틱(insulating plastic)은 절연 저항이 높고, 주파수 특성이 우수하고, 유연성도 우수하다는 특징을 갖고 있기 때문에, 통신용, 전자기기용, 전력용, 인버터용 등의 필름 컨덴서의 재료로서 기대되고 있다.Since the insulating plastic has a high insulation resistance, excellent frequency characteristics, and excellent flexibility, it is expected to be used as a material for film capacitors for communication, electronic devices, electric power, and inverters have.
필름 컨덴서(film capacitor)는 통상적으로 유전성 플라스틱 필름 (dielectric film)의 표면에 알루미늄 또는 아연을 증착한 구조의 필름 컨덴서(metallized film capacitor 라 부름), 알루미늄박(foil)과 유전성 플라스틱 필름(film)을 다층으로 적층한 필름 컨덴서(film/foil capacitor라 부름) 등이 있다. 최근에는 금속 증착에 의해 유전성 플라스틱 필름상에 전극을 형성한 것 도 널리 사용되고 있다.Film capacitors typically include film capacitors (called metallized film capacitors), films of aluminum foil and dielectric films on the surface of a dielectric film on which aluminum or zinc is deposited Multilayered film capacitors (called film / foil capacitors), and the like. In recent years, electrodes formed on a dielectric plastic film by metal vapor deposition have also been widely used.
증착 금속의 종류, 예를 들면, 알루미늄, 아연, 주석, 니켈 크롬, 철, 구리 티타늄, 또는 이들 금속의 합금 등을 들 수 있다. 필름 컨덴서의 전기적 특성과 생산적 측면에서 아연, 알루미늄, 주석, 또는 그들을 포함하는 합금이 바람직하게 사용된다.Examples of the deposited metal include aluminum, zinc, tin, nickel chrome, iron, copper titanium, and alloys of these metals. Zinc, aluminum, tin, or an alloy containing them is preferably used in terms of electrical characteristics and productivity of the film capacitor.
필름 컨덴서용 필름의 유전성 고분자(dieletric polymers)로는 폴리프로필렌(PP), 폴리에스테르(PET), 폴리페닐렌설파이드(PPS) 등의 탄화수소계 폴리머(polymer)가 검토되고 있지만, 이들 필름 단독으로는 유전율(dielectric permittivity)은 2.3 ~ 3 정도 수준이다.Hydrocarbon polymers such as polypropylene (PP), polyester (PET) and polyphenylene sulfide (PPS) have been studied as dielectric polymers of film for film capacitors. However, (dielectric permittivity) is about 2.3 ~ 3.
폴리프로필렌(PP), 폴리에스테르(PET) 필름을 유전성 플라스틱 필름 (dielectric film)으로 그 표면에 전극으로 금속 증착층을 갖는 필름을 이용한 금속화 필름 컨덴서(metallized film capacitor)는 자가치유성 온도 및 주파수에 의존하는 용량변화가 적기 때문에 널리 이용되고 있다. 폴리에스테르(PET) 필름은 저렴하고 사용하기 쉬운 이점이 있다. 한편 폴리프로필렌(PP) 필름은 폴리에스테르(PET) 필름보다 고정밀 고성능 필름 컨덴서를 형성할 수 있는 이점이 있다. 폴리프로필렌 필름은, 그 전기 특성이 우수한 것 등의 이유로부터 전기 용도에 널리 이용되고 있다. 폴리프로필렌(PP) 또는 폴리에스테르(PET) 필름의 두께는 용도에 따라 적절히 설정되지만, 일반적으로 0.5~ 25 um 가 적당하며, 1.5~ 16 um가 바람직하다. 폴리페닐렌설파이드 필름을 필름 컨덴서의 유전체에 사용하여 내열성, 주파수 특성, 온도 특성 등이 우수한 컨덴서를 제공할 수 있다고 알려져 있다. A metallized film capacitor using a film made of polypropylene (PP), polyester (PET) film as a dielectric film and a metal deposition layer as an electrode on the surface thereof, And thus it is widely used. Polyester (PET) films are inexpensive and easy to use. On the other hand, a polypropylene (PP) film has an advantage that a high-precision and high-performance film capacitor can be formed more than a polyester (PET) film. BACKGROUND ART Polypropylene films are widely used in electric applications because of their excellent electrical properties and the like. The thickness of the polypropylene (PP) film or the polyester (PET) film is appropriately set depending on the application, but is generally in the range of 0.5 to 25 μm, preferably 1.5 to 16 μm. It is known that a polyphenylene sulfide film can be used as a dielectric of a film capacitor to provide a capacitor excellent in heat resistance, frequency characteristics, and temperature characteristics.
그러나 위와 같은 컨덴서는 그 제조 공정, 즉 권회, 재단, 성형 등의 공정에서 제조 조건의 범위가 좁아 이러한 관리가 미흡하며 필름 면의 물성 편차 발생로 인한 저전압 파괴에 의한 불량품이 증가한다는 단점이 있다.However, such a capacitor is disadvantageous in that the range of manufacturing conditions in the manufacturing process such as winding, cutting, molding and the like is so narrow that such management is insufficient and defective products due to low-voltage breakage are increased due to variations in physical properties of the film surface.
필름 컨덴서의 소형화/대용량화가 진행되면서 컨덴서 필름의 추가적인 고유전율화가 강하게 요구되고 있다. 그 중에서도 컨덴서 용도에서의 유전체 재료로서의 신장은 현저하다. 최근, 소형화, 저가격화의 요구가 강하며, 유전체인 필름 두께의 박막화가 진행되고 있다.As the film capacitor is miniaturized / increased in capacity, there is a strong demand for an additional high dielectric constant of the capacitor film. Among them, the elongation as a dielectric material in capacitor applications is remarkable. In recent years, there has been a strong demand for downsizing and cost reduction, and film thickness of the dielectric film is progressing.
필름 컨덴서의 정전용량(capacitance value)은 사용하는 필름 (film material)의 유전율에 비례하고, 필름의 막 두께에 반비례하는 것으로 알려져 있다. The capacitance value of the film capacitor is proportional to the dielectric constant of the film material used and is known to be inversely proportional to the film thickness of the film.
정전용량을 증가시키기 위해 (1)유전율이 높은 폴리머인 폴리불화비닐리덴(PVDF) 과 폴리프로필렌코폴리머 필름을 사용하여 정전용량을 증가시키는 기술, (2)폴리불화비닐리덴(PVDF) 보다 유전율이 높은 티탄산바륨계 산화물 입자를 포함한 필름을 사용하여 정전용량을 증가시키는 기술 등이 알려져 있다.(1) a technique of increasing the capacitance by using polyvinylidene fluoride (PVDF) and a polypropylene copolymer film which are polymers having high dielectric constant, (2) a technique of increasing the dielectric constant by using a polyvinylidene fluoride (PVDF) A technique of increasing the capacitance by using a film containing high barium titanate oxide particles, and the like are known.
고유전율 (high permittivity) 폴리머인 폴리불화비닐리덴(PVDF)계 폴리머의 유전율은 18~20 이나, 큐리온도가 60 로 사용이 제한되며, 필름 컨덴서로 일반적으로 이용되는 폴리프로필렌(PP), 폴리에스테르(PET) 필름에 비해 비용이 높고, 내장력, 내인열성이 떨어지고, 생산성이 저하됨으로 적용범위가 제한되어 있다.Polyvinylidene fluoride (PVDF) polymer, which is a high permittivity polymer, has a dielectric constant of 18 to 20, but its use is limited to a Curie temperature of 60, and polypropylene (PP), polyester (PET) film, the tensile strength, endurance, and productivity are lowered.
필름의 막 두께, 즉 필름을 박막화하는 것이 검토되어 왔지만, 박막화가 지나치면 성막이 곤란해지는 것 이외에 내전압의 저하가 나타남으로 박막화에는 한계가 있다.Though the film thickness of the film, that is, the film has been studied, it is difficult to form the film when the film is thinned, but the withstand voltage is lowered.
따라서 본 발명자들은 필름컨덴서용 필름의 고유전율화의 수단의 하나로서, 특히 유전율이 높은 무기물 나노입자와 폴리머를 복합화하여, 필름화하는 기술을 제안하고자 한다.Therefore, the present inventors propose a technique of composing inorganic nanoparticles having a high dielectric constant and a polymer and forming them into a film, as one means of increasing the dielectric constant of a film for a film capacitor.
상기 종래 기술의 문제점을 해결하기 위해, 본 발명은 필름컨덴서의 고유전율화를 가능하게 하는 고유전성 필름컨덴서용 조성물, 이의 제조방법 및 이를 이용하여 제조한 필름컨덴서용 고유전성 필름을 제공하는 것을 목적으로 한다.In order to solve the problems of the prior art, it is an object of the present invention to provide a composition for a high dielectric constant film capacitor that enables high dielectric constant of a film capacitor, a method for producing the composition, and a high dielectric constant film for a film capacitor .
상기 목적을 달성하기 위하여, 본 발명은 입자의 직경이 100 nm 이하인 고유전성 무기물 입자가 표면에 부착된 열가소성 폴리머를 포함하는 고유전성 필름컨덴서용 조성물을 제공한다.In order to achieve the above object, the present invention provides a composition for a high dielectric constant film capacitor comprising a thermoplastic polymer having a surface of a high dielectric constant inorganic particle having a particle diameter of 100 nm or less.
또한, 본 발명은 1) 고유전성 무기물 나노입자를 분말 혹은 칩 형상의 열가소성 폴리머의 표면에 형성시켜 고유전성 무기물 나노입자가 형성된 열가소성 폴리머를 제조하는 단계; 및 2) 상기 고유전성 무기물 나노입자가 형성된 열가소성 폴리머를 용제에 분산시켜 고유전성 필름컨덴서용 조성물을 제조하는 단계를 포함하는 고유전성 필름컨덴서용 조성물의 제조방법을 제공한다.The present invention also provides a method for producing a thermoplastic polymer, comprising the steps of: 1) forming a high-dielectric inorganic nanoparticle on the surface of a powder or chip-shaped thermoplastic polymer to prepare a thermoplastic polymer having a high-dielectric inorganic nanoparticle; And 2) dispersing the thermoplastic polymer in which the high-dielectric inorganic nanoparticles are formed in a solvent to prepare a composition for a high-dielectric film capacitor.
또한, 본 발명은 상기 고유전성 필름컨덴서용 조성물을 포함하는 필름컨덴서용 고유전성 필름을 제공한다.In addition, the present invention provides a high dielectric constant film for a film capacitor comprising the composition for the high dielectric constant film capacitor.
또한, 본 발명은 상기 고유전성 무기물 나노입자가 표면에 부착된 열가소성 폴리머를 포함하는 필름컨덴서용 고유전성 필름을 제공한다. The present invention also provides a high dielectric constant film for a film capacitor, wherein the high dielectric inorganic nanoparticle comprises a thermoplastic polymer having a surface attached thereto.
본 발명에 따라 나노 크기의 고유전성 무기물 입자가 형성된 폴리머를 포함하는 조성물은 나노 무기물 입자가 폴리머 중에 균일하게 분산되며, 나노 무기물 입자가 필름 중에서 단단히 결합되므로 공극의 발생을 억제할 수 있어 유전율이 높고 내구성과 안정성이 높은 필름컨덴서용 고유전성 필름을 제조할 수 있다.According to the present invention, a composition including a polymer in which nano-sized high-dielectric inorganic particles are formed has a high dielectric constant because nano inorganic particles are uniformly dispersed in the polymer and nano inorganic particles are tightly bonded in the film, A high dielectric constant film for a film capacitor having high durability and stability can be produced.
도 1은 본 발명에 따르는 분말 혹은 칩 형태의 열가소성 폴리머의 표면에 무기물 나노입자를 형성시키는 공정에 대한 개념도이다.
도 2는 본 발명의 일실시예에서 분말 혹은 칩 형태의 열가소성 폴리머의 표면에 무기물 나노입자를 형성시키기 위한, 교반용기를 갖춘 진공증착 장치의 개념도이다.
도 3은 본 발명에 따라 PVDF 분말 및 PVDF 분말의 표면에 은 (Ag) 및 황동 (Brass) 나노입자를 형성시킨 PVDF 분말을 보여주는 사진이다.1 is a conceptual diagram of a process for forming inorganic nanoparticles on the surface of a thermoplastic polymer in powder or chip form according to the present invention.
2 is a conceptual diagram of a vacuum deposition apparatus equipped with an agitating vessel for forming inorganic nanoparticles on the surface of a thermoplastic polymer in powder or chip form in an embodiment of the present invention.
FIG. 3 is a photograph showing a PVDF powder and a PVDF powder in which silver (Ag) and brass nanoparticles are formed on the surface of the PVDF powder according to the present invention.
이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명은 입자의 직경이 100 nm 이하인 고유전성 무기물 입자가 표면에 부착된 열가소성 폴리머를 포함하는 고유전성 필름컨덴서용 조성물을 제공한다.The present invention provides a composition for a high dielectric constant film capacitor comprising a thermoplastic polymer to which a high dielectric constant inorganic particle having a particle diameter of 100 nm or less is attached to a surface.
상기 고유전성 필름컨덴서용 조성물은 열가소성 폴리머를 포함한다. The composition for a high dielectric film capacitor includes a thermoplastic polymer.
상기 열가소성 폴리머는, 불소계 열가소성 폴리머 및 비불소계 열가소성 폴리머로 이루어진 군에서 선택되는 1종 또는 2종의 혼합물일 수 있다.The thermoplastic polymer may be one or a mixture of two or more selected from the group consisting of a fluorine-containing thermoplastic polymer and a non-fluorine-containing thermoplastic polymer.
상기 불소계 열가소성 폴리머로서, 불화비닐리덴(PVdF)계 수지, 폴리테트라플루오로에틸렌(PTFE), 트리플루오로에틸렌(TrFE), 헥사플루오로프로필렌(HFP), 퍼플루오로(알킬비닐에테르)(PAVE) 등의 공중합체를 사용할 수 있으나 반드시 이에 제한되지는 않는다.(PTFE), trifluoroethylene (TrFE), hexafluoropropylene (HFP), perfluoro (alkyl vinyl ether) (PAVE), polyvinylidene fluoride ) May be used, but the present invention is not limited thereto.
그 중에서도 비유전율(20℃, 1㎑)이 3 이상, 바람직하게는 5 이상, 더욱 바람직하게는 8 이상, 가장 바람직하게는 10 이상인 것이, 내전압, 절연성, 비유전율의 향상, 나아가 필름으로 하였을 때의 비유전율이 높은 점에서 바람직하다. 따라서 불화비닐리덴(PVdF)계 수지를 사용하는 것이 가장 바람직하다. In particular, when the relative dielectric constant (20 占 폚, 1 kHz) is 3 or more, preferably 5 or more, more preferably 8 or more, and most preferably 10 or more, improvement of withstand voltage, insulation property and relative dielectric constant, Is preferred because of its high relative dielectric constant. Therefore, it is most preferable to use a vinylidene fluoride (PVdF) based resin.
또한, 비유전율의 상한값은 특별히 제한은 없지만, 통상 12, 바람직하게는 11이다.The upper limit value of the relative dielectric constant is not particularly limited, but is usually 12, preferably 11.
상기 비불소계 열가소성 폴리머는 휨성(flexible)이 좋고 비유전율이 높은 점에서, 폴리부틸렌테레프탈레이트(PBT), 폴리에스테르계(PET), 폴리에틸렌나프탈레이트(PEN) 등의 폴리에스테르계; 폴리카보네이트계(PC); 실리콘수지, 폴리에테르계, 폴리아세트산비닐, 폴리에틸렌계, 폴리프로필렌(PP)계 등이 바람직하고, 강도를 높이기 위해서는 폴리메타크릴산메틸 등의 폴리(메트)아크릴레이트계, 에폭시 수지, 폴리에틸렌옥시드, 폴리프로필렌옥시드, 폴리페닐렌옥시드(PPO), 폴리페닐렌술피드(PPS), 폴리아미드계(PA), 폴리이미드계(PI), 폴리아미드이미드계(PAI), 폴리스티렌계, 폴리벤조이미다졸(PBI) 등을 사용할 수 있고, 또한 고유전성을 보충하는 점에서 시아노풀루란, 구리프탈로시아닌계 중합체 등을 사용할 수 있고, 기계적 강도나 절연 저항의 향상의 점에서 셀룰로오스계 등의 수지를 사용할 수 있다. The non-fluorine-containing thermoplastic polymer is preferably a polyester-based polymer such as polybutylene terephthalate (PBT), polyester (PET), polyethylene naphthalate (PEN) or the like in view of flexibility and high dielectric constant; Polycarbonate-based (PC); Silicone resin, polyether-based resin, polyvinyl acetate resin, polyethylene-based resin and polypropylene (PP) -based resin are preferable. In order to increase the strength, poly (meth) acrylate, epoxy resin, polyethylene oxide , Polypropylene oxide, polyphenylene oxide (PPO), polyphenylene sulfide (PPS), polyamide series (PA), polyimide series (PI), polyamideimide series (PAI), polystyrene series, (PBI) can be used. In addition, cyanoplurane, a copper phthalocyanine-based polymer and the like can be used in order to supplement the high dielectric constant. From the viewpoint of improving the mechanical strength and insulation resistance, a resin such as a cellulose- .
특히, 폴리카보네이트계, 폴리에틸렌옥시드, 폴리프로필렌옥시드, 폴리(메트)아크릴레이트계, 폴리아세트산비닐, 셀룰로오스계 수지가, 기계적 강도나 절연 저항의 향상의 점에서 바람직하다.In particular, polycarbonate-based, polyethylene oxide, polypropylene oxide, poly (meth) acrylate-based, polyvinyl acetate, and cellulose-based resins are preferable in terms of improvement of mechanical strength and insulation resistance.
그 중에서도, 상기 불소계 열가소성 폴리머와 병용하는 경우, 불소계 열가소성 폴리머와의 상용성(miscibility)이 우수한 점에서, 셀룰로오스계 수지, 폴리에스테르 수지 및 폴리메타크릴산메틸로 이루어지는 군으로부터 선택되는 적어도 1종이 특히 바람직하다.Among them, when used in combination with the fluorine-containing thermoplastic polymer, at least one kind selected from the group consisting of a cellulose-based resin, a polyester resin and a polymethylmethacrylate is particularly preferable in view of the excellent miscibility with the fluorine- desirable.
특히, 셀룰로오스계 수지를 병용할 때는, 비유전율의 향상과 유전 손실의 저감에 유효하다.Particularly, when a cellulose resin is used in combination, it is effective to improve the relative dielectric constant and reduce the dielectric loss.
상기 열가소성 폴리머는 직경이 2.0μm이하인 분말이 고유전성 필름의 성막시 조작이 용이하다는 점에서 바람직하다.The thermoplastic polymer is preferable in that the powder having a diameter of 2.0 m or less is easy to handle when the high dielectric constant film is formed.
상기 고유전성 무기물은 유전상수가 5~200인 것이 바람직하며, 필름컨덴서용 조성물의 특성에 따라 선택되는 것일 수 있다.The dielectric constant of the high-dielectric inorganic material is preferably 5 to 200, and may be selected according to the characteristics of the composition for a film capacitor.
상기 고유전성 무기물은 실리콘(Si), 구리(Cu), 아연(Zn), 황동(Brass), 알루미늄(Al), 베릴륨(Be), 마그네슘(Mg), 스트론튬(Sr), 바륨(Ba), 이트륨(Y), 티타늄(Ti), 지르코늄(Zr), 하프뮴(Hf), 바나듐(V), 니오븀(Nb), 탄탈륨(Ta), 란타늄(La), 은(Ag), 금(Au), 백금(Pt), 팔라듐(Pd) 혹은 이들의 산화물인 산화규소(SiO2), 산화구리(CuO), 산화아연(ZnO), 산화구리(CuO), 알루미나(Al2O3), 산화베릴륨(BeO), 산화마그네슘(MgO), 산화스트론튬(SrO), 산화바륨(BaO), 이트륨산화물(Y2O3), 산화티타늄(TiO), 이산화티타늄(TiO2), 산화지르코늄(ZrO2), 산화하프뮴(HfO2), 산화바나듐(V2O3), 산화니오븀(Nb2O5), 산화탄탈륨 (Ta2O5), 산화란탄(La2O3), 산화은 (Ag2O), 산화금(Au2O3), 산화백금(PtO2), 산화팔라듐(PdO) 등일 수 있다.The high dielectric inorganic material may be at least one selected from the group consisting of Si, Cu, Zn, Br, Al, Ber, Mg, Sr, Ba, (Ag), gold (Au), tantalum (Y), titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium , platinum (Pt), palladium (Pd) or of their oxides of silicon oxide (SiO 2), copper oxide (CuO), zinc oxide (ZnO), copper oxide (CuO), alumina (Al 2 O 3), beryllium oxide (BeO), magnesium (MgO), strontium oxide (SrO), barium (BaO), yttrium oxide oxide (Y 2 O 3), titanium (TiO), titanium dioxide (TiO 2), zirconium oxide (ZrO 2) oxide, a half-di (HfO 2), vanadium oxide (V 2 O 3), niobium (Nb 2 O 5), tantalum oxide (Ta 2 O 5), lanthanum (La 2 O 3), silver oxide (Ag 2 O oxide ), Gold oxide (Au 2 O 3 ), platinum oxide (PtO 2 ), palladium oxide (PdO), and the like.
바람직하게는, 상기 고유전성 무기물은 실리콘(Si), 산화티타늄(TiO), 이산화티타늄(TiO2), 산화구리(CuO), 산화아연(ZnO), 알루미나(Al2O3), 이트륨산화물(Y2O3), 산화마그네슘(MgO), 산화지르코늄(ZrO2), 산화베릴륨(BeO) 및 산화란탄(La2O3)으로 이루어진 군으로부터 선택된 1종 또는 2종이상의 혼합물일 수 있다.Preferably, the high dielectric inorganic material is at least one selected from the group consisting of silicon (Si), titanium oxide (TiO 2 ), titanium dioxide (TiO 2 ), copper oxide (CuO), zinc oxide (ZnO), alumina (Al 2 O 3 ), yttrium oxide Y 2 O 3 ), magnesium oxide (MgO), zirconium oxide (ZrO 2 ), beryllium oxide (BeO) and lanthanum oxide (La 2 O 3 ).
상기 열가소성 폴리머 표면에 입자의 직경은 100 nm이하, 바람직하게는 80 nm 이하이다. 하한은 특별히 한정되지는 않지만 10~50nm인 고유전성 무기물 입자가 부착된다.The diameter of the particles on the thermoplastic polymer surface is 100 nm or less, preferably 80 nm or less. The lower limit is not particularly limited, but the high-dielectric inorganic particles having 10 to 50 nm are attached.
이러한 무기물 나노 입자가 열가소성 폴리머 표면에 균일하게 분산되면 소량의 배합으로 필름의 전기 절연성을 크게 향상시킬 수 있다.
When such inorganic nanoparticles are uniformly dispersed on the surface of the thermoplastic polymer, the electrical insulation of the film can be greatly improved by a small amount of the inorganic nanoparticles.
본 발명은 상기 고유전성 필름컨덴서용 조성물의 제조방법을 제공한다.The present invention provides a process for producing the composition for a high dielectric constant film capacitor.
구체적으로, 본 발명은 1) 고유전성 무기물 나노입자를 분말 혹은 칩 형상의 열가소성 폴리머의 표면에 형성시켜 고유전성 무기물 나노입자가 형성된 열가소성 폴리머를 제조하는 단계; 및 2) 상기 고유전성 무기물 나노입자가 형성된 열가소성 폴리머를 용제에 분산시켜 고유전성 필름컨덴서용 조성물을 제조하는 단계를 포함하는 고유전성 필름컨덴서용 조성물의 제조방법을 제공한다.Specifically, the present invention provides a method for preparing a thermoplastic polymer, comprising the steps of: 1) preparing a thermoplastic polymer having a high-dielectric inorganic nanoparticle formed on the surface of a powder or chip-shaped thermoplastic polymer; And 2) dispersing the thermoplastic polymer in which the high-dielectric inorganic nanoparticles are formed in a solvent to prepare a composition for a high-dielectric film capacitor.
상기 단계 1)은 열가소성 폴리머 분말을 교반하기 위한 교반장치와 무기물 나노입자를 발생시키는 증착원을 구비한 나노입자 제조장치에서 진행하는 것을 특징으로 한다.The step 1) is performed in an apparatus for producing nanoparticles having an agitator for stirring thermoplastic polymer powder and an evaporation source for generating inorganic nanoparticles.
보다 구체적으로, 상기 나노입자 제조장치는 진공 증착조; 상기 진공 증착조 내에 구비된 교반조; 상기 교반조 내에 구비되고 열가소성 폴리머 분말을 교반하는 스크류; 및 상기 진공 증착조 내의 교반조 상부에 구비되고 무기물 입자를 증발시키는 증착원으로 구성된다.More specifically, the nanoparticle production apparatus includes a vacuum deposition vessel; A stirring tank provided in the vacuum evaporation tank; A screw provided in the stirring tank and stirring the thermoplastic polymer powder; And an evaporation source provided in the upper portion of the stirring tank in the vacuum evaporation tank and evaporating the inorganic particles.
상기 교반조의 측면의 상부 말단은, 수직면을 기준으로 중심 방향으로 1 내지 90도 굽어져 있고, 상기 스크류는 수평 또는 수직 방향으로, 교반조에 장입되는 열가소성 폴리머 분말의 전체 깊이의 1/5 내지 3/4 를 교반하도록 구비되는 것을 특징으로 한다.The upper end of the side surface of the stirring tank is bent to 1 to 90 degrees in the center direction with respect to the vertical surface, and the screw is horizontally or vertically disposed at an angle of 1/5 to 3/4 of the total depth of the thermoplastic polymer powder charged into the stirring tank. 4 is stirred.
상기 나노입자 제조 장치는 상기 교반조의 측면이, 수직면을 기준으로 하여 중심 방향으로 1 내지 90 도 굽어져 있는 것을 특징으로 한다. 그 결과 열가소성 폴리머 분말이 교반조 벽을 타고 외부로 이탈되는 것을 방지할 수 있다.The nanoparticle production apparatus is characterized in that the sides of the agitator are bent by 1 to 90 degrees in the center direction with respect to the vertical plane. As a result, it is possible to prevent the thermoplastic polymer powder from escaping to the outside through the stirring vessel wall.
상기 스크류는 수평형 또는 수직형 스크류로서, 수평 방향 또는 수직 방향으로 열가소성 폴리머 분말을 교반한다.The screw is a horizontal or vertical screw, which stirs the thermoplastic polymer powder in the horizontal or vertical direction.
상기 나노입자 제조 장치는 스크류가, 교반조에 장입되는 열가소성 폴리머 분말의 전체 깊이의 1/5 내지 3/4 를 교반하도록 구비되는 것을 특징으로 한다.The nanoparticle production apparatus is characterized in that the screw is provided so as to agitate 1/5 to 3/4 of the total depth of the thermoplastic polymer powder charged in the stirring tank.
상기 나노입자 제조 장치는 수평형 또는 수직형 스크류가 열가소성 폴리머 분말 중에 충분히 장입되게 함으로써, 고속 교반 시에도 열가소성 폴리머 분말들이 위로 비산되는 것을 방지하고 열가소성 폴리머 분말들이 중앙 또는 벽면부위에 정체되지 않고 열가소성 폴리머 분말들이 교반조의 내부에서 상하로 쉽게 이동되게 하였다.The apparatus for manufacturing nanoparticles prevents the thermoplastic polymer powders from scattering upward even at a high speed stirring by allowing the horizontal or vertical screw to be sufficiently loaded in the thermoplastic polymer powder and to prevent the thermoplastic polymer powders from stagnating at the central or wall surface, The powders were easily moved up and down inside the stirring tank.
상기 단계 1)은 a) 열가소성 폴리머 분말(혹은 칩)을 진공 증착조 내의 교반조에 투입하는 단계; b) 진공증착 공정을 수행하기 위하여 진공배기를 하는 단계; c) 열가소성 폴리머 분말(혹은 칩)을 교반하는 단계; d) 증착원을 이용하여 나노 크기의 무기물 입자 형성을 위한 입자를 발생시키는 단계; 및 e) 열가소성 폴리머 분말(혹은 칩)의 표면 상에 무기물 입자를 증착하는 단계로 진행될 수 있다.The step 1) comprises the steps of: a) injecting a thermoplastic polymer powder (or a chip) into a stirring tank in a vacuum evaporation tank; b) vacuum evacuation to perform a vacuum deposition process; c) stirring the thermoplastic polymer powder (or chip); d) generating particles for formation of nano-sized inorganic particles using an evaporation source; And e) depositing inorganic particles onto the surface of the thermoplastic polymer powder (or chip).
상기 d) 단계에서 무기물 입자를 발생시키기 위한 방법으로 열증착(Thermal Evaporation), 전자빔 증착(E-beam Evaporation), DC 스퍼터링(DC Sputtering), 캐소드 아크 증착법 (cathodic arc sputtering), DC 마그네트론 증착법(DC magnetron sputtering), RF 스퍼터링(RF Sputtering), 이온빔 스퍼터링(Ion Beam Sputtering), 분자빔 에피텍시(Molecular Beam Epitaxy), 아크방전법(Arc Discharge Process), 레이저 어블레이션(Laser Ablation) 등을 사용할 수 있다. As a method for generating the inorganic particles in the step d), thermal evaporation, E-beam evaporation, DC sputtering, cathodic arc sputtering, DC magnetron deposition (DC such as magnetron sputtering, RF sputtering, ion beam sputtering, molecular beam epitaxy, arc discharge process, and laser ablation. have.
상기 폴리머 분말(혹은 칩)이 교반조의 교반날개에 의하여 교반되는 속도는 0.1 내지 400 rpm의 범위에서 제어하는 것이 바람직하다.The speed at which the polymer powder (or the chip) is stirred by the stirring wing of the stirring tank is preferably controlled in the range of 0.1 to 400 rpm.
또한, 진공 증착조의 작업진공도(working pressure)는 5 x 10-4 내지 5 x 10-3 torr 로 조절되는 것이 바람직하다. 진공도가 5 x 10-3 torr 이하의 저진공에서는 원자 입자들의 평균 자유 행적의 거리가 짧아져서 무기물 나노입자들이 폴리머 분말(펠렛)의 표면에 형성되기가 어렵다.Also, the working pressure of the vacuum deposition chamber is preferably adjusted to 5 x 10 -4 to 5 x 10 -3 torr. At a low vacuum of 5 x 10 -3 torr or less, the average distance of free movement of atomic particles is shortened, making it difficult for inorganic nanoparticles to form on the surface of polymer powder (pellets).
상기 폴리머 분말(혹은 칩)상에 나노 크기의 무기물 입자를 형성하는 단계에서는, 입자가 폴리머 분말(혹은 칩)상에 증착되어 핵을 형성하며, 이후 핵이 입자의 추가적인 증착에 의해 나노 크기의 무기물 입자를 형성한 후에 폴리머 분말(펠렛)이 교반, 회전되어 혼합되며, 무기물 입자가 증착되지 않은 새로운 폴리머 분말(펠렛)상, 또는 무기물 입자가 증착되지 않은 폴리머 분말(혹은 칩)의 표면에 무기물 입자가 증착됨으로써, 나노 크기의 무기물 입자를 형성할 수 있다.In the step of forming nano-sized inorganic particles on the polymer powder (or chip), the particles are deposited on the polymer powder (or chip) to form nuclei, and the nuclei are then added to the nano- After the particles are formed, the polymer powder (pellets) is mixed with stirring, rotated, and mixed with the inorganic particles (pellets) on the surface of the polymer powder (or chip) on which the inorganic particles are not deposited, Can be deposited to form nano-sized inorganic particles.
도 2를 참조하면, 진공증착장치에서 교반용기(7)에 장입한 폴리머 분말(혹은 칩)(도시하지 않음)을 교반함과 동시에 증착원(6)에서 생성된 무기물 입자들이 폴리머의 표면으로 향하게 하면, 폴리머의 표면에 무기물 입자가 핵을 형성하고 성장하여 나노크기의 입자들이 형성된다.2, a polymer powder (or a chip) (not shown) charged into an agitating vessel 7 is stirred in a vacuum evaporator, and at the same time, the inorganic particles generated in the evaporation source 6 are directed to the surface of the polymer Inorganic particles form nuclei on the surface of the polymer and grow to form nano-sized particles.
바람직하게는, 나노 크기의 무기물 입자는 폴리머 분말(혹은 칩)상에 분당 단위면적당 1 Å 내지 10 ㎛ 두께로 증착된다.Preferably, nano-sized inorganic particles are deposited on the polymer powder (or chip) to a thickness of 1 A to 10 mu m per unit area per minute.
진공 증착조의 진공도는 불활성 가스를 포함시켜 조절하며, 불활성 가스는 아르곤(Ar), 네온(Ne), N2, O2 등일 수 있으나, 반드시 이에 제한되지는 않는다.The degree of vacuum of the vacuum deposition chamber is controlled by including an inert gas. The inert gas may be argon (Ar), neon (Ne), N 2 , O 2, and the like.
상기 e) 단계에서 폴리머 분말(혹은 칩)의 표면에 형성되는 무기물 입자의 크기는 1~100 nm인 것이 바람직하다.The size of the inorganic particles formed on the surface of the polymer powder (or chip) in the step e) is preferably 1 to 100 nm.
상기 단계 2)는 상기 고유전성 무기물 나노입자가 형성된 열가소성 폴리머를 용제에 분산 또는 용해시켜 용액을 제조하고, 이어서 이들에 기타 첨가제 성분을 적절하게 첨가하여, 교반, 바람직하게는 가열 교반하여 분산시키는 단계일 수 있다.The step 2) is a step of dispersing or dissolving the thermoplastic polymer having the high-dielectric inorganic nanoparticles formed therein in a solvent to prepare a solution, adding other additives to the solution, and dispersing the mixture by stirring, preferably with heating and stirring Lt; / RTI >
상기 용제는 폴리머를 분산 또는 용해하여, 코팅 조성물을 제조할 수 있는 것이 바람직하고, 무기 용제(물 등)거나 유기 용제일 수도 있지만, 폴리머의 종류에 따라서 선정할 수 있다.The solvent preferably disperses or dissolves the polymer to produce a coating composition. The solvent may be an inorganic solvent (water or the like) or an organic solvent, but it may be selected depending on the type of polymer.
예를 들면, 폴리카보네이트계 폴리머에 대해서는 디옥산, 테트라히드로푸란 등의 에테르계 용제; 클로로포름, 크레졸 등의 무극성 용제; 디메틸포름아미드 등의 아미드계 용제; 메틸에틸케톤 등의 케톤계 용제 등을 들 수 있고, 특히 혼합 용제로 했을 때의 안정성이 양호하다는 점에서 에테르계 용제, 아미드계 용제, 케톤계 용제가 바람직하다.For example, for the polycarbonate-based polymer, ether solvents such as dioxane and tetrahydrofuran; Non-polar solvents such as chloroform and cresol; Amide solvents such as dimethylformamide; And ketone solvents such as methyl ethyl ketone. In particular, ether solvents, amide solvents and ketone solvents are preferable from the viewpoint of good stability in the case of a mixed solvent.
셀룰로오스 폴리머에 대해서는 메틸에틸케톤 등의 케톤계 용제; 아세트산에틸 등의 에스테르계 용제; 디옥산 등의 에테르계 용제; 디메틸포름아미드 등의 아미드계 용제 등을 들 수 있고, 특히 혼합 용제로 했을 때 안정성이 양호하다는 점에서 에테르계 용제, 아미드계 용제, 케톤계 용제가 바람직하다.Ketone solvents such as methyl ethyl ketone for the cellulose polymer; Ester solvents such as ethyl acetate; Ether solvents such as dioxane; And amide solvents such as dimethylformamide. Among them, ether solvents, amide solvents and ketone solvents are preferable from the viewpoint of good stability when mixed as a solvent.
폴리페닐렌에테르 폴리머에 대해서는 케톤계 용제, 톨루엔, 메시틸렌 등의 방향족 탄화수소계 용제, 클로로포름, 시클로메탄 등의 염소화탄화수소계 용제 등을 들 수 있고, 특히 도포성이 양호하다는 점에서 케톤계 용제, 방향족 탄화수소계 용제가 바람직하다.Examples of the polyphenylene ether polymer include ketone type solvents, aromatic hydrocarbon type solvents such as toluene and mesitylene, and chlorinated hydrocarbon type solvents such as chloroform and cyclomethane. In view of good applicability, ketone type solvents, An aromatic hydrocarbon solvent is preferred.
폴리시클로올레핀 폴리머에 대해서는 케톤계 용제, 방향족 탄화수소계 용제, 염소화탄화수소계 용제 등을 들 수 있고, 특히 도포성이 양호하다는 점에서 방향족 탄화수소계 용제가 바람직하다.As the polycycloolefin polymer, a ketone-based solvent, an aromatic hydrocarbon-based solvent, a chlorinated hydrocarbon-based solvent and the like are exemplified, and an aromatic hydrocarbon-based solvent is preferable from the viewpoint of good applicability.
폴리술폰 폴리머에 대해서는 이소프로필알코올, 부탄올 등의 알코올계 용제, 케톤계 용제, 염소화탄화수소계 용제 등을 들 수 있고, 특히 도포성이 양호하다는 점에서 알코올계 용제, 케톤계 용제가 바람직하다.Examples of the polysulfone polymer include alcohol solvents such as isopropyl alcohol and butanol, ketone solvents and chlorinated hydrocarbon solvents. Alcohol solvents and ketone solvents are preferable in view of good coatability.
폴리에테르술폰 폴리머에 대해서는 알코올계 용제, 케톤계 용제, 염소화탄화수소계 용제 등을 들 수 있고, 특히 도포성이 양호하다는 점에서 알코올계 용제, 케톤계 용제가 바람직하다.Examples of the polyethersulfone polymer include alcohol solvents, ketone solvents and chlorinated hydrocarbon solvents. Alcohol solvents and ketone solvents are particularly preferable in view of good coatability.
본 발명의 고유전성 필름컨덴서용 조성물은 점도가 0.01 내지 3 Paㆍs가 되도록 용제로 조정하는 것이 도공성이 양호한 점, 그리고 균일하고 평활한 필름이 얻어진다는 점에서 바람직하다. 특히 1.5 Paㆍs 이하인 것이 표면 거칠음을 억제하는 점에서 바람직하다. The composition for a high dielectric film capacitor of the present invention is preferably adjusted to have a viscosity of from 0.01 to 3 Pa.s, in view of good coatability and uniform and smooth film. Particularly, it is preferable that the surface roughness is suppressed to 1.5 Pa · s or less.
상기 고유전성 필름컨덴서용 조성물은 에멀젼형(용제가 물 등)일 수 있다. 특히 중합체 유기 용제의 용액에 무기물 입자를 분산시키는 것이 조성물을 균일하게 조정할 수 있고, 나아가 조성물로부터 균질한 필름을 얻기 쉽다는 점에서 바람직하다.The composition for the high-dielectric film capacitor may be an emulsion type (solvent is water, etc.). Particularly, it is preferable to disperse the inorganic particles in the solution of the polymer organic solvent from the viewpoint that the composition can be uniformly adjusted and the homogeneous film can be easily obtained from the composition.
또한, 본 발명은 상기 고유전성 필름컨덴서용 조성물을 포함하는 필름컨덴서용 고유전성 필름을 제공한다.In addition, the present invention provides a high dielectric constant film for a film capacitor comprising the composition for the high dielectric constant film capacitor.
바람직하게는, 상기 필름은 고유전성 필름컨덴서용 조성물을 기재에 도포하고, 건조하여 필름을 형성하는 단계; 및 상기 필름을 기재로부터 박리하는 단계를 포함하여 제조된다.Preferably, the film is formed by applying a composition for a high dielectric film capacitor to a substrate and drying to form a film; And peeling the film from the substrate.
도포 방법으로서 나이프 코팅법, 캐스트 코팅법, 롤 코팅법, 그라비아 코팅법, 블레이드 코팅법, 로드코팅(rod coating)법, 에어 닥터 코팅법, 커튼 코팅법, 파큰란 코팅(Faknelane coating)법, 키스 코팅(kiss coating)법, 스크린 코팅법, 스핀 코팅법, 분무 코팅법, 압출 코팅법, 전착 코팅법 등을 사용할 수 있지만, 이들 중에서 조작성이 용이하다는 점, 막 두께의 변동이 적다는 점, 생산성이 우수하다는 점에서 롤 코팅법, 그라비아 코팅법, 캐스트 코팅법이 바람직하다.Coating methods such as a knife coating method, a cast coating method, a roll coating method, a gravure coating method, a blade coating method, a rod coating method, an air doctor coating method, a curtain coating method, a Faknelane coating method, A spin coating method, a spray coating method, an extrusion coating method, an electrodeposition coating method, and the like can be used. Among these, ease of operation is easy, variation in film thickness is small, productivity A roll coating method, a gravure coating method and a cast coating method are preferable.
건조는 양키 실린더, 카운터 플로우, 열풍 분사, 에어플로우 실린더, 에어 스루(air through), 적외선, 마이크로파, 유도 가열 등을 이용한 방법으로 행할 수 있다. 예를 들면, 열풍 분사법에서는 130~200 ℃에서 1분간 이내라는 조건이 바람직하게 채택될 수 있다.Drying can be performed by a method using a Yankee cylinder, counter flow, hot air blowing, air flow cylinder, air through, infrared ray, microwave, induction heating or the like. For example, in the hot air blowing method, a condition of within 1 minute at 130 to 200 DEG C can be preferably adopted.
상기 필름컨덴서용 고유전성 필름은 기재로부터 박리되기 때문에, 기재로서는 폴리머가 박리되기 쉬운 재료, 예를 들면 스테인레스 스틸, 구리 등의 금속판; 유리판; ITO나 ZnO를 증착한 폴리머 필름; 표면에 이형 처리를 실시한 폴리머 필름 등이 바람직하다. 이 중에서도, 표면에 이형 처리를 실시한 폴리머 필름이 박리되기 쉽고 생산성도 높다는 점에서 바람직하다. Since the high-dielectric film for a film capacitor is peeled off from the base material, the base material may be a material which is liable to peel off the polymer, for example, a metal plate such as stainless steel or copper; Glass plate; A polymer film on which ITO or ZnO is deposited; A polymer film subjected to a releasing treatment on the surface thereof and the like are preferable. Among them, the polymer film subjected to the releasing treatment on the surface is preferably peelable and high in productivity.
상기 기재는 표면 자유 에너지(단위: J/㎡)가 30 이상인 것이 바람직하고, 또한 물에 대한 접촉각이 110 이하인 것이 바람직하다.The substrate preferably has surface free energy (unit: J / m < 2 >) of 30 or more and a contact angle with water of 110 or less.
다르게, 피막으로 기재에 보관하려면 폴리머 필름에 본 발명의 코팅 조성물을 도포, 건조하여 적층 필름의 형태로 할 수 있다. 적층 필름의 기재로는 VdF 계 폴리머 (A)와 접착성이 좋은 두께가 1.5 ~ 3μm 정도의 폴리머 필름이 바람직하다. 폴리머로는 폴리에틸렌테레프탈레이트(PET), 폴리에틸렌나프탈레이트(PEN), 폴리카보네이트(PC), 폴리아크릴레이트(PA), 폴리이미드(PI), 폴리아미드이미드(PAI), 폴리벤즈이미드다졸(PBI), 폴리페닐렌설파이드(PPS), 폴리페닐렌옥사이드( PPO), 폴리설폰(PSF) 등의 엔지니어링 플라스틱이 바람직하다.Alternatively, in order to store the film as a substrate, the coating composition of the present invention may be applied to the polymer film and dried to form a laminated film. As the substrate of the laminated film, a polymer film having a thickness of about 1.5 to 3 mu m which is excellent in adhesion to the VdF-based polymer (A) is preferable. Examples of the polymer include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyacrylate (PA), polyimide (PI), polyamideimide (PAI), polybenzimidazole , Polyphenylene sulfide (PPS), polyphenylene oxide (PPO), and polysulfone (PSF).
이형 처리로서는 각종 이형제를 도포하는 처리, 플라즈마 처리, 이형성 필름을 적층하는 처리 등을 예시할 수 있다.Examples of the mold-releasing treatment include a treatment for applying various releasing agents, a plasma treatment, and a treatment for laminating a releasable film.
박리 결과 얻어진 필름은 그대로 사용할 수도 있지만, 또한 공지의 이축연신 방법에 의해 연신할 수도 있으며, 그 경우 연신 배율은 2 내지 6배정도가 바람직하다.The film obtained as a result of peeling may be used as it is or may be stretched by a known biaxial stretching method. In this case, the stretching magnification is preferably 2 to 6 times.
이축 연신의 방법으로 인플레이션 동시 이축 연신법, 스텐터 동시 이축 연신법 및 스텐터 축차 이축 연신법 중 한 방법을 사용할 수 있지만, 이 중에서도 제막 안정성, 두께 균일성, 필름의 표면 형상을 제어하는 점에 있어서 스텐터 축차 이축 연신법이 바람직하게 이용된다.As a method of biaxial stretching, one of inflation simultaneous biaxial stretching method, simultaneous biaxial stretching method of stenter and biaxial stretching method of stenter biaxial stretching can be used. Among these methods, however, it is preferable to control film forming stability, thickness uniformity, So that the stenter biaxial stretching method is preferably used.
또한, 본 발명은 상기 고유전성 무기물 나노입자가 표면에 부착된 열가소성 폴리머를 포함하는 필름컨덴서용 고유전성 필름을 제공한다. The present invention also provides a high dielectric constant film for a film capacitor, wherein the high dielectric inorganic nanoparticle comprises a thermoplastic polymer having a surface attached thereto.
바람직하게는, 상기 필름은 고유전성 무기물 나노입자가 표면에 부착된 열가소성 폴리머를 용융 압출하여 제조된다.Preferably, the film is produced by melt extruding a thermoplastic polymer having a surface-attached high-dielectric inorganic nanoparticle.
그 밖에, 필름컨덴서용 고유전성 필름으로서 이용하기 위해, 얻어진 필름에 대하여 전극용의 알루미늄의 증착을 쉽게 하기 위해서 추가로 필름의 표면에 플라즈마 처리나 코로나 방전처리를 실시할 수도 있다. 또한, 필름의 표면 거칠음을 억제하기 위해서 별종의 폴리머를 표면 코팅할 수도 있고, 강도 개선을 위해 자외선이나 전자선, 방사선에 의한 가교 처리를 실시할 수도 있다.
In addition, plasma treatment or corona discharge treatment may be further applied to the surface of the film in order to facilitate deposition of aluminum for the electrode on the resulting film for use as a high-dielectric film for a film capacitor. Further, in order to suppress the surface roughness of the film, a kind of polymer may be coated on the surface, or a crosslinking treatment by ultraviolet rays, electron beams, or radiation may be performed to improve the strength.
이하, 본 발명을 실시예를 통해 더욱 상세히 설명한다.Hereinafter, the present invention will be described in more detail by way of examples.
본 발명에서 폴리머 분말에 형성되는 나노 크기(1~100nm)의 무기물 입자의 유전율은 다음과 같다.
The dielectric constant of nano-sized inorganic particles (1 to 100 nm) formed in the polymer powder in the present invention is as follows.
<실시예 1>≪ Example 1 >
제1 단계: 고유전성 무기물 나노입자 코팅 Step 1: coating with high-dielectric inorganic nanoparticles PVDFPVDF 분말의 제조 Preparation of powder
폴리불화비닐리덴(PVDF) 분말 10kg을 교반조에 투입하고 기본진공도(base pressure)에 도달하기까지 진공펌핑(vacuum pumping)을 수행하였다. 이 때의 기본진공도는 1 x 10-5 ~ 5 x 10-5Torr 이며, 기본진공도에 도달한 후 PVDF 분말을 교반하면서 은(Ag) 또는 황동 (Brass) 타겟을 사용하여 스퍼터링 방법으로 증착공정을 수행하였다. 진공증착이 수행되는 동안의 작업진공도(working pressure)는 1x10-4 ~ 5x10-3Torr 의 범위내에서 유지하였다. 증착공정에서 DC전원장치의 파워는 500W으로, 시간은 3시간 20분으로 하여 은 또는 황동 나노입자의 함량이 1,000ppm다.10 kg of polyvinylidene fluoride (PVDF) powder was poured into a stirring tank and vacuum pumping was performed until the base pressure was reached. In this case, the basic vacuum degree is 1 × 10 -5 to 5 × 10 -5 Torr. After reaching the basic degree of vacuum, the PVDF powder is stirred and the deposition process is carried out by sputtering using a silver (Ag) or brass target Respectively. The working pressure during the vacuum deposition was maintained in the range of 1 x 10 -4 to 5 x 10 -3 Torr. In the deposition process, the power of the DC power source is 500W, and the time is 3 hours and 20 minutes, and the content of silver or brass nano-particles is 1,000ppm.
그 결과 PVDF 분말의 표면에 무게 기준으로 1,000ppm의 은(Ag) 및 황동 (Brass) 무기물 나노입자를 형성시켰다.As a result, 1,000 ppm of silver (Ag) and brass inorganic nanoparticles were formed on the surface of the PVDF powder.
도 3을 보면, 은 및 황동 나노입자는 플라즈몬 현상에 의해 나노입자의 원재료의 종류에 따라 일정한 색상을 띠게 되고 균일한 색상이 형성되어 있는 것을 확인할 수 있고, PVDF 분말 표면상에 골고루 형성되어 있음을 알 수 있다. 상기 분말에 대한 나노입자의 함량은 필요 시 증착시간을 제어하여 더욱 높은 함량으로 제조할 수도 있다.
Referring to FIG. 3, it can be seen that the silver and brass nanoparticles are uniformly colored according to kinds of the raw materials of the nanoparticles due to the plasmon phenomenon, and uniform color is formed, and they are uniformly formed on the surface of the PVDF powder Able to know. The content of the nanoparticles in the powder may be adjusted to a higher content by controlling the deposition time if necessary.
제2 단계: Step 2: 필름컨덴서용For film capacitor 조성물의 제조 Preparation of composition
상기에서 제조한 무기물 나노입자가 표면에 형성된 PVDF 분말(혹은 칩)을 아미드계 용제인 에쿠아미드(EQUAMIDE, 일본 이데미츠흥산 제품)에 분산 또는 용해시켜 고유전성 필름컨덴서용 조성물을 제조하였다.
A PVDF powder (or a chip) having the above-described inorganic nanoparticles formed on its surface was dispersed or dissolved in an amide-based solvent (EQUAMIDE, manufactured by Idemitsu Kosan Co., Ltd.) to prepare a composition for a high dielectric film capacitor.
제3 단계: 필름 Step 3: Film 컨덴서용For condenser 고유전성 필름의 제조 Manufacture of high dielectric films
상기에서 제조한 고유전성 필름컨덴서용 조성물을 캐스팅 코팅법을 이용하여 PET기재에 도포하고, 열풍 분사법으로 130~200℃에서 1분간 이내의 조건으로 건조하여 필름을 형성한 후, 상기 필름을 PET기재로부터 박리하여 필름컨덴서용 고유전성 필름을 제조하였다.
The composition for a high dielectric film capacitor prepared above was applied to a PET substrate using a cast coating method and dried under hot air spraying at 130 to 200 ° C for 1 minute to form a film, And peeled from the substrate to prepare a high-dielectric film for a film capacitor.
<실시예 2>≪ Example 2 >
실시예 1과 같은 방법으로 저밀도 폴리프로필렌(LDPP) 분말의 표면에 산화구리 나노입자를 형성시켰다. 이 때 나노입자의 함량은 무게기준으로 1,500ppm이었다. 그리고 고용융 장력 폴리프로필렌(HMS-PP) 분말의 표면에 1,500ppm의 산화구리 나노입자를 형성시켰다. 또한, 저밀도 폴리프로필렌(LDPP) 분말의 표면에 산화구리 나노입자 대신 이산화티타늄 나노 입자를 무게기준으로 1,500ppm을 형성하였다.Copper nanoparticles were formed on the surface of a low-density polypropylene (LDPP) powder in the same manner as in Example 1. At this time, the content of the nanoparticles was 1,500 ppm by weight. And 1,500 ppm of copper oxide nanoparticles were formed on the surface of the high-melt tension polypropylene (HMS-PP) powder. In addition, 1,500 ppm of titanium dioxide nanoparticles were formed on the surface of the low density polypropylene (LDPP) powder instead of the copper oxide nanoparticles.
상기 산화구리 나노입자가 형성된 저밀도 폴리프로필렌 및 이산화티타늄 나노입자가 형성된 저밀도 폴리프로필렌과, 산화구리 나노입자가 형성된 고용융 장력 폴리프로필렌을 블렌드하여 용융 압출하였다. 용융 압출한 수지를 여과 필터에 통과시킨 후, 220~280℃의 온도에서 슬릿상 구금(플랫 다이)으로부터 압출하였다. 구금으로부터 압출한 폴리머를 냉각드럼상에서 고화시켜 미연신(연신하지 않은 캐스트(cast) 시트를 얻었다.The low-density polypropylene formed with the copper oxide nanoparticles and the low-density polypropylene formed with the titanium dioxide nanoparticles and the high-melt-strength polypropylene formed with the copper oxide nanoparticles were blended and melt-extruded. The melt-extruded resin was passed through a filtration filter and extruded from a slit-shaped nip (flat die) at a temperature of 220 to 280 ° C. The polymer extruded from the cage was solidified on a cooling drum to obtain an unstretched (unstretched cast sheet).
상기 미연신 필름을 120~150℃로 유지된 복수의 롤에 통과시켜 예열하였다. 예열은 필름의 양면이 동일한 면 형상이 되도록 온도차가 없도록 행하였다. 이 온도 상태를 유지한 채로 주속차를 둔 롤 사이에 필름을 통과시켜 길이 방향으로 2 내지 6배 연신하여 실온으로 냉각하여 상기 미연신 필름을 이축 연신하여 이축 배향시켰다.The unstretched film was passed through a plurality of rolls maintained at 120 to 150 ° C to be preheated. The preheating was performed so that there was no temperature difference so that both sides of the film had the same surface shape. While maintaining this temperature state, the film was passed between rolls having a main difference in speed, stretched 2 to 6 times in the longitudinal direction, cooled to room temperature, and biaxially stretched to biaxially orient the unstretched film.
이어서 140℃에서 축 방향으로 연신 한 후 150℃에서 이축 방향으로 연신하여 두께 3μm 의 고유전성 나노 무기물 입자를 함유한 폴리프로필렌 필름을 얻었다. 이러한 연신 방법에 따라 시트 표면은 평균 0.3μm 정도의 균일한 요철이 형성되었다.Then, the film was stretched in the axial direction at 140 ° C and then stretched in the biaxial direction at 150 ° C to obtain a polypropylene film containing the high-dielectric nano-inorganic particles having a thickness of 3 μm. According to this stretching method, uniform irregularities of about 0.3 mu m were formed on the surface of the sheet.
Claims (10)
2) 상기 고유전성 무기물 나노입자가 표면에 부착된 열가소성 폴리머를 용제에 분산시켜 고유전성 필름컨덴서용 조성물을 제조하는 단계를 포함하는 고유전성 필름컨덴서용 조성물의 제조방법.1) preparing a thermoplastic polymer having high-dielectric inorganic nanoparticles adhered to its surface by forming a high-dielectric inorganic nanoparticle having a diameter of 100 nm or less on the surface of a powder or chip-shaped thermoplastic polymer through vapor deposition; And
2) dispersing the thermoplastic polymer having the surface of the high-dielectric inorganic nanoparticles on the surface thereof in a solvent to prepare a composition for a high-dielectric film capacitor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150078536A KR101674081B1 (en) | 2015-06-03 | 2015-06-03 | Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150078536A KR101674081B1 (en) | 2015-06-03 | 2015-06-03 | Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR101674081B1 true KR101674081B1 (en) | 2016-11-22 |
Family
ID=57539965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020150078536A KR101674081B1 (en) | 2015-06-03 | 2015-06-03 | Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101674081B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107611017A (en) * | 2017-09-21 | 2018-01-19 | 天津大学 | A kind of method for improving flexible capacitor capacitance |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20100109942A (en) | 2008-03-19 | 2010-10-11 | 다이킨 고교 가부시키가이샤 | Coating composition for forming high dielectric film and high dielectric film |
KR20110096596A (en) | 2008-12-22 | 2011-08-30 | 다이킨 고교 가부시키가이샤 | High dielectric film forming composition for film capacitor |
KR101095766B1 (en) * | 2006-07-27 | 2011-12-21 | 다이킨 고교 가부시키가이샤 | Coating composition |
-
2015
- 2015-06-03 KR KR1020150078536A patent/KR101674081B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101095766B1 (en) * | 2006-07-27 | 2011-12-21 | 다이킨 고교 가부시키가이샤 | Coating composition |
KR20100109942A (en) | 2008-03-19 | 2010-10-11 | 다이킨 고교 가부시키가이샤 | Coating composition for forming high dielectric film and high dielectric film |
KR20110096596A (en) | 2008-12-22 | 2011-08-30 | 다이킨 고교 가부시키가이샤 | High dielectric film forming composition for film capacitor |
Non-Patent Citations (2)
Title |
---|
Y. Kobayahsi et al., ‘Fabrication and dielectric properties of the BaTiO3-polymer nano-composite thin films,’ Journal of the European Ceramic Society 28, 1, 117-122 (2008.) * |
Y. Kobayahsi et al., ‘Fabrication and dielectric properties of the BaTiO3-polymer nano-composite thin films,’ Journal of the European Ceramic Society 28, 1, 117-122 (2008.)* |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107611017A (en) * | 2017-09-21 | 2018-01-19 | 天津大学 | A kind of method for improving flexible capacitor capacitance |
CN107611017B (en) * | 2017-09-21 | 2019-09-13 | 天津大学 | A method for improving the capacitance of flexible capacitors |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7542265B2 (en) | High energy density capacitors and methods of manufacture | |
US6426861B1 (en) | High energy density metallized film capacitors and methods of manufacture thereof | |
CN101978446B (en) | Coating composition for forming highly dielectric film and highly dielectric film | |
JP5261896B2 (en) | Coating composition | |
US20100302707A1 (en) | Composite structures for high energy-density capacitors and other devices | |
CN104479161B (en) | A kind of membrane capacitance Kynoar/polypropylene composite film and preparation method | |
US20110228442A1 (en) | Capacitor having high temperature stability, high dielectric constant, low dielectric loss, and low leakage current | |
JP5494676B2 (en) | High dielectric film | |
JP4952793B2 (en) | High dielectric film | |
CN105086297A (en) | Electric energy storage dielectric ceramic/polymer composite material and preparing method thereof | |
US12163005B2 (en) | Multilayer and flexible capacitors with metal-ion doped TIO2 colossal permittivity material/polymer composites | |
EP3216037A1 (en) | Energy storage devices and methods of production thereof | |
CN102504449A (en) | Polymer matrix composite membrane with high energy density and preparation method thereof | |
JP5135937B2 (en) | High dielectric film | |
EP2305743A1 (en) | Dielectric film, associated article and method | |
JP5070976B2 (en) | High dielectric film | |
KR101674081B1 (en) | Composition for High Dielectric Film Condenser, Method for Manufacturing the Same, and High Dielectric Film for Film condenser comprising the Same | |
WO2009116393A1 (en) | Coating composition for forming high dielectric film and high dielectric film | |
WO2008044573A1 (en) | Capacitor layer-forming material, method for producing capacitor layer-forming material, and printed wiring board comprising built-in capacitor obtained by using the capacitor layer-forming material | |
JP2913779B2 (en) | Biaxially stretched film for capacitors | |
JP3198666B2 (en) | Biaxially stretched film | |
JPH05217800A (en) | Manufacture of film capacitor component | |
Zhang et al. | Polymer film capacitors with high dielectric constant, high capacitance density, and high energy density | |
EP4404722A1 (en) | Piezoelectric film | |
JP2019110216A (en) | Film manufacturing method for film capacitor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20150603 |
|
PA0201 | Request for examination | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20160314 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20160923 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20161102 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20161103 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
FPAY | Annual fee payment |
Payment date: 20191112 Year of fee payment: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20191112 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20201103 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20211103 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20221103 Start annual number: 7 End annual number: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20241105 Start annual number: 9 End annual number: 9 |