KR101646160B1 - 내식성이 우수한 크롬도금액 - Google Patents
내식성이 우수한 크롬도금액 Download PDFInfo
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- KR101646160B1 KR101646160B1 KR1020150159438A KR20150159438A KR101646160B1 KR 101646160 B1 KR101646160 B1 KR 101646160B1 KR 1020150159438 A KR1020150159438 A KR 1020150159438A KR 20150159438 A KR20150159438 A KR 20150159438A KR 101646160 B1 KR101646160 B1 KR 101646160B1
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- Prior art keywords
- chromium
- corrosion resistance
- chromium plating
- plating solution
- plating
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- 238000007747 plating Methods 0.000 title claims abstract description 96
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 74
- 238000005260 corrosion Methods 0.000 title abstract description 41
- 230000007797 corrosion Effects 0.000 title abstract description 41
- 239000011651 chromium Substances 0.000 claims abstract description 68
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 65
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910001430 chromium ion Inorganic materials 0.000 claims abstract description 10
- 229910001415 sodium ion Inorganic materials 0.000 claims abstract description 10
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims abstract description 9
- 150000001735 carboxylic acids Chemical class 0.000 claims description 26
- 239000011734 sodium Substances 0.000 claims description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 7
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 7
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 6
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 6
- WIYCQLLGDNXIBA-UHFFFAOYSA-L disodium;3-(3-sulfonatopropyldisulfanyl)propane-1-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)CCCSSCCCS([O-])(=O)=O WIYCQLLGDNXIBA-UHFFFAOYSA-L 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 235000019253 formic acid Nutrition 0.000 claims description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 3
- 229960000583 acetic acid Drugs 0.000 claims description 3
- 239000004310 lactic acid Substances 0.000 claims description 3
- 235000014655 lactic acid Nutrition 0.000 claims description 3
- 239000012362 glacial acetic acid Substances 0.000 claims description 2
- 239000001384 succinic acid Substances 0.000 claims description 2
- 150000003568 thioethers Chemical class 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 2
- YXEXMVJHQLWNGG-UHFFFAOYSA-N 3-(3,3-disulfopropyldisulfanyl)propane-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)CCSSCCC(S(O)(=O)=O)S(O)(=O)=O YXEXMVJHQLWNGG-UHFFFAOYSA-N 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 25
- 239000003054 catalyst Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 230000000996 additive effect Effects 0.000 description 7
- -1 Z-methyl pyridinium Chemical compound 0.000 description 6
- 230000035515 penetration Effects 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000004255 ion exchange chromatography Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- OPUAWDUYWRUIIL-UHFFFAOYSA-N methanedisulfonic acid Chemical compound OS(=O)(=O)CS(O)(=O)=O OPUAWDUYWRUIIL-UHFFFAOYSA-N 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- QLOKJRIVRGCVIM-UHFFFAOYSA-N 1-[(4-methylsulfanylphenyl)methyl]piperazine Chemical compound C1=CC(SC)=CC=C1CN1CCNCC1 QLOKJRIVRGCVIM-UHFFFAOYSA-N 0.000 description 1
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- FKNQCJSGGFJEIZ-UHFFFAOYSA-O 4-methylpyridin-1-ium Chemical compound CC1=CC=[NH+]C=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-O 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical class OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-N iodic acid Chemical class OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- GRJJQCWNZGRKAU-UHFFFAOYSA-N pyridin-1-ium;fluoride Chemical compound F.C1=CC=NC=C1 GRJJQCWNZGRKAU-UHFFFAOYSA-N 0.000 description 1
- QYPWRPSMKLUGJZ-UHFFFAOYSA-N pyridin-1-ium;sulfate Chemical compound [O-]S([O-])(=O)=O.C1=CC=[NH+]C=C1.C1=CC=[NH+]C=C1 QYPWRPSMKLUGJZ-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- PXLIDIMHPNPGMH-UHFFFAOYSA-N sodium chromate Chemical compound [Na+].[Na+].[O-][Cr]([O-])(=O)=O PXLIDIMHPNPGMH-UHFFFAOYSA-N 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
이러한 본 발명은 크롬 이온 공급원과 황산 이온 공급원을 포함하는 크롬도금액에 있어서, Na 이온을 함유하는 황화물과 카르복시산이 더 포함되되, 황화물은 C6H12Na2O6S4(Bis-(Sodium Sulfopropyl)-Disulfide인 것을 특징으로 하는 내식성이 우수한 크롬도금액을 기술적 요지로 한다.
Description
도 2는 본 발명의 바람직한 실시예 따라 SPS 첨가량에 따른 전류 효율을 도시한 그래프.
도 3은 본 발명의 바람직한 실시예 및 비교예에 따른 표면균열 사진.
SPS (mol/L) |
카르복시산 (mol/L) |
전류 효율 (%) |
표면균열 | 부식발생시간 (h) |
표면의 외관 | |
실시예 1 | 0.4 | 0.1 | 28 | 기존 대비 조밀한 균열 | 144 | 미려하고 광택있는 표면 |
실시예 2 | 0.4 | 0.2 | 27 | 168 | ||
실시예 3 | 0.4 | 0.3 | 26 | 144 | ||
실시예 4 | 0.4 | 0.4 | 27 | 168 | ||
실시예 5 | 0.4 | 0.5 | 28 | 144 |
SPS (mol/L) |
카르복시산 (mol/L) |
전류 효율 (%) |
표면균열 | 부식발생시간 (h) |
표면의 외관 | |
비교예 1 | 0.4 | 0 | 25 | 우수 | 96 | 미려하고 광택있는 표면 |
비교예 2 | 0.4 | 0.6 | 28 | 기존 대비 조밀한 균열 | 120 | 회색의 무광택 표면 |
비교예 3 | 0.4 | 1.0 | 26 | 96 | ||
비교예 4 | 0 | 0 | 13 | 적음 | 24 | 광택있는 표면 |
Claims (5)
- 크롬 이온 공급원과 황산 이온 공급원을 포함하는 크롬도금액에 있어서,
Na 이온을 함유하는 황화물; 및
카르복시산;이 더 포함되되,
상기 황화물은,
C6H12Na2O6S4(Bis-(Sodium Sulfopropyl)-Disulfide인 것을 특징으로 하는 내식성이 우수한 크롬도금액. - 제1항에 있어서,
상기 카르복시산은,
상기 크롬도금액에 대하여 0.1~0.5mol/L로 포함되는 것을 특징으로 하는 내식성이 우수한 크롬도금액. - 제1항에 있어서,
상기 카르복시산은,
개미산(formic acid), 빙초산(glacial acetic acid), 숙신산(succinic acid) 및 젖산(lactic acid)으로 이루어진 군으로부터 선택되는 어느 하나 이상인 것을 특징으로 하는 내식성이 우수한 크롬도금액. - 삭제
- 제1항에 있어서,
상기 황화물은,
상기 크롬도금액에 대하여 0.1~1.0mol/L로 포함되는 것을 특징으로 하는 내식성이 우수한 크롬도금액.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150159438A KR101646160B1 (ko) | 2015-11-13 | 2015-11-13 | 내식성이 우수한 크롬도금액 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020150159438A KR101646160B1 (ko) | 2015-11-13 | 2015-11-13 | 내식성이 우수한 크롬도금액 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR101646160B1 true KR101646160B1 (ko) | 2016-08-08 |
Family
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Family Applications (1)
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KR1020150159438A Expired - Fee Related KR101646160B1 (ko) | 2015-11-13 | 2015-11-13 | 내식성이 우수한 크롬도금액 |
Country Status (1)
Country | Link |
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KR (1) | KR101646160B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200036341A (ko) | 2018-09-28 | 2020-04-07 | 주식회사 포스코 | 3가 크롬 전기도금액 및 이를 이용한 전기도금 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040055684A (ko) * | 2002-12-20 | 2004-06-26 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 역 펄스 도금 조성물 및 방법 |
KR20050052214A (ko) * | 2003-11-29 | 2005-06-02 | 테크앤라이프 주식회사 | 3가 크롬도금액 조성물과 그 제조방법 |
US20070131558A1 (en) | 2005-12-13 | 2007-06-14 | Enthone Inc. | Process for deposition of crack-free and corrosion-resistant hard chromium and chromium alloy layers |
KR20140027200A (ko) * | 2011-05-03 | 2014-03-06 | 아토테크더치랜드게엠베하 | 전기도금 조 및 어두운 크롬층의 제조 방법 |
WO2014170037A1 (en) * | 2013-04-17 | 2014-10-23 | Atotech Deutschland Gmbh | Functional chromium layer with improved corrosion resistance |
-
2015
- 2015-11-13 KR KR1020150159438A patent/KR101646160B1/ko not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20040055684A (ko) * | 2002-12-20 | 2004-06-26 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 역 펄스 도금 조성물 및 방법 |
KR20050052214A (ko) * | 2003-11-29 | 2005-06-02 | 테크앤라이프 주식회사 | 3가 크롬도금액 조성물과 그 제조방법 |
US20070131558A1 (en) | 2005-12-13 | 2007-06-14 | Enthone Inc. | Process for deposition of crack-free and corrosion-resistant hard chromium and chromium alloy layers |
KR20140027200A (ko) * | 2011-05-03 | 2014-03-06 | 아토테크더치랜드게엠베하 | 전기도금 조 및 어두운 크롬층의 제조 방법 |
WO2014170037A1 (en) * | 2013-04-17 | 2014-10-23 | Atotech Deutschland Gmbh | Functional chromium layer with improved corrosion resistance |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200036341A (ko) | 2018-09-28 | 2020-04-07 | 주식회사 포스코 | 3가 크롬 전기도금액 및 이를 이용한 전기도금 방법 |
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