KR101607570B1 - Chemical vapor deposition apparatus and chemical vapor deposition method - Google Patents

Abstract

The present invention relates to a chemical vapor deposition apparatus, comprising: a deposition chamber; A substrate seating part located inside the deposition chamber and on which the substrate is placed; An initiator supply unit provided outside the deposition chamber and supplying a liquid phase initiator; A monomer supply unit provided outside the deposition chamber and supplying a liquid monomer; A droplet generating unit having a piezoelectric body for generating a mixed droplet by applying a vibration to a mixed liquid of an initiator and a liquid monomer supplied from an initiator supplying unit and a monomer supplying unit; And a jetting portion for jetting the mixed droplet generated in the droplet generating portion onto the upper portion of the substrate.

Description

Technical Field [0001] The present invention relates to a chemical vapor deposition apparatus and a chemical vapor deposition method,

The present invention relates to a chemical vapor deposition apparatus and a chemical vapor deposition method. More specifically, the initiator and the monomer are injected into the deposition chamber in a droplet state and then evaporated, thereby increasing the injection amount of the initiator and the monomer injected into the deposition chamber. As the injection amount of the initiator and the monomer is increased, To a chemical vapor deposition apparatus capable of shortening a tack time and a method using the same.

Organic Luminescence Emitting Device (OLED) is a self-luminous self-luminous device that uses an electroluminescent phenomenon that emits light when a current flows through a fluorescent organic compound, and does not require a backlight for applying light to a non- Therefore, it is possible to manufacture a lightweight and thin flat panel display device. The flat panel display device using such an organic electroluminescent device has a fast response speed and wide viewing angle, and is emerging as a next generation display device.

Meanwhile, in order to form a thin film such as a sealing film used in a sealing process or an insulating film used in a thin film transistor during the manufacturing process of an organic electroluminescent device, an initiated chemical vapor deposition (iCVD) ) Can be used.

The chemical vapor deposition method using an initiator is a method of depositing a polymer (poymer) on the surface of a substrate by vaporizing an initiator and a monomer to cause a polymerization reaction in a gas phase.

In the case of the chemical vapor deposition method using such an initiator, the initiator used to initiate the chain reaction of the monomer and the monomer forming the polymer is injected into the deposition chamber in the vapor phase and deposited on the substrate surface, .

However, in view of the large size of the substrate, a larger amount of initiator and monomer is required for deposition of the substrate. In the vapor phase initiator and vapor phase monomer injection method, the amount of injection into the deposition chamber is small, There is a problem that the deposition time for depositing becomes long and the tact time is increased.

Korean Patent Publication No. 10- 2011-0049571 (published on May 12, 2011)

The present invention relates to a method of increasing the injection amount of an initiator and a monomer injected into a deposition chamber by injecting an initiator and a monomer into a deposition chamber in a droplet state and then evaporating the deposition material to increase the amount of the initiator and monomer injected, A chemical vapor deposition apparatus and a chemical vapor deposition method capable of shortening the tack time by shortening the time required for the chemical vapor deposition.

According to an aspect of the present invention, there is provided a deposition apparatus including: a deposition chamber; A substrate seating part located inside the deposition chamber and on which the substrate is placed; An initiator supply unit provided outside the deposition chamber and supplying a liquid phase initiator; A monomer supply unit provided outside the deposition chamber and supplying a liquid monomer; A droplet generating unit having a piezoelectric body for generating a mixed droplet by applying a vibration to a mixed liquid of an initiator and a liquid monomer supplied from an initiator supplying unit and a monomer supplying unit; And a jetting portion for jetting the mixed droplet generated in the droplet generating portion onto the upper portion of the substrate.

Wherein the liquid crystal generating unit includes a mixing tank in which a mixed liquid of the supplied liquid initiator and the liquid monomer is accommodated, and the piezoelectric body is coupled to the mixing tank.

The chemical vapor deposition apparatus further includes a carrier gas supply unit connected to the mixing tank and supplying a carrier gas to the mixing tank, and the mixed liquid droplet may be injected through the injection unit by the carrier gas.

The carrier gas may be argon (Ar) or nitrogen (N2).

And a heating unit positioned above the substrate seating part in the deposition chamber and heating the mixed droplet by heating as the mixed droplet sprayed through the spray part passes therethrough.

The heating section includes: a first heating section for heating the mixed liquid droplet to vaporize to generate the initiator gas phase particles and monomer vapor phase particles; And a second heating unit which is located below the first heating unit and activates the initiator vapor phase particles by heating.

The heating temperature of the first heating section may be higher than the heating temperature of the second heating section.

Each of the first heating portion and the second heating portion may include a plurality of heat lines arranged at a predetermined distance from each other.

The distance of the hot wire of the first heating part may be larger than the distance of the hot wire of the second heating part.

The heating section may include a third heating section which is located below the second heating section and which prevents the cooling of the initiator gaseous particles by cooling.

The third heating section may include a plurality of heat lines arranged at a predetermined distance from each other.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid droplet, comprising: supplying a liquid phase initiator and a liquid monomer to a droplet generating portion; Generating a mixed droplet by applying a vibration to a mixed liquid of a supplied liquid initiator and a liquid monomer; Injecting a mixed droplet into the deposition chamber through the injection portion; Vaporizing the injected mixed droplets through a heating unit disposed inside the deposition chamber; There is provided a chemical vapor deposition method comprising vaporizing an initiator gas phase formed by vaporization of a mixed droplet and monomer vapor phase particles on a substrate to form a polymer thin film.

The vaporizing step may include sequentially passing a mixed droplet through the first heating part and the second heating part coupled to the inside of the deposition chamber.

According to the embodiment of the present invention, the amount of the initiator and the monomer injected into the deposition chamber is increased by injecting the initiator and the monomer into the deposition chamber in a droplet state and then evaporated, and as the injection amount of the initiator and the monomer is increased, The film deposition time can be shortened and the process tack time can be reduced.

1 is a schematic view of a chemical vapor deposition apparatus according to an embodiment of the present invention.
2 is a view for explaining a heating unit of a chemical vapor deposition apparatus according to an embodiment of the present invention.
3 is a flowchart of a chemical vapor deposition method according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and specific embodiments are illustrated in the drawings and described in detail in the detailed description. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.

Hereinafter, a chemical vapor deposition apparatus and a chemical vapor deposition method according to the present invention will be described in detail with reference to the accompanying drawings, wherein like reference numerals designate corresponding or corresponding components And redundant explanations thereof will be omitted.

FIG. 1 is a schematic view of a chemical vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a view for explaining a heating unit of a chemical vapor deposition apparatus according to an embodiment of the present invention.

1 and 2 show the deposition chamber 10, the substrate seating portion 50, the substrate 30, the jetting portion 100, the heating portion 200, the first heating portion 210, the heating wires 215 and 235 The second heating part 230, the third heating part 250, the initiator supplying part 310, the monomer supplying part 330, the carrier gas supplying part 350, the droplet generating part 370, the mixing tank 371 ) And a piezoelectric body 373 are shown.

The chemical vapor deposition apparatus according to the present embodiment includes a deposition chamber 10; A substrate seating part (50) located inside the deposition chamber (10) and on which the substrate (30) is placed; An initiator supply unit 310 provided outside the deposition chamber 10 for supplying a liquid phase initiator; A monomer supply unit 330 provided outside the deposition chamber 10 for supplying a liquid monomer; A droplet generating unit 370 having a piezoelectric body 373 for generating mixed droplets by applying a vibration to a mixed liquid of a liquid phase initiator and a liquid monomer supplied from the initiator supplying unit 310 and the monomer supplying unit 330; And a jetting section 100 for jetting the mixed droplet generated by the droplet generating section 370 to the upper portion of the substrate 30. The initiator droplet and the monomer droplet are injected into the deposition chamber 10 and then evaporated, The amount of the initiator and the monomer injected into the substrate 10 is increased and the amount of the initiator and monomer injected is increased, so that the thin film deposition time of the substrate 30 can be shortened.

The inside of the deposition chamber 10 can be maintained in a vacuum state by a vacuum pump (not shown) where the thin film deposition is performed on the substrate 30 within the deposition chamber 10, and when the thin film deposition is performed in an atmospheric pressure state, It is also possible to maintain the atmospheric pressure.

The substrate seating portion 50 is located inside the deposition chamber 10 and the substrate 30 is seated. The substrate seating portion 50 is located below the deposition chamber 10 and supports the lower surface of the substrate 30.

Initiator supply part 310 is provided outside of deposition chamber 10 and supplies a liquid phase initiator. The initiator supply unit 310 stores a liquid initiator, and then supplies a liquid initiator to the droplet generating unit 370, which will be described later, in order to proceed with the deposition process.

An initiator is a substance that induces activation of the first reaction so that the monomer can form a polymer in the process of the present invention. The initiator of this embodiment may be a thermal initiator or a UV initiator, but the material is not particularly limited as long as it is an initiator capable of decomposing by heating to activate the monomer.

The monomer supply part 330 is provided outside the deposition chamber 10 and supplies a liquid monomer. The monomer supplying part 330 stores the monomer in a liquid state, and supplies a liquid monomer to the droplet generating part 370, which will be described later, in order to carry out the deposition process.

The monomer is a unit which can be used for polymer formation, and is not particularly limited as long as it is a substance which can be activated by an initiator.

The supply of the liquid phase initiator and the liquid monomer may be performed by various methods such as a pump feeding method.

The droplet generating unit 370 includes a piezoelectric body for generating mixed droplets by applying a vibration to a mixed liquid of a liquid phase initiator and a liquid monomer supplied from the initiator supplying unit 310 and the monomer supplying unit 330.

The droplet generating unit 370 includes a mixing tank 371 in which a mixed liquid of the supplied liquid initiator and the liquid monomer is received and the piezoelectric body 373 can be coupled to the mixing tank 371.

The mixing tank 371 is provided with an internal space to store the mixed liquid of the liquid phase initiator and the liquid monomer, and supplies the mixed droplets generated by the piezoelectric body 373 to the jetting unit 100.

The piezoelectric substance 373 is immersed in the mixed liquid supplied to the lower part of the mixing tank 371, and ultrasonic vibration is applied to the mixed liquid to convert the mixed liquid into atomized drops.

The jetting section (100) injects the mixed droplet generated in the droplet generating section (370) onto the top of the substrate (30).

In this embodiment, the jetting unit 100 is coupled to the upper portion of the deposition chamber 10, and the mixed droplet is distributed over the heating unit 200 positioned above the substrate seating unit 50 so as to be jetted.

The chemical vapor deposition apparatus according to the present embodiment further includes a carrier gas supply unit 350 connected to the mixing chamber 371 to supply a carrier gas to the mixing chamber 371, So that the mixed droplet can be injected through the injector 100.

The carrier gas supplied to the mixing tank 371 carries a mixed droplet of the initiator and the monomer and injects the mixed droplet of the initiator and the monomer into the deposition chamber 10 through the injection unit 100.

The carrier gas may be an inert gas or a gas that does not react with the mixed liquid, and may be a carrier medium for injecting mixed droplets of an initiator and a monomer into the upper portion of the deposition chamber 10 through the injection unit 100. For example, the carrier gas may be argon (Ar) or nitrogen (N2). However, the carrier gas is not limited to the type of the gas and may be variously changed depending on the kind of the thin film to be deposited.

On the other hand, the jetting section 100 ejects the mixed droplet generated by the droplet generating section 370 onto the upper portion of the substrate.

The mixed droplet generated by the droplet generating unit 370 is supplied to the spraying unit 100 by the carrier gas and is sprayed to the upper part of the deposition chamber through the spraying unit 100. The jetting section 100 may include a jetting nozzle.

On the other hand, the heating unit 200 is located above the substrate 30 and heats the mixed droplets as they pass through the spray unit 100 to vaporize the mixed droplets. The mixed liquid droplets are lowered from the upper part of the deposition chamber 10 to the lower part by gravity and pass through the heating part 200. The mixture liquid is heated and vaporized while passing through the heating part 200.

The heating unit 200 includes a first heating unit 210 for heating the mixed liquid droplets to generate vaporized vapor phase particles and monomer vapor phase particles, a second heating unit 210 located below the first heating unit 210, And a second heating unit 230 for activating the second heating unit.

The first heating unit 210 generates gas phase initiator gas phase and monomer vapor phase particles by heating the mixed liquid droplet to be vaporized. The first heating unit 210 is located below the ejection region where the mixed droplet is injected into the deposition chamber 10, and heats the mixed droplet that is sprayed and falls to vaporize.

The second heating part 230 is located below the first heating part 210. The vaporized initiator vapor particles passing through the first heating part 210 pass through the second heating part 230 again and are reheated, And the initiator gas phase particles are activated. The heating temperature of the first heating unit 210 may be higher than the heating temperature of the second heating unit 230. This is because the vaporizing heat for vaporizing the mixed droplet is larger than the heat of decomposition for activating the initiator.

Meanwhile, a third heating unit 250 for heating the initiator vapor phase particles and the monomer vapor phase particles to prevent cooling may be disposed below the second heating unit 230. The third heating unit 250 prevents the temperature of the activated initiator vapor phase particles from dropping, and enables deposition of the polymer thin film on the substrate 30 stably.

Each of the first heating unit 210 and the second heating unit 230 may include a plurality of heat lines 215 and 235 spaced apart from each other at regular intervals. The heating wire 215 of the first heating part 210 may be arranged along one direction inside the deposition chamber 10 so as to pass the mixture liquid droplets against the substrate 30, (235) may be disposed along one direction inside the deposition chamber (10) so that the initiator gas phase particles and the monomer vapor phase particles pass.

The heat rays 215 of the plurality of first heating parts 210 and the heat rays 235 of the plurality of second heating parts 230 may be arranged parallel to each other or may be arranged to intersect with each other.

The heating wire 255 of the third heating unit 250 is disposed along one direction inside the deposition chamber 10 so that the initiator vapor phase particles and the monomer vapor phase particles are opposed to the substrate 30. [

like this. The initiator and the monomer can be injected into the deposition chamber 10 in the form of droplets to increase the injection amount of the initiator and the monomer injected into the deposition chamber 10 as compared with the conventional gas phase injection method, The thin film deposition time of the substrate 30 can be shortened and the tack time can be reduced.

4 is a flowchart of a chemical vapor deposition method according to another embodiment of the present invention. The chemical vapor deposition method according to this embodiment includes: supplying a liquid phase initiator and a liquid monomer to a droplet generating unit 370; Generating a mixed droplet by applying a vibration to a mixed liquid of a supplied liquid initiator and a liquid monomer; Spraying a mixed droplet into the deposition chamber (10) through the jetting section (100); Vaporizing the injected mixed droplets through a heating unit (200) disposed inside the deposition chamber; And vaporizing the mixed liquid droplets to form the polymer thin film by vaporizing the initiator gas phase particles and the monomer gas phase particles formed on the substrate 30. [

Hereinafter, a chemical vapor deposition method according to the present embodiment will be described with reference to FIG.

First, a liquid phase initiator and a liquid monomer are supplied to the droplet generating unit 370 through an initiator supplying unit 310 and a monomer supplying unit 330 provided outside the deposition chamber 10 (S400).

The mixed liquid of the supplied liquid initiator and the liquid monomer is ultrasonically vibrated by the piezoelectric body 373 coupled to the lower part of the droplet generating unit 370 and converted into a droplet form (S500).

The generated initiator droplet and monomer droplet are injected to the upper part of the deposition chamber 10 through the injection part 100 (S600).

The mixed liquid droplets are lowered by gravity, and the mixed liquid droplets are heated and vaporized by the heating unit 200 while passing through the heating unit 200 (S700).

The vaporizing step S700 may include sequentially passing the mixed droplets through the first heating unit 210 and the second heating unit 230, which are coupled to the inside of the deposition chamber 10, sequentially.

The mixed liquid sprayed onto the substrate 30 by the sprayer 100 is lowered by the gravity and sequentially passes through the first heating unit 210 and the second heating unit 230, The mixed liquid droplets are vaporized while passing through the first heating unit 210 to generate the vapor phase particles of the initiator and the vapor phase monomers. The vapor phase particles of the initiator are pyrolyzed and activated by passing through the second heating unit 230.

The initiator gas phase particles and the monomer gas phase particles generated while passing through the heating unit 200 are deposited on the surface of the substrate 30 that is seated on the substrate seating unit 50 and the polymer thin film (S800).

like this. The initiator and the monomer can be injected into the deposition chamber 10 in the form of droplets to increase the injection amount of the initiator and the monomer injected into the deposition chamber 10 as compared with the conventional gas phase injection method, The thin film deposition time of the substrate 30 can be shortened and the tack time can be reduced.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the following claims And changes may be made without departing from the spirit and scope of the invention.

10: deposition chamber 50: substrate seating part
30: substrate 100:
200: heating section 210: first heating section
215, 235, 255: heat line 230: second heating section
250: third heating section 310: initiator supply section
330: monomer supply part 350: carrier gas supply part
370: droplet generating unit 371: mixing tank
373:

Claims (13)

A deposition chamber;
A substrate seating part located inside the deposition chamber and on which the substrate is placed;
An initiator supply unit provided outside the deposition chamber and supplying a liquid phase initiator;
A monomer supply unit provided outside the deposition chamber and supplying a liquid monomer;
A droplet generating unit having a piezoelectric body for generating a mixed droplet by applying a vibration to a mixed liquid of the initiator in the liquid phase and the monomer in the liquid phase supplied from the initiator supplying unit and the monomer supplying unit;
And a jetting unit for jetting the mixed droplet generated by the droplet generating unit to the top of the substrate,
Further comprising a heating unit positioned in the deposition chamber and positioned above the substrate seating unit to vaporize the mixed droplet by heating the mixed droplet sprayed through the spray unit,
The heating unit includes:
A first heating unit for heating the mixed liquid droplet to vaporize to generate initiator vapor phase particles and monomer vapor phase particles;
And a second heating unit located below the first heating unit for heating and activating the initiator vapor phase particles,
Wherein the heating temperature of the first heating section is higher than the heating temperature of the second heating section. The method according to claim 1,
Wherein the droplet generating unit comprises:
And a mixing tank in which a mixed liquid of the initiator and the liquid monomer in the supplied liquid phase is contained,
And the piezoelectric body is bonded to the mixing tank. 3. The method of claim 2,
And a carrier gas supply unit connected to the mixing tank to supply a carrier gas to the mixing tank,
And the mixed liquid droplet is injected through the injection part by the carrier gas. The method of claim 3,
Wherein the carrier gas is argon (Ar) or nitrogen (N2). delete delete delete The method according to claim 1,
Wherein each of the first heating portion and the second heating portion includes a plurality of heat lines spaced apart from each other at regular intervals. 9. The method of claim 8,
Wherein the distance of the heat ray of the first heating portion is larger than the distance of the heat ray of the second heating portion. The method according to claim 1,
The heating unit includes:
And a third heating unit located below the second heating unit and heating the initiator vapor phase particles to prevent cooling. 11. The method of claim 10,
Wherein the third heating section includes a plurality of heat lines spaced apart from each other at regular intervals. Supplying a liquid phase initiator and a liquid monomer to a droplet generating portion;
Generating a mixed droplet by applying a vibration to a mixed liquid of the initiator and the liquid monomer in a liquid phase;
Injecting the mixed droplet into the deposition chamber through a jetting portion;
Vaporizing the injected mixture droplets through a heating unit disposed in the deposition chamber;
Forming a polymer thin film by vaporizing the initiator gas phase and monomer vapor phase particles formed by vaporizing the mixed droplet on a substrate,
Wherein the vaporizing step comprises:
And sequentially passing the mixed droplet through the first heating unit and the second heating unit coupled to the inside of the deposition chamber,
Wherein the heating temperature of the first heating section is higher than the heating temperature of the second heating section. delete

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