KR101425514B1 - Artificial Marble Having Natural Pattern and Partial Luminescent and Method or Preparing Thereof - Google Patents
Artificial Marble Having Natural Pattern and Partial Luminescent and Method or Preparing Thereof Download PDFInfo
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- KR101425514B1 KR101425514B1 KR1020110145952A KR20110145952A KR101425514B1 KR 101425514 B1 KR101425514 B1 KR 101425514B1 KR 1020110145952 A KR1020110145952 A KR 1020110145952A KR 20110145952 A KR20110145952 A KR 20110145952A KR 101425514 B1 KR101425514 B1 KR 101425514B1
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- silica
- artificial marble
- resin composition
- natural stone
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- 239000002928 artificial marble Substances 0.000 title claims abstract description 64
- 238000000034 method Methods 0.000 title claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 176
- 239000004575 stone Substances 0.000 claims abstract description 75
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 67
- 150000001875 compounds Chemical class 0.000 claims abstract description 52
- 229920006337 unsaturated polyester resin Polymers 0.000 claims abstract description 50
- 239000000049 pigment Substances 0.000 claims abstract description 48
- 239000000203 mixture Substances 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 33
- 239000001023 inorganic pigment Substances 0.000 claims abstract description 17
- 239000012860 organic pigment Substances 0.000 claims abstract description 17
- 239000011342 resin composition Substances 0.000 claims description 64
- 239000002245 particle Substances 0.000 claims description 53
- 238000002156 mixing Methods 0.000 claims description 20
- 239000010453 quartz Substances 0.000 claims description 18
- 239000004576 sand Substances 0.000 claims description 18
- 239000011256 inorganic filler Substances 0.000 claims description 17
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000003431 cross linking reagent Substances 0.000 claims description 14
- 239000000843 powder Substances 0.000 claims description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 10
- 229910000077 silane Inorganic materials 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- 238000009825 accumulation Methods 0.000 claims description 4
- 239000002250 absorbent Substances 0.000 claims description 3
- 238000000748 compression moulding Methods 0.000 claims description 3
- 239000004579 marble Substances 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 2
- 230000005494 condensation Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 12
- 230000000052 comparative effect Effects 0.000 description 13
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- 239000003086 colorant Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 229920006305 unsaturated polyester Polymers 0.000 description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- KDCDRDLFMIISIA-UHFFFAOYSA-N 2,2-dimethyl-6-oxoheptanoic acid Chemical compound CC(=O)CCCC(C)(C)C(O)=O KDCDRDLFMIISIA-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000002969 artificial stone Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920002994 synthetic fiber Polymers 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ZQHJVIHCDHJVII-OWOJBTEDSA-N (e)-2-chlorobut-2-enedioic acid Chemical compound OC(=O)\C=C(\Cl)C(O)=O ZQHJVIHCDHJVII-OWOJBTEDSA-N 0.000 description 1
- SASYHUDIOGGZCN-ARJAWSKDSA-N (z)-2-ethylbut-2-enedioic acid Chemical compound CC\C(C(O)=O)=C\C(O)=O SASYHUDIOGGZCN-ARJAWSKDSA-N 0.000 description 1
- ORTVZLZNOYNASJ-UPHRSURJSA-N (z)-but-2-ene-1,4-diol Chemical compound OC\C=C/CO ORTVZLZNOYNASJ-UPHRSURJSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- DRMYLINAGHHBNG-UHFFFAOYSA-N 2-oxo-3h-furan-4-carboxylic acid Chemical compound OC(=O)C1=COC(=O)C1 DRMYLINAGHHBNG-UHFFFAOYSA-N 0.000 description 1
- CWPKTBMRVATCBL-UHFFFAOYSA-N 3-[1-[1-[(2-methylphenyl)methyl]piperidin-4-yl]piperidin-4-yl]-1h-benzimidazol-2-one Chemical compound CC1=CC=CC=C1CN1CCC(N2CCC(CC2)N2C(NC3=CC=CC=C32)=O)CC1 CWPKTBMRVATCBL-UHFFFAOYSA-N 0.000 description 1
- PKBVYRDGTJBIKR-UHFFFAOYSA-N C(=C)C(O)C(CO)(CO)CO Chemical compound C(=C)C(O)C(CO)(CO)CO PKBVYRDGTJBIKR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000005084 Strontium aluminate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- MLDWIYATQASALW-UHFFFAOYSA-N pent-1-ene-1,1-diol Chemical compound CCCC=C(O)O MLDWIYATQASALW-UHFFFAOYSA-N 0.000 description 1
- MHGMBRBPBZPUAD-UHFFFAOYSA-N pent-4-ene-1,2,3-triol Chemical compound OCC(O)C(O)C=C MHGMBRBPBZPUAD-UHFFFAOYSA-N 0.000 description 1
- -1 pentaerythritol Chemical class 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- FNWBQFMGIFLWII-UHFFFAOYSA-N strontium aluminate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Sr+2].[Sr+2] FNWBQFMGIFLWII-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B24/00—Use of organic materials as active ingredients for mortars, concrete or artificial stone, e.g. plasticisers
- C04B24/24—Macromolecular compounds
- C04B24/28—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C04B24/283—Polyesters
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B14/00—Use of inorganic materials as fillers, e.g. pigments, for mortars, concrete or artificial stone; Treatment of inorganic materials specially adapted to enhance their filling properties in mortars, concrete or artificial stone
- C04B14/02—Granular materials, e.g. microballoons
- C04B14/04—Silica-rich materials; Silicates
- C04B14/06—Quartz; Sand
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B3/00—Producing shaped articles from the material by using presses; Presses specially adapted therefor
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2103/00—Function or property of ingredients for mortars, concrete or artificial stone
- C04B2103/54—Pigments; Dyes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/54—Substitutes for natural stone, artistic materials or the like
- C04B2111/542—Artificial natural stone
- C04B2111/545—Artificial marble
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Civil Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
본 발명은 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 유기안료, 무기안료 또는 이들의 혼합물(C)을 포함하는 비축광성 모재(I) 70 ~ 95 중량% ; 및 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(D)를 포함하는 축광성 무정형 무늬 부분(II) 5 ~ 30 중량%;를 포함하고, 상기 축광성 무정형 무늬 부분(II)의 총표면적은 인조대리석 표면적의 5 ~ 30 %인 것을 특징으로 하는 자연석 질감 및 부분 축광성을 갖는 인조대리석을 제공한다. 본 발명의 인조대리석은 밝은 곳에서는 자연석 질감을 가지면서 어두운 곳에서는 부분적은 축광 효과로 인한 새로운 질감을 발현한다.The present invention relates to a non-shrinkable base material (I) comprising 70 to 95% by weight of an unsaturated polyester resin (A), a silica-containing compound (B) and an organic pigment, an inorganic pigment or a mixture thereof (C); And 5 to 30% by weight of an accumulative amorphous pattern portion (II) comprising an unsaturated polyester resin (A), a silica containing compound (B) and a phosphorescent pigment (D) ) Is 5 to 30% of the total surface area of the artificial marble. The present invention provides an artificial marble having a natural stone texture and a partial accumulative property. The artificial marble of the present invention has a natural stone texture in a bright place and a new texture due to a partial luminous effect in a dark place.
Description
본 발명은 자연석 질감 및 부분 축광성을 갖는 인조대리석 및 그 제조방법에 관한 것이다. 보다 구체적으로, 본 발명은 불포화 폴리에스테르 수지, 실리카 함유 화합물 및 안료(유기안료, 무기안료 또는 이들의 혼합물)를 포함하는 비축광성 모재와 불포화 폴리에스테르 수지, 실리카 함유 화합물 및 축광안료를 포함하는 축광성 무정형 무늬 부분을 포함하여 자연석 질감 및 축광성 패턴을 형성하는 인조대리석에 관한 것이다.
TECHNICAL FIELD The present invention relates to an artificial marble having a natural stone texture and a partial accumulative property, and a method of manufacturing the same. More specifically, the present invention relates to a non-shrinkable base material comprising an unsaturated polyester resin, a silica-containing compound and a pigment (an organic pigment, an inorganic pigment or a mixture thereof), a shaft containing an unsaturated polyester resin, To an artificial marble forming a natural-stone texture and an accumulative pattern including a light-like amorphous pattern portion.
화강암(Granite)이나 대리석(Marble)과 같은 천연석은 표면의 무늬가 아름다워 예로부터 건축 장식재로 사용되어 왔으며, 최근에는 고품격 질감을 나타내는 재료로서 각광을 받아 바닥재, 벽체, 싱크대 상판 등의 분야에서 그 수요가 크게 증가되고 있다. 이로 인해 고가의 천연석만으로는 그 수요를 충족할 수 없게 되고, 이를 계기로 다양한 종류의 인조석이 개발되었다.Natural stones such as granite and marble have been used as decorative materials since ancient times because of their beautiful surface pattern. Recently, they have been spotlighted as high-quality textured materials, and their demand in the fields of flooring, walls, . As a result, expensive natural stone alone can not meet the demand, and a variety of artificial stones have been developed.
인조석은 크게 아크릴계 또는 불포화 폴리에스테르 베이스 수지에 무기 충진제, 착색제, 경화제 등 각종 혼합재료를 첨가하여 제조되는 일반 인조석과, 무기계(실리카계) 천연광물과 바인더 수지를 혼합한 컴파운드(compound)를 진공 압축 성형하여 천연석의 질감을 그대로 나타내도록 만든 수지계 강화 천연석(일명 "Engineering stone"이라고 함)으로 분류된다.Artificial stones are mainly produced by adding various synthetic materials such as inorganic fillers, coloring agents and hardeners to acrylic or unsaturated polyester base resins, and inorganic compounds (silica-based) natural minerals and binder resins, It is classified as a resin-reinforced natural stone (also called "Engineering stone") which is molded and made to express the texture of natural stone.
상기 수지계 강화 천연석은 혼합되는 천연광물의 종류, 수지 또는 안료의 색상, 교반 공정 등에 따라 다양한 색상과 질감을 나타내도록 제조될 수 있으며, 천연광물을 주원료로 하기 때문에 일반 인조석보다 훨씬 더 우수한 천연 질감을 나타내어 최근에 그 수요가 크게 증가되고 있다.The resin-reinforced natural stone can be manufactured to exhibit various colors and textures depending on the kinds of natural minerals to be mixed, the colors of resins or pigments, and the stirring process, and natural minerals are used as main raw materials, The demand has been greatly increased recently.
이와 같이 제조되는 수지계 강화 천연석은, 단색으로 제조되거나, 서로 다른 색상의 안료가 각각 첨가되어 서로 다른 색상을 갖는 수지 혼합물을 믹서에서 혼합함으로써 다색톤을 갖도록 제조되거나, 칩을 사용하여 천연석 질감을 갖도록 하고 있다.The resin-reinforced natural stone produced as described above may be prepared to have a multicolor tone by mixing monochromatic pigments or pigments of different colors and mixing different resin colors in a mixer, or by using chips to have a natural stone texture .
그러나, 위와 같은 종래 수지계 강화 천연석의 색감, 패턴, 무늬는 이미 오래전 사용되어 오던 것으로서, 천연석이 가지고 있는 다양한 질감의 연출을 요구하는 소비자의 욕구를 충족시키기에는 부족하며, 단조로운 느낌을 탈피하고 있지 못하다는 문제점이 있다.However, the color, pattern and pattern of the conventional resin-reinforced natural stone as described above have been used for a long time, and they are not sufficient to meet the desire of consumers demanding the production of various textures possessed by natural stones, There is a problem.
이러한 인조대리석의 기능 및 성능 향상을 위한 시도로서 축광재 등의 야광발광성 물질이나 자외선 흡수에 동반하여 발광하는 자외선발광재 등의 발광성 물질을 이용하여 인조대리석에 발광 기능을 부여하는 시도가 계속되어 왔다.As an attempt to improve the function and performance of such artificial marble, attempts have been made to impart a luminescent function to artificial marble by using a luminescent material such as a luminous luminescent material such as a phosphorescent material or an ultraviolet luminescent material that emits light accompanying ultraviolet absorption .
그러나 기존의 축광성 인조대리석은 표면에 축광안료를 코팅하거나 축광성 칩(Chip)을 활용하여 질감을 창출하는 방식이었다. 축광성 칩을 사용할 경우 균일한 축광성을 나타낼 수 없고, 표면에 축광안료를 코팅한 경우는 사람 이동이 많은 바닥이나 표면 경도로 인하여 오랜 시간을 사용 못하는 문제점이 있었다.Conventional artificial marble, however, was a method of coating the surface with a phosphorescent pigment or using a condensing chip to create texture. When a photoconductive chip is used, it can not exhibit uniform photoconductivity. When a phosphorescent pigment is coated on the surface, there is a problem in that it can not be used for a long time due to a surface having a lot of human movement or surface hardness.
또한, 종래의 축광성 인조대리석은 충분한 축광성능 달성을 위하여 축광안료를 과량 사용하였다. 그러나 축광안료는 고가의 물질로서 이를 과량 사용하게 되면 제조원가의 증대로 상용화에 큰 걸림돌이 될 수 밖에 없다. 따라서 축광안료의 사용을 최소화하면서 충분한 축광성을 달성하는 것이 요구되어 왔다.Conventional artificial marble has also used excessive amounts of phosphorescent pigments to achieve sufficient luminous performance. However, phosphorescent pigments are expensive materials, and if they are used excessively, they will be a big obstacle to commercialization due to an increase in manufacturing cost. Therefore, there has been a demand for achieving sufficient accumulative properties while minimizing the use of phosphorescent pigments.
따라서 본 발명자들은 이러한 문제점을 인지하여 적절한 배합비율을 연구하였으며, 그 결과 축광안료의 함량을 최소화하면서 장시간 동안 충분한 휘도로 지속되는 축광성을 달성하고, 자연석에 가까운 인조대리석의 질감을 유지하는 인조대리석을 개발하기에 이른 것이다.
Therefore, the inventors of the present invention have studied an appropriate blend ratio and have found that the blend of the artificial marble, which maintains the texture of the artificial marble close to the natural stone, To develop.
본 발명의 목적은 축광 효과를 갖는 인조대리석을 제공하는 것이다.It is an object of the present invention to provide an artificial marble having a phosphorescent effect.
본 발명의 다른 목적은 부분적으로 축광패턴을 갖는 인조대리석을 제공하는 것이다.Another object of the present invention is to provide an artificial marble having a partial luminous pattern.
본 발명의 다른 목적은 자연석 질감을 가지면서 부분적인 축광패턴을 갖는 인조대리석을 제공하는 것이다.Another object of the present invention is to provide an artificial marble having a natural stone texture and a partial luminous pattern.
본 발명의 다른 목적은 표면경도를 저하시키지 않으면서 우수한 축광 효과를 갖는 인조대리석을 제공하는 것이다.Another object of the present invention is to provide artificial marble having excellent phosphorescent effect without lowering surface hardness.
본 발명의 다른 목적은 자연석 질감을 가지면서 부분적인 축광패턴을 갖는 인조대리석의 제조방법을 제공하는 것이다.Another object of the present invention is to provide a method of manufacturing an artificial marble having a natural stone texture and a partial luminous pattern.
본 발명의 상기 목적 및 기타의 목적들은 하기 설명되는 본 발명에 의하여 모두 달성될 수 있다.
These and other objects of the present invention can be achieved by the present invention described below.
상기 과제를 해결하기 위하여, 본 발명의 부분 축광성 인조대리석은 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 유기안료, 무기안료 또는 이들의 혼합물(C)을 포함하는 비축광성 모재(I) 70 ~ 95 중량% 및 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(D)를 포함하는 축광성 무정형 무늬 부분(II) 5 ~ 30 중량%를 포함할 수 있으며, 상기 축광성 무정형 무늬 부분(II)의 총 표면적은 인조대리석 표면적의 5 ~ 30 %인 것을 특징으로 한다.In order to solve the above problems, the partially-photostable artificial marble of the present invention comprises a non-shrinking base material (A) containing an unsaturated polyester resin (A), a silica-containing compound (B), and an organic pigment, (II) comprising 70 to 95% by weight of an amorphous polyester resin (I) and an unsaturated polyester resin (A), a silica containing compound (B) and a phosphorescent pigment (D) , And the total surface area of the accumulative amorphous pattern portion (II) is 5 to 30% of the artificial marble surface area.
본 발명의 일 구체예에 따르면, 상기 비축광성 모재(I)는 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 90 ~ 93 중량%를 포함하는 비축광성 모재(I) 조성물 100 중량부에 대하여 유기안료, 무기안료 또는 이들의 혼합물(C) 0.1 ~ 1 중량부를 포함하는 것을 특징으로 하며, 상기 축광성 무정형 무늬 부분(II)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 85 ~ 91 중량%, 및 축광안료(D) 2 ~ 5 중량%를 포함하는 것을 특징으로 한다.According to one embodiment of the present invention, the non-shrinkable base material (I) is a non-shrinkable base material (I) comprising 7 to 10% by weight of an unsaturated polyester resin (A) and 90 to 93% by weight of a silica- (A) 7 to 10 (A), wherein the photographic amorphous pattern portion (II) comprises 0.1 to 1 part by weight of an organic pigment, an inorganic pigment or a mixture thereof 85 to 91% by weight of the silica-containing compound (B), and 2 to 5% by weight of the phosphorescent pigment (D).
상기 실리카 함유 화합물(B)은 실리카 함유 화합물(B) 100 중량%에 대하여 천연석 입자(B1) 50 ~ 80 중량% 및 무기질 충전재(B2) 20 ~ 50 중량%를 포함하는 것을 특징으로 한다.The silica-containing compound (B) is characterized by comprising 50 to 80% by weight of the natural stone particles (B1) and 20 to 50% by weight of the inorganic filler (B2) based on 100% by weight of the silica-containing compound (B).
상기 천연석 입자(B1)는 천연석 입자(B1) 100 중량%에 대하여 실리카 샌드(b1) 15 ~ 93 중량% 및 석영칩(b2) 7 ~ 85 중량%를 포함하는 것을 특징으로 한다.The natural stone particles (B1) comprise 15 to 93% by weight of a silica sand (b1) and 7 to 85% by weight of a quartz chip (b2) based on 100% by weight of the natural stone particles (B1).
본 발명의 다른 구체예에 따르면, 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 유기안료, 무기안료 또는 이들의 혼합물(C)을 혼합하여 비축광성 수지 조성물(i)을 준비하는 단계; 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 축광안료(D)를 혼합하여 축광성 수지 조성물(ii)을 준비하는 단계; 상기 비축광성 수지 조성물(i) 70 ~ 95 중량% 및 축광성 수지 조성물(ii) 5 ~ 30 중량%를 혼합하여 컴파운드(iii)를 제조하는 단계; 및 상기 컴파운드(iii)를 적재 플레이트에 시트 형태로 공급한 다음 고압으로 압축 성형하는 단계;를 거쳐 자연석 질감 및 부분 축광성을 갖는 인조대리석을 제조할 수 있다.
According to another embodiment of the present invention, a non-shrinkable resin composition (i) is prepared by mixing an unsaturated polyester resin (A), a silica-containing compound (B) and an organic pigment, an inorganic pigment or a mixture (C) step; (Ii) by mixing the unsaturated polyester resin (A), the silica-containing compound (B), and the phosphorescent pigment (D); Preparing compound (iii) by mixing 70 to 95% by weight of the non-shrinkable resin composition (i) and 5 to 30% by weight of the light-accumulating resin composition (ii); And a step of supplying the compound (iii) to the mounting plate in a sheet form and then compression-molding the compound (iii) at a high pressure to produce an artificial marble having a natural stone texture and a partial accumulative property.
본 발명의 인조대리석은 밝은 곳에서는 자연석 질감을 가지고, 표면경도를 저하시키지 않으면서 어두운 곳에서는 부분적은 축광 효과로 인한 새로운 질감을 발현한다.
The artificial marble of the present invention has a natural stone texture in a bright place and a new texture due to a phosphorescent effect partially in a dark place without lowering the surface hardness.
도 1은 실내 조명에서 본 발명의 인조대리석을 촬영한 사진이다.
도 2는 암실에서 본 발명의 인조대리석을 촬영한 사진이다.
도 3은 축광성 수지 조성물 함량에 따른 인조대리석을 촬영한 사진이다.Fig. 1 is a picture of the artificial marble of the present invention taken in an indoor lighting.
2 is a photograph of the artificial marble of the present invention taken in a dark room.
3 is a photograph of artificial marble according to the content of the resin composition.
이하, 본 발명을 구체적으로 설명하기로 한다.Hereinafter, the present invention will be described in detail.
축광성Accumulation 인조대리석 Artificial marble
본 발명은 자연석 질감을 가지면서 부분적인 축광 효과를 갖는 인조대리석에 관한 발명으로서, 상기 인조대리석은 비축광성 모재(I) 및 축광성 무정형 무늬 부분(II)으로 이루어지는 것을 특징으로 한다. The present invention relates to an artificial marble having a natural stone texture and partial luminous effect, wherein the artificial marble comprises a non-shrinking base material (I) and an accumulative amorphous pattern portion (II).
본 발명의 인조대리석은 도 1에 도시된 바와 같이 밝은 곳에서는 전체적으로 기존 자연석의 외관 및 질감을 가지면서, 도 2와 같이 조명이 어두워지면 상기 축광성 무정형 무늬 부분(II)의 축광안료로 인하여 부분적인 축광 패턴을 형성하게 된다.As shown in FIG. 1, the artificial marble of the present invention has the appearance and texture of an existing natural stone as a whole in a bright place, and when the illumination becomes dark as shown in FIG. 2, the luminous pigment of the photographic amorphous pattern portion (II) Thereby forming an intense phosphorescence pattern.
상기 비축광성 모재(I)는 본 발명의 인조대리석이 자연석에 가까운 외관과 질감을 갖도록 하기 위하여 필요한 구성요소로서, 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 유기안료, 무기안료 또는 이들의 혼합물(C)을 포함하여 이루어진다. (A), a silica-containing compound (B) and an organic pigment, an inorganic pigment or an organic pigment, which is a component necessary for the artificial marble of the present invention to have an appearance and texture close to natural stones, And a mixture (C) of these.
본 발명의 구체예에서, 상기 비축광성 모재(I)는 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 90 ~ 93 중량%를 포함하는 비축광성 모재 조성물 100 중량부에 대하여 유기안료, 무기안료 또는 이들의 혼합물(C) 0.1 ~ 1 중량부를 포함하는 것이 바람직하다.In the embodiment of the present invention, the non-shrinkable base material (I) is a mixture of 100 parts by weight of the non-shrinkable base material composition comprising 7 to 10% by weight of the unsaturated polyester resin (A) and 90 to 93% by weight of the silica- And 0.1 to 1 part by weight of an organic pigment, an inorganic pigment or a mixture thereof (C).
한편, 상기 축광성 무정형 무늬 부분(II)은 인조대리석에 부분적인 축광 효과를 부여하기 위한 구성으로서, 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(D)를 포함하여 이루어진다. 즉, 안료 성분으로 비축광성 모재(I)의 유기안료, 무기안료 또는 이들의 혼합물(C) 대신에 축광안료(D)를 사용하는 것 외에는 나머지 성분이 비축광성 모재(I)와 공통된다.On the other hand, the above-mentioned accumulative amorphous pattern portion (II) is composed of an unsaturated polyester resin (A), a silica-containing compound (B) and a phosphorescent pigment (D) for giving a partial luminous effect to the artificial marble . That is, the remaining components are common to the non-shrinkable base material (I) except that the phosphorescent pigment (D) is used instead of the organic pigment, inorganic pigment or mixture (C) of the non-shrinkable base material (I) as the pigment component.
본 발명의 구체예에서, 상기 축광성 무정형 무늬 부분(II)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 85 ~ 91 중량%, 및 축광안료(D) 2 ~ 5 중량%를 포함되는 것이 바람직하다.In the embodiment of the present invention, the photographic amorphous pattern portion (II) contains 7 to 10% by weight of the unsaturated polyester resin (A), 85 to 91% by weight of the silica containing compound (B) 5% by weight.
본 발명의 인조대리석의 부분적인 축광 패턴은 상기 비축광성 모재(I) 및 축광성 무정형 무늬 부분(II)의 함량을 조절함으로써 다양하게 형성할 수 있다.The partial photoluminescence pattern of the artificial marble of the present invention can be variously formed by controlling the content of the non-shrinking base material (I) and the accumulative amorphous pattern portion (II).
본 발명의 구체예에서 비축광성 모재(I) 70 ~ 95 중량%; 및 축광성 무정형 무늬 부분(II) 5 ~ 30 중량%;의 함량으로 포함되는 것이 바람직하며, 보다 바람직하게는 비축광성 모재(I) 80 ~ 90 중량%; 및 축광성 무정형 무늬 부분(II) 10 ~ 20 중량%;로 포함될 수 있다. 상기 축광성 무정형 무늬 부분(II)이 5 중량% 미만으로 포함되는 경우 축광 패턴이 제대로 형성되지 않는 문제점이 있으며, 30 중량%를 초과하여 포함되는 경우에는 자연석 질감을 발현되지 않는 문제점을 가질 수 있다.In an embodiment of the present invention, 70 to 95% by weight of the non-shrinkable base material (I); And 5 to 30% by weight of the condensable amorphous pattern portion (II), more preferably 80 to 90% by weight of the non-shrinkable base material (I); And 10 to 20% by weight of an accumulative amorphous pattern portion (II). When the photostable amorphous pattern portion (II) is contained in an amount of less than 5% by weight, there is a problem that the phosphorescent pattern is not formed properly, and when it exceeds 30% by weight, the natural stone texture may not be developed .
상기의 함량으로 배합함으로써 상기 축광 패턴은 인조대리석 표면적의 5 ~ 30 %를 차지하는 것이 바람직하고, 보다 바람직하게는 10 ~ 20 %를 차지하여 자연스러운 질감을 형성할 수 있다. By blending with the above content, the luminous intensity pattern preferably occupies 5 to 30%, more preferably 10 to 20% of the artificial marble surface area, and natural texture can be formed.
자연스러운 질감 및 식별 가능한 축광 효과를 나타내기 위해서, 상기 축광성 무정형 무늬 부분(II)의 평균면적은 20 ~ 30 % 인 것이 바람직하다. In order to exhibit a natural texture and distinguishable phosphorescent effect, the average area of the accumulative amorphous pattern portion II is preferably 20 to 30%.
이하에서는 본 발명의 인조대리석을 구성하는 각 구성성분에 대하여 구체적으로 살펴보기로 한다.Hereinafter, each component constituting the artificial marble of the present invention will be specifically described.
(A) 불포화 폴리에스테르 수지(A) an unsaturated polyester resin
본 발명에서 수지 성분은 인조대리석의 골격을 형성하는 성분인 천연석 입자 및 무기질 충전재를 감싸고, 가교제와 함께 전체를 결합하는 역할을 하며, 인조대리석이 형성되었을 때 탄성 혹은 인장강도를 부여하는 기능을 한다. In the present invention, the resin component encapsulates the natural stone particles and the inorganic filler, which form the skeleton of the artificial marble, binds the whole together with the crosslinking agent, and functions to impart elasticity or tensile strength when artificial marble is formed .
본 발명은, 상기 수지 성분으로 천연석 입자 등과 결합력이 우수한 불포화 폴리에스테르 수지(UPE resin; Unsaturated PolyEster resin)를 사용하는 것을 특징으로 한다.The present invention is characterized by using UPE resin (Unsaturated Polyester resin) having excellent bonding strength with natural stone particles or the like as the resin component.
본 발명에서 사용되는 불포화 폴리에스테르 수지는 당업계에 통상적으로 공지되어 있으며, 다가산과 다가알콜의 에스테르화 반응 생성물로서 상기 다가산 및/또는 다가알콜 화합물은 불포화 부분을 포함한다.The unsaturated polyester resin used in the present invention is conventionally known in the art, and the polyvalent acid and / or polyhydric alcohol compound as an esterification reaction product of a polyvalent acid and a polyvalent alcohol includes an unsaturated portion.
상기 다가산으로는 폴리카르복실산, 폴리카르복실산 무수물, 폴리카르복실산 할라이드, 폴리카르복실산 에스테르를 사용할 수 있으며, 불포화 폴리카르복실산의 구체적인 예로는 말레익산, 무수말레산, 푸마르산, 클로로말레익산, 에틸말레익산, 이타코닉산, 시트라코닉산, 제로닉산, 리로친코닉산, 메사코닉산, 아코닉산, 에시틸렌 다카르복실산 또는 이들의 혼합물 등을 사용할 수 있다. 또한, 폴리에스테르 수지의 제조에 통상적으로 사용되는 프탈산, 이소프탈산, 테레프탈산, 숙신산 또는 이들의 혼합물을 사용할 수 있다.Examples of the polyvalent acid include polycarboxylic acids, polycarboxylic acid anhydrides, polycarboxylic acid halides and polycarboxylic acid esters. Specific examples of the unsaturated polycarboxylic acids include maleic acid, maleic anhydride, fumaric acid, There may be used chloromaleic acid, ethyl maleic acid, itaconic acid, citraconic acid, geronic acid, lyroconic acid, mesaconic acid, aconic acid, ethylenetradecarboxylic acid or mixtures thereof. Further, phthalic acid, isophthalic acid, terephthalic acid, succinic acid, or a mixture thereof, which are conventionally used in the production of a polyester resin, may be used.
상기 다가 알콜로는 에틸렌글리콜, 디에틸렌글리콜, 프로필렌글리콜, 디프로필렌글리콜, 1,3-부탄디올, 1,6-헥산디올, 네오펜틸글리콜, 1,4-시클로헥산디올 등의 2가 알콜, 글리세린 등의 3가 알콜, 펜타에리쓰리톨 등의 4가 알콜 등 또는 이들의 혼합물을 사용할 수 있다. 또한, 불포화 다가 알콜의 구체적인 예로는 부텐디올, 펜텐디올, 알릴 또는 비닐 글리세롤 에테르, 알릴 또는 비닐 펜타에리쓰리톨, 또는 이들의 혼합물을 사용할 수 있다. Examples of the polyhydric alcohol include dihydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, 1,3-butanediol, 1,6-hexanediol, neopentyl glycol and 1,4- , Trihydric alcohols such as pentaerythritol, and the like, or mixtures thereof. Specific examples of the unsaturated polyhydric alcohols include butenediol, pentenediol, allyl or vinyl glycerol ether, allyl or vinylpentaerythritol, or a mixture thereof.
상기 불포화 폴리에스테르 수지는 그 분자량이 70,000 ~ 100,000인 것을 사용하는 것이 바람직하다. 불포화 폴리에스테르 수지의 분자량이 클수록 천연석 입자와의 결합력이 우수하여 연마 공정에서 수지의 일부분이 깎여 나가더라도 외부로 드러난 천연석 입자를 효과적으로 고정시켜 줄 수 있기 때문이다. 불포화 폴리에스테르 수지의 분자량이 70,000 미만이면 인조대리석의 표면에서 천연석 입자의 탈락현상이 발생할 수 있고, 100,000을 초과하면 점성이 너무 커서 천연석 입자와 잘 혼합되지 않는 단점이 있다.The unsaturated polyester resin preferably has a molecular weight of 70,000 to 100,000. The larger the molecular weight of the unsaturated polyester resin is, the better the binding force with the natural stone particles is, and even if a part of the resin is shaved in the polishing process, the natural stone particles exposed to the outside can be effectively fixed. If the molecular weight of the unsaturated polyester resin is less than 70,000, the natural stone particles may fall off from the surface of the artificial marble. If the molecular weight exceeds 100,000, the viscosity of the natural stone particles is too large to mix well with the natural stone particles.
본 발명에서 상기 불포화 폴리에스테르 수지(A)는 비축광성 모재(I)에 있어서, 불포화 폴리에스테르 수지(A) 및 실리카 함유 화합물(B)을 포함하는 비축광성 모재(I) 조성물 100 중량%에 대하여 7 ~ 10 중량%로 포함될 수 있으며, 축광성 무정형 무늬 부분(II)에 있어서, 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(C)를 포함하는 축광성 무정형 무늬 부분(II) 조성물 100 중량%에 대하여 7 ~ 10 중량%로 포함될 수 있다. 만약, 불포화 폴리에스테르 수지를 7 중량% 미만으로 포함시 천연석 입자와의 결합력이 저하될 수 있으며, 10 중량%를 초과하는 경우에는 천연석의 외관 및 질감을 상실될 수 있기 때문이다.In the present invention, the unsaturated polyester resin (A) is a mixture of 100 wt% of the non-shrinkable base material (I) composition comprising the unsaturated polyester resin (A) and the silica-containing compound (B) (A), the silica-containing compound (B) and the phosphorescent pigment (C) in the photoconductive amorphous pattern portion (II) II) composition in an amount of 7 to 10% by weight based on 100% by weight of the composition. If the unsaturated polyester resin is contained in an amount of less than 7% by weight, the bonding strength with the natural stone particles may be deteriorated. If it exceeds 10% by weight, the appearance and texture of the natural stone may be lost.
(B) 실리카 함유 화합물(B) a silica-containing compound
본 발명의 실리카 함유 화합물(B)은 비축광성 모재(I)에 있어서, 불포화 폴리에스테르 수지(A) 및 실리카 함유 화합물(B)을 포함하는 비축광성 모재(I) 조성물 100 중량%에 대하여 90 ~ 93 중량%로 포함될 수 있으며, 축광성 무정형 무늬 부분(II)에 있어서, 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(C)를 포함하는 축광성 무정형 무늬 부분(II) 조성물 100 중량%에 대하여 85 ~ 91 중량%로 포함될 수 있다. 상기 범위와 같이 실리카 함유 화합물을 고함량으로 포함함으로써 자연석에 가까운 외관 및 질감을 형성할 수 있기 때문이다.The silica-containing compound (B) of the present invention is a non-shrinkable base material (I), which contains 90 to 90% by weight of a non-shrinkable base material (I) composition containing the unsaturated polyester resin (A) (II) containing an unsaturated polyester resin (A), a silica-containing compound (B) and a phosphorescent pigment (C) in the photothermographic amorphous pattern portion (II) And 85 to 91% by weight based on 100% by weight of the composition. This is because the silica-containing compound is contained in a high content as in the above range, so that the appearance and texture close to the natural stone can be formed.
또한, 본 발명의 실리카 함유 화합물(B)은 실리카 함유 화합물(B) 100 중량%에 대하여 천연석 입자(B1) 50 ~ 80 중량% 및 무기질 충전재(B2) 20 ~ 50 중량%를 포함할 수 있다. The silica-containing compound (B) of the present invention may contain 50 to 80% by weight of the natural stone particles (B1) and 20 to 50% by weight of the inorganic filler (B2) based on 100% by weight of the silica-containing compound (B).
(B1) 천연석 입자(B1) Natural stone particles
본 발명의 인조대리석이 천연석에 가까운 외관 및 질감을 형성하기 위하여 천연석 입자를 필수적으로 포함한다. The artificial marble of the present invention essentially contains natural stone particles to form a natural stone-like appearance and texture.
상기 천연석 입자는 자연에서 얻어지는 다양한 종류의 무기계 골재를 사용할 수 있으나, 축광 효과를 증대시키기 위하여 투명성을 가지는 천연석 입자를 사용하는 것이 바람직하다. 투명성을 가지는 천연석 입자를 사용하는 이유는 인조대리석 내부에서 분산이나 난반사를 촉진시키고 이로 인하여 축광안료의 대부분이 빛에너지를 흡수할 수 있게 도와주기 때문이다. The natural stone particles may use various kinds of natural aggregates obtained from nature, but it is preferable to use natural stone particles having transparency in order to increase the luminous effect. The reason why the natural stone particles having transparency is used is that it facilitates the dispersion or diffuse reflection in the artificial marble, thereby allowing most of the phosphorescent pigment to absorb the light energy.
상기 투명성을 가지는 천연석 입자로는 실리카 샌드, 석영칩, 수정 또는 이들의 혼합물로 이루어진 천연석 입자를 사용할 수 있다.As the natural stone particles having transparency, natural stone particles made of silica sand, quartz chips, quartz, or a mixture thereof can be used.
상기 천연석 입자로는 다양한 크기의 광물을 사용하는 것이 가능하나, 0.1 ~ 9.0 mm의 평균입경을 가진 입자를 사용하는 것이 바람직하다. 본 발명의 배합에서 평균입경이 0.1mm 미만의 천연석 입자를 사용하는 경우에는 3 mcd/m2의 휘도에 달하는 시간이 0.6 시간에 불과하게 된다. As the natural stone particles, various sizes of minerals can be used, but it is preferable to use particles having an average particle size of 0.1 to 9.0 mm. In the case of using the natural stone particles having an average particle size of less than 0.1 mm in the blend of the present invention, the time to reach the luminance of 3 mcd / m 2 is only 0.6 hours.
특히, 본 발명에서 상기 천연석 입자는, 평균입경이 상이한 실리카 샌드(b1) 및 석영칩(b2)을 혼합하여 사용하는 것이 바람직하며, 실리카 샌드의 평균입경은 0.1 ~ 1.2mm, 석영칩의 평균입경은 1.2 ~ 9.0mm인 것이 더욱 바람직하다. Particularly, in the present invention, it is preferable that the above-mentioned natural stone particles are mixed with a silica sand (b1) and a quartz chip (b2) having different average particle diameters. The average particle size of the silica sand is 0.1 to 1.2 mm, More preferably 1.2 to 9.0 mm.
이러한 실리카 샌드와 석영칩은 천연석 입자(b1) 전체 100중량%에 대하여 실리카 샌드(b1) 15 ~ 93 중량% 및 석영칩(b2) 7 ~ 85 중량%의 함량으로 포함되는 경우 자연석 질감이 가장 뛰어나다.Such silica sand and quartz chips are most excellent in the natural stone texture when they are contained in an amount of 15 to 93% by weight of the silica sand (b1) and 7 to 85% by weight of the quartz chip (b2) based on 100% by weight of the entire natural stone particles (b1) .
본 발명에서 상기 천연석 입자(B1)는 상기 실리카 함유 화합물(B) 전체 100 중량%에 대하여 50 ~ 80 중량%을 포함할 수 있으며, 상기 범위일 때 축광 효과 및 비용 면에서 바람직하다.In the present invention, the natural stone particles (B1) may contain 50 to 80% by weight based on 100% by weight of the entire silica-containing compound (B).
(B2) 무기질 충전재(B2) Inorganic filler
본 발명에서는 상기 천연석 입자보다 입경이 작은 무기질 충전재을 더 포함할 수 있다. 이러한 무기질 충전재는 인조대리석의 전체 배합에 있어서, 수지 성분의 사용량을 최소화하는 역할을 하여 천연대리석의 외관 및 질감을 최대한 유지시킬 수 있게 하며, 인조대리석의 치밀화에 기여한다. 또한, 축광안료의 사용량을 감소시켜 효율적인 발광에도 기여한다.In the present invention, an inorganic filler having a particle diameter smaller than that of the natural stone particles may be further included. Such an inorganic filler serves to minimize the amount of the resin component used in the whole compounding of the artificial marble, thereby maximizing the appearance and texture of the natural marble and contributing to the densification of the artificial marble. In addition, the use amount of the phosphorescent pigment is reduced, thereby contributing to efficient light emission.
상기 무기질 충전재의 예로는 실리카 파우더, 수산화알루미늄, 유리가루, 석영가루, 탄산칼슘 등을 사용할 수 있으며, 천연석의 실리카 파우더를 사용하는 것이 가장 바람직하다. Examples of the inorganic filler include silica powder, aluminum hydroxide, glass powder, quartz powder, calcium carbonate and the like, and it is most preferable to use silica powder of natural stone.
상기 무기질 충전재의 평균입경은 20 ㎛ 이하인 것이 가장 바람직하다. The average particle diameter of the inorganic filler is most preferably 20 m or less.
본 발명에서 상기 무기질 충전재(B2)는 상기 실리카 함유 화합물(B) 전체 100 중량%에 대하여 20 ~ 50 중량%를 포함할 수 있다. 무기질 충전재의 함량이 20 중량% 미만이면, 제품 성형이 잘 되지 않는 문제가 발생하며, 무기질 충전재의 함량이 50 중량%를 초과하면,불포화 폴리에스테르 수지(A)의 함량이 높아져 제품 표면에 물성이 저하될 수 있다.In the present invention, the inorganic filler (B2) may contain 20 to 50% by weight based on 100% by weight of the total of the silica-containing compound (B). When the content of the inorganic filler is less than 20% by weight, a problem arises that the product is not easily molded. When the content of the inorganic filler exceeds 50% by weight, the content of the unsaturated polyester resin (A) Can be degraded.
(C) 유/무기 안료(C) Oil / Inorganic pigment
본 발명에 있어서 축광성을 나타내는 색상의 다변화를 위하여 유/무기 안료를 더 포함할 수 있다. 상기 유/무기 안료로는 아조계, 프탈로시아닌계가 사용될 수 있으며, 불포화 폴리에스테르 수지(A) 및 실리카 함유 화합물(B)을 포함하는 비축광성 모재(I) 조성물 100 중량%에 대하여 0.1 ~ 1 중량부로 사용하는 것이 바람직하다.In the present invention, an organic / inorganic pigment may be further included for the purpose of diversifying the hue showing the photographic properties. The organic and inorganic pigments may be azo pigments or phthalocyanine pigments and may be used in an amount of 0.1 to 1 part by weight based on 100% by weight of the non-shrinkable base material (I) composition comprising the unsaturated polyester resin (A) and the silica- Is preferably used.
(D) (D) 축광안료Phosphorescent pigment
본 발명의 인조대리석에 축광성를 부여하는 축광안료는 통상의 축광안료라면 제한없이 사용할 수 있으나, 알루민산스트론튬계 안료 또는 황화아연계 안료를 사용하는 것이 바람직하다.The phosphorescent pigment which imparts the photographic properties to the artificial marble of the present invention can be used without limitation as long as it is a conventional phosphorescent pigment, but it is preferable to use a strontium aluminate pigment or a zinc sulfide pigment.
상기 축광안료는 평균입경이 6 ~ 150 ㎛인 것을 사용하는 것이 바람직하다. 상기 축광안료의 평균입경이 6 ㎛ 미만인 경우 발광성능이 저하될 수 있으며, 평균입경이 150 ㎛를 초과하는 경우 초기의 포화상태로 하기 위한 광조사의 시간이 길어지는 문제점이 있다.The phosphorescent pigment preferably has an average particle diameter of 6 to 150 mu m. When the average particle diameter of the phosphorescent pigment is less than 6 탆, the light emitting performance may be deteriorated. When the average particle diameter exceeds 150 탆, there is a problem that the light irradiation time for initial saturation is prolonged.
한편, 축광안료는 고가의 물질이므로 축광안료의 사용비율을 최소화하면서 인조대리석의 발광성능을 최대화하는 것이 중요하며, 본 발명에서는 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(C)를 포함하는 축광성 무정형 무늬 부분(II) 조성물 100 중량%에 대하여 2 ~ 5 중량%를 사용하는 것이 바람직하다. 본 발명의 배합비율에서 축광안료를 2 중량% 미만으로 사용하는 경우에는 충분한 축광효과를 나타낼 수 없으며, 5 중량%를 초과하는 경우에는 경제성 측면에서 바람직하지 못하며, 다량 사용에도 불구하고 추가적인 축광성능의 향상을 기대할 수 없다.It is important to maximize the luminous performance of the artificial marble while minimizing the use ratio of the phosphorescent pigment. In the present invention, it is important that the unsaturated polyester resin (A), the silica-containing compound (B) and the phosphorescent pigment It is preferable to use 2 to 5% by weight based on 100% by weight of the condensing amorphous pattern portion (II) composition containing the component (C). When the content of the phosphorescent pigment is less than 2% by weight in the blend ratio of the present invention, sufficient phosphorescent effect can not be exhibited. When it exceeds 5% by weight, it is not preferable from the economical point of view. No improvement can be expected.
(E) 기타 첨가제(E) Other additives
본 발명에 있어서 인조대리석의 경화를 위하여 경화제(e1)가 사용될 수 있으며, 경화작용의 촉진을 위하여 경화촉진제(e2)가 사용될 수 있다. 상기 경화제는 비축광성 모재(I) 조성물 100 중량부 또는 축광성 무정형 무늬 부분(II) 조성물 100중량부에 대하여 각각 0.1 ~ 0.2 중량부, 상기 경화촉진제는 전체 중량에 대하여 0.01 ~ 0.02 중량부로 사용하는 것이 바람직하다. In the present invention, a curing agent (e1) may be used for curing the artificial marble, and a curing accelerator (e2) may be used for promoting the curing action. The curing agent is used in an amount of 0.1 to 0.2 parts by weight with respect to 100 parts by weight of the non-shrinkable base material (I) composition and 100 parts by weight of the photothermographic amorphous portion (II) composition, and 0.01 to 0.02 parts by weight of the curing accelerator is used .
또한, 본 발명의 불포화 폴리에스테르 수지와 천연석 입자 및 무기질 충전재의 결합을 위하여 가교제(e3)를 사용할 수 있다. 상기 가교제로는 실란계 가교제를 사용하는 것이 바람직하며, 비축광성 모재(I) 조성물 100 중량부 또는 축광성 무정형 무늬 부분(II) 조성물 100중량부에 대하여 0.05 ~ 0.1 중량부를 사용하는 것이 바람직하다.
Further, a crosslinking agent (e3) may be used for bonding the unsaturated polyester resin of the present invention with the natural stone particles and the inorganic filler. As the crosslinking agent, it is preferable to use a silane crosslinking agent. It is preferable to use 0.05 to 0.1 part by weight based on 100 parts by weight of the non-shrinkable base material (I) composition or 100 parts by weight of the photographic amorphous pattern (II) composition.
인조대리석의 제조방법Manufacturing method of artificial marble
본 발명의 인조대리석은 상기와 같이 비축광성 모재(I) 및 축광성 무정형 무늬 부분(II)으로 이루어지는 것을 특징으로 한다.The artificial marble of the present invention is characterized by comprising the non-shrinking base material (I) and the accumulative amorphous pattern portion (II) as described above.
수지 조성물의 준비Preparation of resin composition
상기 비축광성 모재(I)부분을 형성하는 비축광성 수지 조성물(i)은 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 유기안료, 무기안료 또는 이들의 혼합물(C)을 믹서기로 혼합하여 준비되고, 상기 축광성 무정형 무늬 부분(II)을 형성하는 축광성 수지 조성물(ii)은 불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 축광안료(D)를 믹서기로 혼합하여 준비된다. 상기 축광성 수지 조성물은 고가의 축광안료를 포함하고 있으므로 별도의 믹서기에서 혼합이 이루어진다.The non-shrinking resin composition (i) for forming the non-shrinkable base material (I) is prepared by mixing the unsaturated polyester resin (A), the silica-containing compound (B), and the organic pigment, (Ii) mixing and mixing the unsaturated polyester resin (A), the silica-containing compound (B), and the phosphorescent pigment (D) in a blender to prepare a photoconductive resin composition (ii) . Since the photoconductive resin composition contains an expensive phosphorescent pigment, mixing is carried out in a separate mixer.
상기 비축광성 수지 조성물(i)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 90 ~ 93 중량%를 포함하는 비축광성 모재 조성물 100 중량부에 대하여 유기안료, 무기안료 또는 이들의 혼합물(C) 0.1 ~ 1 중량부를 포함하는 것이 바람직하며, 상기 축광성 수지 조성물(ii)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 85 ~ 91 중량%, 및 축광안료(D) 2 ~ 5 중량%를 포함하는 것을 특징으로 한다.The non-shrinkable resin composition (i) comprises 100 parts by weight of a non-shrinkable base material composition comprising 7 to 10% by weight of an unsaturated polyester resin (A) and 90 to 93% by weight of a silica- (A) and 85 to 91% by weight of a silica-containing compound (B), based on 100 parts by weight of the total of the unsaturated polyester resin (A) %, And 2 to 5 wt% of a phosphorescent pigment (D).
또한, 상기 비축광성 수지 조성물(i) 및 상기 축광성 수지 조성물(ii)은 각각 비축광성 모재 조성물 또는 축광성 수지 조성물 100 중량부에 대하여 경화제 0.1 ~ 0.2 중량부 및 경화촉진제 0.01 ~ 0.02 중량부를 더 포함할 수 있으며, 실란계 가교제 0.05 ~ 0.1 중량부를 더 포함할 수 있다.The non-shrinkable resin composition (i) and the above-described light-absorbent resin composition (ii) each contain 0.1 to 0.2 parts by weight of a curing agent and 0.01 to 0.02 parts by weight of a curing accelerator per 100 parts by weight of the non- And may further include 0.05 to 0.1 parts by weight of a silane crosslinking agent.
비축광성Stockpile 수지 조성물과 The resin composition 축광성Accumulation 수지 조성물의 혼합 Mixing resin composition
상기 비축광성 수지 조성물(i) 및 축광성 수지 조성물(ii)이 준비되면, 상기 비축광성 수지 조성물(i) 70 ~ 95 중량% 및 축광성 수지 조성물(ii) 5 ~ 30 중량%를 혼합하여 컴파운드(iii)를 형성하는 단계를 거친다.When the non-shrinking resin composition (i) and the shrinking resin composition (ii) are prepared, 70 to 95% by weight of the non-shrinking resin composition (i) and 5 to 30% (iii).
상기 컴파운드(iii)의 형성 단계에 있어, 상기 비축광성 수지 조성물(i)은 공급속도의 조절이 가능하도록 복수 개의 믹서기로부터 분할 공급될 수 있다.In the step of forming the compound (iii), the non-shrinkable resin composition (i) may be separately supplied from a plurality of blenders so that the feeding rate can be adjusted.
상기 각각의 믹서기로부터 공급된 비축광성 수지 조성물(i)과 축광성 수지 조성물(ii)은 라인 믹서에 의하여 부분적으로 혼합될 수 있다.The non-shrinkable resin composition (i) and the photographic resin composition (ii) supplied from each of the above blenders can be partially mixed by a line mixer.
상기와 같이 형성된 컴파운드(iii)는 적재 플레이트에 시트 형태로 공급한 다음 진공 압축 성형되는 단계를 거침으로서 인조대리석의 제조가 완료된다.The compound (iii) formed as described above is fed to a stacking plate in a sheet form and then subjected to vacuum compression molding to complete the manufacture of the artificial marble.
이하, 본 발명의 바람직한 실시예를 기재한다. 다만, 하기의 실시예는 본 발명의 바람직한 일 실시예일 뿐, 본 발명이 하기 실시예에 의해 한정되는 것은 아니다.
Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only a preferred embodiment of the present invention, and the present invention is not limited by the following examples.
실시예Example
시료의 준비Preparation of sample
(A) 불포화 폴리에스테르(UPE) 수지(A) Unsaturated polyester (UPE) resin
애경화학 M900 인조대리석용(UPE)계 수지를 사용하였다.Aekyung Chemical M900 artificial marble (UPE) resin was used.
(B) 실리카 함유 화합물(B) a silica-containing compound
(B1) 천연석 입자(B1) Natural stone particles
(b1) 실리카 샌드(b1) a silica sand
이레종합소재의 평균입경이 0.1 ~ 1.2 mm인 실리카 샌드를 사용하였다.A silica sand having an average particle diameter of 0.1 to 1.2 mm was used as the synthetic material.
(b2) 석영칩(b2) quartz chip
21세기 실리카 평균입경이 1.2 ~ 9.0 mm인 석영칩을 사용하였다.Quartz chips with an average particle size of 1.2 to 9.0 mm were used in the 21st century.
(B2) 무기질 충전재(B2) Inorganic filler
21세기 실리카 평균입경이 12 ㎛인 실리카 파우더를 사용하였다.21st century Silica powder having an average particle size of 12 μm was used.
(C) 유/무기 안료(C) Oil / Inorganic pigment
우신피그먼트사 TR92, 318M, Y8G, Y6R, R110 안료를 사용하였다.And TR92, 318M, Y8G, Y6R and R110 pigments were used.
(D) 축광안료(D) Phosphorescent pigment
평균입경이 25㎛인 욱성화학(주)의 (PL-120) 축광안료를 사용하였다.(PL-120) phosphorescent pigment of Yuk Sung Chemical Co., Ltd., having an average particle diameter of 25 mu m, was used.
(E) 기타 첨가제(E) Other additives
(e1) 경화제로서 세기아케마(Luperox P) TBPB를 사용하였다.(e1) Luperox P TBPB was used as a hardener.
(e2) 경화촉진제로서 진양화성 6%-Cobalt를 사용하였다.(e2) 6% -Cobalt as a hardening accelerator was used.
(e3) 가교제로서 구담(WD70) 실란계 커플링제를 사용하였다.(e3) Guten (WD70) silane coupling agent was used as a crosslinking agent.
물성 평가 방법Property evaluation method
(1) 최고휘도 : DN65 상용광원으로 200 럭스를 20분 조사한 후에, 5분 이후의 초기휘도를 측정하였다. (1) Maximum luminance: The initial luminance after 5 minutes was measured after irradiating 200 lux with DN65 commercial light source for 20 minutes.
(2) 최저휘도 : DN65 상용광원으로 200 럭스를 20분 조사한 후에, 60분 이후의 휘도가 측정하였다.(2) Minimum luminance: The luminance after 60 minutes was measured after irradiating 200 lux with DN65 commercial light source for 20 minutes.
(3) 자연석 질감 : 인조대리석이 자연석에 가까운 질감을 형성하는지 여부를 육안으로 검사하여 양호 또는 불량으로 구분하였다. (3) Natural stone texture: Whether artificial marble forms a texture close to a natural stone was visually inspected and classified as good or bad.
(4) 표면경도(바콜) : ASTM D 2583 측정방법 적용하여 바콜경도를 측정하였다.(4) Surface hardness (Barcol): Barcol hardness was measured by applying ASTM D 2583 measurement method.
실시예Example 및 And 비교예Comparative Example
실시예 1Example 1
불포화 폴리에스테르 수지 7 중량%, 실리카 샌드 16 중량%, 석영칩 55 중량%, 실리카 파우더 22 중량%를 포함하는 비축광성 수지 조성물(i) 100 중량부에 대하여, 유/무기 안료 0.1 중량부, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제1믹서기 및 제2믹서기에서 혼합하여 비축광성 수지 조성물(i)을 준비하였다. 100 parts by weight of the non-shrinkable resin composition (i) containing 7% by weight of an unsaturated polyester resin, 16% by weight of a silica sand, 55% by weight of a quartz chip and 22% by weight of silica powder, 0.1 parts by weight of an organic / inorganic pigment, , 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent were mixed in a first mixer and a second mixer to prepare a non-shrinkable resin composition (i).
불포화 폴리에스테르 수지 9.6 중량%, 실리카 샌드 47.9 중량%, 석영 칩 13.8 중량%, 실리카 파우더 26.6 중량%, 축광안료 2.1 중량%를 포함하는 축광성 수지 조성물(ii) 100 중량부에 대하여, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제3믹서기에서 혼합하여 축광성 수지 조성물(ii)을 준비하였다.Based on 100 parts by weight of the light-accumulating resin composition (ii) containing 9.6% by weight of an unsaturated polyester resin, 47.9% by weight of a silica sand, 13.8% by weight of a quartz chip, 26.6% by weight of silica powder and 2.1% , 0.02 parts by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent were mixed in a third mixer to prepare a light-accumulating resin composition (ii).
상기 준비된 비축광성 수지 조성물(i) 90 중량% 및 축광성 수지 조성물(ii) 10 중량%를 제4믹서기에 투입 혼합하여 컴파운드를 형성하였다.90% by weight of the non-shrinkable resin composition (i) and 10% by weight of the photoconductive resin composition (ii) were put into a fourth mixer to form a compound.
상기 컴파운드를 성형 및 경화하여 인조대리석을 제조한 후 각각의 물성을 측정하였다. 그 결과를 표 3에 나타내었다.The compound was molded and cured to produce artificial marble, and the physical properties of each were measured. The results are shown in Table 3.
실시예 2Example 2
컴파운드의 제조에 있어서, 하기 표 3과 같이 비축광성 수지 조성물(i) 80 중량% 및 축광성 수지 조성물(ii) 20 중량%를 투입하여 혼합한 것을 제외하고는 실시예 1과 동일하게 수행하였다.The preparation of the compound was carried out in the same manner as in Example 1 except that 80% by weight of the non-shrinkable resin composition (i) and 20% by weight of the condensation resin composition (ii) were added and mixed as shown in Table 3 below.
실시예 3Example 3
축광성 수지 조성물(ii)의 제조에 있어서, 불포화 폴리에스테르 수지 9.3 중량%, 실리카 샌드 46.4 중량%, 석영 칩 13.4 중량%, 실리카 파우더 25.7 중량%, 축광안료 5 중량%를 포함하는 축광성 수지 조성물(ii) 100 중량부에 대하여, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제3믹서기에서 혼합하여 축광성 수지 조성물(ii)을 준비한 것을 제외하고는 실시예 1과 동일하게 수행하였다.In the production of the photographic resin composition (ii), the photoconductive resin composition comprising 9.3% by weight of an unsaturated polyester resin, 46.4% by weight of a silica sand, 13.4% by weight of a quartz chip, 25.7% by weight of silica powder and 5% (ii) was prepared in the same manner as in Example 1, except that the photosensitive resin composition (ii) was prepared by mixing 0.2 part by weight of a curing agent, 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent in a third blender, Respectively.
비교예 1Comparative Example 1
컴파운드의 제조에 있어서, 하기 표 3과 같이 비축광성 수지 조성물(i) 97 중량% 및 축광성 수지 조성물(ii) 3 중량%를 투입하여 혼합한 것을 제외하고는 실시예 1과 동일하게 수행하였다.The preparation of the compound was carried out in the same manner as in Example 1, except that 97% by weight of the non-shrinkable resin composition (i) and 3% by weight of the shrinkable resin composition (ii) were added and mixed as shown in Table 3 below.
비교예 2Comparative Example 2
컴파운드의 제조에 있어서, 비축광성 수지 조성물(i) 60 중량% 및 축광성 수지 조성물(ii) 40 중량%를 투입하여 혼합한 것을 제외하고는 실시예 1과 동일하게 수행하였다.The procedure of Example 1 was repeated except that 60 wt% of non-shrinkable resin composition (i) and 40 wt% of shrinkable resin composition (ii) were added and mixed in the preparation of the compound.
비교예 3Comparative Example 3
비축광성 수지 조성물(i)의 제조에 있어서, 불포화 폴리에스테르 수지 9.7 중량%, 실리카 샌드 48.4 중량%, 석영 칩 14 중량%, 실리카 파우더 26.9 중량%, 축광안료 1.1 중량%를 포함하는 축광성 수지 조성물(ii) 100 중량부에 대하여, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제3믹서기에서 혼합하여 축광성 수지 조성물(ii)을 준비한 것을 제외하고는 실시예 1과 동일하게 수행하였다.(I) was prepared in the same manner as in the production of the non-shrinkable resin composition (i) except that the composition of the photoconductive resin composition containing 9.7 wt% of unsaturated polyester resin, 48.4 wt% of silica sand, 14 wt% of quartz chip, 26.9 wt% of silica powder, (ii) was prepared in the same manner as in Example 1, except that the photosensitive resin composition (ii) was prepared by mixing 0.2 part by weight of a curing agent, 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent in a third blender, Respectively.
비교예 4Comparative Example 4
비축광성 수지 조성물(i)의 제조에 있어서, 불포화 폴리에스테르 수지 8.8 중량%, 실리카 샌드 44.1 중량%, 석영 칩 12.7 중량%, 실리카 파우더 24.5 중량%, 축광안료 6.9 중량%를 포함하는 축광성 수지 조성물(ii) 100 중량부에 대하여, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제3믹서기에서 혼합하여 축광성 수지 조성물(ii)을 준비한 것을 제외하고는 실시예 1과 동일하게 수행하였다.(I) was prepared in the same manner as in the production of the non-shrinkable resin composition (i), except that the weight of the photoconductive resin composition containing 8.8% by weight of unsaturated polyester resin, 44.1% by weight of silica sand, 12.7% by weight of quartz chips, (ii) was prepared in the same manner as in Example 1, except that the photosensitive resin composition (ii) was prepared by mixing 0.2 part by weight of a curing agent, 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent in a third blender, Respectively.
비교예 5Comparative Example 5
비축광성 수지 조성물(i)의 제조에 있어서, 불포화 폴리에스테르 수지 12.2 중량%, 실리카 샌드 61.2 중량%, 석영칩 5.1 중량%, 실리카 파우더 31.6 중량%를 포함하는 비축광성 수지 조성물(i) 100 중량부에 대하여, 유/무기 안료 0.1 중량부, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제1믹서기 및 제2믹서기에서 혼합하여 비축광성 수지 조성물(i)을 준비한 것을 제외하고는 실시예 1과 동일하게 수행하였다.100 parts by weight of a non-shrinkable resin composition (i) comprising 12.2% by weight of an unsaturated polyester resin, 61.2% by weight of a silica sand, 5.1% by weight of a quartz chip and 31.6% by weight of silica powder, Except that the non-shrinking resin composition (i) was prepared by mixing 0.1 part by weight of an organic / inorganic pigment, 0.2 part by weight of a curing agent, 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent in a first blender and a second blender Was carried out in the same manner as in Example 1.
비교예 6Comparative Example 6
비축광성 수지 조성물(i)의 제조에 있어서, 불포화 폴리에스테르 수지 6 중량%, 실리카 샌드 16 중량%, 석영칩 56 중량%, 실리카 파우더 22 중량%를 포함하는 비축광성 수지 조성물(i) 100 중량부에 대하여, 유/무기 안료 0.1 중량부, 경화제 0.2 중량부, 경화촉진제 0.02 중량부, 실란계 가교제 0.1 중량부를 제1믹서기 및 제2믹서기에서 혼합하여 비축광성 수지 조성물(i)을 준비한 것을 제외하고는 실시예 1과 동일하게 수행하였다.
100 parts by weight of a non-shrinkable resin composition (i) comprising 6% by weight of an unsaturated polyester resin, 16% by weight of a silica sand, 56% by weight of a silica chip and 22% by weight of silica powder, Except that the non-shrinking resin composition (i) was prepared by mixing 0.1 part by weight of an organic / inorganic pigment, 0.2 part by weight of a curing agent, 0.02 part by weight of a curing accelerator, and 0.1 part by weight of a silane crosslinking agent in a first blender and a second blender Was carried out in the same manner as in Example 1.
도 3은 축광성 수지 조성물의 함량에 따른 인조대리석의 외관을 보여주는 사진이고, 도 4는 축광성 수지 조성물에 있어서 축광안료의 함량에 따른 휘도의 변화를 나타내는 그래프로서, 이를 참고하여 분석해보면, 상기 표 2에서 보듯이 실시예 1 내지 3은 자연석 질감을 가지고 표면경도를 저하시키지 않으면서, 초기 휘도가 우수하고, 축광 효과가 장시간 지속됨을 알 수 있다.FIG. 3 is a photograph showing the appearance of artificial marble according to the content of the photographic resin composition, and FIG. 4 is a graph showing a change in luminance according to the content of a phosphorescent pigment in the photoconductive resin composition. As shown in Table 2, it can be seen that Examples 1 to 3 have a natural stone texture and do not decrease the surface hardness, but have excellent initial brightness and long-lasting phosphorescent effect.
반면, 축광성 수지 조성물을 적게 사용한 비교예 1 및 축광성 수지 조성물이 과량 포함된 비교예 2의 경우 자연석 질감이 저하됨을 확인할 수 있다. 또한, 축광안료를 적게 사용한 비교예 3의 경우 축광 효과가 저하되었고, 축광안료를 과량 사용한 비교예 4의 경우 자연석 질감이 저하되었다. 불포화 폴리에스테르 수지를 과량 사용한 비교예 5 및 불포화 폴리에스테르 수지를 적게 사용한 비교예 6은 축광 효과가 저하되고, 자연석 질감이 저하되었으며, 표면경도 역시 저하되었다.
On the other hand, it can be confirmed that the natural stone texture is lowered in the case of Comparative Example 1 in which the photoconductive resin composition is less used and Comparative Example 2 in which the photoconductive resin composition is used in an excess amount. In addition, the phosphorescent effect was lowered in Comparative Example 3 in which the phosphorescent pigment was used less, and in Comparative Example 4 in which the phosphorescent pigment was used in an excessive amount, the natural stone texture was lowered. In Comparative Example 5 in which an unsaturated polyester resin was used in an excessive amount and Comparative Example 6 in which an unsaturated polyester resin was used in a small amount, the phosphorescent effect was lowered, the natural stone texture was lowered, and the surface hardness was also lowered.
Claims (21)
불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B) 및 축광안료(D)를 포함하는 축광성 무정형 무늬 부분(II) 5 ~ 30 중량%;
를 포함하고, 상기 축광성 무정형 무늬 부분(II)의 총 표면적은 인조대리석 표면적의 5 ~ 30 %이며,
상기 비축광성 모재(I)는 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 90 ~ 93 중량%를 포함하는 비축광성 모재(I) 조성물 100 중량부에 대하여 유기안료, 무기안료 또는 이들의 혼합물(C) 0.1 ~ 1 중량부를 포함하고,
상기 축광성 무정형 무늬 부분(II)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 85 ~ 91 중량%, 및 축광안료(D) 2 ~ 5 중량%를 포함하는 것을 특징으로 하는 자연석 질감 및 부분 축광성을 갖는 인조대리석.
70 to 95% by weight of a non-shrinkable base material (I) comprising an unsaturated polyester resin (A), a silica-containing compound (B) and an organic pigment, an inorganic pigment or a mixture thereof (C); And
5 to 30% by weight of an accumulative amorphous pattern portion (II) comprising an unsaturated polyester resin (A), a silica-containing compound (B) and a phosphorescent pigment (D);
, Wherein the total surface area of the accumulative amorphous pattern portion (II) is 5 to 30% of the artificial marble surface area,
The non-shrinkable base material (I) is obtained by mixing 100 parts by weight of a non-shrinkable base material (I) composition containing 7 to 10% by weight of an unsaturated polyester resin (A) and 90 to 93% by weight of a silica- 0.1 to 1 part by weight of an inorganic pigment or a mixture thereof (C)
(II) comprises 7 to 10% by weight of an unsaturated polyester resin (A), 85 to 91% by weight of a silica containing compound (B) and 2 to 5% by weight of a phosphorescent pigment (D) Artificial marble with characteristic natural stone texture and partial condensation.
The method according to claim 1, wherein the silica-containing compound (B) comprises 50 to 80% by weight of the natural stone particles (B1) and 20 to 50% by weight of the inorganic filler (B2) Artificial marble with natural stone texture and partial accumulation.
5. The artificial marble according to claim 4, wherein the natural stone particles (B1) have an average particle size of 0.1 to 9.0 mm.
The natural stone particles according to claim 4, wherein the natural stone particles (B1) comprise 15 to 93% by weight of a silica sand (b1) and 7 to 85% by weight of a quartz chip (b2) Artificial marble with natural stone texture and partial accumulation.
7. The method according to claim 6, wherein the silica sand (b1) has an average particle size of 0.1 to 1.2 mm and the quartz chip (b2) has an average particle size of 1.2 to 9.0 mm. marble.
5. The artificial marble according to claim 4, wherein the inorganic filler (B2) is a silica powder having an average particle size of 20 m or less.
The artificial marble according to claim 1, wherein the average particle size of the phosphorescent pigment (D) is 6 to 150 탆.
The method according to claim 1, wherein the artificial marble has a maximum luminance of 110 mcd / m 2 or more, a luminance of 7 mcd / m 2 or more The artificial marble having a natural stone texture and a partial accumulative property.
불포화 폴리에스테르 수지(A), 실리카 함유 화합물(B), 및 축광안료(D)를 혼합하여 축광성 수지 조성물(ii)을 준비하는 단계;
상기 비축광성 수지 조성물(i) 70 ~ 95 중량% 및 축광성 수지 조성물(ii) 5 ~ 30 중량%를 혼합하여 컴파운드(iii)를 제조하는 단계; 및
상기 컴파운드(iii)를 적재 플레이트에 시트 형태로 공급한 다음 고압으로 압축 성형하는 단계;
를 포함하고,
상기 비축광성 수지 조성물(i)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 90 ~ 93 중량%를 포함하는 비축광성 모재 조성물 100 중량부에 대하여 유기안료, 무기안료 또는 이들의 혼합물(C) 0.1 ~ 1 중량부를 포함하고,
상기 축광성 수지 조성물(ii)은 불포화 폴리에스테르 수지(A) 7 ~ 10 중량%, 실리카 함유 화합물(B) 85 ~ 91 중량%, 및 축광안료(D) 2 ~ 5 중량%를 포함하는 것을 특징으로 하는 자연석 질감 및 부분 축광성을 갖는 인조대리석을 제조하는 방법.
Preparing a non-shrinkable resin composition (i) by mixing an unsaturated polyester resin (A), a silica-containing compound (B), and an organic pigment, an inorganic pigment or a mixture thereof (C);
(Ii) by mixing the unsaturated polyester resin (A), the silica-containing compound (B), and the phosphorescent pigment (D);
Preparing compound (iii) by mixing 70 to 95% by weight of the non-shrinkable resin composition (i) and 5 to 30% by weight of the light-accumulating resin composition (ii); And
Feeding the compound (iii) to a stacking plate in a sheet form and then compression-molding it at a high pressure;
Lt; / RTI >
The non-shrinkable resin composition (i) comprises 100 parts by weight of a non-shrinkable base material composition comprising 7 to 10% by weight of an unsaturated polyester resin (A) and 90 to 93% by weight of a silica- 0.1 to 1 part by weight of a mixture (C)
(Ii) comprises 7 to 10% by weight of an unsaturated polyester resin (A), 85 to 91% by weight of a silica-containing compound (B) and 2 to 5% by weight of a phosphorescent pigment (D) And a method for producing an artificial marble having a natural stone texture and a partial condensing property.
12. The method of claim 11, wherein the silica-containing compound (B) comprises 50 to 80% by weight of the natural stone particles (B1) and 20 to 50% by weight of the inorganic filler (B2) A method of manufacturing an artificial marble having a natural stone texture and a partial accumulative property.
The method according to claim 14, wherein the natural stone particles (B1) comprise 15 to 93% by weight of a silica sand (b1) and 7 to 85% by weight of a quartz chip (b2) based on 100% by weight of the natural stone particles (B1) A method of manufacturing an artificial marble having a natural-stone texture and a partial condensing property.
The non-shrinkable resin composition (i) according to claim 11, wherein the non-shrinking resin composition (i) comprises 0.1 to 0.2 parts by weight of a curing agent (e1) based on 100 parts by weight of the non- And 0.01 to 0.02 part by weight of a curing accelerator (e2). The method of manufacturing an artificial marble having a natural stone texture and a partial condensing property.
The non-shrinkable resin composition (i) according to claim 11, wherein the non-shrinking resin composition (i) is a silane-based crosslinking agent (e3) of 0.05 to 0.1 The method of claim 1, further comprising the step of:
The light-emitting resin composition (ii) according to claim 11, wherein the light-absorbent resin composition (ii) comprises 100 parts by weight of the light-curable resin composition containing the unsaturated polyester resin (A), the silica- And 0.1 to 0.2 part by weight of a curing accelerator (e2) and 0.01 to 0.02 part by weight of a curing accelerator (e2).
12. The photographic paper according to claim 11, wherein the light-absorbent resin composition (ii) comprises 100 parts by weight of a photoconductive resin composition comprising an unsaturated polyester resin (A), a silica-containing compound (B) and a phosphorescent pigment (C) 0.0 > (e3) < / RTI > by weight, based on the total weight of the artificial marble.
12. The method of claim 11, wherein the non-shrinking resin composition (i) is supplied from a plurality of blenders in the compound (iii) production step.
12. The method according to claim 11, wherein the non-shrinking resin composition (i) and the shrinking resin composition (ii) are partially mixed by a line mixer in the step of preparing the compound (iii) ≪ / RTI >
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KR20220000741U (en) | 2020-09-23 | 2022-03-30 | 최기영 | Stairs stone |
KR102630966B1 (en) | 2022-09-14 | 2024-02-01 | 최기영 | Method for manufacturing artificial block |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016099114A1 (en) * | 2014-12-16 | 2016-06-23 | 삼성에스디아이 주식회사 | Enhanced natural stone composition, and enhanced natural stone chip and enhanced natural stone which have metal pearl texture and comprise same |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990061709A (en) * | 1997-12-31 | 1999-07-26 | 전원중 | Thermosetting Unsaturated Polyester Resin Composition and Manufacturing Method of Artificial Marble Using the Same |
JPH11292595A (en) * | 1998-04-14 | 1999-10-26 | Doperu:Kk | Luminous imitation stone molding |
JP2003063882A (en) * | 2001-08-28 | 2003-03-05 | Matsushita Electric Works Ltd | Method for producing artificial marble |
JP2008037900A (en) | 2006-08-01 | 2008-02-21 | Japan Composite Co Ltd | Press molding material including phosphorescent material and press molded product thereof |
-
2011
- 2011-12-29 KR KR1020110145952A patent/KR101425514B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990061709A (en) * | 1997-12-31 | 1999-07-26 | 전원중 | Thermosetting Unsaturated Polyester Resin Composition and Manufacturing Method of Artificial Marble Using the Same |
JPH11292595A (en) * | 1998-04-14 | 1999-10-26 | Doperu:Kk | Luminous imitation stone molding |
JP2003063882A (en) * | 2001-08-28 | 2003-03-05 | Matsushita Electric Works Ltd | Method for producing artificial marble |
JP2008037900A (en) | 2006-08-01 | 2008-02-21 | Japan Composite Co Ltd | Press molding material including phosphorescent material and press molded product thereof |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102247175B1 (en) | 2020-09-23 | 2021-04-30 | 최기영 | Artificial block and thereof manufacturing method and apparatus |
KR20220000741U (en) | 2020-09-23 | 2022-03-30 | 최기영 | Stairs stone |
KR102346957B1 (en) | 2021-06-29 | 2022-01-03 | 최기영 | Artificial block |
KR102630966B1 (en) | 2022-09-14 | 2024-02-01 | 최기영 | Method for manufacturing artificial block |
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