KR101394173B1 - 강도, 경도 및 밀착성이 우수한 감광성 하이브리드 수지, 및 이것을 함유하는 알칼리현상이 가능한 경화성 조성물 및 그 경화물 - Google Patents
강도, 경도 및 밀착성이 우수한 감광성 하이브리드 수지, 및 이것을 함유하는 알칼리현상이 가능한 경화성 조성물 및 그 경화물 Download PDFInfo
- Publication number
- KR101394173B1 KR101394173B1 KR1020120006917A KR20120006917A KR101394173B1 KR 101394173 B1 KR101394173 B1 KR 101394173B1 KR 1020120006917 A KR1020120006917 A KR 1020120006917A KR 20120006917 A KR20120006917 A KR 20120006917A KR 101394173 B1 KR101394173 B1 KR 101394173B1
- Authority
- KR
- South Korea
- Prior art keywords
- acid
- photosensitive resin
- group
- alkylene oxide
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000011161 development Methods 0.000 claims abstract description 8
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 7
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- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 claims description 3
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- 125000006159 dianhydride group Chemical group 0.000 claims description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 2
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- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
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- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
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- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000002896 organic halogen compounds Chemical class 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
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- 238000007639 printing Methods 0.000 description 1
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- 230000002250 progressing effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- KCNSDMPZCKLTQP-UHFFFAOYSA-N tetraphenylen-1-ol Chemical compound C12=CC=CC=C2C2=CC=CC=C2C2=CC=CC=C2C2=C1C=CC=C2O KCNSDMPZCKLTQP-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- YFDSDPIBEUFTMI-UHFFFAOYSA-N tribromoethanol Chemical compound OCC(Br)(Br)Br YFDSDPIBEUFTMI-UHFFFAOYSA-N 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (16)
- 불포화 모노카르복실산으로 개질된, 알킬렌옥사이드-부가 노볼락형 페놀 수지(A)와 실록산 화합물(B)이, 다염기산 무수물(C)을 연결기로 하여 결합된 구조를 가지며, 50 내지 200mg KOH/g의 산가를 갖고,
상기 실록산 화합물(B)가 3-메타크릴옥시프로필메틸디메톡시실란, 3-메타크릴옥시프로필메틸디에톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 2-(3,4-에폭시시클로헥실)-에틸트리메톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디에톡시실란 및 이들의 혼합물, 및 이들의 단독 중합물 또는 이들 중 2종 이상의 공중합물로부터 선택되는,
하이브리드 감광성 수지. - 제1항에 있어서, 상기 알킬렌옥사이드가 에틸렌옥사이드, 프로필렌옥사이드, 트리메틸렌옥사이드, 테트라히드로푸란 및 테트라히드로피란으로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지.
- 제1항에 있어서, 상기 노볼락형 페놀 수지에 대한 상기 알킬렌옥사이드의 부가비율이 노볼락형 페놀 수지의 -OH기 1몰당 알킬렌옥사이드 0.3 내지 10.0 몰인 것을 특징으로 하는 하이브리드 감광성 수지.
- 제1항에 있어서, 상기 불포화 모노카르복실산이 아크릴산, 메타크릴산, 크로톤산, 신남산, α-시아노신남산, β-스티릴아크릴산 및 β-푸르푸릴아크릴산으로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지.
- 삭제
- 제1항에 있어서, 상기 다염기산 무수물(C)가 지환식 이염기산 무수물, 지방족 또는 방향족 이염기산 무수물, 및 지방족 또는 방향족 사염기산 이무수물로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지.
- (1) 노볼락형 페놀 수지에 알킬렌옥사이드를 부가반응시키는 단계;
(2) 상기 (1)단계의 반응 생성물을 불포화 모노카르복실산과 반응시키는 단계;
(3) 상기 (2)단계의 반응 생성물을 다염기산 무수물과 반응시키는 단계; 및
(4) 상기 (3)단계의 반응 생성물을 실록산 화합물과 반응시키는 단계;를 포함하고,
상기 실록산 화합물이 3-메타크릴옥시프로필메틸디메톡시실란, 3-메타크릴옥시프로필메틸디에톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 2-(3,4-에폭시시클로헥실)-에틸트리메톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디에톡시실란 및 이들의 혼합물, 및 이들의 단독 중합물 또는 이들 중 2종 이상의 공중합물로부터 선택되는,
하이브리드 감광성 수지 제조방법. - 제7항에 있어서, 상기 알킬렌옥사이드가 에틸렌옥사이드, 프로필렌옥사이드, 트리메틸렌옥사이드, 테트라히드로푸란 및 테트라히드로피란으로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지 제조방법.
- 제7항에 있어서, 상기 노볼락형 페놀 수지에 대한 상기 알킬렌옥사이드의 부가비율이 노볼락형 페놀 수지의 -OH기 1몰당 알킬렌옥사이드 0.3 내지 10.0 몰인 것을 특징으로 하는 하이브리드 감광성 수지 제조방법.
- 제7항에 있어서, 상기 불포화 모노카르복실산이 아크릴산, 메타크릴산, 크로톤산, 신남산, α-시아노신남산, β-스티릴아크릴산 및 β-푸르푸릴아크릴산으로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지 제조방법.
- 제7항에 있어서, 상기 다염기산 무수물이 지환식 이염기산 무수물, 지방족 또는 방향족 이염기산 무수물, 및 지방족 또는 방향족 사염기산 이무수물로부터 선택된 1종 이상인 것을 특징으로 하는 하이브리드 감광성 수지 제조방법.
- 삭제
- 제1항 내지 제4항 및 제6항 중 어느 한 항의 하이브리드 감광성 수지, 중합 개시제 및 에폭시 수지를 함유하는 것을 특징으로 하는, 알칼리현상이 가능한 경화성 조성물.
- 제13항에 있어서, 감광성 (메트)아크릴레이트 화합물을 더 포함하는 것을 특징으로 하는, 알칼리현상이 가능한 경화성 조성물.
- 제13항에 있어서, 경화촉매를 더 포함하는 것을 특징으로 하는, 알칼리현상이 가능한 경화성 조성물.
- 제13항의 알칼리 현상이 가능한 경화성 조성물을 광경화 또는 열경화시켜 얻어지는 경화물.
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