KR101369244B1 - 유기 반도체 화합물, 이의 제조방법 및 이를 채용한 유기 태양전지 - Google Patents
유기 반도체 화합물, 이의 제조방법 및 이를 채용한 유기 태양전지 Download PDFInfo
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- KR101369244B1 KR101369244B1 KR1020120121881A KR20120121881A KR101369244B1 KR 101369244 B1 KR101369244 B1 KR 101369244B1 KR 1020120121881 A KR1020120121881 A KR 1020120121881A KR 20120121881 A KR20120121881 A KR 20120121881A KR 101369244 B1 KR101369244 B1 KR 101369244B1
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- KR
- South Korea
- Prior art keywords
- alkyl
- formula
- chemical formula
- heteroaryl
- aryl
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 147
- 239000004065 semiconductor Substances 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims description 29
- 230000008569 process Effects 0.000 title description 2
- 229920000642 polymer Polymers 0.000 claims abstract description 66
- -1 alkyl imide Chemical class 0.000 claims abstract description 34
- 230000001590 oxidative effect Effects 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 43
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 125000003118 aryl group Chemical group 0.000 claims description 28
- 125000001072 heteroaryl group Chemical group 0.000 claims description 26
- 125000002947 alkylene group Chemical group 0.000 claims description 22
- 125000004419 alkynylene group Chemical group 0.000 claims description 20
- 229910052736 halogen Inorganic materials 0.000 claims description 15
- 150000002367 halogens Chemical class 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 13
- 125000001424 substituent group Chemical group 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 9
- 125000000304 alkynyl group Chemical group 0.000 claims description 7
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 229910052711 selenium Inorganic materials 0.000 claims description 7
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 7
- 125000000739 C2-C30 alkenyl group Chemical group 0.000 claims description 6
- 125000000732 arylene group Chemical group 0.000 claims description 6
- 125000005549 heteroarylene group Chemical group 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 2
- 125000001979 organolithium group Chemical group 0.000 claims description 2
- 150000001491 aromatic compounds Chemical class 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 30
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000003786 synthesis reaction Methods 0.000 description 20
- 239000000463 material Substances 0.000 description 18
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 239000007787 solid Substances 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 150000007523 nucleic acids Chemical class 0.000 description 12
- 102000039446 nucleic acids Human genes 0.000 description 12
- 108020004707 nucleic acids Proteins 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 239000000370 acceptor Substances 0.000 description 10
- 238000004770 highest occupied molecular orbital Methods 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 7
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000005525 hole transport Effects 0.000 description 6
- 150000003949 imides Chemical class 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 125000005605 benzo group Chemical group 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 5
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229920000144 PEDOT:PSS Polymers 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- TXOCYFXCASYKQH-UHFFFAOYSA-N ethyl 2-(4-bromothiophen-3-yl)-2-oxoacetate Chemical compound C(C)OC(C(=O)C1=CSC=C1Br)=O TXOCYFXCASYKQH-UHFFFAOYSA-N 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000000877 morphologic effect Effects 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- CSABAZBYIWDIDE-UHFFFAOYSA-N sulfino hydrogen sulfite Chemical compound OS(=O)OS(O)=O CSABAZBYIWDIDE-UHFFFAOYSA-N 0.000 description 3
- 238000004809 thin layer chromatography Methods 0.000 description 3
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 3
- TUCRZHGAIRVWTI-UHFFFAOYSA-N 2-bromothiophene Chemical compound BrC1=CC=CS1 TUCRZHGAIRVWTI-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 238000006069 Suzuki reaction reaction Methods 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 229960004592 isopropanol Drugs 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- QKDYDXJISKWZQE-UHFFFAOYSA-N selenopheno[3,2-b]selenophene Chemical compound [se]1C=CC2=C1C=C[se]2 QKDYDXJISKWZQE-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- 0 *N(C(C1=C2SC3C1=C(N)SC3[Al]N)=O)C2=O Chemical compound *N(C(C1=C2SC3C1=C(N)SC3[Al]N)=O)C2=O 0.000 description 1
- PDQRQJVPEFGVRK-UHFFFAOYSA-N 2,1,3-benzothiadiazole Chemical compound C1=CC=CC2=NSN=C21 PDQRQJVPEFGVRK-UHFFFAOYSA-N 0.000 description 1
- OOCWTIOGJOIPGS-UHFFFAOYSA-N 2-butyloctan-1-amine Chemical compound CCCCCCC(CN)CCCC OOCWTIOGJOIPGS-UHFFFAOYSA-N 0.000 description 1
- ASAVFBNAUMXKHJ-UHFFFAOYSA-N 2-decyltetradecan-1-amine Chemical compound CCCCCCCCCCCCC(CN)CCCCCCCCCC ASAVFBNAUMXKHJ-UHFFFAOYSA-N 0.000 description 1
- VGKLVWTVCUDISO-UHFFFAOYSA-N 3,4-dibromothiophene Chemical compound BrC1=CSC=C1Br VGKLVWTVCUDISO-UHFFFAOYSA-N 0.000 description 1
- MZSAMHOCTRNOIZ-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-phenylaniline Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(NC2=CC=CC=C2)C=CC=1 MZSAMHOCTRNOIZ-UHFFFAOYSA-N 0.000 description 1
- OUCUHGDRVOLLGQ-UHFFFAOYSA-N C(C)OC(=O)C1SC=2C1=C(SC2)C(=O)OCC Chemical compound C(C)OC(=O)C1SC=2C1=C(SC2)C(=O)OCC OUCUHGDRVOLLGQ-UHFFFAOYSA-N 0.000 description 1
- LAJBDHMJTJGESC-UHFFFAOYSA-N C(CCCCCCCCCCC)C1=C(SC(=C1)[Sn](C)(C)C)CCC=1SC(=CC1CCCCCCCCCCCC)[Sn](C)(C)C Chemical compound C(CCCCCCCCCCC)C1=C(SC(=C1)[Sn](C)(C)C)CCC=1SC(=CC1CCCCCCCCCCCC)[Sn](C)(C)C LAJBDHMJTJGESC-UHFFFAOYSA-N 0.000 description 1
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 description 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 1
- QFNNTXRADJEWLJ-UHFFFAOYSA-N CCC1=C2C(=C(SC2=C(S1)CC)C(=O)O)C(=O)O Chemical compound CCC1=C2C(=C(SC2=C(S1)CC)C(=O)O)C(=O)O QFNNTXRADJEWLJ-UHFFFAOYSA-N 0.000 description 1
- NNADZCWJFMWOTG-UHFFFAOYSA-N CCCCCCCCN(C(C(C1Sc2c([s]3)Br)c2c3Br)O)C1=O Chemical compound CCCCCCCCN(C(C(C1Sc2c([s]3)Br)c2c3Br)O)C1=O NNADZCWJFMWOTG-UHFFFAOYSA-N 0.000 description 1
- BKBLBLYXTYMDKS-UHFFFAOYSA-N CCCCCCCCNC(C1SC(CSC2)C2C1C=O)=O Chemical compound CCCCCCCCNC(C1SC(CSC2)C2C1C=O)=O BKBLBLYXTYMDKS-UHFFFAOYSA-N 0.000 description 1
- SNFNXIISPJTWLV-UHFFFAOYSA-N CCOC(C1=C(C(OCC)=O)SC2C1=CSC2)=O Chemical compound CCOC(C1=C(C(OCC)=O)SC2C1=CSC2)=O SNFNXIISPJTWLV-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- PHXQIAWFIIMOKG-UHFFFAOYSA-N NClO Chemical compound NClO PHXQIAWFIIMOKG-UHFFFAOYSA-N 0.000 description 1
- RWCMHQZUYWBVAE-UHFFFAOYSA-N OS(=O)(=O)S(=O)(=O)S(O)(=O)=O Chemical compound OS(=O)(=O)S(=O)(=O)S(O)(=O)=O RWCMHQZUYWBVAE-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ZEEBGORNQSEQBE-UHFFFAOYSA-N [2-(3-phenylphenoxy)-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound C1(=CC(=CC=C1)OC1=NC(=CC(=C1)CN)C(F)(F)F)C1=CC=CC=C1 ZEEBGORNQSEQBE-UHFFFAOYSA-N 0.000 description 1
- SAHIZENKTPRYSN-UHFFFAOYSA-N [2-[3-(phenoxymethyl)phenoxy]-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound O(C1=CC=CC=C1)CC=1C=C(OC2=NC(=CC(=C2)CN)C(F)(F)F)C=CC=1 SAHIZENKTPRYSN-UHFFFAOYSA-N 0.000 description 1
- ABRVLXLNVJHDRQ-UHFFFAOYSA-N [2-pyridin-3-yl-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound FC(C1=CC(=CC(=N1)C=1C=NC=CC=1)CN)(F)F ABRVLXLNVJHDRQ-UHFFFAOYSA-N 0.000 description 1
- DSCRNZFCNFDDOV-UHFFFAOYSA-N [Sn]CC1=CC=CS1 Chemical compound [Sn]CC1=CC=CS1 DSCRNZFCNFDDOV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000002330 electrospray ionisation mass spectrometry Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- DQYBDCGIPTYXML-UHFFFAOYSA-N ethoxyethane;hydrate Chemical compound O.CCOCC DQYBDCGIPTYXML-UHFFFAOYSA-N 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- UAYKGOMDUQLCJS-UHFFFAOYSA-N ethylsulfanyl acetate Chemical compound CCSOC(C)=O UAYKGOMDUQLCJS-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- TTXREHJILPRMDI-UHFFFAOYSA-N thieno[3,4-b]thiophene-2,3-dicarboxylic acid Chemical compound S1C=2C(C(=C1C(=O)O)C(=O)O)=CSC2 TTXREHJILPRMDI-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- HIHKYDVSWLFRAY-UHFFFAOYSA-N thiophene-2,3-dicarboxylic acid Chemical compound OC(=O)C=1C=CSC=1C(O)=O HIHKYDVSWLFRAY-UHFFFAOYSA-N 0.000 description 1
- KKRPPVXJVZKJON-UHFFFAOYSA-N trimethyl-(5-trimethylstannylthiophen-2-yl)stannane Chemical compound C[Sn](C)(C)C1=CC=C([Sn](C)(C)C)S1 KKRPPVXJVZKJON-UHFFFAOYSA-N 0.000 description 1
- WCHYSNDRWAMSCS-UHFFFAOYSA-N trimethyl-[5-[2-(5-trimethylstannylthiophen-2-yl)ethyl]thiophen-2-yl]stannane Chemical compound S1C([Sn](C)(C)C)=CC=C1CCC1=CC=C([Sn](C)(C)C)S1 WCHYSNDRWAMSCS-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 238000002061 vacuum sublimation Methods 0.000 description 1
- 238000004832 voltammetry Methods 0.000 description 1
Images
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Abstract
Description
도 2는 실시예 4, 5에 따른 유기반도체 화합물의 용액상 및 필름상의 UV-vis 흡수 스펙트라를 나타낸 도면이다.
도 3은 실시예 6에 따른 유기반도체 화합물의 용액상 및 필름상의 UV-vis 흡수 스펙트라를 나타낸 도면이다.
도 4는 실시예 7에 따른 유기반도체 화합물의 용액상 및 필름상의 UV-vis 흡수 스펙트라를 나타낸 도면이다.
도 5는 실시예 4, 5에 따른 유기반도체 화합물의 전기적 특성(cyclic voltammetry)을 나타낸 도면이다.
도 6은 실시예 6, 7에 따른 유기반도체 화합물의 전기적 특성(cyclic voltammetry)을 나타낸 도면이다.
도 7은 실시예 4를 DSC를 통해 분자의 분절운동을 관측한 도면이다.
도 8은 실시예 5를 DSC를 통해 분자의 분절운동을 관측한 도면이다.
도 9는 실시예 6를 DSC를 통해 분자의 분절운동을 관측한 도면이다.
도 10은 실시예 7를 DSC를 통해 분자의 분절운동을 관측한 도면이다.
도 11은 실시예 4를 TGA를 통해 분자의 분해온도를 관측한 도면이다.
도 12는 실시예 5를 TGA를 통해 분자의 분해온도를 관측한 도면이다.
도 13은 실시예 6을 TGA를 통해 분자의 분해온도를 관측한 도면이다.
도 14는 실시예 7를 TGA를 통해 분자의 분해온도를 관측한 도면이다.
도 15는 실시예 4,5를 유기태양전지소자로 제작하여 측정한 전류밀도-전압 곡선(J-V)의 도면이다.
도 16은 실시예 4, 5를 유기 태양전지소자로 제작하여 외부양자효율을 측정한 도면이다.
도 17은 실시예 6를 유기태양전지소자로 제작하여 측정한 전류밀도-전압 곡선(J-V)도면이다.
도 18은 실시예 7을 유기태양전지소자로 제작하여 측정한 전류밀도-전압 곡선(J-V)도면이다.
도 19은 실시예 6, 7을 유기 태양전지소자로 제작하여 외부양자효율을 측정한 도면이다.
UV-S (max) (nm) |
UV-F (max) (nm) |
UV-ann (max) (nm) |
UV-edge (nm) |
Band gap (optical) (eV) |
LUMO (optical) (eV) |
HOMO (electronic) (eV) |
|
PEBTTPD (실시예 4) |
491, 668 | 496, 703 | 500, 726 | 919 (939-ann) |
1.35 (1.32) |
4.01 | 5.36 |
POBTTPD (실시예 5) |
491, 648 | 491, 651 | 491, 660 | 934 (947-ann) |
1.33 (1.31) |
3.97 | 5.30 |
POBOBDTPD (실시예 6) |
490, 638 | 490, 650 | - | 919 | 1.35 | 4.01 | 5.36 |
PEBOBDTPD (실시예 7) |
490, 636 | 490, 650 | - | 873 | 1.42 | 3.97 | 5.30 |
Oxidation onset (eV) | Reduction onset (eV) | HOMO (eV) |
LUMO (eV) |
Band gap (Electronic) (eV) |
|
PEBTTPD (실시예 4) |
0.95 | -0.36 | 5.37 | 4.06 | 1.32 |
POBTTPD (실시예 5) |
0.81 | -0.42 | 5.23 | 4.00 | 1.30 |
POBOBDTPD (실시예 6) |
0.92 | -0.52 | 5.34 | 3.90 | 1.44 |
PEBOBDTPD (실시예 7) |
1.02 | -0.51 | 5.44 | 3.91 | 1.53 |
Devices | V OC (V) | J SC (mA/cm2) | FF (%) | PCE (%) |
PEBTTPD:PC70BM | 0.72 | 13.5 | 0.54 | 5.3 |
POBTTPD:PC70BM | 0.70 | 11.1 | 0.64 | 5.0 |
POBOBDTPD:PC70BM | 0.68 | 9.39 | 63 | 4.02 |
PEBOBDTPD:PC70BM | 0.64 | 4.81 | 46 | 1.41 |
Claims (15)
- 제 1항에 있어서,
상기 고분자 화합물은 하기 화학식 11로 표시되는 것인 고분자 화합물.
[화학식 11]
(상기 화학식 11에서,
Z는 S 또는 Se이고;
Ar은 C6-C30아릴렌 또는 C3-C30헤테로아릴렌이며;
R은 C1-C30알킬, C2~C30알킬렌, C2~C30알키닐렌, C6~C30아릴 및 C3~C30헤테로아릴로부터 선택되며, 상기 알킬, 알킬렌, 알키닐렌, 아릴 및 헤테로아릴은 C1-C20알킬, C2-C30알케닐, C2-C30알키닐, C1-C30알콕시, 아미노기, 하이드록시기, 할로겐기, 사이아노기, 나이트로기, 트리플루오로메틸기 및 실릴기로 선택되는 하나 이상의 치환기로 더 치환될 수 있으며;
상기 n은 1 내지 1000의 정수이다.) - 제 7항에 있어서,
상기 R은 C1-C30알킬기인 유기 반도체 화합물. - 제 7항에 있어서,
상기 Z는 S인 유기 반도체 화합물. - 하기 화학식 2로 표시되는 화합물과 화학식 3으로 표시되는 화합물을 반응시켜 하기 화학식 4로 표시되는 화합물을 제조하는 단계;
화학식 4로 표시되는 화합물을 산화시켜 화학식 5로 표시되는 화합물을 제조하는 단계;
화학식 5로 표시되는 화합물을 무수아세틱산과 반응시켜 화학식 6으로 표시되는 화합물을 제조하는 단계;및
화학식 6으로 표시되는 화합물을 하기 화학식 7로 표시되는 화합물과 반응시켜 화학식 1로 표시되는 화합물을 제조하는 단계;를 포함하는 화학식 1로 표시되는 유기 반도체 화합물의 제조방법.
[화학식 1]
[화학식 2]
[화학식 3]
[화학식 4]
[화학식 5]
[화학식 6]
[화학식 7]
RNH2
[상기 화학식 1 내지 7에서,
Z는 S 또는 Se이고;
R은 C1-C30알킬, C2~C30알킬렌, C2~C30알키닐렌, C6~C30아릴 또는 C3~C30헤테로아릴이며, 상기 알킬, 알킬렌, 알키닐렌, 아릴 및 헤테로아릴은 C1-C30알킬, C2-C30알케닐, C2-C30알키닐, C1-C30알콕시, 아미노기, 하이드록시기, 할로겐기, 사이아노기, 나이트로기, 트리플루오로메틸기 및 실릴기로 선택되는 하나 이상의 치환기로 더 치환될 수 있으며;
R1 또는 R2는 서로 독립적으로, C1-C30알킬이며;
X는 할로겐이다.] - 제 10항에 있어서,
상기 화학식 1은 상기 화학식 6, 1몰에 대하여 상기 화학식 7, 0.5 ~ 2.0몰로 반응시키는 것인 화학식 1로 표시되는 유기 반도체 화합물의 제조방법. - 제 10항에 있어서,
Z는 S이며, R은 C1-C30알킬기인 화학식 1로 표시되는 유기 반도체 화합물의 제조방법. - 제 1항 내지 제 6항중 어느 한 항에 따른 고분자 화합물을 함유하는 유기 태양전지.
- 제 14항에 있어서,
상기 유기 태양전지는 구조가 기판, 투명전극, 정공수송층, 활성층, 전자수송층, 금속전극이 순차적으로 적층된 구조인 유기 태양전지.
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CN104993058B (zh) * | 2015-05-27 | 2018-08-17 | 南昌大学 | 一种层状钙钛矿结构材料及在甲胺铅碘钙钛矿薄膜太阳能电池中的应用 |
KR101960614B1 (ko) | 2017-11-08 | 2019-03-20 | 고려대학교 산학협력단 | 메틸렌 싸이오펜 카르복실레이트와 벤조다이싸이오펜을 함유하는 공액형 고분자 유도체와 이를 이용한 유기 태양전지 |
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KR101563120B1 (ko) | 2013-06-20 | 2015-11-06 | 경상대학교산학협력단 | 유기 반도체 화합물, 이의 제조방법 및 이를 채용한 유기 태양전지 |
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