KR101312505B1 - Substrate treatment device being capable of adjusting height of antenna - Google Patents

Abstract

Substrate processing apparatus capable of adjusting the height of the antenna according to the present invention, the upper open chamber; A dielectric window provided in the open portion of the chamber; An antenna positioned above the dielectric window to generate an inductively coupled plasma in the chamber; And an upper structure coupled to and detachable from an upper portion of the chamber and supporting the antenna, and configured to open and close the upper structure using an opening / closing jig, such that an antenna, a dielectric window, and the like are positioned on the upper portion of the chamber. The components can be inspected and repaired more easily, and a more stable antenna support structure can be realized.

Description

Substrate treatment device being capable of adjusting height of antenna}

The present invention relates to a substrate processing apparatus using an inductively coupled plasma for treating the surface of a semiconductor substrate, a flat panel display substrate and the like.

In general, a plasma processing method for treating a surface of a semiconductor wafer, a flat panel display substrate, or the like is largely a capacitively coupled plasma (CCP) process and an inductively coupled plasma (ICP) process method. have.

The capacitively coupled plasma treatment method is a method of treating a substrate by generating a plasma while applying high frequency power between two parallel plate electrodes, and the inductively coupled plasma treatment method is a coil antenna located outside the reactor. By applying a high frequency power source, a plasma is generated inside the reactor in an electrolessless type.

Here, the substrate processing apparatus using the inductively coupled plasma processing method as described above (hereinafter referred to as 'substrate processing apparatus using inductively coupled plasma'), forms a magnetic coil that changes with time to form an ICP plasma. (Coil Antenna) is essential. Coil antenna has been developed and used in a variety of structures, such as cylindrical, planar, hemispherical, spiral, multiple loop (Loop) type.

A substrate processing apparatus using such an inductively coupled plasma is usually composed of a chamber for forming a vacuum space for substrate processing, a dielectric plate provided on the upper portion of the chamber, an antenna provided on the dielectric plate, and the like. In addition, a substrate support on which a substrate to be surface-treated is mounted is provided inside the chamber, and a process gas supply means and an RF power applying unit are provided on the upper portion of the chamber.

However, in the substrate processing apparatus using the conventional inductively coupled plasma as described above, the antenna supporting structure of the dielectric window is not only complicated because the antenna is installed on the dielectric window, and a structure such as a cover is provided on the upper part of the chamber. In addition, there is a problem in that it is not easy to check or repair internal components such as antenna and dielectric window.

In addition, the conventional substrate processing apparatus as described above has a problem that there is a limit in generating an optimal plasma in the chamber according to the process conditions because the height of the antenna is fixed.

The contents of the background art described above are technical information that the inventor of the present application holds for the derivation of the present invention or acquired in the derivation process of the present invention and is a known technology disclosed to the general public prior to the filing of the present invention I can not.

The present invention has been made to solve the above problems, by providing a substrate processing apparatus capable of adjusting the height of the antenna to be implemented by properly adjusting the plasma generation conditions in the chamber by configuring to adjust the height of the antenna There is a purpose.

Substrate processing apparatus capable of adjusting the antenna height according to the present invention for realizing the above object is a chamber with an open top; A dielectric window provided in the open portion of the chamber; An antenna positioned above the dielectric window to generate an inductively coupled plasma in the chamber; An upper structure coupled to and detachable from an upper portion of the chamber and supporting the antenna; And an antenna height adjusting device configured to support the antenna in the upper structure to adjust the height of the antenna from the dielectric window.

First, the antenna height adjustment device, the upper structure is divided, the support is assembled to the chamber and the lifting portion is separated from the support is configured to be able to move up and down with the antenna, and the lifting portion between the support and the lifting portion up and down A lifting drive mechanism for moving may be provided.

At this time, the divided portion of the support and the lifting portion is formed to have a step structure, the upper portion of the lifting portion is preferably relatively long, the lower portion is preferably formed relatively short.

In addition, the elevating drive mechanism is preferably installed in a position facing each other horizontally in the portion divided into a staircase structure of the support portion and the elevating portion.

Next, the antenna height adjusting apparatus may be configured to include a lifting body positioned on the antenna and supported by the antenna, and a lifting driving mechanism installed on the upper structure to move the lifting body up and down.

At this time, the lifting body is disposed in the horizontal direction inside the upper structure of the lifting plate and the antenna is supported, a plurality of vertically disposed on the upper portion of the lifting plate to move up and down with the lifting plate by the lifting drive mechanism It is preferable to comprise the guide rods.

In addition, the upper structure is preferably provided with a guide for guiding the linear movement of the guide rod.

The lift drive mechanism may include a lift motor supported by the upper structure, a pinion rotated by the motor, and a rack formed on at least one of the guide rods and engaged with the pinion.

Next, the antenna is supported in a suspended state by a plurality of support rods in the upper structure, wherein the antenna height adjustment device may be configured to adjust the height of the antenna by adjusting the length of the support rods.

Next, the lifting drive mechanism is provided at a portion where the chamber and the upper structure are coupled, and the height of the antenna may be adjusted by moving the upper structure up and down from the chamber.

The main problem solving means of the present invention as described above, will be described in more detail and clearly through examples such as 'details for the implementation of the invention', or the accompanying 'drawings' to be described below, wherein In addition to the main problem solving means as described above, various problem solving means according to the present invention will be further presented and described.

Substrate processing apparatus capable of adjusting the height of the antenna according to the present invention, since the structure of the upper structure of the chamber can be easily separated to clean, inspect, repair, etc. There is an effect that can be easily and simply performed.

In particular, since the present invention is configured to adjust the height of the antenna, there is an effect of improving the process performance required for substrate processing by appropriately adjusting the plasma generation conditions in the chamber.

1 is an overall configuration diagram showing a substrate processing apparatus of a first embodiment according to the present invention.
FIG. 2 is a detailed view illustrating an upper structure in the substrate processing apparatus illustrated in FIG. 1.
3 is a detailed view illustrating a state in which an upper structure opening and closing device is installed in the substrate processing apparatus illustrated in FIG. 1.
4 is a view showing an open state of the upper structure opening and closing device illustrated in FIG.
5 is a plan view of the substrate processing apparatus and the upper structure opening and closing apparatus illustrated in FIG. 3.
6 is a plan view showing a substrate processing apparatus and a switching device for opening and closing the second embodiment according to the present invention.
7 is a plan view illustrating a structure for opening and closing a plurality of divided upper structures in the present invention.
8 and 9 are configuration diagrams of the lowered state and the lifted state showing an embodiment of the antenna height adjustment structure according to the present invention.
10 and 11 are diagrams showing the lowered state and the elevated state showing another embodiment of the antenna height adjustment structure according to the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

1 is a view showing the overall configuration of a substrate processing apparatus according to a first embodiment of the present invention, wherein reference numeral 10 denotes a chamber, 15 denotes a substrate mounting table, and S denotes a substrate.

The chamber 10 illustrated in FIG. 1 illustrates an embodiment in which one chamber is formed by being coupled to each other after the upper chamber 11 and the lower chamber 13 are configured, but the chamber 10 is not divided into a plurality of chambers. It is also possible that the whole chamber is configured as one without.

Although not illustrated in one of the chambers 10, a gate valve configured to insert and remove a processing object such as a substrate S into and out of the chamber 10 is configured.

Various components that are configured for substrate processing, such as the substrate mounting table 15, the gate valve, and the exhaust device, can be easily implemented by those skilled in the art by using a known substrate processing device (or process chamber). In the following description, a description thereof will be omitted and the configuration will be described based on the components disposed on the upper portion of the chamber 10.

The chamber 10 is formed to have an open top, and the dielectric part 20 is provided at the open part.

The dielectric window 20 may be made of a ceramic material or the like, and is coupled in a sealed structure to the chamber 10 so as to form a vacuum in an internal space including the chamber 10. The construction of the dielectric window 20 is also well known in the art to which the present invention pertains, and thus a detailed description thereof will be omitted.

An antenna 30 is disposed above the dielectric window 20 to generate an inductively coupled plasma in the interior space of the chamber 10, and an upper structure 50 that supports the antenna 30 is opened above the chamber 10. ) Is provided.

In this case, the antenna 30 is configured to be supplied with RF power by being connected to an RF source and a matching unit 35, and the like, but is preferably arranged in a coiled structure like a conventional antenna structure, but is not limited thereto. If the structure capable of generating an inductively coupled plasma in the chamber 10 can be configured by adopting the configuration of known antennas.

However, unlike the prior art, the antenna 30 is not supported by the dielectric window 20 and is installed to be supported by the upper structure 50 in a state spaced apart from the dielectric window 20 by a predetermined distance.

1 and 2, reference numeral 32 denotes an antenna introduction portion.

Now, the upper structure 50 including the antenna 30 to support and protect the upper components of the chamber 10 will be described.

The upper structure 50 has a structure in which both ends are bent downward so as to form a space in which the antenna 30 is located, and is assembled with a fastening member 60 or the like on the upper portion of the chamber 10 to form a chamber ( It is preferable to be configured to be coupled to 10). That is, when the upper structure 50 is a planar beam structure when viewed in plan view, the upper structure 50 is a horizontal beam 51 and the vertical beam 52 is combined with each other to form a 'c'-shaped structure as a whole, This upper structure 50 is composed of a configuration that is assembled on the upper portion of the chamber (10). 5 shows a configuration in which the two upper structures 50 are installed side by side at a predetermined interval. In this case, the horizontal beams 51 may be provided respectively, and the vertical beams 52 may be provided to interconnect both ends of the two horizontal beams 52. Of course, the vertical beams 52 may be installed on one horizontal beam 51, respectively. At this time, it is possible to open and close each upper structure 50 individually.

In addition, the upper structure 50 may be composed of one, or may be composed of two or more.

In FIG. 2 and the like, reference numeral 52a denotes a plate that blocks the outer surface of the vertical beam 52.

The upper structure 50 is configured such that the antenna 30 is positioned in the space while forming a space between the dielectric window 20 and the space in which the antenna 30 is located is opened from the outside to be in an atmospheric pressure state. It is composed.

Alternatively, the upper structure 50 is not made of a beam structure, the upper portion may be configured as a cover with a plate-like structure. This will be described below with reference to FIG. 6.

A support rod 55 is installed on an upper bottom surface of the upper structure 50 so that the antenna 30 can be supported while being positioned above the dielectric window 20. At this time, the support rod 55 is installed vertically between the upper structure 50 and the antenna 30 is configured to support the antenna 30 in a suspended state, it is composed of a plurality of so as to stably support the entire antenna It is preferable. In addition, the support rod 55 is configured to be adjustable in height, it is preferable to be configured to properly adjust the position of the antenna 30 to generate a desired inductively coupled plasma in the chamber. At this time, the height adjustment structure of the support rod 55 can be configured in such a way as to adjust the coupling height of the rod body divided up and down.

In addition, devices necessary for supplying power to the antenna 30, that is, the matching unit 35 and the like, may be installed on the outer upper portion of the upper structure 50.

The upper structure 50 configured as described above is installed from the chamber 10 so as to easily perform inspection, repair, replacement, etc. on the components of the upper portion of the chamber 10 such as the antenna 30 and the dielectric window 20. It is configured detachably. This will be described in detail when describing the switching device of the substrate processing apparatus to be described below.

On the other hand, the dielectric window 20 is provided with a shower head 70 for injecting a process gas in the chamber 10, and passes through the upper structure 50 and the dielectric window 20 to process the shower head 70 A gas supply line 75 for supplying gas is installed and configured. At this time, the shower head 70 is connected to the gas supply line 75 in a state fixed to the dielectric window 20 is configured to receive the process gas from the outside, the gas supply line 75 is the upper structure 50 When opening, it is preferable to be configured to be easily separated. This will also be described in detail when the switching device of the substrate processing apparatus to be described below.

In FIG. 2, reference numeral 37 denotes a ground line connected to the antenna 30.

Now, the opening and closing structure of the upper structure of the substrate processing apparatus having the structure as described above will be described.

Referring to FIG. 3, a jig coupling part 58 is formed on the upper structure 50. In addition, an opening / closing jig 100 configured to lift or lower the upper structure 50 from the chamber 10 is formed above the upper structure 50 at the side of the chamber 10.

Opening and closing jig 100, the jig frame 120 in the state of the side of the chamber 10, the jig frame 120 is connected to the jig coupling portion 58 of the upper structure 50, the jig It is preferable that the frame 120 is configured to be rotatable about the rotating body 110 so as to lift or lower the upper structure 50 and the antenna 30.

At this time, the jig frame 120 may be formed in a reverse L-shaped structure, the rotating body 110 is configured to rotate the jig frame 120 by a rotation driving device (not shown). Here, since the rotary drive device can be variously configured using a well-known hydraulic motor, an electric motor, and the like, which provides a rotational force to the rotating body 110, a detailed description thereof will be omitted.

As illustrated in FIG. 5, the jig frame 120 may be configured such that two jig frames 120 are connected to an upper portion of each upper structure 50 with respect to one rotating body 110. Of course, it is also possible to be composed of two or more jig frame 120. The reason why the jig frame 120 is composed of a plurality of in order to open and close the upper structure 50 more stably.

And the jig frame 120 and the jig coupling portion 58 of the upper structure 50 is a configuration that can be assembled and detachable, if the structure that can maintain a firmly coupled state when opening and closing the upper structure 50 is known It can be configured in various ways by adopting a combined configuration such as a lift device.

In order to open and close the upper structure 50 using the opening and closing jig 100 as described above, the upper structure 50 is separated from the chamber 10, and the gas supply line 75 connected to the shower head 70 is also separated. It should be possible to be configured, for this purpose is configured to separate the gas supply line 75 is composed of a coupling member 77 and the like on top of the upper structure (50).

The structure separating the upper structure 50 from the chamber 10 is performed by disassembling the fastening member 60, such as a bolt fastened between the upper end of the upper chamber 11 and the upper structure 50, that is, the chamber ( It is configured to be able to separate the upper structure 50 from 10). In this case, the fastening member 60 may be configured as a fastening bolt fastened to the upper portion of the chamber 10 in the vertical beam 52 of the upper structure 50.

In addition, the gas supply line 75 is installed to be supported by the horizontal beam 51 of the upper structure 50, unwind the fastening member 77 for fixing the gas supply line 75 to the horizontal beam 51, shower After the gas supply line 75 connected to the head 70 is separated from the upper structure 50, the upper structure 50 may be configured to be separated from the chamber 10 together with the antenna 30.

In the substrate processing apparatus as described above, the opening and closing jig 100 when performing an operation such as checking, repairing, or replacing the dielectric window 20, the antenna 30, and the like provided in the upper portion of the chamber 10. Lift the upper structure 50 by using, proceeds in the open state of the top of the chamber (10).

At this time, the method of opening the upper structure 50, after separating the gas supply line 75 assembled in the upper structure 50, the fastening member 60 for fixing the upper structure 50 and the chamber 10 mutually Dismantle). Thereafter, the opening and closing jig 100 is operated to lift and open the upper structure 50. At this time, the opening and closing jig 100 is located on the side of the chamber 10 and rotates about the rotating body 110 while lifting the upper structure 50 as the upper structure 50 is separated from the chamber 10 and lifted up. You lose.

Of course, since the antenna 30 is in a state supported by the upper structure 50, the antenna 30 is lifted together with the upper structure 50, and the upper structure 50 is vertically or inverted by the opening / closing jig 100. When rotated, the inspection and repair of various parts in the upper structure 50 such as the antenna 30 can be performed in a safer state from the danger of falling of the upper structure.

In addition, since the upper structure 50 is completely removed from the upper side of the chamber 10, the upper part of the chamber 10, including the dielectric window 20, may be inspected and repaired, and thus the inspection and repair operation may be performed. Not only this is facilitated, it is also possible to prevent safety accidents that may occur due to falling of the upper structure 50 during the operation.

After the process as described above, when the inspection and repair of the upper components of the chamber 10 is completed, the opening and closing jig 100 is operated in the opposite manner to the upper structure 50 is lowered to the upper portion of the chamber 10 The upper structure 50 is assembled to the chamber 10, and the upper structure 50 is reassembled in the order of reassembling the gas supply line 75.

Here, when the plurality of upper structures 50 are configured separately, it is also possible to lift only the necessary portion.

On the other hand, FIG. 6 shows a structure in which the upper portion of the upper structure 50 ′ is formed in a mostly blocked structure, unlike the configuration of the first embodiment of the present invention as described above.

That is, the upper structure 50 'may be composed of a plate-like structure 51' and a side structure 52 'coupled to the lower circumference of the plate-like structure 51'. In this case, the side structure 52 'may be configured in a rectangular frame structure using a beam or the like.

When the upper structure 50 ′ is configured to include the plate-shaped structure 51 ′ as described above, the hole 53 opened to allow the antenna introduction portion 32 to pass through the upper portion (the center portion of the upper structure in the drawing) is provided. It is preferably formed.

Similarly, the upper structure 50 ′ is configured to support the antenna 30 through the support rod 55, and also to connect the gas supply line 75 connected to the shower head 70.

Since other configurations can be implemented through the configuration of the above-described first embodiment, repeated descriptions thereof will be omitted. In addition, the same reference numerals are assigned to the same or similar components. However, unlike the embodiment illustrated in FIG. 3, the fastening members 60 'and 77' for assembling the gas supply line 75 and the upper structure 50 'are extended from the upper side to the lower side rather than the lower side of the upper structure. It may be fastened to each other to assemble the gas supply line 75 and the upper structure 50 '. Of course, the gas supply line may be configured to be disassembled at the top of the upper structure.

On the other hand, Figure 7 shows the opening and closing structure of the upper structure 50 of the large substrate processing apparatus for processing a large area substrate, etc., wherein the upper structure 50 is divided into a plurality, the opening and closing jig 100 Also, it is preferable to configure a plurality of pieces so as to lift each of the plurality of divided upper structures 50.

In FIG. 7, the portion indicated by the hidden line shows the connecting member 90 interconnecting the divided upper structures, and can be installed in consideration of the division size, the support state, and the like of the upper structure.

Although not illustrated in the drawings, the beam structured upper structure 50 illustrated in FIG. 3 may be divided and configured on the same principle as in FIG. 7. In this case, a connecting structure interconnecting between the divided superstructure and the superstructure is necessarily installed, so that when lifting each of the divided superstructures, the connecting structure is first dismantled, and then each superstructure is the same as in FIG. It can also be configured to be lifted by the method.

8 to 11 are views showing the configuration of an embodiment that can adjust the height of the antenna.

First, an embodiment of an antenna height adjustment structure will be described with reference to FIGS. 8 and 9. 8 is a view showing a state in which the antenna is lowered, and FIG. 9 is a view showing a state in which the antenna is raised.

In one embodiment of the antenna height adjustment structure according to the present invention, the antenna structure for adjusting the height is capable of raising and lowering the portion supporting the antenna 30 is divided by the upper structure (50).

The antenna height adjusting device includes a support part 151 assembled to the upper chamber 11 and a lifting part 152 which is separated from the support part 151 and made to be liftable together with the antenna 30.

The support 151 is configured to be detachably assembled to the upper chamber 11 and maintained in a fixed state as described above through various embodiments.

The lifting unit 152 is separated from the support unit 151 as an upper portion of the antenna 30, that is, a central portion of the upper structure 50, and is configured to be liftable. At this time, the antenna 30 is supported by the lifting unit 152 through the support rod 55.

In addition, the antenna height adjustment device is a lift actuator 160, which is a lift drive mechanism for adjusting the height of the antenna 30 by lifting the lift unit 152 from the support unit 151 between the support unit 151 and the lift unit 152. It is provided.

The lifting actuator 160 may be appropriately selected and used as a known actuator capable of raising or lowering the lifting unit 152 while being supported by the support unit 151. That is, it can comprise using the linear motor which generate | occur | produces a linear motion force, a ball screw, a hydraulic cylinder, the linear drive mechanism using a rack and pinion, etc.

In the drawing of the present embodiment, the divided part of the support part 151 and the lifting part 152 is formed in a step shape. It is preferable that the upper part of the lifting part 152 is relatively long and the lower part is formed relatively short. . This is to enable the lifting movement in a state in which the lifting unit 152 is more stably supported.

When configured in this way, the lifting actuator 160 is preferably installed between the parts facing the horizontal surface side of the stairs as illustrated in the figure so that the lifting unit 152 can be moved up and down.

8 illustrates a state in which the lifting unit 152, the support rod 55, and the antenna 30 are lowered together by the lifting actuator 160, and FIG. 9 shows the elevation unit 152, the support rod 55, and the antenna. (30) shows the state which rose together.

As such, since the height of the antenna 30 is adjusted from the internal space or the dielectric window 20 of the chamber 10, the substrate is generated by generating an inductively coupled plasma while adjusting the height of the antenna 30 according to process conditions. The surface treatment work of this can be performed.

On the other hand, as the upper structure 50 is separated into the support 151 and the lifting unit 152 is configured, the gas supply line 75 for supplying the process gas to the shower head 70 is arranged to be supported on the support 151 side. It is preferable to configure.

In addition, in one embodiment of the antenna height adjustment structure as described above, the upper structure 50 is formed by using the opening / closing jig 100 (see FIG. 3, etc.) as in the embodiments described with reference to FIGS. 1 to 7. It is configured to be lifted or lowered from the chamber 10, wherein the jig coupling portion 58 (see Fig. 3, etc.) is preferably installed on the upper side of the support portion 151 of the upper structure 50.

In addition, although the upper structure 50 has been described with reference to a structure consisting of a beam, likewise illustrated in FIG. 6, even when the upper portion is configured as a cover with a plate-like structure, application of an embodiment of the antenna height adjustment structure is possible. At this time, the upper part where the antenna 30 is located is separated to form a lifting part, and the peripheral part of the lifting part can be configured to form a supporting part.

In addition, the upper structure 50 is not divided, the portion that is coupled to the chamber 10, that is, referring to Figure 3, the upper chamber 11 and the vertical beam 52 is provided with a lifting drive mechanism in the upper portion It is also possible to configure the height of the antenna 30 by raising and lowering the entire upper structure 50 from the chamber 11.

Since other configurations can be configured in the same way as the configuration of the first and second embodiments of the present invention described above, repeated description is omitted.

Next, another embodiment of the antenna height adjustment structure will be described with reference to FIGS. 10 and 11.

Another embodiment of the antenna height adjustment structure according to the present invention, unlike the above-described embodiment, so that the upper structure 50 is not divided, it is possible to lift the support rod 55 'for supporting the antenna 30 It is composed.

That is, a lifting body 160 configured to move up and down from the upper structure 50 is provided in the lower portion of the upper structure 50, and the support rod 55 ′ connected to the antenna 30 is connected to the lifting body 160. It consists of a configuration that is installed.

The elevating body 160 is provided with a lifting plate 161 having a top end of the supporting rod 55 'fixed in a horizontal direction and a plurality of guide rods 163 arranged in a vertical direction on the upper part of the lifting plate 161. It is composed.

Of course, the upper structure 50 has a guide 155 for guiding the guide rod 163 of the lifting body 160 to move linearly. In this case, the guide 155 may be configured to be appropriately formed in the upper structure 50 as long as it is a structure capable of guiding the linear motion of the guide rod 163. For example, it may be formed in a guide hole structure, or may be configured to guide the vertical movement of the guide rod 163 by attaching a separate guide member.

The guide rods 163 may be disposed in a plurality of configurations so that the lifting body 160 can move up and down stably.

The drive mechanism for elevating the elevating body 160 is configured to move the guide rod 163 up and down. In the drawing of this embodiment, the rack 164 is formed on the guide rod 163, and the rack 164 The configuration using the lifting motor 166 to drive the pinion 165 coupled to the. Of course, the lifting motor 166 is installed to be supported on the upper structure (50).

In addition, any drive mechanism capable of moving the elevating body 160 in the vertical direction can be modified in various ways according to the implementation conditions.

On the other hand, the antenna introduction portion (32 ') is also configured to be divided, combined with the structure in which the divided portion is inserted can be configured to have a continuous electrical connection structure while the insertion depth is changed according to the height adjustment of the antenna 30. In addition, it can be configured using a connection method corresponding to a change in length by using a variety of known connection methods such as stretch connection structure.

As described above, in another embodiment of the antenna height adjusting structure according to the present invention, the driving mechanism is operated to raise and lower the lifting body 160, the support bar 55 ', and the antenna 30 to appropriately adjust the height of the antenna 30. It is configured to be.

On the other hand, although not illustrated in the drawings, as described above, by dividing the supporting rod 55 itself to adjust the height of the antenna 30 by changing the insertion degree in a state in which the lower supporting rod is inserted into the upper supporting rod (as opposed to possible). It is also possible to configure.

At this time, the drive mechanism is preferably configured to adjust the length of the other support rods 55 by lifting the specific support rods 55.

In addition, it is also possible to configure a portion or the entirety of the support rod 55 in a cylinder structure so that the height of the antenna can be adjusted according to the adjustment of the piston length of the cylinder.

The substrate treating apparatus according to the present invention as described above is preferably configured to perform a surface treatment operation of a substrate formed in a flat panel display panel, but is not limited thereto, and may be used for etching a semiconductor wafer, a glass substrate, and the like. It is also applicable to an apparatus for performing ashing, chemical vapor deposition (CVD), ion implantation, and the like.

As described above, the technical ideas described in the embodiments of the present invention can be performed independently of each other, and can be implemented in combination with each other. While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is evident that many alternatives, modifications, and variations will be apparent to those skilled in the art. It is possible. Accordingly, the technical scope of the present invention should be determined by the appended claims.

Claims (10)

A chamber open at the top;
A dielectric window provided in the open portion of the chamber;
An antenna positioned upwardly from the dielectric window to generate an inductively coupled plasma in the interior space of the chamber;
The support rod is provided to be coupled to and detachable from the upper portion of the chamber, and when the antenna is coupled to the chamber, the antenna is positioned between the dielectric window and forms a free space for lifting the positioned antenna and supports the antenna to be suspended. An upper structure provided with a cover structure to protect the antenna;
An antenna height adjusting device configured to support the antenna in the upper structure and to elevate the antenna to adjust the height of the antenna from the dielectric window;
By including an upper structure opening and closing device for separating the upper structure by lifting from the chamber,
When the upper structure is lifted from the chamber by operating the upper structure opening and closing device, the antenna supported by the supporting rod provided in the upper structure is lifted together with the upper structure and the antenna height adjusting device so that the antenna is located. A substrate processing apparatus capable of adjusting the antenna height is deviated from, the space in which the antenna is located.
The method according to claim 1,
The antenna height adjustment device, the upper structure is divided, the lifting portion is composed of a support portion assembled in the chamber and the support rod is separated from the support portion and the support rod for supporting the antenna,
And a lift drive mechanism configured to move the lift unit up and down between the support unit and the lift unit.
The method of claim 2,
The divided portion of the support portion and the lifting portion is formed to have a step structure, the upper portion of the lifting portion is substrate processing apparatus capable of adjusting the height, characterized in that formed longer than the lower portion.
The method of claim 3,
The lift drive mechanism is a substrate processing apparatus capable of adjusting the height of the antenna, characterized in that installed in a position facing each other horizontally in a portion divided into a staircase structure of the support and the lift.
The method of claim 1, wherein the antenna height adjustment device,
A lifting body positioned above the antenna and supported by a support rod supporting the antenna;
And a lift drive mechanism installed on the upper structure to move the lift body up and down.
The method according to claim 5, wherein the lifting body,
An elevating plate disposed inside the upper structure to support a support rod supporting the antenna;
And a plurality of guide rods disposed on an upper portion of the elevating plate to move up and down with the elevating plate by the elevating drive mechanism.
The method of claim 6,
Substrate processing apparatus capable of adjusting the antenna height, characterized in that the upper structure is provided with a guide for guiding the linear movement of the guide rod.
The method of claim 6,
The elevating drive mechanism may include an elevating motor supported by the upper structure, a pinion rotated by the motor, and a rack formed on at least one of the guide rods and engaged with the pinion. Substrate processing apparatus.
The method according to claim 1,
The antenna height adjustment device is a substrate processing apparatus capable of adjusting the antenna height, characterized in that configured to adjust the height of the antenna by adjusting the length of the support rod for supporting the antenna.
A chamber open at the top;
A dielectric window provided in the open portion of the chamber;
An antenna positioned upwardly from the dielectric window to generate an inductively coupled plasma in the interior space of the chamber;
The support rod is provided to be coupled to and detachable from the upper portion of the chamber, and when the antenna is coupled to the chamber, the antenna is positioned between the dielectric window and forms a free space for lifting the positioned antenna and supports the antenna to be suspended. An upper structure provided with a cover structure to protect the antenna;
An antenna height adjusting device configured to support the antenna in the upper structure and to elevate the antenna to adjust the height of the antenna from the dielectric window;
By including an upper structure opening and closing device for separating the upper structure by lifting from the chamber,
When the upper structure is lifted from the chamber by operating the upper structure opening and closing device, the antenna supported by the supporting rod provided in the upper structure is lifted together with the upper structure and the antenna height adjusting device so that the antenna is located. Away from, the space in which the antenna is located is opened,
A lift drive mechanism is provided at a portion where the chamber and the upper structure are coupled to each other, thereby elevating the antenna by the antenna height adjusting device and moving the upper structure up and down by the lift drive mechanism. Substrate processing device that can adjust the height of the antenna configured to adjust the height.

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