KR101307755B1 - Cooking device and Controlling method for the same - Google Patents

Abstract

The present invention relates to a cooking apparatus that is easy to clean the cooking chamber and a control method thereof. To this end, the present invention is provided in the cooking appliance main body, the cooking appliance main body, a cooking compartment for forming a space for cooking food, and a water supply device for supplying steam or water to the cooking compartment to clean the inside of the cooking compartment; It includes, the inner wall of the cooking chamber exposed to the food provides a cooking apparatus and a control method having a physical property friendly with moisture through the plasma surface treatment.

According to the present invention, it is possible to easily clean the inside of the cooking chamber even at a low temperature, thereby increasing the space of the cooking chamber.

Cooker, Plasma, Hydrophilicity, Water Supply Device, Pollutant Removal Device

Description

Cooking device and Controlling method for the same}

1 is a perspective view showing an embodiment of a cooking appliance according to the present invention.

FIG. 2 is a schematic representation of the front of FIG. 1; FIG.

Figure 3 is a view showing an embodiment of an atmospheric pressure plasma processing apparatus used in the manufacture of the cooking appliance of the present invention.

Figures 4a to 4c is a view showing the wettability of the inner wall of the cooking chamber surface plasma treatment according to the present invention.

5 is a perspective view showing an embodiment of a water supply device provided in the cooking appliance according to the present invention.

Figure 6 is a state diagram showing a state of cleaning the inner wall of the cooking chamber of the cooking appliance according to the present invention.

7 is a flowchart illustrating a control method of a cooking appliance according to the present invention.

Description of the Related Art

10: cooking appliance body 20: door

30: second heating device 40: rack supporter

50: cooking chamber 51: inner wall

60: rack 70: third heating apparatus

80: tray 90: first heater

200: water supply device 210: water tank

220: pump 230: water jet nozzle

400: pollutant removal device

The present invention relates to a cooking apparatus, and more particularly, to a cooking apparatus and a control method of improving the cleanability of the inside of the cooking chamber.

In general, there are a variety of products, such as oven, microwave oven. A microwave oven is a device that includes only a magnetron or cooks food using a magnetron and a heater. In addition, the oven is a cooking utensil designed to cook food by drying and sealing the cooking material after heating. As a heat source for supplying heat to the food, electricity or gas fuel is used.

The cooking apparatuses include a cooking appliance body forming an appearance, a cooking chamber forming a space in which food is accommodated, a door for opening and closing the cooking chamber, and a heating device for cooking the food.

The cooking chamber is a cooking space formed inside the oven body, and the door is hinged to the front surface of the cooking appliance body to open and close left and right or up and down. In addition, the heating device is provided on one side inside the cooking chamber, and supplies heat energy for cooking food. The heat energy generated by the heating device is transferred to the food in the form of convective heat transfer or radiant heat transfer.

However, the above-described conventional cooking appliance has the following problems.

First, in the conventional cooking apparatus, the contaminant such as oil generated when cooking food is fixed to the inner wall of the cooking chamber to remove the contaminant by operating the heating device at a high temperature, for example, at least 450 ° C. for 2 hours or more. Burn. As such, if the inside of the cooking chamber is maintained at a high temperature for a long time, power consumption consumed by the heating apparatus reaches a considerable amount, and there is a problem in that the user is restricted in time to use the cooking apparatus.

Second, even when cleaning the remaining residues after burning the contaminants while maintaining the temperature inside the cooking chamber at a high temperature, the user is exposed to the risk of burns even when cleaning the residues of the remaining contaminants because the inside of the cooking compartment is still maintained at a high temperature.

Third, when the inside of the cooking chamber is maintained at a high temperature due to the high temperature cleaning function used in the conventional cooking appliance, the temperature of the door glass positioned at the front of the cooking chamber is also increased. Since the door glass is directly exposed to the user, the user may be burned due to the high temperature door glass.

Fourth, as in the conventional cooking appliance, the higher the temperature of the interior of the cooking chamber becomes thicker the heat insulating material for blocking the heat energy leaking to the outside. When the thickness of the insulation is thick, not only the manufacturing cost of the product increases but also the space of the cooking chamber is relatively small.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a cooking apparatus and a method of controlling the same, which can improve cleaning performance inside the cooking chamber.

Another object of the present invention is to provide a cooking apparatus and a control method thereof which can be used safely and easily by a user.

Still another object of the present invention is to provide a cooking apparatus capable of increasing a space of a cooking chamber in which food is cooked.

In order to achieve the above object, the present invention provides a cooking appliance main body, a cooking compartment provided inside the cooking appliance main body, forming a space for cooking food, and steam or water in the cooking compartment to clean the inside of the cooking compartment. It includes a water supply device for supplying, the inner wall of the cooking chamber exposed to the food provides a cooking device having a physical property friendly to the water through the plasma surface treatment.

The inner wall of the cooking chamber preferably has a superhydrophilic property.

The water supply device may include a water tank for storing water, and a water injection nozzle for spraying the water into the cooking chamber.

In addition, the water supply device may include a case for storing water, a heater for heating and converting the water into steam. In addition, the water supply device may further include a steam injection nozzle for injecting the steam into the cooking chamber.

According to another embodiment of the present invention, the present invention comprises the steps of determining whether the cooking of food in the cooking chamber having an inner wall having water-friendly properties and supplying steam or water into the cooking chamber to clean the cooking chamber It provides a control method of a cooking apparatus including a water supply step.

The control method of the cooking appliance may further include a pollutant removing step of removing the pollutant attached to the inner wall of the cooking chamber.

The pollutant removing step may be to spray water at a high pressure using a water supply device installed in the cooking appliance.

Hereinafter, a preferred embodiment of a cooking appliance according to the present invention will be described in detail with reference to the accompanying drawings.

1 and 2, an embodiment of a cooking appliance according to the present invention will be described in detail.

The cooking appliance includes a cooking appliance body 10, a cooking chamber 50 forming a space for cooking food, a door 20 for opening and closing the cooking chamber 50, and a control unit for controlling the cooking appliance main body 10. A control device (not shown), and a heating device for cooking the food.

The control panel 2 for controlling the cooker is installed at the upper front of the cooker main body 10. The control panel 2 is connected to the control device provided inside the cooker main body. Of course, the control panel 2 may be provided separately from the cooker main body to adjust the control device at a long distance.

In addition, a transformer (not shown) is installed inside the main body of the cooker to supply electric power according to the type of food. The transformer is connected to the control device and made adjustable by the user. For example, when the user selects a method for cooking food on the control panel 2, the control device connected to the control panel controls the power supplied to the heating device by adjusting the transformer.

The heating device may be exposed to the cooking chamber 50 or may be provided inside the cooking appliance body. Heat energy generated by the heating device is transferred to the food by convection or radiation.

The heating device includes a first heating device 90 installed above the cooking chamber, a second heating device 30 installed behind the cooking chamber, and a third heating device 70 installed below the cooking chamber. Include.

The first heating device 90 is for heating the food by emitting infrared rays and is mainly used to bake food. As the first heating device 90, a magnetron or a heater is used. The first heating device 90 is preferably fixed to the upper portion of the cooking chamber. Of course, the first heating device 90 may be installed to be movable in the upper portion of the cooking chamber.

The second heating device 30 is located on the inner wall of the cooking compartment facing the door 20, and auxiliary heat is supplied to food placed inside the cooking chamber. A blowing fan 35 is installed around the second heating device 30 to flow heat generated by the second heating device 30 into the cooking chamber. The blowing fan 35 serves to distribute the air heated by the second heating device 30 evenly in the cooking chamber.

The third heating device 70 includes a heat generating member 71 for generating heat and a support member 73 for supporting the heat generating member 71. The third heating device 70 is located under the rack 60 and may be used as a heat source for baking bread or cakes.

The space heated by the third heating device 70 may be limited to a space for baking bread or cake, not the entire space inside the main body of the cooking appliance. For example, the cooking chamber may be divided into spaces by a separate separator (not shown), and the third heating apparatus may heat only the space separated by the separator. As a result, the heating devices are selectively turned on / off according to the food cooking method to transfer the heat energy to the food.

In addition, a tray 80 on which food is placed may be installed in the cooking chamber 50. The tray 80 is detachably installed in the rack 60 for guiding the movement of the tray 80. Of course, the tray 80 may be fixed inside the cooking chamber. In addition, the tray 80 may be a plasma surface treatment of the surface including the portion on which food is placed. Details related to the plasma surface treatment will be described later.

Meanwhile, the rack 60 in which the tray is placed is installed in the cooking chamber 50. Of course, food may be placed directly on the upper surface of the rack (60). The rack 60 may be installed according to the intention of the user. That is, the position of the rack is installed to enable the position adjustment in the interior of the cooker body.

Rack supporters 40 for supporting the rack 60 are installed at both ends of the rack 60. The rack supporter 40 includes a plurality of rack guides 43 on which the rack 60 can be supported, and a guide support member 41 for supporting the rack guide 43. The guide support member 41 is fixedly installed on the inner surface of the cooker main body, and the rack guide 43 is installed in multiple stages on the guide support member 41.

In addition, the door 20 for opening and closing the cooker main body is hinged to the front of the cooker main body 10. The door 20 may be installed to slide in the front of the cooker main body.

The door 20 includes a door frame 21 forming an edge of the door and a door glass 22 installed inside the door frame. A lower portion of the door frame 21 is hinged to the cooker main body, and a sealing member (not shown) for blocking the inside and the outside of the cooker main body may be installed at an inner edge of the door frame. The door glass 22 is preferably made of a heat-resistant material that is transparent and resistant to heat so that a user can check the inside of the cooker main body.

On the other hand, the cooking chamber 50 is formed inside the main body of the cooking appliance 10, the inner wall 51 of the cooking chamber forms a predetermined space for cooking food, and is exposed to the food when cooking food. .

The inner wall 51 of the cooking chamber is subjected to plasma surface treatment on an enamel base material, that is, a substrate. The inner wall of the cooking chamber has various physical properties by surface modification through plasma surface treatment.

The inner wall 51 of the cooking chamber is subjected to plasma surface treatment at atmospheric pressure, that is, atmospheric pressure, and surface modification is performed in the micro-unit area. In addition, the physical properties of the inner wall 51 are determined according to the surface treatment conditions including the atmosphere gas, voltage applied, pressure, etc. supplied during the plasma surface treatment.

In addition, the cooker main body 10 may further include a water supply device 200 for supplying water to the inside of the cooking chamber to clean the inside of the cooking chamber 50 after the cooking of food is completed. Of course, the water supply device may supply steam into the cooking chamber.

The water supply device 200 is a water tank 210 in which water is stored, a pump 220 for moving water in the water tank into the cooking chamber, and a water injection nozzle for spraying water on the inner wall of the cooking chamber. 230.

The water tank 210 and the pump 220 are installed outside the cooking chamber and are adjacent to each other. Of course, the water tank 210 and the pump 220 may be connected through a separate connection pipe.

In addition, the water tank 210 is connected to the water injection nozzle 230 installed on the upper wall of the cooking chamber. Therefore, when the pump 220 is operated, water is sprayed to the inner wall of the cooking chamber through the water injection nozzle 230 by the pressure of the pump 220. The operation of the water supply device is preferably to be operated after the user presses a button (not shown) of the cleaning function.

As a result, the water supply apparatus 200 removes contaminants fixed on the inner wall of the cooking chamber by spraying water on the inner wall 51 of the cooking chamber having a (super) hydrophilic property through plasma surface treatment.

Specifically, when the inner wall 51 of the cooking chamber is hydrophilic, water penetrates between the inner wall 51 and the contaminants. The user can then easily separate the contaminants from the inner wall using a separate device.

A plasma treatment apparatus is used to treat the inner wall 51 of the plasma surface, and the plasma treatment apparatus generates plasma at atmospheric pressure. Of course, the inner wall may be plasma treated in a vacuum state.

With reference to FIG. 3, the plasma processing apparatus used to make the inner wall of the cooking appliance according to the present invention will be briefly described.

Plasma is a group of positively charged ions and negatively charged electrons, which are clustered together.

The principle of generating the plasma is briefly described as follows. When energy is applied to a gas particle, ie, a gas molecule or an atom, the outermost electrons are out of orbit, and the gas particle is separated into positively charged ions and negatively charged electrons. These positively charged ions and negatively charged electrons gather to form a grouping activity. In general, an artificial plasma phenomenon occurring in a space is generated by an ionization reaction by electrons generated by electrical energy or free electrons in a space accelerated by an electric field and colliding with gas particles in the space.

Specifically, the gas emits light when the atmosphere gas is supplied between the two electrodes under atmospheric pressure, and then a high frequency, that is, a radio frequency is supplied. That is, glow discharge occurs when a high frequency resonance phenomenon is used, and the glow discharge can significantly lower the temperature than atmospheric pressure discharge of other methods.

The plasma processing apparatus shown in FIG. 3 is a device for generating plasma at atmospheric pressure, hereinafter referred to as an atmospheric pressure plasma processing apparatus. The atmospheric pressure plasma processing apparatus includes a chamber 170 including a gas inlet 180 and a gas outlet 190, a stage 101 disposed in the chamber 170, on which a substrate 100 is mounted, and the stage ( 101) The first and second electrodes 140 and 160 are formed to face each other at a predetermined distance from the surface and the stage 101.

A gas supply device for supplying an atmosphere gas to the outside of the chamber 170 through a radio frequency (RF) power supply device 130 for applying a high frequency to the first electrode 140 and the gas inlet 180 ( 110 is installed. A filter 120 for filtering the atmosphere gas is installed between the gas inlet 180 and the power supply device 130.

Here, the second electrode 160 is grounded, and surfaces of the first and second electrodes 140 and 160 are protected by an insulator (not shown). The gas outlet 190 serves as a passage through which gases remaining after the plasma surface treatment on the substrate 100 are discharged.

At this time, the power supply device 130 is such that the voltage applied between the two electrodes is 100V ~ 90000V and the frequency is 10 to 10 ⁹ Hz. Atmospheric gas flowing through the gas inlet 180 is activated between various types of electrodes to form a plasma composed of ions, electrons, radicals and neutral particles. Of course, when the atmosphere gas is introduced into the chamber may be supplied after being heated to a predetermined temperature in advance.

The gas used here consists of any one selected from an inert gas, an oxidizing gas, a reducing gas, or a mixture thereof. Specifically, the gas is air, nitrogen (N ₂ ), oxygen (O ₂ ), argon (Ar), water (H ₂ O), helium (He), carbon dioxide (CO ₂ ), nitrogen oxides, carbon tetrafluoride, ammonia Various mixtures of ethylene, ethylene chloride, etc. can be used or used individually.

Here, it is preferable that the atmosphere gas is evenly supplied throughout to maintain the discharge in a large area. A mesh may be installed inside the chamber 170 to evenly introduce the atmosphere gas into the gas inlet 180.

In addition, the electrodes 140 and 1160 use aluminum, titanium, nickel, chromium, copper, tungsten, platinum, or the like having strong corrosion resistance and conductivity. Of course, a dielectric may be provided below the electrodes. When the discharge is difficult or when a strong discharge is required, the plasma may be generated by generating a desired discharge by adjusting the size of the dielectric.

The operation of the atmospheric pressure plasma processing apparatus will be described below.

The substrate 100 is positioned on the second electrode 160, the gas is supplied from the gas supply device 110 to the chamber 170 through the filter 120, and at the same time, a high frequency is applied to the first electrode 140. When is applied, the atmosphere gas between the first and second electrodes 140 and 160 is in a plasma state.

When electrical energy is applied to the molecules of the atmospheric gas present in the chamber 170, the ion or the radicals having high reactivity are generated by the collision of the accelerated electrons with the outermost electrons of the molecules and atoms leaving orbits. The ions and radicals thus generated are accelerated by continuous collisions and electrical attractive forces to impinge on the surface of the material and break down molecular bonds in the region of several μm, thereby inducing physical and chemical changes such as the formation of functional groups of gas components.

At this time, the material formed on the substrate 100 is surface-treated according to the components of the atmosphere gas supplied from the gas supply device 110 and the intensity and waveform of the high frequency applied to the first electrode 140.

4A to 4C, the wettability of the inner wall of the cooking chamber in which the plasma surface is treated by the atmospheric pressure plasma processing apparatus will be described.

The inner wall 51 of the cooking chamber having undergone the plasma surface treatment has different properties depending on the contact angle α in contact with the water droplets W. As shown in FIG. 4A, when the contact angle is 10 ° or less, it has superhydrophilicity with water. As shown in FIG. 4B, when the contact angle is 90 ° to 150 °, it has water repellency. As shown, when the contact angle is 150 ° or more, it has super water repellency. Of course, the maximum angle of the contact angle is 180 degrees.

In chemical surface modification, radicals or ions are generated by collision of ions or electrons with high binding energy with chemically low binding energy, and the surrounding ozone, oxygen, nitrogen and the like are combined with carbon and hydrogen on the surface to form a carbonyl group. A highly polar functional group such as a carboxyl group, a cyan group, or a hydroxyl group is generated to chemically modify the surface to be hydrophilic.

For example, the inner wall 51 of the cooking chamber having hydrophilic characteristics is surface-treated by a plasma generated from a mixed gas of a monomer and a gas that cannot be polymerized. Specifically, when acetylene (C ₂ H ₂ ) is used as the monomer gas and nitrogen (N ₂ ) is used as the non-polymerizable gas, and the ratio of the mixed gas (acetylene: nitrogen) is 1: 9, the inner wall of the cooking chamber has hydrophilicity. .

In addition, as a heat treatment condition for hydrophilic surface modification, the initial pressure is 1000 mmHg, the operating pressure is 0.3 mmHg, the current is 800mmA, the treatment time is 90 seconds. The surface treatment conditions described herein use some of the various conditions related to hydrophilic treatment, and the present invention is applied even when the type of mixed gas, the mixing composition ratio, and other treatment conditions are different.

The hydrophilic property of the inner wall of the cooking chamber is directly related to the chemical properties of the surface of the polymer, and the polymer surface synthesized under the plasma of the mixed gas has a high surface energy to spread water well. The high surface energy that leads to the hydrophilic properties results from the hydrophilic functional groups of the surface layer. The hydrophilic functional groups include C-O, CO, (C = O), C-N, N-H, and the like. The presence of these functional groups was confirmed by x ray photoelectron spectroscopy (XPS) and Flouier Transformation Infrared Spectroscopy (FT IR) analysis.

Surface modification of the inner wall of the cooking chamber to have hydrophilicity is not limited to the case of using a mixture of acetylene and nitrogen as described above. For example, a gas such as nitrogen, oxygen, or the like may be used as a non-polymerizable gas of hydrocarbon other than acetylene as a monomer. It may have various embodiments, such as using.

Referring to Figure 5, another embodiment of a water supply device provided in the cooking appliance according to the present invention will be described.

The water supply device is for supplying steam to the inside of the cooking chamber, is installed outside the cooking chamber. The water supply device includes a case 310 forming an outer shape, a heater 320 installed inside the case, and a water level sensor 330. Of course, the water supply device may include a steam injection nozzle (see 230 of FIG. 2) for supplying the steam generated by the heater into the cooking chamber.

The case 310 serves to receive water supplied for steam generation, and includes an upper case 311 and a lower case 312. Here, the upper case 311 forms the upper appearance of the case 310, the lower case 312 forms the lower appearance of the case 310.

Specifically, the upper case 311 has a container shape open at the lower end, the lower case 312 is a container shape with an open upper end is coupled to the lower end of the upper case 311 and the upper case 311 Together with a space for steam generation.

At this time, the upper case 311 and the lower case 312 may be coupled to each other by screw fastening, it is preferable to prevent the leakage of steam is coupled by mutual fusion. In addition, one side of the case 310 is provided with a sensor housing 311a in which the water level sensor is installed.

In addition, the heater 320 is provided in the case 310 and functions to generate steam by heating water stored in the case 310.

Specifically, it is preferable that the bottom space in the case 310, more specifically, horizontally installed at a position spaced a predetermined distance from the bottom of the lower case 312. Here, the heater 320 is a sheath heater, and two terminals at both ends are exposed to the outside of either side of the case 310.

Accordingly, when the heater 320 is supplied with power through two terminals exposed to the outside, the heater 320 performs a function of evaporating water stored in the case 310 by heat generation.

Next, the water level sensor 330 detects the water level inside the case. In the present embodiment, the water level sensor 330 is configured to detect when the water level of the water supplied inside the case 310 reaches a predetermined level.

In detail, the water level sensor 330 includes a sensor electrode 331, and the sensor electrode 331 includes three common electrodes 331a, a long electrode 331b, and a short electrode 331c. An electrode.

The common electrode 331a and the long electrode 331b are respectively positioned at a lower end at a height set to a minimum level of water required for steam generation, and the single electrode 331c is the common electrode 331a and the long electrode ( 331b) is formed so that its lower end is located at a height set to be approximately the maximum level for steam generation.

The heights at which the lower ends of the long electrode 331b and the common electrode 331a are positioned are such that the heater 320 can be completely immersed in water.

Accordingly, when water is supplied into the case 310 and the lower ends of the long electrode 331b and the common electrode 331a are immersed in water, the corresponding water level signal is input to the controller, and the heater 320 is provided. Is driven and steam is generated in the case 310.

More specifically, when the water surface inside the case 310 is higher than the lower ends of the long electrode 331b and the common electrode 331a, a current flows between the long electrode 331b and the common electrode 331a. The electrical signal is detected accordingly.

Then, when water is supplied to the inside of the case 310 and the lower end of the single electrode 331c is submerged in water, current flows through the single electrode 331c to allow the inside of the case 310 to flow into the case 310. The water supply is interrupted.

On the other hand, the water supply device, it is preferable to further include a diaphragm 332 to prevent the malfunction of the water level sensor at the same time to protect the electrodes from water splashing due to bubbles generated during the heating of the water supply.

Here, the diaphragm 332 partitions between the heater 320 and the water level sensor 330, and approximately at the bottom of the lower case 312 so that water can pass through the side surface of the diaphragm 332. A hole (not shown) formed to the lower end of the single electrode 331c is formed.

In addition, an upper surface of the case 310, more specifically, an upper end of the upper case 311 is provided with a temperature sensor 340 extending downward into the case 310. Here, the temperature sensor 340 functions to measure the temperature of water and / or steam heated by the heater 320.

On the other hand, the outer wall of the case 310 is provided with at least one coupling member (370, 380) for coupling the case 310 to the cooker body (10).

In the present embodiment, the outer wall of the case 310, the first coupling member 370 and the case 310 for screwing the case 310 to the cooker main body 10, the main body of the cooker main body A second coupling member 380 for hooking to 10 is provided.

Accordingly, a screw hole (not shown) is formed in the first coupling member 370, and the second coupling member 380 is formed with a hook that is engaged with one side of the cooker main body 10.

One side of the case 310, the steam discharge pipe 350 for discharging the steam generated in the case 310 is provided. Specifically, the steam discharge pipe 350 is preferably formed on the upper side of the casing 310 in consideration of the high temperature vapor is raised to the upper space of the case 310.

On the other hand, the lower portion of the case 310 is connected to the water supply pipe 360 for supplying water for steam generation. Here, the water supply pipe 360, one end is connected to the lower side of the case 310 so that the water supply hole 361 is provided on the lower side of the case 310, the other end water supply for supplying water It is connected to a hose (not shown).

Here, the water supply hole 361 is preferably provided at a position lower than the water level of the water level sensor 330 detects. In the present embodiment, the water supply hole 361 may be provided at a position substantially lower than the lower end of the long electrode 331b.

More specifically, the water supply pipe 360 is connected to the lower case 312, the water supply hole 361 is water in the direction parallel to the bottom of the case 310, that is, the bottom of the lower case 312. It is preferable to be configured to discharge the.

Referring to Figure 6, the state of cleaning the inner wall of the cooking chamber using the decontamination apparatus according to the present invention will be described.

After the cooking of the food is completed, when water is supplied to the inner wall of the cooking chamber through the water supply device, the moisture (W) penetrates between the contaminants S and the inner wall 51 of the cooking chamber. At this time, since the inner wall 51 of the cooking chamber is plasma surface treated to have super hydrophilicity, moisture easily permeates between the contaminants S and the inner wall 51 of the cooking chamber. Then, the adhesion of the contaminants adhering to the inner wall of the cooking chamber is alleviated.

Thereafter, the user removes the contaminants S from the inner wall 51 of the cooking chamber by using the contaminant removing apparatus 400. The contaminant removing apparatus 400 may include a cleaning member 420 for easily separating the contaminants from the inner wall 51 of the cooking chamber and a panel 410 to which the cleaning member 420 is attached. The cleaning member 420 and the panel 410 may be automatically moved by a mechanical device (not shown) provided in the cooker main body, or may be manually moved by a user.

The cleaning member 420 may be made of a plastic material, such as rubber, but may be made of a cloth, such as a cloth.

On the other hand, the removal of the contaminants may be performed by a water supply device. For example, the pump provided in the water supply device shown in FIG. 2 sprays water at high pressure to remove contaminants attached to the inner wall of the cooking chamber.

In detail, after the cooking of food is finished, water is first sprayed into the cooking chamber at a low pressure, and after a predetermined time, water is injected into the cooking chamber at a high pressure to separate the contaminants from the interior wall of the cooking chamber. do. That is, the step of supplying water into the cooking compartment by the water supply device may be divided into two stages, and the two stages may be set as separate functions by the control apparatus.

An embodiment of a control method of a cooking appliance according to the present invention will be described with reference to FIG. 7.

First, it is determined whether the cooking of the food is completed by the cooking apparatus according to the present invention (S10). The determination of whether the cooking of the food is completed may be determined by a control device provided in the cooking appliance body. Alternatively, even when the user ends the cooking of the food, the control device may recognize that the cooking of the food is completed.

After the cooking of the food is completed and the user takes the food out of the cooking chamber, steam or water is supplied to the inside of the cooking chamber to clean the inside of the cooking chamber (S20).

In the case of supplying water, when the user presses a control button related to water supply, the pump and the water injection nozzle operate to start spraying water into the cooking chamber. In addition, when steam is supplied to the inside of the cooking chamber, the heater and the steam injection nozzle are operated so that the steam is injected into the cooking chamber.

After water or steam is injected into the cooking chamber, a pollutant removing step of removing contaminants attached to the inner surface of the cooking chamber is performed (S30).

In order to remove contaminants attached to the inner wall of the cooking chamber, water may be sprayed at a high pressure using the water supply device. Specifically, the water supply device primarily performs a water supply step of spraying water into the cooking chamber at a low pressure to supply water between the inner wall of the cooking chamber and the contaminants, and after a predetermined time has elapsed to a high pressure. By spraying water into the cooking chamber, a contaminant removing step of completely separating the contaminants from the inner wall of the cooking chamber is performed.

Of course, the user may remove the contaminants fixed inside the cooking chamber by using the contaminant removal device having a separate cleaning member.

The present invention is not limited to the above-described embodiments, and those skilled in the art can make modifications without departing from the spirit of the present invention, and such modifications are within the scope of the present invention.

The cooking appliance according to the present invention has the following effects.

First, according to the present invention, the inner surface of the cooking chamber has a plasma surface treatment, and by installing a water supply device capable of supplying water to the inner wall, there is an advantage that the interior of the cooking chamber can be safely and simply cleaned.

Second, according to the present invention, since it is not necessary to heat the inside of the cooking chamber to a high temperature in order to burn the contaminants fixed in the cooking chamber, there is an advantage that the thickness of the heat insulating material for insulating the cooking chamber becomes thin, and the space of the cooking chamber is widened. .

Third, since it is not necessary to maintain the inside of the cooking chamber at a high temperature in order to burn the contaminants fixed inside the cooking chamber, there is an advantage of reducing the risk of burns and reducing power consumption. In addition, since it is not necessary to maintain the inside of the cooking chamber at a high temperature for a long time to burn the contaminants, there is an advantage that the time required for cleaning the cooking chamber is reduced.

Claims (8)

Cooker main body; A cooking chamber provided inside the main body of the cooking appliance and forming a space for cooking food; And, It includes a water supply device for supplying steam or water to the cooking chamber to clean the inside of the cooking chamber, The inner wall of the cooking chamber exposed to the food is characterized in that the base material of the enamel material by plasma surface treatment to have a water-friendly properties. The method of claim 1, The inner wall of the cooking chamber is characterized in that the base material of the enamel material having a super hydrophilic property by plasma treatment of the atmosphere of the acetylene: nitrogen = 1: 9 atmosphere gas. The method according to claim 1 or 2, The water supply device includes a water tank for storing water, and a water injection nozzle for injecting the water into the cooking chamber. The method according to claim 1 or 2, The water supply device includes a case for storing water, a heater for heating the water to convert to steam. 5. The method of claim 4, The water supply device further comprises a steam injection nozzle for injecting the steam into the cooking chamber. Determining whether cooking of the food by the cooking apparatus according to claim 1 is completed; And, And a water supply step of supplying steam or water to the cooking chamber to clean the cooking chamber of the cooking apparatus. The method according to claim 6, And a pollutant removing step of removing a pollutant attached to an inner wall of the cooking chamber. The method of claim 7, wherein The pollutant removing step of controlling the cooking apparatus, characterized in that for spraying water at a high pressure using a water supply device installed in the cooking apparatus.

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