KR101278311B1 - Surface treating agent for metallic materials - Google Patents
Surface treating agent for metallic materials Download PDFInfo
- Publication number
- KR101278311B1 KR101278311B1 KR1020117013457A KR20117013457A KR101278311B1 KR 101278311 B1 KR101278311 B1 KR 101278311B1 KR 1020117013457 A KR1020117013457 A KR 1020117013457A KR 20117013457 A KR20117013457 A KR 20117013457A KR 101278311 B1 KR101278311 B1 KR 101278311B1
- Authority
- KR
- South Korea
- Prior art keywords
- compound
- metal
- organoalkoxysilane
- metal material
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000007769 metal material Substances 0.000 title claims abstract description 147
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 71
- 238000000576 coating method Methods 0.000 claims abstract description 61
- 239000011248 coating agent Substances 0.000 claims abstract description 56
- -1 silicic acid compound Chemical class 0.000 claims abstract description 50
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 45
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 37
- 238000004381 surface treatment Methods 0.000 claims abstract description 32
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000012756 surface treatment agent Substances 0.000 claims abstract description 25
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 150000002222 fluorine compounds Chemical class 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 10
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 9
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 8
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 7
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 7
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 230000007062 hydrolysis Effects 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 6
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 6
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 58
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 29
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 18
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000003277 amino group Chemical group 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 8
- 239000000839 emulsion Substances 0.000 claims description 6
- 229920003169 water-soluble polymer Polymers 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 abstract description 53
- 238000005260 corrosion Methods 0.000 abstract description 53
- 239000003112 inhibitor Substances 0.000 abstract description 12
- 150000003016 phosphoric acids Chemical class 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 43
- 238000012360 testing method Methods 0.000 description 23
- 239000007788 liquid Substances 0.000 description 22
- 235000011007 phosphoric acid Nutrition 0.000 description 18
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 17
- 238000012545 processing Methods 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 14
- 239000002253 acid Substances 0.000 description 12
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 12
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 12
- 229910000831 Steel Inorganic materials 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- 238000007747 plating Methods 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 229910019142 PO4 Inorganic materials 0.000 description 9
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 9
- 235000021317 phosphate Nutrition 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 239000010452 phosphate Substances 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 239000006087 Silane Coupling Agent Substances 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 7
- 239000000654 additive Substances 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 238000010828 elution Methods 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 239000011572 manganese Substances 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 150000003863 ammonium salts Chemical class 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229910001335 Galvanized steel Inorganic materials 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 239000008397 galvanized steel Substances 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000010955 niobium Substances 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 150000003377 silicon compounds Chemical class 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Chemical compound [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 239000001993 wax Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000003449 preventive effect Effects 0.000 description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 2
- MFWFDRBPQDXFRC-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;vanadium Chemical compound [V].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O MFWFDRBPQDXFRC-LNTINUHCSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- HXNCOGIKSLLIDH-UHFFFAOYSA-N P(O)(O)=O.N(C=CC)(C=CC)C=CC Chemical compound P(O)(O)=O.N(C=CC)(C=CC)C=CC HXNCOGIKSLLIDH-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 2
- 239000011609 ammonium molybdate Substances 0.000 description 2
- 235000018660 ammonium molybdate Nutrition 0.000 description 2
- 229940010552 ammonium molybdate Drugs 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- HJZKOAYDRQLPME-UHFFFAOYSA-N oxidronic acid Chemical compound OP(=O)(O)C(O)P(O)(O)=O HJZKOAYDRQLPME-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 229940005657 pyrophosphoric acid Drugs 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 150000003682 vanadium compounds Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 2
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 description 2
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- RYSXWUYLAWPLES-MTOQALJVSA-N (Z)-4-hydroxypent-3-en-2-one titanium Chemical compound [Ti].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O RYSXWUYLAWPLES-MTOQALJVSA-N 0.000 description 1
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- AIFLGMNWQFPTAJ-UHFFFAOYSA-J 2-hydroxypropanoate;titanium(4+) Chemical compound [Ti+4].CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O.CC(O)C([O-])=O AIFLGMNWQFPTAJ-UHFFFAOYSA-J 0.000 description 1
- BDSSZTXPZHIYHM-UHFFFAOYSA-N 2-phenoxypropanoyl chloride Chemical compound ClC(=O)C(C)OC1=CC=CC=C1 BDSSZTXPZHIYHM-UHFFFAOYSA-N 0.000 description 1
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- 229910052744 lithium Inorganic materials 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 239000004137 magnesium phosphate Substances 0.000 description 1
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 1
- 229960002261 magnesium phosphate Drugs 0.000 description 1
- 235000010994 magnesium phosphates Nutrition 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- 229940077478 manganese phosphate Drugs 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000012170 montan wax Substances 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000159 nickel phosphate Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- JOCJYBPHESYFOK-UHFFFAOYSA-K nickel(3+);phosphate Chemical compound [Ni+3].[O-]P([O-])([O-])=O JOCJYBPHESYFOK-UHFFFAOYSA-K 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- XNHGKSMNCCTMFO-UHFFFAOYSA-D niobium(5+);oxalate Chemical compound [Nb+5].[Nb+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O XNHGKSMNCCTMFO-UHFFFAOYSA-D 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RGRFMLCXNGPERX-UHFFFAOYSA-L oxozirconium(2+) carbonate Chemical compound [Zr+2]=O.[O-]C([O-])=O RGRFMLCXNGPERX-UHFFFAOYSA-L 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- LYTNHSCLZRMKON-UHFFFAOYSA-L oxygen(2-);zirconium(4+);diacetate Chemical compound [O-2].[Zr+4].CC([O-])=O.CC([O-])=O LYTNHSCLZRMKON-UHFFFAOYSA-L 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- NFVUDQKTAWONMJ-UHFFFAOYSA-I pentafluorovanadium Chemical compound [F-].[F-].[F-].[F-].[F-].[V+5] NFVUDQKTAWONMJ-UHFFFAOYSA-I 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000007686 potassium Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- HVTHJRMZXBWFNE-UHFFFAOYSA-J sodium zincate Chemical compound [OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Zn+2] HVTHJRMZXBWFNE-UHFFFAOYSA-J 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000009283 thermal hydrolysis Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- YUOWTJMRMWQJDA-UHFFFAOYSA-J tin(iv) fluoride Chemical compound [F-].[F-].[F-].[F-].[Sn+4] YUOWTJMRMWQJDA-UHFFFAOYSA-J 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 229940048102 triphosphoric acid Drugs 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- VLOPEOIIELCUML-UHFFFAOYSA-L vanadium(2+);sulfate Chemical compound [V+2].[O-]S([O-])(=O)=O VLOPEOIIELCUML-UHFFFAOYSA-L 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229960001296 zinc oxide Drugs 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
- C23C22/74—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process for obtaining burned-in conversion coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
- C09D5/082—Anti-corrosive paints characterised by the anti-corrosive pigment
- C09D5/084—Inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
- C23C22/36—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates
- C23C22/362—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates containing also zinc cations
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/40—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates
- C23C22/42—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates containing also phosphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/40—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates
- C23C22/44—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing molybdates, tungstates or vanadates containing also fluorides or complex fluorides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
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Abstract
본 발명은, 도포형의 표면처리로 형성되는 피막에 있어서, 내식성, 덧칠 도장성의 모든 성능을 갖고, 특히, 형성된 피막이 금속재료 표면과의 밀착성이 우수하며, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화할 수 있는 금속재료용 표면처리제를 제공하는 것을 목적으로 한다. 본 발명의 금속재료 표면처리제는, 규산 화합물(A)과 오르가노알콕시실란(B)과, Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, 및 Zn으로 이루어진 군으로부터 선택되는 1종 이상의 금속원소를 포함하는 금속 화합물(C)과, 인산 화합물 및 불소 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물(D)과 물(E)과, 상기 오르가노알콕시실란(B)의 가수분해로부터 생성되는 알코올(F)을 함유하고, 상기 알코올(F)의 처리제 중에서의 몰농도(mol/L)가 소정의 범위로 조정되어 있는 처리제이다.According to the present invention, in the coating formed by the surface treatment of a coating type, the coating film has all the performances of corrosion resistance and paintability, and in particular, the formed coating is excellent in adhesion to the surface of the metal material and acts as a corrosion inhibitor of the metal material. An object of the present invention is to provide a surface treating agent for a metal material which can be immobilized in a coating film. The metal material surface treatment agent of this invention is a silicic acid compound (A), organoalkoxysilane (B), Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Metal compound (C) comprising at least one metal element selected from the group consisting of Nb, Cr, and Zn, at least one compound (D) and water (E) selected from the group consisting of phosphoric acid compounds and fluorine compounds And a alcohol (F) generated from hydrolysis of the organoalkoxysilane (B), and a molar concentration (mol / L) in the treatment agent of the alcohol (F) is a treatment agent adjusted to a predetermined range. .
Description
본 발명은 금속재료용 표면처리제, 그 금속재료용 표면처리제를 사용한 표면처리방법, 및 피막을 갖는 표면처리 금속재료에 관한 것이다.The present invention relates to a surface treatment agent for metal materials, a surface treatment method using the surface treatment agent for metal materials, and a surface treatment metal material having a coating.
방식성 또는 도장성을 얻기 위해, 금속계 재료에는 표면처리가 행해진다. 즉, 표면처리에 의해, 금속의 부식을 억제하거나, 도장한 경우에 그 도막이 박리되지 않도록 하거나, 도막이 박리되어도 그 부분으로부터의 부식이 진행되지 않도록 하는 효과가 얻어지는 것이 중요하다. 종래, 금속계 재료의 표면처리로서는, 인산의 금속염의 결정을 석출시키는 인산염 처리나 6가 크롬을 포함한 피막을 형성하는 크로메이트 처리가 행해져 왔다.In order to obtain anticorrosiveness or paintability, the metallic material is subjected to surface treatment. That is, it is important to obtain the effect of suppressing the corrosion of the metal by the surface treatment, or preventing the coating film from peeling off when the coating is applied, or preventing corrosion from the portion even if the coating film is peeled off. Conventionally, as the surface treatment of a metallic material, the phosphate treatment which precipitates the crystal | crystallization of the metal salt of phosphoric acid, and the chromate treatment which forms the film containing hexavalent chromium have been performed.
인산염 처리에서는, 먼저, 금속재료를 인산과 금속 이온을 포함하는 수용액에 접촉시킨다. 이때, 금속이 산으로 용해되고, 그 용해 반응에 의해 금속재료의 계면에서 수소가 소비되므로 pH 상승이 일어난다. 이 pH 상승에 의해, 용존할 수 없게 된 인산의 금속염이 금속재료의 표면에 석출되어, 인산염 피막이 형성된다. 인산염 피막은 금속재료 표면의 용해적(溶解跡)에 석출되기 때문에, 금속재료와의 밀착성은 매우 우수하다. 또한, 미세한 결정의 집합에 의해 피막이 형성되기 때문에, 미세한 요철에 의한 앵커효과에 의해 도장된 도막과의 밀착성도 우수하다. 그 때문에, 도장의 하지(下地)처리로서 현재에도 널리 사용되는 우수한 표면처리이다.In the phosphate treatment, first, the metal material is brought into contact with an aqueous solution containing phosphoric acid and metal ions. At this time, the metal is dissolved with an acid, and the pH rises because hydrogen is consumed at the interface of the metal material by the dissolution reaction. By this increase in pH, the metal salt of phosphoric acid, which cannot be dissolved, is precipitated on the surface of the metal material to form a phosphate film. Since the phosphate film is precipitated by dissolution on the surface of the metal material, the adhesion with the metal material is very excellent. Moreover, since a film is formed by aggregation of fine crystal | crystallization, adhesiveness with the coating film coated by the anchor effect by fine unevenness | corrugation is also excellent. Therefore, it is the outstanding surface treatment currently widely used as a base treatment of painting.
그러나, 금속을 인산 함유의 산성 수용액에 접촉시켜 용해 반응을 일으키는 것을 기원으로 한, 소위 반응형 표면처리이기 때문에, 금속재료 종류에 따라 인산을 포함하는 처리액의 성분이 변화한다는 문제가 있었다. 또한, 금속재료의 표면에 석출되지 못한 인산염이, 슬러지로서 처리액에 부유하기 때문에, 이것을 제거할 필요가 있었다. 또한, 수용액과 금속재료의 접촉 조건(온도, 시간 등)을 적절히 변경할 필요가 있고, 또한, 표면처리 후에 수세공정(배수의 발생)이 필요해진다는 문제도 가지고 있었다. 또한, 반응성이 부족한 스테인리스와 같은 재료에는 적용할 수 없었다.However, since it is a so-called reactive surface treatment which originates in contacting an acidic aqueous solution containing phosphoric acid and causing a dissolution reaction, there exists a problem that the component of the processing liquid containing phosphoric acid changes according to the kind of metal material. In addition, since the phosphate which did not precipitate on the surface of the metal material was suspended in the treatment liquid as sludge, it was necessary to remove it. In addition, it was necessary to appropriately change the contact conditions (temperature, time, etc.) between the aqueous solution and the metal material, and also had a problem that a washing process (generation of drainage) was required after the surface treatment. In addition, it could not be applied to a material such as stainless steel that lacked reactivity.
크로메이트 처리에도 인산염과 동일하게 반응 타입이 있고, 수용액을 도포하여 건조할 뿐인 도포형 크로메이트 처리가 잘 알려져 있다. 도포형 크로메이트 처리는, 6가 크롬을 포함하는 수용액을 금속재료 표면에 도포하여 건조할 뿐인 간편한 방법이다. 그 때문에, 표면처리 후에 수세공정이 필요 없고, 배수되지 않는 폐쇄 시스템으로 되는 것으로부터, 시트 코일의 표면처리에서는 매우 많이 채용되고 있다. 또한, 도포형 크로메이트 피막은 3가 크롬의 고분자화를 기초로 한 피막 골격에 가용성의 6가 크롬(크롬산)을 보유·유지(保持)한 형태를 취하고 있어, 3가 크롬 베이스의 피막 배리어 효과와 6가 크롬에 의한 산화 작용(부동태화 작용, 자기수복 작용)으로부터, 금속재료에 우수한 내식성을 부여하고 있다. 또한, 도장의 하지처리로서 적용하는 경우에는, 그 전처리로서 Ni를 미량 치환 도금함으로써 도막이 박리되기 어려워지는 것이 알려져 있다. 그 이유의 하나로, 이 치환 도금에 의해 크로메이트 피막과 금속 표면의 밀착성이 향상된 것을 들고 있다.The chromate treatment also has a reaction type similar to phosphate, and a coated chromate treatment which is only applied by drying an aqueous solution is well known. The coating type chromate treatment is a simple method of simply applying an aqueous solution containing hexavalent chromium to the metal material surface and drying it. Therefore, since the washing process is unnecessary after the surface treatment and it becomes a closed system which is not drained, it is employ | adopted very much in the surface treatment of a sheet coil. In addition, the coated chromate coating has a form in which a soluble hexavalent chromium (chromic acid) is retained and maintained in the coating skeleton based on the polymerization of trivalent chromium. Excellent corrosion resistance is imparted to the metal material from the oxidation action (passivation action, self-healing action) by hexavalent chromium. In addition, when applying as a base treatment of coating, it is known that a coating film becomes difficult to peel off by carrying out a trace displacement plating of Ni as the pretreatment. One of the reasons is that the substitution plating improves the adhesion between the chromate coating and the metal surface.
금속재료의 이상적인 표면처리는, 금속재료 표면과의 밀착성이 우수하고, 피막 성분이 고분자화된 것이며, 또한, 그 피막 중에 가용성의 부식 억제제가 존재하고, 이것을 장기간에 걸쳐서 보유·유지 가능한 피막을 형성하는 것이다. 도포형 크로메이트 처리에서는, 상기와 같은 특성을 갖는 피막이 형성되어 있다.The ideal surface treatment of the metal material is excellent in adhesion to the surface of the metal material, the coating component is polymerized, and a soluble corrosion inhibitor is present in the coating, which forms a coating that can be held and maintained for a long time. It is. In the coating type chromate treatment, a film having the above characteristics is formed.
그러나, 도포형 크로메이트 처리에 의해 형성되는 피막은 6가 크롬을 포함하고, 이 6가 크롬이 수분과의 접촉에 의해 용출되는 것으로부터, 환경면, 안전성의 관점으로부터 경원시되는 경향이 있다. 그 때문에, 크로메이트 피막으로부터 6가 크롬의 용출을 억제하는 여러 가지 연구 개발이 행해졌다.However, the coating film formed by the coated chromate treatment contains hexavalent chromium, and since the hexavalent chromium is eluted by contact with water, it tends to be light from the viewpoint of the environment and safety. Therefore, various research and development which suppressed elution of hexavalent chromium from the chromate coating was performed.
그러나, 최근에는, 6가 크롬의 존재 자체가 꺼려지게 되어, 6가 크롬을 포함하지 않는 논크로메이트 처리의 개발이 많이 행해지고 있다.However, in recent years, the presence of hexavalent chromium itself is reluctant, and a lot of development of the non-chromate process which does not contain hexavalent chromium is performed.
논크로메이트 처리로서, 특허문헌 1에서는, P 화합물, Si 화합물, 및 4가의 바나듐 화합물에 의해 피막이 형성된 강판(鋼板)이 개시되어 있다. 그러나, 이 기술로는, 금속재료 표면과의 밀착성을 충분하게 확보할 수 없고, 또한 충분한 내식성을 얻을 수도 없었다.As the non-chromate treatment, Patent Document 1 discloses a steel sheet having a film formed of a P compound, a Si compound, and a tetravalent vanadium compound. However, with this technique, adhesion to the surface of the metal material could not be sufficiently secured and sufficient corrosion resistance could not be obtained.
특허문헌 2에서는, 실란 커플링제, 특정 수지, F가 4개 이상인 금속 착체, 및 금속 화합물(Mn, Co, Zn, Mg, Ni, Ti, V, Zr)을 포함하는 처리액이 개시되어 있다. 그러나, 이 기술로는, 금속재료 표면과의 밀착성을 충분히 확보할 수 없고, 또한 충분한 내식성을 얻을 수도 없었다.In patent document 2, the processing liquid containing a silane coupling agent, specific resin, the metal complex in which F is four or more, and a metal compound (Mn, Co, Zn, Mg, Ni, Ti, V, Zr) is disclosed. However, with this technique, adhesion to the surface of the metal material could not be sufficiently secured and sufficient corrosion resistance could not be obtained.
특허문헌 3에서는, 콜로이드상 실리카와, 오르가노알콕시실란과, 에틸렌성 불포화기를 갖는 비닐모노머를 중합하는 반응 조작으로 얻어진 코어/셀 형상 복합입자의 수분산성물(水分散性物)이 개시되어 있다. 그러나, 이 입자 중의 80% 이상이 콜로이드상 실리카이다. 이 입자는 안정하게 수지에 혼합하기 위한 기술로서, 이대로 사용해도 피막을 형성할 수 없고, 또한 내식성도 얻어지지 않았다.In patent document 3, the water dispersion of the core / cell-shaped composite particle obtained by the reaction operation which superposes colloidal silica, organoalkoxysilane, and the vinyl monomer which has ethylenically unsaturated group is disclosed. . However, at least 80% of these particles are colloidal silica. As a technique for stably mixing this particle | grain with resin, even if it used as it is, a film could not be formed and corrosion resistance was not obtained either.
특허문헌 4에서는, 실란과 금속 킬레이트를 함유하는 조성물을 사용한 기술이 개시되어 있다. 금속 킬레이트는, 금속 이온(특히 양이온 상태)을 용해시키는 역할을 담당하는 동시에, 금속재료 표면과 결합하는 역할을 하고 있다. 그러나, 이 기술에서는, 금속 이온을 킬레이트하여, 금속 이온을 용해하기 쉬운 형태로 하기 때문에, 결과적으로 그들의 용출을 충분히 억제하지 못하여, 장기 내식성을 얻을 수 없었다.In patent document 4, the technique using the composition containing a silane and a metal chelate is disclosed. Metal chelates play a role of dissolving metal ions (especially in cationic state) and at the same time bonding to metal surface. However, this technique chelates the metal ions to form a form in which the metal ions are easy to dissolve. As a result, their elution cannot be sufficiently suppressed and long-term corrosion resistance cannot be obtained.
특허문헌 5에서는, 실란 커플링제 0.01~100 g/L, 실리카 0.05~100 g/L, Zr 0.01~50 g/L 및/또는 Ti 0.01~50 g/L, 티오카르보닐기 함유 화합물 0.01~100 g/L, 아크릴 수지 0.1~100 g/L를 포함하는 처리액이 개시되어 있다. 이 기술은 밀착성이 우수하기 때문에, 도장성은 좋으나, 무도장시의 내식성이 불충분하였다. 더 나아가서는, 시간의 흐름에 따라 처리액이 겔화되기 때문에, 공업적으로 사용할 수 없었다.In patent document 5, 0.01-100 g / L of a silane coupling agent, 0.05-100 g / L of silica, 0.01-50 g / L of Zr, and / or 0.01-50 g / L of Ti, 0.01-100 g / of thiocarbonyl group containing compounds The processing liquid containing L and 0.1-100 g / L of acrylic resin is disclosed. Since this technique is excellent in adhesiveness, paintability is good, but corrosion resistance at the time of unpainting is inadequate. Furthermore, because the treatment liquid gelled with time, it could not be used industrially.
특허문헌 6에서는, 카르복실기 함유 폴리우레탄 수지, 실란 커플링제, 실리카, 및 인편상 실리카를 사용한 기술이 개시되어 있다.In patent document 6, the technique using a carboxyl group-containing polyurethane resin, a silane coupling agent, a silica, and flaky silica is disclosed.
특허문헌 7에서는, 폴리우레탄 수지와, 실란 커플링제와, 실리카를 사용한 기술이 개시되어 있다. 특허문헌 6 및 7에 개시되는 기술은, 금속재료 표면과의 밀착성을 충분히 확보할 수 없었다. 또한, 실리카를 피막 중에 충분히 고정화할 수 없기 때문에, 충분한 내식성을 얻을 수 없었다.In patent document 7, the technique using a polyurethane resin, a silane coupling agent, and silica is disclosed. The technique disclosed in patent documents 6 and 7 was not able to ensure the adhesiveness with the metal material surface enough. In addition, since the silica could not be sufficiently immobilized in the film, sufficient corrosion resistance could not be obtained.
특허문헌 8에서는, 하층에 유기 수지와 실란 커플링제를 포함하는 피막을 형성하고, 상층에 티오카르보닐기를 함유하는 유기 수지 피막이 개시되어 있다. 본 기술은 2층 처리에 있어서 하층에 관한 것으로서, 상층과의 조합에 의해 비로소 목적을 달성시킬 수 있는 것이다. 그 때문에 단독 피막으로서는, 금속재료와의 밀착성이나 내식성을 얻을 수 없다.In patent document 8, the film containing organic resin and a silane coupling agent is formed in the lower layer, and the organic resin film which contains a thiocarbonyl group in the upper layer is disclosed. This technology relates to the lower layer in the two-layer process, and the object can be achieved only by combining with the upper layer. Therefore, as a single film, adhesiveness and corrosion resistance with a metal material cannot be acquired.
특허문헌 9에서는, 바나듐 화합물과 Zr, Ti, Mo, W, Mn, Ce를 사용한 기술이 개시되어 있다. 그러나, 이 기술로 형성되는 피막과 금속재료의 충분한 밀착성은 얻어지지 않고, 또한, 금속 화합물의 용출을 억제할 수 없었다.In patent document 9, the technique using a vanadium compound and Zr, Ti, Mo, W, Mn, Ce is disclosed. However, sufficient adhesion between the coating film and the metal material formed by this technique could not be obtained and the elution of the metal compound could not be suppressed.
특허문헌 10에서는, 실란 커플링제와, 실리카 졸과, 수성 유기 수지를 사용한 기술이 공개되어 있다. 이 기술에서는 실란 커플링제를 실리카 표면에 결합시키기 위해, 실리카 성분을 고정화하는 것이 가능하지만, 금속 화합물의 용출을 억제할 수 없었다.In patent document 10, the technique using a silane coupling agent, a silica sol, and an aqueous organic resin is disclosed. In this technique, the silica component can be immobilized in order to bond the silane coupling agent to the silica surface, but elution of the metal compound could not be suppressed.
전술한 바와 같이, 어느 방법에서도 크로메이트 피막을 대체한 표면처리 강판은 얻어지고 있지 않아, 내식성이나 덧칠 도장성 등의 모든 특성을 종합적으로 만족하고, 특히 형성된 피막과 금속재료의 밀착성의 향상, 금속재료의 부식의 억제가 이루어진 표면처리 강판을 제조할 수 있는 표면처리제의 개발이 강하게 요망되고 있었다.As described above, no surface-treated steel sheet has been obtained by replacing the chromate coating in any of the above methods, and it satisfies all characteristics such as corrosion resistance and paintability, and in particular, improves the adhesion between the formed coating and the metallic material, and the metallic material. There has been a strong desire to develop a surface treatment agent capable of producing a surface treated steel sheet in which corrosion is inhibited.
특허문헌 1: 일본국 특허공개 제2005-48199호 공보Patent Document 1: Japanese Patent Application Laid-Open No. 2005-48199
특허문헌 2: 일본국 특허공개 제2005-120469호 공보Patent Document 2: Japanese Patent Application Laid-Open No. 2005-120469
특허문헌 3: 일본국 특허 제3818689호 명세서Patent Document 3: Japanese Patent No. 3818689
특허문헌 4: 일본국 특허공표 제2006-519307호 공보Patent Document 4: Japanese Patent Publication No. 2006-519307
특허문헌 5: 일본국 특허공개 제2001-316845호 공보Patent Document 5: Japanese Patent Application Laid-Open No. 2001-316845
특허문헌 6: 일본국 특허공개 제2005-178213호 공보Patent Document 6: Japanese Patent Application Laid-Open No. 2005-178213
특허문헌 7: 일본국 특허공개 제2005-200757호 공보Patent Document 7: Japanese Patent Application Laid-Open No. 2005-200757
특허문헌 8: 일본국 특허 제3722658호 명세서Patent Document 8: Japanese Patent No. 3722658
특허문헌 9: 일본국 특허공개 제2002-30460호 공보Patent Document 9: Japanese Patent Application Laid-Open No. 2002-30460
특허문헌 10: 일본국 특허공개 제2001-98215호 공보Patent Document 10: Japanese Patent Application Laid-Open No. 2001-98215
본 발명은, 도포형의 표면처리로 형성되는 피막에 있어서, 내식성, 덧칠 도장성 등의 모든 특성을 가지고, 특히, 형성된 피막이 금속재료 표면과의 밀착성이 우수하며, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화 가능한 금속재료용 표면처리제, 및 그 금속재료용 표면처리제를 사용한 표면처리방법을 제공하는 것을 목적으로 한다.The present invention has all the characteristics such as corrosion resistance, overcoat, etc. in the coating formed by the surface treatment of the coating type, and in particular, the formed coating has excellent adhesion to the metal material surface and acts as a corrosion inhibitor of the metal material. An object of the present invention is to provide a surface treatment agent for a metal material which can immobilize components in a film, and a surface treatment method using the surface treatment agent for a metal material.
본 발명자들은, 오르가노알콕시실란의 성질에 착안하여, 예의 검토를 행한 결과, 소정의 화합물을 포함하고, 또한, 오르가노알콕시실란의 가수분해로부터 생성되는 알코올의 양이 제어된 처리제를 사용함으로써, 상기 과제가 해결되는 것을 발견하였다.MEANS TO SOLVE THE PROBLEM The present inventors focused on the property of organoalkoxysilane, and as a result of earnestly examining, by using the processing agent in which the quantity of the alcohol which contains a predetermined compound and is produced | generated from the hydrolysis of organoalkoxysilane is controlled, The problem was found to be solved.
즉, 본 발명은, 이하의 (1) 내지 (9)를 제공한다.That is, this invention provides the following (1)-(9).
(1) 규산 화합물(A)과(1) a silicic acid compound (A)
오르가노알콕시실란(B)과,Organoalkoxysilane (B),
Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, 및 Zn으로 이루어진 군으로부터 선택되는 1종 이상의 금속원소를 포함하는 금속 화합물(C)과,Metal compound comprising at least one metal element selected from the group consisting of Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, and Zn (C )and,
인산 화합물 및 불소 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물(D)과,At least one compound (D) selected from the group consisting of a phosphoric acid compound and a fluorine compound,
물(E)과,Water (E),
상기 오르가노알콕시실란(B)의 가수분해로부터 생성되는 알코올(F)을 함유하는 금속재료용 표면처리제로서,As a surface treatment agent for metal materials containing alcohol (F) produced | generated from the hydrolysis of the said organoalkoxysilane (B),
상기 알코올(F)의 처리제 중에서의 몰농도(mol/L)(CF1)와, 상기 오르가노알콕시실란(B)에 포함되는 모든 알콕시기가 가수분해된 경우에 생성되는 알코올의 처리제 중에서의 몰농도(mol/L)(CF2)의 비(CF1/CF2)가 0.05~0.9의 범위로 조정된, 금속재료용 표면처리제.And the molar concentration (mol / L) (C F1 ) in water treating agent of the alcohol (F), wherein the organoalkoxysilane molar concentrations in the agent of the alcohol that is generated when all the alkoxy groups are hydrolyzed contained in (B) The surface treating agent for metal materials whose ratio (C F1 / C F2 ) of (mol / L) (C F2 ) is adjusted to the range of 0.05-0.9.
(2) 상기 알코올(F)과 상기 금속 화합물(C)의 질량비(C/F)가 0.01~50의 범위인, (1)에 기재된 금속재료용 표면처리제.(2) The surface treating agent for metal materials according to (1), wherein the mass ratio (C / F) of the alcohol (F) and the metal compound (C) is in the range of 0.01 to 50.
(3) 상기 알코올(F)과 상기 화합물(D)의 질량비(D/F)가 0.01~25인, (1) 또는 (2)에 기재된 금속재료용 표면처리제.(3) The surface treating agent for metal materials according to (1) or (2), wherein the mass ratio (D / F) of the alcohol (F) and the compound (D) is 0.01 to 25.
(4) 상기 규산 화합물(A)과 상기 오르가노알콕시실란(B)의 질량비(A/B)가 0.01~3.0이고,(4) The mass ratio (A / B) of the silicic acid compound (A) and the organoalkoxysilane (B) is 0.01 to 3.0,
상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 금속 화합물(C)의 질량비(C/(A+B))가 0.01~2.0이며,The mass ratio (C / (A + B)) of the total mass (A + B) and the metal compound (C) of the silicic acid compound (A) and the organoalkoxysilane (B) is 0.01 to 2.0,
상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 화합물(D)의 질량비(D/(A+B))가 0.01~1.5인, (1) 내지 (3) 중 어느 하나에 기재된 금속재료용 표면처리제.(1) to which the mass ratio (D / (A + B)) of the total mass (A + B) of the silicic acid compound (A) and the organoalkoxysilane (B) and the compound (D) is 0.01 to 1.5. The surface treating agent for metal materials in any one of (3).
(5) 상기 오르가노알콕시실란(B)이 아미노기 및/또는 에폭시기를 갖는, (1) 내지 (4) 중 어느 하나에 기재된 금속재료용 표면처리제.(5) The surface treating agent for metal materials according to any one of (1) to (4), wherein the organoalkoxysilane (B) has an amino group and / or an epoxy group.
(6) 추가로, 수용성 고분자 및 수계 에멀젼 수지로 이루어진 군으로부터 선택되는 1종 이상의 화합물(G)을 함유하는, (1) 내지 (5) 중 어느 하나에 기재된 금속재료용 표면처리제.(6) The surface treating agent for a metal material according to any one of (1) to (5), further comprising at least one compound (G) selected from the group consisting of a water-soluble polymer and an aqueous emulsion resin.
(7) 처리제 중에 있어서 상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 화합물(G)의 질량비(G(A+B))가 0.01~0.3인, (6)에 기재된 금속재료용 표면처리제.(7) The total mass (A + B) of the silicic acid compound (A) and the organoalkoxysilane (B) and the mass ratio (G (A + B)) of the compound (G) in the treating agent are 0.01 to 0.3. , Surface treatment agent for metal materials as described in (6).
(8) (1) 내지 (7) 중 어느 하나에 기재된 금속재료용 표면처리제를 금속재료 표면 상에 도포하고, 가열 건조하여, 피막량이 Si 부착량으로 2~1000 ㎎/㎡인 피막을 상기 금속재료 표면 상에 형성하는, 금속재료의 표면처리방법.(8) The surface treatment agent for a metal material according to any one of (1) to (7) is applied on the surface of the metal material and dried by heating to form a film having a coating amount of 2 to 1000 mg / m 2 as the Si adhesion amount. The surface treatment method of a metal material formed on the surface.
(9) (8)에 기재된 금속재료의 표면처리방법에 의해 얻어지는, 표면 상에 피박을 갖는 표면처리 금속재료.(9) The surface-treated metal material which has a film on the surface obtained by the surface treatment method of the metal material as described in (8).
본 발명은, 도포형의 표면처리로 형성되는 피막에 있어서, 우수한 내식성, 덧칠 도장성 등의 모든 성능을 가지고, 특히, 형성된 피막이 금속재료 표면과의 밀착성이 우수하고, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화 가능한 금속재료용 표면처리제, 및 그 금속재료용 표면처리제를 사용한 표면처리방법을 제공한다.The present invention has all the performances such as excellent corrosion resistance, overcoat, and the like in a coating formed by a coating type surface treatment, and in particular, the formed coating has excellent adhesion to the metal material surface and acts as a corrosion inhibitor of the metal material. The surface treatment agent for metal materials which can fix | immobilize the to-be-constituted component in a film, and the surface treatment method using the surface treatment agent for metal materials are provided.
이하에, 본 발명의 금속재료용 표면처리제, 및 그 금속재료용 표면처리제를 사용한 표면처리방법에 대해서 설명한다.Below, the surface treatment method using the surface treating agent for metal materials of this invention, and this surface treating agent for metal materials is demonstrated.
먼저, 금속재료용 표면처리제에 대해서 상세하게 설명한다.First, the surface treating agent for metal materials is demonstrated in detail.
<금속재료용 표면처리제><Surface Treatment Agent for Metal Materials>
본 발명의 금속재료용 표면처리제는, 규산 화합물(A)과 오르가노알콕시실란(B)과, Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, 및 Zn으로 이루어진 군으로부터 선택되는 1종 이상의 금속원소를 포함하는 금속 화합물(C)과, 인산 화합물 및 불소 화합물로 이루어진 군으로부터 선택되는 화합물(D)과, 물(E)과, 오르가노알콕시실란(B)의 가수분해로부터 생성되는 알코올(F)을 함유하는 금속재료용 표면처리제이다. 또한, 알코올(F)의 처리제 중에서의 몰농도(mol/L)(CF1)와, 오르가노알콕시실란(B)에 포함되는 모든 알콕시기가 가수분해된 경우에 생성되는 알코올의 처리제 중에서의 몰농도(mol/L)(CF2)의 비(CF1/CF2)가 0.05~0.9의 범위로 조정되어 있다.The surface treatment agent for metal materials of this invention is a silicic acid compound (A), organoalkoxysilane (B), Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W , A metal compound (C) comprising at least one metal element selected from the group consisting of Nb, Cr, and Zn, a compound (D) selected from the group consisting of a phosphoric acid compound and a fluorine compound, water (E), And a surface treating agent for metal materials containing an alcohol (F) generated from hydrolysis of the organoalkoxysilane (B). Further, the molar concentrations in the agent of the alcohol that is generated when all the alkoxy groups are hydrolyzed contained in a molar concentration (mol / L) (C F1 ) and the organoalkoxysilane (B) in water treating agent of the alcohol (F) The ratio (C F1 / C F2 ) of (mol / L) (C F2 ) is adjusted in the range of 0.05 to 0.9.
먼저, 금속재료용 표면처리제를 구성하는 각종 성분에 대해서 설명한다.First, the various components which comprise the surface treating agent for metal materials are demonstrated.
<규산 화합물(A)><Silic acid compound (A)>
본 발명의 금속재료용 표면처리제에는, 규산 화합물(A)이 포함된다. 규산 화합물을 사용함으로써, 내식성, 덧칠 도장성, 내열성, 용접성, 연속 가공성 등의 모든 성능이 우수한 피막을 형성할 수 있다.The silicic acid compound (A) is contained in the surface treating agent for metal materials of this invention. By using a silicic acid compound, the film which is excellent in all the performances, such as corrosion resistance, overcoat, heat resistance, weldability, and continuous workability, can be formed.
규산 화합물은, 규소와 산소를 주 구성성분으로 하는 것으로서, 그 종류는 특별히 한정되지 않는다. 예를 들면, 규산나트륨, 규산칼륨, 규산리튬 등 알칼리규산염, 이들 규산염으로부터 이온 교환법에 의해 나트륨, 칼륨, 또는 리튬을 제거하여 졸화하는 등의 방법에 의해 얻어지는 콜로이달 실리카나 액상 실리카, 염화 규소를 공기 중에서 연소 산화시켜 제작한 기상 실리카를 물에 분산시킨 분산체, 더 나아가서는 알콕시실란의 가수분해물 등을 들 수 있다. 그 중에서도, 얻어지는 피막의 성능이 보다 우수한 점에서, 콜로이달 실리카 및 액상 실리카가 바람직하다.The silicic acid compound is mainly composed of silicon and oxygen, and the kind thereof is not particularly limited. For example, colloidal silica, liquid silica, and silicon chloride obtained by alkali silicate such as sodium silicate, potassium silicate, lithium silicate, and sodium silicate obtained by a method such as removing sodium, potassium, or lithium by ion exchange, and solvating the silicate The dispersion which disperse | distributed the gas phase silica produced by combustion oxidation in air in water, Furthermore, the hydrolyzate of an alkoxysilane, etc. are mentioned. Especially, colloidal silica and liquid silica are preferable at the point which the performance of the obtained film is more excellent.
예를 들면, 액상 실리카로서, 스노우텍스C, 스노우텍스CS, 스노우텍스CM, 스노우텍스O, 스노우텍스OS, 스노우텍스OM, 스노우텍스NS, 스노우텍스N, 스노우텍스NM, 스노우텍스S, 스노우텍스20, 스노우텍스30, 스노우텍스40, 아데라이토AT-20N, 아데라이토AT-20A, 아데라이토AT-20Q 등을 들 수 있고, 또한 특수한 사슬형상으로 가공된 스노우텍스UP, 스노우텍스OUP, 스노우텍스PS-S, 스노우텍스PS-SO, 스노우텍스PS-M, 스노우텍스PS-MO, 스노우텍스PS-L, 스노우텍스PS-LO 등을 들 수 있다.For example, as liquid silica, Snowtex C, Snowtex CS, Snowtex CM, Snowtex O, SnowtexOS, Snowtex OM, Snowtex NS, Snowtex N, SnowtexNM, Snowtex S, Snowtex 20, Snowtex 30, Snowtex 40, Aderaito AT-20N, Aderaito AT-20A, Aderaito AT-20Q, and also Snowtex UP, SnowtexOUP, Snowtex processed in a special chain shape PS-S, Snowtex PS-SO, Snowtex PS-M, Snowtex PS-MO, Snowtex PS-L, Snowtex PS-LO.
또한, 기상 실리카로 불리는 미립자 실리카로서는, 에어로실50, 에어로실130, 에어로실200, 에어로실300, 에어로실380, 에어로실TT600, 에어로실MOX80, 에어로실MOX170 등을 들 수 있고, 이것을 물에 분산한 것도 사용할 수 있다.Moreover, as fine particle silica called gas phase silica, Aerosil 50, Aerosil 130, Aerosil 200, Aerosil 300, Aerosil 380, Aerosil TT600, Aerosil MOX80, Aerosil MOX170 etc. are mentioned, A dispersion can also be used.
금속재료용 표면처리제 중에 있어서 규산 화합물(A)의 함유량은, 특별히 한정되지 않지만, 얻어지는 피막의 내식성, 덧칠 도장성, 내열성, 용접성, 연속 가공성이 보다 우수하다는 관점으로부터, 처리제 중의 전체 고형분에 대해서, 0.1~70 질량%가 바람직하고, 1~50 질량%가 보다 바람직하다. 또한, 처리제 중의 전체 고형분은, 후술하는 피막을 구성하는 고형성분을 의미하고, 용매 등은 포함되지 않는다.Although content of a silicic acid compound (A) in a surface treating agent for metal materials is not specifically limited, From the viewpoint of the corrosion resistance, the coating property, the heat resistance, the weldability, and the continuous workability of the coating film obtained, with respect to the total solid in a processing agent, 0.1-70 mass% is preferable, and 1-50 mass% is more preferable. In addition, the total solid in a processing agent means the solid component which comprises the film mentioned later, and a solvent etc. are not contained.
<오르가노알콕시실란(B)><Organoalkoxysilane (B)>
본 발명의 금속재료용 표면처리제에는, 오르가노알콕시실란(B)이 포함된다. 오르가노알콕시실란(B)과 전술한 규산 화합물(A)을 병용함으로써, 규산 화합물(A)과 오르가노알콕시실란(B)의 실록산 결합에 의한 삼차원 구조를 갖는 피막이 형성된다. 그것에 의해, 얻어지는 피막의 내식성, 덧칠 도장성, 내열성, 용접성, 연속 가공성, 어스성, 금속재료 표면과의 밀착성 등이 향상된 것으로 추측된다.The organoalkoxysilane (B) is contained in the surface treating agent for metal materials of this invention. By using together an organoalkoxysilane (B) and the above-mentioned silicic acid compound (A), the film which has a three-dimensional structure by the siloxane bond of a silicic acid compound (A) and an organoalkoxysilane (B) is formed. Thereby, it is guessed that the corrosion resistance, the overcoat, heat resistance, weldability, continuous workability, earth resistance, adhesiveness with the surface of a metal material, etc. of the film obtained are improved.
본 발명에서 사용되는 오르가노알콕시실란은, 특별히 한정되지 않지만, 예를 들면, 테트라메톡시실란, 테트라에톡시실란, 트리메틸메톡시실란, 트리메틸에톡시실란, 디메틸디메톡시실란, 디메틸디에톡시실란, 메틸트리메톡시실란, 메틸트리에톡시실란, 시클로헥실메틸디메톡시실란, n-헥실트리메톡시실란, 디페닐디메톡시실란, 디페닐디에톡시실란, 페닐트리메톡시실란, 페닐트리에톡시실란, 데실트리메톡시실란, 옥타데실트리메톡시실란, 옥타데실트리에톡시실란, 이소부틸트리메톡시실란, 비닐트리클로로실란, 비닐트리메톡시실란, 비닐트리에톡시실란, β-(3,4-에폭시시클로헥실)에틸트리메톡시실란, γ-글리시독시프로필트리메톡시실란, γ-글리시독시프로필메틸디에톡시실란, γ-글리시독시프로필트리에톡시실란, N-β(아미노에틸)γ-아미노프로필메틸디메톡시실란, γ-아미노프로필트리메톡시실란, γ-아미노프로필트리에톡시실란, γ-메타크릴옥시프로필메틸디메톡시실란, γ-메타크릴옥시프로필메틸디에톡시실란, γ-메르캅토프로필메틸디메톡시실란, p-스티릴트리메톡시실란, γ-아크릴옥시프로필트리메톡시실란, N-페닐-γ-아미노프로필트리메톡시실란, γ-우레이도프로필트리에톡시실란, γ-클로로프로필트리메톡시실란, 비스(트리에톡시실릴프로필)테트라설피드, γ-이소시아네이트프로필트리에톡시실란, γ-트리에톡시실릴-N-(1,3-디메틸-부틸리덴)프로필아민, N-(비닐벤질아민)-β-아미노에틸-γ-아미노프로필트리메톡시실란 등을 들 수 있다.The organoalkoxysilane used in the present invention is not particularly limited, but for example, tetramethoxysilane, tetraethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, Methyltrimethoxysilane, methyltriethoxysilane, cyclohexylmethyldimethoxysilane, n-hexyltrimethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane , Decyltrimethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, isobutyltrimethoxysilane, vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, β- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltriethoxysilane, N-β (amino Ethyl) γ-aminoprop Philmethyldimethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-mercapto Propylmethyldimethoxysilane, p-styryltrimethoxysilane, γ-acryloxypropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-ureidopropyltriethoxysilane, γ- Chloropropyltrimethoxysilane, bis (triethoxysilylpropyl) tetrasulfide, γ-isocyanatepropyltriethoxysilane, γ-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine , N- (vinylbenzylamine) -β-aminoethyl-γ-aminopropyltrimethoxysilane, and the like.
그 중에서도, 알코올 농도를 조정하기 쉬운 것으로부터, 활성인 알콕시기를 3 mol 갖는 트리알콕시실란이 바람직하다.Especially, since it is easy to adjust alcohol concentration, the trialkoxysilane which has 3 mol of active alkoxy groups is preferable.
또한, 오르가노알콕시실란(B)이, 아미노기 및 에폭시기로부터 선택되는 1종 이상의 관능기를 갖는 것이 바람직하다. 오르가노알콕시실란(B)이 이들의 관능기를 갖는 것에 의해, 상기 규소 화합물(A)과 상기 오르가노알콕시실란(B)의 실록산 결합이 보다 촉진되어, 더욱 치밀한 삼차원 가교를 갖는 피막이 형성될 것으로 추측된다. 이것에 의해 피막은, 금속재료의 부식 억제제로서 작용하는 성분을 보다 고정하는 것이 가능해져, 더욱 내식성이 향상된다.Moreover, it is preferable that organoalkoxysilane (B) has 1 or more types of functional groups chosen from an amino group and an epoxy group. By organoalkoxysilane (B) having these functional groups, the siloxane bond of the said silicon compound (A) and said organoalkoxysilane (B) is accelerated | stimulated more, and the film | membrane which has a more dense three-dimensional bridge | crosslinking is estimated. do. As a result, the coating can be further fixed to a component acting as a corrosion inhibitor of the metal material, further improving corrosion resistance.
오르가노알콕시실란의 바람직한 실시형태의 하나로서, 이하의 화학식 I으로 표시되는 화합물을 들 수 있다.As one of the preferable embodiment of organoalkoxysilane, the compound represented by the following general formula (I) is mentioned.
[화학식 I](I)
화학식 I 중, X는 에폭시기, 아미노기, 메르캅토기, 아크릴옥시기, 우레이도기, 이소시아네이트기, 및 비닐기로 이루어진 군으로부터 선택되는 어느 하나의 관능기를 나타낸다. L은 2가의 연결기, 또는 단순한 결합수(結合手)를 나타낸다. R은 알킬기 또는 수소원자를 나타낸다. n은 1~3의 정수를 나타낸다.In the formula (I), X represents any one functional group selected from the group consisting of an epoxy group, an amino group, a mercapto group, an acryloxy group, a ureido group, an isocyanate group, and a vinyl group. L represents a divalent linking group or simple coupling | bonding number. R represents an alkyl group or a hydrogen atom. and n represents an integer of 1 to 3.
화학식 I 중, X는 에폭시기, 아미노기, 메르캅토기, 아크릴옥시기, 우레이도기, 이소시아네이트기, 및 비닐기로 이루어진 군으로부터 선택되는 어느 하나의 관능기를 나타낸다. 그 중에서도, 에폭시기, 아미노기가 바람직하다. 또한, n이 2 이상인 경우는, X는 동일해도 되고 상이해도 된다.In the formula (I), X represents any one functional group selected from the group consisting of an epoxy group, an amino group, a mercapto group, an acryloxy group, a ureido group, an isocyanate group, and a vinyl group. Especially, an epoxy group and an amino group are preferable. In addition, when n is two or more, X may be same or different.
화학식 I 중, L은 2가의 연결기, 또는 단순한 결합수를 나타낸다.In the formula (I), L represents a divalent linking group or a simple bond number.
L로 표시되는 연결기로서는, 예를 들면, 알킬렌기(탄소수 1~20이 바람직하다), -O-, -S-, 아릴렌기, -CO-, -NH-, -SO2-, -COO-, -CONH-, 또는 이들을 조합한 기를 들 수 있다. 그 중에서도, 알킬렌기가 바람직하다. 단순한 결합수의 경우, 화학식 I의 X가 Si(규소원자)와 직접 연결하는 것을 가리킨다.As the linking group represented by L, for example, an alkylene group (having a carbon number of 1 to 20 is preferred), -O-, -S-, an arylene group, -CO-, -NH-, -SO 2 - , -COO- , -CONH-, or a combination thereof. Especially, an alkylene group is preferable. In the case of a simple bond water, X in formula (I) refers to the direct connection with Si (silicon atoms).
또한, n이 2 이상인 경우는, L은 동일해도 되고 상이해도 된다.In addition, when n is two or more, L may be same or different.
화학식 I 중, R은 각각 독립적으로, 알킬기(바람직하게는, 탄소수 1~4), 또는 수소원자를 나타낸다.In general formula (I), R represents an alkyl group (preferably C1-C4) or a hydrogen atom each independently.
화학식 I 중, n은 1~3의 정수를 나타낸다. 그 중에서도, 1이 바람직하다.In general formula (I), n represents the integer of 1-3. Especially, 1 is preferable.
또한, 오르가노알콕시실란(B)은 알콕시기의 일부가 가수분해된 가수분해물이어도 된다.The organoalkoxysilane (B) may be a hydrolyzate in which a part of the alkoxy group is hydrolyzed.
금속재료용 표면처리제 중에 있어서 오르가노알콕시실란(B)의 함유량은, 특별히 한정되지 않지만, 얻어지는 피막의 내식성, 덧칠 도장성, 내열성, 용접성, 연속 가공성, 어스성, 금속재료 표면과의 밀착성이 보다 우수하다는 관점으로부터, 처리제 중의 전체 고형분에 대해서, 0.1~70 질량%가 바람직하고, 1~50 질량%가 보다 바람직하다.Although content of organoalkoxysilane (B) is not specifically limited in the surface treating agent for metal materials, Corrosion resistance, overcoat, heat resistance, weldability, continuous workability, earth resistance, and adhesiveness with the surface of a metal material are more limited. From a viewpoint of being excellent, 0.1-70 mass% is preferable with respect to the total solid in a processing agent, and 1-50 mass% is more preferable.
<금속 화합물(C)><Metal Compound (C)>
본 발명의 금속재료용 표면처리제에는, Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, 및 Zn으로 이루어진 군으로부터 선택되는 1종 이상의 금속원소를 포함하는 금속 화합물(C)이 포함된다. 금속 화합물(C)과, 후술하는 인산 화합물 및/또는 불소 화합물을 병용함으로써, 피막 중에 난용성의 염이 형성된다. 이 난용성의 염이, 상기 규소 화합물(A)과 상기 오르가노알콕시실란(B)의 가교 반응을 촉진시켜, 더욱 치밀한 망목구조를 갖는 피막이 형성됨으로써, 금속재료의 부식 억제제로서 작용하는 금속 화합물(C)을 피막 중에 고정화하기 쉬워질 것으로 추찰된다.The surface treatment agent for a metal material of the present invention is one selected from the group consisting of Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, and Zn. Metal compound (C) containing the above metal element is contained. A poorly soluble salt is formed in a film by using together a metal compound (C) and a phosphoric acid compound and / or a fluorine compound mentioned later. This poorly water-soluble salt promotes the crosslinking reaction of the silicon compound (A) and the organoalkoxysilane (B) to form a film having a more dense network structure, whereby a metal compound acting as a corrosion inhibitor of a metal material ( It is guessed that C) will become easy to fix in a film.
금속 화합물(C)은, 상기 금속원소를 포함하고 있으면 특별히 한정되지 않지만, 예를 들면, 상기 금속을 포함하는 질산염, 초산염, 인산염, 황산염, 암모늄염, 불화물 등을 들 수 있다.The metal compound (C) is not particularly limited as long as it contains the metal element. Examples thereof include nitrates, acetates, phosphates, sulfates, ammonium salts, and fluorides.
금속 화합물(C)의 구체예로서, Zr을 포함하는 금속 화합물로서는, 예를 들면, 질산지르코늄, 옥시질산지르코늄, 초산지르코닐, 황산지르코닐, 탄산지르코닐암모늄, 탄산지르코닐칼륨, 탄산지르코닐나트륨, 및 지르코니아졸 등을 들 수 있다. 또한, 수용성 지르코늄염의 수용액을, 이온 교환이나 알칼리 중화하여 만들어지는 지르콘산 및 그 염도 들 수 있다.As a specific example of a metal compound (C), as a metal compound containing Zr, zirconium nitrate, zirconium oxynitrate, zirconyl acetate, zirconyl sulfate, zirconyl ammonium carbonate, zirconyl potassium carbonate, zirconyl carbonate Sodium, zirconia sol and the like. Moreover, the zirconic acid and its salt which are produced by ion-exchange or alkali neutralization of the aqueous solution of water-soluble zirconium salt are also mentioned.
Ti를 포함하는 금속 화합물로서는, 예를 들면, 황산티타닐, 질산티타닐, 질산티탄, 염화티타닐, 염화티탄, 티타니아졸, 산화티탄, 옥살산티탄산칼륨, 티탄락테이트, 티탄테트라이소프로폭시드, 티탄아세틸아세토네이트, 디이소프로필티타늄비스아세틸아세톤 등을 들 수 있다. 또한, 황산티타닐의 수용액을, 열가수분해시켜 얻어지는 메타티탄산이나, 알칼리 중화로 얻어지는 오르토티탄산 및 이들의 염도 들 수 있다.Examples of the metal compound containing Ti include titanium sulfate, titanium nitrate, titanium nitrate, titanium chloride, titanium chloride, titanazole, titanium oxide, potassium oxalate, titanium lactate, and titanium tetraisopropoxide. , Titanium acetylacetonate, diisopropyl titanium bisacetyl acetone, and the like. Moreover, metatitanic acid obtained by thermal hydrolysis of the aqueous solution of titanyl sulfate, ortho titanic acid obtained by alkali neutralization, and these salts are also mentioned.
Co를 포함하는 금속 화합물로서는, 예를 들면, 황산코발트, 질산코발트, 탄산코발트, 인산코발트, 염화코발트, 산화코발트, 수산화코발트 등을 들 수 있다.Examples of the metal compound containing Co include cobalt sulfate, cobalt nitrate, cobalt carbonate, cobalt phosphate, cobalt chloride, cobalt oxide, and cobalt hydroxide.
Fe를 포함하는 금속 화합물로서는, 예를 들면, 황산철, 질산철, 염화철, 인산철, 산화철, 수산화철, 철분 등을 들 수 있다.As a metal compound containing Fe, iron sulfate, iron nitrate, iron chloride, iron phosphate, iron oxide, iron hydroxide, iron powder, etc. are mentioned, for example.
V를 포함하는 금속 화합물로서는, 예를 들면, 오산화바나듐, 메타바나딘산 암모늄, 메타바나딘산나트륨, 옥시3염화바나듐, 삼산화바나듐, 이산화바나듐, 옥시황산바나듐, 바나듐옥시아세틸아세토네이트, 바나듐아세틸아세토네이트, 3염화바나듐, 인바나도몰리브덴산, 황산바나듐 등을 들 수 있다.As a metal compound containing V, for example, vanadium pentoxide, ammonium metavanadate, sodium metavanadate, vanadium oxychloride, vanadium trioxide, vanadium dioxide, vanadium oxysulfate, vanadiumoxyacetylacetonate, vanadium acetyl Acetonate, vanadium trichloride, invanado molybdate, vanadium sulfate and the like.
Ce를 포함하는 금속 화합물로서는, 예를 들면, 질산세륨, 초산세륨, 염화세륨, 세륨졸 등을 들 수 있다.Examples of the metal compound containing Ce include cerium nitrate, cerium acetate, cerium chloride, cerium sol, and the like.
Mo를 포함하는 금속 화합물로서는, 예를 들면, 몰리브덴산암모늄, 몰리브덴산나트륨, 몰리브덴산칼륨, 몰리브도인산암모늄 등을 들 수 있다.As a metal compound containing Mo, ammonium molybdate, sodium molybdate, potassium molybdate, ammonium molybdate phosphate, etc. are mentioned, for example.
Mn을 포함하는 금속 화합물로서는, 예를 들면, 과망간산칼륨, 과망간산암모늄, 과망간산나트륨, 과망간산염이나, 황산망간, 질산망간, 산화망간, 탄산망간, 염화망간, 인산망간 등을 들 수 있다.Examples of the metal compound containing Mn include potassium permanganate, ammonium permanganate, sodium permanganate, permanganate, manganese sulfate, manganese nitrate, manganese oxide, manganese carbonate, manganese chloride, and manganese phosphate.
Mg를 포함하는 금속 화합물로서는, 예를 들면, 황산마그네슘, 질산마그네슘, 탄산마그네슘, 인산마그네슘, 염화마그네슘, 산화마그네슘, 수산화마그네슘 등을 들 수 있다.As a metal compound containing Mg, magnesium sulfate, magnesium nitrate, magnesium carbonate, magnesium phosphate, magnesium chloride, magnesium oxide, magnesium hydroxide, etc. are mentioned, for example.
Al을 포함하는 금속 화합물로서는, 예를 들면, 산화알루미늄, 수산화알루미늄, 황산알루미늄, 질산알루미늄, 인산알루미늄, 염화알루미늄 등을 들 수 있다.As a metal compound containing Al, aluminum oxide, aluminum hydroxide, aluminum sulfate, aluminum nitrate, aluminum phosphate, aluminum chloride, etc. are mentioned, for example.
Ni를 포함하는 금속 화합물로서는, 예를 들면, 산화니켈, 수산화니켈, 황산니켈, 질산니켈, 인산니켈, 염화니켈 등을 들 수 있다.As a metal compound containing Ni, nickel oxide, nickel hydroxide, nickel sulfate, nickel nitrate, nickel phosphate, nickel chloride, etc. are mentioned, for example.
Ca를 포함하는 금속 화합물로서는, 예를 들면, 산화칼슘, 수산화칼슘, 황산칼슘, 질산칼슘, 인산칼슘, 염화칼슘 등을 들 수 있다.Examples of the metal compound containing Ca include calcium oxide, calcium hydroxide, calcium sulfate, calcium nitrate, calcium phosphate, calcium chloride and the like.
W를 포함하는 금속 화합물로서는, 예를 들면, 메타텅스텐산암모늄, 메타텅스텐산나트륨, 메타텅스텐산칼륨, 파라텅스텐산, 파라텅스텐산암모늄, 파라텅스텐산나트륨 등을 들 수 있다.Examples of the metal compound containing W include ammonium metatungstate, sodium metatungstate, potassium metatungstate, paratungstic acid, ammonium paratungstate, and sodium paratungstate.
Nb를 포함하는 금속 화합물로서는, 예를 들면, 옥살산니오브, 산화니오브, 니오브졸 등을 들 수 있다.As a metal compound containing Nb, niobium oxalate, niobium oxide, niobazole, etc. are mentioned, for example.
Cr을 포함하는 금속 화합물로서는, 예를 들면, 3가의 크롬을 들 수 있고, 황산크롬, 질산크롬, 염화크롬, 수산화크롬, 산화크롬, 인산크롬 등을 들 수 있다.As a metal compound containing Cr, trivalent chromium is mentioned, for example, chromium sulfate, chromium nitrate, chromium chloride, chromium hydroxide, chromium oxide, chromium phosphate, etc. are mentioned.
Zn을 포함하는 금속 화합물로서는, 예를 들면, 산화아연, 수산화아연, 황산아연, 질산아연, 염화아연, 인산아연, 아세틸아연 등을 들 수 있고, 그 외에는, 아연은 양성 금속이기 때문에, 알칼리사이드에서 생성되는 아연산나트륨, 아연산칼륨 등을 들 수 있다.Examples of the metal compound containing Zn include zinc oxide, zinc hydroxide, zinc sulfate, zinc nitrate, zinc chloride, zinc phosphate, acetyl zinc, and the like, and since zinc is an amphoteric metal, alkali side Sodium zincate, potassium zincate, and the like.
이들 중, 내식성 향상의 효과가 높은 점에서, Zr, V, Al, 또는 Zn을 포함하는 금속 화합물, 및 이들의 염으로부터 선택되는 적어도 1종 이상을 포함하는 것이 보다 바람직하다.Among these, since the effect of improving corrosion resistance is high, it is more preferable to contain at least 1 sort (s) chosen from a metal compound containing Zr, V, Al, or Zn, and these salts.
금속재료용 표면처리제 중에 있어서 금속 화합물(C)의 함유량은, 특별히 한정되지 않지만, 얻어지는 피막의 내식성, 어스성이 보다 우수하다는 관점으로부터, 처리제 중의 전체 고형분에 대해서, 0.05~50 질량%가 바람직하고, 0.1~30 질량%가 보다 바람직하다.Although content of a metal compound (C) is not specifically limited in the surface treating agent for metal materials, 0.05-50 mass% is preferable with respect to the total solid in a processing agent from the viewpoint of being more excellent in the corrosion resistance and earth resistance of the film obtained. , 0.1-30 mass% is more preferable.
<인산 화합물 및/또는 불소 화합물><Phosphate Compounds and / or Fluorine Compounds>
본 발명의 금속재료용 표면처리제에는, 인산 화합물 및 불소 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물(D)이 포함된다. 전술한 바와 같이, 인산 화합물 및/또는 불소 화합물은, 금속 화합물(C)과 병용함으로써, 상기 규소 화합물(A)과 상기 오르가노알콕시실란(B)의 가교 반응을 촉진시킨다. 더 나아가서는, 인산 화합물 및/또는 불소 화합물은, 기재인 금속을 에칭하여, 기재 표면과 결합한 피막을 형성하기 때문에, 피막의 내식성, 금속재료 표면과의 밀착성을 더욱 향상시킬 것으로 추측된다.The surface treating agent for metal materials of this invention contains 1 or more types of compound (D) chosen from the group which consists of a phosphoric acid compound and a fluorine compound. As described above, the phosphoric acid compound and / or the fluorine compound is used in combination with the metal compound (C) to promote the crosslinking reaction between the silicon compound (A) and the organoalkoxysilane (B). Furthermore, since a phosphate compound and / or a fluorine compound etch the metal which is a base material, and form the film combined with the surface of a base material, it is guessed that the corrosion resistance of a film and adhesiveness with the surface of a metal material are further improved.
인산 화합물로서는, 인산의 암모늄염, 금속염(금속으로서는, 예를 들면, 알칼리 금속, V, Co, W, Ti, Zr, Al, Zn을 들 수 있다.); 피로인산 등의 축합인산; 피트산, 포스폰기, 포스핀기를 갖는 유기 인산 화합물 등을 들 수 있다. 예를 들면, 인산, 메타인산, 피로인산, 오르토인산, 삼인산, 사인산, 및 이들의 암모늄염, 알루미늄염, 마그네슘염, 니트릴로트리스메틸렌포스폰산, 니트릴로트리스프로필렌포스폰산, 니트릴로디에틸메틸렌포스폰산, 니트릴로프로필비스메틸렌포스폰산메탄, 1-히드록시메탄-1,1-디포스폰산 등을 들 수 있다.Examples of the phosphoric acid compound include ammonium salts and metal salts of phosphoric acid (as metals, for example, alkali metals, V, Co, W, Ti, Zr, Al, Zn); Condensed phosphoric acid such as pyrophosphoric acid; The organic phosphoric acid compound which has a phytic acid, a phosphon group, a phosphine group, etc. are mentioned. For example, phosphoric acid, metaphosphoric acid, pyrophosphoric acid, orthophosphoric acid, triphosphoric acid, diacid, and ammonium salts, aluminum salts, magnesium salts, nitrilotris methylenephosphonic acid, nitrilotrispropylene phosphonic acid, nitrilodiethylmethylene phosphate Phonic acid, nitrilopropylbismethylenephosphonic acid methane, 1-hydroxymethane-1,1-diphosphonic acid, etc. are mentioned.
인산 화합물은, 단독으로 또는 2종 이상을 조합시켜서 사용된다.Phosphoric acid compounds are used individually or in combination of 2 or more types.
불소 화합물로서는, 예를 들면, 불화수소산, 그의 암모늄염, 그의 알칼리 금속염; 불화주석, 불화망간, 불화제1철, 불화제2철, 불화알루미늄, 불화아연, 불화바나듐 등의 금속 불화물; 산화불소, 불화아세틸, 불화벤조일 등의 산불화물을 들 수 있다.As a fluorine compound, hydrofluoric acid, its ammonium salt, its alkali metal salt; Metal fluorides such as tin fluoride, manganese fluoride, ferrous fluoride, ferric fluoride, aluminum fluoride, zinc fluoride and vanadium fluoride; Acid fluorides, such as fluorine oxide, acetyl fluoride, and benzoyl fluoride, are mentioned.
보다 바람직하게는 Ti, Zr, Hf, Si, Al 및 B로 이루어진 군으로부터 선택되는 1종 이상의 원소를 갖는 것이 바람직하게 사용된다. 구체적으로는, 예를 들면, (TiF6)2-, (ZrF6)2-, (HfF6)2-, (SiF6)2-, (AlF6)3-, (BF4OH)- 등의 음이온에 수소원자가 1~3원자 부가된 착체, 이들 음이온의 암모늄염, 이들 음이온의 금속염 등을 들 수 있다. 보다 구체적으로는, 티탄불화수소산, 지르콘불화수소산, 규불화수소산 등을 들 수 있다.More preferably, those having at least one element selected from the group consisting of Ti, Zr, Hf, Si, Al and B are preferably used. Specifically, for example, (TiF 6) 2-, ( ZrF 6) 2-, (HfF 6) 2-, (SiF 6) 2-, (AlF 6) 3-, (BF 4 OH) - , etc. Complexes having 1 to 3 atoms of hydrogen atoms added to an anion thereof, ammonium salts of these anions, metal salts of these anions, and the like. More specifically, titanium hydrofluoric acid, zircon hydrofluoric acid, hydrofluoric acid, etc. are mentioned.
불소 화합물은, 단독으로 또는 2종 이상을 조합하여 사용된다.A fluorine compound is used individually or in combination of 2 or more types.
금속재료용 표면처리제 중에 있어서 화합물(D)의 합계 함유량은, 특별히 한정되지 않지만, 얻어지는 피막의 내식성이 보다 우수하다는 관점으로부터, 처리제 중의 전체 고형분에 대해서, 0.01~40 질량%가 바람직하고, 0.1~30 질량%가 보다 바람직하다.Although the total content of a compound (D) in the surface treating agent for metal materials is not specifically limited, 0.01-40 mass% is preferable with respect to the total solid in a processing agent from the viewpoint of being more excellent in the corrosion resistance of the film obtained, and 0.1- 30 mass% is more preferable.
<물(E)><Water (E)>
본 발명의 금속재료용 표면처리제에는 물(E)이 포함된다.Water (E) is contained in the surface treating agent for metal materials of this invention.
금속재료용 표면처리제 중에 있어서 물의 함유량은, 특별히 한정되지 않지만, 처리제의 취급이 보다 용이하다는 관점으로부터, 처리제 전량에 대해서, 30~99 질량%가 바람직하고, 40~95 질량%가 보다 바람직하다.Although content of water in a surface treating agent for metal materials is not specifically limited, 30-99 mass% is preferable with respect to a processing agent whole quantity, and 40-95 mass% is more preferable from a viewpoint that handling of a processing agent is easier.
<알코올(F)><Alcohol (F)>
본 발명의 금속재료용 표면처리제에는, 전술한 오르가노알콕시실란(B)의 가수분해로부터 생성되는 알코올(F)이 포함된다. 알콕시기를 갖는 오르가노알콕시실란(B)의 가수분해 반응에 의해, 알코올이 생성된다.The surface treatment agent for metal materials of this invention contains alcohol (F) produced | generated from the hydrolysis of the organoalkoxysilane (B) mentioned above. Alcohol is produced | generated by the hydrolysis reaction of the organoalkoxysilane (B) which has an alkoxy group.
알코올의 종류로서는, 사용되는 오르가노알콕시실란의 알콕시기의 종류에 의존하고, 예를 들면, 메탄올, 에탄올, 프로판올 등을 들 수 있다.As a kind of alcohol, depending on the kind of alkoxy group of organoalkoxysilane used, methanol, ethanol, propanol, etc. are mentioned, for example.
본 발명의 금속재료용 표면처리제 중에 포함되는 알코올(F)의 몰농도(mol/L)(CF1)는, 오르가노알콕시실란에 포함되는 알콕시기가 모두 가수분해된 경우에 얻어지는 처리제 중의 알코올의 몰농도(mol/L)(CF2)와의 관계에 있어서, CF1/CF2=0.05~0.9를 만족시키도록 조정되고, 바람직하게는 0.1~0.8을 만족시킨다.The molar concentration (mol / L) (C F1 ) of the alcohol (F) contained in the surface treating agent for metal materials of the present invention is the mole of alcohol in the treating agent obtained when all the alkoxy groups contained in the organoalkoxysilane are hydrolyzed. In the relationship with the concentration (mol / L) (C F2 ), it is adjusted to satisfy C F1 / C F2 = 0.05 to 0.9, and preferably 0.1 to 0.8.
상기 몰농도비(CF1/CF2)가 0.05 미만인 경우, 규산 화합물(A)과 오르가노알콕시실란(B)이, 실록산 결합을 형성하는 데에 필요한 반응성 관능기의 효과가 오르가노알콕시실란(B)으로부터 상실되기 때문에, 피막의 내식성, 덧칠 도장성, 형성된 피막과 금속재료 표면의 밀착성이 저하된다. 또한, 몰농도비(CF1/CF2)가 0.9를 초과하는 경우, 반응성 관능기의 효과가 높기 때문에, 오르가노알콕시실란(B)끼리 실록산 결합을 형성하고, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화할 수 없게 된다.When the molar concentration ratio (C F1 / C F2 ) is less than 0.05, the effect of the reactive functional group required for the silicic acid compound (A) and the organoalkoxysilane (B) to form a siloxane bond is organoalkoxysilane (B). Since it loses from the film, corrosion resistance of a film, coating property, and the adhesiveness of the formed film and the surface of a metal material fall. In addition, when the molar concentration ratio (C F1 / C F2 ) exceeds 0.9, since the effect of the reactive functional group is high, the organoalkoxysilanes (B) form siloxane bonds with each other, and a component that acts as a corrosion inhibitor of the metal material is used. It becomes impossible to fix | immobilize in a film.
오르가노알콕시실란(B)의 알콕시기에 유래하는 알코올의 몰농도(mol/L)(CF1)를 조정하는 방법은 특별히 한정되지 않고, 예를 들면, 오르가노알콕시실란에 실란올 축합촉매와 물을 혼합한 용액에 있어서, 부생(副生)되는 알코올량을 제어하여 농도를 조정하는 방법, 및 부생되는 알코올과 물을 제거하여 농도를 조정하는 방법 등을 들 수 있다.The method for adjusting the molarity (mol / L) (C F1 ) of the alcohol derived from the alkoxy group of the organoalkoxysilane (B) is not particularly limited, and for example, a silanol condensation catalyst and water in the organoalkoxysilane. In the solution which mixed the above, the method of adjusting the density | concentration by controlling the amount of alcohol byproduced, the method of adjusting the density | concentration by removing the by-produced alcohol and water, etc. are mentioned.
또한, 알코올 농도의 측정방법은, 특별히 한정되지 않고, 가스크로마토그래피나 이온크로마토그래피 등의 크로마토그래프법, 및 핵 자기공명 분광법 등을 들 수 있다.In addition, the measuring method of alcohol concentration is not specifically limited, The chromatograph method, such as gas chromatography and ion chromatography, and nuclear magnetic resonance spectroscopy, etc. are mentioned.
또한, 본 발명의 금속재료용 표면처리제 중에 있어서, 전술한 금속 화합물(C)과 알코올(F)의 질량비(C/F)가, 0.01~50을 만족시키는 것이 바람직하고, 0.1~40을 만족시키는 것이 보다 바람직하다. 상기 범위 내라면, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화하기 쉬워지기 때문에, 얻어지는 피막의 내식성, 덧칠 도장성, 금속재료 표면과의 밀착성이 보다 우수한 점에서 바람직하다.Moreover, in the surface treating agent for metal materials of this invention, it is preferable that the mass ratio (C / F) of the metal compound (C) and alcohol (F) mentioned above satisfy | fills 0.01-50, and satisfy | fills 0.1-40. It is more preferable. If it is in the said range, since the component which acts as a corrosion inhibitor of a metal material becomes easy to be immobilized in a film, it is preferable at the point which is excellent in the corrosion resistance of a film obtained, an overcoat, and adhesiveness with the surface of a metal material.
또한, 본 발명의 금속재료용 표면처리제 중에 있어서, 화합물(D)과 알코올(F)의 질량비(D/F)가, 0.01~25를 만족시키는 것이 바람직하고, 0.1~20을 만족시키는 것이 보다 바람직하며, 0.1~15를 만족시키는 것이 보다 바람직하다. 상기 범위 내라면 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화하기 쉬워지기 때문에, 얻어지는 피막의 내식성, 덧칠 도장성, 금속재료 표면과의 밀착성이 보다 우수한 점에서 바람직하다.Moreover, in the surface treating agent for metal materials of this invention, it is preferable that mass ratio (D / F) of a compound (D) and alcohol (F) satisfies 0.01-25, and it is more preferable to satisfy 0.1-20. It is more preferable to satisfy 0.1-15. If it is in the said range, since the component which acts as a corrosion inhibitor of a metal material becomes easy to be immobilized in a film, it is preferable at the point which is more excellent in the corrosion resistance of a film obtained, an overcoat, and adhesiveness with the metal material surface.
본 발명의 금속재료용 표면처리제 중에 있어서 규산 화합물(A)과 오르가노알콕시실란(B)의 질량비(A/B)는, 0.01~3.0인 것이 바람직하고, 0.05~2.5가 보다 바람직하다. 0.01 미만인 경우, 연속 가공성이 저하되는 경우가 있고, 3.0을 초과하는 경우는, 형성되는 피막과 금속재료 표면의 밀착성이 저하되는 경우가 있다.In the surface treating agent for metal materials of this invention, it is preferable that the mass ratio (A / B) of a silicic acid compound (A) and organoalkoxysilane (B) is 0.01-3.0, and 0.05-2.5 are more preferable. When it is less than 0.01, continuous workability may fall, and when it exceeds 3.0, adhesiveness of the film formed and the surface of a metal material may fall.
본 발명의 금속재료용 표면처리제 중에 있어서 규산 화합물(A) 및 오르가노알콕시실란(B)의 합계 질량(A+B)과, 금속 화합물(C)의 질량비(C/(A+B))는, 0.01~2.0인 것이 바람직하고, 0.05~1.5인 것이 보다 바람직하다. 0.01 미만인 경우, 피막의 내식성이 저하되는 경우가 있고, 2.0을 초과하는 경우는, 피막의 내식성의 저하와 함께, 피막과 금속재료 표면의 밀착성이 저하되는 경우가 있다.In the surface treating agent for metal materials of the present invention, the total mass (A + B) of the silicic acid compound (A) and the organoalkoxysilane (B) and the mass ratio (C / (A + B)) of the metal compound (C) are It is preferable that it is 0.01-2.0, and it is more preferable that it is 0.05-1.5. When it is less than 0.01, the corrosion resistance of a film may fall, and when it exceeds 2.0, the corrosion resistance of a film may fall and the adhesiveness of a film and a metal material surface may fall.
본 발명의 금속재료용 표면처리제 중에 있어서 규산 화합물(A) 및 오르가노알콕시실란(B)의 합계 질량(A+B)과, 화합물(D)의 질량비(D/(A+B))는, 0.01~1.5인 것이 바람직하고, 0.05~1.0인 것이 보다 바람직하다. 0.01 미만인 경우, 피막의 내식성이 저하되는 경우가 있고, 1.5를 초과하는 경우는, 피막의 내식성, 어스성, 피막과 금속재료 표면의 밀착성이 저하되는 동시에, 금속재료 중의 부식 억제제로서 작용하는 성분의 피막 중에서의 고정화가 되기 어려워지는 경우가 있다.In the surface treatment agent for metal materials of this invention, the total mass (A + B) of a silicic acid compound (A) and organoalkoxysilane (B), and the mass ratio (D / (A + B)) of a compound (D), It is preferable that it is 0.01-1.5, and it is more preferable that it is 0.05-1.0. If it is less than 0.01, the corrosion resistance of the film may decrease, and if it exceeds 1.5, the corrosion resistance of the film, the earth resistance, the adhesion between the film and the surface of the metal material are deteriorated, and the components acting as corrosion inhibitors in the metal material. It may become difficult to fix | immobilize in a film.
<기타 첨가제><Other additives>
본 발명의 금속재료용 표면처리제에는, 필요에 따라서, 각종 첨가제가 포함되어 있어도 된다. 이하에, 함유되는 첨가제에 대해서 설명한다.The surface treatment agent for metal materials of this invention may contain various additives as needed. Below, the additive contained is demonstrated.
<수용성 고분자 및/또는 수계 에멀젼 수지>Water-soluble polymers and / or aqueous emulsion resins
본 발명의 금속재료용 표면처리제에는, 수용성 고분자 및 수계 에멀젼 수지로 이루어진 군으로부터 선택되는 1종 이상의 화합물(G)이 포함되어 있어도 된다. 이 화합물(G)의 첨가에 의해, 피막의 내지문성이나 윤활성이 향상된다.The surface treating agent for metal materials of the present invention may contain at least one compound (G) selected from the group consisting of a water-soluble polymer and an aqueous emulsion resin. By addition of this compound (G), the fingerprint-finding property and lubricity of a film improve.
수용성 고분자 및/또는 수계 에멀젼 수지의 종류로서는, 특별히 한정되지 않지만, 예를 들면, 폴리아크릴산, 폴리메타크릴산, 폴리아크릴아미드, 폴리비닐알코올 등의 수용성 고분자, 물에 분산한 형태의 아크릴 수지, 우레탄 수지, 에폭시 수지, 폴리에스테르 수지, 폴리아미드 수지, 폴리올레핀 수지, 에틸렌-아크릴 수지, 폴리부티랄 수지, 폴리아세탈 수지, 불소 수지 등을 들 수 있다.Although it does not specifically limit as a kind of water-soluble polymer and / or aqueous emulsion resin, For example, Water-soluble polymers, such as polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinyl alcohol, acrylic resin of the form disperse | distributed to water, Urethane resin, epoxy resin, polyester resin, polyamide resin, polyolefin resin, ethylene-acrylic resin, polybutyral resin, polyacetal resin, fluorine resin and the like.
금속재료용 표면처리제 중에 있어서 화합물(G)의 함유량은, 특별히 한정되지 않는다.Content of the compound (G) in the surface treating agent for metal materials is not specifically limited.
그 중에서도, 처리제 중에 있어서 규산 화합물(A) 및 오르가노알콕시실란(B)의 합계 질량(A+B)과 화합물(G)의 질량비(G/(A+B))가, 0.01~0.3인 것이 바람직하고, 0.05~0.25인 것이 보다 바람직하다. 0.01 미만의 경우, 피막의 내지문성이나 윤활성의 향상이 보이지 않는 경우가 있고, 0.3을 초과하는 경우, 피막의 내식성 및 내열성이 저하되는 경우가 있다.Especially, the mass ratio (G / (A + B)) of the total mass (A + B) of a silicic acid compound (A) and organoalkoxysilane (B) and a compound (G) in a processing agent is 0.01-0.3 It is preferable and it is more preferable that it is 0.05-0.25. In the case of less than 0.01, the anti-fingerprint property and lubricity of the coating may not be observed, and in the case of more than 0.3, the corrosion resistance and heat resistance of the coating may decrease.
본 발명의 금속재료용 표면처리제에는, 실란올 축합 촉매가 포함되어 있어도 된다. 실란올 축합 촉매로서는, 특별히 한정되지 않지만, 예를 들면, 포름산, 초산, 부티르산, 옥살산, 숙신산, 락트산, L-아스코르브산, 타르타르산, 구연산, DL-말산, 말론산, 말레산, 프탈산, 니트릴로트리스메틸렌포스폰산, 니트릴로트리스프로필렌포스폰산, 니트릴로디에틸메틸렌포스폰산, 니트릴로프로필비스메틸렌포스폰산메탄, 메탄-1-히드록시-1,1-디포스폰산, 에탄-1-히드록시-1,1-디포스폰산, 프로판-1-히드록시-1,1-디포스폰산, 설폰산, 벤젠설폰산, 케티민 화합물, 알디민 화합물, 엔아민 화합물, 옥사졸리딘 화합물, 아미노알킬알콕시실란 등을 들 수 있다.The silanol condensation catalyst may be contained in the surface treating agent for metal materials of this invention. Although it does not specifically limit as a silanol condensation catalyst, For example, formic acid, acetic acid, butyric acid, oxalic acid, succinic acid, lactic acid, L-ascorbic acid, tartaric acid, citric acid, DL-malic acid, malonic acid, maleic acid, phthalic acid, nitrilo Trismethylenephosphonic acid, nitrilotrispropylene phosphonic acid, nitrilodiethylmethylenephosphonic acid, nitrilopropylbismethylenephosphonic acid methane, methane-1-hydroxy-1,1-diphosphonic acid, ethane-1-hydroxy- 1,1-diphosphonic acid, propane-1-hydroxy-1,1-diphosphonic acid, sulfonic acid, benzenesulfonic acid, ketimine compound, aldimine compound, enamine compound, oxazolidine compound, aminoalkylalkoxy Silane and the like.
본 발명의 금속재료용 표면처리제에는, N을 포함하는 방청(anti-rust) 첨가제가 포함되어 있어도 된다. 이들의 예로서, 에틸렌디아민, 트리에틸아민, 요소, 구아니딘 등을 들 수 있다.The anti-rust additive containing N may be contained in the surface treating agent for metal materials of this invention. Examples of these include ethylenediamine, triethylamine, urea, guanidine and the like.
본 발명의 금속재료용 표면처리제에는, 필요에 따라서, 윤활성을 향상시키기 위한 첨가제(윤활제)가 포함되어 있어도 된다. 피막의 윤활성을 개선함으로써, 피막에 흠집이 생기는 것을 방지하여, 가공시 피막의 손상을 저감하는 것에 유효하게 작용한다.The surface treatment agent for metal materials of this invention may contain the additive (lubricant) for improving lubricity as needed. By improving the lubricity of the coating, it is possible to prevent scratches on the coating and to effectively reduce damage to the coating during processing.
첨가제로서는, 폴리에틸렌 왁스, 산화폴리에틸렌 왁스, 산화폴리프로필렌 왁스, 카나우바 왁스, 파라핀 왁스, 몬탄 왁스, 라이스 왁스, 테플론(등록상표) 왁스, 이황화탄산, 그라파이트 등의 고체 윤활제를 들 수 있다. 이들의 고체 윤활제 중에서, 1종 또는 2종 이상을 사용하는 것이 가능하다.Examples of the additive include solid lubricants such as polyethylene wax, polyethylene oxide wax, polypropylene oxide, carnauba wax, paraffin wax, montan wax, rice wax, Teflon (registered trademark) wax, carbonic acid disulfide and graphite. Among these solid lubricants, it is possible to use one kind or two or more kinds.
본 발명의 금속재료용 표면처리제에는, 필요에 따라서 알코올, 케톤, 셀로솔브계의 수용성 용제, 계면활성제, 소포제, 레벨링제, 방균 방곰팡이제, 착색제 등을 첨가해도 된다. 이들에 의해, 처리제의 건조성, 도포 외관, 작업성, 저장성, 의장성을 향상시킬 수 있다. 단, 이들은 본 발명에서 얻어지는 품질을 손상시키지 않을 정도로 첨가하는 것이 중요하고, 많아도 처리액 중에 수 질량%이다.You may add alcohol, a ketone, a cellosolve type water-soluble solvent, surfactant, an antifoamer, a leveling agent, an antibacterial mold, a coloring agent, etc. to the surface treating agent for metal materials of this invention as needed. These can improve the drying property, coating appearance, workability, shelf life, and design of the treatment agent. However, it is important to add these so that it may not impair the quality obtained by this invention, and they are several mass% in a process liquid at most.
본 발명의 금속재료용 표면처리제의 pH는, 처리액을 안정하게 제작할 수 있다면 산성이어도 되고 알칼리성이어도 된다. 단, pH가 0.5 미만인 경우, 금속재료와의 반응성이 높아져 외관이 저하되는 경우가 있고, 14를 초과하는 경우, 금속 화합물의 안정성이 저하되어, 처리제 자체의 안정성이 저하되기 때문에 바람지하지 않다.PH of the surface treating agent for metal materials of this invention may be acidic or alkaline, as long as it can produce a process liquid stably. However, when pH is less than 0.5, reactivity with a metal material may become high, and external appearance may fall, and when it exceeds 14, the stability of a metal compound will fall and the stability of a processing agent itself will not be desired.
본 발명의 금속재료용 표면처리제에는, 필요에 따라서, 상기 물 이외의 용매(예를 들면, 알코올 등)가 포함되어 있어도 된다.The surface treatment agent for metal materials of this invention may contain solvents (for example, alcohol etc.) other than the said water as needed.
본 발명의 금속재료용 표면처리제의 조제방법은, 특별히 한정되지 않는다. 예를 들면, 규산 화합물(A), 오르가노알콕시실란(B), 금속 화합물(C), 인산 화합물 및/또는 불소 화합물(D), 및 물(E)을, 혼합 믹서 등의 교반기를 사용하여 충분히 혼합함으로써 제조할 수 있다.The preparation method of the surface treating agent for metal materials of this invention is not specifically limited. For example, a silicic acid compound (A), an organoalkoxysilane (B), a metal compound (C), a phosphoric acid compound and / or a fluorine compound (D), and water (E) are mixed using a stirrer such as a mixing mixer. It can manufacture by mixing sufficiently.
<표면처리방법><Surface Treatment Method>
본 발명의 금속재료용 표면처리제를 사용한 표면처리방법은, 특별히 한정되지 않지만, 상기 금속재료용 표면처리제를 금속재료 표면 상에 도포하고, 가열 건조하여, 피막량이 Si 부착량으로 2~1000 ㎎/㎡인 피막을 금속재료 표면 상에 형성하는 표면처리방법이 바람직하다.Although the surface treatment method using the surface treating agent for metal materials of this invention is not specifically limited, The said surface treating agent for metal materials is apply | coated on the metal material surface, and it heat-drys, and the film amount is 2-1000 mg / m <2> by Si adhesion amount. The surface treatment method of forming a phosphorus film on the metal material surface is preferable.
이하에, 이 표면처리방법에 대해서 설명한다.This surface treatment method will be described below.
도포 전에, 필요에 따라서, 금속재료 표면 상의 유분이나 오염을 제거할 목적으로, 금속재료에 전처리를 행해도 된다. 금속재료는, 방청 목적으로 방청유가 도유되어 있는 경우가 많다. 또한, 방청유로 도유되어 있지 않은 경우에도, 작업 중에 부착된 유분이나 오염 등이 있다. 전처리를 행함으로써, 금속재료 표면 상을 청정하여, 본 발명의 금속재료용 표면처리제에 의해 금속재료 표면이 균일하게 젖기 쉬워진다. 또한, 유분이나 오염 등이 없어, 본 발명의 금속재료용 표면처리제로 재료 표면이 균일하게 젖는 경우는, 전처리 행정은 특별히 필요는 없다.Before application, the metal material may be pretreated as necessary for the purpose of removing oil or dirt on the metal material surface. In metal materials, rust preventive oil is often oiled for the purpose of rust prevention. Moreover, even if it is not oiled with rust preventive oil, there exist oils, contamination, etc. which adhered during operation. By pretreatment, the surface of the metal material is cleaned, and the surface of the metal material is easily wetted by the surface treatment agent for metal materials of the present invention. In addition, when there is no oil, a contamination, etc., and a material surface wets uniformly with the surface treating agent for metal materials of this invention, a pretreatment process is not necessary in particular.
또한, 전처리의 방법으로서는, 특별히 한정되지 않고, 탕세(湯洗), 용제 세정, 알칼리 탈지 세정 등의 방법을 들 수 있다.Moreover, it does not specifically limit as a method of pretreatment, The methods, such as hot water washing | cleaning, solvent washing | cleaning, and alkali degreasing washing | cleaning, are mentioned.
사용되는 금속재료로서는, 특별히 제한되지 않지만, 용융 아연 도금 강판(GI), 이것을 합금화한 합급화 용융 아연 도금 강판(GA), 더 나아가서는 용융 아연 Zn-5%Al 합금 도금 강판(GF), 용융 아연-55% 알루미늄 합금 도금 강판(GL), 전기 아연 도금 강판(EG), 전기 아연-Ni 합금 도금 강판(Zn-Ni), 알루미늄 도금, 알루미늄 시트를 들 수 있다. 또한, 도금을 행하지 않은 철판에도 적용은 가능하다.Although it does not restrict | limit especially as a metal material used, Hot-dip galvanized steel plate (GI), Alloyed hot dip galvanized steel plate (GA) which alloyed this, Further hot-dip zinc Zn-5% Al alloy plated steel plate (GF), Hot-dip A zinc-55% aluminum alloy plated steel plate (GL), an electrogalvanized steel plate (EG), an electro zinc-Ni alloy plated steel plate (Zn-Ni), aluminum plating, and an aluminum sheet are mentioned. Moreover, it is applicable also to the iron plate which is not plated.
금속재료용 표면처리제의 금속재료로의 도포방법으로서는, 처리되는 금속재료의 형상 등에 따라 적절히 최적의 방법이 선택되고, 롤 코트법, 침지법, 스프레이 도포법 등을 들 수 있다.As a coating method of the surface treatment agent for metal materials to a metal material, the optimal method suitably is selected according to the shape of the metal material to be processed, etc., and a roll coating method, an immersion method, a spray coating method, etc. are mentioned.
보다 구체적으로는, 예를 들면, 시트 형상의 경우는, 롤 코트법이나, 처리액을 금속재료에 스프레이하고 롤이나 기체를 고압으로 분사하여 도포량을 조정한다. 성형품의 경우는, 처리액에 침지하여 끌어올리고, 경우에 따라서는 압축 공기로 여분의 처리액을 불어 날려 버려 도포량을 조정하는 것 등을 들 수 있다.More specifically, for example, in the case of a sheet form, the coating amount is adjusted by spraying a roll coating method or a processing liquid onto a metal material and spraying a roll or a gas at a high pressure. In the case of a molded article, it is immersed in a process liquid, and it raises, and in some cases, blows an excess process liquid with compressed air, and adjusts an application amount.
금속재료 표면 상에 형성된 도막을 건조할 때의 가열온도로서는, 40~250℃가 바람직하고, 60~200℃가 보다 바람직하며, 60~180℃가 특히 바람직하다. 40℃ 미만이면, 본 발명의 처리제의 주 용매인 수분이 잔존하여, 금속 화합물을 고정할 수 없거나, 피막의 내식성이 저하된다. 250℃를 초과하면, 피막에 크랙(crack)이 생기기 쉬워져, 내식성이 저하되는 경우가 있다. 가열 건조방법은 특별히 한정되지 않고, 열풍이나 인덕션 히터, 적외선, 근적외선 등에 의해 가열하여, 처리제를 건조하면 된다.As heating temperature at the time of drying the coating film formed on the metal material surface, 40-250 degreeC is preferable, 60-200 degreeC is more preferable, 60-180 degreeC is especially preferable. If it is less than 40 degreeC, the water | moisture content which is a main solvent of the processing agent of this invention remains, and a metal compound cannot be fixed, or the corrosion resistance of a film falls. When it exceeds 250 degreeC, a crack may occur easily in a film and corrosion resistance may fall. The heat drying method is not particularly limited and may be heated by hot air, an induction heater, infrared rays, near infrared rays, or the like to dry the treatment agent.
또한, 가열시간은, 사용되는 금속재료용 표면처리제 중의 화합물의 종류 등에 따라 적절히 최적의 조건이 선택된다. 그 중에서도, 생산성 등의 측면에서, 0.1~60초가 바람직하고, 1~30초가 보다 바람직하다.In addition, optimal heating conditions are selected suitably according to the kind etc. of the compound in the surface treating agent for metal materials used. Especially, 0.1-60 second is preferable from a viewpoint of productivity etc., and 1-30 second is more preferable.
금속재료 표면 상에 형성되는 피막의 피막량은, Si 부착량으로 2~1000 ㎎/㎡가 되도록 조정되고, 바람직하게는 10~800 ㎎/㎡이며, 보다 바람직하게는 20~500 ㎎/㎡이다. 2 ㎎/㎡ 미만의 경우는, 본 발명의 효과를 충분하게는 얻을 수 없는 경우가 있고, 1000 ㎎/㎡를 초과하는 경우는, 효과가 포화되어, 경제적으로 불이익이 될뿐 아니라, 경우에 따라서는 내식성의 저하를 초래하는 경우도 있다.The film amount of the film formed on the metal material surface is adjusted so that it may become 2-1000 mg / m <2> by Si adhesion amount, Preferably it is 10-800 mg / m <2>, More preferably, it is 20-500 mg / m <2>. In the case of less than 2 mg / m 2, the effect of the present invention may not be sufficiently obtained. In the case of more than 1000 mg / m 2, the effect is saturated and economically disadvantageous. May cause deterioration of corrosion resistance.
전술한 표면처리방법에 의해 형성된 피막상에, 건조 후의 막두께가 0.1~3.0 ㎛가 되도록 유기 고분자막을 형성하여, 추가로 고도의 내식성이나 내지문성, 윤활성을 부여할 수 있다. 이와 같은 유기 고분자막은, 이미 공지의 아크릴, 우레탄, 에폭시 등 수지 에멀젼이나, 이것에 실리카, 방청제, 윤활제, 자외선 흡수제, 안료 등이 첨가된 것을 사용할 수 있다.On the film formed by the above-mentioned surface treatment method, an organic polymer film is formed so that the film thickness after drying may be 0.1-3.0 micrometers, and it can further give a high corrosion resistance, fingerprint resistance, and lubricity. As such an organic polymer film, what is known is resin emulsion, such as acryl, urethane, and epoxy, and what added silica, a rust preventive agent, a lubricating agent, a ultraviolet absorber, a pigment, etc. to this.
상기 금속재료용 표면처리제를 사용하여 금속재료의 표면처리를 행함으로써, 내식성, 덧칠 도장성, 내열성, 용접성, 연속 가공성, 어스성, 내지문성을 가지고, 특히, 형성된 피막이 금속재료 표면과의 밀착성이 우수하고, 금속재료의 부식 억제제로서 작용하는 성분을 피막 중에 고정화할 수 있는 표면처리 피막을 형성할 수 있다.The surface treatment of the metal material is carried out using the surface treatment agent for the metal material, thereby providing corrosion resistance, coating paintability, heat resistance, weldability, continuous processability, earth resistance and fingerprint resistance, and in particular, the formed film has good adhesion to the surface of the metal material. It is possible to form a surface treatment film which is excellent and can fix a component which acts as a corrosion inhibitor of a metal material in the film.
본 발명의 금속재료용 표면처리제를 사용하여 얻어지는 표면처리 금속재료는, 각종 용도에 적용할 수 있다. 예를 들면, 건축, 전기, 자동차 등의 각종 분야에서 사용되는 재료 등을 들 수 있다.The surface treatment metal material obtained using the surface treating agent for metal materials of this invention is applicable to various uses. For example, the material etc. which are used in various fields, such as a building, an electricity, and an automobile, are mentioned.
실시예Example
다음으로, 실시예 및 비교예에 의해 본 발명의 효과를 설명하지만, 본 실시예는 어디까지나 본 발명을 설명하는 일례에 지나지 않고, 본 발명을 한정하는 것은 아니다.Next, effects of the present invention will be described with reference to examples and comparative examples, but the present examples are merely illustrative of the present invention and are not intended to limit the present invention.
1. 시험판의 작성방법1. How to Write a Trial
(1) 공시재(供試材)(소재)(1) Test materials (materials)
이하의 시판 재료를 공시재로서 사용하였다.The following commercially available materials were used as test materials.
(i) 전기 아연 도금 강판(EG): 판두께 0.8 ㎜, 도금량=20/20(g/㎡)(i) Electrogalvanized steel sheet (EG): plate thickness 0.8 mm, plating amount = 20/20 (g / ㎡)
(ii) 용융 아연 도금 강판(GI): 판두께 0.8 ㎜, 도금량=60/60(g/㎡)(ii) Hot-dip galvanized steel sheet (GI): plate thickness 0.8 mm, plating amount = 60/60 (g / ㎡)
(iii) 합금화 용융 아연 도금 강판(GA): 판두께 0.8 ㎜, 도금량=40/40(g/㎡)(iii) alloyed hot dip galvanized steel sheet (GA): plate thickness 0.8 mm, plating amount = 40/40 (g / ㎡)
또한, 도금량은 각각의 강판의 주면 상으로의 도금량을 나타내고 있다. 예를 들면, 전기 아연 도금 강판의 경우는, 20/20(g/㎡)이고, 강판 양면의 각각에 20g/㎡의 도금을 갖는 것을 의미한다.The plating amount represents the plating amount on the main surface of each steel sheet. For example, in the case of an electrogalvanized steel sheet, it means 20/20 (g / m <2>), and means having 20 g / m <2> plating in each of both surfaces of a steel plate.
(2) 전처리(세정)(2) pretreatment (washing)
시험편의 제작방법으로서는, 먼저 상기 공시재의 표면을 니혼 파커라이징 제조 펄클린 N364S를 사용해서 처리하여, 표면 상의 유분이나 오염을 제거하였다. 다음으로, 수돗물로 수세하여 금속재료 표면이 물로 100% 젖는 것을 확인한 후, 추가로 순수(純水)를 흘리고, 100℃ 분위기의 오븐에서 수분을 제거한 것을 시험판으로서 사용하였다.As a production method of the test piece, the surface of the said test material was first processed using Nippon Parkarizing-made Perclin N364S, and the oil and contamination on the surface were removed. Next, after confirming that the surface of the metal material was 100% wet with water by washing with tap water, pure water was further flowed and water was removed from the oven at 100 ° C. atmosphere as a test plate.
(3) 본 발명의 처리액의 조정(3) Adjustment of the treatment liquid of the present invention
각 성분을 표 1에 나타내는 조성(고형분 질량비)으로 수중에서 혼합하여, 처리액을 얻었다.Each component was mixed in water with the composition (solid content mass ratio) shown in Table 1, and the process liquid was obtained.
또한, 표 1 중에 성분(A), (B), (C), (D), 및 (G)의 배합량은, 금속재료용 표면처리액 1 ㎏ 중에 배합되는 양(g)을 나타낸다. 또한, 알코올 성분(F)의 함유량은, 가스크로마토그래피를 사용하여 측정하고, 오르가노알콕시실란의 함유량으로부터 CF2를 계산하여, 이하의 몰농도비(CF1)/(CF2)로서 나타낸다.In addition, in Table 1, the compounding quantity of component (A), (B), (C), (D), and (G) shows the quantity (g) mix | blended in 1 kg of surface treatment liquids for metal materials. In addition, content of alcohol component (F) is measured using gas chromatography, Computes C F2 from content of organoalkoxysilane, and shows it as the following molar concentration ratio (C F1 ) / (C F2 ).
이하에, 표 1에서 사용된 화합물에 대해서 설명한다.Below, the compound used in Table 1 is demonstrated.
<규소 화합물(A)><Silicon Compound (A)>
A1: 스노우텍스C(닛산가가쿠 공업사 제조)A1: Snowtex C (manufactured by Nissan Chemical Industries, Ltd.)
A2: 스노우텍스O(닛산가가쿠 공업사 제조)A2: Snowtex O (manufactured by Nissan Chemical Industries, Ltd.)
<오르가노알콕시실란(B)><Organoalkoxysilane (B)>
B1: γ-글리시독시트리에톡시실란B1: γ-glycidoxycitriethoxysilane
B2: 아미노프로필트리에톡시실란B2: aminopropyltriethoxysilane
B3: 비닐트리에톡시실란B3: vinyltriethoxysilane
B4: 테트라에톡시실란B4: tetraethoxysilane
<금속 화합물(C)><Metal Compound (C)>
C1: 탄산지르코늄암모늄C1: zirconium ammonium carbonate
C2: 바나듐아세틸아세토네이트C2: vanadium acetylacetonate
C3: 질산마그네슘C3: magnesium nitrate
C4: 질산알루미늄C4: aluminum nitrate
C5: 산화아연C5: zinc oxide
<화합물(D)><Compound (D)>
D1: 인산D1: phosphoric acid
D2: 1-히드록시메탄-1,1-디포스폰산D2: 1-hydroxymethane-1,1-diphosphonic acid
D3: 티탄불화수소산D3: Titanium Hydrofluoric Acid
D4: 지르콘불화수소산D4: Zirconic Hydrofluoric Acid
<알코올농도(몰농도비)(CF1)/(CF2)><Alcohol concentration (molar concentration ratio) (C F1 ) / (C F2 )>
<화합물(G)> <Compound (G)>
G1: 아크릴 수지(쇼와 고분자(주) 제조, 폴리졸 AM-2386)G1: acrylic resin (Showa Polymer Co., Ltd. make, polysol AM-2386)
(4) 처리방법(4) Treatment method
상기의 금속재료용 표면처리액을 사용하여, 이하의 도장방법으로 각 시험판 상에 도장하고, 그 후, 수세하지 않고, 그대로 오븐에 넣고, 표 2에 나타내어지는 건조온도에서 건조시켜, 표 2에 나타내어지는 피막량의 피막을 형성시켰다.Using the above-mentioned surface treatment liquid for metal materials, it is coated on each test plate by the following coating method, and then it is put into an oven as it is without washing with water, dried at the drying temperature shown in Table 2, The film | membrane of the film amount shown is formed.
건조온도는, 오븐 중의 분위기온도와 오븐에 넣고 있는 시간으로 조절하였다. 또한, 건조온도는 시험판 표면의 도달온도를 나타낸다. 바 코트 도장 및 롤 코트 도장의 구체적인 방법은, 이하와 같다.The drying temperature was adjusted by the atmosphere temperature in oven, and the time put into oven. In addition, the drying temperature represents the temperature attained on the test plate surface. The specific method of bar coat coating and roll coat coating is as follows.
바 코트 도장: 처리액을 시험판에 적하하고, #3~5 바 코터로 도장하였다. 사용한 바 코터의 번수(番手)와 처리액의 농도에 의해, 소정의 피막량이 되도록 조정하였다.Bar coat coating: The process liquid was dripped at the test board, and it coated by the # 3-5 bar coater. The number of coatings used and the concentration of the treatment liquid were adjusted to a predetermined coating amount.
롤 코트 도장: 시험판을 처리액에 실온에서 1초 정도 침지시키고, 꺼낸 후, 롤로 여분의 액을 없애, 도포량을 조정하였다. 롤에 의한 물빼기 양과 처리액의 농도에 의해, 소정의 피막량이 되도록 조정하였다.Roll coat coating: The test plate was immersed in the processing liquid at room temperature for about 1 second, and after taking out, the excess liquid was removed with a roll and the coating amount was adjusted. The amount of water drained off the roll and the concentration of the treatment liquid were adjusted to a predetermined coating amount.
(5) 평가시험의 방법(5) Method of evaluation test
(5-1) 내식성 평가(5-1) Corrosion Resistance Evaluation
표면처리된 시험판을 70×150 ㎜로 잘라내, 이면(裏面)과 단부(端部)를 비닐테이프로 실링하여 이하의 시험을 행하였다. 평가는, 녹 발생 면적률을 육안으로 판정 평가하였다.The surface-treated test plate was cut out to 70 * 150 mm, the back surface and the edge part were sealed with vinyl tape, and the following test was done. Evaluation evaluated the rust generation area ratio visually.
염수 분무 시험(SST: JIS-Z-2371에 준한다):Salt spray test (SST: according to JIS-Z-2371):
SST 120시간 후의 백청(white rust) 발생 면적률을 육안으로, 하기 판정기준으로 평가하였다.The area ratio of white rust generation after 120 hours of SST was visually evaluated according to the following criteria.
사이클 시험(CCT(JASO): M609-91(자동차용 재료 부식 시험방법): CCT 30사이클 후의 백청 발생 면적률을 육안으로, 하기 판정 기준으로 평가하였다.Cycle test (CCT (JASO): M609-91 (Vehicle corrosion test method for automobiles): The area ratio of white rust generated after 30 cycles of CCT was visually evaluated based on the following criteria.
판정 기준:Criteria:
◎: 녹 발생 면적률 10% 미만◎: rust generation area rate less than 10%
○: 녹 발생 면적률 10% 이상 20% 미만○: Rust generation area rate 10% or more less than 20%
△: 녹 발생 면적률 20% 이상 40% 미만(Triangle | delta): 20% or more of rust generation area rate less than 40%
×: 녹 발생 면적률 40% 이상X: Rust generation area rate of 40% or more
××: 전면 녹 발생××: front rust generation
(5-2) 금속재료와의 밀착성 평가(5-2) Evaluation of adhesion with metal materials
A법: 직경 40 ㎜로 표면이 경면상(鏡面狀)으로 연마된 스테인리스의 환봉(丸棒)을, 하중 50 ㎏으로 표면처리된 시험판의 표면을 10 왕복시키고, 테이프 박리하여, 황산동 수용액(3% 수용액, 실온, 5초 침지)으로 치환 도금하고, 피막의 박리 정도를 평가하였다.Method A: A round bar of stainless steel polished to a mirror surface with a diameter of 40 mm was reciprocated 10 times on a surface of a test plate surface-treated with a load of 50 kg, and the tape was peeled off to obtain a copper sulfate aqueous solution (3 % Aqueous solution, room temperature, 5 seconds immersion), and the plating was carried out to evaluate the peeling degree of the film.
B법: 에릭슨 압출기로 표면처리된 시험판을 7 ㎜ 압출하고, 압출 가공부 전체를 셀로테이프(등록상표)로 박리하여, 황산동 수용액(3% 수용액, 실온, 5초 침지)으로 치환 도금하고, 피막의 박리 정도를 평가하였다.Method B: The test plate surface-treated with an Ericsson extruder was extruded 7 mm, and the whole extruded part was peeled off with a cello tape (registered trademark), substituted with a copper sulfate aqueous solution (3% aqueous solution, room temperature, 5 seconds immersion), and coated. The peeling degree of was evaluated.
판정 기준:Criteria:
◎: 박리 없음◎: no peeling
○: 아주 약간의 점상 박리 있음○: very slight peeling
△: 약간의 박리 있음△: slight peeling
×: 현저한 박리 있음X: There is remarkable peeling
(5-3) 금속 화합물의 용출성 평가(5-3) Evaluation of the elution of metal compounds
표면처리된 시험판을, 순수의 비등수(沸騰水)에 2시간 침지하고, 형광 X선 분석장치로 금속 화합물의 잔존량을 측정하였다. 시험 전에 측정한 금속 화합물의 부착량으로, 금속의 고정률을 산출하였다.The test plate surface-treated was immersed in the boiling water of pure water for 2 hours, and the residual amount of the metal compound was measured with the fluorescent X-ray analyzer. The fixed ratio of metal was computed by the adhesion amount of the metal compound measured before the test.
고정률(%)=잔존량(㎎/㎡)/시험전 부착량(㎎/㎡)×100Fixed rate (%) = residual amount (mg / m 2) / adhesion before test (mg / m 2) × 100
판정 기준:Criteria:
◎: 95% 이상 100%◎: more than 95% 100%
○: 90% 이상 95% 미만○: more than 90% less than 95%
△: 60% 이상 90% 미만△: 60% or more less than 90%
×: 20% 이상 60% 미만×: 20% or more and less than 60%
××: 20% 미만××: less than 20%
(5-4) 덧칠 도장성의 평가(5-4) Evaluation of paintability
표면처리된 시험판 상에 시판의 멜라민알키드 도료를 도장하고, 160℃에서 소부(baking)한 후의 도막두께가 20 ㎛가 되도록 하였다. 그 후, 끓는 물에 2시간 침지 후, NT 커터로 가로 세로 1 ㎜의 바둑판눈을 100개 잘라, 그 부분을 에릭슨 압출기로 6 ㎜ 압출하고, 테이프로 박리하여, 도막의 잔존상황을 이하의 평가로 실시하였다.A commercially available melamine alkyd paint was applied onto the surface-treated test plate, and the coating film thickness after baking at 160 ° C. was set to 20 μm. Subsequently, after immersion in boiling water for 2 hours, 100 boards of 1 mm in length and width were cut with an NT cutter, the part was extruded 6 mm with an Ericsson extruder, peeled off with a tape, and the remaining conditions of the coating film were evaluated as follows. Was carried out.
판정 기준:Criteria:
◎: 박리 없음~5% 미만◎: no peeling off-less than 5%
○: 박리 5% 이상 10% 미만○: 5% or more peeling less than 10%
△: 박리 10% 이상 20% 미만(Triangle | delta): Peeling 10% or more and less than 20%
×: 박리 20% 이상 60% 미만X: 20% or more peeling less than 60%
××: 박리 60% 이상××: 60% or more of peeling
내식성 시험: 시험판에 NT 커터로 X 형상으로 재료까지 도달하는 절개를 넣고, 그것을 상기의 CCT(사이클시험) 80사이클 후의 녹 발생 상황을 이하의 판정 기준으로 평가하였다.Corrosion Resistance Test: An incision reaching the material in an X shape with an NT cutter was placed in a test plate, and the rust occurrence after 80 cycles of the CCT (cycle test) was evaluated according to the following criteria.
판정 기준:Criteria:
◎: 절개로부터 1 ㎜ 미만◎: less than 1 mm from incision
○: 절개로부터 1 ㎜ 이상 2 ㎜ 미만○: 1 mm or more but less than 2 mm from the incision
△: 절개로부터 2 ㎜ 이상 5 ㎜ 미만△: 2 mm or more and less than 5 mm from the incision
×: 절개로부터 5 ㎜ 이상X: 5 mm or more from the incision
××: 도막 박리가 발생××: coating film peeling off
실시예 1~51, 및 비교예 52~67에 기재된 금속재료용 표면처리제를 사용하여 얻어진 표면처리 금속재료에 관해서, 상기의 (5-1)~(5-4)의 평가를 행한 결과를, 표 3에 나타낸다.The result of having evaluated said (5-1)-(5-4) about the surface-treated metal material obtained using Examples 1-51 and the surface treating agent for metal materials of Comparative Examples 52-67, It is shown in Table 3.
또한, 실용상의 관점으로부터, 상기 평가 항목에 있어서「×」및 「××」가 없는 것이 필요해진다.In addition, from a practical point of view, it is necessary that there is no "x" and "xx" in the said evaluation item.
표 3에 나타내는 바와 같이, 소정의 화합물을 포함하고, 또한, 알코올 몰농도비(CF1)/(CF2)가 조정된 본 발명의 처리제는, 내식성, 덧칠 도장성이 우수하고, 또한, 형성된 피막이 금속재료 표면과의 밀착성이 우수하여, 금속재료의 부식 억제제로서 작용하는 성분의 용출이 억제되어 있는 것이 확인되었다.As shown in Table 3, the treatment agent of the present invention containing a predetermined compound and in which the alcohol molar concentration ratio (C F1 ) / (C F2 ) is adjusted is excellent in corrosion resistance and paintability, and the formed film is It was confirmed that the adhesion to the surface of the metal material was excellent and the elution of the component acting as a corrosion inhibitor of the metal material was suppressed.
그 중에서도, 실시예 23~26의 비교로부터, 오르가노알콕시실란(B)으로서 에폭시기 또는 아미노기를 갖는 오르가노알콕시실란을 사용하면 각 특성이 보다 우수한 것을 알 수 있었다. 또한, 실시예 16과 17의 비교로부터, 2종의 오르가노알콕시실란을 병용하면, 각 특성이 보다 향상되는 것을 알 수 있었다.Especially, when the organoalkoxysilane which has an epoxy group or an amino group as organoalkoxysilane (B) was used from the comparison of Examples 23-26, it turned out that each characteristic is more excellent. In addition, from the comparison of Examples 16 and 17, it was found that when using two kinds of organoalkoxysilanes together, the respective properties were further improved.
한편, 비교예에 있어서는, 모든 특성을 종합적으로 만족하는 결과는 얻어지지 않았다.
On the other hand, in the comparative example, the result which satisfy | fills all the characteristics collectively was not obtained.
Claims (9)
오르가노알콕시실란(B)과,
Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, 및 Zn으로 이루어진 군으로부터 선택되는 1종 이상의 금속원소를 포함하는 금속 화합물(C)과,
인산 화합물 및 불소 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물(D)과
물(E)과,
상기 오르가노알콕시실란(B)의 가수분해로부터 생성되는 알코올(F)을 함유하는 금속재료용 표면처리제로서,
상기 알코올(F)의 처리제 중에서의 몰농도(mol/L)(CF1)와, 상기 오르가노알콕시실란(B)에 포함되는 모든 알콕시기가 가수분해된 경우에 생성되는 알코올의 처리제 중에서의 몰농도(mol/L)(CF2)의 비(CF1/CF2)가 0.05~0.9의 범위로 조정된, 금속재료용 표면처리제.Silicic acid compound (A)
Organoalkoxysilane (B),
Metal compound comprising at least one metal element selected from the group consisting of Zr, Ti, Co, Fe, V, Ce, Mo, Mn, Mg, Al, Ni, Ca, W, Nb, Cr, and Zn (C )and,
At least one compound (D) selected from the group consisting of a phosphoric acid compound and a fluorine compound
Water (E),
As a surface treatment agent for metal materials containing alcohol (F) produced | generated from the hydrolysis of the said organoalkoxysilane (B),
And the molar concentration (mol / L) (C F1 ) in water treating agent of the alcohol (F), wherein the organoalkoxysilane molar concentrations in the agent of the alcohol that is generated when all the alkoxy groups are hydrolyzed contained in (B) The surface treating agent for metal materials whose ratio (C F1 / C F2 ) of (mol / L) (C F2 ) is adjusted to the range of 0.05-0.9.
상기 알코올(F)과 상기 금속 화합물(C)의 질량비(C/F)가 0.01~50인, 금속재료용 표면처리제. The method of claim 1,
The mass ratio (C / F) of the said alcohol (F) and said metal compound (C) is 0.01-50, The surface treating agent for metal materials.
상기 알코올(F)과 상기 화합물(D)의 질량비(D/F)가 0.01~25의 범위인, 금속재료용 표면처리제.The method of claim 1,
The surface treatment agent for metal materials whose mass ratio (D / F) of the said alcohol (F) and said compound (D) is the range of 0.01-25.
상기 규산 화합물(A)과 상기 오르가노알콕시실란(B)의 질량비(A/B)가 0.01~3.0이고,
상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 금속 화합물(C)의 질량비(C/(A+B))가 0.01~2.0이며,
상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 화합물(D)의 질량비(D/(A+B))가 0.01~1.5인, 금속재료용 표면처리제.The method of claim 1,
The mass ratio (A / B) of the silicic acid compound (A) and the organoalkoxysilane (B) is 0.01 to 3.0,
The mass ratio (C / (A + B)) of the total mass (A + B) and the metal compound (C) of the silicic acid compound (A) and the organoalkoxysilane (B) is 0.01 to 2.0,
Surface mass for metal materials whose total mass (A + B) of the said silicic acid compound (A) and the organoalkoxysilane (B) and the mass ratio (D / (A + B)) of the said compound (D) are 0.01-1.5. Treatment agent.
상기 오르가노알콕시실란(B)이 아미노기, 에폭시기, 또는 아미노기 및 에폭시기를 갖는, 금속재료용 표면처리제.The method of claim 1,
The organoalkoxy silane (B) has an amino group, an epoxy group, or an amino group and an epoxy group, The surface treating agent for metal materials.
추가로, 수용성 고분자 및 수계 에멀젼 수지로 이루어진 군으로부터 선택되는 1종 이상의 화합물(G)을 함유하는, 금속재료용 표면처리제.The method of claim 1,
Furthermore, the surface treating agent for metal materials containing 1 or more types of compound (G) chosen from the group which consists of a water-soluble polymer and an aqueous emulsion resin.
상기 규산 화합물(A) 및 상기 오르가노알콕시실란(B)의 합계 질량(A+B)과 상기 화합물(G)의 질량비(G/(A+B))가 0.01~0.3인, 금속재료용 표면처리제.The method according to claim 6,
The surface for metal materials whose total mass (A + B) of the said silicic acid compound (A) and the organoalkoxysilane (B) and the mass ratio (G / (A + B)) of the said compound (G) are 0.01-0.3. Treatment agent.
The surface treatment metal material which has a film on the surface obtained by the surface treatment method of the metal material of Claim 8.
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WO2010070728A1 (en) | 2010-06-24 |
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