KR101213470B1 - 태양전지의 반사방지막, 태양전지, 태양전지의 제조방법 - Google Patents
태양전지의 반사방지막, 태양전지, 태양전지의 제조방법 Download PDFInfo
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- KR101213470B1 KR101213470B1 KR1020080125326A KR20080125326A KR101213470B1 KR 101213470 B1 KR101213470 B1 KR 101213470B1 KR 1020080125326 A KR1020080125326 A KR 1020080125326A KR 20080125326 A KR20080125326 A KR 20080125326A KR 101213470 B1 KR101213470 B1 KR 101213470B1
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- solar cell
- film
- dielectric constant
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- 238000004519 manufacturing process Methods 0.000 title abstract description 16
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 230000031700 light absorption Effects 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 18
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229910004541 SiN Inorganic materials 0.000 claims description 3
- 239000003989 dielectric material Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 119
- 239000010410 layer Substances 0.000 description 57
- 239000010409 thin film Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 17
- 238000000151 deposition Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000000231 atomic layer deposition Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 5
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000002803 fossil fuel Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000651 laser trapping Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- HEHINIICWNIGNO-UHFFFAOYSA-N oxosilicon;titanium Chemical compound [Ti].[Si]=O HEHINIICWNIGNO-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
Claims (19)
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- 광을 투과시키는 투과기판;상기 투과기판 아래에 형성되어 상기 투과기판과의 거리에 따라 유전율이 증가하도록 구성된 반사방지막;상기 반사방지막 아래에 형성되어 상기 반사방지막을 통과한 광을 전기 에너지로 변환하는 광흡수층; 및상기 광흡수층 아래에 형성되어 상기 반사방지막을 통과한 광 중에서 상기 광흡수층에서 변환되지 않고 통과된 광을 다시 광흡수층으로 전달하는 고반사막을 포함하고,상기 반사방지막은제1유전율의 물질로 구성된 저유전막;상기 제1유전율보다 높은 제2유전율의 물질로 구성된 고유전막; 및상기 저유전막과 상기 고유전막 사이에 위치하여 상기 제1유전율로부터 상기 제2유전율까지 점차적으로 유전율이 상승하도록 구성된 기울기층을 포함하고,상기 기울기층은 상기 제1유전율의 물질과 상기 제2유전율의 물질의 화합물로 구성되고,상기 고반사막은상기 제1유전율의 물질로 구성된 저유전막;상기 제2유전율의 물질로 구성된 고유전막; 및상기 저유전막과 상기 고유전막 사이에 위치하여 상기 제1유전율로부터 상기 제2유전율까지 점차적으로 유전율이 상승하도록 구성된 기울기층을 포함하고,상기 고반사막은 태양광이 입사하는 방향에 따라 상기 고유전막, 상기 기울기층 및 상기 저유전막의 순서로 증착된 것을 특징으로 하는 태양전지.
- 삭제
- 제13항에 있어서,상기 저유전막은 Al2O3, SiO2, SiN 중 적어도 하나 이상을 포함하고,상기 고유전막은 TiO2, ZrO2, HfO2, Ta2O5, ZnO 중 적어도 하나 이상을 포함하는 것을 특징으로 하는 태양전지.
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009169000A JP2010067956A (ja) | 2008-09-08 | 2009-07-17 | 太陽電池用反射防止膜、太陽電池及び該太陽電池の製造方法 |
US12/506,187 US20100180941A1 (en) | 2008-09-08 | 2009-07-20 | Antireflection film of solar cell, solar cell, and method of manufacturing solar cell |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR20080088479 | 2008-09-08 | ||
KR1020080088479 | 2008-09-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100029676A KR20100029676A (ko) | 2010-03-17 |
KR101213470B1 true KR101213470B1 (ko) | 2012-12-20 |
Family
ID=42179865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020080125326A Expired - Fee Related KR101213470B1 (ko) | 2008-09-08 | 2008-12-10 | 태양전지의 반사방지막, 태양전지, 태양전지의 제조방법 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100180941A1 (ko) |
JP (1) | JP2010067956A (ko) |
KR (1) | KR101213470B1 (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110146768A1 (en) * | 2009-12-21 | 2011-06-23 | Ppg Industries Ohio, Inc. | Silicon thin film solar cell having improved underlayer coating |
DE102010024521A1 (de) | 2010-06-21 | 2011-12-22 | Innovent E.V. | Verfahren zur Erhöhung der Transluzenz eines Substrats |
KR101138554B1 (ko) * | 2010-07-05 | 2012-05-08 | 현대중공업 주식회사 | 태양전지 및 그 제조방법 |
WO2012061152A2 (en) * | 2010-10-25 | 2012-05-10 | California Institute Of Technology | Atomically precise surface engineering for producing imagers |
WO2012057889A1 (en) * | 2010-10-29 | 2012-05-03 | Applied Materials, Inc. | Atomic layer deposition film with tunable refractive index and absorption coefficient and methods of making |
CN102610663A (zh) * | 2011-01-25 | 2012-07-25 | 东方电气集团(宜兴)迈吉太阳能科技有限公司 | 单晶硅太阳能电池用叠层减反射膜 |
CN102723384B (zh) * | 2011-03-29 | 2015-05-13 | 比亚迪股份有限公司 | 一种CdTe太阳能电池及其制作方法 |
CN102810573B (zh) * | 2011-05-30 | 2015-05-27 | 比亚迪股份有限公司 | 一种CdTe太阳能电池及其制作方法 |
US20120024362A1 (en) * | 2011-05-31 | 2012-02-02 | Primestar Solar, Inc. | Refractive index matching of thin film layers for photovoltaic devices and methods of their manufacture |
CN102222704B (zh) * | 2011-06-27 | 2014-04-09 | 光为绿色新能源股份有限公司 | 一种晶体硅太阳能电池三层减反射膜及其制备方法 |
US11367800B1 (en) | 2012-04-20 | 2022-06-21 | Magnolia Solar, Inc. | Optically-thin III-V solar cells and methods for constructing the same |
US9614108B1 (en) | 2012-04-20 | 2017-04-04 | Magnolia Solar, Inc. | Optically-thin chalcogenide solar cells |
CN102931281A (zh) * | 2012-11-14 | 2013-02-13 | 东方电气集团(宜兴)迈吉太阳能科技有限公司 | 一种晶体硅太阳能电池三层减反射膜的制备方法 |
KR102208083B1 (ko) * | 2013-10-04 | 2021-01-28 | 한국전자통신연구원 | 태양전지 및 그를 포함하는 태양전지 모듈 |
CN103594531A (zh) * | 2013-11-28 | 2014-02-19 | 湖南大学 | 一种亲水型非规整多层减反射膜及其制备方法 |
JP6239473B2 (ja) | 2014-09-19 | 2017-11-29 | 株式会社東芝 | 光電変換素子、太陽電池および多接合型太陽電池 |
KR102093168B1 (ko) * | 2019-02-22 | 2020-03-25 | 이상환 | 이중 광경로를 가진 광 검출기 |
KR102729859B1 (ko) * | 2019-12-09 | 2024-11-13 | 현대자동차주식회사 | 적외선용 무반사 렌즈 |
CN112713216B (zh) * | 2020-12-30 | 2022-07-08 | 江苏润阳世纪光伏科技有限公司 | 一种太阳能电池的层叠减反射膜的制备方法 |
CN113921620B (zh) * | 2021-11-17 | 2024-10-29 | 南开大学 | 一种折射率渐变特性的减反射膜的制备方法 |
CN114975642B (zh) * | 2022-01-28 | 2024-02-27 | 浙江晶科能源有限公司 | 光伏电池以及光伏组件 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070116966A1 (en) * | 2005-11-22 | 2007-05-24 | Guardian Industries Corp. | Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60208813A (ja) * | 1984-04-02 | 1985-10-21 | Mitsubishi Electric Corp | 光電変換装置とその製造方法 |
JPS6371801A (ja) * | 1986-09-16 | 1988-04-01 | Hitachi Ltd | 反射防止膜 |
JP3006266B2 (ja) * | 1992-03-10 | 2000-02-07 | トヨタ自動車株式会社 | 太陽電池素子 |
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2008
- 2008-12-10 KR KR1020080125326A patent/KR101213470B1/ko not_active Expired - Fee Related
-
2009
- 2009-07-17 JP JP2009169000A patent/JP2010067956A/ja active Pending
- 2009-07-20 US US12/506,187 patent/US20100180941A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070116966A1 (en) * | 2005-11-22 | 2007-05-24 | Guardian Industries Corp. | Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide |
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Publication number | Publication date |
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US20100180941A1 (en) | 2010-07-22 |
JP2010067956A (ja) | 2010-03-25 |
KR20100029676A (ko) | 2010-03-17 |
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