KR101197023B9 - 플라즈마 처리 장치 및 플라즈마 처리 방법 - Google Patents

플라즈마 처리 장치 및 플라즈마 처리 방법

Info

Publication number: KR101197023B9
Authority: KR; South Korea
Prior art keywords: plasma treatment; treatment device; treatment method; plasma; treatment
Prior art date: 2009-10-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

KR1020090101155A

Other languages

English (en)

Other versions

KR101197023B1 (ko

KR20110044468A (ko

Inventor

신철희

황철주

Original Assignee

주성엔지니어링(주)

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2009-10-23

Filing date

2009-10-23

Publication date

2024-12-20

2009-10-23 Application filed by 주성엔지니어링(주) filed Critical 주성엔지니어링(주)

2009-10-23 Priority to KR1020090101155A priority Critical patent/KR101197023B1/ko

2011-04-29 Publication of KR20110044468A publication Critical patent/KR20110044468A/ko

2012-11-06 Application granted granted Critical

2012-11-06 Publication of KR101197023B1 publication Critical patent/KR101197023B1/ko

2024-12-20 Publication of KR101197023B9 publication Critical patent/KR101197023B9/ko

Status Active legal-status Critical Current

2029-10-23 Anticipated expiration legal-status Critical

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Plasma Technology (AREA)
Drying Of Semiconductors (AREA)

KR1020090101155A 2009-10-23 2009-10-23 플라즈마 처리 장치 및 플라즈마 처리 방법 Active KR101197023B1 (ko)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
KR1020090101155A KR101197023B1 (ko)	2009-10-23	2009-10-23	플라즈마 처리 장치 및 플라즈마 처리 방법

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
KR1020090101155A KR101197023B1 (ko)	2009-10-23	2009-10-23	플라즈마 처리 장치 및 플라즈마 처리 방법

Publications (3)

Publication Number	Publication Date
KR20110044468A KR20110044468A (ko)	2011-04-29
KR101197023B1 KR101197023B1 (ko)	2012-11-06
KR101197023B9 true KR101197023B9 (ko)	2024-12-20

Family

ID=44049194

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1020090101155A Active KR101197023B1 (ko)	2009-10-23	2009-10-23	플라즈마 처리 장치 및 플라즈마 처리 방법

Country Status (1)

Country	Link
KR (1)	KR101197023B1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR102124940B1 (ko) *	2013-05-24	2020-06-22	인베니아 주식회사	유도 결합 플라즈마 처리 장치 및 그 제어방법
US9721758B2 (en) *	2015-07-13	2017-08-01	Mks Instruments, Inc.	Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
KR101993712B1 (ko) *	2017-08-09	2019-06-28	피에스케이홀딩스 (주)	기판 처리 장치, 기판 처리 방법 및 플라즈마 발생 유닛
JP7061264B2 (ja) *	2018-03-20	2022-04-28	日新電機株式会社	プラズマ制御システム及びプラズマ制御システム用プログラム
JP7515423B2 (ja) *	2021-01-22	2024-07-12	東京エレクトロン株式会社	プラズマ処理装置の異常検知方法及びプラズマ処理装置

2009
- 2009-10-23 KR KR1020090101155A patent/KR101197023B1/ko active Active

Also Published As

Publication number	Publication date
KR101197023B1 (ko)	2012-11-06
KR20110044468A (ko)	2011-04-29

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BR112014011529A2 (pt)	2017-05-16	dispositivo de tratamento de água e método de tratamento de água
BRPI1006494A2 (pt)	2016-03-15	dispositivo e metodo de localização de descargas parciais
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BRPI1007909A2 (pt)	2016-02-16	método e dispositivo médico
EP2408275A4 (en)	2015-10-28	PLASMA TREATMENT APPARATUS
EP2478828A4 (en)	2012-12-05	ENDOSCOPE TREATMENT DEVICE AND ENDOSCOPE TREATMENT METHOD
BRPI1008459A2 (pt)	2016-08-09	aparelho de programação e método de programação
EP2556884A4 (en)	2014-08-13	LIQUID TREATMENT DEVICE AND TREATMENT METHOD
KR101697970B9 (ko)	2024-12-20	플라즈마 처리 장치 및 이를 이용한 챔버 세정 방법
EP2445154A4 (en)	2012-12-26	Modulation method and device

Legal Events

Date	Code	Title	Description
2009-10-23	A201	Request for examination
2009-10-23	PA0109	Patent application	Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20091023
2009-10-23	PA0201	Request for examination
2011-04-29	PG1501	Laying open of application
2011-05-04	E902	Notification of reason for refusal
2011-05-04	PE0902	Notice of grounds for rejection	Comment text: Notification of reason for refusal Patent event date: 20110504 Patent event code: PE09021S01D
2012-01-10	E90F	Notification of reason for final refusal
2012-01-10	PE0902	Notice of grounds for rejection	Comment text: Final Notice of Reason for Refusal Patent event date: 20120110 Patent event code: PE09021S02D
2012-08-02	E701	Decision to grant or registration of patent right
2012-08-02	PE0701	Decision of registration	Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20120802
2012-10-29	GRNT	Written decision to grant
2012-10-29	PR0701	Registration of establishment	Comment text: Registration of Establishment Patent event date: 20121029 Patent event code: PR07011E01D
2012-10-29	PR1002	Payment of registration fee	Payment date: 20121029 End annual number: 3 Start annual number: 1
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