KR101140076B1 - 다결정 실리콘 제조 방법 - Google Patents
다결정 실리콘 제조 방법 Download PDFInfo
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- KR101140076B1 KR101140076B1 KR1020097026321A KR20097026321A KR101140076B1 KR 101140076 B1 KR101140076 B1 KR 101140076B1 KR 1020097026321 A KR1020097026321 A KR 1020097026321A KR 20097026321 A KR20097026321 A KR 20097026321A KR 101140076 B1 KR101140076 B1 KR 101140076B1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 50
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 71
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 64
- 239000010703 silicon Substances 0.000 claims abstract description 64
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims abstract description 63
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000000034 method Methods 0.000 claims abstract description 55
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 33
- 229940104869 fluorosilicate Drugs 0.000 claims abstract description 30
- 239000002253 acid Substances 0.000 claims abstract description 28
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 28
- 239000000284 extract Substances 0.000 claims abstract description 25
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 25
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000011777 magnesium Substances 0.000 claims abstract description 23
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 22
- 230000008569 process Effects 0.000 claims abstract description 22
- 238000000926 separation method Methods 0.000 claims abstract description 16
- 239000012467 final product Substances 0.000 claims abstract description 11
- 238000001035 drying Methods 0.000 claims abstract description 10
- 238000005187 foaming Methods 0.000 claims abstract description 6
- 239000000843 powder Substances 0.000 claims description 32
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 19
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 17
- 238000000605 extraction Methods 0.000 claims description 15
- 230000009467 reduction Effects 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 10
- 239000000047 product Substances 0.000 claims description 10
- 239000011541 reaction mixture Substances 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 9
- 230000003472 neutralizing effect Effects 0.000 claims description 7
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 claims description 7
- 239000006260 foam Substances 0.000 claims description 4
- 150000007530 organic bases Chemical class 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 3
- 238000009691 centrifugal disintegration Methods 0.000 claims description 2
- 238000009434 installation Methods 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 230000003993 interaction Effects 0.000 abstract description 3
- 229920001296 polysiloxane Polymers 0.000 abstract description 3
- 238000005272 metallurgy Methods 0.000 abstract description 2
- 238000005406 washing Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 19
- 238000006722 reduction reaction Methods 0.000 description 16
- 230000008021 deposition Effects 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 125000005270 trialkylamine group Chemical group 0.000 description 8
- 239000011253 protective coating Substances 0.000 description 7
- 239000011863 silicon-based powder Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 6
- 238000005265 energy consumption Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010306 acid treatment Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- VIDOPANCAUPXNH-UHFFFAOYSA-N 1,2,3-triethylbenzene Chemical compound CCC1=CC=CC(CC)=C1CC VIDOPANCAUPXNH-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- FLWCIIGMVIPYOY-UHFFFAOYSA-N fluoro(trihydroxy)silane Chemical compound O[Si](O)(O)F FLWCIIGMVIPYOY-UHFFFAOYSA-N 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- IEPMHPLKKUKRSX-UHFFFAOYSA-J silicon(4+);tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Si+4] IEPMHPLKKUKRSX-UHFFFAOYSA-J 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- 241000795424 Epia Species 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000012824 chemical production Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- CUPFNGOKRMWUOO-UHFFFAOYSA-N hydron;difluoride Chemical compound F.F CUPFNGOKRMWUOO-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003295 industrial effluent Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000011044 quartzite Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims (35)
- 다음 단계를 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법:- 플루오로규산과 유기 염기를 상호 반응시켜 플루오로규산 용액으로부터 유기-가용성(organo-soluble) 플루오규산염을 생성하는 단계;- 수득된 플루오로규산의 염을 55-60℃의 온도에서 공기 또는 불활성 기체로 건조시키는 단계;- 플루오규산염을 분해시켜 기체상태의 4불화실리콘과 불화수소를 생성하는 단계;- 생성된 기체상태의 4불화실리콘과 불화수소를 발연황산 존재 하에서 미분리상태로 이산화실리콘을 통과하여 흘려보내는 단계;- 1000℃ 이하의 온도에서 마그네슘 증기에 의해 실리콘이 상기 생성된 기체상태의 4불화실리콘으로부터 환원되는 단계;- 실리콘과 불화마그네슘 분말의 혼합물인 환원 생성물을 분리시키면서 동시에 구형 분말 형태의 다결정 실리콘을 산출하는 단계;- 생성된 다결정 실리콘을 불화마그네슘으로부터 분리하는 단계.
- 제 1 항에 있어서, 반응 혼합물 분리 및 그와 동시에 구형 분말 형태의 실리콘의 산출이 원심 붕괴법(centrifugal disintegration method)에 의해 수행됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 제 2 항에 있어서, 상기 원심 붕괴법에서, 실리콘과 불화마그네슘 분말의 반응 혼합물이 용해로의 내부에 위치하며 회전될 수 있는 도가니로 운반되고 여기서 상기 혼합물은 도가니와 비용융성 전극 사이에 형성된 플라즈마 아크에 노출됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 제 3 항에 있어서, 원심 붕괴는 불활성 기체 대기에서 수행됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 제 1 항에 있어서, 실리콘 환원은 와류 반응기(vortex reactor) 내에서 수행됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 제 1 항에 있어서, 상기 마그네슘 증기는 진공 증발기(vacuum evaporator)로부터 와류 반응기로 운반됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 제 1 항에 있어서, 상기 다결정 실리콘은 0.3 내지 0.6 mm 범위의 입자 크기의 구형 분말 형태로 생성됨을 특징으로 하는, 플루오로규산 용액으로부터 다결정 실리콘을 제조하는 방법.
- 수송관 시스템에 의하여 연결된 다음 유닛들을 포함하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비:- 플루오로규산 용액의 추출을 제공하는 유닛;- 생성된 플루오로규산 추출물의 건조를 제공하는 유닛;- 추출물을 분해시켜 기체상태의 4불화실리콘 및 불화수소의 생성을 제공하는 유닛;- 불화수소를 중화시켜 4불화실리콘의 생성을 제공하는 유닛;- 마그네슘 용융물로부터 마그네슘 증기의 생성을 제공하는 유닛;- 그 내부에서 마그네슘 존재 하에서 기체상태의 4불화실리콘으로부터 실리콘이 환원되는 유닛;- 반응 혼합물의 분리 및 동시에 구형 분말 형태의 실리콘 산출을 제공하는 유닛;- 최종 생성물의 분리를 제공하는 유닛.
- 제 8 항에 있어서, 상기 플루오로규산 용액의 추출을 제공하는 유닛이 하나 이상의 원심 추출기를 포함함을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 상기 추출물의 건조를 제공하는 유닛이 열-교환 장치가 장착된 하나 이상의 발포 건조기를 포함함을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 상기 추출물을 분해시켜 기체상태의 4불화실리콘 및 불화수소의 생성을 제공하는 유닛이 하나 이상의 원심 추출기를 포함함을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 상기 불화수소를 중화시켜 4불화실리콘의 생성을 제공하는 유닛이 이산화실리콘으로 채워진 하나 이상의 발포 반응기를 포함함을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 상기 마그네슘 용융물로부터 마그네슘 증기의 생성을 제공하는 유닛으로서 하나 이상의 진공 증발기가 사용됨을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 실리콘 환원을 위한 유닛으로서 하나 이상의 와류 반응기가 사용됨을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 8 항에 있어서, 구형 분말 형태의 실리콘 생성 및 반응 혼합물의 분리를 위한 유닛이 용해로 내에 위치한 도가니(회전될 수 있음)와 전극을 포함하며 상기 도가니와 전극 사이에서 플라즈마 아크가 유지됨을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
- 제 15 항에 있어서, 상기 전극은 비용융성임을 특징으로 하는, 플루오로규산 용액으로부터 구형 분말 형태의 다결정 실리콘을 제조하기 위한 설비.
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US8175118B2 (en) | 2008-05-15 | 2012-05-08 | Marvell World Trade Ltd. | Efficient physical layer preamble format |
US8165185B2 (en) | 2008-09-29 | 2012-04-24 | Marvell World Trade Ltd. | Physical layer data unit format |
KR101168942B1 (ko) * | 2010-04-27 | 2012-08-02 | 주식회사 케이씨씨 | 결정성 규사를 사용한 사불화규소의 제조방법 |
CN102502648A (zh) * | 2011-11-06 | 2012-06-20 | 云南省化工研究院 | 一种制备太阳能级多晶硅的方法 |
WO2015008889A1 (ko) * | 2013-07-16 | 2015-01-22 | 웅진에너지 주식회사 | 폴리실리콘 제조 장치 및 방법 |
CN103922345B (zh) * | 2014-04-16 | 2015-12-02 | 应烈荣 | 一种利用工业含氟尾气酸提取超纯氟硅酸及二氧化硅的方法 |
CN111453736B (zh) * | 2020-04-27 | 2024-08-06 | 江苏鑫华半导体科技股份有限公司 | 三氯氢硅净化系统和方法 |
CN114394597A (zh) * | 2022-01-24 | 2022-04-26 | 贵州理工学院 | 一种利用四氟化硅为原料制备硅薄膜的方法 |
CN119059526B (zh) * | 2024-11-01 | 2025-03-21 | 甬江实验室 | 非晶化六氟硅酸锂及其制备方法、石墨负极片及其制备方法和应用 |
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US3273963A (en) * | 1963-01-17 | 1966-09-20 | Columbian Carbon | Process for generating silicon tetrafluoride |
US4102765A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving alkali or alkaline-earth metals |
JPS604125B2 (ja) * | 1981-02-16 | 1985-02-01 | セントラル硝子株式会社 | 高純度四弗化珪素の製造法 |
DE3246121A1 (de) * | 1982-12-13 | 1984-06-14 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von borfreiem siliziumdioxid |
JPS60500334A (ja) * | 1982-12-27 | 1985-03-14 | エス・ア−ル・アイ・インタ−ナショナル | 弗化珪素酸から珪素を製造する装置 |
US4565711A (en) * | 1984-06-29 | 1986-01-21 | Wedtech Corp. | Method of and apparatus for the coating of quartz crucibles with protective layers |
RU2046095C1 (ru) * | 1991-06-25 | 1995-10-20 | Всероссийский научно-исследовательский институт неорганических материалов им.акад. А.А.Бочвара | Способ получения тетрафторида кремния |
JP3134370B2 (ja) * | 1991-07-29 | 2001-02-13 | 三菱マテリアル株式会社 | 粒状シリコン多結晶の製造方法 |
JP4074931B2 (ja) * | 2002-03-27 | 2008-04-16 | 富士機械製造株式会社 | シリコン球状体の製造方法及びその製造装置 |
JP4588396B2 (ja) * | 2003-09-25 | 2010-12-01 | 昭和電工株式会社 | テトラフルオロシランの製造方法 |
CN1830776A (zh) * | 2006-03-30 | 2006-09-13 | 中南大学 | 一种制备太阳能电池级硅材料的方法 |
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