KR101130920B1 - Coating apparatus and method of fabricating liquid crystal display device using the same - Google Patents

Abstract

The coating liquid coating apparatus of the present invention and a manufacturing method of the liquid crystal display device using the same are to ensure the uniformity of the coating by inserting an elliptical bar (bar) in the slit nozzle to uniform the flow of fluid, through the slit nozzle A coating liquid coating apparatus for applying a coating liquid to the entire surface of a workpiece, wherein the slit nozzle comprises: a nozzle body separated into a first nozzle body and a second nozzle body; An inlet formed at an upper portion of the second nozzle body to introduce a coating liquid; An accommodation space formed on an inner surface of the second nozzle body between the first nozzle body and the second nozzle body to store the introduced coating liquid; A discharge port formed in a lower portion between the first nozzle body and the second nozzle body to apply the stored coating liquid to the surface of the workpiece; A shim formed at an upper portion between the first nozzle body and the second nozzle body to maintain a gap between the first nozzle body and the second nozzle body; And it is inserted into the lower end of the receiving space, characterized in that it comprises a bar to be formed in the longitudinal direction of the nozzle body to uniform the flow of the coating liquid.

Slit Nozzle, Applicator, Fluid Flow, Bar

Description

COATING APPARATUS AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME}

1 is a cross-sectional view showing the structure of a typical spin coater.

2A and 2B are perspective views illustrating a basic concept of a slit coater and a photosensitive material applied by the slit coater.

Figure 3 is a front view schematically showing a slit coater according to an embodiment of the present invention.

4 is a cross-sectional view schematically showing a slit nozzle according to an embodiment of the present invention.

5 is a front view schematically showing a slit nozzle according to an embodiment of the present invention.

6 is a cross-sectional view schematically showing the structure and fluid flow of the bar inserted in the slit nozzle in the slit nozzle shown in FIG.

7a to 7d are exemplary views schematically showing bars having various forms according to the present invention.

DESCRIPTION OF REFERENCE NUMERALS

110: glass substrate 120,220: table

140,240: slit nozzle 200: slit nozzle

241 nozzle body 242 discharge port

246: inlet 300: slit coater

400,400a ~ 400d: bar

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating liquid coating device, and more particularly, to a coating liquid such as a resist liquid, a developing liquid, a color filter, or the like on a surface of an object such as a flat panel display (FPD) substrate or a semiconductor wafer. The present invention relates to a coating liquid coating apparatus for coating in a shape and a manufacturing method of a liquid crystal display device using the same.

The manufacturing process of a flat panel display device or a semiconductor device includes a thin film deposition process, a photolithography process for exposing a selected region of the thin film, and an etching process for removing the thin film of the selected region, a plurality of times. Or a coating step of forming a photoresist film of a photosensitive material on the wafer and an exposure and developing step of patterning it using a mask having a predetermined pattern formed thereon.

In general, a spray coating method, a roll coating method, or a spin coating method is used for the coating process of forming a photoresist film on a substrate or a wafer.

In the case of the spray coating method and the roll coating method, the spin coating method is used for forming a high-precision pattern because the coating film is not suitable for high precision in the uniformity and film thickness adjustment of the coating film.

Hereinafter, a spin coater used in the spin coating method will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view showing the structure of a general spin coater.

As shown in the figure, the spin coater not only surrounds the spin chuck 5 and the spin chuck 5 connected to the rotation shaft 6 from the outside, but also opens and closes a cover 7. ) And a nozzle 4 positioned above the spin chuck 5 and moving into the cover 7 when the cover 70 is opened.

The spin chuck 5 is mounted with the workpiece 10 to which the photoresist is applied, and a drain valve (not shown) is disposed below the cover 7 to discharge the photoresist falling downward. .

The spin coater configured as described above sprays a photoresist on the surface of the workpiece 10 on which the nozzle 4 descends and is seated on the spin chuck 5 in order to form a coating film on the predetermined workpiece 10. Done.

When the photoresist is sprayed onto the workpiece 10, the cover 7 is sealed and the motor M rotates, and the rotating shaft 6 connected thereto rotates to mount the workpiece 10 on the workpiece 10. The spin chuck 5 is rotated at a predetermined rotational speed.

When the spin chuck 5 rotates, the photoresist sprayed on the upper surface of the object 10 is spread out by centrifugal force so that the photoresist is applied to the entire surface of the object 10.

When the photoresist is coated on the entire surface of the workpiece 10 as described above, the photoresist is solidified and then exposed and developed using a photo mask to form a predetermined pattern on the surface of the workpiece 10.

However, the spin coating method using the spin coater is suitable for coating a photosensitive material on a small workpiece such as a wafer, and has a large and heavy substrate for a flat panel display device (for example, a liquid crystal display). It is not suitable for coating photosensitive material on panel glass substrate).

This is because the larger the substrate to be coated with the photosensitive material and the heavier the weight, the more difficult it is to rotate the substrate at high speed, and the breakage and energy consumption of the substrate during the high speed rotation are very large.

In addition, the spin coating method has a problem that waste of photoresist is severe because the amount of waste is excessively large compared to the amount of photoresist used for coating. That is, a considerable amount of photoresist applied to the substrate surface is scattered out of the spin chuck at high speed. Substantially, the amount of photoresist wasted is much higher than that of photoresists used for photosensitization, and the scattered photoresist fragments are likely to act as foreign matters in subsequent thin film formation processes, and may also be environmental pollution sources.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and provides a coating liquid coating apparatus capable of uniformly applying a coating liquid, such as a resist liquid, a developing liquid, a color filter, to a large area substrate, and a method of manufacturing a liquid crystal display device using the same. The purpose is to.

In addition, another object of the present invention is to provide a coating liquid coating apparatus capable of maintaining a uniform coating of the coating liquid by making the fluid flow inside the slit nozzle uniform, and a manufacturing method of the liquid crystal display device using the same.

Other objects and features of the present invention will be described in the configuration and claims of the invention described below.

In order to achieve the above object, the present invention is a coating liquid coating apparatus for applying a coating liquid to the entire surface of the workpiece through a slit nozzle, the slit nozzle is a nozzle body separated into a first nozzle body and a second nozzle body ; An inlet formed at an upper portion of the second nozzle body to introduce a coating liquid; An accommodation space formed on an inner surface of the second nozzle body between the first nozzle body and the second nozzle body to store the introduced coating liquid; A discharge port formed in a lower portion between the first nozzle body and the second nozzle body to apply the stored coating liquid to the surface of the workpiece; A shim formed at an upper portion between the first nozzle body and the second nozzle body to maintain a gap between the first nozzle body and the second nozzle body; And it is inserted into the lower end of the receiving space, characterized in that it comprises a bar (bar) is formed in the longitudinal direction of the nozzle body to uniform the flow of the coating liquid.

In addition, the manufacturing method of the liquid crystal display device of the present invention comprises the steps of providing a first substrate and a second substrate; A nozzle body which is divided into a first nozzle body and a second nozzle body, an inlet formed at an upper portion of the second nozzle body to introduce a coating liquid, and an inner surface of the second nozzle body between the first nozzle body and the second nozzle body; A storage space formed in the storage space for storing the introduced coating liquid, a discharge hole formed in a lower portion between the first nozzle body and the second nozzle body to apply the stored coating liquid to the surface of the workpiece, and the first nozzle body; It is formed in the upper portion between the second nozzle body and is inserted into the lower end of the wedge and the receiving space to maintain the gap between the first nozzle body and the second nozzle body, formed in the longitudinal direction of the nozzle body flow of the coating liquid Providing a slit nozzle configured to make the uniform; Applying a coating liquid to a surface of the first substrate or the second substrate using the slit nozzle; Forming a thin film transistor pattern and a color filter pattern on a first substrate or a second substrate to which the coating liquid is applied using a photolithography process; And bonding the first substrate and the second substrate to each other.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the coating liquid coating apparatus and a method of manufacturing a liquid crystal display device using the same according to the present invention.

In general, in the semiconductor manufacturing field and flat panel display device manufacturing field, a photolithography process is required as described above in order to pattern a thin film performing a specific function, for example, an oxide thin film, a metal thin film, or a semiconductor thin film, into a desired shape. Photolithography processes use photosensitive materials such as photoresists that chemically react with light.

At this time, the photosensitive material should be formed in a very uniform thickness on the substrate on which the thin film is formed so that no defect occurs during the process. For example, when the photosensitive material is formed thicker than the specified thickness, the desired portion of the thin film is not etched, and when the photosensitive material is formed thinner than the specified thickness, the thin film is etched more than the desired etching amount. .

In particular, the application of the uniform photosensitive material is one of the very important factors in the current trend of increasing the size of the substrate as the substrate for a flat panel display device, especially the liquid crystal display panel, becomes larger.

In order to solve the above problem, a nozzle method of spraying a predetermined photosensitive material using a slit nozzle without using a spinner like a conventional spin chuck has been proposed. Since the nozzle-type coating liquid coating device does not use a spinner, the photosensitive material is injected through a spinless coater or a slit and thus is called a slit coater. The slit coater is suitable for applying a photosensitive material to a large liquid crystal display panel by supplying the photosensitive material through a slit-shaped nozzle longer than its width to apply a photosensitive material to the surface of the substrate in the form of a surface.

2A and 2B are exemplary views illustrating a basic concept of a slit coater and a photosensitive material applied by the slit coater.

As shown in the figure, the slit coater of the present invention includes a nozzle 140 having a narrow slit shape and a long length, and supplies the photoresist 145 through the slit nozzle 140 to supply the substrate 110. The photoresist 145 is applied to the surface in the form of a plane.

That is, the slit coater is a device for applying a predetermined amount of photoresist 145 to the substrate 110 through the bar-shaped long slit nozzle 140, and is fixed from one side of the substrate 110 to the other side. By applying a predetermined amount of photoresist 145 through the fine slit nozzle 140 while moving at a speed, a uniform photoresist film may be formed on the surface of the substrate 110.

In addition, the slit coater can apply the photoresist 145 only to the surface of the desired substrate 110, and thus has an advantage that the coating liquid can be used more wastelessly than the above-described spin coater. It is possible to apply, so it is suitable for large substrates and rectangular substrates.

For reference, reference numeral 120 denotes a table on which the substrate 110 is seated, and an arrow indicates that the photoresist 145 is sprayed and applied in the direction of the arrow in the direction in which the slit nozzle 140 moves.

However, this structure alone does not guarantee uniformity of the coating liquid, such as the photoresist 145 flowing from top to bottom by itself.

3 is a front view schematically showing a slit coater according to an embodiment of the present invention.

At this time, the slit coater according to the present embodiment uses a rectangular glass substrate for manufacturing the screen panel of the liquid crystal display device as the substrate to be processed, and in the photolithography process of selectively etching the electrode layer or the like formed on the surface of the substrate, the surface of the substrate It is used for the coating liquid coating process of apply | coating a coating liquid to this. In addition, the slit coater may be modified as a device for applying a processing liquid (coating liquid) to not only glass substrates for liquid crystal display devices but also various substrates for flat panel displays in general.

As shown in the drawing, the slit coater 300 of the present embodiment is a table 220 on which a substrate (not shown) is seated, and a slit nozzle part for applying a photosensitive material such as a photoresist to the substrate. And a driving unit 260 installed at both ends of the slit nozzle unit 200 to move the slit nozzle unit 200 at a constant speed. In addition, the slit coater 300 pumps the photosensitive material to be sprayed by applying a constant pressure while supplying a photosensitive material to the slit nozzle unit 200 from the supply unit (not shown) for supplying the photosensitive material coated on the substrate. (pumping) means (not shown).

At this time, although not shown in the drawing, the supply unit is composed of a storage tank for storing the photosensitive material and a supply pipe and a flow rate adjusting device for supplying the photosensitive material stored therein to the slit nozzle unit 200.

The storage tank may store a photoresist such as a photoresist supplied to the slit nozzle unit 200, a coating solution such as a developing solution, a color filter, and the like, and may be attached to the driving unit 260.

The pumping means applies a predetermined pressure to the slit nozzle unit 200 and causes the photosensitive material stored in the slit nozzle unit 200 to be injected by the pressure. In this case, the pumping means may be installed in the storage tank, and pressurizes the inside of the storage tank to serve to supply the coating liquid stored in the storage tank to the slit nozzle unit 200.

An object to be processed, such as a glass substrate, is mounted on the table 220, and a plurality of pins (not shown) are provided on the table surface to lift the substrate from the table 220.

At this time, the table 220 is made of a rectangular stone (stone), the upper surface and the side is processed flat.

The upper surface of the table 220 is a horizontal plane, the substrate is seated, a plurality of vacuum suction holes (not shown) are formed on the upper surface, so that the suction of the substrate during the processing of the substrate in the slit coater 300 To keep the substrate in a predetermined horizontal position.

At this time, although not shown in the drawing, a preliminary ejection device is installed at one side of the table 220, and the preliminary ejection is performed from the slit nozzle unit 200 when the coating is first started or after the coating is completed each time. The coating liquid may be uniformly applied on the entire surface of the slit nozzle unit 200.

The driving unit 260 is installed at both ends of the slit nozzle unit 200 and the pair of Z-axis driving unit 261 and the slit nozzle unit for moving the slit nozzle unit 200 in the vertical direction (Z-axis direction). It includes a pair of X-axis drive unit 262 to move the 200 at a constant speed in the front-rear direction (X-axis direction) to uniformly spray the photosensitive material on the substrate surface.

At this time, the X-axis driving device 262 may be composed of a motor (not shown), a moving rail, a moving means 270 such as a guide rail, a non-contact type linear (linear) motor can be used as the motor. .

The moving means 270 guides the movement of the slit nozzle part 200 together with the support block 290 fixed and installed at both ends of the table 220. That is, the moving means 270 serves as a guide for moving the slit nozzle part 200 in the horizontal X axis direction of the surface of the table 220 in order to apply the coating liquid to the substrate through the slit nozzle part 200. .

The upper part of the table 220 is provided with a slit nozzle part 200 which is placed almost horizontally on both sides of the table 220, the slit nozzle part 200 crosses the upper part of the substrate and the width of the substrate It consists of a nozzle 240 of the slit-shaped having a length corresponding to and the head 250 is mounted. In addition, the slit nozzle unit 200 includes a gap sensor 255 for measuring a gap between the nozzles 240.

At this time, the nozzle 240 is composed of a nozzle body 241, the inlet and the discharge port 242, has a storage space for storing the photosensitive material in the nozzle body 241, the inlet is a nozzle body 241 The discharge port 242 is formed on the surface of the nozzle body 241 facing the substrate. At this time, the discharge port 242 has a slit shape longer than the width.

In addition, the nozzle 240 is uniformly coated on the surface of the substrate by spraying the photosensitive material while moving from one side of the substrate to the other side through the X-axis drive device 262. Alternatively, the same photosensitive material coating process may be performed by sliding the substrate 100 while the nozzle 240 is fixed.

The head 250 and the nozzle 240 are fixed by a plurality of bolts (not shown), by adjusting the bolt to adjust the height deviation in the vertical direction of both ends of the nozzle 240.

The slit nozzle 240 of the present embodiment configured as described above primarily controls the geometric uniformity and symmetry of the inside by a plurality of bolts (not shown) installed at the lower end of the nozzle body 241, and inside the slit nozzle 240. By inserting a bar-shaped auxiliary material (not shown), the coating liquid flowing from the upper inlet can be uniformly flowed to the lower discharge port 242 with respect to the nozzle 240 direction, which will be described in detail with reference to the accompanying drawings. Explain.

4 is a cross-sectional view schematically showing a slit nozzle according to an embodiment of the present invention, Figure 5 is a front view schematically showing a slit nozzle according to an embodiment of the present invention.

As shown in the figure, the nozzle 240 is largely composed of a first nozzle body 241a, a second nozzle body 241b, an inlet 246 and an outlet 242.

As such, the nozzle 240 has a structure in which two parts of the nozzle body 241 are coupled to each other, and the housing 240 may temporarily store the photosensitive material supplied between the first nozzle body 241a and the second nozzle body 241b. Space 244 is formed. The storage space 244 serves to uniformly spray the photosensitive material pressurized by the pumping means to the entire slit nozzle 240 without being directly injected through the discharge port 242. The storage space 244 may be formed in an arcuate shape having a large space at the center and a relatively small space at the edge of the inner surface of the second nozzle body 241b.

The inlet 246 is formed on the second nozzle body 241b to supply a photosensitive material to the storage space 244, and the discharge hole 242 faces the substrate in a slit shape longer than a width. It is formed on the viewing surface to apply a surface-sensitive photosensitive material on the surface of the substrate.

In this case, the inlet 246 is formed in the upper portion of the second nozzle body 241b, for example, but the present invention is not limited thereto, and the inlet 246 of the present embodiment is the first It may be formed between the nozzle body 241a and the second nozzle body 241a.

The gap between the first nozzle body 241a and the second nozzle body 241b is determined and maintained by a very thin shim 243 made of stainless steel.

As described above, the slit nozzle 240 according to the present embodiment divides the structure into two left and right body parts 241a and 241b to ensure geometric uniformity, and the bolt 248 installed at the lower end of the nozzle body 241. By tightening and loosening the gap between the left and right nozzle body (241a, 241b) is adjusted.

In addition, an injection liquid such as a photoresist injected from the upper portion P _I may be inserted into the slit nozzle 240 to adjust the fluid flow to the nozzle 240. Flow to the lower part (P _O ) uniformly.

In this way, by securing the uniformity of the coating through the shape change inside the slit nozzle 240, it is possible to improve the yield and improve the productivity.

6 is a cross-sectional view schematically showing the structure and fluid flow of the bar inserted in the slit nozzle in the slit nozzle shown in FIG.

As shown in the figure, the bar 400 having an elliptical cross section has an open portion, and has a structure of front and rear symmetry such that a coating liquid such as a photoresist flows uniformly before and after the cross section. In this case, the bar 400 may be located at the lower end of the storage space 244 of the slit nozzle 240.

For reference, the arrow shown schematically shows the flow of the fluid.

As described above, the bar 400 of the present embodiment has an example of an elliptical structure that becomes symmetrical, but the present invention is not limited thereto, and the bar 400 of the present embodiment has the slit nozzle 240. It may have an asymmetrical structure according to the internal shape, and may have various shapes other than elliptical, for example, a circular structure.

In addition, the bar 400 of the present embodiment has been described with an example in which a part of the lower part is open, but the present invention is not limited thereto.

The bar 400 may be horizontal or have a constant angle with respect to the longitudinal direction, and the case in which the bar 400 has a constant angle with respect to the longitudinal direction will be described in detail with reference to the accompanying drawings.

7A to 7D are diagrams schematically illustrating bars having various shapes according to the present invention, and various types of bars 400a to 400d having a predetermined angle with respect to the length direction are illustrated.

As shown in FIGS. 7A and 7D, the bars 400a and 400d according to the present invention may have a high central portion, vary in the degree of height, and may have one or more of the highest points.

In addition, as shown in Figures 7b and 7c, the bar (400b, 400c) according to the present invention may be configured with a low central portion, the degree of height is also very varied, and also the case where the lowest is one or more places have.

That is, the bars 400a to 400d according to the present invention may have both ends higher or lower than the center, and when the bars 400a to 400d have a constant angle with respect to the longitudinal direction, the high points are located at one point. It may be formed as described above.

As described above, the bars 400a to 400d having various shapes are appropriately inserted according to the change of the internal shape of the slit nozzle 240, and one example in which the internal shape of the slit nozzle 240 is changed is provided. The structure and the position of formation.

That is, when the vent is formed in the center of the nozzle body, the shape of the inside of the slit nozzle 240 is changed according to the case where the vent is formed on the center and right and left sides of the nozzle body, and when the vent is formed on one side of the nozzle body. Accordingly, the bars 400a to 400d inserted into the slit nozzle 240 may be inserted into various shapes.

Here, the vent is formed to discharge the air when air is generated in the slit nozzle 240, particularly in the storage space 244, as in the case of filling the slit nozzle 240 with the photosensitive material for the first time.

Hereinafter, an example in which the coating liquid coating device of the present invention is applied will be described in detail through a manufacturing method of a liquid crystal display device.

The manufacturing method of the liquid crystal display device is largely composed of an array process for forming an array substrate, a color filter process for forming a color filter substrate, and a cell process for forming a unit liquid crystal display panel by combining the array substrate and the color filter substrate. Looking in more detail as follows.

First, a thin film transistor which is a switching element which is arranged vertically and horizontally on a transparent insulating substrate such as glass to define a plurality of pixel regions and is connected to the gate line and the data line in each pixel region. To form. In addition, the pixel electrode is connected to the thin film transistor through the array process and drives the liquid crystal layer as a signal is applied through the thin film transistor. In the transverse electric field mode, the pixel electrode and the common electrode for forming a horizontal electric field are formed together in the liquid crystal layer through the array process.

In addition, a color matrix is formed on the color filter substrate to form a black matrix that distinguishes between the color filter composed of a sub color filter that implements red, green, and blue colors and the sub color filter and blocks light transmitted through the liquid crystal layer. do.

The black matrix may be an organic film made of a resin material. For example, coloring of an acrylic, epoxy or polyimide resin including any one of carbon black and black pigment may be performed. Organic resins and the like can be used.

Next, an overcoat layer made of a transparent insulating material is formed on the entire surface of the substrate.

The overcoat layer may be formed of a transparent resin having insulating properties to planarize the substrate on which the color filter is formed and to prevent elution of the pigment ions, and may be formed of an acrylic resin or an epoxy resin.

As described above, the array process and the color filter process require a plurality of photolithography processes to form patterns of thin film transistors and color filters.

The photolithography process is a series of processes for transferring a pattern drawn on a mask onto a substrate on which a thin film is deposited to form a desired pattern. The photolithography process includes a plurality of processes such as photoresist coating, exposure, and development.

At this time, for example, when the coating liquid coating apparatus of the present invention is used to apply the photosensitive liquid, a desired pattern can be obtained by applying a uniform photosensitive liquid to the entire surface of the substrate. As a result, the yield and productivity can be improved.

Next, a spacer is formed of an organic layer on the color filter substrate or the array substrate.

As the spacers are gradually enlarged in size, column spacers (or patterned spacers) fixed to an array substrate or a color filter substrate are used.

Subsequently, an alignment layer is applied to the array substrate and the color filter substrate, respectively, and then the alignment layer is provided to provide alignment control force or surface fixation force (ie, pretilt angle and alignment direction) to the liquid crystal molecules of the liquid crystal layer formed between the two substrates. Orientation treatment. In this case, a rubbing or photoalignment method may be applied as the alignment treatment method.

Next, a predetermined seal pattern is formed on the color filter substrate with a sealant, and a liquid crystal layer is formed on the array substrate.

Thereafter, pressure is applied to the array substrate and the color filter substrate to form a unit liquid crystal display panel.

Many details are set forth in the foregoing description but should be construed as illustrative of preferred embodiments rather than to limit the scope of the invention. Therefore, the invention should not be defined by the described embodiments, but should be defined by the claims and their equivalents.

As described above, the coating liquid coating apparatus and the method of manufacturing the liquid crystal display device using the same according to the present invention provide the effect of improving the yield and productivity by securing the coating uniformity.

Claims (18)

In the coating liquid applying apparatus for applying the coating liquid to the entire surface of the workpiece through the slit nozzle, The slit nozzle A nozzle body separated into a first nozzle body and a second nozzle body; An inlet formed at an upper portion of the second nozzle body to introduce a coating liquid; An accommodation space formed on an inner surface of the second nozzle body between the first nozzle body and the second nozzle body to store the introduced coating liquid; A discharge port formed in a lower portion between the first nozzle body and the second nozzle body to apply the stored coating liquid to the surface of the workpiece; A shim formed at an upper portion between the first nozzle body and the second nozzle body to maintain a gap between the first nozzle body and the second nozzle body; And It is inserted into the lower end of the receiving space, the coating liquid applying apparatus, characterized in that it comprises a bar (bar) is formed in the longitudinal direction of the nozzle body to uniform the flow of the coating liquid. The coating liquid application apparatus according to claim 1, further comprising a table for seating the object. The coating liquid applying apparatus according to claim 1, wherein the object is a glass substrate. The coating liquid coating apparatus according to claim 1, wherein the coating liquid comprises a photosensitive liquid such as a photoresist, a developing solution or a color filter. The coating liquid coating apparatus according to claim 1, wherein the storage space is formed in an arcuate shape having a large space at the center and a relatively small space at the edge of the inner surface of the second nozzle body. The coating liquid application apparatus according to claim 1, wherein the bar has an elliptical cross section. The coating liquid coating apparatus of claim 1, further comprising a vent formed in the nozzle body to discharge air generated in the storage space. The coating liquid application apparatus according to claim 1, wherein the bar is open at a lower portion thereof. The coating liquid application apparatus according to claim 1, wherein the bar is horizontal with respect to the longitudinal direction of the nozzle body. 8. The coating liquid application apparatus according to claim 7, wherein the bar is curved at an angle with respect to the longitudinal direction of the nozzle body. The coating liquid coating apparatus according to claim 10, wherein the bar is curved at an angle with respect to the longitudinal direction of the nozzle body such that both ends thereof are higher or lower than the center according to the position at which the vent is formed. The coating liquid coating apparatus according to claim 1, wherein the bar has a symmetrical structure back and forth so that the coating liquid flows uniformly before and after its cross section. Providing a first substrate and a second substrate; A nozzle body which is divided into a first nozzle body and a second nozzle body, an inlet formed at an upper portion of the second nozzle body to introduce a coating liquid, and an inner surface of the second nozzle body between the first nozzle body and the second nozzle body; A storage space formed in the storage space for storing the introduced coating liquid, a discharge hole formed in a lower portion between the first nozzle body and the second nozzle body to apply the stored coating liquid to the surface of the workpiece, and the first nozzle body; It is formed in the upper portion between the second nozzle body and is inserted into the lower end of the wedge and the receiving space to maintain the gap between the first nozzle body and the second nozzle body, formed in the longitudinal direction of the nozzle body flow of the coating liquid Providing a slit nozzle configured to make the uniform; Applying a coating liquid to a surface of the first substrate or the second substrate using the slit nozzle; Forming a thin film transistor pattern and a color filter pattern on a first substrate or a second substrate to which the coating liquid is applied using a photolithography process; And And attaching the first substrate and the second substrate to each other. The method of claim 13, wherein the coating solution includes a photoresist such as a photoresist, a developing solution, or a color filter. The method of claim 13, further comprising a vent formed in the nozzle body to discharge air generated in the storage space. The method of claim 15, wherein the bar is formed to be bent at a predetermined angle with respect to the length direction of the nozzle body. 17. The liquid crystal display of claim 16, wherein the bar is formed to be bent at a predetermined angle with respect to the length direction of the nozzle body so that both ends thereof are higher or lower than the center according to the position at which the vent is formed. Manufacturing method. 15. The method of claim 13, further comprising forming a liquid crystal layer between the first substrate and the second substrate.

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